Abstract: A terminal bushing sealing element is adapted to be fitted between a terminal bushing and a barrier element. The sealing element is elastic, has an annular shape, and includes a wall with an inner surface and an outer surface. A first opening is provided at a first end of the sealing element and a second opening is provided at a second end of the sealing element, which is opposite to the first end and the wall extends between the first end and the second end. The wall includes a first wall portion that is inclined such that a diameter of the sealing element increases from the first end in the direction towards the second end. The sealing element provides for improved sound attenuation while maintaining a long creepage distance and may be used in sound attenuation casings that are included in power capacitor arrangements.

Abstract: Provided is a capacitor, which includes a first electrode including aluminum, a second electrode facing the first electrode, and a first dielectric layer interposed between the first electrode and the second electrode, including aluminum oxide, and having multiple pores defined in a surface of the first dielectric layer in contact with the second electrode.

Abstract: A multilayer ceramic capacitor includes a ceramic body which is unlikely to be cracked. A dimension in a length direction L is referred to as L0. A distance in the length direction L is referred to as L1 between an end in the length direction L of a portion of a first external electrode located on a first principal surface and an end of a second internal electrode closer to the first end surface. The ratio L1/L0 is about 0.05 to about 0.35.

Abstract: A multilayer ceramic capacitor provided in a multilayer printed wiring board includes a ceramic body with a plurality of ceramic layers and internal electrodes stacked, and an external electrode including a base layer that includes a sintered metal containing a metal and glass and a plated layer provided on the surface of the base layer, which is provided on an end surface of the ceramic body to be connected to the internal electrodes. The external electrode includes a principal surface portion disposed on a principal surface of the ceramic body. The outermost layer of the plated layer includes a Cu plated layer. The ratio of arithmetic mean roughness (Ra) at the surface of the ceramic body/arithmetic mean roughness (Ra) at the surface of the external electrode satisfies a condition: about 0.06 the arithmetic mean roughness (Ra) at the surface of the ceramic body/the arithmetic mean roughness (Ra) at the surface of the external electrode about 0.97.

Abstract: An electronic component includes an electronic element including two outer electrodes on surfaces thereof and a board terminal including a board main body and two mounting electrodes. The board main body has electrical insulating properties and a first principal surface. The two mounting electrodes are disposed on the first principal surface and electrically coupled to the two outer electrodes, respectively. The electronic element is mounted on the first principal surface side. The two outer electrodes are partially disposed outside an outer edge of the board terminal when viewed from the first principal surface side. The height from an end of each of the two outer electrodes opposite the board terminal to an end of the board terminal opposite the electronic element is not greater than a larger dimension of the width of the electronic element and the width of the board terminal.

Abstract: A multilayer ceramic capacitor includes an external electrode that is unlikely to be peeled. First and second external electrodes each include base layers provided over a ceramic body and including a metal and glass, and Cu plated layers provided over the base layers. The multilayer ceramic capacitor includes a reactive layer. The reactive layer contains about 5 atomic % to about 15 atomic % of Ti, about 5 atomic % to about 15 atomic % of Si, and about 2 atomic % to about 10 atomic % of V.

Abstract: A multilayer ceramic capacitor (MLCC) includes: first and second metal frames formed on a mounting surface of a ceramic body to be connected to first and second external electrodes providing voltages having opposing polarities, respectively, wherein the first and second metal frames are positioned inwardly of both end surfaces of the ceramic body in a length direction of the ceramic body to be spaced apart from both end surfaces of the ceramic body, respectively.

Abstract: In a multilayer ceramic capacitor in which an outer electrode is arranged on a ceramic element body to be electrically connected to an inner electrode, the outer electrode includes a metal electrode layer on the ceramic element body, and a conductive resin layer on the metal electrode layer. When a dielectric layer between a pair of the inner electrodes adjacent in a stacking direction among a plurality of the inner electrodes extending to one of a pair of end surfaces of the ceramic element body is an inter-electrode dielectric layer, a gap extends a direction connecting the adjacent inner electrodes sandwiching the inter-electrode dielectric layer at a position near or adjacent to at least the one of the end surfaces.

Abstract: A ceramic electronic component includes an electronic component ceramic main body and internal electrodes disposed within the electronic component main body. The internal electrodes include through holes passing through the internal electrodes in the thickness direction. Ceramic columns are disposed in the through holes and connect the ceramic on one side of the internal electrodes and the ceramic on the other side thereof. An area ratio of the ceramic columns to ends of the internal electrodes located within the electronic component main body is greater than an area ratio of ceramic columns to central portions of the internal electrodes.

Abstract: A multilayer ceramic capacitor unlikely to be cracked from ridges of a ceramic body into the ceramic body is configured such that “a” is a distance in a height direction between an effective portion and a first principal surface; “b” is a distance in a length direction between a first end surface and the effective portion in the length direction; “c” is a thickness of the thickest portion of a first base layer provided over the first principal surface; “d” is a distance in the length direction between the thickest portion of the first base layer provided over the first end surface and a portion of the first base layer located over the first principal surface and closest to a second end surface; and “e” is a maximum thickness of a portion of the first base layer provided over the first end surface; and f: the height of the ceramic body, and a condition of 2?(c·d+e·f/2)/(a·b)?6 is satisfied.

Abstract: A vacuum variable vapacitor includes a pre-vacuum enclosure for reducing a pressure differential across the bellows, wherein a drive is disposed outside the enclosures of the vacuum variable capacitor. The vacuum force load on the drive system can thereby be reduced, allowing faster movement of the movable electrode, faster capacitance adjustment of the vacuum variable capacitor and longer lifetimes of the device.

Abstract: A solid electrolytic capacitor that includes an anode body, a dielectric overlying the anode body, a solid electrolyte that contains one or more conductive polymers and overlies the dielectric, and an external coating that overlies the solid electrolyte, is provided. The external coating includes at least one carbonaceous layer and at least one metal layer. In addition to the aforementioned layers, the external coating can also include at least one conductive polymer layer that can be disposed between the carbonaceous and metal layers. Among other things, such a conductive polymer layer can reduce the likelihood that the carbonaceous layer will delaminate from the solid electrolyte during use. Further, the notched geometry of the anode body itself is selected to minimize the risk of delamination of the external coating layers from the anode body. This combination of characteristics can increase the mechanical robustness of the part and improve its electrical performance.

Abstract: A solid electrolytic capacitor includes: a capacitor element including a sintered compact of a valve action metal, a dielectric layer, an electrolyte layer, and a cathode layer sequentially formed over a surface of the sintered compact, and an anode wire drawn out of the sintered compact; an anode terminal; a cathode terminal; and an exterior resin. The anode terminal includes a mounting portion and an upright portion. The upright portion has a trapezoidal shape. A length of a welding surface corresponding to an edge of the upright portion on the anode wire side is set to be longer than a length of the upright portion on the mounting portion side and to be longer than a width of the anode wire.

Abstract: A photocatalyst material and a photocatalyst device capable of generating hydrogen from water by radiation of sunlight at high efficiency. The photocatalyst material according to the present invention includes a nitride-based compound semiconductor obtained by replacement of part of Ga and/or Al by a 3d-transition metal. The nitride-based compound semiconductor has one or more impurity bands. A light absorption coefficient of the nitride-based compound semiconductor is 1,000 cm?1 or more in an entire wavelength region of 1,500 nm or less and 300 nm or more. Further, the photocatalyst material satisfies the following conditions: the energy level of the bottom of the conduction band is more negative than the redox potential of H+/H2; the energy level of the top of the valence band is more positive than the redox potential of O2/H2O; and there is no or little degradation of a material even when the material is irradiated with light underwater.

Abstract: Disclosed herein is a high-capacity slurry electrode for use in a flow energy storage system, comprising: an electrolyte; electrode active particles, distributed in the electrolyte, functioning as an electrode active material in an electrochemical flow capacitor storage system; and a redox active material, dissolved in the electrolyte, behaving as a pseudo-capacitor through a redox reaction on a surface of the electrode active material, wherein the high-capacity slurry electrode exhibits both capacitor properties based on the electrode active particles and pseudo-capacitor properties based on the redox active material.

Abstract: An aspect of a capacitor comprises an exterior package case housing an electrolyte along with a capacitor element, a sealing plate where an external terminal is disposed, the sealing plate sealing the exterior package case, a current collecting plate disposed between an electrode protruding portion formed on an element end surface of the capacitor element and the external terminal, a gas releasing mechanism disposed in the sealing plate to release a gas in the exterior package case, and a blocking mechanism disposed on at least one of the sealing plate and the current collecting plate to block the electrolyte from the gas releasing mechanism.

Abstract: A lighted circuit breaker status indication device includes a light guide made of one of transparent and translucent material. At least one light source is configured to illuminate the light guide. The light source is coupled to a circuit breaker by at least one electrical contact. A status circuit path of the light circuit breaker status indication device is coupled to the circuit breaker and configured to provide power to the light source when the circuit breaker is both energized and open, and not to provide power to the light source when the circuit breaker is one of not energized and closed.

Abstract: A light-emitting assembly positioned within a switch housing of a keyboard assembly for an electronic device is disclosed. The light-emitting assembly may include a phosphor structure, a transparent material positioned on opposing side surfaces of the phosphor structure, and an epoxy layer formed over an entire back surface of the phosphor structure and the transparent material. The light-emitting assembly may also include a mask layer formed over an entire top surface of: the phosphor structure, the transparent material, and the epoxy layer. The light-emitting assembly may further include a light source positioned within the phosphor structure for emitting a light.

Abstract: A switch device including a case having a through hole, a cylindrical member including a first cylindrical section having a small diameter arranged in the through hole of the case and a second cylindrical section having a large diameter arranged on an outer portion of the case, an operation member including a shaft section slidably inserted into the first cylindrical section and a head section slidably arranged in the second cylindrical section, a waterproof member provided between an inner peripheral surface of the second cylindrical section and an outer peripheral surface of the head section, and a vent passage that allows air inside the second cylindrical section and air outside the case to pass through a vent hole provided in the cylindrical member and a gap between an outer surface of the cylindrical member and an outer surface of the case for ventilation.

Abstract: An operating member including an actuating part movably mounted between a rest position and a switching position, a circuit board with an open contacting portion, a switching mat made of an elastic material disposed adjacent to the circuit board, and at least one contact pill formed on a side of the switching mat facing towards the circuit board, which cooperate in such a way that, in the switching position of the actuating part at the latest, the open contacting portion of the circuit board is closed by the contact pill, and where the switching mat moreover forms at least one tactile-feel dome which is associated with the contact pill, is elastically compressible by actuation of the actuating part in the direction of the switching position and which, in its initial position, defines a unilaterally open hollow volume in the switching mat, in order to cause a tactile feedback on the actuating part, where the contact pill is disposed outside the hollow volume defined by the tactile-feel dome.

Abstract: A key switch device includes: a key top that includes an operating surface; a pair of link members that is interlocked with each other to move the key top upward and downward; a frame member that includes a leg portion extending downward and a flange portion provided at an end of the leg portion, and pivotably supports the pair of the link members; and a support plate that includes a through hole through which the leg portion and the flange portion penetrate, and a projection portion projecting upwardly from a part of an outer periphery of the through hole toward an inside of the through hole.

Abstract: Relays having internal connections on both sides of their switches may be used in conjunction with a connector that integrates both the normal relay switch control lines with the sensing conductors of a control module for a battery module of an energy storage device. In this manner, sensing conductors may be routed along with the switch control lines for the relay instead of separately as described above. This integration reduces the complexity and cost associated with the energy storage device, because it reduces the number of separately routed lines and also eliminates the external connections for at least some of the sensing conductors.

Abstract: The present disclosure may fix the second yoke without using an upper cover and a lower cover, thereby having an effect of simplifying the entire structure, and reducing the fabrication cost, and decreasing the fabrication time.

Abstract: The present invention relates to a direct current relay, and more particularly, to a direct current relay capable of reducing an electronic repulsive force generated between a fixed contact and a movable contact by a permanent magnet installed to extinguish an arc. The direct current relay includes: a frame; first and second fixed contacts spaced from each other with a predetermined distance there between; first and second magnetic substances formed to enclose a lower part of the first and second fixed contacts; a movable contact movable to contact or to be separated from the first and second fixed contacts, having a first movable contact contactable to the first fixed contact, and having a second movable contact contactable to the second fixed contact; and a pair of permanent magnets installed on long sides of the frame.

Abstract: The present invention relates to an auxiliary contact mechanism of an electromagnetic contactor, and more particularly, to an auxiliary contact mechanism of an electromagnetic contactor capable of maximizing a time duration for which power is supplied to a magnetic coil for switching a main contact until the main contact is closed. The auxiliary contact mechanism of an electromagnetic contactor, includes: a case formed to have a box shape; an auxiliary sliding member installed above the case, and moving up and down by receiving a pressure from a main contact sliding member; an elastic member accommodated in an insertion groove formed in the auxiliary sliding member; a pressing member insertion-installed below the auxiliary sliding member, and moving up and down by an elastic force of the elastic member; and a micro switch turned on/off by the pressing member.

Abstract: A photocathode device may replenish its photoemissive coating to replace coating material that desorbs/evaporates during photoemission. A linear actuator system may regulate the release of a replenishment material vapor, such as an alkali metal, from a chamber inside the photocathode device to a porous cathode substrate. The replenishment material deposits on the inner surface of a porous membrane and effuses through the membrane to the outer surface, where it replenishes the photoemissive coating. The rate of replenishment of the photoemissive coating may be adjusted using the linear actuator system to regulate performance of the photocathode device during photoemission. Alternatively, the linear actuator system may adjust a plasma discharge gap between a cartridge containing replenishment material and a metal grid. A potential is applied between the cartridge and the grid, resulting in ejection of metal ions from the cartridge that similarly replenish the photoemissive coating.

Abstract: The invention relates to air ionization modules with ionization tubes removably arranged in mounts and to a support comprising the mounts. The air ionization modules are characterized in particular in that as little condensation as possible occurs while enriching an air flow with ions. For this purpose, the support has two mutually spaced plates, a first plate being an assembly plate and a second plate being a circuit board comprising the mounts. Furthermore, a body made of a heat-insulating material is located between the plates such that the second plate is arranged so as to be heat-insulated relative to the first plate. The air ionization module is used to generate ions in an air flow for at least one inner room of a building. Ionized air leads to a separation of multiple odor-causing molecules, an eradication of microorganisms, a degradation of volatile gaseous hydrocarbons, and a reduction of the oxide potential of the air, for example.

Abstract: Embodiments include an X-ray cathode filament, filament system, process to manufacture the filament and process to use the filament, where the filament includes a planar substrate, such as of tungsten, having a top surface coated with a coating of carburized tungsten (e.g., W2C) and thoria (ThO2). A first electron beam is emitted from the coating through a thermionic effect at a first temperature, such as when the filament is heated to between 1700 and 1900 degrees Celsius by running an electrical current through the filament. At this temperature, a second electron beam may be caused by (1) a reaction that includes creating thorium (Th) in the coating, and (2) the thorium diffusing to uncoated surfaces of the substrate from which the second electron beam is emitted. The filament may also have slots forming a zipper shape, forming a square switchback shape, or forming a rectangular labyrinth shape to reduce the current required to heat the filament.

Abstract: A focused ion beam system is provided. The focused ion beam system includes a plasma generation chamber configured to contain a source gas that is radiated with microwaves to produce plasma. The plasma generation chamber includes a plasma confinement device configured to confine the plasma in radial and axial directions within the plasma generation chamber and to form a plasma meniscus at an extraction end of the plasma generation chamber. The focused ion beam system also includes a beam extraction chamber configured to extract a focused ion beam from the confined plasma and to focus the extracted focused ion beam on a workpiece.

Abstract: A composite charged particle beam apparatus includes a first charged particle beam column that irradiates a thin sample with a first charged particle beam, a second charged particle beam column that irradiates an irradiation position of the first the charged particle beam of the thin sample with a second charged particle beam, and a sample holder that fixes the thin sample, and a sample stage on which the sample holder is mounted. The sample holder is able to rotate the thin sample within a surface parallel to an observation surface of the thin sample around a first rotational axis on the sample stage.

Abstract: In accordance with an embodiment, a defect inspection method includes: generating first and second images regarding a subject with first and second patterns, extracting first coordinates of the first pattern from the first image, setting a mask region in which a predetermined margin is provided in the first coordinates, taking a difference between the second image and a reference image, and checking the difference against the mask region to detect a defect in the second pattern. The first image is generated from a signal obtained by generating a charged particle beam under a first charged particle irradiation condition and irradiating the charged particle beam to a subject. The second image is generated from a signal obtained by generating a charged particle beam under a second charged particle irradiation condition, irradiating the charged particle beam to a subject region of the subject, and detecting second charged particles generated from the subject.

Abstract: A method for correcting a drift of an accelerating voltage includes measuring, after a position of a focus of a charged particle beam has been adjusted based on a first adjustment value and a predetermined time period has passed, a second adjustment value when the position of the focus of the charged particle beam is newly adjusted, calculating a deviation amount between the first adjustment value and the second adjustment value, calculating, using a correlation stored in a storage device, a correction value of an accelerating voltage to be applied to a beam source which emits the charged particle beam, where the correction value corresponds to the deviation amount, and correcting the accelerating voltage to be applied to the beam source, by using the correlation value.

Abstract: A charged particle beam apparatus includes a stage for fixing a sample, a driving mechanism for driving the stage, a focused ion beam column, an electron beam column, a detector that detects a secondary charged particle emitted from the sample irradiated with a charged particle beam, a gas supplying device that supplies gas for forming a deposition film on a surface of the sample, and a control device that generates image data indicating the position distribution of the secondary charged particle detected by the detector. The control device irradiates the sample with the electron beam prior to irradiating the sample with a focused ion beam, recognizes an alignment mark provided in the sample in the image data by the electron beam, and performs positioning of an irradiation region of the sample using the alignment mark.

Abstract: A method is provided of reducing the thickness of a region of a target sample. Reference data is obtained that is representative of x-rays generated by a particle beam being directed upon part of a reference sample under a first set of beam conditions. Under a second set of beam conditions the particle beam is directed upon the region of the target sample. The resultant x-rays are monitored as monitored data. Output data are then calculated based upon the reference and the monitored data. Material is then removed from the region, so as to reduce its thickness, in accordance with the output data.

Abstract: According to one embodiment, an etching apparatus includes a stage in an etching chamber, the stage which holds one of a first substrate and a second substrate, a plasma generator in the etching chamber, the plasma generator which is opposite to the stage and irradiates an ion beam toward the stage, a grid which is provided between the plasma generator and the stage, a supporter supporting the stage, the supporter having a rotational axis in a direction in which the ion beam is irradiated, a controller which is configured to mount the first substrate on the stage and irradiate the ion beam with the beam angle larger than 0° to the first substrate, when an elapsed time from an end of an etching of a predetermined layer in the second substrate is equal to or larger than a predetermined time.

Abstract: A chicane blanker assembly for a charged particle beam system includes an entrance and an exit, at least one neutrals blocking structure, a plurality of chicane deflectors, a beam blanking deflector, and a beam blocking structure. The entrance is configured to accept a beam of charged particles propagating along an axis. The at least one neutrals blocking structure intersects the axis. The plurality of chicane deflectors includes a first chicane deflector, a second chicane deflector, a third chicane deflector, and a fourth chicane deflector sequentially arranged in series between the entrance and the exit and configured to deflect the beam along a path that bypasses the neutrals blocking structure and exits the chicane blanker assembly through the exit. In embodiments, the chicane blanker assembly includes a two neutrals blocking structures. In embodiments, the beam blocking structure is arranged between the third chicane deflector and the fourth chicane deflector.

Abstract: A plasma processing chamber includes a substrate support for receiving and holding a substrate. A window in the plasma processing chamber is oriented over the substrate support. A plurality of transformer coupled plasma coils is disposed over the window. The TCP coils are disposed radially equidistant from one another. Each TCP coil is connected to a power circuitry at one end and the opposite end is electrically grounded. The power circuitry includes an RF source and a phase-shift modulator. The RF source is used to apply RF power to the TCP coils at a generator frequency to generate RF electric field. The phase-shift modulator coupled to the RF source is configured to apply a modulation frequency that is phase-shifted to allow the RF electric field applied to each of the TCP coils to transition in a rotating pattern.

Abstract: A grid assembly for a substrate processing system includes a first portion including a first body defining a central opening, an inlet, an outlet, and an upper manifold that is located in the first body and that is in fluid communication with the inlet or the outlet. A second portion is arranged adjacent to the first portion and includes a second body defining a central opening. A plurality of tubes is arranged in the central opening of the second body. First ones of the plurality of tubes are in fluid communication with the upper manifold. A lower manifold is located in the second body and is in fluid communication with the other one of the inlet or the outlet. Second ones of the plurality of tubes are in fluid communication with the lower manifold. The grid assembly is arranged between a remote plasma source and a substrate.

Abstract: Substrate treating systems are disclosed. The system may include a chamber with a processing space, a supporting unit provided in the processing space to support a substrate, a gas supplying unit provided in the processing space to supply gas into the processing space, a plasma source unit generating plasma from the gas, and a liner unit disposed to enclose the supporting unit. The supporting unit may include a supporting plate supporting a substrate. The liner unit may include an inner liner enclosing the supporting plate and an actuator vertically moving the inner liner.

Abstract: A substrate processing method for performing a plasma process on a processing target substrate by a plasma processing apparatus is provided. The plasma processing apparatus comprises: a processing chamber; a gas supply unit; a mounting table; a microwave generator; a dielectric plate; a slot antenna plate; a wavelength shortening plate; and a microwave supply unit, and the microwave supply unit comprises a coaxial waveguide and a distance varying device. The substrate processing method comprises: mounting the processing target substrate on the mounting table; generating microwave by the microwave generator; and varying, by the distance varying device, a distance in a radial direction between a part of an outer surface of an inner conductor and a facing member facing a part of an outer surface of the inner conductor in order to uniformly generate plasma under a lower surface of the dielectric plate in the processing chamber.

Abstract: A method and apparatus generates pulses that can be used for high-precision three-dimensional plasma treatment. At least two sources are furnished with at least one time function, wherein each of the at least two sources radiates an electromagnetic field generated by one of the time functions, and the at least one time function. In a method, the at least two sources cooperate in such a manner that at least one predetermined field strength is realized sequentially in a temporal succession in at least two predetermined space-time points. An alternative method uses at least one source and at least one reflection element. An apparatus with at least two sources and at least one data processing device or at least one source, at least one reflection element and at least one data processing device is configured such that one of the methods can be executed.

Abstract: Provided is a technique of uniformly processing a substrate within a short time by supplying a sufficient amount of active species to a surface of the substrate. A substrate processing apparatus includes: a process chamber; a discharge chamber; a plasma source; an exhaust system; a process gas supply system including a temporary storage unit; and a control unit configured to control the plasma source, the exhaust system and the process gas supply system to: intermittently supply a process gas temporarily stored in the temporary storage unit into the discharge chamber; and supply the process gas activated in the discharge chamber from the discharge chamber into the process chamber having an inner pressure lower than an inner pressure of the discharge chamber.

Abstract: Methods and systems for depositing a thin film are disclosed. The methods and systems can be used to deposit a film having a uniform thickness on a substrate surface that has a non-planar three-dimensional geometry, such as a curved surface. The methods involve the use of a deposition source that has a shape in accordance with the non-planar three-dimensional geometry of the substrate surface. In some embodiments, multiple layers of films are deposited onto each other forming multi-layered coatings. In some embodiments, the multi-layered coatings are antireflective (AR) coatings for windows or lenses.

Abstract: A high throughput deposition apparatus includes a first process chamber; one or more first deposition sources in the first process chamber; a first main carrier comprising a plurality of first sub-carriers each configured to carry one or more substrate each positioned around an axial direction and configured to receive a first deposition material from the one or more first deposition sources, wherein the first sub-carriers define a curved surface around the axial direction; and a transport mechanism configured to move the first main carrier along the axial direction through the first process chamber.

Abstract: A miniature mass spectrometer is disclosed comprising an atmospheric pressure ionisation source and a first vacuum chamber having an atmospheric pressure sampling orifice or capillary, a second vacuum chamber located downstream of the first vacuum chamber and a third vacuum chamber located downstream of the second vacuum chamber. An ion detector is located in the third vacuum chamber. A first RF ion guide is located within the first vacuum chamber and a second RF ion guide is located within the second vacuum chamber. The ion path length from the atmospheric pressure sampling orifice or capillary to an ion detecting surface of the ion detector is ?400 mm. The mass spectrometer further comprises a tandem quadrupole mass analyser, a 3D ion trap mass analyser, a 2D or linear ion trap mass analyser, a Time of Flight mass analyser, a quadrupole-Time of Flight mass analyser or an electrostatic mass analyser arranged in the third vacuum chamber.

Abstract: A miniature mass spectrometer is disclosed comprising an atmospheric pressure ionisation source, a first vacuum chamber having an atmospheric pressure sampling orifice or capillary, a second vacuum chamber located downstream of the first vacuum chamber and a third vacuum chamber located downstream of the second vacuum chamber. A first vacuum pump is arranged and adapted to pump the first vacuum chamber, wherein the first vacuum pump is arranged and adapted to maintain the first vacuum chamber at a pressure <10 mbar. A first RF ion guide is located within the first vacuum chamber. An ion detector is located in the third vacuum chamber. The ion path length from the atmospheric pressure sampling orifice or capillary to an ion detecting surface of the ion detector is ?400 mm. The mass spectrometer further comprises a split flow turbomolecular vacuum pump comprising an intermediate or interstage port connected to the second vacuum chamber and a high vacuum (“HV”) port connected to the third vacuum chamber.

Abstract: A method and apparatus for investigating a chemical-based event inside a vehicle without significant delay. A number of samples of air are collected at a number of locations inside the vehicle in response to a detection of the chemical-based event inside the vehicle. A number of chemical profiles for the number of samples are generated on-site using a portable chemical profiling device. A probable cause of the chemical-based event is identified using at least one of the number of chemical profiles.

Abstract: Systems and methods are used to analyze a sample using variable detection scan resolutions. A tandem mass spectrometer is instructed to perform at least two scans of a sample with different detection scan resolutions using a processor. The tandem mass spectrometer includes a mass analyzer that allows variable detection scan resolutions. The selection of the different detection scan resolutions can be based on one or more properties of sample compounds. The properties may include a sample compound molecular weight distribution that is calculated from a molecular weight distribution of expected compounds or is determined from a list of molecular weights for one or more known compounds. The tandem mass spectrometer can also be instructed to perform an analysis of the sample before instructing the tandem mass spectrometer to perform the at least two scans of the sample.

Abstract: A method of manufacturing a device for manipulating charged particles using an axial electric field as they travel along a longitudinal axis of the device is disclosed. The method comprises providing first electrodes of different lengths, supplying different voltages to these electrodes and arranging grounded electrodes between the first electrodes in order to form the desired axial potential profile.

Abstract: Some embodiments include methods utilizing atomic layer deposition to form material containing silicon and nitrogen (e.g., silicon nitride). The atomic layer deposition uses SiI4 as one precursor and uses a nitrogen-containing material as another precursor. Some embodiments include methods of forming a structure in which a chalcogenide region is formed over a semiconductor substrate; and in which SiI4 is used as a precursor during formation of silicon nitride material directly against a surface of the chalcogenide region.