Electrostatic Field Or Electrical Discharge Patents (Class 204/164)
  • Patent number: 10443117
    Abstract: A plasma nitriding apparatus includes: a surface treatment unit which includes a treatment tank to house part of a treatment object inclusive of a surface treatment region, and performs a nitriding treatment on the surface treatment region inside of the treatment tank by using plasma of a treatment gas; and an outer container which receives supply of the treatment gas, and houses the treatment object and the treatment tank so that a region of the treatment object other than the part is exposed from the treatment tank.
    Type: Grant
    Filed: June 3, 2016
    Date of Patent: October 15, 2019
    Assignee: IHI Corporation
    Inventors: Norimitsu Kameya, Kenji Fuchigami
  • Patent number: 10441608
    Abstract: This invention relates generally to novel methods and novel devices for the continuous manufacture of nanoparticles, microparticles and nanoparticle/liquid solution(s). The nanoparticles (and/or micron-sized particles) comprise a variety of possible compositions, sizes and shapes. The particles (e.g., nanoparticles) are caused to be present (e.g., created and/or the liquid is predisposed to their presence (e.g., conditioned)) in a liquid (e.g., water) by, for example, preferably utilizing at least one adjustable plasma (e.g., created by at least one AC and/or DC power source), which plasma communicates with at least a portion of a surface of the liquid. At least one subsequent and/or substantially simultaneous adjustable electrochemical processing technique is also preferred. Multiple adjustable plasmas and/or adjustable electrochemical processing techniques are preferred.
    Type: Grant
    Filed: June 30, 2016
    Date of Patent: October 15, 2019
    Assignee: Clene Nanomedicine, Inc.
    Inventors: David Kyle Pierce, Mark G. Mortenson, David A. Bryce
  • Patent number: 10428455
    Abstract: A method of treating a substrate, comprising providing a substrate having a generally sheet or planar form or a fiber or yarn form; providing a colorant to be set at the surface of the substrate; and subjecting the substrate and colorant to reactive species from a plasma generated by an atmospheric plasma apparatus until the colorant is set at the surface of the substrate. A method of setting a colorant on a substrate, comprising performing an etch operation, or plasma pre-treatment to change surface charge, on a substrate using a plasma, particularly a plasma generated at atmospheric conditions, to create a desired surface texture, or surface charge, at the surface of substrate; and depositing a colorant on the surface under plasma or non-plasma conditions; and allowing the colorant to set at the surface of the substrate.
    Type: Grant
    Filed: December 5, 2014
    Date of Patent: October 1, 2019
    Assignee: The North Face Apparel Corp.
    Inventors: Justin Lee Gladish, Mary-Ellen Smith, Graham C. Page
  • Patent number: 10388984
    Abstract: A method for producing a graphite powder for a negative electrode of a lithium ion secondary battery, including a process of graphitizing a mixture of a carbon raw material powder and a silicon carbide powder, wherein a 90% particle diameter in a volume-based cumulative particle size distribution by laser diffraction method, D90, is 1 to 40 ?m, a silicon carbide content in a total mass of a carbon raw material and silicon carbide (mass of silicon carbide/total mass of the carbon raw material and silicon carbide) is 1 to 35 mass %, the ratio of a 50% particle diameter in a volume-based cumulative particle size distribution by laser diffraction method, D50, of the carbon raw material powder to D50 of silicon carbide powder (D50 of the carbon raw material powder/D50 of silicon carbide powder) is 0.40 to 4.0.
    Type: Grant
    Filed: May 10, 2016
    Date of Patent: August 20, 2019
    Assignee: SHOWA DENKO K.K
    Inventors: Yasuaki Wakizaka, Yoshikuni Sato, Daisuke Miyamoto
  • Patent number: 10342112
    Abstract: A linear flexible plasma generator having a function of cooling and temperature control. More efficient power control is possible, since a temperature of an electrode itself can be controlled in a state when plasma is discharged. In addition, since a temperature of the electrode surface can be decreased, use for the purposes of sterilization, neutralization, treatment, beauty treatment, and so on is possible.
    Type: Grant
    Filed: March 28, 2018
    Date of Patent: July 2, 2019
    Assignee: AGENCY FOR DEFENSE DEVELOPMENT
    Inventor: Hee-Soo Jung
  • Patent number: 10294383
    Abstract: The invention provides articles and methods for making such articles including a substrate coated on at least one region thereof with a layer of nanocomposites nano-cellulose materials and nanoparticles.
    Type: Grant
    Filed: March 6, 2018
    Date of Patent: May 21, 2019
    Assignee: Yissum Research Development Company of the Hebrew University of Jerusalem Ltd.
    Inventors: Oded Shoseyov, Yossef Paltiel, Shira Yochelis, Sigal Baruch-Sharon, Yuval Nevo
  • Patent number: 10273349
    Abstract: Fibers for fiber-reinforced resin of the present invention are fibers for fiber-reinforced resin to which a sizing agent is adhered. The fibers are at least one selected from carbon fibers and glass fibers, and an ester bond (—COO—) generated by denaturation of the sizing agent is present on surfaces of the fibers. A method for producing the same according to the present invention includes: subjecting fibers to which a sizing agent is adhered to at least one treatment selected from the group consisting of ozone oxidation, ultraviolet irradiation at a wavelength of 400 nm or less, and a plasma treatment. The fibers are at least one selected from carbon fibers and glass fibers. Thus, it is possible to provide carbon fibers having enhanced wettability to a matrix resin and thereby allowing the matrix resin to be impregnated between the fibers easily.
    Type: Grant
    Filed: March 11, 2014
    Date of Patent: April 30, 2019
    Assignee: KURASHIKI BOSEKI KABUSHIKI KAISHA
    Inventors: Masamichi Ito, Tadaharu Tanaka, Wataru Horimoto
  • Patent number: 10266940
    Abstract: In some embodiments a method of depositing a metal-containing layer atop a substrate disposed in a physical vapor deposition (PVD) chamber includes: providing a plasma forming gas to a processing region of the PVD chamber; providing a first amount of RF power to a target assembly disposed opposite the substrate to form a plasma within the processing region of the PVD chamber; sputtering source material from the target assembly to deposit a metal-containing layer onto the substrate, wherein the source material is at a first erosion state; and tuning an auto capacitance tuner coupled to a substrate support while sputtering source material to maintain an ion energy at a surface of the substrate within a predetermined range as the target erodes from the first erosion state to a second erosion state.
    Type: Grant
    Filed: February 22, 2016
    Date of Patent: April 23, 2019
    Assignee: APPLIED MATERIALS, INC.
    Inventors: Zhenbin Ge, Vivek Gupta, Adolph Miller Allen, Ryan Hanson
  • Patent number: 10269545
    Abstract: Methods for operating a plasma processing chamber are provided. One example method includes processing a substrate in the plasma processing chamber under vacuum. The processing of said substrate produces particulate residues that adhere to surfaces within an internal region of the plasma processing chamber. The method includes characterizing performance of the processing of the substrate and inspecting an internal region of the plasma processing chamber after processing said substrate without breaking said vacuum. The inspecting is configured to identify characteristics of said particulate residues on one or more surfaces of the internal region of the plasma processing chamber. The inspecting includes capturing optical data of said one or more surfaces. The method further includes generating a tool model to correlate the characterized performance of the processing of the substrate to the characterized particulate residues.
    Type: Grant
    Filed: July 21, 2017
    Date of Patent: April 23, 2019
    Assignee: Lam Research Corporation
    Inventor: Richard Alan Gottscho
  • Patent number: 10260145
    Abstract: A film formation apparatus includes a chamber that is a sealed container in which a target formed of a film formation material is placed, and into which the workpiece is carried, a gas discharging unit discharging a gas in the sealed container for a predetermined time period after the workpiece is carried into the chamber to obtain a base pressure, and a sputter gas introducing unit introducing a sputter gas containing oxygen to the interior of the chamber having undergone the discharging and becoming the base pressure. The sputter gas introducing unit decreases an oxygen partial pressure in the sputter gas to be introduced in the chamber in accordance with an increase in the base pressure due to an increase of the film formation material sticking to the interior of the chamber.
    Type: Grant
    Filed: March 17, 2017
    Date of Patent: April 16, 2019
    Assignee: Shibaura Mechatronics Corporation
    Inventor: Daisuke Ono
  • Patent number: 10211032
    Abstract: A microwave plasma source radiating a microwave in a chamber of a plasma processing apparatus to generate surface wave plasma includes a microwave output unit configured to generate and output a microwave, a microwave supply unit configured to transmit the microwave output from the microwave output unit, and a microwave radiation member configured as a ceiling wall of the chamber and configured to radiate the microwave supplied from the microwave supply unit into the chamber. The microwave supply unit includes microwave introduction mechanisms provided along a circumferential direction, thereby introducing the microwave to the microwave radiation member. The microwave radiation member includes slot antennas having slots through which the microwave is radiated and a microwave transmission member. The slots are provided to form a circular shape as a whole. The microwave transmission member provided to form a circular ring shape.
    Type: Grant
    Filed: December 10, 2014
    Date of Patent: February 19, 2019
    Assignee: TOKYO ELECTRON LIMITED
    Inventors: Tomohito Komatsu, Taro Ikeda, Yutaka Fujino
  • Patent number: 10137427
    Abstract: The present invention relates to a nanoparticle preparation device using laser, and more particularly, the nanoparticle preparation device using the laser wherein the nanoparticles prepared by irradiating the laser beam to the source material gas within the reaction chamber are recovered without being oxidized by blocking the air or moisture within the glove box in which the nitrogen atmosphere is maintained, and thus the nanoparticles are efficiently collected without oxidation.
    Type: Grant
    Filed: October 15, 2015
    Date of Patent: November 27, 2018
    Assignee: SHONANO CO., LTD
    Inventor: Won Il Cho
  • Patent number: 10105673
    Abstract: A treatment liquid production device includes a first tank; a first plasma generating device that includes a first pair of electrodes and a first power supply, the first power supply applying a voltage between the first pair of electrodes, the first plasma generating device generating plasma in a liquid in the first tank; a second tank; a second plasma generating device that includes a second pair of electrodes and a second power supply, the second power supply applying a voltage between the second pair of electrodes, the second plasma generating device generating plasma in a liquid in the second tank; and a controller operative to produce a first treatment liquid having a high initial oxidizing power during a first period and a second treatment liquid having a high remaining oxidizing power during a second period which is longer than the first period.
    Type: Grant
    Filed: May 28, 2015
    Date of Patent: October 23, 2018
    Assignee: PANASONIC INTELLECTUAL PROPERTY MANAGEMENT CO., LTD.
    Inventors: Katsumi Imada, Mariko Miyashita, Yoshiko Miyamoto
  • Patent number: 10101087
    Abstract: A method and process system of comprehensively utilizing high-temperature slag balls exiting a rotary kiln in a kiln process for producing phosphoric acid, comprising a rotary kiln, a cooling device and a dryer for composite green pellets in a kiln process for producing phosphoric acid, wherein the cooling device comprises at least two cooling stages; the high-temperature slag balls are first conveyed to the cooling device, then the cooling device carries slag balls successively to multiple cooling stages by the movement of a trolley, each cooling stage introduces cold air for cooling, a part of the hot air after cooling is sent to the cavity of the rotary kiln, and the other part thereof is sent to the dryer for composite green pellets in the kiln process for producing phosphoric acid for drying.
    Type: Grant
    Filed: December 3, 2015
    Date of Patent: October 16, 2018
    Assignee: SICHUAN KO CHANG TECHNOLOGY CO., LTD.
    Inventors: Yonghe Hou, Jiabin Wang, Shenghui Lei, Jing Li
  • Patent number: 10103123
    Abstract: Various embodiments provide a semiconductor device, including a final metal layer having a top side and at least one sidewall; and a passivation layer disposed over at least part of at least one of the top side and the at least one sidewall of the final metal layer; wherein the passivation layer has a substantially uniform thickness.
    Type: Grant
    Filed: March 10, 2017
    Date of Patent: October 16, 2018
    Assignee: Infineon Technologies AG
    Inventors: Michael Rogalli, Wolfgang Lehnert
  • Patent number: 10058895
    Abstract: A technique relates sorting entities. The entities are introduced into a nanopillar array. The entities include a first population and a second population, and the nanopillar array includes nanopillars arranged to have a gap separating one from another. The nanopillars are ordered to have an array angle relative to a fluid flow direction. The entities are sorted through the nanopillar array by transporting the first population of the entities less than a predetermined size in a first direction and by transporting the second population of the entities at least the predetermined size in a second direction different from the first direction. The nanopillar array is configured to employ the gap with a gap size less than 300 nanometers in order to sort the entities having a sub-100 nanometer size.
    Type: Grant
    Filed: April 27, 2015
    Date of Patent: August 28, 2018
    Assignee: INTERNATIONAL BUSINESS MACHINES CORPORATION
    Inventors: Yann A. Astier, Joshua T. Smith, Gustavo A. Stolovitzky, Chao Wang, Benjamin H. Wunsch
  • Patent number: 10052404
    Abstract: The invention provides a biocompatible component having a surface intended for contact with living tissue, wherein the surface comprises particles of metal oxide, said particles having an average particle size of less than 100 nm.
    Type: Grant
    Filed: May 10, 2012
    Date of Patent: August 21, 2018
    Assignee: Dentsply Sirona Inc.
    Inventors: Elisabet Ahlberg, Ingela Mattisson, Johanna Löberg
  • Patent number: 10046989
    Abstract: An electrochemical system and method are disclosed for On Site Generation (OSG) of oxidants, such as free available chlorine, mixed oxidants and persulfate. Operation at high current density, using at least a diamond anode, provides for higher current efficiency, extended lifetime operation, and improved cost efficiency. High current density operation, in either a single pass or recycle mode, provides for rapid generation of oxidants, with high current efficiency, which potentially allows for more compact systems. Beneficially, operation in reverse polarity for a short cleaning cycle manages scaling, provides for improved efficiency and electrode lifetime and allows for use of impure feedstocks without requiring water softeners. Systems have application for generation of chlorine or other oxidants, including mixed oxidants providing high disinfection rate per unit of oxidant, e.g. for water treatment to remove microorganisms or for degradation of organics in industrial waste water.
    Type: Grant
    Filed: April 23, 2015
    Date of Patent: August 14, 2018
    Assignee: Advanced Diamond Technologies, Inc.
    Inventors: Ian Wakefield Wylie, Prabhu U. Arumugam, Hongjun Zeng, John Arthur Carlisle
  • Patent number: 10036990
    Abstract: An image forming system includes: an image forming unit that forms a toner image on a sheet; a post-processing unit that performs post-processing to the sheet; a conveying unit that conveys the sheet from the image forming unit to the post-processing unit; a discharge member that is arranged between the image forming unit and the post-processing unit in a sheet conveying direction, and discharges static electricity from the sheet conveyed by the conveying unit; a voltage applying unit that applies to the discharge member a discharge voltage for discharging static electricity from the sheet; and a control unit that accelerates a conveying speed of the sheet when the discharge voltage is applied by the voltage applying unit, and controls the conveying unit to vary acceleration timing for accelerating the conveying speed of the sheet in accordance with a type of the post-processing.
    Type: Grant
    Filed: November 17, 2016
    Date of Patent: July 31, 2018
    Assignee: KONICA MINOLTA, INC.
    Inventor: Yuki Adachi
  • Patent number: 10035192
    Abstract: This invention relates generally to novel methods and novel devices for the continuous manufacture of nanoparticles, microparticles and nanoparticle/liquid solution(s) (e.g., colloids). The nanoparticles (and/or micron-sized particles) comprise a variety of possible compositions, sizes and shapes. The particles (e.g., nanoparticles) are caused to be present (e.g., created and/or the liquid is predisposed to their presence (e.g., conditioned)) in a liquid (e.g., water) by, for example, preferably utilizing at least one adjustable plasma (e.g., created by at least one AC and/or DC power source), which plasma communicates with at least a portion of a surface of the liquid. At least one subsequent and/or substantially simultaneous adjustable electrochemical processing technique is also preferred. Multiple adjustable plasmas and/or adjustable electrochemical processing techniques are preferred. Processing enhancers can be utilized alone or with a plasma. Semicontinuous and batch processes can also be utilized.
    Type: Grant
    Filed: August 25, 2014
    Date of Patent: July 31, 2018
    Assignee: Clene Nanomedicine, Inc.
    Inventors: David Kyle Pierce, Mark Gordon Mortenson, David Andrew Bryce, Adam Robert Dorfman, Mikhail Merzliakov, Arthur Maxwell Grace
  • Patent number: 10037832
    Abstract: The separation of single-walled carbon nanotubes (SWNTs), by electronic type using centrifugation of compositions of SWNTs and surface active block copolymers in density gradient media.
    Type: Grant
    Filed: May 18, 2015
    Date of Patent: July 31, 2018
    Assignee: Northwestern University
    Inventors: Mark C. Hersam, Alexander L. Antaris, Alexander A. Green
  • Patent number: 10023470
    Abstract: A controlled preparation of octachlorotrisilane and higher polychlorosilane such as DCTS and DCPS from monomeric chlorosilane, proceeds by exposing the chlorosilane to a nonthermal plasma and recycling chlorosilane that has not been converted to octachlorotrisilane into the plasma.
    Type: Grant
    Filed: April 25, 2016
    Date of Patent: July 17, 2018
    Assignee: EVONIK DEGUSSA GMBH
    Inventors: Imad Moussallem, Juergen Erwin Lang, Hartwig Rauleder, Martin Trocha, Nicole Brausch
  • Patent number: 10000709
    Abstract: A hydrocarbon resource processing device may include a radio frequency (RF) source and an RF applicator coupled to the RF source. The RF applicator may include a base member being electrically conductive, and first and second elongate members being electrically conductive and having proximal ends coupled to the base member and extending outwardly therefrom in a generally parallel spaced apart relation. The first and second elongate members may have distal ends configured to receive the hydrocarbon resource therebetween. In another embodiment, the RF applicator may include an enclosure being electrically conductive and having a passageway therethrough to accommodate a flow of the hydrocarbon resource and a divider being electrically conductive and positioned within the enclosure.
    Type: Grant
    Filed: June 2, 2016
    Date of Patent: June 19, 2018
    Assignee: HARRIS CORPORATION
    Inventor: Francis Eugene Parsche
  • Patent number: 9984860
    Abstract: An apparatus and methods to increase and direct the spatial volume of atmospheric pressure plasma jets. One or more additional gas flows is introduced to intersect the plasma jet. As the plasma jet interacts with these additional gas flows, the direction of propagation of the plasma jet is altered, the plasma expands into the volume defined by the additional gas flow, and the volume and effective surface area of the plasma jet increases accordingly, while the power increase needed to drive the increase in plasma volume scales sub-linearly with the increase in volume.
    Type: Grant
    Filed: October 27, 2017
    Date of Patent: May 29, 2018
    Assignee: The United States of America, as represented by the Secretary of the Navy
    Inventors: Scott G. Walton, David R. Boris, Tzvetelina Petrova, Eric D. Gillman
  • Patent number: 9975147
    Abstract: A technique relates sorting entities. The entities are introduced into a nanopillar array. The entities include a first population and a second population, and the nanopillar array includes nanopillars arranged to have a gap separating one from another. The nanopillars are ordered to have an array angle relative to a fluid flow direction. The entities are sorted through the nanopillar array by transporting the first population of the entities less than a predetermined size in a first direction and by transporting the second population of the entities at least the predetermined size in a second direction different from the first direction. The nanopillar array is configured to employ the gap with a gap size less than 300 nanometers in order to sort the entities having a sub-100 nanometer size.
    Type: Grant
    Filed: June 24, 2015
    Date of Patent: May 22, 2018
    Assignee: INTERNATIONAL BUSINESS MACHINES CORPORATION
    Inventors: Yann A. Astier, Joshua T. Smith, Gustavo A. Stolovitzky, Chao Wang, Benjamin H. Wunsch
  • Patent number: 9943871
    Abstract: An electrode rod 71 serving as a first electrode is provided to be in contact with a flow path member and a processing liquid of a processing liquid supply path 2. If the processing liquid is flown in the processing liquid supply path 2, static electricity is generated by friction so that the processing liquid and the flow path member is electrically charged. By allowing the electrode rod 71 to be closely contacted with the flow path member, the amount of electric charges corresponding to the sum of the charge amounts of the processing liquid and the flow path member is measured as a surface potential of the first electrode by a surface potential measuring unit 77. The measured surface potential is displayed on a display unit 201.
    Type: Grant
    Filed: September 26, 2016
    Date of Patent: April 17, 2018
    Assignee: TOKYO ELECTRON LIMITED
    Inventor: Hitoshi Hashima
  • Patent number: 9942986
    Abstract: Components may have substrates with metal traces that form mating contacts. The components may be bonded together using anisotropic conductive adhesive bonding techniques. During bonding, conductive particles may be concentrated over the contacts by application of magnetic or electric fields or by using a template transfer process. Gaps between the contacts may be at least partially free of conductive particles to help isolate adjacent contacts. Polymer between the substrates may attach the substrates together. The conductive particles may be embedded in the polymer and crushed or melted to short opposing contacts together.
    Type: Grant
    Filed: January 6, 2017
    Date of Patent: April 10, 2018
    Assignee: Apple Inc.
    Inventors: Koohee Han, Hui Chen, Kuo-Hua Sung, Cyrus Y. Liu, To C. Tan
  • Patent number: 9932258
    Abstract: An apparatus and process for making glass and glass gobs on demand. A sheet of molten glass is provided in a staging section. The sheet of molten glass is held within the staging section when there is no demand for glass articles. When there is a demand for production of glass articles, a portion of the sheet of molten glass is flowed into a gob forming section.
    Type: Grant
    Filed: April 17, 2014
    Date of Patent: April 3, 2018
    Assignee: Owens-Brockway Glass Container Inc.
    Inventor: Terence J Clark
  • Patent number: 9926420
    Abstract: Hydrophilic fluoroplastic substrates and methods of making hydrophilic fluoroplastic substrates from 4-acryloylmorpholine are disclosed.
    Type: Grant
    Filed: June 4, 2014
    Date of Patent: March 27, 2018
    Assignee: 3M Innovative Properties Company
    Inventors: Robert S. Clough, Wenli Wang
  • Patent number: 9926195
    Abstract: The present teachings provide methods for providing populations of single-walled carbon nanotubes that are substantially monodisperse in terms of diameter, electronic type, and/or chirality. Also provided are single-walled carbon nanotube populations provided thereby and articles of manufacture including such populations.
    Type: Grant
    Filed: December 3, 2010
    Date of Patent: March 27, 2018
    Assignee: Northwestern University
    Inventors: Michael S. Arnold, Mark C. Hersam, Samuel I. Stupp
  • Patent number: 9922851
    Abstract: A wafer bonding method includes placing a top wafer on a top bonding framework including a plurality of outlet holes around a periphery of the top bonding framework. A bottom wafer is placed on a bottom bonding framework that includes a plurality of inlet holes around a periphery of the bottom bonding framework. The top bonding framework is in overlapping relation to the bottom bonding framework such that a gap exist between the top wafer and the bottom wafer. A gas stream is circulated through the gap between the top wafer and the bottom wafer entering the gap through one or more of the plurality of inlet holes and exiting the gap through one or more of the plurality of outlet holes. The gas stream replaces any existing ambient moisture from the gap between the top wafer and the bottom wafer.
    Type: Grant
    Filed: May 5, 2014
    Date of Patent: March 20, 2018
    Assignee: International Business Machines Corporation
    Inventors: Wei Lin, Spyridon Skordas, Robert R. Young, Jr.
  • Patent number: 9889218
    Abstract: The invention relates to an electrode arrangement (1) for generating a non-thermal plasma, comprising: a layer-shaped first electrode (2) made of an electrically conductive material, a layer-shaped second electrode (4) made of an electrically conductive material, wherein the second electrode (4) is electrically insulated from the first electrode (2), and a dielectric barrier (3) being arranged between the first electrode (2) and the second electrode (4), so that the non-thermal plasma is generated by a dielectric barrier discharge. The inventive electrode arrangement is characterized in that at least one of the first electrode (2) and the second electrode (4) comprises several perforations which are distributed over the electrode.
    Type: Grant
    Filed: March 13, 2009
    Date of Patent: February 13, 2018
    Assignee: MAX-PLANCK-GESELLSCHAFT ZUR FOERDERUNG DER WISSENSCHAFTEN E.V.
    Inventors: Gregor Eugen Morfill, Bernd Steffes, Tetsuji Shimizu
  • Patent number: 9887069
    Abstract: A plasma processing system for processing at least a substrate with plasma. The plasma processing chamber is capable of controlling ion energy distribution. The plasma processing system may include a first electrode. The plasma processing system also includes a second electrode that is different from the first electrode and is configured for bearing the substrate. The plasma processing system may also include a signal source coupled with the first electrode. The signal source may provide a non-sinusoidal signal through the first electrode to control ion energy distribution at the substrate when the substrate is processed in the plasma processing system, wherein the non-sinusoidal signal is periodic.
    Type: Grant
    Filed: December 10, 2009
    Date of Patent: February 6, 2018
    Assignee: Lam Research Corporation
    Inventors: Andreas Fischer, Eric Hudson
  • Patent number: 9887020
    Abstract: A composition including graphene; and at least one dopant selected from the group consisting of an organic dopant and an inorganic dopant.
    Type: Grant
    Filed: July 30, 2010
    Date of Patent: February 6, 2018
    Assignee: SAMSUNG ELECTRONICS CO., LTD.
    Inventors: Hyeon-jin Shin, Won-mook Choi, Jae-young Choi, Seon-mi Yoon
  • Patent number: 9884027
    Abstract: A system for manufacturing an artificial construct suitable for transplantation into a biological organism that includes a two or three three-dimensional preform that is based on the actual two or three-dimensional structure of a native mammalian tissue; and an electrospinning apparatus, wherein the electrospinning apparatus is operative to deposit at least one layer of polymer fibers on the preform to form a polymer scaffold, and wherein the orientation of the fibers in the scaffold relative to one another is substantially parallel.
    Type: Grant
    Filed: January 14, 2013
    Date of Patent: February 6, 2018
    Assignee: NANOFIBER SOLUTIONS, INC.
    Inventor: Jed K. Johnson
  • Patent number: 9869051
    Abstract: A dryer for a wall-mounted washing machine is disclosed. The dryer provides a duct passage that is curved in multiple ways, and that has a heater and a fan. Therefore, the dryer may be installed in a wall-mounted washing machine having a relatively small or narrow accommodating space. The dryer may have a relatively high gas flow rate and/or flow velocity. That is, the dryer may implement a function for drying laundry.
    Type: Grant
    Filed: December 31, 2013
    Date of Patent: January 16, 2018
    Assignee: Dongbu Daewoo Electronics Corporation
    Inventor: Seong Bo Hong
  • Patent number: 9855354
    Abstract: The present invention relates to an apparatus for sterilization which may be applied to a medical dry sterilizer, and more particularly, to an apparatus which injects hydrogen peroxide so as to generate plasma and OH radicals which are effective in sterilization, so as to achieve the sterilization of a treated object. According to the present invention, the apparatus for sterilization comprises: a sterilizing reactor in which sterilization is performed on a treated object; a vacuuming unit which is equipped with a vacuum pump connected to the sterilizing reactor and which vacuumizes the interior of the sterilizing reactor; a hydrogen-peroxide supply unit which supplies hydrogen peroxide in a gas state to the interior of the sterilizing reactor; and a microwave-plasma generating unit which generates plasma using microwaves.
    Type: Grant
    Filed: June 4, 2012
    Date of Patent: January 2, 2018
    Assignee: KOREA BASIC SCIENCE INSTITUTE
    Inventors: Tai Hyeop Lho, Dong Chan Seok
  • Patent number: 9839908
    Abstract: A device comprising, a substrate having a droplet thereover, and an electrical source coupleable to the substrate. The electrical source is configured to apply a voltage between the substrate and the droplet using an electrode. The electrode has a first portion and a second portion non-symmetric to the first portion, the first and second portions defined by a plane located normal to a longitudinal axis and through a midpoint of a length of the electrode.
    Type: Grant
    Filed: April 8, 2014
    Date of Patent: December 12, 2017
    Assignee: Alcatel Lucent
    Inventors: Joanna Aizenberg, Paul Robert Kolodner, Thomas Nikita Krupenkin
  • Patent number: 9834442
    Abstract: A reactor for reforming a liquid hydrocarbon fuel, and associated processes and systems, are described herein. In one example, a two stage process is disclosed in which a first reactor is coupled to a second stage reactor having a reaction volume greater than the first reactor. In the first reactor, the liquid hydrocarbon fuel is partially reformed and thereafter is inputted into the second stage reactor for complete partial oxidation. The reaction product is at last partially synthesis gas, a mixture of carbon monoxide, hydrogen, as well as other low hydrocarbons such as methane, ethylene, ethane, and acetylene. The low hydrocarbons can be reformed further in a solid oxide fuel cell. A portion of the gaseous, rotating contents of the second stage reactor may be input into the first reactor to help generate and sustain rotation within the first reactor.
    Type: Grant
    Filed: February 18, 2011
    Date of Patent: December 5, 2017
    Assignee: Drexel University
    Inventors: Alexander Rabinovich, Michael Gallagher, Alexander Fridman, Anatoliy Polevich, Alexander F. Gutsol
  • Patent number: 9823567
    Abstract: A manufacturing method of a mask plate for shielding during sealant-curing includes: forming a negative photoresist light-shielding material layer on a transparent substrate; with a color-filter mask plate set, exposing the substrate formed with the negative photoresist light-shielding material layer; developing the substrate after exposing to form the pattern of the mask plate. The method does not require separate fabrication of a mask plate, thereby significantly reducing the manufacturing costs of the mask plate for shielding during sealant-curing.
    Type: Grant
    Filed: June 14, 2013
    Date of Patent: November 21, 2017
    Assignees: BOE TECHNOLOGY GROUP CO., LTD., HEFEI BOE OPTOELECTRONICS TECHNOLOGY CO., LTD.
    Inventors: Yong Liu, Xiaohe Li, Hongmin Li, Xianjie Shao, Qinghua Jiang
  • Patent number: 9809039
    Abstract: A plasma generating device includes a first plasma electrode and a counter electrode facing each other. The first plasma electrode extends in a lateral direction and includes two projections. Each of the two projections protrudes from the first plasma electrode in the direction of the counter electrode over a predetermined distance. The plasma generating device further includes a preload mechanism adapted for urging each of said two projections of the first plasma electrode against the counter electrode. The two projections cooperatively define a plasma gap between the first plasma electrode and the counter electrode. The counter electrode includes a support surface facing said plasma gap. The support surface is substantially flat along the plasma gap.
    Type: Grant
    Filed: September 26, 2016
    Date of Patent: November 7, 2017
    Assignee: OCE-TECHNOLOGIES B.V.
    Inventors: Guido G. Willems, Hermanus M. Kuypers
  • Patent number: 9750833
    Abstract: An apparatus and method of producing an atmospheric non-equilibrium plasma (ANEP) in a sealed container having a selected working gas and an object to be treated is described. A variety of working gas mixtures including air, O2, N2, CO2, He and Ar, in combination with a range of ionization gradients, voltages and ANEP column lengths was investigated so as to establish effective ranges of the variables using the sterilization of a sample as a measure of effectiveness. Certain combinations of working gas, voltage gradient, voltage or ANEP column length were found to have greater effectiveness. The approach may be used for food products, medical equipment, or other objects where treatment with reactive gas atmospheres is effective.
    Type: Grant
    Filed: August 3, 2016
    Date of Patent: September 5, 2017
    Assignee: PURDUE RESEARCH FOUNDATION
    Inventors: Kevin M. Keener, Jeanette L. Jensen
  • Patent number: 9728940
    Abstract: The invention relates to a method for surface treating a substrate (28) by means of an electrical corona discharge, wherein aerosols (5) are sprayed into discharge area defined by an active gap formed between a corona electrode and the substrate (28) during the discharging, designed such that the aerosols (5) are sprayed substantially opposite the direction of gravity.
    Type: Grant
    Filed: November 24, 2010
    Date of Patent: August 8, 2017
    Assignee: KALWAR CIV INNOSERV GMBH & CO. KG
    Inventor: Klaus Kalwar
  • Patent number: 9708201
    Abstract: A liquid treatment apparatus includes a dielectric tube through which water to be treated flows, a first electrode, at least one end of which is dispose in the dielectric tube, and a second electrode made of a conductive metallic material, at least one end of the second electrode being disposed in the dielectric tube and on an upstream side of a flow pass of the water relative to the first electrode. The conductive metallic material of the second electrode is adapted to be in direct contact with the water to be treated. The liquid treatment apparatus also includes a power supply for applying a voltage between the first electrode and the second electrode, and a heat-resistant member covering at least a portion of an inner wall face of the dielectric tube. The portion of the inner wall faces the first electrode.
    Type: Grant
    Filed: November 1, 2014
    Date of Patent: July 18, 2017
    Assignee: PANASONIC INTELLECTUAL PROPERTY MANAGEMENT CO., LTD.
    Inventors: Masaki Fujikane, Mari Onodera, Shin-Ichi Imai
  • Patent number: 9662870
    Abstract: A dispensing jig and a device including the same are provided. The dispensing jig includes a jig body defining a positioning chamber which has an opening and is configured to position a first adhesive surface of a first object. The first adhesive surface is a surface of the first object to be adhered to a second adhesive surface of a second object. An anti-sticking layer is provided on each of an upper surface of a periphery of the opening facing the second adhesive surface and an inner circumferential wall surface of the opening.
    Type: Grant
    Filed: December 21, 2015
    Date of Patent: May 30, 2017
    Assignee: XIAOMI INC.
    Inventors: Gaocai Han, Yuan Gao, Duo Xu, Xinhua Sun
  • Patent number: 9650252
    Abstract: The pretreatment method for carbon nanotube formation according to the present invention comprises a first plasma treatment process in which catalytic metal fine particles are formed by applying plasma to a catalytic metal layer and atomizing the catalytic metal, and a second plasma treatment process in which the catalytic metal fine particles are activated by applying plasma of a gas mixture, in which a hydrogen-containing gas and a nitrogen gas are mixed, to the catalytic metal fine particles. A co-catalyst layer formed of nitride such as TiN and TaN is preferably disposed below the catalytic metal layer. The co-catalyst layer is nitrated by the plasma of the gas mixture including the hydrogen-containing gas and the nitrogen gas and the activation ratio of the catalytic metal fine particles is increased.
    Type: Grant
    Filed: July 9, 2012
    Date of Patent: May 16, 2017
    Assignee: TOKYO ELECTRON LIMITED
    Inventor: Takashi Matsumoto
  • Patent number: 9617965
    Abstract: A system and method for providing multiple fast rising pulses to improve performance efficiency. In one approach, multiple fast rising pulse power is employed to improve fuel efficiency and power of an engine. The system and method can involve a transient plasma plug assembly intended to replace a traditional spark plug. Alternatively, an approach involving a pulse generator and a high voltage pulse carrying ignition cable is contemplated.
    Type: Grant
    Filed: December 15, 2014
    Date of Patent: April 11, 2017
    Assignee: Transient Plasma Systems, Inc.
    Inventors: Jason M. Sanders, Daniel Singleton, Andras Kuthi, Martin A. Gundersen
  • Patent number: 9599405
    Abstract: An apparatus for cooling a reactive mixture, comprising: a reactor configured to form the reactive mixture; a quench chamber comprising a frusto-conical body having a wide end, a narrow end, and a quench region formed between the wide and narrow end, wherein the quench chamber is configured to receive the reactive mixture from the plasma reactor through a reactive mixture inlet into the quench region, to receive a conditioning fluid through at least one fluid inlet, and to flow the conditioning fluid into the quench region, wherein the frusto-conical body is configured to produce a turbulent flow within the quench region with the flow of the conditioning fluid into the quench region, thereby promoting the quenching of the reactive mixture to form a cooled gas-particle mixture; and a suction generator configured to force the cooled gas-particle mixture out of the quench chamber.
    Type: Grant
    Filed: October 12, 2015
    Date of Patent: March 21, 2017
    Assignee: SDCmaterials, Inc.
    Inventors: Maximilian A. Biberger, Frederick P. Layman
  • Patent number: 9593030
    Abstract: A liquid treatment apparatus includes a dielectric tube through which water to be treated flows, a first electrode at least a part of which is disposed in the dielectric tube, a second electrode at least a part of which is disposed in the dielectric tube at a position upstream of the first electrode, a gas supplier operative to generate a bubble by supplying a gas into the water to be treated, and a power supply operative to apply a voltage between the first electrode and the second electrode in a state in which the bubble covers a conductor-exposed portion of the first electrode.
    Type: Grant
    Filed: April 23, 2015
    Date of Patent: March 14, 2017
    Assignee: PANASONIC INTELLECTUAL PROPERTY MANAGEMENT CO., LTD.
    Inventors: Masaki Fujikane, Mari Onodera, Shin-ichi Imai
  • Patent number: RE47582
    Abstract: A free radical sterilization system having a chamber defining a region, and a generator for generating free radical reach effluent from a free radical electric generator and/or a vaporizer. A closed loop circulating system without a free-radical destroyer is provided for supplying the mixture of free radicals from the electric generator mixed with the hydrogen peroxide solution in the form of the effluent to the chamber. The free-radical sterilization system is used in sterilizing items in the chamber and, with an open-bottomed wound chamber, in treating wounds on a body.
    Type: Grant
    Filed: June 23, 2016
    Date of Patent: August 27, 2019
    Assignee: STERIFRE MEDICAL, INC.
    Inventor: Czeslaw Golkowski