Abstract: An electronic device can include a first radiation region, a second radiation region spaced apart from the first radiation region, and an insulating region. The insulating region can have a first side and a second side opposite the first side. The first radiation region can lie immediately adjacent to the first side, and the second radiation region can lie immediately adjacent to the second side. Within the insulating region, no other radiation region may lie between the first and second radiation regions, and the insulating region can include an insulating layer that includes a plurality of openings. In another aspect, a process for forming the electronic device can include patterning an insulating layer.

Abstract: An island-like interlayer insulating film is formed selectively in a region where a source interconnection and a gate interconnection intersect.

Abstract: A method for making a semiconductor device includes patterning a semiconductor layer, overlying an insulator layer, to create a first active region and a second active region, wherein the first active region is of a different height from the second active region, and wherein at least a portion of the first active region has a first conductivity type and at least a portion of the second active region has a second conductivity type different from the first conductivity type in at least a channel region of the semiconductor device. The method further includes forming a gate structure over at least a portion of the first active region and the second active region. The method further includes removing a portion of the second active region on one side of the semiconductor device.

Abstract: A semiconductor device may include a substrate and an insulating layer formed on the substrate. A multi-layer fin may be formed on the insulating layer and may include two semiconducting layers isolated by an insulating layer in vertical direction. A first MOS type device comprising a first source region, a first channel region and a first drain region is arranged on the first semiconducting layer in the multi-layer fin. A second MOS type device comprising a second source region, a second channel region and a second drain region is arranged on the second semiconducting layer in the multi-layer fin. A gate electrode is provided so as to be vertically adjacent to the first and second channel regions.

Abstract: The junction breakdown voltage of an ESD protection device is adjusted by altering the distance between two diffusion regions of opposite conductivity types.

Abstract: A transistor includes a gate electrode on a substrate, source/drain regions in the substrate at both sides of the gate electrode, and a channel region defined between the source/drain regions, wherein the channel region includes a recessed region and at least one of the source/drain regions is spaced away from the recessed region of the channel region.

Abstract: In a semiconductor device including a semiconductor substrate, a gate insulating layer formed on the semiconductor substrate, a gate electrode layer formed on the gate insulating layer, a source region and a drain region formed within the semiconductor substrate adjacent to the gate electrode layer, and sidewall insulating layers formed on sidewalls of the gate electrode layer and the gate insulating layer, air gaps are formed between one of the sidewall insulating layers and the source region and between another of the sidewall insulating layers and the drain region. Semiconductor layers are formed on the source region and the drain region outside of said air gaps, and upper surfaces of the semiconductor layers are higher than upper surfaces of the air gaps. Silicide layers are formed on the semiconductor layers.

Abstract: A PMOS device less affected by negative bias time instability (NBTI) and a method for forming the same are provided. The PMOS device includes a barrier layer over at least a portion of a gate structure, a gate spacer, and source/drain regions of a PMOS device. A stressed layer is then formed over the barrier layer. The barrier layer is preferably an oxide layer and is preferably not formed for NMOS devices.

Abstract: Provided is a band gap constant-voltage circuit which is configured by combining a PMOS transistor, an NMOS transistor, a bipolar transistor, and a resistor, and is capable of preventing an output voltage from being stabilized at 0 V immediately after power supply fluctuation. According to the band gap constant-voltage circuit of the present invention, the back-gates of two p-type transistors (P112 and P113) constituting a differential amplifier are each connected to a node 11 which is a power source terminal on the positive side of the differential amplifier, and a level shifter circuit is connected to the gate of each of the transistors (P112 and P113).

Abstract: A semiconductor device includes a first semiconductor layer, a first interlayer insulation layer, a second semiconductor layer, and a gate pattern. The first interlayer insulation layer covers the first semiconductor layer. The second semiconductor layer is formed on the first interlayer insulation layer and includes source regions, drain regions, and a channel region interposed between the source region and the drain region. The gate pattern includes a gate insulation layer on the channel region of the second semiconductor layer. At least one of the source regions and the drain regions includes an elevated layer having a top surface higher than that of the channel region.

Abstract: The semiconductor device of present invention is provided with an impurity diffusion region formed in the surface part of a semiconductor layer and a metal silicide layer formed in the surface part of the impurity diffusion region. An interlayer insulating film is formed on the metal silicide layer, and a contact plug that passes through the interlayer insulating film and is electrically connected with the metal silicide layer is formed. The contact plug passing through the interlayer insulating film is formed in a region where the metal silicide layer has a sufficient film thickness, and a recess is formed in the metal silicide layer at the contact hole bottom. Moreover, the contact plug has a projection fitting to the recess of the metal silicide layer in a part of a contact surface with the metal silicide layer.

Abstract: A metal oxide semiconductor (MOS) transistor is disclosed. The MOS transistor includes: a semiconductor substrate; a gate disposed on the semiconductor substrate, wherein the gate comprises two sidewalls; a spacer formed on the sidewalls of the gate; a source/drain region disposed in the semiconductor substrate; a silicide layer disposed on top of the gate and the surface of the source/drain region; and a retarded interface layer disposed in the junction between the silicide layer and the gate and source/drain region.

Abstract: A field-effect transistor includes source, drain, and gate electrodes; a crystalline or polycrystalline layer of inorganic semiconductor; and a dielectric layer. The layer of inorganic semiconductor has an active channel portion physically extending from the source electrode to the drain electrode. The inorganic semiconductor has a stack of 2-dimensional layers in which intra-layer bonding forces are covalent and/or ionic. Adjacent ones of the layers are bonded together by forces substantially weaker than covalent and ionic bonding forces. The dielectric layer is interposed between the gate electrode and the layer of inorganic semiconductor material. The gate electrode is configured to control a conductivity of an active channel part of the layer of inorganic semiconductor.

Abstract: Provided is a semiconductor device including a thin film transistor with at least one protruding impurity region and a method for manufacturing the same. The semiconductor device includes bulk transistors formed on a semiconductor substrate and an interlayer insulation layer covering the bulk transistor. At least one thin film transistor is formed on the interlayer insulation layer including impurity regions adjacent thereto. At least one impurity region of the thin film transistor protrudes higher than the other impurity region.

Abstract: A semiconductor device such as a Static Random Access Memory (SRAM) cell includes an access transistor. A drain of the access transistor includes a first N-type impurity and a second N-type impurity. The diffusion coefficient of the first N-type impurity is smaller than the diffusion coefficient of the second N-type impurity. By providing a drain as described above, hot carrier effects within the access transistor may be minimized.

Abstract: Semiconductor devices having a gate-all-around (GAA) structure capable of higher operating performance may be provided. A semiconductor device may include a semiconductor substrate, at least one gate electrode, and at least one gate insulating layer. The semiconductor substrate may have a body, at least one supporting post protruding from the body, and at least one pair of fins separated from the body, wherein both ends of each fin of the at least one pair of fins are connected to and supported by the at least one supporting post. The at least one gate electrode may enclose a portion of at least one fin of the at least one pair of fins of the semiconductor substrate, and may be insulated from the semiconductor substrate. The at least one gate insulating layer may be interposed between the at least one gate electrode and the at least one pair of fins of the semiconductor substrate.

Abstract: A semiconductor device 1 includes: a base 2 mainly formed of a semiconductor material; a gate electrode 5; and a gate insulating film 3 provided between the base 2 and the gate electrode 5. The gate insulating film 3 is formed of an insulative inorganic material containing silicon, oxygen and element X other than silicon and oxygen as a main material. The gate insulating film 3 is provided in contact with the base 2, and contains hydrogen atoms. The gate insulating film 3 has a region where A and B satisfy the relation: B/A is 10 or less in the case where the total concentration of the element X in the region is defined as A and the total concentration of hydrogen in the region is defined as B. Further, the region is at least a part of the gate insulating film 3 in the thickness direction thereof.

Abstract: Compositions, methods of using inorganic moieties for dielectric modulation, and related device structures.

Abstract: There are many inventions described and illustrated herein. In one aspect, the present inventions relate to devices, systems and/or methods of encapsulating and fabricating electromechanical structures or elements, for example, accelerometer, gyroscope or other transducer (for example, pressure sensor, strain sensor, tactile sensor, magnetic sensor and/or temperature sensor), filter or resonator. The fabricating or manufacturing microelectromechanical systems of the present invention, and the systems manufactured thereby, employ wafer bonding encapsulation techniques.

Abstract: A micro-electro-mechanical system (MEMS) current sensor for sensing a magnetic field produced by an electrical current flowing in a conductor includes a first fixed element and a moving element. The moving element is spaced away from the first fixed element and is movable relative to the fixed element responsive to a magnetic field produced by an electrical current flowing in a conductor for providing a mechanical indication of a strength of the magnetic field. The sensor also includes a tunneling current generator for generating a tunneling current between the first fixed element and the moving element and a tunneling current monitor for monitoring a change in the tunneling current responsive to the mechanical indication to provide an indication of a value of the electrical current in the conductor.

Abstract: A magnetic memory includes a magnetic tunneling junction element having a reference layer, a tunnel barrier layer and a recording layer laminated in order, information being written to the recording layer in accordance with spin injection magnetization reversal caused by a current, information written to the recording layer being read out using a current. The magnetic tunneling junction element is disposed on a plug connected to a selection transistor, and a sidewall insulating film covering a side portion of the recording layer of the magnetic tunneling junction element is formed.

Abstract: In a chip element having a substrate, an impedance element formed on the substrate, and a plurality of electrodes formed on the substrate to be connected to the impedance element, the substrate is formed of a low-permittivity material having a permittivity low enough to decrease the parasitic capacitance in a GHz range. The substrate further includes at least a synthetic resin and an inorganic compound.

Abstract: A method of fabricating a semiconductor device comprises the steps of forming an isolation trench in a semiconductor substrate, depositing a silicon oxide film on the semiconductor substrate by a high-density plasma CVD process such that the silicon oxide film fills the isolation trench and such that the silicon oxide film contains water with such an amount that there is caused a shrinkage in the silicon oxide film when a dehydration process is applied to the silicon oxide film, causing a shrinkage in the silicon oxide film by dehydrating the silicon oxide film, and removing the silicon oxide film deposited on the silicon substrate by a chemical mechanical polishing process.

Abstract: A semiconductor device may include a fuse pattern and an interconnection pattern formed on a surface of a semiconductor substrate. An interlayer dielectric layer may be disposed on the surface of the semiconductor substrate including the fuse pattern and the interconnection pattern. A bonding pad may be formed over the interconnection pattern and connected to the interconnection pattern through the interlayer dielectric layer. A visible indicator may be formed in the interlayer dielectric layer near the bonding pad. The visible indicator may indicate a bonding region and a probing region of the bonding pad.

Abstract: Provided are a semiconductor device which substantially prevents repair failure and a method of manufacturing the same. The semiconductor device includes a plurality of first fuses formed apart from each other on a semiconductor substrate, and on which a protective layer is formed; a first insulating layer filled in between the first fuses and configured to expose the protective layer; a plurality of second fuses formed between the first fuses and on the first insulating layer; and a second insulating layer formed on the first insulating layer, wherein the second insulating layer includes a fuse window configured to fully expose the second fuses and the protective layer formed on the first fuses.

Abstract: A semiconductor memory device having an improved fuse structure may include an interlayer insulating film on a semiconductor substrate, an opening in the interlayer insulating film, a vertical fuse that may conform to the opening, a fuse insulating film on the vertical fuse that may fill the opening, and metal wiring lines that may be electrically connected to the vertical fuse.

Abstract: A system and method for forming post passivation inductors, and related structures, is described. High quality electrical components, such as inductors and transformers, are formed on a layer of passivation, or on a thick layer of polymer over a passivation layer.

Abstract: A semiconductor device including inductors with improved reliability and a method of manufacturing the same are provided. The semiconductor device may include a substrate, an insulating film pattern formed on the substrate and having an opening, an amorphous metal nitride film formed inside the opening, a diffusion reducing or preventing film formed on the amorphous metal nitride film, and a conductive film including the diffusion reducing or preventing film filling the inside of the opening.

Abstract: Disclosed are integrated circuit structures each having a silicon germanium film incorporated as a local interconnect and/or an electrical contact. These integrated circuit structures provide improved local interconnects between devices and/or increased capacitance to devices without significantly increasing structure surface area or power requirements. Specifically, disclosed are integrated circuit structures that incorporate a silicon germanium film as one or more of the following features: as a local interconnect between devices; as an electrical contact to a device (e.g., a deep trench capacitor, a source/drain region of a transistor, etc.); as both an electrical contact to a deep trench capacitor and a local interconnect between the deep trench capacitor and another device; and as both an electrical contact to a deep trench capacitor and as a local interconnect between the deep trench capacitor and other devices.

Abstract: A capacitor structure including a plurality of conductive layers, a dielectric layer and a plurality of contacts is disclosed. The conductive layers are stacked, and each conductive layer has a first conductive pattern and a second conductive pattern. The dielectric layer is disposed between the first conductive pattern and the second conductive pattern and between two adjacent conductive layers. The contacts are disposed in the dielectric layer, and electrically connected to the first conductive patterns in two adjacent conductive layers and electrically connected to the second conductive patterns in two adjacent conductive layers. Wherein, the contact electrically connecting to the first conductive patterns in two adjacent conducive layers is a first strip contact, which extends between the first conductive patterns in two adjacent conductive layers, and the boundary of the first strip contact is located within the boundary of the first conductive pattern.

Abstract: Resistors that avoid the problems of miniaturization of semiconductor devices and a related method are disclosed. In one embodiment, a resistor includes a planar resistor material that extends vertically within at least one metal layer of a semiconductor device. In another embodiment, a resistor includes a resistor material layer extending between a first bond pad and a second bond pad of a semiconductor device. The two embodiments can be used alone or together. A related method for generating the resistors is also disclosed.

Abstract: A trench-gate transistor (1) has an integral first layer of silicon dioxide (31) which extends from the upper surface (10a) of the semiconductor body (10) over top corners of each cell array trench (20), the integral first layer also providing a thin gate dielectric insulating layer (31A) for a thick gate electrode (41) and the integral first layer also providing a first part (31B) of a stack of materials which constitute a thick trench sidewall insulating layer (31B,32,33) for a thin field plate (42), a layer of silicon nitride (32) providing a second part of the stack and a second layer of silicon dioxide (33) providing a third part of the stack. The integrity of the first silicon dioxide layer (31) over the trench (20) top corners helps to avoid gate (41)—source (24) short circuits. In a method of manufacture (FIGS.

Abstract: The present invention provides a technology that makes it possible to enhance the gain and the efficiency of an RF bipolar transistor. Device isolation is given between a p+ type isolation region and an n+ type collector embedded region and between a p+ type isolation region and an n type collector region (an n+ type collector extraction region) with an isolation section that surrounds the collector extraction region in a plan view and is formed by embedding a dielectric film in a groove penetrating an isolation section, a collector region, and a collector embedded region and reaching a substrate. Further, a current route is formed between an emitter wiring (a wiring) and the substrate with an electrically conductive layer formed by embedding the electrically conductive layer in a groove penetrating a dielectric film, silicon oxide films, a semiconductor region, and the isolation regions and reaching the substrate, and thereby the impedance between the emitter wiring and the substrate is reduced.

Abstract: Methods of forming areas of alternative material on crystalline semiconductor substrates, and structures formed thereby. Such areas of alternative material are suitable for use as active areas in MOSFETs or other electronic or opto-electronic devices.

Abstract: A total ionizing dose suppression architecture for a transistor and a transistor circuit uses an “end cap” metal structure that is connected to the lowest potential voltage to overcome the tendency of negative charge buildup during exposure to ionizing radiation. The suppression architecture uses the field established by coupling the metal structure to the lowest potential voltage to steer the charge away from the critical field (inter-device) and keeps non-local charge from migrating to the “birds-beak” region of the transistor, preventing further charge buildup. The “end cap” structure seals off the “birds-beak” region and isolates the critical area. The critical area charge is source starved of an outside charge. Outside charge migrating close to the induced field is repelled away from the critical region. The architecture is further extended to suppress leakage current between adjacent wells biased to differential potentials.

Abstract: One aspect of the invention relates to a semiconductor component with cavity structure and a method for producing the same. The semiconductor component has an active semiconductor chip with the microelectromechanical structure and a wiring structure on its top side. The microelectromechanical structure is surrounded by walls of at least one cavity. A covering, which covers the cavity, is arranged on the walls. The walls have a photolithographically patterned polymer. The covering has a layer with a polymer of identical type. In one case, the molecular chains of the polymer of the walls are crosslinked with the molecular chains of the polymer layer of the covering layer to form a dimensionally stable cavity housing.

Abstract: The present invention relates to a semiconductor substrate comprising at least first and second device regions, wherein the first device region comprises a first recess having interior surfaces oriented along a first set of equivalent crystal planes, and wherein the second device region comprises a second recess having interior surfaces oriented along a second, different set of equivalent crystal planes. A semiconductor device structure can be formed using such a semiconductor substrate. Specifically, at least one n-channel field effect transistor (n-FET) can be formed at the first device region, which comprises a channel that extends along the interior surfaces of the first recess. At least one p-channel field effect transistor (p-FET) can be formed at the second device region, which comprises a channel that extends along the interior surfaces of the second recess.

Abstract: An edge seal structure and fabrication method are described. The edge seal structure includes a high impedance substrate containing a base material and a grounded floating edge seal that is on the substrate but is isolated from the base material. The edge seal contacts a first doped well in the substrate that has the same conductivity type as and is more heavily doped than the base material. The first doped well is in a second doped well that has a different conductivity type than the first doped well. The first and second doped wells and the base material form back-to-back series connected diodes. The wells are effectively connected to power and ground such that the diodes are reverse-biased. The edge seal is formed by a stack of conductive layers, at least some of which are surrounded by a stack of insulating layers.

Abstract: An integrated circuit package system including forming a leadframe having a lead with a leadfinger support of a predetermined height, and attaching an integrated circuit die with an electrical interconnect at a predetermined collapse height determined by the predetermined height of the leadfinger support.

Abstract: A method of manufacturing a semiconductor device 28 in which a plating mask 38, 39 having a noble metal plating layer 35 as an uppermost layer is formed at a predetermined portion on an obverse surface side or a reverse surface side of a leadframe material 10, and the leadframe material 10 is consecutively subjected to etching by using the plating mask 38, 39 as a resist mask, so as to form external connection terminal portions 22 which electrically communicate with a semiconductor element 18 disposed in an interior of an encapsulating resin 21, and which project downwardly. Base metal plating or noble metal plating 33 exhibiting etching solution resistance is provided as a lowermost layer of the plating mask 38, 39.

Abstract: A semiconductor package has a structure in which a leadframe pad to which a semiconductor die is attached and inner leads electrically connected to the leadframe pad are covered by a molded housing, and outer leads extending from the inner leads protrude from a side surface of the molded housing to the outside. The outer leads include a first outer lead disposed in a central portion of the molded housing, second and third outer leads respectively disposed in a right and left of the first outer lead. The second and third outer leads each have bent portions in portions where they are adjacent to the side surface of the molded housing, the bent portions protruding to increase a space between the first outer lead and the bent portions in the molded housing. At least one of the bent portions of the second and third outer leads is covered by an extended portion of the molded housing.

Abstract: In a lead frame, through holes are formed outside suspending leads and trenches are formed on a back surface along the suspending leads so as to communicate with the through holes. When sealing resin is injected into cavities of a resin molding die, air enters the through holes through air vents and flows out from the through holes by a resin injection pressure in the trenches, making it easier for the sealing resin to enter the through holes. Since the sealing resin leaking to the air vents can be injected into the through holes, it is possible to enhance the bonding force between the sealing resin after curing and the lead frame in the vicinity of the air vents and effect release of the resin molding die, while allowing the sealing resin leaking to the air vents to remain on the lead frame side without remaining within the air vents.

Abstract: A substrate for device bonding is provided, which enables bonding of a device with high bond strength to an Au electrode formed on a substrate such as aluminum nitride by soldering the device at a low temperature using a soft solder metal having a low melting point such as an Au—Sn-based solder having an Au content of 10% by weight. The substrate for device bonding comprises a substrate having an Au electrode layer formed on its surface and in which (i) a layer composed of a platinum group element, (ii) a layer composed of at least one transition metal element selected from the group consisting of Ti, V, Cr and Co, (iii) a barrier metal layer composed of at least one metal selected from the group consisting of Ag, Cu and Ni and (iv) a solder layer composed of a solder containing Sn or In as a main component are laminated in this order on the Au electrode layer.

Abstract: In a circuit, an integrated circuit package and methods for attaching integrated circuit dies or discrete power components to flanges of integrated circuit packages, each of the integrated circuit dies is sawed from a wafer. The thickness of the wafer is reduced by mechanical grinding, applying an isotropic wet chemical etching to the wafer to eliminate crystal defects, evaporating adhesion and diffusion barrier metals on the backside of the wafer, evaporating Au and Sn on the backside of the wafer, wherein the weight proportion of Au is equal to or larger than 85%, sawing the wafer into the circuit dies, and soldering each of the circuit dies to a respective flange of an integrated circuit package.

Abstract: A PCB having an embedded bare chip and a manufacturing method thereof are disclosed. A method of manufacturing a PCB may include embedding a bare chip in a board such that electrode pads of the bare chip are exposed, and forming electrode bumps on the electrode pads. In this way, the mass production system of a bare chip embedded PCB can be made to have a simplified process and low cost.

Abstract: Stacked microelectronic devices and methods for manufacturing such devices are disclosed herein. In one embodiment, a stacked microelectronic device assembly can include a first known good packaged microelectronic device including a first interposer substrate. A first die and a first through-casing interconnects are electrically coupled to the first interposer substrate. A first casing at least partially encapsulates the first device such that a portion of each first interconnect is accessible at a top portion of the first casing. A second known good packaged microelectronic device is coupled to the first device in a stacked configuration. The second device can include a second interposer substrate having a plurality of second interposer pads and a second die electrically coupled to the second interposer substrate. The exposed portions of the first interconnects are electrically coupled to corresponding second interposer pads.

Abstract: A stacked semiconductor structure and fabrication method thereof are provided. The method includes mounting and connecting electrically a semiconductor chip to a first substrate, mounting on the first substrate a plurality of supporting members corresponding in position to a periphery of the semiconductor chip, mounting a second substrate having a first surface partially covered with a tape and a second surface opposite to the first surface on the supporting members via the second surface, connecting electrically the first and second substrates by bonding wires, forming on the first substrate an encapsulant for encapsulating the semiconductor chip, the supporting members, the second substrate, the bonding wires, and the tape with an exposed top surface, and removing the tape to expose the first surface of the second substrate and allow an electronic component to be mounted thereon. The present invention prevents reflow-induced contamination, spares a special mold, and eliminates flash.

Abstract: A stacked semiconductor device includes an interposer substrate having external power supply terminals, and semiconductor chips stacked on the interposer substrate. A power supply wiring arranged in the semiconductor chip located in the bottom layer is connected to the external power supply terminal via a bump electrode, the power supply wiring arranged in the semiconductor chip located in the top layer is connected to the external power supply terminal via a bonding wire, and the power supply wirings each arranged in adjacent semiconductor chips are mutually connected via the through electrode. Such a loop structure can solve a problem such that the higher the semiconductor chip, the larger its voltage drop.

Abstract: Microelectronic devices and methods for manufacturing microelectronic devices are disclosed herein. In one embodiment, a microelectronic device includes a microelectronic die, a plurality of electrical couplers projecting from the die, and a flowable material disposed on the die. The die includes an integrated circuit and a plurality of terminals operably coupled to the integrated circuit. The electrical couplers are attached to corresponding terminals on the die. The flowable material includes a plurality of spacer elements sized to space the die apart from another component. The flowable material may be a no-flow underfill, a flux compound, or other suitable material.

Abstract: A printed circuit board (PCB) may include a substrate. A copper layer may be formed over a portion of the substrate, the copper layer including at least one of a metallic powder and a ceramic powder.