Electroplating flow shaping plate having offset spiral hole pattern
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Claims
We claim the ornamental design for an electroplating flow shaping plate having offset spiral hole pattern, as shown and described.
4304641 | December 8, 1981 | Grandia et al. |
5078852 | January 7, 1992 | Yee et al. |
5660699 | August 26, 1997 | Saito et al. |
5744019 | April 28, 1998 | Ang |
6004440 | December 21, 1999 | Hanson et al. |
6080291 | June 27, 2000 | Woodruff et al. |
6398926 | June 4, 2002 | Mahneke |
6497801 | December 24, 2002 | Woodruff et al. |
6521102 | February 18, 2003 | Dordi |
6632335 | October 14, 2003 | Dordi et al. |
6921468 | July 26, 2005 | Graham et al. |
D544452 | June 12, 2007 | Nakamura et al. |
D548705 | August 14, 2007 | Hayashi |
D552565 | October 9, 2007 | Nakamura et al. |
D553104 | October 16, 2007 | Oohashi et al. |
D587222 | February 24, 2009 | Sasaki et al. |
7641776 | January 5, 2010 | Nagar et al. |
D609652 | February 9, 2010 | Nagasaka et al. |
D609655 | February 9, 2010 | Sugimoto |
7670465 | March 2, 2010 | Yang et al. |
D614593 | April 27, 2010 | Lee et al. |
7935240 | May 3, 2011 | Singh et al. |
20070068819 | March 29, 2007 | Singh et al. |
20110031112 | February 10, 2011 | Birang et al. |
- U.S. Appl. No. 61/405,608, “Flow diverters and flow shaping plates for electroplating cells”, Mayer et al., filed Oct. 21, 2010.
Type: Grant
Filed: Oct 21, 2010
Date of Patent: Nov 8, 2011
Assignee: Novellus Systems, Inc. (San Jose, CA)
Inventors: Steven T. Mayer (Lake Oswego, OR), David Porter (Sherwood, OR), Robert Rash (Portland, OR)
Primary Examiner: Selina Sikder
Attorney: Weaver Austin Villeneuve & Sampson LLP
Application Number: 29/377,521