Abstract: This invention relates to a method of cleansing skin having an impaired barrier function. The method of this invention utilizes cleansing compositions that have the characteristic of minimally perturbing or interacting with the skin barrier by applying to the skin a cleansing composition comprising (i) at least one low molecular weight, non-cross-linked, linear acrylic copolymer and (ii) at least one surfactant selected from the group consisting of anionic surfactants, amphoteric surfactants, and combinations of two or more thereof, the cleansing composition having a ?ST(65) of greater than about 2 mN/m.

Abstract: A method for preventing or reducing contamination of an immersion type projection apparatus is provided. The apparatus includes at least one immersion space that is at least partially filled with a liquid when the apparatus projects a beam of radiation onto a substrate. The method includes rinsing at least part of the immersion space with a rinsing liquid before the apparatus is used to project the beam of radiation onto a substrate.

Abstract: The present invention provides a Bacillus sp. subtilisin variant. In addition, the present invention provides compositions comprising this serine protease variant. In some embodiments, the present invention provides laundry and other non-automatic (i.e., hand) dishwashing cleaning compositions comprising this serine protease variant.

Abstract: The present application relates to care polymers and fabric and home care compositions comprising such care polymers, as well as processes for making and using such care polymers and such compositions. The performance of the care polymers that Applicants teach, can be further increased by following the emulsification teaching of the present specification and/or combining such care polymers with silicone materials.

Abstract: A method of cleaning a substrate processing chamber that enables formation of an oxide film on a surface of a processing chamber inside component to be prevented. A substrate processing chamber 11 has therein a processing space S into which a wafer W is transferred and carries out reactive ion etching on the wafer W in the processing space S. The substrate processing chamber 11 has an upper electrode plate 38 that comprises silicon and a lower surface of which is exposed to the processing space S. A dry cleaning is carried out on the upper electrode plate 38 using oxygen radicals produced from oxygen gas introduced into the processing space S. An oxide removal processing is carried out on the upper electrode plate 38 using fluorine ions and fluorine radicals produced from carbon tetrafluoride gas introduced into the processing space S.

Abstract: A soiled surface cleaning system is described for pre spraying soiled surface areas, and for rinsing and extracting the pre sprayed soiled surface areas, wherein the pre spraying of the soiled surface areas does not have to be stopped in order to perform the rinsing and extracting of the pre sprayed soiled surface areas. The system includes a prespray unit having a proportional pump driven by water from a water service line. The pump mixes the water with prespray and feeds the diluted prespray to a spray gun. The system also includes a rinse unit having a triplex pump that receives water from the water service line, increases the water's pressure, and feeds the pressurized water to an injector. The injector mixes the water with a rinse agent and feeds the diluted rinse agent to a nozzle arrangement on an extraction wand. In use, areas of the soiled surface are first pre sprayed with the diluted prespray. The diluted prespray is allowed to dwell on the pre sprayed areas.

Abstract: A method for removing inorganic foreign matters from the surface of a substrate made of silicon or glass or the surface of an inorganic coating formed on the surface of the substrate, which includes applying a light beam in a wavelength range which makes the light absorption coefficient of at least one of a material of the substrate, a material of the inorganic coating and the inorganic foreign matters be at least 0.01/cm, to the surface of the substrate or to the surface of the inorganic coating in an application amount of at least 10 J/cm2 in an oxygen- or ozone-containing atmosphere, and exposing the surface of the substrate or the surface of the inorganic coating having a negative surface potential to an acidic solution having a pH ?6.

Abstract: A load-bearing structure (10) for transporting or storing a load is disclosed. The structure includes at least one load-bearing surface (20) and a plurality of support members (40). Each support member (40) is disposed at least about the periphery of the load-bearing surface (20) and extends substantially downward relative to the load-bearing surface (20). The plurality of support members (40) defines a peripheral channel (80) about the load-bearing surface (20), which is apt to accommodate at least a portion (40, 110) of a substantially same load-bearing structure (10). The load-bearing surface (20) and the plurality of support members (40) are made from a substantially rigid material.

Abstract: The present invention is improved cleaning method and composition for cleaning headlight lens using a composition having water, at least one ketone and a surfactant where the ratio of ketone to surfactant is between 1:0.02-1.0.

Abstract: A method for washing biomass is described. The method includes: (i) receiving a first discrete amount of biomass; (ii) receiving a second discrete amount of biomass; (iii) washing the first discrete amount of biomass with solvent to produce a first effluent stream enriched with inorganic material; and (iv) washing the second discrete amount of biomass with the first effluent stream to produce a second effluent solvent stream.

Abstract: Embodiments of the invention relate to a detergent composition including a poly(maleic acid/vinyl octyl ether) (PMAOVE) hydrophobically modified polymer; and a heavy duty liquid detergent. In addition, embodiments relate to a method of cleaning a substrate, including contacting a substrate with a poly(maleic acid/vinyl octyl ether) (PMAOVE) hydrophobically modified polymer solution.

Abstract: A dishwasher and a method for controlling the same are provided. The dishwasher includes a contamination level sensor that measures a contamination level of washing water in a washing tub of the dishwasher. The method includes supplying washing water to an inside of the dishwasher, washing dishes by spraying the washing water to the inside of the dishwasher, temporarily pausing the washing of the dishes for a preset time period, and resuming the washing of the dishes after the preset time period.

Abstract: A control mechanism of a cleaning apparatus is preset to control the apparatus for a cleaning process or a rinsing process to include delivering a process liquid, which is corresponding one of a cleaning liquid and a rinsing liquid, from a back surface liquid supply nozzle through a liquid delivery port, thereby forming a liquid film on the back surface of a substrate, and then once stopping and then re-starting delivery of the process liquid from the back surface liquid supply nozzle, thereby forming a liquid film also on a portion around the liquid delivery port, so as to process the portion around the liquid delivery port as well as the substrate.

Abstract: A substrate cleaning system according to the present invention comprises cleaning devices, and a controller for controlling the driving of the cleaning devices in accordance with driving recipes predetermined. The controller prioritizes the cleaning devices, calculates, on the basis of a driving recipe for a cleaning device having a higher priority and a driving recipe for a cleaning device having a lower priority, a time in which the two cleaning devices can interfere with each other, and sets the calculated time as a waiting time. The cleaning device having the higher priority is made to start cleaning a substrate from a predetermined cleaning-starting position, while the cleaning device having the lower priority is kept waiting in a predetermined waiting position. When or after the waiting time has elapsed since the cleaning device having the higher priority started cleaning, the cleaning device having the lower priority is made to move from the waiting position and start cleaning the substrate.

Abstract: A substrate washing method for supplying a process liquid onto a substrate to wash the substrate includes the steps of (a) supplying a first process liquid of a first temperature onto the substrate having a resist pattern, to cover a surface of the substrate with the first process liquid, and (b) supplying a second process liquid onto the surface of the substrate covered with the first process liquid, to cover the surface of the substrate with the second process liquid of a second temperature higher than the first temperature, thereby removing the resist pattern.

Abstract: A substrate cleaning apparatus is capable of individually setting a threshold value for use in making a check of a resistivity during a rinsing process on a recipe setting screen in each process step. Thus, by setting each threshold value depending on the type of liquid chemical to be used immediately before the rinsing process, the substrate cleaning apparatus can use an optimum threshold value during the rinsing process in each process step to make a check of the resistivity. This allows the proper completion of the rinsing process in each process step.

Abstract: Methods are provided for descaling metallic components devices such as stents. The devices or components are cleaned under ultrasound in a cleaning solution of ammonium hydrogen fluoride at a temperature within a range of about 60° to 80° C., then rinsed at that temperature with an aqueous rinse containing a nonionic surfactant and rinsed again with purified water.

Abstract: The present invention discloses a method of making a photoresist stripper for removing a positive or negative tone photoresist, bonding adhesive, ink mark, and/or post etch residue from a semiconductor substrate, comprising a) an organic sulfonic acid, (b) a halogen-free organic solvent, and (c) an alkanolamine and (d) amine sulfonate or amine sulfonamide or mixtures thereof from semiconductor substrates.

Abstract: A method for cleaning a surface of a resin layer capable of sufficiently improving peel strength of a metal film formed by plating on a surface which is roughened by performing a desmear treatment on a resin layer containing a resin added with a large amount of filler is provided.

Abstract: Described and claimed are apparatuses and systems for surface cleaning comprising a pump and an applicator connected to the pump through which one or more cleaning agents can be applied to the surface at an operating pressure that is about 600 PSI or less and an operating flow rate that is about 1 gal/min or less.

Abstract: In a RLSA microwave plasma processing apparatus that radiates microwave from a microwave generator into a chamber by using a planer antenna (Radial Line Slot Antenna) having many slots formed according to a certain pattern, the chamber contaminated with Na or the like is cleaned by using a cleaning gas containing H2 and O2.

Abstract: A substrate processing apparatus comprises an indexer block, an anti-reflection film processing block, a resist film processing block, a development processing block, and an interface block. An exposure device is arranged adjacent to the interface block. The interface block comprises washing processing units and an interface transport mechanism. Before a substrate is subjected to exposure processing by the exposure device, the substrate is transported to a washing processing unit by the interface transport mechanism. The substrate is washed and dried by the washing processing unit.

Abstract: The present application relates to organosilicones and compositions such as consumer products comprising such organosilicones, as well as processes for making and using such organosilicones and such compositions. Such compositions comprising such organosilicones are easier to formulate, and provide more economical and superior care benefits when compared to current silicone containing compositions.

Abstract: The present application relates to care agents, for example care polymers, and compositions such as consumer products comprising such care agents, as well as processes for making and using such care agents and such compositions. The performance of the care polymers that Applicants teach, can be further increased by following the emulsification teaching of the present specification and/or combining such care polymers with silicone materials.

Abstract: Disclosed herein are a materials such as a coating, such as an architectural coating or a CARC coating, comprising a lipolytic enzyme or organophosphorous compound degrading enzyme. Also disclosed herein are methods of decontaminating a surface comprising such a material from a chemical substrate of an enzyme such as a lipid or an organophosphorus compound.

Abstract: The present application relates to care agents, for example care polymers, and compositions such as consumer products comprising such care agents, as well as processes for making and using such care agents and such compositions. The performance of the care polymers that Applicants teach, can be further increased by following the emulsification teaching of the present specification and/or combining such care polymers with silicone materials.

Abstract: The present application relates to organosilicones and compositions such as consumer products comprising such organosilicones, as well as processes for making and using such organosilicones and such compositions. Such compositions comprising such organosilicones are easier to formulate, and provide more economical and superior care benefits when compared to current silicone containing compositions.

Abstract: The present application relates to care agents, for example care polymers, and compositions such as consumer products comprising such care agents, as well as processes for making and using such care agents and such compositions. The performance of the care polymers that Applicants teach, can be further increased by following the emulsification teaching of the present specification and/or combining such care polymers with silicone materials.

Abstract: Disclosed is a substrate processing apparatus capable of drying a substrate to be processed while suppressing a pattern collapse or occurrence of contamination. In a processing vessel, a substrate is immersed in a liquid in the longitudinal direction, and the liquid is pushed out by a substitution fluid of a supercritical state to be discharged from the processing vessel. Thereafter, the substitution fluid subjected to the substitution with the liquid is discharged from the processing vessel to depressurize the processing vessel, and the substitution fluid is changed from the supercritical state to a gaseous state to dry the substrate.

Abstract: The present application relates to organosilicones and compositions such as consumer products comprising such organosilicones, as well as processes for making and using such organosilicones and such compositions. Such compositions comprising such organosilicones are easier to formulate, and provide more economical and superior care benefits when compared to current silicone containing compositions.

Abstract: Embodiments of the present disclosure include cleaning processes, cleaning machines, and methods of preventing acidification of a cleaning composition in a cleaning process. The cleaning process includes contacting an article having contaminants with a cleaning composition to remove the contaminants from the article, where the cleaning composition comes to have acidic components as a result of contacting the article with the cleaning composition, and where at least 85 percent by weight, based on a total weight of the cleaning composition, of the cleaning composition is an organic solvent, collecting the cleaning composition with the contaminants and the acidic components, separating the contaminants from the cleaning composition (114), and passing the cleaning composition with the acidic components over an ion exchange resin (125) to remove the acidic components from the cleaning composition.

Abstract: A rinse method for rinsing a substrate having an exposure pattern thereon developed includes presetting conditions for a rinse process according to surface states of the substrate, measuring a surface state of the substrate, selecting a corresponding condition for the rinse process based on the measured surface state of the substrate, and performing the rinse process under the selected condition.

Abstract: Embodiments of the present invention are directed to metallic solderability preservation coating on connectors of semiconductor package to prevent oxide. Singulated semiconductor packages can have contaminants, such as oxides, on exposed metal areas of the connectors. Oxidation typically occurs on the exposed metal areas when the semiconductor packages are not stored in appropriate environments. Copper oxides prevent the connectors from soldering well. An anti-tarnish solution of the present invention is used to coat the connectors during sawing, after sawing, or both of a semiconductor array to preserve metallic solderability. The anti-tarnish solution is a metallic solution, which advantageously allows the semiconductor packages to not need be assembled immediately after fabrication.

Abstract: This invention relates to fabric and home care products comprising one or more cold water proteases and processes for making and using such products. Such compositions provide improved cleaning and freshness. Such cold water proteases may be derived from parent enzymes, including BPN? subtilisin and subtilisin derived from Bacillus lentus, by substitution, insertion and/or deletion of one or more of the parent enzymes' amino acids.

Abstract: Semiconductor device fabrication equipment performs a PEOX (physical enhanced oxidation) process, and includes a remote plasma generator for cleaning a process chamber of the equipment. After a PEOX process has been preformed, a purging gas is supplied into the process chamber to purge the process chamber, and the remote plasma generator produces plasma using a first cleaning gas. Accordingly, a reactor of the remote plasma generator is cleaned by the first cleaning gas plasma. Subsequently, the purging gas is supplied to purge the process chamber, and the remote plasma generator produces plasma using a second cleaning gas to remove the first cleaning gas plasma from the remote plasma generator and the process chamber. Finally, full flush operations are performed to remove any gases remaining in the process chamber.

Abstract: The invention relates to a cleaning agent, characterized in that the cleaning agent comprises a microemulsion or a fluid nanophase system, and has the following components: a) at least one non-water-soluble substance having a solubility in water of less than 4 g per liter; b) at least one amphiphile substance, NP-MCA, that has no tenside structure, does not form structures on its own, has a solubility in water or oil between 4 g and 1000 g per liter, and preferably does not accumulate at the oil-water boundary, with the provision that NP-MCA is not selected from among 2-Ethyl-1,3-Hexanediol, 2-Methyl-2,4-Pentanediol, 2-(n-Butyl)-2-Ethyl-1,3-Propanediol and/or 1,2-Diols; c) at least one anionic, cationic, amphoteric and/or non-ionic tenside; d) water and/or a water-soluble solvent having hydroxyl functionality and, optionally, additives.

Abstract: A method of decontaminating an oxide layer-comprising surface of a component or a system of a nuclear facility. An acidic water film is produced on the surface, the film of water is brought into contact with a gaseous acid anhydride, and the oxide layer is treated with gaseous ozone as oxidizing agent.

Abstract: A method for selectively removing an aluminum-poor overlay coating from a substrate of a component, which as a result of its low aluminum content is highly resistant to a selective stripping solution. The method entails diffusing aluminum into the overlay coating to form an aluminum-infused overlay coating having an increased aluminum level in at least an outer surface thereof. The diffusion step is carried out so that the increased aluminum level is sufficient to render the aluminum-infused overlay coating removable by selective stripping. The outer surface of the aluminum-infused overlay coating is then contacted with an aqueous composition to remove the aluminum-infused overlay coating from the substrate. The aqueous composition includes at least one acid having the formula HxAF6, and/or precursors thereof, wherein A is Si, Ge, Ti, Zr, Al, and/or Ga, and x is from 1 to 6.

Abstract: A method for removing common contaminates or residues which include but are not limited to ionic residues, particulate residues and moisture from semiconductor wafers used in the manufacture of IC (integrated circuits), liquid crystal displays and flat panel displays. The process includes the use of certain esters or certain esters combined with particular co-solvents. The cleaning method may be utilized in a variety of cleaning processes or process steps and offers economic and performance advantages.

Abstract: According to one embodiment, a substrate having a plurality of adjacent patterns on one surface thereof is cleaned by cleaning liquid. Subsequently, after the cleaning liquid is displaced with pure water, the pure water is displaced with displacement liquid. Under a condition that the displacement liquid among the patterns does not vaporize, the displacement liquid not contributing to prevention of collapse of the patterns is removed. After the displacement liquid is removed, the substrate is held in supercritical fluid and the displacement liquid among the patterns is displaced with the supercritical fluid. After the displacement liquid among the patterns is displaced with the supercritical fluid, the supercritical fluid adhering to the substrate is vaporized.

Abstract: This disclosure relates to a persulfate-free dental appliance cleanser containing a low-concentration of chlorhexidine, or a pharmaceutically acceptable salt thereof.

Abstract: There is provided a substrate processing method including cleaning a substrate by immersing the substrate in a cleaning solution in a longitudinal direction while the cleaning solution is supplied to a cleaning tank; transferring the substrate picked up from the cleaning tank to a drying chamber while holding the substrate in a longitudinal direction; and drying the substrate in the drying chamber communicating with an upper area of the cleaning tank by alternately supplying a first drying gas containing vapor of a solvent for removing a liquid and a second drying gas without containing the vapor of the solvent for removing the liquid to an area where the substrate is exposed between the upper area of the cleaning tank and the drying chamber after an upper end of the cleaned substrate is picked up from a liquid surface of the cleaning solution.

Abstract: Disclosed herein is a cleaning method useful in removing contaminants from a surface of a coating which comprises an oxide or fluoride of a Group III B metal. Typically the coating overlies an aluminum substrate which is present as part of a semiconductor processing apparatus. The coating typically comprises an oxide or a fluoride of Y, Sc, La, Ce, Eu, Dy, or the like, or yttrium-aluminum-garnet (YAG). The coating may further comprise about 20 volume % or less of Al2O3.

Abstract: Disclosed is a substrate processing apparatus for cleaning and drying a substrate such as a semiconductor wafer. This substrate processing apparatus includes a liquid processing unit for processing a substrate by immersing the substrate in stored purified water, a drying unit arranged above the liquid processing unit and configured to dry the substrate, a substrate transfer apparatus for transferring the substrate between the liquid processing unit and drying unit, a fluid supply mechanism for supplying a fluid mixture containing vapor or mist of purified water and vapor or mist of a volatile organic solvent to the drying unit, and a controller for controlling the supply of the fluid mixture.

Abstract: In particular a porous substrate (FS) like a fabric. Process to clean a substrate, comprising a step of subjecting the substrate to an air-water spray (SPR), generated using a spraying means (N) comprising an air passage (OPA) and a water passage (OPW), wherein air is greater than 90% by volume of the spray, the air velocity is greater than 80 m/s and wherein said air passage does not coaxially surround said water passage. Device to clean soiled fabric (FS) comprising a feed water container (CW) and an air compressor (AC) in fluid communication with a spray nozzle (N) comprising an air passage and a water passage, said device being capable of generating an air pressure in the range of 1 to 3 bar (absolute) and an air velocity greater than 80 m/s at the exit of said nozzle; and the air is greater than 90% volume of said spray, and wherein said air passage does not coaxially surround said water passage. An external mix spray nozzle is especially preferred in the device.

Abstract: A method of machine cleaning dishes in a dishwasher, wherein over the course of a cleaning program, having a pre-rinsing operation and a cleaning operation, two liquid cleansers A and B having the following composition: A:—10 to 75 wt % of builder(s); ?0.1 to 10 wt % of enzyme(s); ?24.9 to 89.9 wt % of solvent; and B: ?10 to 74.9 wt % of builder(s); ?25 to 89.9 wt % of solvent; are metered into the wash bath at two successive times t1 and t2. The liquid cleanser A has a pH value (20° C.) of between 6 and 9 and is metered in at time t1, while the liquid cleanser B has a pH value (20° C.) of between 9 and 14 and is metered in at time t2.

Abstract: A method for preparing a biomaterial comprising the steps of acellularizing the fish scale to remove cell components, decalcifying the fish scale; and cleaning the fish scale, wherein in the step of acellularizing, it further including stirring constantly the fish scale in a solution comprised of an octylphenoxypolyethoxyethanol, a tris-buffered salt and a protease inhibition; and rinsing in a Hanks' buffered saline and the fish scale keeps the naturally 3-dimension microstructure after the step of acellularizing the fish scale.

Abstract: A remover composition containing 1,3-propanediamine (a), 1-hydroxyethylidene-1, 1-diphosphonic acid (b) and water, wherein the remover composition contains the component (a) in an amount of from 0.2 to 30% by weight, the component (b) in an amount of from 0.05 to 10% by weight, and the water in an amount of from 60 to 99.75% by weight, and wherein the composition has a pH at 20° C. of from 9 to 13; and a remover composition containing an organic amine (A), an organic phosphonic acid (B), a linear sugar alcohol (C) and water, wherein the remover composition contains the component (A) in an amount of from 0.2 to 30% by weight, the component (B) in an amount of from 0.05 to 10% by weight, the component (C) in an amount of from 0.1 to 10% by weight, and the water in an amount of from 50 to 99.65% by weight, and wherein the composition has a pH at 20° C. of from 9 to 13.

Abstract: A method for manufacturing a semiconductor device includes the step of conducting a cleaning process for a wafer formed with copper wiring lines to remove contaminations produced on a back surface of the wafer. The cleaning process is conducted by injecting onto the back surface of the wafer an etchant for removing contaminations and simultaneously injecting onto a front surface of the wafer a reductant containing hydrogen.

Abstract: A method of processing bone material using supercritical fluids is disclosed. The method comprises placing the bone material in a processing chamber, adding supercritical fluid to the processing chamber, pulsing the supercritical fluid in the processing chamber, and rinsing the bone material. A processing system for processing bone material using supercritical fluids in accordance with the present invention comprises a processing chamber for housing the bone material, a vat for storing a processing fluid, a pump, a heating element, a flow path, a tank, and a solvent port.