Heater for substrate processing apparatus

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Description

FIG. 1 is a front, bottom and right side perspective view of a heater for substrate processing apparatus showing our new design;

FIG. 2 is a front elevational view thereof;

FIG. 3 is a rear elevational view thereof;

FIG. 4 is a right side elevational view thereof;

FIG. 5 is a left side elevational view thereof:

FIG. 6 is a top plan view thereof;

FIG. 7 is a bottom plan view thereof; and,

FIG. 8 is a cross-sectional view thereof taken in the direction of line 8-8 in FIG. 6.

The dot-dash broken lines and evenly spaced broken lines immediately adjacent to the shaded areas represent the bounds of the claimed design, while all other evenly spaced broken lines are directed to environment; the broken lines form no part of the claimed design. In addition, the dot-dot-dash broken line arrows in the FIG. 6 view is used to identify the cross-section views, are for reference purposes only, and form no part of the claimed design.

Claims

We claim the ornamental design for a heater for substrate processing apparatus, as shown and described.

Referenced Cited
U.S. Patent Documents
D516047 February 28, 2006 Hahn
D518452 April 4, 2006 Hahn
D519087 April 18, 2006 Hahn
D790490 June 27, 2017 Osaka
20080166882 July 10, 2008 Miya
20090291566 November 26, 2009 Ueno
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20110065288 March 17, 2011 Harada
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20110306212 December 15, 2011 Sato
Patent History
Patent number: D825502
Type: Grant
Filed: Mar 13, 2017
Date of Patent: Aug 14, 2018
Assignee: HITACHI KOKUSAI ELECTRIC INC. (Tokyo)
Inventors: Tetsuya Kosugi (Toyama), Takatomo Yamaguchi (Toyama), Shuhei Saido (Toyama)
Primary Examiner: Thomas Johannes
Assistant Examiner: Lauren McVey
Application Number: 29/596,960