Dielectric window for plasma processing device

- Tokyo Electron Limited
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Description

FIG. 1 is a perspective view of a dielectric window for plasma processing device showing our new design;

FIG. 2 is a front view thereof;

FIG. 3 is a rear view thereof;

FIG. 4 is a right side view thereof;

FIG. 5 is a top plan view thereof; and,

FIG. 6 is a cross-sectional view taken along line 6-6 of FIG. 2.

Claims

The ornamental design for a dielectric window for a plasma processing device, as shown and described.

Referenced Cited
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7694651 April 13, 2010 Vikharev et al.
20010007302 July 12, 2001 Hong
20060110546 May 25, 2006 Vikharev et al.
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Patent History
Patent number: D645486
Type: Grant
Filed: Sep 10, 2010
Date of Patent: Sep 20, 2011
Assignee: Tokyo Electron Limited
Inventors: Wataru Yoshikawa (Amagasaki), Naoki Matsumoto (Amagasaki), Jun Yoshikawa (Amagasaki)
Primary Examiner: Patricia Palasik
Attorney: Cantor Colburn LLP
Application Number: 29/369,644
Classifications
Current U.S. Class: Element Or Attachment (D15/138)