Upper chamber for a plasma processing apparatus
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Description
Claims
The ornamental design for an upper chamber for a plasma processing apparatus, as shown and described.
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Patent History
Patent number: D812578
Type: Grant
Filed: Jul 26, 2016
Date of Patent: Mar 13, 2018
Assignee: Hitachi High-Technologies Corporation (Tokyo)
Inventors: Takashi Uemura (Tokyo), Kohei Sato (Tokyo), Susumu Tauchi (Tokyo)
Primary Examiner: Jeffrey D Asch
Assistant Examiner: Tracey J Bell
Application Number: 29/572,169
Type: Grant
Filed: Jul 26, 2016
Date of Patent: Mar 13, 2018
Assignee: Hitachi High-Technologies Corporation (Tokyo)
Inventors: Takashi Uemura (Tokyo), Kohei Sato (Tokyo), Susumu Tauchi (Tokyo)
Primary Examiner: Jeffrey D Asch
Assistant Examiner: Tracey J Bell
Application Number: 29/572,169
Classifications