Abstract: An improved technique achieves a uniform photoresist film on a wafer by controlling the volatility of the solvent in a photoresist solution during the bake process step. Because film formation takes place in the bake rather than the spin steps of the process, the improved technique involves using less viscous and therefore less costly and easier to use resists to cast relatively thick photoresist films. Such control is achieved in an enclosed chamber into which a carrier gas is introduced; the carrier gas mixes with gaseous solvent to create a saturating atmosphere in which the rate of evaporation of solvent decreases. This enables the heating of the wafer without the reduction of solvent in the film so that the photoresist can self-level. When the film has self-leveled, the solvent is then baked off as usual.

Abstract: A semiconductor wafer spinning chuck includes a rotatable base, a plurality of arms, upstanding from the base, a selectively releasable clamping mechanism, associated with the arms, and a spray nozzle, extending through the base. The clamping mechanism has a first portion configured to mechanically clamp an edge of a first semiconductor wafer and hold the first wafer in a substantially horizontal orientation upon all of the arms, with a backside of the first wafer facing down. The spray nozzle is oriented to direct a spray of fluid at the backside of the first wafer.

Abstract: A coating treatment apparatus includes: a rotating and holding part; a nozzle supplying a coating solution; a moving mechanism moving the nozzle; and a control unit that controls the rotating and holding part, the nozzle, and the moving mechanism to supply the coating solution onto a central portion of the substrate and rotate the substrate at a first rotation speed, then move a supply position of the coating solution from a central position toward an eccentric position of the substrate with the substrate being rotated at a second rotation speed lower than the first rotation speed while continuing supply of the coating solution, then stop the supply of the coating solution with the rotation speed of the substrate decreased to a third rotation speed lower than the second rotation speed, and then increase the rotation speed of the substrate to be higher than the third rotation speed.

Abstract: In a coating step, a substrate is rotated at a high speed, and in that state a resist solution is discharged from a first nozzle to a central portion of the substrate to apply the resist solution over the substrate. Subsequently, in a flattening step, the rotation of the substrate is decelerated and the substrate is rotated at a low speed to flatten the resist solution on the substrate. In this event, the discharge of the resist solution by the first nozzle in the coating step is performed until a middle of the flattening step, and when the discharge of the resist solution is finished in the flattening step, the first nozzle is moved to move a discharge position of the resist solution from the central portion of the substrate. According to the present invention, the resist solution can be applied uniformly within the substrate.

Abstract: A coating and drying apparatus for the application of a coating substance to a stent and drying the stent is provided.

Abstract: A liquid processing method forms a coating film by supplying and pouring a coating solution from a coating solution nozzle onto a surface of a substrate held substantially horizontally by a substrate holder. In the liquid processing method, a process for photographing a leading end portion of a coating solution nozzle is provided. When performing a process for anti-drying of the coating solution for a long period of time in advance, a position of the coating solution and a position of an anti-drying liquid are set by using a soft scale displayed on a screen where the photographed image is displayed. Therefore, a dispense control is performed based on a set value without depending on the naked eyes and a control for suppressing the drying of the coating solution in the leading end portion of the coating solution nozzle is performed.

Abstract: Disclosed is a liquid processing apparatus including first and second cups installed so as to surround a rotation holding unit of a substrate and guide a processing liquid scattered from the rotating substrate downwards. A first driving unit and a second driving unit elevate the first cup and the second cup between a position receiving the processing liquid and the lower position thereof. A controller controls that the first cup and the second cup are ascended at the same time by transferring the driving force of the first driving unit while the first cup or a first elevating member thereof is overlapped with the second cup or a second elevating member thereof from the lower side by setting the ascending speed of the first cup to be higher than the ascending speed of the second cup when the first and second cups are ascended at the same time.

Abstract: An open-bottomed reactor cell for wet processing of substrates can be configured to confine a process liquid to an area under the cell (processing the “internal site”), or alternatively to exclude the process liquid from most of the area under the cell (processing the “external site”) without physical contact between the cell and substrate. A slight underpressure or overpressure maintained inside the main cavity of the cell causes the liquid to form a meniscus in the narrow gap between the cell and substrate rather than flowing outside the desired process area. An area under a peripheral channel outside the main cavity of the cell is shared by both the internal site and the external side, allowing the entire substrate to be processed.

Abstract: Disclosed herein is a method of forming a coating, comprising applying a first coating to a substrate having a plurality of topographical features, planarizing a top surface of the first coating, and drying the coating after planarizing the top surface of the first coating. The first coating may be applied over the plurality of topographical features, and substantially liquid during application. The first coating may optionally be a conformal coating over topographical features of the substrate. The conformal coating may be dried prior to planarizing the top surface of the first coating and a solvent applied to the conformal coating, with the top surface of the conformal coating being substantially planar after application of the solvent. The coating may have a planar surface prior to the drying the first coating and the first coating may be dried without substantial spin-drying by modifying an environment of the first coating.

Abstract: Embodiments of the present invention generally provide plasma etch process chamber improvements. An improved gas injection nozzle is provided for use at a central location of the lid of the chamber. The gas injection nozzle may be used in an existing plasma etch chamber and is configured to provide a series of conic gas flows across the surface of a substrate positioned within the chamber. In one embodiment, an improved exhaust kit for use in the plasma etch chamber is provided. The exhaust kit includes apparatus that may be used in an existing plasma etch chamber and is configured to provide annular flow of exhaust gases from the processing region of the chamber.

Abstract: A substrate processing apparatus including a holder for rotatably holding a substrate; a coating solution supply nozzle for supplying a coating solution onto a front surface of the substrate to be processed held by the holder; a treatment chamber housing the holder and the coating solution supply nozzle; a cooling device which cools the substrate before the coating solution is supplied to the substrate, to a predetermined temperature; a heating devices which heats the substrate coated with the coating solution to a predetermined temperature; and a transferer that transfers the substrate between the treatment chamber, the cooling device and the heating device, wherein the treatment chamber, the cooling device and the heating device are partitioned from ambient air, and wherein at least the treatment chamber is connected to a gas supply mechanism having a supply source of a gas having a kinematic viscosity coefficient higher than that of air.

Abstract: A coating method includes supplying a coating liquid from a coating nozzle onto a front side central portion of a substrate held on a substrate holding member, rotating the substrate holding member about a vertical axis to spread the coating liquid toward a peripheral portion of the substrate by a centrifugal force and thereby form a film of the coating liquid, forming a liquid film of a process liquid for preventing a contaminant derived from the coating liquid from being deposited or left on a back side peripheral portion of the substrate, and damping a vertical wobble of the peripheral portion of the substrate being rotated, by a posture regulating mechanism, while delivering a gas from delivery holes onto a back side region of the substrate on an inner side of the peripheral portion on which the liquid film is formed.

Abstract: Provided is a coating device including: a rotating part which rotatably holds a substrate while the substrate is upright; a cup portion disposed to surround an outer periphery of the substrate held by the rotating part and having an opening which exposes a first surface and a second surface of the substrate; a coating part which includes a nozzle ejecting a liquid material to the first surface and to the second surface of the substrate through the opening; and a cover portion which is provided on the first surface and the second surface sides of the substrate and by which the opening is opened and closed.

Abstract: A semiconductor manufacturing apparatus according to the present embodiment comprises a chamber. A chemical-agent supply part is configured to supply a water-repellent agent or an organic solvent to a surface of a semiconductor substrate having been cleaned with a cleaning liquid in the chamber. A spray part is configured to spray a water-capture agent capturing water into an atmosphere in the chamber.

Abstract: A manufacturing method of a semiconductor device according to the present invention comprises cleaning a semiconductor substrate. A first chemical liquid for forming a water-repellent protection film and a second chemical liquid coating the first chemical liquid are supplied on a surface of the semiconductor substrate. Alternatively, the semiconductor substrate is immersed in the first chemical liquid coated with the second chemical liquid. The semiconductor substrate is then dried.

Abstract: A plated film having a uniform film thickness is formed on a surface of a substrate. A semiconductor manufacturing apparatus includes: a holding mechanism for holding a substrate rotatably; a nozzle for supplying a processing solution for performing a plating process on a processing target surface of the substrate; a substrate rotating mechanism for rotating the substrate held by the holding mechanism in a direction along the processing target surface; a nozzle driving mechanism for moving the nozzle in a direction along the processing target surface at a position facing the processing target surface of the substrate held by the holding mechanism; and a control unit for controlling the supply of the processing solution by the nozzle and the movement of the nozzle by the nozzle driving mechanism.

Abstract: A coating film forming apparatus that holds a substrate upon a spin chuck and forms a coating film by supplying a chemical liquid upon a top surface of said substrate comprises: an outer cup provided detachably to surround the spin chuck; an inner cup provided detachably to surround a region underneath the substrate held upon the chuck; a cleaning nozzle configured to supply a cleaning liquid for cleaning a peripheral edge part of the substrate, such that the cleaning liquid is supplied to a peripheral part of a bottom surface of the substrate; a cutout part for nozzle mounting, the cutout part being provided to the inner cup to engage with the cleaning nozzle; and a cleaning liquid supply tube connected to the cleaning nozzle, the cleaning nozzle being detachable to the cutout part in a state in which the cleaning liquid supply tube is connected.

Abstract: Disclosed is a coating apparatus having a coater chuck capable of improving a photoresist coating uniformity by preventing the coater chuck for performing a photoresist coating process from being sunk, in a manner of employing a different type of a material for making the coater chuck, wherein the coater chuck is made of stone and connected to a a servo motor via a drive shaft, the driving shaft being movable up and down, and a glass substrate coated with photoresist through a slit nozzle is placed on the coater chuck.

Abstract: Methods for coating medical devices for implantation within a body vessel are provided comprising providing a cylindrical container, placing a medical device inside the cylindrical container, and applying a polymer in liquid form inside the container.

Abstract: A coating treatment method includes: a first step of discharging a coating solution from a nozzle to a central portion of a substrate while acceleratingly rotating the substrate, to apply the coating solution over the substrate; a second step of then decelerating the rotation of the substrate and continuously rotating the substrate; and a third step of then accelerating the rotation of the substrate to dry the coating solution on the substrate. In the first step, the acceleration of the rotation of the substrate is changed in the order of a first acceleration, a second acceleration higher than the first acceleration, and a third acceleration lower than the second acceleration to acceleratingly rotate the substrate at all times.

Abstract: A method for treating a product suitable for human consumption, for example, a meat product, such as slaughtered poultry or parts thereof, in which a large number of products are successively supplied, optionally in groups, to an inspection station in which each product is subjected to a visual inspection to detect a defect on the respective product. If a decision is made to provide a specific additive-addition treatment to a product, the product is supplied to an additive-addition station, where the product is subjected to an additive-addition treatment and an additive is added to at least one part of the outside of each product or the inside of each product.

Abstract: Various embodiments of methods and devices for drying coated stents in an oven are described herein.

Abstract: Provided is an integrated coating system. An integrated coating system according to an exemplary embodiment of the present invention includes: a unwinding means provided with a roll to supply a web; a worktable roll configured to support the web supplied from the unwinding means; a plurality of printing means configured to perform printing or coating on the web supplied from the unwinding means; a plurality of curing means each of which is modulated to cure a printing material on the web passing through at least one printing means; and a winding means around which the web, of which printing or coating work is completed by passing through the curing means, is wound in a roll shape.

Abstract: Disclosed is a liquid processing apparatus capable of increasing the number of arranged substrate retainers without increasing the total exhaust amount of the liquid processing apparatus. A N-number (N is an integer identical to or greater than three) of cup bodies are inhaled and exhausted in total exhaust amount E through a plurality of separate exhaustion passage each having a first damper, and through a common exhaustion passage connected in common downstream of the separate exhaustion passages. The first dampers are configured such that an external air is received from the cup body in a first intake amount of external air E1 for one of the cup bodies where a chemical liquid nozzle is placed at a setting location facing a wafer, and an external air is received from each of the other cup bodies in a second intake amount of external air E2 less than the first amount E1 and the intake amount of external air from both each of the other cup bodies and each of branched passages equals (E?E1)/(n?1).

Abstract: A coater for coating a material with a solution or a suspension includes an access door and a process port separately openable within a housing. A rotating coating drum is removably connected with respect to the coater and the coater is configured for exchange of drums having a wide range of production capacities.

Abstract: A substrate processing apparatus includes a chamber, a substrate holding part, a substrate rotating mechanism, a liquid receiving part, and an upper nozzle. The chamber includes a chamber body and a chamber cover, and the chamber cover is moved up and down. While the chamber cover is in contact with the chamber body, a small sealed space is formed and some processings involving pressure reduction or pressurization are performed. When the chamber cover is moved up, an annular opening is formed between the chamber cover and the chamber body. On an outer side relative to the annular opening, positioned are a first cup part and a second cup part. A processing liquid spattering from a substrate is received by the first cup part or the second cup part. In the substrate processing apparatus, it is possible to perform various processings in the small chamber.

Abstract: Apparatuses, and related methods, for processing a workpiece that include a particular barrier structure that can overlie and cover a workpiece. Apparatuses, and related methods, for processing a workpiece that include a particular movable member that can be positioned over and moved relative to a workpiece. Apparatuses, and related methods, for processing a workpiece that include a particular ceiling structure that can overlie a processing chamber. Nozzle devices, and related methods, that include a particular annular body. Nozzle devices, and related methods, that include a particular first, second, and third nozzle structure.

Abstract: A spin coating apparatus that supplies a coating liquid to a substrate and rotating the substrate to form a coating film, has a holding part that holds the substrate mounted thereon in a horizontal position; a rotationally driving source that rotationally drives the holding part about a rotational axis parallel with the vertical direction, thereby rotating the substrate; and a coating liquid supplying part that supplies the coating liquid to the substrate held by the holding part.

Abstract: System and method for coating an expandable member of a medical device comprising a support structure to support the expandable member and an applicator positioned with at least one outlet proximate a surface of an expandable member. A drive assembly establishes relative movement between the at least one outlet and the surface of the expandable member to apply fluid on the surface of the expandable member along a coating path. A positioning device maintains a substantially fixed distance between the at least one outlet and the surface of the expandable member during relative movement therebetween by ejecting a pressurized medium against the surface of the expandable member.

Abstract: This invention relates to a method for conducting film coating on the surface of spinning circular workpiece under action of gas pressure, and nozzle utilized in the same. Circular workpiece to be coated is held on a rotating mechanism, and a feedstock loading machine having a nozzle, which is capable of guiding redundant feedstock and overflowing in a specific direction, is set to have a 100 ?m gap with the circular workpiece. When the rotating mechanism is rotated, the polymer solution is precoated on the surface of the circular workpiece, and when gas valve is opened, the polymer solution is squeezed to a predetermined thickness by an annular high pressure gas-stream formed on the periphery of a cylinder, produced from the high pressure gas released.

Abstract: An apparatus for coating a stent comprises a coating solution reservoir, a stent support for carrying a stent adjacent the reservoir, transducers for generating waves through the coating solution, and a controller that controls timing at which the transducers are powered in order to eject a droplet of the coating solution.

Abstract: Embodiments of the invention include apparatus and methods for coating drug eluting medical devices. In an embodiment, the invention includes a coating apparatus including a coating application unit comprising a movement restriction structure; a fluid applicator; and an air nozzle. The apparatus can further include a rotation mechanism and an axial motion mechanism, the axial motion mechanism configured to cause movement of at least one of the coating application unit and the rotation mechanism with respect to one another. Other embodiments are also included herein.

Abstract: An insertion apparatus supplies malleable material into a piston ring groove. An arcuate nozzle is supplied with malleable material under pressure created by a plunger urged by an actuator driven by an electric motor. A rotatable piston nest made of resilient material receives and snuggly secures a piston therein. The rotatable piston nest and piston are movable between a first, retracted position and a second, extended position. In the extended position the groove of the piston ring is spaced in proximity to the arcuate nozzle where malleable material is metered into the groove. Rotational indexing of the piston enables placement of the malleable material in circumferential locations within the piston ring groove.

Abstract: A method for coating catheter balloons with a defined amount of a pharmacologically active agent, uses a coating device having a volume measuring device for releasing a measurable amount of a coating solution by means of a dispensing device specifically onto the surface of the catheter balloon.

Abstract: A method of coating a first porous substrate with a thermoplastic material comprises the steps of: rotating the substrate about an axis of the substrate; and applying the material in a liquefied state onto the substrate, wherein the step of applying is performed from the outside of the substrate. According to another embodiment, a method of coating a porous substrate with a thermoplastic material comprises the steps of: connecting a first porous substrate to a rotator; rotating the substrate about an axis of the substrate; pumping the material in a liquefied state from a receptacle to an application head; and applying the material in a liquefied state onto the substrate, wherein the step of applying is performed from the outside of the substrate. In certain embodiments, the material coated on the substrate is used to help remove at least a portion of a filtercake.

Abstract: Disclosed is a substrate processing apparatus which can inhibit the occurrence of spots, such as watermarks, by reducing the remaining of the liquid that has been used for liquid treatment, inhibit the turn-over of the wafer, and improve throughput. In the disclosed substrate processing apparatus including a carrying means for carrying a semiconductor wafer W while vertically holding the wafer, a wafer boat (a carrying means) includes lower holders holding the bottom portion of the wafer, and a couple of left/right upper holders for holding the bottom outer edges of the wafer when the wafer is turned over. The lower holder includes a holding groove part and a turn-over prevention groove part, which are integrally formed with each other.

Abstract: A coating solution that contains 10 to 20% by weight of epoxy resin serving as a thermosetting resin, 20 to 30% by weight of MoS2, and 5 to 10% by weight of graphite, with a remainder thereof constituted by an organic solvent, is sprayed onto a wrap portion side face of an orbiting scroll from a spray nozzle . While spraying the coating solution, the orbiting scroll is rotated on a rotating table and the spray nozzle is moved along a rectilinear movement path toward a radial direction outer side of the orbiting scroll while maintaining an attitude thereof from the start of the spraying process. After applying the coating solution, the coating solution is dried by baking, whereupon a break-in operation is performed. As a result, an elastic coating is formed at a coating thickness that enables elastic deformation in accordance with a clearance between the wrap portion side faces.

Abstract: The present invention provides a spin coater including a rotation table that rotatably holds the disc substrate, a spin-cup that surrounds the outer circumference of a disc substrate held on the rotation table, a dripping unit configured to drip an ultraviolet-curable resin composition onto the surface of the disc substrate, a rotating unit configured to rotate the disc substrate via the rotation table to spread the ultraviolet-curable resin composition over the surface of the disc substrate, a heating unit configured to heat the ultraviolet-curable resin composition on the disc substrate, and a temperature controlling unit configured to control a reaching temperature of the spin cup which is increased by the heating unit each time the ultraviolet-curable resin composition is spread, so as to be constant over multiple spin coating processes.

Abstract: After a solvent is discharged onto a substrate in a period from a time point t0 to a time point t1, rotation of the substrate is started at a time point t2. A resist liquid is discharged onto a center portion of a target surface of the substrate at a time point t3. A rotation speed of the substrate starts to decrease at a time point t4, and attains a first speed after a certain period of time. The discharge of the resist liquid is stopped at a time point t5. The rotation of the substrate is accelerated in a period from a time point t6 to a time point t7, and the rotation speed of the substrate attains a second speed at the time point t7. The rotation of the substrate is decelerated in a period from the time point t7 to a time point t8, and the rotation speed of the substrate attains a third speed at the time point t8.

Abstract: A substrate is first rotated at a first rotation speed, and a resist solution is applied. Rotation of the substrate is decelerated to a second rotation speed lower than the first rotation speed so that the substrate is rotated at the low speed to smooth the resist solution on the substrate. Rotation of the substrate is then accelerated to a third rotation speed higher than the second rotation speed, and a solvent for the coating solution and/or a dry gas are/is supplied to the resist solution on the substrate. The solvent gas is supplied to a portion of the resist solution on the substrate thicker than a set thickness, and the dry gas is supplied to a portion of the coating solution on the substrate thinner than the set thickness. This thins the thicker portion of the resist solution and thickens the thinner portion to uniform the resist solution.

Abstract: There is provided a liquid processing apparatus capable of preventing an atmospheric air of a lower surface side of a substrate, to which a processing liquid is supplied, from circulating and being introduced into an upper surface side of the substrate, to which the processing liquid is not supplied, and capable of decreasing a fuzzy gas consumption supplied to separate the atmospheres between the lower and upper surface sides from each other. An upper plate 5 is disposed at an opposite side to the upper surface of the substrate maintained horizontally and a gas supplier 53, 531 supplies a pressurized gas into a space formed between the upper plate and the substrate. Also, due to a negative pressure built in a space formed between the upper plate and the substrate, an atmospheric gas outside the space is introduced into the space via a gas inlet port.

Abstract: A coating device includes a coating mechanism which includes nozzles for ejecting a liquid material onto front and rear surfaces of a substrate while rotating the substrate; and an adjusting mechanism which adjusts the coating state of the liquid material at the outer periphery of the substrate; wherein the adjusting mechanism includes a dip portion which dips the outer periphery of the substrate in a solution while rotating the substrate and dissolves and removes a thin film formed on the outer periphery of the substrate; and a suction portion which suctions the vicinity of the outer periphery of the substrate after dipping in the solution.

Abstract: Apparatuses and methods for applying a coating to an ear of corn are disclosed. An enclosure having a user accessible workspace and a motor to turn an ear of corn therein to apply a coating to the ear of corn rotated by the motor is also disclosed. The method includes providing an enclosure with a user accessible workspace for housing a motor assembly having a motor with a grip, releasably securing the ear of corn to the grip, rotating the ear of corn with the motor, and spraying the coating on the ear of corn with the coating applicator associated with the workspace. Each ear of corn has an identifier to track and index the ear corn during coating and drying.

Abstract: A covered sample plate with wells holding samples to be dried. The cover has through holes that communicate with only a portion of each well. The covered plate is inserted into a cradle of an assembly of cradles that is rotated. The cradle assembly fits into a tub and when rotated the cradles present a sold wall that functions as a centrifugal fan that drives air out through an opening in the tub. The air is dried of solvent and re-circulated back through the through holes in the cover to the sample wells.

Abstract: A spray gun (31) is attached to a multi-function unit (32) movable in a horizontal direction and a perpendicular direction. The spray gun (31) is mounted to a support holder (33), and the support holder (33) is connected to a support arm (35) of the multi-function unit (32). The support arm (35) is attached to a unit cover (36) which is openable/closable with respect to a casing (2). The support holder (33) and the support arm (35) can hide and house a liquid hose and an air hose therein so that the hoses and the like are arranged in an apparatus in such a state as to be completely free from being exposed. An installation position of the spray gun (31) can be finely adjusted by the multi-function unit (32) during a coating process, thereby enabling a control for keeping constant distances between tablet surfaces and the spray gun (31).

Abstract: A coating method includes holding a substrate in a horizontal state on a substrate holding member; supplying a coating liquid onto a front side central portion of the substrate held on the substrate holding member; rotating the substrate holding member about a vertical axis to spread the coating liquid supplied on the front side central portion of the substrate toward a front side peripheral portion of the substrate by a centrifugal force; and damping a wobble of the substrate being rotated, by a wobble damping mechanism including a gas delivery port and a suction port both disposed to face a back side of the substrate, while delivering a gas from the delivery port and sucking the gas into the suction port.

Abstract: A substrate liquid processing apparatus of the present invention includes a guide rotary cup configured to guide a process-liquid scattering from a substrate rotating and being held by a substrate holding table and a guide cup configured to guide downward the process-liquid guided by the guide rotary cup. The guide cup includes a downward extension portion extending downward from an inner peripheral end portion of a guide cup body and an inner peripheral extension portion extending inward from the inner peripheral end portion more than the downward extension portion. The inner peripheral extension portion is configured to form a gas guide space together with the guide rotary cup and the downward extension portion so that a gas turning by the rotation of the guide rotary cup can be guided downward.

Abstract: A system for forming a coating on a stent has a hub for holding a plurality of cartridges. Each cartridge has a plurality of mandrels, each mandrel capable of supporting a stent. A chamber has a drying section and a spray coating section, and is configured to receive a cartridge from the hub. An arm moves a cartridge from the hub to the chamber. A spray applicator applies a coating composition to a stent in the spray coating section.

Abstract: In a template treatment of forming a film of a release agent on a treatment surface of a template, the treatment surface of the template is first cleaned. Thereafter, in a coating unit, the release agent is applied to the treatment surface of the template. The release agent on the template is then dried. Then, alcohol is applied to the release agent on the template to make the release agent adhere to the treatment surface of the template and to remove an unreacted portion of the release agent. Thereafter, the alcohol on the template is dried and removed. In this manner, a film of the release agent is formed in a predetermined film thickness on the treatment surface of the template.

Abstract: A wet processing apparatus for wet-processing substrates can suppress the reduction of throughput when some component part thereof becomes unserviceable. The wet processing apparatus includes a first nozzle unit and a second nozzle unit. When the wet processing apparatus operates in a normal mode, a substrate carrying mechanism is controlled so as to deliver substrates alternately to processing units of a first group and those of a second group so that the substrates are processed sequentially in order. When the processing units of the first group (the second group) are unserviceable due to the inoperativeness of the substrate holders, a processing liquid supply system or a nozzle support mechanism, the nozzle unit for the processing units of the second group (the first group) is moved to process substrates by the serviceable ones of the first group (the second group).