Electrode plate for plasma processing apparatus
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The features shown in broken lines depict environmental subject matter only and form no part of the claimed design.
Claims
The ornamental design for an electrode plate for plasma processing apparatus, as shown and described.
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Type: Grant
Filed: Dec 1, 2015
Date of Patent: Aug 1, 2017
Assignee: TOKYO ELECTRON LIMITED (Tokyo)
Inventors: Shinichi Kozuka (Miyagi), Ryosuke Niitsuma (Miyagi), Manabu Ishikawa (Miyagi)
Primary Examiner: Susan Bennett Hattan
Assistant Examiner: Rebecca Tsehaye
Application Number: 29/547,064