Wafer-boat for heat-processing of semiconductor wafers
Latest Tokyo Electron Limited Patents:
- Plasma processing apparatus and plasma processing method
- Detection method and plasma processing apparatus
- Substrate processing apparatus, data processing method, and data processing program
- Substrate processing apparatus and substrate processing method
- Management apparatus, prediction method, and prediction program
Description
Claims
The ornamental design for a wafer-boat for heat-processing of semiconductor wafers, as shown and described.
Referenced Cited
U.S. Patent Documents
| 5219079 | June 15, 1993 | Nakamura |
| D361752 | August 29, 1995 | Yamaga |
| D404371 | January 19, 1999 | Shimazu |
| D409158 | May 4, 1999 | Shimazu |
| D411176 | June 22, 1999 | Shimazu |
| 6065615 | May 23, 2000 | Uchiyama et al. |
| D429224 | August 8, 2000 | Ishii |
| 6488497 | December 3, 2002 | Buckley et al. |
| 6796439 | September 28, 2004 | Araki |
| 20020092815 | July 18, 2002 | Kim et al. |
| 20030010730 | January 16, 2003 | Buckley |
| 20030024888 | February 6, 2003 | Payne et al. |
| 20050145584 | July 7, 2005 | Buckley et al. |
Patent History
Patent number: D551634
Type: Grant
Filed: Aug 25, 2005
Date of Patent: Sep 25, 2007
Assignee: Tokyo Electron Limited (Tokyo)
Inventor: Kazuyuki Sugawara (Minato-ku)
Primary Examiner: Selina Sikder
Attorney: Smith, Gambrell & Russell, LLP
Application Number: 29/236,991
Type: Grant
Filed: Aug 25, 2005
Date of Patent: Sep 25, 2007
Assignee: Tokyo Electron Limited (Tokyo)
Inventor: Kazuyuki Sugawara (Minato-ku)
Primary Examiner: Selina Sikder
Attorney: Smith, Gambrell & Russell, LLP
Application Number: 29/236,991
Classifications
Current U.S. Class:
Semiconductor, Transistor Or Integrated Circuit (24) (D13/182)