Gas diffusion plate for a plasma processing apparatus
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The broken lines show the boundary of enlarged portions and form no part of the claimed design.
Claims
The ornamental design for a gas diffusion plate for a plasma processing apparatus, as shown and described.
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Type: Grant
Filed: Feb 27, 2018
Date of Patent: Dec 3, 2019
Assignee: Hitachi High-Technologies Corporation (Tokyo)
Inventors: Kazuumi Tanaka (Tokyo), Kouji Okuda (Tokyo)
Primary Examiner: Susan Bennett Hattan
Assistant Examiner: Omeed Agilee
Application Number: 29/638,441