Wafer attracting plate
Latest Tokyo Electron Limited Patents:
- PROCESSING LIQUID SUPPLY SYSTEM, PROCESSING LIQUID SUPPLY METHOD, AND RECORDING MEDIUM
- SUBSTRATE INSPECTION APPARATUS AND SUBSTRATE INSPECTION METHOD
- EXHAUST STRUCTURE AND EXHAUST METHOD FOR FLOW RATE CONTROL DEVICE, AND GAS SUPPLY SYSTEM AND GAS SUPPLY METHOD COMPRISING SAME
- COMMUNICATION SYSTEM, CALCULATION DEVICE, AND COMMUNICATION METHOD
- Substrate processing apparatus and substrate processing method
Description
Claims
The ornamental design for wafer attracting plate, as shown and described.
Referenced Cited
U.S. Patent Documents
Patent History
Patent number: D609652
Type: Grant
Filed: Jan 22, 2009
Date of Patent: Feb 9, 2010
Assignee: Tokyo Electron Limited (Tokyo)
Inventors: Munetoshi Nagasaka (Nirasaki), Ikuo Ogasawara (Nirasaki), Eiichi Shinohara (Nirasaki)
Primary Examiner: Selina Sikder
Attorney: Oblon, Spivak, McClelland, Maier & Neustadt, L.L.P.
Application Number: 29/331,222
Type: Grant
Filed: Jan 22, 2009
Date of Patent: Feb 9, 2010
Assignee: Tokyo Electron Limited (Tokyo)
Inventors: Munetoshi Nagasaka (Nirasaki), Ikuo Ogasawara (Nirasaki), Eiichi Shinohara (Nirasaki)
Primary Examiner: Selina Sikder
Attorney: Oblon, Spivak, McClelland, Maier & Neustadt, L.L.P.
Application Number: 29/331,222
Classifications
Current U.S. Class:
Electron Or Vacuum Tube (23) (D13/180)