Gas inlet attachment for wafer processing apparatus

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Description

FIG. 1 is a front, top and right side perspective view of a gas inlet attachment for wafer processing apparatus showing our new design;

FIG. 2 is a front elevational view thereof;

FIG. 3 is a left side elevational view thereof;

FIG. 4 is a right side elevational view thereof;

FIG. 5 is a rear elevational view thereof;

FIG. 6 is a top plan view thereof;

FIG. 7 is a bottom plan view thereof; and,

FIG. 8 is a cross sectional view taken along line 8-8 in FIG. 4.

Claims

The ornamental design for a gas inlet attachment for wafer processing apparatus, as shown and described.

Referenced Cited
U.S. Patent Documents
3484122 December 1969 Sanders
D326272 May 19, 1992 Nakao
D720051 December 23, 2014 Dole
D818509 May 22, 2018 Miyazaki
D827150 August 28, 2018 Nakagawa
D872843 January 14, 2020 Stoffa, Sr.
D873392 January 21, 2020 Hruschak
D890572 July 21, 2020 Saiki
D901564 November 10, 2020 Murata et al.
D924953 July 13, 2021 Shimada
D944661 March 1, 2022 Sambu
20130220221 August 29, 2013 Sanchez
20170051408 February 23, 2017 Takagi
20170241015 August 24, 2017 Sim
Foreign Patent Documents
1648531 February 2019 JP
1624352 December 2019 JP
Patent History
Patent number: D964443
Type: Grant
Filed: Feb 17, 2021
Date of Patent: Sep 20, 2022
Assignee: KOKUSAI ELECTRIC CORPORATION (Tokyo)
Inventor: Satoru Murata (Toyama)
Primary Examiner: Patricia A Palasik
Application Number: 29/770,855