Support of wafer boat for manufacturing semiconductor wafers
Latest Tokyo Electron Limited Patents:
- Plasma processing apparatus and plasma processing method
- Detection method and plasma processing apparatus
- Substrate processing apparatus, data processing method, and data processing program
- Substrate processing apparatus and substrate processing method
- Management apparatus, prediction method, and prediction program
Description
Claims
The ornamental design for a support of wafer boat for manufacturing semiconductor wafers, as shown and described.
Referenced Cited
Patent History
Patent number: D616395
Type: Grant
Filed: Sep 2, 2009
Date of Patent: May 25, 2010
Assignee: Tokyo Electron Limited (Minato-Ku)
Inventor: Izumi Sato (Oshu)
Primary Examiner: Selina Sikder
Attorney: Burr & Brown
Application Number: 29/342,857
Type: Grant
Filed: Sep 2, 2009
Date of Patent: May 25, 2010
Assignee: Tokyo Electron Limited (Minato-Ku)
Inventor: Izumi Sato (Oshu)
Primary Examiner: Selina Sikder
Attorney: Burr & Brown
Application Number: 29/342,857
Classifications
Current U.S. Class:
Semiconductor, Transistor Or Integrated Circuit (24) (D13/182)