Abstract: Apparatus for sensing deposition of a thin film layer of a material from a source onto a substrate having a carriage assembly including a predetermined number of apertures for selectively passing predetermined portions of a material from the source along each of a plurality of predetermined paths located in the proximity of the substrate under conditions correlated to that under which the material is deposited through a deposition path onto the substrate, inhibiting elements positioned relative to the carriage assembly for selectively inhibiting passage of predetermined portions of the material through a selected number of the predetermined number of the apertures, and a monitior for monitoring a selected parameter of the thin film material which is passed through other than the selected number of apertures of the carriage assembly wherein the monitor includes a plurality of detectors one of each of which is positioned along one of the plurality of predetermined paths and being adapted to sense a predetermine

Abstract: Apparatus for manufacturing metal layers and glow polymer layers which are superimposed and laterally offset relative to one another has two vacuum chambers which are separated from one another by air locks and has a cylinder with cavities in the surface thereof in which substrates for the layers are mounted on supports. Each cavity includes a displaceable diaphragm with a diaphragm aperture structure through which the layers are deposited. The cylinder, together with lock jaws, forms the air locks, so that the supports traverse both vacuum chambers. In a first vacuum chamber structures are provided for the manufacture of glow polymer layers and in a second vacuum chamber metallization structures are provided for the manufacture of the metal layers. In each cavity devices are provided for the displacement of the diaphragms between the glow polymer and metallization chambers.

Abstract: The arbitrary contouring of thickness of a sputter-deposited film is made possible by a blocking means having a primary blocking shield and an ancillary blocking shield. The primary blocking shield intercepts atoms sputtered directly from the cathode target by line-of-sight transport. The ancillary blocking shield extends downwardly from the side of the primary blocking shield which is placed closest to the substrate. The ancillary blocking shield intercepts atoms sputtered from the cathode which by intervening gas collisions have been redirected to travel underneath the primary blocking shield. Precise tailoring of the thickness profile of the coating on the substrate is thereby provided and the quality of the composite film is maintained. The method for contouring the thickness of sputter coated layers comprises sputter coating portions of the film at successive stations. By employing the improved blocking shield at selected stations, the film in the aggregate may have the desired thickness contour.

Abstract: An inhomogeneous optical layer is formed on a surface of a substrate in a vacuum coater, in which the substrate is moved along a travelling path having path sections and a substance is evaporated from its source and deposited on the surface while the deposited substance is exposed to gas which is able to react on the substance. In such an operation, the deposition rate of the substance is varied monotonously along the path in each of the path section in order that, in a layer formed by the deposition on the substrate, the content of the substance and that of the reaction product are varied monotonously in the direction of thickness. If the refractive index of the substance is different from that of the reaction product, the resultant refractive index in the layer is varied monotonously in the direction of the thickness of the layer.

Abstract: An inhomogeneous optical layer is formed on a surface of a substrate in a vacuum coater, in which the substrate is moved along a travelling path having path sections and two substances are evaporated from their respective sources and both of the substances are deposited on a common surface section of the surface. In such an operation, the deposition rate of each of the substances is varied monotonously along the path in each of the path section in order that, in a layer formed by the deposition on the substrate, the content of each of the substances is varied monotonously in the direction of thickness. If the refractive index of one of the substances is different from that of the other of the substances, the resultant refractive index in the layer is varied monotonously in the direction of the thickness of the layer.

Abstract: Apparatus for compensating for asymmetric signatures in semiconductor processes. An asymmetric thickness profile is obtained in a sputter coating system by using a shield placed in an asymmetric position with respect to the center of a symmetric sputtering system such as a circularly symmetric sputtering system. A sputter coated layer is obtained which has the asymmetric character of the shield and its placement. When the substrate is placed in subsequent equipment having asymmetric etch characteristics, the resultant film has a uniform thickness or a known contour.

Abstract: Surfaces of revolution to be coated by vapor deposition are placed in centering holes of a rotary dome which is centrally seated on a rotary ring. The rotary ring centered by means of fixedly mounted guide and drive rollers so as to have an evaporative source located as close as possible to the axis of rotation of the dome and at the center of curvature of the dome. The substance, vaporized by heating in a high vacuum space, condenses on the substrates as a thin layer. From the variation of the layer thickness, the outline of a corrective mask is computed for a constant radiant intensity of the vapor in all utilizable directions in the space, while assuming a central, point source of evaporation. A corresponding corrective mask is then secured by means of a support to another rotary ring in close proximity to the surfaces of revolution to be coated, which other ring is centered in the same manner as the first rotary ring, but rotates in the opposite direction about the same axis.

Abstract: Method for producing laminated capacitors, including a rotatable drum having a periphery and recesses formed therein, carriers disposed on the drum in the recesses defining a setting range on the periphery of the drum, a first vacuum chamber for metal layer deposition, a second vacuum chamber for insulating material layer deposition, means for supplying a vapor jet through a path in the first vacuum chamber and a shielding mask for shielding the carriers from the vapor jet, which includes shielding off the carriers from the vapor jet with the shielding mask before vapor deposition, alternatingly conducting the carriers on the drum through the first and second vacuum chambers, removing the shielding mask from the vapor jet path after a given number of revolutions of the drum for the period during which the setting range on the periphery of drum rotates through the first zone, and reintroducing the shielding mask in the vapor jet path after the last metal layer has been deposited during the rotation through the

Abstract: A carriage assembly for positioning a selected mask from a plurality of masks between a substrate and a source wherein an elongated mask support means having an elongated mask supporting frame and including means for defining elements for guiding and supporting the elongated mask supporting frame, a plurality of apertures formed in the elongated mask supporting frame and which extends from the upper surface to the lower surface and wherein each aperture has a predetermined diameter and a preselected spacing between the centers thereof and which support a plurality of masks therein, a support roller having a bearing surface for engaging, guiding and dynamically supporting the elongated mask supporting frame through the guiding and supporting elements; a pair of central guide rollers each of which have an outer grooved recessed receiving surface for engaging, guiding and dynamically supporting the elongated mask supporting frame through the guiding and supporting elements and a loaded clamping roller having an

Abstract: Apparatus for accurately registering a first member in an interdependent relationship to a second member including prealigned registration members selectively mounted on the second member and having a first elongated member which defines a primary registration point, a second elongated member which defines a different secondary registration point, which together define a line of rotation, a third elongated member which defines a tertiary registration point located at a point other than on the line of rotation wherein each of the elongated members are positioned in a predetermined pattern and reference registration members mounted on the first member having a first receiving member which defines a primary reference point which receives and engages the first elongated member superimposing the primary registration point on the primary reference point, a second receiving member defining a reference line segment which extends in a preselected direction wherein the second receiving member receives and engages the s

Abstract: An evaporation fixture for sequentially vapor depositing dielectric or ot materials on the surface of a substrate at various slant and rotational angles without opening the fixture. A connecting rod extends from the exterior of the evaporation fixture to the interior of the fixture where it is connected to a cam mechanism. The cam mechanism is in turn mechanically coupled to a reorientation ring that is concentric with the substrate holding ring of the fixture. A slot in the reorientation ring is in engagement with the substrate holding mechanism connecting pin. Movement of the connecting rod at the end exterior to the evaporation fixture causes movement of the reorientation ring with respect to the holding ring and by means of the slot-pin coupling causes rotational and angular reorientation of the substrate with respect to the evaporated material.

Abstract: A crystal plating device and method thereof in which a crystal to be plated and thereby set at a desired frequency is placed in an external removable holder or slug for insertion into a chamber of a plating device. The device is connected to a vacuum pump which is activated after the slug is loaded. Spring loaded filament posts carry a filament of precious metal such as gold or silver. The crystal is oscillated at a predetermined frequency prior to the filament being energized to evaporate or atomize the metal which plates the crystal and sets it frequency identical to that of the oscillator.The slug is externally loaded and can carry different size crystals. It is fitted with masks to accurately direct the deposit of the metal upon either or both sides of the crystal. After plating the slug is easily removed from the plating device.

Abstract: Deposition of continuous pin-hole free tellurium films with thicknesses to less than 150A on a suitable substrate is achieved by first pretreating the substrate prior to film deposition. Ion sputtering or bombardment of the substrate surface with an inert gas prior to tellurium evaporation creates a dense coverage of nucleation sites on the substrate which improves the adhesiveness and resistance to abrasion and oxidation of the deposited film while providing very thin pinhole free films of uniform thickness and desired crystallite orientation.

Abstract: Apparatus and process for producing electronic-grade semiconductor bodies are disclosed wherein continuously-pulled slim rod which can be formed in situ from the reaction of a seed crystal and a molten semiconductor material source, is pulled into and through a chemical vapor deposition chamber, having a gas curtain along the inner wall, the slim rod surface being preheated before entry into the deposition chamber where it is simultaneously exposed to focused heating and thermally decomposable gaseous compounds in order to provide suitable surface reaction conditions on the slim rod for the decomposition of the gaseous compounds which results in deposition growth upon the surface of the rod.

Abstract: An apparatus and method are provided for depositing submicron patterns on a substrate. The apparatus includes an evaporative source located opposite the substrate so that molecules from the source can be deposited directly on the substrate. A mask is located between the evaporative source and the substrate, the mask having openings which correspond to the desired pattern to be deposited on the substrate. A plate is located between the mask and the substrate, the plate having an aperture for allowing evaporated molecules to be deposited on the substrate according to the pattern of the mask.

Abstract: Coating apparatus having a vacuum chamber and a rotary motion assembly rotatably mounted in the vacuum chamber. Drive means is carried by the vacuum chamber for rotating the rotary motion assembly on an axis. At least one coating source is disposed within the chamber and is generally coincident with the axis of rotation for the rotary motion assembly. A mask structure is mounted in the chamber for rotational movement about an axis which is generally coincident with the axis of rotation of the rotary motion assembly. Additional drive means is provided for rotating the mask structure as the rotary motion assembly is rotated.

Abstract: A spray hood is provided for use in coating glassware such as bottles. The hood defines a tunnel for straddling a conveyor and has baffles on walls of the tunnel for adjustment horizontally and vertically to define a space about at least lower parts of the glassware where coating is to be sprayed. A coating supply system is coupled to the walls for spraying in the space and includes nozzles in two groups: one group on one side near an entrance end of the tunnel; and the other group on the other side near an exit end of the tunnel.

Abstract: The present ion source called "Vaporized-Metal Cluster Ion Source" is adapted to produce ionized vapor aggregate (ionized cluster) instead of atomic or molecular ions in conventional ion sources. Clusters consisting of 10.sup.2 -10.sup.3 atoms are formed by the adiabatic expansion due to the ejection into a high vacuum region through a nozzle of a heated crucible and ionized by electron bombardment. By "Ionized-Cluster Beam Deposition" using the ion source, fine-quality deposited films of many kinds of materials can be obtained on metal, semiconductor and insulator substrate with strong adhesion and with a fairly high deposition rate.

Abstract: A vacuum vapor-deposition apparatus comprising a turntable for holding some substrates subjected to vapor-deposition, on its circumferential portions; a plurality of evaporating boats disposed opposite to the circumferential portions of the turntable; a plurality of SCR boat power sources for respectively heating the plural evaporating boats; and at least one quartz deposition monitor provided on the turntable, wherein the turntable is rotated for vacuum vapor-deposition so that the evaporated materials from the respective boats are periodically deposited on some substrates to form the start of the successively evaporated materials.

Abstract: A vacuum metallizing apparatus for coating hollow articles such as tap bodies includes a carrier defining a shallow cylindrical chamber which is arranged for connection to a high vacuum source through valves. The carrier provides a plurality of ports with seatings in each of which a hollow article may be received with the interior of the article opening to the chamber. A filament assembly is mounted inside the chamber for rotation so that during evaporation of the coating metal on the filament, the filament sweeps past each port while the chamber including the interior of each hollow article is at high vacuum. Two different types of carrier are described, and a double or alternating type of arrangement of the carriers is described as well.

Abstract: A vacuum metallizing apparatus and method for coating the inside of hollow articles, e.g. tap control knobs, in which the article is engaged with a seating of a hollow body so that the interior of the article and the hollow body define a chamber in which high vacuum can be induced through the hollow body. A heating assembly is mounted in the hollow body for vaporizing the coating metal. The heating assembly is enclosed by a shield and may be associated with a shutter that is movable to interfere with deposition inside the article for certain coating metals.

Abstract: A microscope slide smoker device for providing a layer of smoke reactant to laboratory microscope slide comprising a base section having a flat upper surface with a rectangular aperture therein, fixture means mounted on said base at the shorter ends of said aperture for holding, aligning and smoking a microscope slide, slide rails mounted on the bottom of said base for receiving a burner screen holder and a hollow chimney tube section which is placed on the top surface of the base section.