Gas diffusion plate for a plasma processing apparatus
Latest Hitachi High-Technologies Corporation Patents:
The broken lines show the boundary of enlarged portions and form no part of the claimed design.
Claims
The ornamental design for a gas diffusion plate for a plasma processing apparatus, as shown and described.
| D411516 | June 29, 1999 | Imafuku |
| D589473 | March 31, 2009 | Takamoto |
| D638550 | May 24, 2011 | Bedingham |
| D648289 | November 8, 2011 | Mayer |
| D667561 | September 18, 2012 | Bedingham |
| D672050 | December 4, 2012 | Lee |
| D734483 | July 14, 2015 | Chan |
| D789888 | June 20, 2017 | Jang |
| D793572 | August 1, 2017 | Kozuka |
| D794210 | August 8, 2017 | Jarvius |
| 20120097770 | April 26, 2012 | Lee |
| 20180247853 | August 30, 2018 | Furuta |
Type: Grant
Filed: Feb 27, 2018
Date of Patent: Dec 3, 2019
Assignee: Hitachi High-Technologies Corporation (Tokyo)
Inventors: Kazuumi Tanaka (Tokyo), Kouji Okuda (Tokyo)
Primary Examiner: Susan Bennett Hattan
Assistant Examiner: Omeed Agilee
Application Number: 29/638,441