Dielectric window for plasma processing device
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Description
Claims
The ornamental design for a dielectric window for a plasma processing device, as shown and described.
Referenced Cited
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| 6280563 | August 28, 2001 | Baldwin et al. |
| 7694651 | April 13, 2010 | Vikharev et al. |
| 20010007302 | July 12, 2001 | Hong |
| 20060110546 | May 25, 2006 | Vikharev et al. |
| 20080102538 | May 1, 2008 | Chang et al. |
| 20090068934 | March 12, 2009 | Hong et al. |
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Patent History
Patent number: D645486
Type: Grant
Filed: Sep 10, 2010
Date of Patent: Sep 20, 2011
Assignee: Tokyo Electron Limited
Inventors: Wataru Yoshikawa (Amagasaki), Naoki Matsumoto (Amagasaki), Jun Yoshikawa (Amagasaki)
Primary Examiner: Patricia Palasik
Attorney: Cantor Colburn LLP
Application Number: 29/369,644
Type: Grant
Filed: Sep 10, 2010
Date of Patent: Sep 20, 2011
Assignee: Tokyo Electron Limited
Inventors: Wataru Yoshikawa (Amagasaki), Naoki Matsumoto (Amagasaki), Jun Yoshikawa (Amagasaki)
Primary Examiner: Patricia Palasik
Attorney: Cantor Colburn LLP
Application Number: 29/369,644
Classifications
Current U.S. Class:
Element Or Attachment (D15/138)