Abstract: A lead terminal for a capacitor which is less likely to be broken even when the capacitor implemented on a substrate is continuously subjected to vibration, has excellent in vibration resistance and lifetime characteristics and capable of being manufactured inexpensively, is provided. The lead terminal 1 for a capacitor has an aluminum wire 2 having a round bar portion 2a and a flat portion 2b, and a metal wire 3 welded to the round bar portion 2a of the aluminum wire 2. Furthermore, the lead terminal 1 for a capacitor has a curved portion 2c at a boundary section between the round bar portion 2a and the flat portion 2b, and a curvature radius R of the curved portion 2c is set to be equal to or greater than 0.5.

Abstract: A capacitor includes a positive electrode, a negative electrode, a separator disposed between the positive electrode and the negative electrode, and an electrolyte. The positive electrode includes a positive electrode current collector and a positive electrode active material held on the positive electrode current collector. The positive electrode active material contains activated carbon. The activated carbon has a carboxyl group, and an amount of desorption of carboxyl group per unit mass of the activated carbon is 0.03 ?mol/g or less when the activated carbon is heated with a temperature increase from 300° C. to 500° C. The capacitor has an upper-limit voltage Vu for charging and discharging. The upper-limit voltage Vu of a lithium-ion capacitor is 4.2 V or more. The upper-limit voltage Vu of an electric double-layer capacitor is 3.3 V or more.

Abstract: The present invention relates to a conductive electrode for a system for the storage of electrical energy (1) having an aqueous electrolyte solution, said electrode comprising a metal current collector (3) and an active material (7), said current collector (3) comprising at least one conductive protective layer (5) which is leaktight to electrolytes and which is placed between said metal current collector (3) and said active material (7), said conductive protective layer (5) comprising: a polymer or copolymer binder comprising at least 50% of vinyl chloride unit, a crosslinked elastomer, at least one agent for crosslinking said crosslinked elastomer, conductive fillers.

Abstract: An electric double-layer capacitor contains an electrolytic solution, wherein the electrolytic solution comprises 1.2 to 1.8 mol/L of spirobipyrrolidinium tetrafluoroborate as electrolyte as well as solvent, where the solvent contains 50 to 60 percent by volume of propylene carbonate, 30 to 36 percent by volume of dimethyl carbonate, and 4 to 20 percent by volume of ethyl methyl carbonate. The electric double-layer capacitor can maintain its initial high capacitance and low internal resistance, while undergoing smaller characteristic changes after being exposed to low-temperature environments, high-voltage environments or high-temperature environments.

Abstract: A contact bridge arrangement for an electrical switch, such as a contactor or a relay, is disclosed. The contact bridge arrangement comprises a contact bridge having a contact bridge body, an actuating member on which the contact bridge is held that is movable with respect to the contact bridge along an actuating direction, the actuating member having a stop and a spring base, and a spring disposed between the spring base and the contact bridge body pressing the stop against the contact bridge.

Abstract: A contact bridge arrangement for an electrical switch is disclosed that has a contact bridge holder and a contact bridge. The contact bridge holder is monolithically formed with a spring. The contact bridge is held on the contact bridge holder and movable along an actuating direction. The contact bridge is pressed against the contact bridge holder by the spring.

Abstract: A switch for a belt buckle of a seatbelt device including at least two contact elements (4, 5) abutting on each other or reaching into abutment on each other in a cavity of the switch, wherein at least one of the contact elements (4, 5) is configured as a movable contact spring. An insertion channel (8) is provided into which a belt tongue, a locking part, an ejector (7) or a part movably coupled with one of these parts is insertable and removable at least with a section during the locking and unlocking movement of the belt tongue. A movably supported coupling member (3) protrudes with a first section (10) into the insertion channel (8) and includes a second section (11) associated with the contact spring. The movably supported coupling member (3) abuts via the second section (11) on the contact spring in a position-independent manner.

Abstract: The present invention relates to a door locking device for household appliances. The device according to the present invention allows to detect a door closing or opening condition, to actuate, only with the door closed, an electromagnetic actuator that triggers door locking means and a respective switch, and finally to detect the door locking condition. The operation of the door lock required by current safety standards is obtained here by means of an architecture of the door lock which allows to simplify the architecture of the door lock itself, in particular by reducing the connecting contacts with the household appliance to only two.

Abstract: A keyswitch includes a board, a cap, and a support device. The support device is disposed between the board and the cap and includes first and second support members movably connected to the cap and the board. A stopping member is formed on one of the first support member and the cap. An elastic member is formed on the other one of the first support member and the cap. When the cap is not pressed, the stopping member abuts against the elastic member to keep the cap at a non-pressed position. When the cap is pressed to a pressed position, the cap and the first support member slide relatively to make the stopping member deform the elastic member. When the cap is released, the elastic member drives the cap and the first support member to slide relatively, so as to move the cap back to the non-pressed position.

Abstract: An electrical multiple stage switch assembly includes an assembly casing, a first component carrier, and at least one multiple stage switch including a first disc contact, at least one second disc contact, and an actuator. The first and second disc contacts are positioned with their centers substantially aligned, and the first and second disc contact are adapted to flex into an electrical connection when the actuator is pressed and to flex back into a non-electrical connection when the actuator is released. A controlling member includes a controlling part for each switch, and the controlling part includes a spacing member adapted to limit the smallest possible distance between adjacent component carriers.

Abstract: An input mechanism is disclosed. The input mechanism includes a dome support structure defining an opening that extends through the dome support structure, a collapsible dome positioned in the opening and engaged with the dome support structure, and a cover member coupled to the dome support structure and covering the collapsible dome, thereby retaining the collapsible dome within the opening of the dome support structure.

Abstract: A low profile keyboard backlight module includes an electrically insulative bottom membrane layer, an intermediate membrane layer including a conducting layer, an insulative layer and a light-emitting layer attached together through lamination and bonded to the top surface of the bottom membrane layer, and an electrically insulative top membrane layer bonded to a top surface of the intermediate membrane layer opposite to the bottom membrane layer and having an integrated elastic layer located at a top surface thereof to support a set of keys. Thus, the low profile keyboard backlight module provides optimal waterproof effects and is practical for use in an electronic product having light, thin, short and small characteristics.

Abstract: An illuminated push-button switch according to the present invention includes a key top, a plunger, and a supporting fix member that forms a space between the key top and the plunger, and supports and fixes together the key top and the plunger. A plurality of the supporting fix members are provided, separated from each other, in a plane perpendicular to an optical axis. With this configuration, the illuminated push-button switch having a wide illuminated region secured on a touch surface, and a keyboard can be provided.

Abstract: The switch includes the base, a plurality of the fixed contact terminals, the sliding body, the operation lever, the coil spring, and the cover. From above the base, the fixed contact terminals, the sliding body, the operation lever, and the coil spring are mounted to the base, and the sliding body is pressed against the operation lever to position the operation lever. The cover is mounted to the base from above so as to press the operation lever by the pressing portion of the cover and cause the operation lever to rotate to an initial position.

Abstract: One embodiment of the disclosure includes an input module. The input module includes a switch, a rotatable and translatable input member operably connected to the switch and configured to actuate the switch, and an electrical contact operably connected to the switch and in electrical communication with the input member. During operation, the electrical connection between the input member and the electrical contact is maintained during translation and rotation of the input member. The input module may be used with a variety of electronic devices and can be used by a user to provide input to those devices.

Abstract: A tank for a circuit breaker has a body defining an interior volume and having opposing ends. An flange is at each end of the body with the flanges defining a central longitudinal axis of the body. The body has an internal surface defining a top portion of the tank disposed substantially above the axis and defining a bottom portion of the tank disposed substantially below the axis. The top portion is spaced from the axis as defined by at least a first radius from the axis. The bottom portion is spaced from the axis as defined by at least a second radius from axis. The second radius is greater than the first radius so as to reduce an electric field intensity on the bottom portion of the body and thus reduce effects of foreign particles within the interior volume, regardless of phase rotation.

Abstract: A device for switching a direct current includes an operating current path which has a mechanical switch, a switch-off current path which is connected in parallel to the operating current path and has a power-electronic switch, and a commutation device which allows commutation of the direct current from the operating current path into the switch-off current path. The commutation device includes a transformer.

Abstract: The present invention provides a magnet, which comprises a body having a first and a second section, and a slide arranged to be movable relative to the body between a first and a second position. The slide comprises a permanent magnet, and a first and a second pole piece that are attached to opposite magnetic pole surfaces of the permanent magnet. The first section comprises a hole that opens into a first cavity of the body, the bottom of the first cavity being delimited at least partly by the second section. The slide is movably arranged in the hole so that the second pole piece is directed towards the bottom of the first cavity, wherein at the first position of the slide, magnetic flux generated by the permanent magnet is short-circuited by the first section, and at the second position of the slide, magnetic flux generated by the permanent magnet is directed through the first and the second section.

Abstract: A thermally activated safety switch for safeguarding a consumer of a power supply network of a vehicle, having a switch housing in a temperature-independent switching unit, which subject to the temperature thereof establishes an electrically conductive connection between two external terminals fed out of the switch housing, wherein the external terminals are fed out at opposite housing sides of the switch housing. On the one hand, the external terminals are provided for an electrical and mechanical terminal connection to the cable connection ends of a consumer to be protected, and on the other hand to a cable portion leading to an on-board power supply electronics, and are configured accordingly.

Abstract: An electrical switch comprising a solenoid assembly including a core casing having a first bearing site and a bearing bush having a second bearing site, an armature movably borne in a switching direction at the first bearing site, and an armature shaft fixed to and movable with the armature and movably borne in the switching direction at the second bearing site.

Abstract: An impulse voltage generating device includes: an insulation cylinder; a DC power source positioned outside the insulation cylinder; capacitors arranged successively and connected to the DC power source in parallel, the capacitors being provided in a plurality of stages, the capacitors being accommodated in metal containers positioned outside the insulation cylinder; a discharging gap switch positioned in the insulation cylinder and provided between the stages; a blower structure configured to cause an insulation gas to flow in the insulation cylinder; a bushing for each of the capacitors, the bushing being positioned outside the insulation cylinder; and a gas spraying structure positioned outside the insulation cylinder, the gas spraying structure being configured to spray the insulation gas to the bushing.

Abstract: Example embodiments presented herein are directed towards an x-ray generating device. The device comprises at least one electron emitter(s) (22, 22_1, 22_2, 22_3) which has an electrically conductive substrate (23). The electrically conductive substrate comprises a coating of nanostructures (24). The device further comprises a heating element (21) attachable to each electrically conductive substrate. The device further comprises an electron receiving component (14) configured to receiving electrons emitted from the at least one electron emitter(s). The device also comprises an evacuated enclosure (10) configured to house the at least one electron emitter(s), the heating element and the electron receiving component. The at least one electron emitter(s) is configured for Schottky emission when the heating element is in an on-state and the at least one electron emitter(s) is negatively biased.

Abstract: A system that may include a processor, wherein the processor comprise an image waveform finder, a synthetic image generator and an output image generator; wherein the processor is configured to (i) receive or generate multiple images of a region of the object; wherein the region has an electron yield that is below an electron yield threshold; wherein each image is generated by scanning the region with an electron beam; (ii) process the multiple images to generate multiple synthetic images, and (iii) generate an output image of the region in response to the multiple synthetic images; wherein the image waveform finder is configured to process each image of the multiple images to find at least one image waveform that has a peak intensity that exceeds an intensity threshold; wherein the synthetic image generator is configured to replace one or more of the at least one image waveforms by one or more corresponding synthetic waveforms to provide a synthetic image; and wherein the output image generator is configured

Abstract: A system that may include a chamber, a motorized system, a chuck, a controller, multiple temperature sensors and a cooling module; wherein the chuck is configured to support an object that is positioned within the chamber; wherein the motorized system is configured to move the chuck in relation to the chamber; wherein the multiple temperature sensors are configured to sense multiple temperatures of at least one point within the chamber; wherein the cooling module is configured to cool a unit of the motorized system; and wherein the controller is configured to control the cooling module in response to the multiple temperatures.

Abstract: A method and a charged particle beam system that includes charged particle beam optics and a movable stage; wherein the movable stage is configured to introduce a movement between the object and charged particle beam optics; wherein the movement is of a constant velocity and along a first direction; wherein the charged particle beam optics is configured to scan, by the charged particle beam, multiple areas of the object so that each point of the multiple areas is scanned multiple times; wherein the multiple areas partially overlap; wherein the scanning is executed by the charged particle beam optics; wherein the scanning comprises performing counter-movement deflections of the charged particle beam for at least partially compensating for the movement; and wherein each area of the multiple areas is scanned by following an area scan scheme that defines multiple scan lines that differ from each other.

Abstract: According to one embodiment, a method of adjusting a charged particle beam drawing apparatus includes obtaining an offset amount in beam size to be set in the charged particle beam drawing apparatus. The method includes forming a linear evaluation pattern on a substrate by changing number of divisions of a beam with a predetermined size and performing drawing by using divided beams, obtaining a change amount in a line width of the evaluation pattern from a design dimension for each number of divisions, and calculating the offset amount by fitting a model function to the change amount for each number of divisions, the model function being obtained by modeling a pattern line width based on a distribution of energy given by charged particle beams.

Abstract: The disclosure provides a method for preparing a cross-section of a sample by milling with a focused ion beam. The cross-section is to be prepared at a pre-defined position. The method includes excavating a trench by milling in a first milling direction. The first milling direction leads away from the position of the cross-section to be prepared. The method also includes excavating the cross-section by enlarging the trench by milling in the reversed milling direction. The second milling direction leads towards the position of the cross-section to be prepared, whereupon the milling is completed at the position where the cross-section is to be cut. The desired largest milling depth is achieved at the completion of this milling step.

Abstract: Disclosed is a plasma processing apparatus including: a processing container; and a partition plate made of an insulating material, having a plurality of openings, and configured to partition an inside of the processing container into a plasma generating chamber and a processing chamber. A first conductive member made of a conductive material is provided on a surface of the processing chamber side of the partition plate, and the first conductive member is applied with at least one of an AC voltage, and a DC voltage of a polarity that is opposite to a polarity of charged particles guided from the plasma generating chamber into the processing chamber through each of the openings.

Abstract: The invention includes generating a plasma from a process gas for etching copper on a substrate; providing DC bias pulses to the substrate; exposing at least one of the plasma and the substrate to UV light while the DC bias pulses are provided to the substrate. Numerous other aspects are provided.

Abstract: The low pressure plasma system includes a treatment chamber which is pumped out in a first process step by means of a pump. In a second process step a gas supply valve is opened in order to achieve a defined gas composition in the treatment chamber at low pressure. In a third process step a plasma generator is switched on in order to ignite a plasma in the treatment chamber. In a fourth process step a flushing valve can be opened in order to flush the treatment chamber. In a fifth process step the treatment chamber can be ventilated by way of a ventilation valve. The sequential switching element can be a rotary switch and include a zero switching position where the low pressure plasma system is off. The sequential switching element renders possible a simple embodiment of the low pressure plasma system and its intuitive operation.

Abstract: A system and method for providing pulsed excited species from a remote plasma unit to a reaction chamber are disclosed. The system includes a pressure control device to control a pressure at the remote plasma unit as reactive species from the remote plasma unit are pulsed to the reaction chamber.

Abstract: A plasma processing device that includes a processing chamber which is disposed in a vacuum vessel and is decompressed internally, a sample stage which is disposed in the processing chamber and on which a sample of a process target is disposed and held, and a plasma formation unit which forms plasma using process gas and processes the sample using the plasma, and the plasma processing device includes: a dielectric film which is disposed on a metallic base configuring the sample stage and connected to a ground and includes a film-like electrode supplied with high-frequency power internally; a plurality of elements which are disposed in a space in the base and have a heat generation or cooling function; and a feeding path which supplies power to the plurality of elements, wherein a filter to suppress a high frequency is not provided on the feeding path.

Abstract: A method and apparatus are provided for plasma etching a substrate in a processing chamber. A focus ring assembly circumscribes a substrate support, providing uniform processing conditions near the edge of the substrate. The focus ring assembly comprises two rings, a first ring and a second ring, the first ring comprising quartz, and the second ring comprising monocrystalline silicon, silicon carbide, silicon nitride, silicon oxycarbide, silicon oxynitride, or combinations thereof. The second ring is disposed above the first ring near the edge of the substrate, and creates a uniform electric field and gas composition above the edge of the substrate that results in uniform etching across the substrate surface.

Abstract: Embodiments of the invention provide a bearing device and a plasma processing apparatus. According to at least one embodiment, the bearing device includes a base, a base driving mechanism, a pressing ring and a baffle ring.

Abstract: Systems and methods for operating a substrate processing system include processing a substrate arranged on a substrate support in a processing chamber. At least one of precursor gas and/or reactive gas is supplied during the processing. The substrate is removed from the processing chamber. Carrier gas and purge gas are selectively supplied to the processing chamber. RF plasma is generated in the processing chamber during N cycles, where N is an integer greater than one. The RF plasma is on for a first period and off for a second period during each of the N cycles. The purge gas is supplied during at least part of each of the N cycles.

Abstract: Embodiments of the invention provide a magnetron and a magnetron sputtering device, including an inner magnetic pole and an outer magnetic pole with opposite polarities. Both the inner magnetic pole and the outer magnetic pole comprise multiple spirals. The spirals of the outer magnetic pole surround the spirals of the inner magnetic pole, and a gap therebetween. In addition, the gap has different widths in different locations from a spiral center to an edge. Moreover, both the spirals of the outer magnetic pole and the spirals of the inner magnetic pole follow a polar equation: r=a?n+b(cos ?)m+c(tan ?)k+d, 0<=n<=2, 0<=m<=2, c=0 or k=0. Because the gap between the inner magnetic pole and the outer magnetic pole has the different widths in a spiral discrete direction, width sizes of the gap in the different locations can be changed to control magnetic field strength distribution in a plane, thus adjusting uniformity of a membrane thickness.

Abstract: According to the present invention, a Cu—Ga alloy sputtering target which is a sintered body has a composition with 29.5 atom % to 43.0 atom % of Ga and a balance of Cu and inevitable impurities. A Cu—Ga alloy crystal particle in the sintered body has a structure in which ? phase particles are dispersed in a ?1-phase crystal particle. A method for producing the sputtering target includes a step of performing normal pressure sintering by heating a molded body formed of a powder mixture of a pure Cu powder and a Cu—Ga alloy powder in a reducing atmosphere, and a step of cooling the obtained sintered body at a cooling rate of 0.1° C./min to 1.0° C./min, at a temperature having a range of 450° C. to 650° C.

Abstract: A detector plate includes a carrier plate, especially an injection-molded carrier plate, having a plurality of detector elements for detecting ionizing radiation. The detector elements function according to the principle of a Geiger-Müller counter. To simplify the production process and to save cost, the anode and/or the cathode should be in the form of a metallization on the carrier plate of the detector plate, the metallization(s) not being present in a single plane only. This configuration offers multiple options for designing the interior used as ionization chamber and for arranging the electrodes in this space. The options for contact with additional printed circuit boards also turn out to be highly advantageous. This further has an advantageous effect on the production process and on the qualities of the radiation measurement devices using detector plates of this kind.

Abstract: The mass spectrometer (1) provides an ionization chamber (11) therein with: a probe (15) having a sample to be measured flow path (155) for spraying a sample to be measured; and a standard sample flow path (255) for spraying a standard sample used for the calibration of the mass-to-charge ratio of the mass spectrum into the ionization chamber. The standard sample is intermittently introduced into the ionization chamber via a pulse valve (216). Thus, mixing of the sample to be measured and the standard sample can be prevented, while the timing according to which the standard sample is introduced can be appropriately controlled. It also becomes possible to acquire an accurate mass spectrum for each sample to be measured even in the case where a number of types of samples to be measured are introduced into the ionization chamber one after another over a short period of time.

Abstract: A beam current transmission system and method are disclosed. The beam current transmission system comprises an extraction device, a mass analyzer, a divergent element, a collimation element and a speed change and turning element, wherein an analysis plane of the mass analyzer is perpendicular to a convergent plane of the extracted beam, and after entering an entrance, the beam is converged on a convergent point in a plane perpendicular to the analysis plane, and then is diverged from the convergent point and transmitted to the divergent element from an exit; the collimation element is used for parallelizing the beam in a transmission plane of the beam; and the speed change and turning element is used for enabling the beam to change speed so as to achieve a target energy while the beam is deflected so that the transmission direction of the beam changes by a first pre-set angle.

Abstract: A method of mass spectrometry or ion mobility spectrometry is disclosed. The method comprises: providing a plurality of species of ions; analysing the ions during a plurality of sequential acquisition periods so as to obtain spectral data relating to the ions; varying the value of an operational parameter of the spectrometer such that it has different values during the different acquisition periods, wherein the spectral data obtained for a given ion varies depending on the value of the operational parameter; storing the spectral data obtained during the different acquisition periods separately; selecting a target ion; and then interrogating the spectral data so as to identify a set of first acquisition periods that include data corresponding to said target ion. Selecting spectral data from only a subset of the first acquisition periods allows the selection of the optimal spectral data for the target ion, whilst discarding less optimal data.

Abstract: Certain configurations of devices are described herein that include a DC multipole that is effective to doubly bend the ions in an entering particle beam. In some instances, the devices include a first multipole configured to provide a DC electric field effective to direct first ions of an entering particle beam along a first internal trajectory at an angle different from the entry trajectory of the particle beam. The first multipole may also be configured to direct the ions in the first multipole along a second internal trajectory that is different than the angle of the first internal trajectory of the particle beam.

Abstract: Apparatus and methods for optimizing the transmission of ions between two differentially pumped vacuum chambers. Ion transmission from the higher pressure vacuum chamber into the lower pressure vacuum chamber is maximized while gas conductance between the chambers is minimized. The conventional single hole circular aperture between adjacent vacuum chambers is replaced with an interface comprising a plurality of smaller apertures configured according to a calculated hole pattern. The individual apertures of the new interface may preferably be arranged in a circular fashion, providing both adequate ion transmission and lower gas conductance. Another embodiment of the invention comprises a surface having a single aperture whose shape comprises a contiguous collection of individual aperture shapes.

Abstract: A determination device for hydrocarbon emissions of a thermal engine including an inspection probe for removing a sample volume from a liquid, a measurement channel for conducting the sample volume via an ion source apparatus to a broadband measurement apparatus that is configured to determine a spectrum to be measured in one step, wherein the ion source apparatus is configured for soft ionization and the measurement apparatus forms an intensity signal sequence across the mass spectrum and is configured as a simultaneously measuring “time-of-flight” detector or as a “double-focusing sector field mass spectrometer in Mattauch-Herzog geometry.

Abstract: A mirror-finishing chamfer polishing is applied using an abrasive-grain-free polishing solution to a chamfered portion of a semiconductor wafer having an oxide film on a top side or the top and bottom sides of the semiconductor wafer and having no oxide film on the chamfered portion. Further, prior to the mirror-finishing chamfer polishing, a pre-finish mirror chamfer polishing is applied using an abrasive-grain-containing polishing solution to the chamfered portion of the semiconductor wafer having the oxide film on the top side or the top and bottom sides and on the chamfered portion.

Abstract: A thin film forming apparatus includes: an injector, the injector including: a distributor including a first distribution portion connected to a first gas inlet, and a second distribution portion connected to a second gas inlet; and a guide connected to the distributor, the guide including a first outlet connected to the first distribution portion, and a second outlet connected to the second distribution portion, wherein the second outlet is disposed above the first outlet.

Abstract: A method of removing metal oxide from electrically conductive contacts of a packaged semiconductor device includes mixing a solution including vinegar and nitric acid, applying the solution to the contacts for a time sufficient to remove the metal oxide from the contacts, and rinsing the solution from the contacts.

Abstract: Certain embodiments herein relate to methods and apparatus for processing a partially fabricated semiconductor substrate in a remote plasma environment. The methods may be performed in the context of wafer level packaging (WLP) processes. The methods may include exposing the substrate to a reducing plasma to remove photoresist scum and/or oxidation from an underlying seed layer. In some cases, photoresist scum is removed through a series of plasma treatments involving exposure to an oxygen-containing plasma followed by exposure to a reducing plasma. In some embodiments, an oxygen-containing plasma is further used to strip photoresist from a substrate surface after electroplating. This plasma strip may be followed by a plasma treatment involving exposure to a reducing plasma. The plasma treatments herein may involve exposure to a remote plasma within a plasma treatment module of a multi-tool electroplating apparatus.

Abstract: Disclosed is a substrate processing method including: supplying a first solvent including a fluorine-free organic solvent, to a workpiece; supplying a second solvent including a fluorine-containing organic solvent that is not dissolved with the first solvent at a normal temperature, and is dissolved with the first solvent at a temperature higher than the normal temperature; and replacing the first solvent with the second solvent while dissolving the first solvent and the second solvent by heating the first solvent and the second solvent to a dissolution temperature or higher.

Abstract: A method of manufacturing a semiconductor device includes forming a film on a substrate by performing a cycle a predetermined number of times. The cycle includes non-simultaneously performing: supplying a precursor containing a predetermined element to the substrate in a process chamber, removing the precursor from the process chamber, supplying a first reactant containing nitrogen, carbon and hydrogen to the substrate, removing the first reactant from the process chamber, supplying a second reactant containing oxygen to the substrate, and removing the second reactant from the process chamber. A time period of the act of removing the precursor is set to be longer than a time period of the act of removing the first reactant, or a time period of the act of removing the second reactant is set to be longer than the time period of the act of removing the first reactant.