Seal for chemical mechanical polishing device
Latest EBARA CORPORATION Patents:
1. Seal for chemical mechanical polishing device
The article is a seal for a top ring of a chemical mechanical polishing device. The feature of the design resides in the shape and configuration of the article as shown in the reproductions. Reproduction
Claims
The ornamental design for a seal for chemical mechanical polishing device as shown and described.
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Type: Grant
Filed: Sep 26, 2023
Date of Patent: Mar 24, 2026
Assignee: EBARA CORPORATION (Tokyo)
Inventors: Kazuhiro Tajima (Ota-ku), Makoto Kashiwagi (Ota-ku), Manato Furusawa (Ota-ku)
Primary Examiner: Rhea Shields
Assistant Examiner: Leah E Hoeferkamp
Application Number: 35/522,479