GAS DISTRIBUTION PLATE AND APPARATUS USING THE SAME
The present invention provides a gas distribution plate for providing at least two gas flowing channel. In one embodiment, the gas distribution plate has a first flowing channel, at least a second flowing channel disposed around the first flowing channel, and a tapered opening communicating with the first and the second flowing channel. In another embodiment, the gas distribution plate has a first flowing channel passing through a first and a second surface of the gas distribution plate, a second flowing channel paralleling to the first surface and a third flowing channel disposed at the second surface and communicating with the second flowing channel. The ends of the first and the third flowing channel have a tapered opening respectively. Besides, the present further provides a gas distribution apparatus for allowing at least two separate gases to be delivered independently into a process chamber while enabling the gases to be mixed completely after entering the processing chamber.
Latest INDUSTRIAL TECHNOLOGY RESEARCH INSTITUTE Patents:
- Marine fuel cell-based integrated heat, electricity, and cooling supply system
- Catalyst coated membrane and preparation method thereof, membrane electrode and fuel cell
- ACTIVE METAL-CONTAINING M-CHA/M-MOR COMPOSITE MOLECULAR SIEVE AND PREPARATION METHOD
- Piston press system and test method for predicting roll service life of high-pressure grinding rolls
- Method for improving one-time seedling rate of microspore embryoids of brassica campestris SSP. chinensis makino
The present invention relates to a gas supply technique, and more particularly, to a gas distribution plate and the apparatuses using the same that is capable of supplying at least two reaction gases.
BACKGROUND OF THE INVENTIONWith rapid advance and popularity of using means of chemical vapor deposition (CVD) in thin film coating process, it is becoming more and more important to have a gas distribution module capable of spraying gases into its corresponding reaction chamber uniformly.
Please refer to
Nevertheless, the aforesaid arrangement is only proper for thin film coating process using low-flow gas, but is not capable of handling those thin film coating processes using high-flow gas since the use of simply only a layer of buffer zone 14 and the gas distribution module 13 is not sufficient. As shown in
There are already many studies relating to the improvement of the gas distribution module. One of which is a gas distribution module disclosed in U.S. Pat. No. 6,921,437. In this gas distribution module, since the gases to be used in a coating process will be mixed in advance, not only it is unsuitable for those coating processes requiring the use of more than one gases that can not be mixed in advance for preventing they from reacting with each other, but also it can not be achieved without the use of some very complex piping arrangement and thus it can be very difficult to build and very costly as well.
Another such study is disclosed in U.S. Pat. No. 6,478,872, which describes a method of delivering gas into reaction chamber and shower head used to deliver gas. However, although the aforesaid gas distribution design is capable of enabling gases to be mixed and spray with sufficient uniformity, it is still very difficult and costly to build since its structure is very complex.
One another such study is disclosed in U.S. Pub. No. 2007/0163440, which describes a gas separation type showerhead. Although the aforesaid showerhead is capable of delivering gases with sufficient uniformity without having the gases to be mixed in advance, it is still disadvantageous in that: the showerhead can be very difficult and costly to build since its structure is very complex.
Furthermore, another such study is disclosed in U.S. Pat. No. 6,148,761, which describes a dual channel gas distribution plate. The dual channel gas distribution plate, being provided as a portion of a gas delivery system to a process chamber, has at least two sets of gas pathways disposed therein for allowing at least two separate gases to be delivered independently into a process chamber. In one embodiment, a first gas pathway, which includes a first set of vertical channels, is formed through the gas distribution plate, and a second gas pathway, which includes a second set of vertical channels, is formed through a portion of the gas distribution plate and connected to a set of interconnecting horizontal channels in the gas distribution plate, where the second gas pathway maintains fluidic separation from the first gas pathway, prior to the gases entering the process chamber.
SUMMARY OF THE INVENTIONThe object of the present invention is to provide a gas distribution plate and the apparatuses using the same that is capable of supplying at least two gases into a process chamber through their corresponding independent gas flowing channels while maintaining fluidic separation between the gas flowing channels prior to the gases entering the process chamber.
Another object of the invention is to provide a gas distribution apparatus, configured with tapered openings connected to the independent gas flowing channels of its gas distribution plate, by that the flow speeds of the gases are reduced so as to diffuse them and thus enable the same to be mixed completely prior to the gases entering the process chamber.
In one embodiment of the invention, the present invention provides a gas distribution plate, which comprises: a frame, having a recess formed at the center thereof; a first channel, connected to the recess by an end thereof while enabling another end thereof to penetrate the frame; a tapered opening, capable of communicating with the first channel; and at least a second channel, formed on the frame while enabling the same to communicate with the tapered opening.
In another embodiment of the invention, the present invention provides a gas distribution apparatus, which comprises: a gas guidance section, for guiding the flow of a first gas; a gas distribution plate, connected to the gas guidance section and comprising: a frame, having a recess formed at the center thereof; a plurality of first channels, each being configured for enabling the same to communicate with the gas guidance section so as to received the first gas therefrom; a plurality of second channels, being arranged in a manner that there is at least one such second channels disposed at a side of each first channel to be used for guiding the flow of a second gas; and a plurality of tapered openings, each being formed for enabling the same to communicate with one corresponding first channel and the at least one second channels disposed at the side of the corresponding first channel.
Furthermore, in another embodiment of the invention, the present invention provides a gas distribution plate, comprising: a frame with a first surface and a second surface, having a recess formed at the center thereof; a first channel, being formed penetrating through the recess of the frame; a second channel, formed inside the frame while allowing the center axis of the second channel to align parallel with the first surface; and a third channel, formed on the second surface of the frame while allowing the same to communicate with the second channel; wherein, the first channel further has a first tapered opening located on the second surface, and the third channel further has a second tapered opening located on the second surface.
In addition, in another embodiment of the invention, the present invention provides a gas distribution apparatus, comprising: a gas guidance section, for guiding the flow of a first gas; a gas distribution plate, connected to the gas guidance section and comprising: a frame with a first surface and a second surface, having a recess formed at the center thereof; a plurality of first channels, each being formed penetrating through the recess of the frame to be used for guiding the flow of a second gas; a plurality of second channels, each being formed inside the frame while allowing the center axis of each second channel to align parallel with the first surface so as to be used for guiding the flow of the first gas; and a plurality of third channel, formed on the second surface of the frame while allowing the same to communicate with their corresponding second channels; wherein, each first channel further has a first tapered opening located on the second surface, and each third channel further has a second tapered opening located on the second surface.
Further scope of applicability of the present application will become more apparent from the detailed description given hereinafter. However, it should be understood that the detailed description and specific examples, while indicating preferred embodiments of the invention, are given by way of illustration only, since various changes and modifications within the spirit and scope of the invention will become apparent to those skilled in the art from this detailed description.
The present invention will become more fully understood from the detailed description given herein below and the accompanying drawings which are given by way of illustration only, and thus are not limitative of the present invention and wherein:
For your esteemed members of reviewing committee to further understand and recognize the fulfilled functions and structural characteristics of the invention, several exemplary embodiments cooperating with detailed description are presented as the follows.
Please refer to
In this embodiment, each first channel 201 is configured boring through the bottom of the recess 2002 and the second surface 2001 so as to connect an end of the referring first channel 20 with the recess 2002. In addition, for each first channel 201, there is at least one second channel 203 formed at a side thereof. It is note that the amount of such second channel 203 for each first channel 201 can be determined at will, nevertheless, there are six second channel 203 for each first channel 201 that is disposed surrounding the tapered opening 202 of the referring first channel 201 while enabling each second channel 203 to connect with referring first channel 201 by an end thereof and simultaneously connect with the recess 2002 by another end thereof. Please refer to
Please refer to
Please refer to
Please refer to
Operationally, as soon as the first gas and the second gas, provided separately from the first gas source 22 and the second gas source 23, are fed into the gas distribution apparatus 2, the second gas will flow into the recess 2002 through the gas supply channel 2003, and then from the recess 2002 into the second channel 203 as the recess is designed communicating with the second channel 203; and simultaneously, the first gas will flow into the second recess 2120 of the third frame 212 through the gas supply channel 2110 of the second frame 211. Moreover, as there are via holes 2121 being formed on the bottom of the second recess 2120 that are designed communicating with the first recess 2100, the first gas after being uniformly distributed in the second recess 2120 can be guided to flow into the first recess 2100 uniformly where the first gas is able to flow into the first channel 201 through the protruding tubes 2101.
Please refer to
Please refer to
Please refer to
As shown in
With respect to the above description then, it is to be realized that the optimum dimensional relationships for the parts of the invention, to include variations in size, materials, shape, form, function and manner of operation, assembly and use, are deemed readily apparent and obvious to one skilled in the art, and all equivalent relationships to those illustrated in the drawings and described in the specification are intended to be encompassed by the present invention.
Claims
1. A gas distribution plate, comprising:
- a frame, having a recess formed at the center thereof;
- a first channel, connected to the recess by an end thereof while enabling another end thereof to penetrate the frame;
- a tapered opening, capable of communicating with the first channel; and
- at least one second channel, formed on the frame while enabling the same to communicate with the tapered opening.
2. The gas distribution plate of claim 1, wherein the at least one second channel is disposed surrounding the periphery of the first channel.
3. The gas distribution plate of claim 1, wherein the center axis of each second channel is arranged parallel with the center axis of the first channel.
4. The gas distribution plate of claim 1, wherein there is an included angle formed between the center axes of the first channel and the at least one second channel.
5. The gas distribution plate of claim 1, wherein the recess is formed by a means selected from the group consisting of: a means for performing a mechanical process upon the center of the frame, and a means for welding pieces of the frame together while allowing the recess to be formed at the center thereof.
6. The gas distribution plate of claim 5, wherein there is at least one gas supply channel being arranged at a side of the recess.
7. The gas distribution plate of claim 1, wherein the first channel and the frame are assembled in a manner selected from the group consisting of: the first channel is integrally formed with the frame, the first channel is connected to the frame by screwing, and the first channel is connected to the frame by tightly engagement.
8. A gas distribution apparatus, comprising:
- a gas guidance section, for guiding the flow of a first gas;
- a gas distribution plate, connected to the gas guidance section and comprising: a frame, having a recess formed at the center thereof; a plurality of first channels, each having an end connected to the recess and another end penetrating the frame while configuring each for enabling the same to communicate with the gas guidance section so as to received the first gas therefrom; a plurality of second channels, being arranged in a manner that there is at least one such second channels disposed at a side of each first channel to be used for guiding the flow of a second gas; and a plurality of tapered openings, each being formed for enabling the same to communicate with one corresponding first channel and the at least one second channels disposed at the side of the corresponding first channel.
9. The gas distribution apparatus of claim 8, wherein the recess is formed by a means selected from the group consisting of: a means for performing a mechanical process upon the center of the frame, and a means for welding pieces of the frame together while allowing the recess to be formed at the center thereof.
10. The gas distribution apparatus of claim 9, wherein there is at least one gas supply channel being arranged at a side of the recess, provided for the second gas to enter the recess.
11. The gas distribution apparatus of claim 8, wherein the at least one second channel is disposed surrounding the periphery of their corresponding first channel.
12. The gas distribution apparatus of claim 8, wherein the center axis of each second channel is arranged parallel with the center axis of the first channel.
13. The gas distribution apparatus of claim 8, wherein there is an included angle formed between the center axes of the first channel and the corresponding at least one second channel.
14. The gas distribution apparatus of claim 8, wherein the gas guidance section further comprising:
- a first frame, disposed on the first surface, having a first recess formed on a side thereof and a plurality of protruding tubes at another side thereof while enabling each tube to communicate with the first recess as each is further capable of communicate with its corresponding first channel through an end thereof; and
- a second frame, disposed covering on the first frame, having an air hole provided for the first gas to flow therethrough as it is being configured to communicate with the first recess.
15. The gas distribution apparatus of claim 14, further comprising:
- a third frame, sandwiched between the first frame and the second frame, being configured with a second recess in a manner that there are a plurality of via holes formed on the bottom of the second recess while enabling the plural via holes to communicate with the first recess.
16. The gas distribution apparatus of claim 8, wherein the second surface is coupled to a process chamber.
17. The gas distribution apparatus of claim 14, wherein the first frame and the plural protruding tubes is assembled in a manner selected from the group consisting of: the first frame is connected to the plural protruding tubes by screwing, and the first frame is connected to the plural protruding tubes by tightly engagement.
18. The gas distribution apparatus of claim 16, wherein the second gas is enabled to flow into the second channels through the recess
19. A gas distribution plate, comprising:
- a frame with a first surface and a second surface, having a recess formed at the center thereof;
- a first channel, being formed penetrating through the recess of the frame;
- a second channel, formed inside the frame while allowing the center axis of the second channel to align parallel with the first surface; and
- a third channel, formed on the second surface of the frame while allowing the same to communicate with the second channel;
- wherein, the first channel further has a first tapered opening located on the second surface, and the third channel further has a second tapered opening located on the second surface
20. The gas distribution plate of claim 19, wherein the recess is formed by a means selected from the group consisting of: a means for performing a mechanical process upon the center of the frame, and a means for welding pieces of the frame together while allowing the recess to be formed at the center thereof.
21. The gas distribution plate of claim 20, wherein there is at least one gas supply channel formed in an area between the wall of the recess and the side of the frame while allowing the at least one gas supply channel to communicate with the second channel.
22. A gas distribution apparatus, comprising:
- a gas guidance section, for guiding the flow of a first gas;
- a gas distribution plate, connected to the gas guidance section and comprising: a frame with a first surface and a second surface, having a recess formed at the center thereof; a plurality of first channels, each being formed penetrating through the recess of the frame to be used for guiding the flow of a second gas; a plurality of second channels, each being formed inside the frame while allowing the center axis of each second channel to align parallel with the first surface so as to be used for guiding the flow of the first gas; and a plurality of third channel, formed on the second surface of the frame while allowing the same to communicate with their corresponding second channels; wherein, each first channel further has a first tapered opening located on the second surface, and each third channel further has a second tapered opening located on the second surface.
23. The gas distribution apparatus of claim 22, wherein the recess is formed by a means selected from the group consisting of: a means for performing a mechanical process upon the center of the frame, and a means for welding pieces of the frame together while allowing the recess to be formed at the center thereof.
24. The gas distribution apparatus of claim 23, wherein there is at least one first gas supply channel formed in an area between the wall of the recess and the side of the frame while allowing the at least one first gas supply channel to communicate with the second channel.
25. The gas distribution apparatus of claim 24, wherein the gas guidance section further comprising:
- a first frame, disposed on the first surface, having a first recess formed on a side thereof in a manner that the first recess is capable of communicate with the at least one gas supply channel through its corresponding at least one guidance passageway formed on a sidewall of the first recess; and
- a second frame, disposed covering on the first frame, having an air hole provided for the first gas to flow therethrough s it is being configured to communicate with the first recess.
26. The gas distribution apparatus of claim 25, wherein there is at least one second gas supply channel being arranged at a side of the recess, provided for the second gas to enter the recess.
27. The gas distribution apparatus of claim 22, wherein the second surface is coupled to a process chamber.
28. The gas distribution apparatus of claim 27, wherein the second gas is enabled to flow into the recess of the frame through the at least one gas supply channel and then is directed to flow into the process chamber through the first channel.
Type: Application
Filed: Nov 11, 2009
Publication Date: Mar 31, 2011
Applicant: INDUSTRIAL TECHNOLOGY RESEARCH INSTITUTE (Hsinchu)
Inventors: Jung-Chen CHIEN (Hsinchu County), Jun-Chin Liu (Hsinchu City), Hung-Jen Yang (Hsinchu City), Tean-Mu Shen (Hsinchu City), Muh-Wang Liang (Miaoli County)
Application Number: 12/616,203
International Classification: C23C 16/455 (20060101);