SEMICONDUCTOR LIGHT-EMITTING DEVICE WITH A PROTECTION LAYER
The present application discloses a semiconductor light-emitting device with a protection layer. The structure includes a heat dispersion substrate, a first connecting layer on the heat dispersion substrate, a protection layer on the first connecting layer, a second connecting layer on the protection layer, and a light-emitting unit on the second connecting layer. The protection layer is highly insulative and can avoid the current leakage forming between the light-emitting unit and the heat dispersion substrate.
This application claims the right of priority based on Taiwan Patent Application No.098146164 entitled “A SEMICONDUCTOR LIGHT-EMITTING DEVICE WITH A PROTECTION LAYER”, filed on Dec. 30, 2009, which is incorporated herein by reference and assigned to the assignee herein.
TECHNICAL FIELDThe present application generally relates to a semiconductor light-emitting device, and more particularly to a semiconductor light-emitting device with a protection layer.
BACKGROUNDAn active layer of the light-emitting diode is between two different conductivity cladding layers. When a current is applied to the electrodes above the two cladding layers, the electrons and the holes from the two cladding layers can inject into the active layer, are combined to generate the omnidirectional light in the active layer that is emitted from every surfaces of the light emitting diode. Due to its different mechanism from the incandescent lamp, the light emitting diode is called the cold light source. A light emitting diode is applied widely in different fields such as automobiles, computers, communications, and consumption electronic products because it has low volume, long life-time, low driving voltage, low consumption electric quantity, rapid response speed, and good shock-proof advantages.
Nevertheless, the application of the conventional light emitting diode has a restriction for it can only be operated under the direct current with low voltage. The high voltage or alternating current might damage the light emitting diode easily, so it needs a converter system to be adopted in the city electricity system. Furthermore, during a conventional light emitting diode assembly process, there is usually an electric static discharge that increase the instantaneous reversion voltage, and then make the light emitting diode breakdown.
SUMMARYThe present application is to provide a light emitting device at least comprising a heat dispersion substrate, a first connecting layer on the heat dispersion substrate, a protection layer on the first connecting layer, a second connecting layer on the protection layer; and a light-emitting unit comprising an epitaxial structure on the second connecting layer. The protection layer can avoid the current leakage forming between the light-emitting unit and the heat dispersion substrate.
The present application is to provide an illumination unit at least comprising a heat dispersion substrate, a first connecting layer on the heat dispersion substrate, a protection layer on the first connecting layer, a second connecting layer on the protection layer, a micro chip illumination module on the second connecting layer, and a conductive structure wherein the conductive structure electrically connecting to each micro chip.
The present application is to provide a semiconductor light emitting device with a structure can avoid the reversion current breakdown at least comprising a heat dispersion substrate; a first connecting layer on the heat dispersion substrate; a protection layer on the first connecting layer; a second connecting layer on the protection layer; a light-emitting diode on the second connecting layer; and a conductive structure electrically connecting the protection layer and the light-emitting diode in anti-parallel connection.
The foregoing aspects and many of the attendant advantages of this application will become more readily appreciated as the same becomes better understood by reference to the following detailed description, when taken in conjunction with the accompanying drawings, wherein:
The first embodiment of the present application discloses a semiconductor light emitting device with a protection layer structure which is highly insulative, wherein the protection layer can avoid the current leakage forming between the light-emitting unit and the heat dispersion substrate. The foregoing aspects and many of the attendant advantages of this application will become more readily appreciated as the same becomes better understood by reference to the following detailed description, when taken in conjunction with the
Referring to
As
The upper surface of the first conductivity type semiconductor 20 is exposed after removing the first growth substrate 10, then the regularly or irregularly roughened surface is formed by the etch method. By etching from the first conductivity type semiconductor layer 20 to the second conductivity type semiconductor layer 40, a partial portion surface of the second conductivity type semiconductor layer is exposed, then the electrodes 15 and 25 are formed on the upper surface of the first conductivity type semiconductor layer 20 and on the exposed surface of the second conductivity type semiconductor layer 40, then the structure of the light-emitting device 11 as the
The second embodiment of the present application discloses a semiconductor light emitting device with a protection layer structure which is highly insulative. The foregoing aspects and many of the attendant advantages of this application will become more readily appreciated as the same becomes better understood by reference to the following detailed description when taken in conjunction with the
The upper surface of the first conductivity type semiconductor 20 is exposed after removing the first growth substrate 10, then the regularly or irregularly roughened surface is formed by the etch method. By etching from the first conductivity type semiconductor layer 20 to the second conductivity type semiconductor layer 40, a partial portion surface of the second conductivity type semiconductor layer is exposed, then the electrodes 15 and 25 are formed on the upper surface of the first conductivity type semiconductor layer 20 and on the exposed surface of the second conductivity type semiconductor layer 40, then the structure of the light-emitting device 16 as
The third embodiment of the present application discloses a semiconductor light emitting device with a protection layer structure which is highly insulative, and it can avoid the high voltage to breakdown the semiconductor light emitting device structure. The foregoing aspects and many of the attendant advantages of this application will become more readily appreciated as the same becomes better understood by reference to the following detailed description, when taken in conjunction with the
An insulating layer 120 is formed inside the plurality of openings 140 to avoid the current leakage. The material of the insulating layer can be dielectric materials such as SiOx or SiNx as shown in
The fourth embodiment of the present application discloses a semiconductor light emitting device with a protection layer structure which is highly insulative, and it can avoid the reversion current to breakdown the semiconductor light emitting device structure. The foregoing aspects and many of the attendant advantages of this application will become more readily appreciated as the same becomes better understood by reference to the following detailed description, when taken in conjunction with the
The light emitting diode 14 that can avoid the reverse current breaking down the structure is exemplified in this embodiment. There are three differences in device structure and manufacturing process compared with the first embodiment shown in
The embodiments of the above mentioned, the growth substrate is at least one material selected from the group consist of silicon carbide, gallium nitride, and aluminum nitride. The first conductivity type semiconductor layer, the active layer, ant the second conductivity type semiconductor layer of the above mentioned can be a single layer or multiple layers structure, such as super-lattice. Besides, the epitaxial structure of the application mentioned does not limit to growth in epitaxial method on the growth substrate, other forming methods such as directly connect or connect to a heat dispersion substrate by a medium in connecting method belong to the scope of the application.
It should be noted that the proposed various embodiments are not for the purpose to limit the scope of the invention. Any possible modifications without departing from the spirit of the invention may be made and should be covered by the application.
Claims
1. A light-emitting device comprising:
- a heat dispersion substrate;
- a first connecting layer on the heat dispersion substrate;
- a protection layer on the first connecting layer wherein the protection layer is highly insulative;
- a second connecting layer on the protection layer; and
- a light-emitting unit comprising an epitaxial structure on the second connecting layer;
- wherein the protection layer can avoid the current leakage forming between the light-emitting unit and the heat dispersion substrate.
2. The light-emitting device according to claim 1, further comprising a reflection layer between the first connecting layer and the protection layer.
3. The light-emitting device according to claim 2, further comprising an adhesive layer between the reflection layer and the protection layer.
4. The light-emitting device according to claim 1, wherein the epitaxial structure comprising a first conductivity type semiconductor layer, a second conductivity type semiconductor layer, and an active layer between the first conductivity type semiconductor layer and the second conductivity type semiconductor layer.
5. The light-emitting device according to claim 1, wherein the epitaxial structure comprising a roughened interface to increase the light extraction efficiency of the epitaxial structure.
6. The light-emitting device according to claim 1, wherein the protection layer comprising an undoped gallium nitride or an undoped III-V group material.
7. The light-emitting device according to claim 1, wherein the protection layer further comprising a first surface and a second surface wherein the area of the first surface is larger than the area of the second surface.
8. The light-emitting device according to claim 2, wherein the reflection layer comprising aluminum, silver, or other high reflectivity materials.
9. The light-emitting device according to claim 2, wherein the adhesive layer comprising indium tin oxide, zinc oxide.
10. The light-emitting device according to claim 1, wherein the first connecting layer comprising soldering tin, low temperature metal, and metal silicide.
11. The light-emitting device according to claim 1, wherein the second connecting layer comprising polymer material, oxide, nitride, or diamond.
12. An illumination unit comprising:
- a heat dispersion substrate;
- a first connecting layer on the heat dispersion substrate;
- a protection layer on the first connecting layer;
- a second connecting layer on the protection layer;
- a micro chip illumination module on the second connecting layer, wherein the illumination module comprising at least two micro chips wherein each micro chip having an active layer; and
- a conductive structure electrically connecting to each micro chip.
13. An illumination unit according to claim 12, further comprising a reflection layer between the first connecting layer and the protection layer.
14. An illumination unit according to claim 12, further comprising an adhesive layer between the reflection layer and the protection layer.
15. An illumination unit according to claim 12, wherein the protection layer comprising an undoped gallium nitride or an undoped III-V group material.
16. An illumination unit according to claim 13, wherein the reflection layer comprising aluminum, silver, or other high reflectivity materials.
17. An illumination unit according to claim 14, wherein the adhesive layer conductive structure electrically connecting to each micro chip comprising indium tin oxide or zinc oxide.
18. An illumination unit according to claim 12, wherein the conductive structure electrically connecting to each micro chip in series connection or parallel connection.
19. An illumination unit according to claim 12, wherein each of the at least two micro chips emits the same wavelength or the different wavelength.
20. An illumination unit according to claim 12, wherein the first connecting layer comprising soldering tin, low temperature metal, and metal silicide.
21. An illumination unit according to claim 12, wherein the second connecting layer comprising polymer material, oxide, nitride, or diamond.
22. A semiconductor device comprising:
- a heat dispersion substrate;
- a first connecting layer on the heat dispersion substrate;
- a protection layer on the first connecting layer;
- a second connecting layer on the protection layer;
- a light-emitting diode on the second connecting layer; and
- a conductive structure electrically connecting to the protection layer and the light-emitting diode in anti-parallel.
23. A semiconductor device according to claim 22, further comprising a reflection layer between the first connecting layer and the protection layer.
24. A semiconductor device according to claim 22, further comprising an adhesive layer between the reflection layer and the protection layer.
25. A semiconductor device according to claim 22, wherein the light-emitting diode comprising a first conductivity type semiconductor layer, a second conductivity type semiconductor layer, and an active layer between the first conductivity type semiconductor layer and the second conductivity type semiconductor layer.
26. A semiconductor device according to claim 22, wherein the protection layer comprising a single layer structure of an undoped gallium nitride or an undoped III-V group material.
27. A semiconductor device according to claim 22, wherein the protection layer comprising a multiple layers structure stacked alternately with zinc oxide and silicon or zinc oxide and indium oxide tin.
28. A semiconductor device according to claim 22, wherein the reflection layer comprising aluminum, silver, or other high reflectivity materials.
29. A semiconductor device according to claim 22, wherein the first connecting layer comprising polymer material, oxide, nitride, or diamond.
30. A semiconductor device according to claim 22, wherein the second connecting layer comprising soldering tin, low temperature metal, and metal silicide.
Type: Application
Filed: Dec 30, 2010
Publication Date: Jun 30, 2011
Patent Grant number: 8779447
Inventors: Chin-Lin YAO (Hsinchu), Chih-Chiang Lu (Hsinchu)
Application Number: 12/982,210
International Classification: H01L 33/64 (20100101); H01L 33/10 (20100101);