Gas distribution plate for a semiconductor processing chamber

Description

FIG. 1 is an isometric view of a gas distribution plate for a semiconductor processing chamber showing our new design;

FIG. 2 is a front elevational view of the gas distribution plate for a semiconductor processing chamber of FIG. 1, the rear elevational view being a mirror image;

FIG. 3 is a side sectional view of the gas distribution plate for a semiconductor processing chamber along lines 3-3 of FIG. 2;

FIG. 4 is an enlarged sectional view of a portion of the gas distribution plate for a semiconductor processing chamber of FIG. 3 showing details of an edge and an opening formed therethrough typical of all of the openings in the gas distribution plate for a semiconductor processing chamber; and,

FIG. 5 is an enlarged view of a portion of the gas distribution plate of FIG. 2 showing details of openings formed therethrough typical of all of the openings in the gas distribution plate for a semiconductor processing chamber.

Claims

The ornamental design for a gas distribution plate for a semiconductor processing chamber, as shown and described.