Exhaust ring for manufacturing semiconductors

- Tokyo Electron Limited
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Description

FIG. 1 is a front/top perspective view of an exhaust ring for manufacturing semiconductors showing my new design;

FIG. 2 is a top plan view thereof, the bottom plan view being a mirror image and, therefore, not shown;

FIG. 3 is a front elevational view thereof, the left-side elevational view being a mirror image and, therefore, not shown;

FIG. 4 is a right-side elevational view thereof;

FIG. 5 is a rear elevational view thereof;

FIG. 6 is a reference front elevational view thereof;

FIG. 7 is a right-side cross-sectional view taken along line 7—7 in FIG. 6; and,

FIG. 8 is an enlarged, partial, cross-sectional view taken along line 8—8 in FIG. 7.

The exhaust ring for manufacturing semiconductors is used in a vacuum vessel for manufacturing semiconductors.

Claims

I claim the ornamental design for exhaust ring for manufacturing semiconductors, as shown and described.

Referenced Cited
U.S. Patent Documents
5310453 May 10, 1994 Fukasawa et al.
D404370 January 19, 1999 Kimura
D404372 January 19, 1999 Ishii
6068441 May 30, 2000 Raaijmakers et al.
6155915 December 5, 2000 Raeder
20030017714 January 23, 2003 Taniyama
20030124820 July 3, 2003 Johnsgard et al.
20040025788 February 12, 2004 Ogasawara et al.
20040056017 March 25, 2004 Renken
Patent History
Patent number: D494551
Type: Grant
Filed: Jun 12, 2003
Date of Patent: Aug 17, 2004
Assignee: Tokyo Electron Limited (Tokyo)
Inventor: Shigeki Doba (Nirasaki)
Primary Examiner: Prabhakar Deshmukh
Assistant Examiner: Selina Sikder
Attorney, Agent or Law Firm: Ladas & Parry
Application Number: 29/183,528
Classifications
Current U.S. Class: Semiconductor, Transistor Or Integrated Circuit (24) (D13/182)
International Classification: 1303;