Electrode plate for plasma processing apparatus

- TOKYO ELECTRON LIMITED
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Description

FIG. 1 is a front view of an electrode plate for plasma processing apparatus of the present invention.

FIG. 2 is a rear view thereof.

FIG. 3 is a top plan view thereof.

FIG. 4 is a bottom view thereof.

FIG. 5 is a right side view thereof.

FIG. 6 is a left side view thereof.

FIG. 7 is a perspective view thereof.

FIG. 8 is a sectional view of the electrode plate for plasma processing apparatus taken along section line 8-8 of FIG. 4.

FIG. 9 is an enlarged view of the portion indicated by arrows 9-9 of the electrode plate for plasma processing apparatus of FIG. 8; and,

FIG. 10 is a reference view of the electrode plate for plasma processing apparatus in use, wherein the electrode plate for plasma processing apparatus is used in the bottom part of a shower head, that is arranged to face a susceptor.

The features shown in broken lines depict environmental subject matter only and form no part of the claimed design.

Claims

The ornamental design for an electrode plate for plasma processing apparatus, as shown and described.

Referenced Cited
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Patent History
Patent number: D793572
Type: Grant
Filed: Dec 1, 2015
Date of Patent: Aug 1, 2017
Assignee: TOKYO ELECTRON LIMITED (Tokyo)
Inventors: Shinichi Kozuka (Miyagi), Ryosuke Niitsuma (Miyagi), Manabu Ishikawa (Miyagi)
Primary Examiner: Susan Bennett Hattan
Assistant Examiner: Rebecca Tsehaye
Application Number: 29/547,064