Gas diffusion plate for a plasma processing apparatus

Skip to: Description  ·  Claims  ·  References Cited  · Patent History  ·  Patent History
Description

FIG. 1 is a front, bottom and right side perspective view of a gas diffusion plate for a plasma processing apparatus according to the design;

FIG. 2 is a front elevational view thereof;

FIG. 3 is a left side elevational view thereof;

FIG. 4 is a right side elevational view thereof;

FIG. 5 is a top plan view thereof;

FIG. 6 is a bottom plan view thereof;

FIG. 7 is a rear elevational view thereof;

FIG. 8 is a cross-sectional view taken along line 8-8 of FIG. 2;

FIG. 9 is an enlarged view of the portion shown in BOX 9 in FIG. 2; and,

FIG. 10 is an enlarged view of the portion shown in BOX 10 in FIG. 8.

The broken lines show the boundary of enlarged portions and form no part of the claimed design.

Claims

The ornamental design for a gas diffusion plate for a plasma processing apparatus, as shown and described.

Referenced Cited
U.S. Patent Documents
D411516 June 29, 1999 Imafuku
D589473 March 31, 2009 Takamoto
D638550 May 24, 2011 Bedingham
D648289 November 8, 2011 Mayer
D667561 September 18, 2012 Bedingham
D672050 December 4, 2012 Lee
D734483 July 14, 2015 Chan
D789888 June 20, 2017 Jang
D793572 August 1, 2017 Kozuka
D794210 August 8, 2017 Jarvius
20120097770 April 26, 2012 Lee
20180247853 August 30, 2018 Furuta
Patent History
Patent number: D868995
Type: Grant
Filed: Feb 27, 2018
Date of Patent: Dec 3, 2019
Assignee: Hitachi High-Technologies Corporation (Tokyo)
Inventors: Kazuumi Tanaka (Tokyo), Kouji Okuda (Tokyo)
Primary Examiner: Susan Bennett Hattan
Assistant Examiner: Omeed Agilee
Application Number: 29/638,441
Classifications