Abstract: An apparatus and a method for drying washed objects being capable of drying the objects in a reduced period of time, effectively preventing contamination of the objects, and preventing energy loss are provided. The apparatus for drying washed objects includes a drying tank having an opening on the upper portion thereof so that the washed objects can be placed or taken out from above, and a rinsing tank formed integrally with the drying tank, and is capable of being sealed hermetically by closing the openable and closable lid. The drying tank includes a mist-straightening vane for supplying organic solvent mist at normal temperatures to the washed objects, so that the washed objects are dried by organic solvent mist emitted from the mist-straightening vane.

Abstract: A method of cleaning a fouled RO membrane in a module for RO separation, the membrane having feed side and permeate side, the foulant accumulating at the feed side.

Abstract: A polishing pad conditioner cleaning method and an apparatus for effectively removing particles from a polishing pad conditioner. The polishing pad conditioner is immersed into a cleaning liquid contained in a cleaning bath. The cleaning liquid is continuously supplied into the cleaning bath. An inert gas is injected into the cleaning liquid from a bottom of the cleaning bath. The injected inert gas bubbles the cleaning liquid, so that the particles sticking to the polishing pad conditioner are removed and overflow from the cleaning bath. The polishing pad conditioner is effectively cleaned, so that formation of particles and scratches on a wafer are reduced when a polishing process is subsequently carried out using the cleaned polishing pad conditioner.

Abstract: A cleaning device for internal combustion engine by way of suction force generated at the air-inlet tube of the engine is disclosed. The tapered air passage accelerates the air stream to produce a suction force, or a moveable or adjustable valve device to change the surface area of the air passage so as to control the effect of vacuum, and the cleaning solution is sucked into the air-inlet tube to clean away the accumulated carbon and debris in the valves or the internal combustion engine.

Abstract: An exemplary cleaning apparatus for cleaning a system having a first fluid is provided, wherein the apparatus comprises a second fluid entering the system and cycling in the system with the first fluid for a predetermined period of time. The cleaning apparatus also comprises an air compressor and an air storage tank. The air compressor is capable of compressing air into air storage tank, and air storage tank is capable of delivering air to the system for purging the first and second fluids from the system after the predetermined period of time has expired. The cleaning apparatus further comprises an air regulator capable of regulating pressure of the air delivered to the system.

Abstract: An apparatus for supercritical processing of multiple workpieces comprises a transfer module, first and second supercritical processing modules, and a robot. The transfer module includes an entrance. The first and second supercritical processing modules are coupled to the transfer module. The robot is preferably located with the transfer module. In operation, the robot transfers a first workpiece from the entrance of the transfer module to the first supercritical processing module. The robot then transfers a second workpiece from the entrance to the second supercritical processing module. After the workpieces have been processed, the robot returns the first and second workpieces to the entrance of the transfer module. Alternatively, the apparatus includes additional supercritical processing modules coupled to the transfer module.

Abstract: An apparatus for supercritical processing of multiple workpieces comprises a transfer module, first and second supercritical processing modules, and a robot. The transfer module includes an entrance. The first and second supercritical processing modules are coupled to the transfer module. The robot is preferably located with the transfer module. In operation, the robot transfers a first workpiece from the entrance of the transfer module to the first supercritical processing module. The robot then transfers a second workpiece from the entrance to the second supercritical processing module. After the workpieces have been processed, the robot returns the first and second workpieces to the entrance of the transfer module. Alternatively, the apparatus includes additional supercritical processing modules coupled to the transfer module.

Abstract: The substrate processing apparatus is provided with a gas-liquid mixing nozzle for generating a gas-liquid mixture by mixing a liquid and a pressurized gas, to discharge the gas-liquid mixture to a substrate at high speeds. The mixture process is conducted in an open space out of the nozzle, and change in the supply pressure of the gas does not affect the supply of the liquid. The reaction products which having been generated on the substrate in etching process is removed at high speeds with the flow of the gas-liquid mixture, whereby the quality of the process is improved.

Abstract: Disclosed herein is an automatic cleaning apparatus for paint sprayer gun comprising a solvent cleaning tank, cleaning tank, and a check valve. The solvent cleaning tank has a pressurized air inlet, the cleaning tank has a plurality of vertically erected first tubes equipped with at least one nozzle for each tube, a second tube is connected with each first tube to communicate all first tubes one another, and a third tube is used to communicate the air inlet and the solvent cleaning tank and cause the solvent to be ejected from the nozzles. The check valve is for collecting the solvent in the bottom of the solvent tank. With this structure, the cleaning apparatus of the present invention uses compressed air as its power source so as to eliminate hazardous electrostatic induction owing to mechanical friction caused by rotation of apparatus components during the cleaning operation.

Abstract: An apparatus and method for cleaning surfaces of semiconductor wafers utilizes streams of gaseous material ejected from a gas nozzle structure to create depressions on or holes through a boundary layer of cleaning fluid formed on a semiconductor wafer surface to increase the amount of gaseous material that reaches the wafer surface through the boundary layer.

Abstract: An apparatus has a hand-cleaning volume sized to receive a gloved or ungloved human hand. The apparatus includes a mechanical-cleaning device and a chemical-cleaning device, operated sequentially to remove particles and chemical contaminants such as organics. The mechanical-cleaning device has a pressurized gas source positioned to direct a flow of pressurized activated gas into the hand-cleaning volume, and a gas-source vent communicating with the hand-cleaning volume to remove the pressurized activated gas after it has passed over the hand. The chemical-cleaning device has an activating nebulizer operable to emit an activated cleaning mist into the hand-cleaning volume so that the activated cleaning mist contacts the hand in the hand-cleaning volume. The hand is cleaned by directing a flow of pressurized ionized gas over the hand, and thereafter flowing a mist of activated cleaning solution over the hand. The cleaning solution preferably includes hydrogen peroxide.

Abstract: A hard floor surface cleaning apparatus includes an aerator, a rotating scrub medium engaging the hard floor surface, a fluid conveyor, and a fluid recovery device. The aerator is configured to produce a foam-like aerated cleaning liquid from a cleaning liquid. The fluid conveyor is coupled to the aerator and is configured to deliver the aerated cleaning liquid onto the scrub medium. The fluid recovery device is configured to remove soiled solution from the hard floor surface.

Abstract: A powder facility used for spray coating includes at least one injection unit (6), at least two powder stations (2) and at least one cleaning unit (16) which are mutually displaceably in program-controlled manner in order to alternatively convey powder from one of the powder receptacles of the powder stations or to clean the powder-flow itineraries using compressed cleaning air.

Abstract: Apparatus and methods are disclosed for cleaning and priming a droplet dispensing device having a plurality of nozzles aligned in at least one row. A dispensing surface of the dispensing device comprising the nozzles is sealingly engaged to form a chamber adjacent the dispensing surface. A wash fluid is introduced into the chamber and removed from the chamber. A priming vacuum is applied individually, and preferably, simultaneously, to at least a portion of the plurality of the nozzles. Optionally, a wash fluid is subsequently introduced into the chamber and removed from the chamber to rinse the dispensing surface.

Abstract: An apparatus for cleaning semiconductor wafers includes a chamber, a bubbler having a vapor generating part for generating alcohol vapor and a spray pipe for spraying the alcohol vapor into the chamber, a gas supply nozzle for spraying gas into the chamber to dry the wafers, a liquid supply nozzle for supplying cleaning liquid into the chamber and a discharge system. The spray pipe of the bubbler has a liquid retention portion that keeps condensate of the alcohol vapor from issuing into the chamber. The gas supply nozzle has a spray outlet configured to spray the same amount of the drying gas onto all of the wafers in the chamber. The liquid supply nozzle has liquid supply openings only in a side portion thereof so that liquid alcohol will not become trapped therein.

Abstract: A foamed cleaning liquid dispensing system for use in a washing machine includes a cleaning liquid dispenser and a foaming device. The cleaning liquid dispenser includes an output flow of cleaning liquid, which is received by the foaming device. The foaming device includes an input flow of air and a mixing member, in which the flows of air and the cleaning liquid are combined to form an output flow of foamed cleaning liquid that is directed to a washing chamber of the washing machine.

Abstract: A cleaning apparatus for electric shaver components has a removable basket that fits inside a compartment. Cleaning is carried out by pumping cleaning fluid and air into a bottom of the compartment via a sieve plate. Debris removed from the components is collected in one compartment of a reservoir. The level of the water in the reservoir is maintained and controlled by the provision of an overflow pipe.

Abstract: An apparatus and system for removing photoresist or other organic material from a substrate such as a semiconductor wafer is provided. The apparatus and system includes a chamber for partially immersing the substrate in a solvent (e.g., deionized water), a chamber for receiving an oxidizing gas (e.g., ozone), and a mechanism for rotating or otherwise moving the substrate through the solvent to coat a thin film of solvent over the organic component on the substrate surface and expose the solvent-coated substrate to the ozone gas.

Abstract: Biofilm and debris can be removed from the interior and exterior surfaces of small bore tubing by passing an aqueous cleaning solution of water, one or more surfactants and preferably a source of hydrogen peroxide, optionally including small inert solid particles, together with a gas under pressure, to create a turbulent flow within the tubing that loosens the biofilm and debris so that they can be flushed from the tubing. When the exterior surfaces of tubing are to be cleaned, the tubing is inserted in a sleeve fitted with an adaptor that provides a pressure-tight seal between the tubing and the sleeve.

Abstract: There is provided a cleaning apparatus having a first vacuum container into which a cleaning object is to be introduced, a second vacuum container set apart from the first vacuum container by means of a light-transmissive member, a pump for evacuating the inside of each of the first vacuum container and the second vacuum container, a gas feed means for feeding an electric-discharge gas into the second vacuum container, and an electric-discharge generation means for generating electric discharge in the second vacuum container, wherein the cleaning object is irradiated through the light-transmissive member by light produced by the electric discharge generated in the second vacuum container.

Abstract: Currently, there are no products available which allow a user to treat microbial and bacterial growth inside a HVAC condensate drain line or clear a clogged line without cutting into the drain line. Our valve is an in-line condensate drain line valve that can be installed easily, quickly and economically, either during new construction or onto existing HVAC systems. The HVAC user can add household bleach to the condensate line, which inhibits microbial and bacterial growth without cutting into or disassembling the drain line. The design of our valve allows the user to perform safe routine maintenance to the HVAC drainage system without having to resort to expensive and repetitive service call repairs over the lifetime of the HVAC system. The valve is further designed to prevent undesirable reverse airflows into the HVAC system and home or building, caused by a dry water trap in the condensate drain.

Abstract: The liquid supply system comprises a pump for delivering a liquid under high pressure and a vaporizer for vaporizing the liquid delivered from the pump. The liquid vaporized in the vaporizer is supplied to a reaction chamber. A pressure gage is provided in a passage extending from the pump to the vaporizer. A monitor device is provided so as to indicate a pressure, based on an output of the pressure gage.

Abstract: A cleaning system and method for a bell atomizer spray head provides an air/solvent mixture to an exterior surface of a bell cup through shaping air passages and outlets during a color change or bell cleaning operation. In the alternative, cleaning passages can be provided for the air/solvent mixture to exit adjacent the bell cup exterior.

Abstract: A megasonic tank system is provided that employs a monitoring system adapted to monitor power signals reflected from a transducer and to determine cleaning information based on the reflected power signals. The megasonic tank system includes a tank adapted to contain a fluid, a transducer coupled to the tank so as to transmit energy to the fluid, and a power supply coupled to the transducer and adapted to deliver energy thereto.

Abstract: A method of washing, microbially decontaminating, and rinsing of a lumened device (B), such as an endoscope includes positioning the device in a chamber (12) of an automated processor (A). Spray nozzles (102, 104, 106, 108, 110) within the chamber sequentially spray washing, microbial decontaminant, and rinse fluids over the device. Fluid connection ports (150, 152, 154) connect with internal passages (187) of the device for delivering the fluids thereto. Leaking connectors (184) connect the automated processor connection ports with inlet ports (196) of the device and allow a portion of the washing, decontaminant, and rinse solutions to leak from each inlet port. A computer control system (80) controls leak testing, cleaning, decontamination, rinsing, and drying stages of a cycle, which are all carried out within the chamber, obviating the need for human contact with the device during processing.

Abstract: Whenever a dishwasher is operated a given number of times or whenever a given number of days transpire, an apparatus performs a process that removes minerals deposits that have built-up inside the dishwasher. The process commences by rinsing the dishwasher interior with water and draining the rinse water. A mixture of water and a chemical that dissolves the minerals is introduced into the dishwasher and a pump circulates the mixture inside the dishwasher for a period of time. Next the mixture is drained out and the dishwasher interior is rinsed again with fresh water.

Abstract: Method and apparatus for servicing a vehicle's transmission cooling system, where the apparatus includes a source valve with inlet and outlet ports, a pump with inlet and outlet ports, and a return valve with inlet and outlet ports. The pump inlet is connected to the source valve outlet. The pump pumps fluid from the source valve inlet through the source valve outlet and the pump inlet to the pump outlet for servicing the transmission cooling system. The fluid returns from the return valve inlet to the return valve outlet and the pump then re-pumps the fluid into the transmission cooling system. The service apparatus may also include a fluid source and a filter interposed between the fluid source and the source valve, where the fluid returns to the fluid source prior to re-pumping the fluid. The service apparatus may also include a flowmeter interposed between the return valve and the fluid source and a filter interposed between the return valve and the flowmeter.

Abstract: Described are cleaning methods and apparatus that minimize the volume of hazardous materials used and created when cleaning components, and further to minimize the possibility of cross-contamination between components from different deposition chambers. Components to be cleaned are stored within or supported by a dedicated cassette before they are placed in a receptacle of cleaning liquid. The cassette displaces a significant percentage of the receptacle's volume; consequently, only a relatively small volume of cleaning liquid is needed to fully submerge the component. In typical embodiments, the combined cassette and component displace a volume of liquid that is greater than the volume of liquid used to clean the component. One embodiment of the invention reduces the requisite volume of cleaning solution using a number of liquid-displacing elements (e.g., balls) contained within a cleaning receptacle.

Abstract: The present invention is a valve cleaning apparatus and method for transporting a cleaning fluid from a supply tank into the air intake valves of a combustion engine. It comprises housing having a pair of legs and a closed end. The housing has a flow path through the housing. A valve is located collinear with the flowpath. The valve cleaning apparatus also includes tubing, a nozzle and a hook to hang the assembly from the hood of a car.

Abstract: A cleaning system for engines for combusting fuel and converting the combusted fuel to mechanical energy includes a liquid constituting an engine enhancer. The liquid comprises a super concentrated formula of carbon cleaning solvents and a high quality lubricant to clean and lubricate the air induction system. A delivery assembly for the fluid includes a supply tank. A nozzle at the output end of a tube includes a main body portion with a small cylindrical outlet and a cylindrical inlet and a frustoconical transition zone between the inlet and the outlet. The nozzle also has a cylindrical filter with a mesh formed with an opening to preclude the passage of solid particles. A hollow cylindrical support block allows the passage of fluid through the nozzle and out of the outlet. A retention assembly is adapted to fixedly position the nozzle in operative position adjacent to the air intake assembly.

Abstract: A cleaning apparatus for electric shaver components has a removable basket fits inside the compartment. Cleaning is carried out by pumping cleaning fluid and air into a bottom of the compartment via a sieve plate. Debris removed from the components is collected in one compartment of a reservoir The level of the water in the reservoir is maintained and controlled by the provision of an overflow pipe.

Abstract: A cleaning system and method for a bell atomizer spray head provides an air/solvent mixture to an exterior surface of a bell cup through shaping air passages and outlets during a color change or bell cleaning operation. In the alternative, cleaning passages can be provided for the air/solvent mixture to exit adjacent the bell cup exterior.

Abstract: Disclosed herein is an automatic cleaning apparatus for paint sprayer gun comprising a solvent cleaning tank, cleaning tank, and a check valve. The solvent cleaning tank has a pressurized air inlet, the cleaning tank has a plurality of vertically erected first tubes equipped with at least one nozzle for each tube, a second tube is connected with each first tube to communicate all first tubes one another, and a third tube is used to communicate the air inlet and the solvent cleaning tank and cause the solvent to be ejected from the nozzles. The check valve is for collecting the solvent in the bottom of the solvent tank. With this structure, the cleaning apparatus of the present invention uses compressed air as its power source so as to eliminate hazardous electrostatic induction owing to mechanical friction caused by rotation of apparatus components during the cleaning operation.

Abstract: A polishing pad conditioner cleaning method and an apparatus for effectively removing particles from a polishing pad conditioner. The polishing pad conditioner is immersed into a cleaning liquid contained in a cleaning bath. The cleaning liquid is continuously supplied into the cleaning bath. An inert gas is injected into the cleaning liquid from a bottom of the cleaning bath. The injected inert gas bubbles the cleaning liquid, so that the particles sticking to the polishing pad conditioner are removed and overflow from the cleaning bath. The polishing pad conditioner is effectively cleaned, so that formation of particles and scratches on a wafer are reduced when a polishing process is subsequently carried out using the cleaned polishing pad conditioner.

Abstract: A method and apparatus for cleaning the EGR system of a vehicle is disclosed. The apparatus includes an induction device that is removably attachable to the manifold of an engine in the location of the EGR valve. The induction device includes an adapter plate and a nozzle assembly. The apparatus further includes a solvent administrator removably attachable to the induction device for providing a quantity of solvent to the EGR system.

Abstract: An apparatus for disinfecting a user's hands has a spray chamber or an open spray zone with an opening for a user to insert his or her hands into the chamber. A supply of a disinfecting solution is provided, and preferably comprises a storage tank with a concentrated solution. This solution is mixed with an incoming freshwater supply, e.g. in a venturi valve, and supplied through spray nozzles into the chamber. A sensor detects the presence of a user's hands and automatically operates the spray nozzles for a predetermined time. The apparatus can also include a fan with its own timer, to provide a supply of drying air. Thus, a user can insert his or her hands, disinfect them with the disinfecting solution, remove the hands and dry them, without requiring any manual operation.

Abstract: Solid products to which dirt adheres are cleaned by introducing them into a container filled with water, mechanically transporting the products through the container to form in the container a suspension of sludge in the water, the sludge comprising dirt which has been removed from the products, the sludge having a specific mass that approaches the specific mass of water. A stream of finely divided air bubbles is fed through the sludge suspension in the container thereby to lower the specific mass of the water and to cause sludge to move by gravity toward a lower section of the container. Sludge-enriched water is removed from that lower section of the container. The products are mechanically transported by a conveyor into and through and out of the container after dirt has been removed therefrom.

Abstract: Systems and methods for controlling the presence and growth of microorganisms and biofilms in water lines is provided. The systems include, for example, a valved, multi-port control manifold for accepting inlet water to be treated and a filter for (1) reducing particulate physical matter, (2) further reducing particulate matter while also reducing the content of absorbable organics, and (3) physically removing microorganisms. The system further includes a mixing reservoir or chamber with specialized means for injecting active agents such as biocides for additional control of planktonic and sessile microbes. An optional pressurized storage vessel for retaining and delivering filtered and treated water is also disclosed. The methods include, for example, the step of introducing an aqueous cleaner derived from natural citrus botanicals into a water system.

Abstract: A method of operating a dishwasher in which items that are to be cleaned includes subjecting the items to the action of a cleaning liquid by delivering the liquid with a pressurized, gaseous delivery medium. In the method, energy and water can be saved and it is not necessary to comply with any specific inflow requirements to use the method.

Abstract: Disclosed are a system and a method for cleaning a trash bin. In a preferred embodiment, the system includes nozzles coupled to lifting means. The nozzles are aimed at the inside of the trash bin. The method includes the steps of lifting the trash bin, inverting it to empty its contents, spraying the inside of the trash bin, and returning the trash bin to the ground. An additional step may include spraying the trash bin when it is returned to the ground.

Abstract: In automated reprocessing system (B), a leak detection system (10) evaluates the integrity of an endoscope (A), having an internal passage (66). The leak detection system includes an interior chamber (42) which is connected to the internal passage by quick connects (18, 20). A source of compressed air (22) pressurizes the chamber and internal passage to a suitable test pressure. A pressure sensor (50) and a temperature sensor (54) detect the pressure and temperature within the chamber and hence in the endoscope passage. Pressure and temperature measurements made over time are used to determine changes in the gas volume, indicative of whether leaks are present in the endoscope. If the endoscope is determined to be free of leaks, the endoscope is washed and microbially decontaminated in the reprocessing system.

Abstract: A method and biological cleaning system are provided for cleaning substrate surfaces of oils and/or greases using a biological cleaning system which utilizes a pre-treatment bath and/or post-treatment bath as part of the cleaning system. The pre-treatment and/or post-treatment baths are compatible with the biological cleaning bath and during operation of the system, the used pre-treatment and/or post-treatment baths are recycled to the biological cleaning solution for biodegradation. A system is provided in which none of the pre-treatment, post-treatment or biological cleaning baths need expensive waste disposal. Replenishment pre-treatment and/or post-treatment baths as well as biological cleaning baths are added as needed to the biological cleaning system. Other treatment baths may be added directly to the biological cleaning bath with or without pre- or post-treatment for specific purposes such as a detergent phosphating bath used in the biological cleaning tank to provide a cleaned phosphated part.

Abstract: A fluid delivery device providing a pulsating discharge. The device comprises a housing having an elongated chamber, a fluid inlet passage to the chamber, and a cylindrical rotor mounted in the chamber and comprising a plurality of grooves. The inlet passage comprises a first fluid injection channel through which the fluid enters the chamber and impinges upon the grooves in the rotor. The fluid thereby rotates the rotor and exits as a fluid pulse through a linear fluid discharge. The grooves in the rotor may be helical such that the pulse of fluid traverses the linear fluid discharge from one portion to another or sequences through a linearly aligned plurality of fluid exits. The device may further comprise a second fluid inlet passage adapted to inject a second fluid into the grooves. One fluid may be compressible and one non-compressible. A method for cleaning an object, such as a circuit board, using the fluid delivery device of the present invention is also disclosed.

Abstract: The improved rinse tank includes an external shell and an internal shell. For one embodiment, the external shell preferably defines a five sided open-top tank with a top open to the atmosphere. The internal shell is preferably disposed within the external shell and has a configuration that will accommodate at least two semiconductor wafer boats filled with six inch semiconductor wafers. The external shell is preferably sized large enough to completely immerse the wafer boat and wafers in water when the rinse tank is filled. A chamber may be formed between the external shell and the internal shell within the lower portion of the rinse tank. Two or more deionized water inlets may be provided at the bottom of the rinse tank at opposite corners. Three or more compressed air nozzles may also be provided at the lower portion of the rinse tank. Multiple deionized water jet ports are provided at the internal shell.

Abstract: An apparatus for operative cleaning and preparation of dental handpieces is made as an integrated unit having holding stubs (6) for receiving the handpieces inside a treating chamber (1, 30), which is designed in a pressure resisting manner and with heating means (12, 56) such that it is directly usable for autoclave treatment of the handpieces. Through the holding stubs (6) and in accordance with a control program it is possible to supply warm water and oil to the respective channels in the handpieces. The apparatus may appear as a table unit (32) holding all what is required for a complete cleaning lubrication and sterilization cycle.

Abstract: An ozonization system (100, 200 or 300) for washing and cleaning objects (71) is described. The system includes a container (110, 210 or 310), an ozonization unit (50) and a diffuser assembly. The container can be a standard kitchen sink, a commercial sink, enclosure (30) or an airtight box (410). The ozonization unit contains a pump (8), an ozone generator (6) and a water separator (162, 262 or 362) which are all controlled by a control circuit (5). The diffuser assembly in one embodiment is a diffuser wand assembly which fits within the standard spray opening (110A) of a kitchen sink. The diffuser tip (129) is inserted into the container and the ozone is diffused into the container through the diffuser tip. In another embodiment, the container has a diffuser plate (214 or 314) spaced apart from the bottom. The ozone is inserted into the gap (213 or 313) between the diffuser plate and the bottom of the container. The ozone is diffused from the gap through the diffuser plate into the container.

Abstract: An object of the invention is to provide a method and an apparatus for recycling plastics which is improved with respect to operation efficiency, operation environment, lowering degradation of plastics, recycling cost and environment load including saving energy. The recycling is made as follows: coarse-crushing used-up plastic products, separating plastic materials from other foreign matters by air blow separation, fine-crushing the separated plastics, washing the fine-crushed plastics by the process using a circulation flow including a spiral flow in which interaction between crushed plastics helps themselves clean without washing agents, dewatering the washed plastics, drying them, removing metallic matters by using metal detector, then feeding them directly without pelletizing to an injection molding machine of which nozzle part is equipped with filter and flow-switching mechanism for cleaning the filter by backwash reverse filtration.

Abstract: Surface cleaning, chemical treatment and drying of semiconductor substrates is carried out using foam as a medium instead of a condensed phase liquid medium. In cleaning and chemical treatment, by introducing a foam into an overflow vessel the foam is caused to pass over the substrate in moving contact therewith. Drying of the substrate is carried out, using a water solution of carbon dioxide in a pressurizable vessel. By releasing the pressure in the vessel, a layer of foam is established on the surface of the solution. The solution is discharged from the vessel, causing the foam layer to pass over the substrate in moving contact therewith. The carbon dioxide reduces the surface tension of the water, thereby enabling the foam layer to be produced and also assisting in the elimination of water from the surface of the substrate. In both cases, the use of foam reduces materials requirements and also reduces the quantity of particles deposited onto the substrate in the treatment process.

Abstract: An apparatus for cleaning a substrate includes a source of pressurized carrier gas and a body of cleaning agent in liquid form. A first conduit directs the pressurized carrier gas from the carrier gas source to the body of cleaning agent. A second conduit carries a flow of the carrier gas away from the body of the cleaning agent. The carrier gas flow carried by the second conduit includes cleaning agent in vapor form acquired from the body of cleaning agent. A nozzle is coupled to the second conduit to cause droplets of the cleaning agent to impinge upon a first face of the substrate to be cleaned.

Abstract: Semiconductor wafers and other electronic parts which similarly require ultra-high purity manufacturing environments are treated with ultra-high purity liquid cleaning and etching agents prepared at the site of use from gaseous raw materials which have been purified to a level compatible with semiconductor manufacturing standards, combined when appropriate with ultra-pure water.