Process tube for semiconductor device manufacturing apparatus

- Tokyo Electron Limited
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Description

FIG. 1 is an isometric view of a process tube for semiconductor device manufacturing apparatus of the present invention;

FIG. 2 is a front view thereof;

FIG. 3 is a rear view thereof;

FIG. 4 is a left side view thereof;

FIG. 5 is a right side view thereof;

FIG. 6 is a top view thereof;

FIG. 7 is a bottom view thereof;

FIG. 8 is a sectional view along line 8—8 shown in FIG. 6;

FIG. 9 is a sectional view along line 9—9 shown in FIG. 6;

FIG. 10 is a sectional view along line 10—10 shown in FIG. 6; and,

FIG. 11 is a sectional view along line 11—11 shown in FIG. 2.

Claims

The ornamental design for a process tube for semiconductor device manufacturing apparatus, as shown and described.

Referenced Cited
U.S. Patent Documents
5037502 August 6, 1991 Suzuki et al.
5279986 January 18, 1994 Maloney et al.
5352293 October 4, 1994 Yang et al.
5752819 May 19, 1998 Hansotte et al.
D405062 February 2, 1999 Shimazu
6240875 June 5, 2001 Van Wijck et al.
6402849 June 11, 2002 Kwag et al.
Patent History
Patent number: D520467
Type: Grant
Filed: Apr 29, 2004
Date of Patent: May 9, 2006
Assignee: Tokyo Electron Limited (Tokyo)
Inventors: Katsutoshi Ishii (Tokyo), Hiroyuki Matsuura (Tokyo)
Primary Examiner: Stella Reid
Assistant Examiner: Selina Sikder
Attorney: Smith, Gambrell & Russell, LLP
Application Number: 29/204,407