Gas nozzle substrate processing apparatus
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Description
Claims
We claim the ornamental design for a gas nozzle substrate processing apparatus, as shown and described.
Referenced Cited
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Patent History
Patent number: D783351
Type: Grant
Filed: Nov 9, 2015
Date of Patent: Apr 11, 2017
Assignee: HITACHI KOKUSAI ELECTRIC INC. (Tokyo)
Inventors: Toshiki Fujino (Toyama), Kosuke Takagi (Toyama), Ryota Sasajima (Toyama)
Primary Examiner: Robin V Webster
Assistant Examiner: Rachel Voorhies
Application Number: 29/544,977
Type: Grant
Filed: Nov 9, 2015
Date of Patent: Apr 11, 2017
Assignee: HITACHI KOKUSAI ELECTRIC INC. (Tokyo)
Inventors: Toshiki Fujino (Toyama), Kosuke Takagi (Toyama), Ryota Sasajima (Toyama)
Primary Examiner: Robin V Webster
Assistant Examiner: Rachel Voorhies
Application Number: 29/544,977
Classifications
Current U.S. Class:
D7/407