LIGHT-EMITTING DEVICE HAVING A ROUGHENED SURFACE WITH DIFFERENT TOPOGRAPHIES
This invention provides an optoelectronic semiconductor device having a rough surface and the manufacturing method thereof. The optoelectronic semiconductor device comprises a semiconductor stack having a rough surface and an electrode layer overlaying the semiconductor stack. The rough surface comprises a first region having a first topography and a second region having a second topography. The method comprises the steps of forming a semiconductor stack on a substrate, forming an electrode layer on the semiconductor stack, thermal treating the semiconductor stack, and wet etching the surface of the semiconductor stack to form a rough surface.
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This application is a continuation of U.S. patent application Ser. No. 12/905,795, entitled “Light-Emitting Device Having a Roughened Surface With Different Topographies”, filed Oct. 15, 2010, which claims the right of priority to U.S. patent application Ser. No. 12/230,054, now U.S. Pat. No. 7,834,369, entitled “Light-Emitting Device Having a Roughened Surface With Different Topographies”, filed Aug. 22, 2008, which claims the right of priority based on Taiwan Application Serial Number 096131320, filed Aug. 23, 2007, which are herein incorporated by references.
TECHNICAL FIELDThis invention relates to a semiconductor optoelectronic device having a rough surface and the manufacturing method thereof.
BACKGROUND OF THE DISCLOSURESurface roughening is one of the efficient ways to improve light extraction efficiency of a light-emitting device. Roughening the substrate or the upmost semiconductor layer into irregular protrusions depressions to scatter incident light impinging on the roughened surface is an example to improve light extraction efficiency. Roughening surface can be achieved by known processes like mechanically polishing or reactive-ion-etching (RIE). Another feasible way is performed by wet etching the wafer immersed in an etching solution for certain duration. The surface is roughened by different etching rates of the etching solution versus different exposed crystal planes of the surface. The roughened surface of the light-emitting device, as shown in
Another conventional way to prevent the light-emitting device from reliability failure or pad peeling is to form the roughened surface before forming the conductive pad, but the contact resistance between the conductive pad and the roughened surface of the underlying layer becomes high and therefore downgrade the device performance. Besides, the resulted surface of the conductive pad is uneven and therefore obstructs the wire-bonding yield.
SUMMARY OF THE DISCLOSUREOne aspect of the present invention is to provide an optoelectronic semiconductor device comprising a substrate; a semiconductor stack further comprising a first semiconductor layer of a first conductivity, an active layer, and a second semiconductor layer of a second conductivity; and an electrode layer formed on the second semiconductor layer; wherein the first and/or second semiconductor layer having a rough surface comprising a first region having a first topography and a second region having a second topography.
Another aspect of the present invention is to provide a method for forming a rough surface on a semiconductor layer of an optoelectronic semiconductor device. The method comprises the steps of forming a semiconductor stack on a substrate; forming an electrode layer on the semiconductor stack; heat treating the semiconductor stack and the electrode layer; and wet etching the surface of the semiconductor stack to form a rough surface.
The optoelectronic semiconductor device comprises light-emitting device or photovoltaic device.
The rough surface comprises a first region 241 having a first rough topography and a second region 242 having a second rough topography. The first region and the second region comprise a plurality of depressions and protrusions. The dimension of the first rough topography is smaller than that of the second rough topography. In an embodiment of the present invention, the distance between the neighboring depressions or the distance between the neighboring protrusions of the first rough topography is around 0.1 to 0.5 micron. The depth of at least one of the depressions or the height of at least one protrusion of the first rough topography is around 0.1 to 0.5 micron. The distance between the neighboring depressions or the distance between the neighboring protrusions of the second rough topography is around 1 to 10 microns. The depth of at least one of the depressions or the height of at least one of the protrusions of the second rough topography is around 0.5 to 2 microns. The first rough topography as shown in
1 providing a growth substrate 21;
2 forming a first semiconductor layer 22, an active layer, and a second semiconductor layer 24 sequentially on the growth substrate;
3 forming an extended electrode layer 25 on the second semiconductor layer 24; proceeding a thermal treatment step, such as rapid thermal annealing (RTA);
4 forming a first conductive pad 26 on a portion of the extended electrode layer 25 and the second semiconductor layer 24;
5 proceeding a thermal treatment step, such as rapid thermal annealing (RTA);
6 wet etching the second semiconductor layer 24 by an etching solution comprising HF, HN03, CH3COOH, and iodine under a low temperature condition from room temperature to 60° C. to form a rough surface thereon, wherein the features of the rough surface is described in the previous embodiments, such as
7 forming a second conductive pad 27 on the other side of the substrate 21.
The structure formed by the method is shown in
The manufacturing method for forming the light-emitting device 5a comprises the steps of:
-
- 1 providing a growth substrate (not shown);
- 2 forming a first semiconductor layer 22, an active layer 23, and a second semiconductor layer 24 sequentially on the growth substrate;
- 3 bonding a temporary substrate (not shown) to the second semiconductor layer 24;
- 4 removing the growth substrate to expose one surface of the first semiconductor layer 22;
- 5 forming a reflecting layer 53 on the exposed surface of the first semiconductor layer 22;
- 6 forming a conductive connecting layer 52 on a conductive substrate 51,
- 7 bonding the conductive substrate 51 with the conductive connecting layer 52 to the reflecting layer 53;
- 8 removing the temporary substrate to expose one surface of the second semiconductor layer 24
- 9 forming an extended electrode layer 25 on the exposed surface of the second semiconductor layer 24;
- 10 forming a first conductive pad 26 on a portion of the extended electrode layer 25 and the second semiconductor layer 24;
- 11 proceeding a thermal treatment step, such as rapid thermal annealing (RTA);
- 12 wet etching the second semiconductor layer 24 to form a rough surface thereon, wherein the features of the rough surface is described in the previous embodiments, such as
FIG. 3A andFIG. 3B ; - 13 forming a second conductive pad 27 on the other side of the conductive substrate 51.
The manufacturing method for forming the light-emitting device 5b comprises the steps of
-
- 1 providing a growth substrate (not shown);
- 2 forming a first semiconductor layer 22, an active layer 23, and a second semiconductor layer 24 sequentially on the growth substrate;
- 3 forming a reflecting layer 53 on the second semiconductor layer 24;
- 4 forming a conductive connecting layer 52 on a conductive substrate 51;
- 5 bonding the conductive substrate 51 with the conductive connecting layer 52 to the reflecting layer 53;
- 6 removing the growth substrate to expose one surface of the first semiconductor layer 22;
- 7 forming an extended electrode layer 25 on the exposed surface of the first semiconductor layer 22;
- 8 forming a first conductive pad 26 on a portion of the extended electrode layer 25 and the first semiconductor layer 22;
- 9 proceeding a thermal treatment step, such as rapid thermal annealing (RTA);
- 10 wet etching the first semiconductor layer 22 to form a rough surface thereon, wherein the features of the rough surface is described in the previous embodiments, such as
FIG. 3A andFIG. 3B ; - 11 forming a second conductive pad 27 on the other side of the conductive substrate 51.
The manufacturing method for forming the light-emitting device 5c comprises the steps of
-
- 1 providing a growth substrate (not shown);
- 2 forming a first semiconductor layer 22, an active layer 23, and a second semiconductor layer 24 sequentially on the growth substrate;
- 3 forming an extended electrode layer 25 on the second semiconductor layer 24;
- 4 proceeding a thermal treatment step, such as rapid thermal annealing (RTA);
- 5 wet etching the second semiconductor layer 24 to form a rough surface thereon, wherein the features of the rough surface is described in the previous embodiments, such as
FIG. 3A andFIG. 3B ; - 6 forming a reflecting layer 53 on a conductive substrate 51;
- 7 forming a conductive connecting layer 52 on the reflecting layer 53;
- 8 bonding the extended electrode layer 25 and the second semiconductor layer 24 to the reflecting layer 53 by the conductive connecting layer 52;
- 9 removing the growth substrate to expose one surface of the first semiconductor layer 22;
- 10 forming a first conductive pad 26 on a portion of the exposed surface of the first semiconductor layer 22;
- 11 forming a second conductive pad 27 on the other side of the conductive substrate 51.
The manufacturing method for forming the light-emitting device 6 comprises the steps of:
-
- 1. providing a growth substrate (not shown);
- 2. forming a first semiconductor layer 22, an active layer 23, and second semiconductor layer 24 sequentially on the growth substrate;
- 3. forming an extended electrode layer 25 on the second semiconductor layer 24;
- 4. proceeding a thermal treatment step, such as rapid thermal annealing (RTA);
- 5. wet etching the second semiconductor layer 24 to form a rough surface thereon, wherein the features of the rough surface is described in the previous embodiments, such as
FIG. 3A andFIG. 3B ; - 6. forming a transparent conductive layer 63 the extended electrode layer 25 and the second semiconductor layer 24;
- 7. forming a transparent adhesive layer 62 on a transparent substrate 61;
- 8. bonding the transparent conductive layer 63 to the transparent substrate 61 by the transparent adhesive layer 62;
- 9. removing the growth substrate to expose one surface of the first semiconductor layer 22;
- 10. removing a part of the first semiconductor layer 22, the active layer 23, the second semiconductor layer 24, and the transparent conductive layer 63 to expose a portion of the transparent conductive layer 63;
- 11. forming a first conductive pad 26 on the first semiconductor layer 22;
- 12. forming a second conductive pad 27 on the exposed portion of the transparent conductive layer 63.
Another alternative embodiment for step 10 to step 12 of the method for forming the light-emitting device 6 is to remove a part of the first semiconductor layer 22, the active layer 23, the second semiconductor layer 24 to expose a portion of the second semiconductor layer 24, and form the second conductive pad 27 on the exposed portion of the second semiconductor layer 24.
According to the various embodiments described as above, it is still under the scope of the present invention to form the featured rough surface on both of the first semiconductor layer and the second semiconductor layer to further enhance the light extraction efficiency.
It should be noted that the proposed various embodiments are not for the purpose to limit the scope of the invention. Any possible modifications without departing from the spirit of the invention may be made and should be covered by the invention.
Claims
1. A method of forming an optoelectronic semiconductor device, comprising the steps of:
- preparing a semiconductor stack;
- forming an electrode layer on a portion of the semiconductor stack;
- proceeding a thermal treatment; and
- roughing another portion of the semiconductor stack not covered by the electrode layer after the thermal treatment.
2. The method of claim 1, wherein the roughing step comprises forming a first region having a first rough topography and a second region having a second rough topography different to the first rough topography.
3. The method of claim 2, wherein the roughing step comprises forming the second region closer to the electrode layer than the first region.
4. The method of claim 2, wherein the roughing step comprises forming the first rough topography having a dimension smaller than the second rough topography.
5. The method of claim 2, wherein the roughing step comprises forming the first region separated from the electrode layer.
6. The method of claim 2, wherein the roughing step comprises forming the second region having an outline similar to the electrode layer.
7. The method of claim 2, wherein the roughing step comprises forming the second region substantially surrounding the electrode layer.
8. The method of claim 2, wherein the roughing step comprises forming the second region substantially lower than the first region.
9. The method of claim 2, wherein the roughing step comprises forming the second region having a cross section with a curved shape.
10. The method of claim 2, wherein the roughing step comprises forming the second region having a wave-shape surface.
11. The method of claim 2, wherein the roughing step comprises forming the second region outward oblique from the electrode layer.
12. The method of claim 2, wherein the roughing step comprises forming the second region not covered by the electrode layer.
13. The method of claim 2, wherein the roughing step comprises etching the semiconductor stack by an etching solution.
14. The method of claim 1, wherein the thermal treatment step is applied to at least of the semiconductor stack and the electrode layer.
15. The method of claim 1, wherein the roughing step is performed at a temperature substantially not greater than 60° C.
16. The method of claim 1, wherein the thermal treatment comprises a rapid thermal annealing step.
17. The method of claim 1, wherein the forming the electrode layer step comprises forming one or more metal layers.
18. The method of claim 1, wherein the roughing step comprises forming a first region having a first rough topography and being substantially separated from the electrode layer.
19. The method of claim 1, wherein the roughing step comprises forming a second region having a second rough topography and an outline similar to the electrode layer.
20. The method of claim 1, wherein the roughing step comprises forming a second region having a second rough topography and being outward oblique from the electrode layer.
Type: Application
Filed: Aug 28, 2012
Publication Date: Dec 20, 2012
Patent Grant number: 8679874
Applicant:
Inventors: Chiu-Lin Yao (Hsinchu), Ta-Cheng Hsu
Application Number: 13/596,811
International Classification: H01L 33/22 (20100101); H01L 31/0236 (20060101);