Upper chamber for a plasma processing apparatus

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Description

FIG. 1 is a front and top perspective view of an upper chamber for a plasma processing apparatus according to the design;

FIG. 2 is a front elevational view thereof;

FIG. 3 is a rear elevational view thereof;

FIG. 4 is a left side elevational view thereof;

FIG. 5 is a right side elevational view thereof;

FIG. 6 is a top plan view thereof;

FIG. 7 is a bottom plan view thereof;

FIG. 8 is a cross-sectional view taken along line 8-8 of FIG. 6; and,

FIG. 9 is a partially enlarged view taken along line 9-9 of FIG. 8.

Claims

The ornamental design for an upper chamber for a plasma processing apparatus, as shown and described.

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Patent History
Patent number: D804436
Type: Grant
Filed: Oct 30, 2015
Date of Patent: Dec 5, 2017
Assignee: Hitachi High-Technologies Corporation (Tokyo)
Inventors: Susumu Tauchi (Tokyo), Takashi Uemura (Tokyo), Kohei Sato (Tokyo)
Primary Examiner: Jeffrey D Asch
Assistant Examiner: Tracey J Bell
Application Number: 29/544,068