Electrostatic Field Or Electrical Discharge Patents (Class 204/164)
  • Patent number: 12022761
    Abstract: The invention relates to a method for coating plant seed, to a seed coating composition, to a coated plant seed, to a use of one or more water-insoluble polymers with a Tg of at least 35° C., to a method of preparing a seed coating composition, to a method of preparing coated seed, to coated seed, to a use of an abrasive material primer or plasma, and to an apparatus for coating of seed. The method for coating plant seed comprises applying to the seed a seed coating composition comprising one or more water-insoluble polymers with a Tg of at least 35° C.
    Type: Grant
    Filed: June 15, 2015
    Date of Patent: July 2, 2024
    Assignee: Incotec Holding B.V.
    Inventors: Henricus Antonius Maria Reus, Jantien Glas, Jérôme Sylvain Garnier, Pieter Wilhelmus Johannes Samuels
  • Patent number: 12006074
    Abstract: Disclosed is a Multi-Use Dust Mitigation System (“MDMS”). The MDMS includes a finger section, a hand section physically attached to the finger section, a fabric-material within both the finger section and hand section, a plurality of conductive-fibers within the fabric-material, and a plurality of input-nodes approximately adjacent to the fabric-material. The fabric-material includes a front-surface and a back-surface. The plurality of conductive-fibers are approximately parallel along the fabric-material and are approximately adjacent to the front-surface of the fabric-material. The plurality of input-nodes are in signal communication with the plurality of conductive-fibers and configured to receive an alternating-current (“AC”) voltage-signal from an input-signal-source and the plurality of conductive-fibers are configured to generate an electric-field on the front-surface of the fabric-material in response to the plurality of input-nodes receiving the AC voltage-signal from the input-signal-source.
    Type: Grant
    Filed: July 9, 2018
    Date of Patent: June 11, 2024
    Assignee: The Boeing Company
    Inventors: Kavya K. Manyapu, Leora Peltz
  • Patent number: 11891316
    Abstract: Plasma discharges and electromagnetic fields may be applied to a liquid, such as water, to treat unwanted material in the liquid.
    Type: Grant
    Filed: July 17, 2017
    Date of Patent: February 6, 2024
    Inventors: Desmond A. Fraser, Patrick J. Hughes, Hossein Ghaffari Nik, Akrem Hassen Adem Aberra, Richard B. McMurray, Shelley Marie Grandy
  • Patent number: 11832662
    Abstract: An apparatus includes multiple first reservoirs and multiple second reservoirs joined with a substrate. Selected ones of the multiple first reservoirs include a reducing agent, and first reservoir surfaces of selected ones of the multiple first reservoirs are proximate to a first substrate surface. Selected ones of the multiple second reservoirs include an oxidizing agent, and second reservoir surfaces of selected ones of the multiple second reservoirs are proximate to the first substrate surface.
    Type: Grant
    Filed: May 18, 2020
    Date of Patent: December 5, 2023
    Assignee: Vomaris Innovations, Inc.
    Inventors: Michael Nagel, Mary Maijer
  • Patent number: 11802262
    Abstract: The present invention provides a system for accelerating the food oxidation rate, comprising a control unit, a baseband circuit, a radio-frequency circuit and an array of antennas. The control unit is used to generate a digital control signal of a spectrum waveform. The baseband and radio-frequency circuits generate analog signal of millimeter-wave according to the control signal of a spectrum waveform. The baseband circuit and the array of antennas emit the analog signal of millimeter-wave toward the food, wherein the analog signal of millimeter-wave has a plurality of first frequency signals and a plurality of second frequency signals, and the first frequency signals and the second frequency signals are alternately arranged and spaced from each other and comprise a plurality of sinusoidal waveforms.
    Type: Grant
    Filed: July 6, 2018
    Date of Patent: October 31, 2023
    Assignee: Millitronic Co., Ltd.
    Inventors: Ya-Chung Yu, Chih-Min Lin
  • Patent number: 11762262
    Abstract: A cavity-enhanced frequency mixer includes an input optical fiber, a waveguide, and an output optical fiber. The waveguide has an input end and an output end, the input end is connected to the input optical fiber, and a surface of the input end of the waveguide is coated with a highly reflective coating. The output optical fiber is formed with a fiber Bragg grating structure. The highly reflective coating and the fiber Bragg grating structure form a pair of reflective surfaces for resonant optical parametric oscillation under a low threshold situation, so that one of the beams generated by the input beam is reflected inside the partially reflective surfaces. Operated above a pump power threshold, the cavity-enhanced frequency mixer is tantamount to a compact, low-power budget optical parametric oscillator, while below the pump power threshold, it is a bright, compact, single-mode and narrow linewidth single-photon source.
    Type: Grant
    Filed: May 27, 2022
    Date of Patent: September 19, 2023
    Assignee: HC PHOTONICS CORPORATION
    Inventors: Jui-Yu Lai, Christophe Le Touze, Ming-Hsien Chou
  • Patent number: 11753345
    Abstract: Systems and methods for making ceramic powders are provided. The method for forming a ceramic powder includes: preparing a precursor mixture, wherein the preparing comprises adding at least one additive to a plurality of reagents, wherein the at least one additive includes at least one of: an oxide, a salt, a pure metal, or an alloy of elements ranging from atomic numbers 21 through 30, 39 through 51, and 57 through 77 and combinations thereof; and carbothermically reacting the precursor mixture to form a ceramic powder, wherein, due to the preparing step, the precursor mixture comprises a sufficient amount of the at least one additive to form the ceramic powder, wherein the ceramic powder comprises: (a) a morphology selected from the group consisting of irregular, equiaxed, plate-like, and combinations thereof; and (b) a particle size distribution selected from the group consisting of fine, intermediate, coarse, and combinations thereof.
    Type: Grant
    Filed: December 20, 2018
    Date of Patent: September 12, 2023
    Assignee: ALCOA USA CORP.
    Inventors: James C. McMillen, Lance M. Sworts, Benjamin D. Mosser
  • Patent number: 11633617
    Abstract: The invention relates to a device (10) for generating a plasma jet (P) comprising a first conduit (11) inside a second conduit (12), a first electrode (17) and a second electrode (18) for generating an electric field in a feed gas flow (F) provided in a first flow channel (15) to generate a plasma jet (P), and adapted to provide a curtain gas flow (C) in the space between the first and second conduit (11,12), wherein the first electrode (17) is positioned radially outside of the first flow channel (15), and wherein the radial distance of the second electrode (18) from a longitudinal axis (I) is larger than the radial distance of the first electrode (17) from said longitudinal axis (1). The invention further relates to an endoscope comprising a device (10), a method for generating a plasma jet (P), a method and a use of the device (10) for manipulating a cavity.
    Type: Grant
    Filed: July 26, 2017
    Date of Patent: April 25, 2023
    Assignee: LEIBNIZ-INSTITUT FÜR PLASMAFORSCHUNG UND TECHNOLOGIE E.V.
    Inventor: Jörn Winter
  • Patent number: 11629860
    Abstract: A method and system to treat emissions (e.g., smoke, particulate, odor, grease) employs a nanosecond high voltage pulse generator, a transient pulsed plasma reactor, and a DC voltage source that supplies a DC bias voltage, preferably a negative DC bias voltage to a conductor of the transient pulsed plasma reactor. The system is used in a scheme that substantially reduces at least particulate matter in emissions streams, for example emissions streams produced during cooking, for instance in commercial charbroiling processes (e.g., cooking of hamburger meat), or from operation of internal combustion engines. Both a reduction in the size distribution and total particulate mass is achieved using the method and system described herein.
    Type: Grant
    Filed: September 27, 2019
    Date of Patent: April 18, 2023
    Assignee: TRANSIENT PLASMA SYSTEMS, INC.
    Inventors: Steve Cronin, William P. Schroeder, Jason M. Sanders, Daniel Singleton, Mark Thomas, Patrick Ford, Martin Adolph Gundersen
  • Patent number: 11610765
    Abstract: An atmospheric pressure plasma processing apparatus and method employing argon as a plasma gas in the absence of helium, including nanosecond pulse-powered electrodes having planar surfaces, and grounded electrodes having planar surfaces parallel to the surfaces of the powered electrodes and spaced-apart a chosen distance therefrom, forming plasma regions, are described. The absence of helium from the plasma discharge has been found not to affect the quality of the resulting plasma-polymerized coatings of the processed substrates.
    Type: Grant
    Filed: August 9, 2019
    Date of Patent: March 21, 2023
    Assignee: APJeT, Inc.
    Inventors: Gregory A. Roche, David W. Tyner, Carrie E. Cornelius, Joseph H. Cross
  • Patent number: 11584840
    Abstract: Boron nitride nanotube (BNNT) dispersions and methods of fabricating the same are provided. Tip sonication-assisted hydrolysis can be utilized, with a dispersant/surfactant (e.g., polyvinyl alcohol (PVA)). The fabrication process can be used to obtain large scale BNNT dispersions with long term stability (e.g., stability for at least 3 months, at least 4 months, at least 5 months, at least 6 months, or about 6 months).
    Type: Grant
    Filed: November 30, 2021
    Date of Patent: February 21, 2023
    Assignee: THE FLORIDA INTERNATIONAL UNIVERSITY BOARD OF TRUSTEES
    Inventors: Cheng Zhang, Arvind Agarwal, Xiaolong Lu
  • Patent number: 11541361
    Abstract: In order to provide a dispersion method and a dispersion apparatus capable of mixing a material to be processed and a dispersion medium having no affinity with each other using a single apparatus without using a dispersant, there are provided a quantitative supply mechanism quantitatively supplying a material to be processed, a suction stirring mechanism primarily including a suction stirring pump in which the material to be processed and a dispersion medium are subjected to negative pressure suction by a negative pressure suction force generated by rotation of a rotating blade and the suctioned material to be processed and the dispersion medium are stirred and mixed by the rotating blade and are allowed to pass through a throttle passage to cause cavitation, and a plasma generating mechanism generating a plasma in bubbles formed due to cavitation in a mixed liquid of the material to be processed and the dispersion medium.
    Type: Grant
    Filed: July 31, 2017
    Date of Patent: January 3, 2023
    Assignees: NIHON SPINDLE MANUFACTURING CO., LTD., UNIVERSITY OF HYOGO, KABUSHIKI KAISHA DAINICHI SEISAKUSHO
    Inventors: Keiichi Asami, Yoshihiro Oka, Yoshimi Nishimura, Tomohiro Hashimoto, Katsuhiko Yonezawa
  • Patent number: 11508556
    Abstract: A plasma processing apparatus includes a microwave introducing module provided at a ceiling portion of a processing chamber and configured to introduce a microwave for generating plasma of a gas into the processing chamber; and a plurality of gas supply holes formed at the ceiling portion of the processing chamber and configured to introduce the gas into a plasma processing space. Each of the plurality of gas supply holes includes a fine hole and a cavity that is expanded from the fine hole and opened to the plasma processing space. A diameter of the cavity on the plasma processing space side is 3 mm or more and is ? or less of a wavelength of a surface wave of a microwave in the plasma.
    Type: Grant
    Filed: May 16, 2018
    Date of Patent: November 22, 2022
    Assignee: TOKYO ELECTRON LIMITED
    Inventors: Taro Ikeda, Tomohito Komatsu, Jun Nakagomi, Kei Nagayosi
  • Patent number: 11439932
    Abstract: The present disclosure relates to a fluid modification system having a container structure and a plurality of independent, ceramic elements. The ceramic elements may be arranged in random orientations and contained in the container structure, thus causing a fluid flow entering the container structure at any given cross-section location to flow over the surfaces of a first subplurality of the ceramic elements, and through the porous walls of a second subplurality of the ceramic elements, before exiting at a second location of the container structure. Each one of the ceramic elements has at least one of a nanofibrous or nanoporous microstructure to enable internal flow both through a wall structure thereof, and over and around the wall structure to affect performance.
    Type: Grant
    Filed: January 10, 2020
    Date of Patent: September 13, 2022
    Assignee: Lawrence Livermore National Security, LLC
    Inventors: James Patrick Kelly, Jeffery J. Haslam, Mark Mitchell
  • Patent number: 11426482
    Abstract: Systems and methods are disclosed for cleaning and sterilizing fluids and other materials. In one implementation, one or more emitters are submerged within a fluid and emit electromagnetic waves having a variable frequency. The frequency of the electromagnetic waves is swept across a frequency range to neutralize bacteria, viruses, and other pathogens in the fluid. The emitters may be submerged within a fluid reservoir and/or within the interior of an enclosed fluidic path (e.g., a pipe). Solid materials may be sterilized by immersing the solid materials within the fluid of such a fluid reservoir. In another implementation, electromagnetic waves may be applied to one or more wires that are wrapped around an exterior wall of a pipe. The frequency of the electromagnetic waves may be varied across a frequency range, resulting in scale and other materials being cleaned from the interior wall of the pipe.
    Type: Grant
    Filed: April 17, 2019
    Date of Patent: August 30, 2022
    Inventor: Rasmus Par Tomas Norling
  • Patent number: 11344889
    Abstract: The embodiments of the present disclosure relate to a microfluidic chip. The microfluidic chip may include a substrate. The substrate may include an electrode layer on a base substrate, a dielectric layer on the electrode layer, and a lyophobic layer on the dielectric layer. The electrode layer may include a plurality of electrode units. Each of the plurality of electrode units may be configured to realize both droplet detection and droplet driving in response to a detection signal and a driving signal respectively.
    Type: Grant
    Filed: April 26, 2019
    Date of Patent: May 31, 2022
    Assignees: BEIJING BOE OPTOELECTRONICS TECHNOLOGY CO., LTD., BOE TECHNOLOGY GROUP CO., LTD.
    Inventors: Haochen Cui, Peizhi Cai, Chuncheng Che, Fengchun Pang, Yingying Zhao, Yue Geng, Le Gu, Nan Zhao, Yuelei Xiao, Hui Liao
  • Patent number: 11311937
    Abstract: Systems, methods, and devices are disclosed for producing quantum particles (e.g., quantum dots) having a uniform size by vaporization of molten precursor droplets. More particularly, the present technology produces quantum dots by melting or liquefying solid and substantially pure precursor materials followed by production of uniformly sized droplets of molten precursor by use of a droplet maker into a microwave generated plasma torch.
    Type: Grant
    Filed: December 17, 2019
    Date of Patent: April 26, 2022
    Assignee: 6K Inc.
    Inventors: Kamal Hadidi, Gregory Wrobel
  • Patent number: 11279633
    Abstract: A system for generating a plasma discharge in liquid utilizes first and second electrodes spaced apart in an interior space of a vessel holding the liquid. A channel can be defined in certain embodiments at least partially by at least one of the first and second electrodes, and an inlet in fluid communication with the interior space is configured to generate a vortical fluid flow in the vessel. A method for generating a plasma discharge in liquid is also provided.
    Type: Grant
    Filed: January 28, 2019
    Date of Patent: March 22, 2022
    Assignee: Onvector LLC
    Inventors: Jun Kang, Daniel J. Cho, HyoungSup Kim
  • Patent number: 11273474
    Abstract: Provided is an ion generating device for organic matter decomposition for generating ions to decompose organic matter stored in a tank. The ion generating device includes a needle electrode and a plate electrode, both facing each other, and a direct-current power supply unit configured to apply a direct-current voltage with positive polarity to the needle electrode. The direct-current power supply unit includes a voltage controller configured to set the direct-current voltage to a specified voltage value to produce positive corona discharge between the needle electrode and the plate electrode under atmospheric pressure.
    Type: Grant
    Filed: January 29, 2019
    Date of Patent: March 15, 2022
    Assignee: GLENCAL TECHNOLOGY CO., LTD.
    Inventors: Masahito Nakaishi, Koji Irie
  • Patent number: 11246885
    Abstract: The present invention relates to a method of preventing or treating keloids using a liquid plasma. A liquid plasma according to the present invention is remarkably effective in inhibiting the generation and proliferation of keloids, thus being expected to be greatly utilized for the prevention and treatment of keloids.
    Type: Grant
    Filed: August 23, 2018
    Date of Patent: February 15, 2022
    Assignee: AJOU UNIVERSITY INDUSTRY-ACADEMIC COOPERATION FOUNDATION
    Inventors: Chul Ho Kim, Sung Un Kang
  • Patent number: 11242252
    Abstract: A process for producing solar grade silicon from silica sand employs a plurality of plasma furnaces to perform a sequence of chemical reactions together with other process steps to produce solar grade silicon. The plasma furnace generates a stable dirty air, donut-shaped plasma into which particulate matter can be introduced. The plasma in the first two stages is formed by gases from the chemical reactions and in the third from inert gasses. Cyclone separators are used to extract particulates from the plasma in an inert gas that prevents reverse reactions as the particular cools.
    Type: Grant
    Filed: January 5, 2017
    Date of Patent: February 8, 2022
    Assignee: Plassein Technologies Ltd. LLC
    Inventor: David Charles Lynch
  • Patent number: 11185861
    Abstract: Multistage deterministic lateral displacement devices, methods of forming the devices, and methods of separating a fluid mixture including particles having three or more particle sizes generally include a first module and at least one additional module. Each module includes a condenser portion and a separate portion. The condenser portion is generally configured to focus a streamline of all particles to a center of a channel whereas the separator separates the streamline of all particles into two different streamlines. One of the streamlines focuses the largest particles in the fluid mixture along a sidewall of the channel and the other streamline of smaller particles is between opposing sidewalls that define the channel. Each additional module can be used to further separate the largest particles remaining in the fluid mixture from the smaller particles.
    Type: Grant
    Filed: June 13, 2018
    Date of Patent: November 30, 2021
    Assignee: INTERNATIONAL BUSINESS MACHINES CORPORATION
    Inventors: Sung-Cheol Kim, Stacey Gifford, Joshua T. Smith, Benjamin Wunsch
  • Patent number: 11183368
    Abstract: A substrate processing system for processing a substrate within a processing chamber is provided and includes a source terminal, a substrate support, and a tuning circuit. The substrate support holds the substrate and includes first and second electrodes, which receive power from a power source via the source terminal. The tuning circuit is connected to the first electrode or the second electrode. The tuning circuit is allocated for tuning signals provided to the first electrode. The tuning circuit includes at least one of a first impedance set or a second impedance set. The first impedance set is serially connected between the first electrode and the power source and receives a first signal from the power source via the source terminal. The second impedance set is connected between an output of the power source and a reference terminal and receives the first signal from the power source via the source terminal.
    Type: Grant
    Filed: August 2, 2018
    Date of Patent: November 23, 2021
    Assignee: Lam Research Corporation
    Inventors: David French, Vincent E. Burkhart, Karl Frederick Leeser, Liang Meng
  • Patent number: 11179490
    Abstract: A method and apparatus for electro-hydrodynamic destruction of an aerosol. The method includes receiving air having large aerosols, greater than about 1 micron, and small aerosols, smaller than about 1 micron, and entraining the large aerosols and small aerosols within an airflow. The airflow is directed to an electric field, which causes the large aerosols to react with the electric field to accumulate an electric charge resulting in extraction of the large aerosols from the airflow. The airflow is also directed to a non-thermal plasma such that the small aerosols remain entrained in the airflow and are subject to electro-hydrodynamic (EHD) phenomena. The non-thermal plasma outputs at least one of radicals, excited species, and ionized atoms and molecules capable of reacting with the small aerosols to result in physical and/or chemical destruction of the small aerosols.
    Type: Grant
    Filed: May 6, 2016
    Date of Patent: November 23, 2021
    Assignee: THE REGENTS OF THE UNIVERSITY OF MICHIGAN
    Inventors: Herek L. Clack, Krista R. Wigginton
  • Patent number: 11127701
    Abstract: The present disclosure provides a method of manufacturing a semiconductor package. Semiconductor dies having conductive pillars are provided and are encapsulated with an insulating encapsulant. A redistribution circuit structure is formed on the insulating encapsulant and the semiconductor dies, and the redistribution circuit structure is electrically connected to the semiconductor dies. A photosensitive mask pattern having a plurality of openings is formed. A plurality of conductive vias is formed within the openings of the photosensitive mask pattern. A dielectric layer is then formed, and the conductive vias are embedded in the dielectric layer.
    Type: Grant
    Filed: June 17, 2019
    Date of Patent: September 21, 2021
    Assignee: Taiwan Semiconductor Manufacturing Company, Ltd.
    Inventors: Hung-Jui Kuo, Hui-Jung Tsai, Jyun-Siang Peng
  • Patent number: 11112353
    Abstract: A residual toxicant detection device for testing residual toxicant in an aqueous solution is disclosed, which includes a first space cavity, a second space cavity, a connecting frame and a sensing cavity. The first space cavity includes a light source and a lens. The second space cavity includes a photo sensor and a circuit module. The connecting frame is configured to connect the first space cavity and the second space cavity. The sensing cavity for receiving an aqueous solution is formed between the first space cavity and the second space cavity and at one side of the connecting frame. The light source emits a light with a wavelength range. The photo sensor receives the sensing signal of the light passing through the sensing cavity. The circuit module is configured to calculate the absorbance and the variation in absorbance of the residual toxicants in the aqueous solution.
    Type: Grant
    Filed: December 27, 2019
    Date of Patent: September 7, 2021
    Assignee: INDUSTRIAL TECHNOLOGY RESEARCH INSTITUTE
    Inventors: Chih-Hao Hsu, Jui-Hung Tsai, Ying-Hao Wang, Chia-Jung Chang
  • Patent number: 11101113
    Abstract: A method of etching uses an overhead electron beam source that generates an ion-ion plasma for performing an atomic layer etch process.
    Type: Grant
    Filed: October 7, 2019
    Date of Patent: August 24, 2021
    Assignee: Applied Materials, Inc.
    Inventors: Kenneth S. Collins, Kartik Ramaswamy, James D. Carducci, Shahid Rauf, Leonid Dorf, Yang Yang
  • Patent number: 11096267
    Abstract: The present disclosure relates to an electric discharge device and associated method for molecular restructuring of a fluid. The electric discharge device comprises a discharge cell including a first dielectric layer and a second dielectric layer that are spaced apart by a gap constituting a flow channel for a feed fluid to be molecularly restructured. The dielectric layers and the flow channel are arranged between a first electrode and a second electrode for generating electric discharge in the flow channel when voltage is applied between the electrodes. The discharge cell comprises a double-walled dielectric tube having an inner wall and an outer wall that come together at both ends of the tube to form a double-walled dielectric tube made in one piece, the inner and outer walls of the double-walled dielectric tube constituting the first and second dielectric layers of the discharge cell.
    Type: Grant
    Filed: December 28, 2017
    Date of Patent: August 17, 2021
    Inventors: Manfred Karl Fandrich, Tosawon Chaimongkonskoon
  • Patent number: 11078124
    Abstract: Systems and methods for making ceramic powders configured with consistent, tailored characteristics and/or properties are provided herein. In some embodiments a system for making ceramic powders, includes: a reactor body having a reaction chamber and configured with a heat source to provide a hot zone along the reaction chamber; a sweep gas inlet configured to direct a sweep gas into the reaction chamber and a sweep gas outlet configured to direct an exhaust gas from the reaction chamber; a plurality of containers, within the reactor body, configured to retain at least one preform, wherein each container is configured to permit the sweep gas to flow therethrough, wherein the preform is configured to permit the sweep gas to flow there through, such that the precursor mixture is reacted in the hot zone to form a ceramic powder product having uniform properties.
    Type: Grant
    Filed: January 7, 2019
    Date of Patent: August 3, 2021
    Assignee: ALCOA USA CORP.
    Inventors: James C. McMillen, Lance M. Sworts, Benjamin D. Mosser, Charles Robert Shanta, III
  • Patent number: 11043387
    Abstract: Methods and apparatus for processing a substrate are provided herein. For example, a method for processing a substrate includes applying at least one of low frequency RF power or DC power to an upper electrode formed from a high secondary electron emission coefficient material disposed adjacent to a process volume; generating a plasma comprising ions in the process volume; bombarding the upper electrode with the ions to cause the upper electrode to emit electrons and form an electron beam; and applying a bias power comprising at least one of low frequency RF power or high frequency RF power to a lower electrode disposed in the process volume to accelerate electrons of the electron beam toward the lower electrode.
    Type: Grant
    Filed: October 30, 2019
    Date of Patent: June 22, 2021
    Assignee: APPLIED MATERIALS, INC.
    Inventors: Kartik Ramaswamy, Yang Yang, Kenneth Collins, Steven Lane, Gonzalo Monroy, Yue Guo
  • Patent number: 11037761
    Abstract: There is provision of a method of controlling a plasma processing apparatus including a chamber in which a plasma is generated, a substrate holder, a radio frequency power supply configured to supply radio frequency electric power to the substrate holder, a matching device provided between the substrate holder and the radio frequency power supply. The method includes acquiring output impedance of the matching device in a state in which impedance matching is achieved; obtaining F-parameters indicating electrical characteristics of the chamber; calculating a degree of high harmonic component generation; and controlling the output impedance of the matching device based on the degree of high harmonic component generation.
    Type: Grant
    Filed: December 5, 2019
    Date of Patent: June 15, 2021
    Assignee: Tokyo Electron Limited
    Inventor: Toshio Haga
  • Patent number: 11027979
    Abstract: The invention relates to a process for hydrogenating silicon tetrachloride in a reactor, wherein a reactant gas containing hydrogen and silicon tetrachloride is heated to a temperature between 850° C. and 1600° C. by means of at least one heating element, which comprises a graphite surface, wherein the temperature of the heating element is between 850° C. and 1600° C. The process is characterized in that a nitrogen compound is added to the reactant gas in a substance amount fraction of 0.1 to 10% based on hydrogen.
    Type: Grant
    Filed: November 23, 2016
    Date of Patent: June 8, 2021
    Assignee: WACKER CHEMIE AG
    Inventors: Martin Zettl, Andreas Hirschmann, Uwe Pätzold, Robert Ring
  • Patent number: 11015259
    Abstract: A method for producing a laminated shim includes subjecting a shim stock to a plasma electrolytic oxidization (PEO) process to create a PEO shim, applying an adhesive layer of an adhesive to a surface of the PEO shim, stacking at least one other PEO shim onto the adhesive layer of the PEO shim to create a stack of PEO shims, and pressing the stack of PEO shims together to create a PEO coated peelable laminate.
    Type: Grant
    Filed: February 15, 2017
    Date of Patent: May 25, 2021
    Assignee: Voss Innovative Technologies Corporation
    Inventors: Peter Voss, Stephen Forrest, Kapilan Paramanathan, Deoram Singh
  • Patent number: 11000802
    Abstract: Systems, methods, and apparatus are contemplated in which a tube cell that produces a dielectric barrier discharge (DBD) is individually configured to minimize the mixing of unwanted byproducts of the generated plasma with an exhaust air stream. The tube cell generates a DBD within a tube cell, such that oxidants or radicals are generated in an environment substantially separated from the exhaust stream. The generated oxidants are directed to intersect with the exhaust stream to minimize the generation of unwanted byproducts. The tube cells are further shaped and arranged in tube cell arrays to alter the flow dynamics of the exhaust stream and the oxidant or radical streams, including mixing of the streams.
    Type: Grant
    Filed: January 27, 2020
    Date of Patent: May 11, 2021
    Assignee: ThrivalTech, LLC
    Inventor: Garrett Hill
  • Patent number: 11001927
    Abstract: A method of forming a corrosion-resistant ceramic coating on a metallic substrate, the method comprising providing a passivation layer on a surface of the metallic substrate by electrochemical passivation of the metallic substrate under a first electrical current and using a first electrically conducting solution; and providing the corrosion-resistant ceramic coating on an outermost surface of the metallic substrate, the outermost surface in use adapted to be exposed to a corrosive environment, by plasma electrolytic oxidation of the metallic substrate with the passivation layer, in a second electrically conducting solution and under a second electrical current having a discharge voltage. The first and the second electrically conducting solutions comprise a tetrafluoroborate compound.
    Type: Grant
    Filed: August 29, 2017
    Date of Patent: May 11, 2021
    Assignees: PRATT & WHITNEY RZESZOW S.A., RZESZOW UNIVERSITY OF TECHNOLOGY
    Inventors: Krzysztof Raga, Adam Baran, Kazimierz Kwolek, Monika Kocój-Toporowska, Anna Dryzner, Jan Sieniawski, Andrzej Sobkowiak, Przemysław Kwolek, Łukasz Florczak, Marcin Drajewicz, Ginter Nawrat, Łukasz Nieużyła, Tomasz Wieczorek, Mirosław Dubiel, Gabriela Lach, Agnieszka Krząkała
  • Patent number: 10998170
    Abstract: Plasma ion energy distribution for ions having different masses is controlled by controlling the relationship between a base RF frequency and a harmonic RF frequency. By the controlling the RF power frequencies, characteristics of the plasma process may be changed based on ion mass. The ions that dominate etching may be selectively based upon whether an ion is lighter or heavier than other ions. Similarly, atomic layer etch processes may be controlled such that the process may be switched between a layer modification step and a layer etch step though adjustment of the RF frequencies. Such switching is capable of being performed within the same gas phase of the plasma process. The control of the RF power includes controlling the phase difference and/or amplitude ratios between a base RF frequency and a harmonic frequency based upon the detection of one or more electrical characteristics within the plasma apparatus.
    Type: Grant
    Filed: April 8, 2019
    Date of Patent: May 4, 2021
    Assignee: Tokyo Electron Limited
    Inventors: Yusuke Yoshida, Sergey Voronin, Alok Ranjan, David J. Coumou, Scott E. White
  • Patent number: 10991554
    Abstract: A system and method for using plasma to treat a substrate are described. The system includes a substrate holder disposed within a plasma processing system, and arranged to support a substrate, a first signal generator for coupling a first signal at a first frequency to plasma in the plasma processing system, and a second signal generator for coupling a second signal at a second frequency to plasma in the plasma processing system, wherein the second frequency being less than the first frequency. The system further includes an amplitude modulation circuit for modulating the first signal between a high amplitude state and a low amplitude state in response to an amplitude modulation signal, and a timing circuit configured to define the amplitude modulation signal that synchronizes the amplitude modulation of the first signal with a target phase for each cycle of the second signal.
    Type: Grant
    Filed: September 21, 2018
    Date of Patent: April 27, 2021
    Assignee: TOKYO ELECTRON LIMITED
    Inventors: Jianping Zhao, Peter L. G. Ventzek, Barton Lane
  • Patent number: 10964515
    Abstract: The present invention relates to a plasma diagnosing system and method, and more particularly, to a system and a method for diagnosing plasma in real time using a change in a capacitance sensed by an electrode using a reference waveform having a frequency different from a plasma discharging frequency band region. The sensed capacitance varies before and after discharging plasma and the plasma is diagnosed using the change in capacitance in real time.
    Type: Grant
    Filed: November 20, 2017
    Date of Patent: March 30, 2021
    Assignee: KWANGWOON UNIVERSITY INDUSTRY-ACADEMIC COLLABORATION FOUNDATION
    Inventors: Gi Chung Kwon, Gi Won Shin, Hwan Hee Lee
  • Patent number: 10934183
    Abstract: A liquid processing apparatus includes a processing tank, a liquid introduction port, a discharge portion, a first electrode, a second electrode, and a power supply. The liquid introduction port is disposed on a first end side of the processing tank, causes a liquid to swirl in the processing tank by introducing the liquid into the processing tank in a tangential direction of the processing tank, and generates a gas phase in a swirling flow of the liquid. The first electrode has a rod shape and is disposed at the first end on a central axis of the processing tank. The second electrode is disposed so as to be exposed to the discharge portion of the processing tank. A voltage is applied between the first electrode and the second electrode to generate plasma in the gas phase.
    Type: Grant
    Filed: February 12, 2019
    Date of Patent: March 2, 2021
    Assignee: PANASONIC INTELLECTUAL PROPERTY MANAGEMENT CO., LTD.
    Inventors: Gaku Miyake, Genichiro Matsuda
  • Patent number: 10919766
    Abstract: An ozone generator with a high voltage electrode and at least one counter electrode which limit a gap in which at least one dielectric and an electrically non-conductive structure are arranged and through which a stream of gas flows in a direction of flow. The high voltage electrode and the at least one counter electrode are provided with a connection for an electrical voltage supply in order to generate silent discharges. The electrically non-conductive structure contains pores with a nominal pore size (x) of 100 ?m<x<1 mm.
    Type: Grant
    Filed: October 19, 2016
    Date of Patent: February 16, 2021
    Assignee: XYLEM IP MANAGEMENT S.à r.l.
    Inventors: Ralf Fiekens, Reiner Fietzek, Manfred Salvermoser, Nicole Brüggemann
  • Patent number: 10882021
    Abstract: A system and method for performing plasma reactions creating a plasma area in a gas adjacent to a liquid. An embodiment of the plasma reactor includes a housing with an internal reaction chamber, first and second inlet paths to the reaction chamber, and electrodes for producing an electric field. The system may optionally further include a pre-ionization electrode and pre-ionization electric field for pre-ionizing a feed gas prior to entry into a reaction chamber. The reactor uses plasma to ionize gas adjacent with the liquid. The ionized gas reacts with the liquid to form an effluent. Exemplary uses of the plasma reactor include ionic injection, gas dissociation, liquid re-formation, and liquid dissociation.
    Type: Grant
    Filed: July 3, 2018
    Date of Patent: January 5, 2021
    Assignee: Ion Inject Technology LLC
    Inventors: Walter Riley Buchanan, Grant William Forsee
  • Patent number: 10822236
    Abstract: Disclosed is a method for producing CNTs by an electric arc discharge method. The synthesis gas for the arc discharge includes nitrogen and oxygen gases. The oxygen gas in the synthesis gas is converted to reactive oxygen species by the arc discharge and chemically reacts with amorphous carbon. Accordingly, the formation of amorphous carbon is suppressed when CNTs are formed on the cathode, and thus, high crystallinity of CNTs can be secured.
    Type: Grant
    Filed: March 22, 2019
    Date of Patent: November 3, 2020
    Assignee: INDUSTRY-ACADEMIC COOPERATION GROUP OF SEJONG UNIVERSITY
    Inventors: Nae Sung Lee, Tae Hun Shin
  • Patent number: 10811187
    Abstract: A method for fabricating a thermal composite includes pouring a mixture including a plurality of magnetically susceptible particles and a thermosetting polymer into a mold, placing the mold containing the mixture in a chamber including a plurality of magnet arrays, and heating the mold containing the mixture in the chamber for a time and at a temperature sufficient to cure the thermosetting polymer. At least one of the plurality of magnet arrays includes a Halbach array.
    Type: Grant
    Filed: September 18, 2018
    Date of Patent: October 20, 2020
    Assignee: Toyota Motor Engineering & Manufacturing North America, Inc.
    Inventor: Ercan M. Dede
  • Patent number: 10784084
    Abstract: Embodiments of the present invention describe the formation of a current source, a light source, and an ozone generator by using a coated double dielectric barrier discharge system (CDDBD). A system for generating charge may include a CDDBD having at least two electrodes that are separated by a gap filled with a gas medium, wherein each of the at least two electrodes are covered with an insulator that prevents charges in the at least two electrodes from passing through the gas medium, and wherein surfaces of each of the at least two insulators are coated with a material having a secondary electron emission coefficient higher than a material of the insulator. Furthermore, the system for generating the charge may also include a power supply coupled with the CDDBD device that supplies energy to the CDDBD device to form an initial electric field.
    Type: Grant
    Filed: April 10, 2019
    Date of Patent: September 22, 2020
    Inventor: Seongsik Chang
  • Patent number: 10752507
    Abstract: Synthesis of silanes with more than three silicon atoms are disclosed (i.e., (SinH(2n+2) with n=4-100). More particularly, the disclosed synthesis methods tune and optimize the isomer ratio by selection of process parameters such as temperature, residence time, and the relative amount of starting compounds, as well as selection of proper catalyst. The disclosed synthesis methods allow facile preparation of silanes containing more than three silicon atoms and particularly, the silanes containing preferably one major isomer. The pure isomers and isomer enriched mixtures are prepared by catalytic transformation of silane (SiH4), disilane (Si2H6), trisilane (Si3H8), and mixtures thereof.
    Type: Grant
    Filed: October 11, 2018
    Date of Patent: August 25, 2020
    Assignees: L'Air Liquide, Société Anonyme pour l'Etude et l'Exploitation des Procédés Georges Claude, American Air Liquide, Inc.
    Inventors: Grigory Nikiforov, Guillaume Husson, Gennadiy Itov, Yang Wang
  • Patent number: 10738768
    Abstract: A satellite thruster increases satellite efficiency. The Linear Actuated ?CAT has a stepper motor to move the ablative electrode forward. A LabVIEW program and Arduino microcontroller are used to analyze the Linear Actuated ?CAT to determine how many steps are required for re-ignition, arc current, and the validity of the feed system. Results from testing show that micro-stepping the stepper motor is an effective way to replenish the cannibalized electrode for propellant.
    Type: Grant
    Filed: June 22, 2017
    Date of Patent: August 11, 2020
    Assignee: The George Washington University
    Inventors: Michael Keidar, George Teel, Samantha A. Hurley
  • Patent number: 10729798
    Abstract: This present invention generally relates to a process for manipulating the chemistry of a product using high voltage atmospheric cold plasma (HVACP) in the presence of a working gas, and in particular to a process for inactivating pathogenic microorganisms in a liquid product by adding an acidic component to or adjusting an acidic component of a product in combination with HVACP treatment. A product of this process is also in the scope of this disclosure.
    Type: Grant
    Filed: May 15, 2017
    Date of Patent: August 4, 2020
    Assignee: Purdue Research Foundation
    Inventors: Kevin Michael Keener, Nikhil K Mahnot
  • Patent number: 10730031
    Abstract: A fluid treatment apparatus is described for the treatment of a fluid substance having multiple component substances to control levels of one or more particular component substances. The apparatus has a reactor chamber; a fluid inlet adapted to provide fluid communication from an external supply of a fluid substance to be treated to said reactor chamber whereby said fluid substance may pass into and through said reactor chamber; a fluid outlet adapted to provide a fluid communication from said reactor chamber whereby said fluid substance may pass from said reactor chamber; at least one first electromagnetic radiation (EMR) waveguide, having at least one first waveguide input port operably coupled within said reactor chamber and adapted to couple electromagnetic radiation of a predetermined first wavelength to a fluid substance passing through said reactor chamber. A method for the treatment of a fluid substance is also described.
    Type: Grant
    Filed: June 30, 2017
    Date of Patent: August 4, 2020
    Assignee: ARCS ENERGY LIMITED
    Inventor: Anthony Archer
  • Patent number: 10696571
    Abstract: The present disclosure relates to a capacitive deionization system which makes use of a controller, a first capacitor acting as a first electrode, a second capacitor acting as a second electrode, and a first inductor for storing energy received from the first capacitor, and transferring the stored energy to the second capacitor. A first plurality of electronic switches are controlled by the controller to control communication between the first inductor and the first capacitor, and between the first inductor and the second capacitor. An additional energy transfer subsystem is included which has a second inductor for receiving energy from the first capacitor while the first inductor is transferring stored energy to the second capacitor.
    Type: Grant
    Filed: October 20, 2016
    Date of Patent: June 30, 2020
    Assignee: Lawrence Livermore National Security, LLC
    Inventors: Michael Stadermann, Steven L. Hunter
  • Patent number: 10680484
    Abstract: A method of protecting ferromagnetic lamination stacks of a component of an electric machine, comprises the following steps: creating a component module by arranging a laminations stack of ferromagnetic sheets into a housing, (b) protecting locations of the component module where coating is unwanted, (c) inserting the component module into a hermetic chamber receiving an ionized gas, (d) polarizing the component module to submit a fixed electric potential to the component module, (e) depositing a thin layer of protective coating on the laminations stack of ferromagnetic sheets through a method of Plasma Enhanced Chemical Vapor Deposition (PECVD) at a temperature lower than 150° C., (f) monitoring the deposition homogeneity and deposition thickness of the thin layer of protective coating until desired thickness, and (g) rectifying the surface of the thin layer of protective coating to have a uniform protective layer.
    Type: Grant
    Filed: January 25, 2016
    Date of Patent: June 9, 2020
    Assignee: SKF MAGNETIC MECHATRONICS
    Inventors: Yvon Baucé, Eduardo Carrasco, Erwan Salahun