Gas inlet attachment for wafer processing apparatus
Description
Claims
The ornamental design for a gas inlet attachment for wafer processing apparatus, as shown and described.
Referenced Cited
U.S. Patent Documents
Foreign Patent Documents
3484122 | December 1969 | Sanders |
D326272 | May 19, 1992 | Nakao |
D720051 | December 23, 2014 | Dole |
D818509 | May 22, 2018 | Miyazaki |
D827150 | August 28, 2018 | Nakagawa |
D872843 | January 14, 2020 | Stoffa, Sr. |
D873392 | January 21, 2020 | Hruschak |
D890572 | July 21, 2020 | Saiki |
D901564 | November 10, 2020 | Murata et al. |
D924953 | July 13, 2021 | Shimada |
D944661 | March 1, 2022 | Sambu |
20130220221 | August 29, 2013 | Sanchez |
20170051408 | February 23, 2017 | Takagi |
20170241015 | August 24, 2017 | Sim |
1648531 | February 2019 | JP |
1624352 | December 2019 | JP |
Patent History
Patent number: D964443
Type: Grant
Filed: Feb 17, 2021
Date of Patent: Sep 20, 2022
Assignee: KOKUSAI ELECTRIC CORPORATION (Tokyo)
Inventor: Satoru Murata (Toyama)
Primary Examiner: Patricia A Palasik
Application Number: 29/770,855
Type: Grant
Filed: Feb 17, 2021
Date of Patent: Sep 20, 2022
Assignee: KOKUSAI ELECTRIC CORPORATION (Tokyo)
Inventor: Satoru Murata (Toyama)
Primary Examiner: Patricia A Palasik
Application Number: 29/770,855
Classifications
Current U.S. Class:
Scientific, Laboratory, Or Industrial Heating Equipment (D15/144.1)