Forming Or Treating Article Containing Magnetically Responsive Material Patents (Class 216/22)
  • Publication number: 20130082027
    Abstract: A method for manufacturing a magnetic write head for magnetic data recording. The method includes forming a depositing a magnetic write pole material and forming a mask structure over the write pole material that includes a polymer mask under-layer, a dielectric hard mask formed over the polymer mask under-layer and a photoresist mask formed over the dielectric hard mask. The image of the photoresist mask is transferred onto the underlying dielectric hard mask and then a reactive ion etching is performed to transfer the image of the dielectric hard mask onto the polymer mask under-layer. This reactive ion etching is performed in an atmosphere chemistry that includes both an oxygen containing gas and a nitrogen containing gas.
    Type: Application
    Filed: September 30, 2011
    Publication date: April 4, 2013
    Applicant: Hitachi Global Storage Technologies Netherlands B.V.
    Inventors: Guomin Mao, Donald G. Allen, Aron Pentek, Thomas J. A. Roucoux, Yi Zheng
  • Publication number: 20130084452
    Abstract: High Hc (>4,000 Oe) and high Hk (>1 Tesla) has been achieved in FePt films as thin as 70 Angstroms. This was accomplished by starting with a relatively thick film having the required high coercivity, coating it with a suitable material such as Ta, and then using ion beam etching to remove surface material until the desired thickness was reached.
    Type: Application
    Filed: September 30, 2011
    Publication date: April 4, 2013
    Inventors: Kunliang Zhang, Min Zheng, Min Li
  • Publication number: 20130082696
    Abstract: A scissor style magnetic sensor having a novel hard bias structure for improved magnetic biasing robustness. The sensor includes a sensor stack that includes first and second magnetic layers separated by a non-magnetic layer such as an electrically insulating barrier layer or an electrically conductive spacer layer. The first and second magnetic layers have magnetizations that are antiparallel coupled, but that are canted in a direction that is neither parallel with nor perpendicular to the air bearing surface by a magnetic bias stricture. The magnetic bias structure includes a neck portion extending from the back edge of the sensor stack and having first and second sides that are aligned with first and second sides of the sensor stack. The bias structure also includes a tapered or wedged portion extending backward from the neck portion.
    Type: Application
    Filed: September 30, 2011
    Publication date: April 4, 2013
    Applicant: Hitachi Global Storage Technologies Netherlands B.V.
    Inventors: Quang Le, Simon H. Liao, Shuxia Wang, Guangli Liu, Yongchul Ahn
  • Patent number: 8409453
    Abstract: A method and system for fabricating magnetic recording transducer are described. The magnetic recording transducer has a main pole, a nonmagnetic gap covering the main pole, and a field region distal from the main pole. A portion of the nonmagnetic gap resides on the top of the main pole. The method and system include providing a patterned seed layer. A thick portion of the patterned seed layer is thicker than a thin portion of the patterned seed layer. At least part of the thick portion of the patterned seed layer resides on a portion of the field region. A wrap-around shield is on the patterned seed layer. At least part of the thin portion of the patterned seed layer is in proximity to and exposed by the wrap-around shield. The method and system also include field etching the field region distal from the wrap-around shield.
    Type: Grant
    Filed: May 12, 2010
    Date of Patent: April 2, 2013
    Assignee: Western Digital (Fremont), LLC
    Inventors: Ming Jiang, Changqing Shi
  • Publication number: 20130078483
    Abstract: A write head for use in a magnetic disk drive and methods of manufacturing the same. When a non-magnetic reactive ion etching (RIE) stop layer is used in a damascene main pole fabrication process, the leading edge shield and the side shield have a magnetic separation. By replacing a non-magnetic RIE stop layer with a magnetic RIE stop layer, no removal of the RIE stop layer around the main pole is necessary. Additionally, the leading edge shield and the side shield will magnetically join together without extra processing as there will be no magnetic separation between the leading edge shield and the side shield.
    Type: Application
    Filed: September 28, 2011
    Publication date: March 28, 2013
    Inventors: Yingjian CHEN, Shiwen HUANG, Edward Hin Pong LEE, Mun Hyoun PARK, Kyusik SHIN, Yuming ZHOU
  • Publication number: 20130075358
    Abstract: A magnetic recording medium a magnetic recording medium includes a soft magnetic layer formed on a substrate, magnetic patterns made of a protruded ferromagnetic layer separated from each other on the soft magnetic layer, and a nonmagnetic layer formed between the magnetic patterns, a nitrogen concentration therein being higher on a surface side than on a substrate side.
    Type: Application
    Filed: November 15, 2012
    Publication date: March 28, 2013
    Applicant: KABUSHIKI KAISHA TOSHIBA
    Inventors: Kaori KIMURA, Yoshiyuki KAMATA, Satoshi SHIROTORI, Tsuyoshi ONITSUKA
  • Publication number: 20130075359
    Abstract: Provided are a perpendicular magnetic recording head and a method of manufacturing the same. The perpendicular magnetic recording head includes a main pole including a pole tip applying a recording magnetic field to a recording medium, a coil surrounding the main pole in a solenoid shape such that recording magnetic field for recording information to a recording medium is generated at the pole tip, and a return yoke forming a magnetic path for the recording magnetic field together with the main pole and surrounding a portion of the coil passing above the main pole. The number of times that the coil passes above the main pole is smaller than the number of times that the coil passes below the main pole.
    Type: Application
    Filed: November 20, 2012
    Publication date: March 28, 2013
    Applicant: SEAGATE TECHNOLOGY LLC
    Inventor: SEAGATE TECHNOLOGY LLC
  • Patent number: 8404130
    Abstract: A method of manufacturing a discrete track medium type perpendicular magnetic recording layer with reduced magnetic interference between tracks and enhanced magnetic recording density is disclosed in which protruding parts of a pattern of protrusions and recesses provided in a composite magnetic recording layer are formed in high quality having a similar film thickness and equivalent perpendicular magnetic recording performance to a perpendicular magnetic recording layer designed for a continuous film type medium.
    Type: Grant
    Filed: August 10, 2010
    Date of Patent: March 26, 2013
    Assignee: Fuji Electric Co., Ltd.
    Inventor: Akira Sato
  • Patent number: 8404128
    Abstract: A method and system for providing a magnetic recording transducer having a pole are disclosed. The pole has side(s), a bottom, and a top wider than the bottom. The method and system include providing at least one side gap layer that covers the side(s) and the top of the pole. At least one sacrificial layer is provided on the side gap layer(s). The sacrificial layer(s) are wet etchable and cover the side gap layer(s). The magnetic recording transducer is planarized after the sacrificial layer(s) are provided. Thus, a portion of the side gap and sacrificial layer(s) is removed. A remaining portion of the sacrificial layer(s) is thus left. The method and system also include wet etching the sacrificial layer(s) to remove the remaining portion of the sacrificial layer(s). A wrap around shield is provided after the remaining portion of the sacrificial layer(s) is removed.
    Type: Grant
    Filed: February 23, 2009
    Date of Patent: March 26, 2013
    Assignee: Western Digital (Fremont), LLC
    Inventors: Hong Zhang, Ge Yi, Lei Wang, Dujiang Wan, Guanghong Luo, Xiaohai Xiang
  • Patent number: 8404431
    Abstract: A method for manufacturing a thin-film magnetic head includes processes of forming a polishing position sensor and a recording head portion alongside on one side of a wafer. The process of forming the recording head portion has a step of performing a photolithography process after applying an alkali soluble resin film and a photoresist film in the named order. The process of forming the polishing position sensor has a step of performing a photolithography process on the photoresist film while having only the photoresist film out of the alkali soluble resin film and the photoresist film.
    Type: Grant
    Filed: November 4, 2011
    Date of Patent: March 26, 2013
    Assignee: TDK Corporation
    Inventors: Hitoshi Hatate, Hisayoshi Watanabe, Masachika Hashino, Koichi Otani
  • Patent number: 8404129
    Abstract: A method and system for fabricating an optical component are described. The method and system include providing a first planarization stopping and a second planarization stopping structure. The first planarization stopping structure has a first height and a first edge. The second planarization stopping structure has a second height different from the first height and a second edge. The first edge is separated from the second edge by a distance. The method and system also include providing an optical material. The optical material resides at least between the first edge of the first planarization stopping structure and the second edge of the second planarization stopping structure. The method and system also include planarizing the optical components. The planarization removes a portion of the optical material to form a surface between the first planarization stopping structure and the second planarization stopping structure. This surface has a curvature.
    Type: Grant
    Filed: March 31, 2010
    Date of Patent: March 26, 2013
    Assignee: Western Digital (Fremont), LLC
    Inventors: Guanghong Luo, Danning Yang, Ming Jiang
  • Patent number: 8398870
    Abstract: There is provided a method for manufacturing a perpendicular magnetic recording medium that includes a step for forming a smooth substrate surface without generating abnormal protrusions or the like when forming a magnetic film or the like on the surface of the substrate, the method for manufacturing a perpendicular magnetic recording medium characterized by including a polishing step in which the surface of a non-magnetic substrate is smoothed before forming the laminated structure on top of the non-magnetic substrate, wherein a polishing liquid used in the polishing step contains diamond particles within a range from 0.001 to 0.05% by mass and also contains a polishing accelerator within a range from 10 to 100 times the amount of diamond particles, and the polishing accelerator is an organic polymer material containing a sulfonic group or a carboxylic group and having an average molecular weight of 4,000 to 10,000.
    Type: Grant
    Filed: September 25, 2009
    Date of Patent: March 19, 2013
    Assignee: Showa Denko K.K.
    Inventor: Ryuji Sakaguchi
  • Publication number: 20130062307
    Abstract: The present invention relates to a method of making a mask for patterning a thin film The method includes a step of forming an inorganic material, which is resolvable into alkali solution, on a substrate; a step of forming the inorganic material in a predetermined pattern; and a step of narrowing the inorganic material with the alkali solution to form the mask.
    Type: Application
    Filed: September 12, 2011
    Publication date: March 14, 2013
    Applicant: TDK Corporation
    Inventors: Hisayoshi WATANABE, Hideyuki Yatsu, Takayuki Nishizawa, Masashi Sano, Hiromichi Umehara, Takayasu Kanaya, Tetsuji Hori
  • Publication number: 20130062320
    Abstract: A substrate having a pattern of magnetic properties may be formed by forming a magnetically inactive layer on the substrate, forming a magnetic precursor on the magnetically inactive layer, and forming magnetically active domains separated by magnetically inactive domains in the magnetic precursor by applying thermal energy to the magnetic precursor. The thermal energy may be applied using a laser, which may be pulsed. Forming the magnetically active domains may include crystallizing portions of the magnetic precursor.
    Type: Application
    Filed: September 13, 2012
    Publication date: March 14, 2013
    Applicant: Applied Materials, Inc.
    Inventor: Stephen Moffatt
  • Publication number: 20130062308
    Abstract: According to one embodiment, a method of manufacturing a magnetic recording head includes forming a main pole, forming an oscillator forming layer includes an underlayer, a spin injection layer, an interlayer, an oscillator layer, and a cap layer on a trailing end surface and sidewalls of the main pole, and removing those parts of the oscillator forming layer which are formed on the sidewalls of the main pole, thereby forming a high-frequency oscillator which is aligned with a width of at least the trailing end surface of the main pole.
    Type: Application
    Filed: July 3, 2012
    Publication date: March 14, 2013
    Applicant: KABUSHIKI KAISHA TOSHIBA
    Inventors: Tomomi FUNAYAMA, Masahiro TAKASHITA, Yusuke TOMODA
  • Patent number: 8393073
    Abstract: A method for constructing a magnetoresistive sensor that avoids shadowing effects of a mask structure during sensor definition. The method includes the use of an antireflective coating (ARC) and a photosensitive mask deposited there over. The photosensitive mask is formed to cover a desired sensor area, leaving non-sensor areas exposed. A reactive ion etch is performed to transfer the pattern of the photosensitive mask onto the underlying ARC layer. The reactive ion etch (RIE) is performed with a relatively high amount of platen power. The higher platen power increases ion bombardment of the wafer, thereby increasing the physical (ie mechanical) component of material removal relative to the chemical component. This increase in the physical component of material removal result in an increased rate of removal of the photosensitive mask material relative to the ion mill resistant mask.
    Type: Grant
    Filed: July 21, 2008
    Date of Patent: March 12, 2013
    Assignee: HGST Netherlands B.V.
    Inventors: Richard Jule Contreras, Michael Feldbaum, Mustafa Michael Pinarbasi
  • Patent number: 8394280
    Abstract: Methods of patterning a material are disclosed. A first resist pattern is formed on a field. A protective layer is formed over the first resist pattern and at least a portion of the field. A second resist pattern is formed over a portion of the protective layer. A portion of a material to be patterned deposited adjacent to the first and second resist patterns is removed.
    Type: Grant
    Filed: November 6, 2009
    Date of Patent: March 12, 2013
    Assignee: Western Digital (Fremont), LLC
    Inventors: Dujiang Wan, Hai Sun, Hongping Yuan, Ling Wang, Xianzhong Zeng
  • Publication number: 20130056441
    Abstract: A manufacturing method of a magnetic recording medium according to one embodiment includes forming a mask layer having a pattern regularly arranged in a longitudinal direction on a magnetic recording medium containing a substrate and a magnetic recording layer, forming a recording portion having a magnetic pattern and a non-recording portion by patterning the magnetic recording layer, and submitting the mask layer to a peeling liquid to peel the mask layer. The mask layer contains a lamination layer of a lift-off layer, a first hard mask, and a second hard mask. The second hard mask is formed of a material that is different from the material of the first hard disk and the material is dissolvable in the same peeling liquid as the peeling liquid that dissolves the lift-off layer.
    Type: Application
    Filed: July 5, 2012
    Publication date: March 7, 2013
    Applicant: Kabushiki Kaisha Toshiba
    Inventors: Kaori Kimura, Kazutaka Takizawa, Masatoshi Sakurai, Akihiko Takeo
  • Publication number: 20130048599
    Abstract: The present invention provides a method for stably generating cleaning plasma regardless of a condition of CO-containing plasma. When a magnetic film formed on a wafer 802 to be etched is processed with the CO-containing plasma which is generated by applying a source electric power to a CO-containing gas containing elements of C and O, which has been introduced into a vacuum chamber 801, to convert the CO-containing gas into a plasma state, the method includes: applying predetermined processing to the magnetic film formed on the wafer 802 to be etched by using the CO-containing plasma; then introducing a cleaning gas into the vacuum chamber in a state of applying the source electric power 806 to the antenna; and then stopping the introduction of the CO-containing gas into the vacuum chamber to thereby generate the cleaning plasma with the use of a predetermined cleaning gas.
    Type: Application
    Filed: February 1, 2012
    Publication date: February 28, 2013
    Inventors: Makoto SATAKE, Makoto Suyama, Masato Ishimaru, Yasukiyo Morioka
  • Patent number: 8377147
    Abstract: The present invention uses externally applied electromagnetic stimulus to control and heat porous magnetic particles and material associated with the particles. The particles contain magnetic material, such as superparamagnetic iron oxide and are infused with a material. Application of a DC magnetic field allows them to be moved with their infused material, and application of an AC RF electromagnetic field allows them to be heated with their infused material. The material can be infused into pores of the particles and the particles can also adhere to an aqueous droplet. The present invention also provides a multi-layer porous magnetic particle. The particle includes a host layer having pores sized to accept magnetic nanoparticles. Magnetic nanoparticles are infused within pores of the host layer. An encoding layer includes pores that define a spectral code. The pores in the encoding layer are sized to substantially exclude the magnetic nanoparticles.
    Type: Grant
    Filed: May 16, 2007
    Date of Patent: February 19, 2013
    Assignee: The Regents of the University of California
    Inventors: Michael J. Sailor, Ji-Ho Park, Austin Derfus, Ester Segal, Kenneth S. Vecchio, Sangeeta N. Bhatia
  • Patent number: 8375565
    Abstract: A method fabricates a transducer having an air-bearing surface (ABS). The method includes providing at least one near-field transducer (NFT) film and providing an electronic lapping guide (ELG) film substantially coplanar with a portion of the at least one NFT film. The method also includes defining a disk portion of an NFT from the portion of the at least one NFT film and at least one ELG from the ELG film. The disk portion corresponds to a critical dimension of the NFT from an ABS location. The method also includes lapping the at least one transducer. The lapping is terminated based on a signal from the ELG.
    Type: Grant
    Filed: May 28, 2010
    Date of Patent: February 19, 2013
    Assignee: Western Digital (Fremont), LLC
    Inventors: Yufeng Hu, Zhongyan Wang, Jinshan Li
  • Patent number: 8377318
    Abstract: A method for manufacturing a magnetic device that obtains sufficient processing accuracy without increasing mask removal steps. A first mask layer is formed above a magnetic layer using one selected from the group consisting of Ti, Ta, W, and an oxide or a nitride thereof. A second mask layer is formed on the first mask layer using Ru or Cr. A resist pattern is formed on the second mask layer. A second mask pattern is formed by performing reactive ion etching with reactive gas containing oxygen on the second mask layer using the resist pattern. A first mask pattern is formed by performing reactive ion etching with reactive gas containing halogen gas on the first mask layer using the second mask pattern. A magnetic pattern is formed by performing reactive ion etching with reactive gas containing oxygen on the magnetic layer using the first mask pattern.
    Type: Grant
    Filed: January 23, 2009
    Date of Patent: February 19, 2013
    Assignee: ULVAC, Inc.
    Inventor: Tadashi Yamamoto
  • Patent number: 8366948
    Abstract: A near-field light generating element has an outer surface including first and second inclined surfaces and an edge part that connects the first and second inclined surfaces to each other. In a method of manufacturing the near-field light generating element, a polishing stopper layer is initially formed on a metal layer, and the polishing stopper layer and the metal layer are etched so that the metal layer is provided with the first inclined surface. Next, a coating layer is formed to cover the metal layer and the polishing stopper layer. The coating layer is made of a non-metallic inorganic material that has an etching rate lower than that of the metal layer in a second etching step to be performed later. Next, the coating layer is polished until the polishing stopper layer is exposed. Next, the second etching step is performed to etch the polishing stopper layer and the metal layer using the coating layer as the etching mask.
    Type: Grant
    Filed: March 1, 2010
    Date of Patent: February 5, 2013
    Assignee: Headway Technologies, Inc.
    Inventors: Yoshitaka Sasaki, Hiroyuki Ito, Shigeki Tanemura, Hironori Araki
  • Publication number: 20130026131
    Abstract: The present disclosure describes a method for manufacturing a full wraparound shield damascene write head through the implementation of a three layered (tri-layered) hard mask. According to an embodiment of the invention, the various layers of hard mask are used for different purposes during the formation of a write head. The wraparound shield head of the present invention exhibits improved physical characteristics that further result in improved performance characteristics. Use of the hard mask layers according to the present invention allows for use of manufacturing processes that can be more closely controlled than those processes used in other processes. For example, smaller dimension lithographic techniques can be used. Also, reliance on certain CMP processes is not necessary where the use of CMP processes is not as well-controlled as deposition or lithographic techniques as is possible using the present invention.
    Type: Application
    Filed: July 28, 2011
    Publication date: January 31, 2013
    Applicant: Hitachi Global Storage Technologies Netherlands B.V.
    Inventors: Shiwen Huang, Fenglin Liu, Qiping Zhong, Kyusik Shin, Yingjian Chen
  • Publication number: 20130026132
    Abstract: A planarizing film-forming composition for a hard disk that is a non-magnetic filler is sufficiently filled into fine grooves on a magnetic material surface (surface), and is required not to cause contraction in the filled parts at the time of photo-curing (at the time of exposure) and post-exposure baking; and a method for producing a hard disk using the composition. The composition comprising at least one polyfunctional (meth)acrylate compound being in a liquid state at room temperature and atmospheric pressure and having a molecular weight of 300 to 10,000. The compound preferably has 2 to 20 (meth)acrylate groups in the molecule, or the compound preferably has a molecular weight of 300 to 2,300. A method for producing a hard disk comprising: forming a concave-convex shape on the surface; covering the surface having the concave-convex shape with the composition; and etching the covered surface for planarization until the surface is exposed.
    Type: Application
    Filed: April 18, 2011
    Publication date: January 31, 2013
    Applicant: NISSAN CHEMICAL INDUSTRIES, LTD.
    Inventors: Taku Kato, Junpei Kobayashi, Keisuke Shuto, Masayoshi Suzuki
  • Publication number: 20130020204
    Abstract: A method for manufacturing a magnetic write head having a tapered leading edge. The method includes depositing a sacrificial non-magnetic layer to a thickness that is at least as great as the thickness of the write pole to be formed. The sacrificial non-magnetic layer is then masked and ion milled so as to form a tapered edge on the sacrificial non-magnetic layer that extends through the thickness of the non-magnetic fill layer. A magnetic material is then deposited and planarized by chemical mechanical polishing. The remaining magnetic material forms the entirety of the magnetic write pole so that there is no need to deposit additional magnetic layers further construct the write pole.
    Type: Application
    Filed: July 20, 2011
    Publication date: January 24, 2013
    Inventors: Donald G. Allen, Liubo Hong, Aron Pentek, Thomas J. A. Roucoux, Junsheng Yang, Yi Zheng, Qiping Zhong, Honglin Zhu
  • Publication number: 20130016444
    Abstract: A method for manufacturing a patterned magnetic media. The method allows both a data region and a servo region to be patterned without the patterning of one region adversely affecting the patterning of the other region. The method results in a patterned data region a patterned servo region and intermediate regions between the servo and data regions. The intermediate regions, which are most likely, but not necessarily, asymmetrical with one another indicate that the method has been used to pattern the media.
    Type: Application
    Filed: July 11, 2011
    Publication date: January 17, 2013
    Applicant: Hitachi Global Storage Technologies Netherlands B.V.
    Inventors: Michael K. Grobis, Jeffrey S. Lille, Ricardo Ruiz
  • Patent number: 8354035
    Abstract: A method of removing resist material from a substrate having a magnetically active surface is provided. The substrate is disposed in a processing chamber and exposed to a fluorine-containing plasma formed from a gas mixture having a reagent, an oxidizing agent, and a reducing agent. A cleaning agent may also be included. The substrate may be cooled by back-side cooling or by a cooling process wherein a cooling medium is provided to the processing chamber while the plasma treatment is suspended. Substrates may be flipped over for two-sided processing, and multiple substrates may be processed concurrently.
    Type: Grant
    Filed: June 23, 2010
    Date of Patent: January 15, 2013
    Assignee: Applied Materials, Inc.
    Inventors: Martin A. Hilkene, Majeed A. Foad, Matthew D. Scotney-Castle, Roman Gouk, Steven Verhaverbeke, Peter I. Porshnev
  • Patent number: 8354034
    Abstract: A magnetic head suitable for high-density recording is provided at a high yield by a method that suppresses a reduction in reproducing output signal due to ion-beam irradiation. After an air-bearing surface of a read element, a magnetic-head element, or a row bar is mechanically polished, the air-bearing surface is irradiated with an ion beam, such that an orthographic projection of an ion-beam incidence direction onto the air-bearing surface forms an in-plane incidence angle of 30 degrees to 150 degrees or of 210 degrees to 330 degrees with respect to a track-width direction. Thereby, the formation of a short circuit due to ion-beam irradiation may be hindered.
    Type: Grant
    Filed: June 25, 2009
    Date of Patent: January 15, 2013
    Assignee: Hitachi Global Storage Technologies Netherlands BV
    Inventors: Nobuto Yasui, Shinji Sasaki, Kazuhito Miyata, Mineaki Kodama
  • Publication number: 20130008867
    Abstract: Methods for manufacturing a magnetic tunnel junction structure include forming a magnetic tunnel junction (MTJ) layer by sequentially stacking a first ferromagnetic layer, a tunnel insulation layer, and a second ferromagnetic layer on a substrate, forming a mask pattern on the MTJ layer, and etching at least a portion of the MTJ layer in an etching chamber using the mask pattern as an etch mask, wherein the etching of the at least a portion of the MTJ layer includes applying a RF source power to a first electrode of the etching chamber as first RF power in a first pulselike mode, and applying a RF bias power to a second electrode of the etching chamber as second RF power in a second pulselike mode. The second pulselike mode of the RF bias power has a different phase from the first pulselike mode of the RF source power.
    Type: Application
    Filed: June 26, 2012
    Publication date: January 10, 2013
    Inventors: Ken Tokashiki, Hyung-Joon Kwon, Myeong-Cheol Kim
  • Patent number: 8347489
    Abstract: A method for manufacturing a magnetic write head having a tapered write pole as well as a leading edge taper, and independent trailing and side magnetic shields. The method allows the write pole to be constructed by a dry process wherein the write pole material is either deposited by a process such as sputter deposition or electrically plated and the write pole shape is defined by masking and ion milling. The write pole has a stepped feature that can either be used to provide increased magnetic spacing between the trailing shield and the write pole at a location slightly recessed from the ABS or can be magnetic material that increases the effective thickness of the write pole at a location slightly recessed from the ABS. A bump structure can be further built over that stepped feature to enhance field gradient as well as reduce trailing shield saturation.
    Type: Grant
    Filed: September 1, 2010
    Date of Patent: January 8, 2013
    Assignee: Hitachi Global Storage Technologies Netherlands B.V.
    Inventors: Liubo Hong, Aron Pentek, Yi Zheng, Honglin Zhu
  • Patent number: 8349196
    Abstract: A system is provided for etching patterned media disks for hard drive. The modular system may be tailored to perform specific processes sequences so that a patterned media disk is fabricated without removing the disk from vacuum environment. In some sequence the magnetic stack is etched while in other the etch is performed prior to forming the magnetic stack. In a further sequence ion implantation is used without etching steps. For etching a movable non-contact electrode is utilized to perform sputter etch. The cathode moves to near contact distance to, but not contacting, the substrate so as to couple RF energy to the disk. The substrate is held vertically in a carrier and both sides are etched serially. That is, one side is etched in one chamber and then in the next chamber the second side is etched.
    Type: Grant
    Filed: December 5, 2008
    Date of Patent: January 8, 2013
    Assignee: Intevac, Inc.
    Inventors: Kevin P. Fairbairn, Michael S. Barnes, Terry Bluck, Ren Xu, Charles Liu, Ralph Kerns
  • Patent number: 8347488
    Abstract: A method for manufacturing a magnetic write head having a non-magnetic step layer, non-magnetic bump at the front of the non-magnetic step layer and a write pole with a tapered trailing edge. The tapered portion of the trailing edge of the write pole is formed by a two step process that allows the write pole taper to be formed with greater accuracy and repeatability than would be possible using a single step taper process. An alternative method is also described on how to make a non-magnetic bump structure with adjustable bump throat height prior to Damascene side shield gap formation in a Damascene wrap around shield head.
    Type: Grant
    Filed: December 9, 2009
    Date of Patent: January 8, 2013
    Assignee: Hitachi Global Storage Technologies Netherlands B.V.
    Inventors: Liubo Hong, Aron Pentek, Yi Zheng
  • Patent number: 8349195
    Abstract: A method and system provide a magnetoresistive structure from a magnetoresistive stack that includes a plurality of layers. The method and system include providing a mask that exposes a portion of the magnetoresistive stack. The mask has at least one side, a top, and a base at least as wide as the top. The method and system also include removing the portion of the magnetoresistive stack to define the magnetoresistive structure. The method and system further include providing an insulating layer. A portion of the insulating layer resides on the at least one side of the mask. The method and system further include removing the portion of the insulating layer on the at least one side of the mask and removing the mask.
    Type: Grant
    Filed: June 27, 2008
    Date of Patent: January 8, 2013
    Assignee: Western Digital (Fremont), LLC
    Inventors: Weimin Si, Liubo Hong, Honglin Zhu, Winnie Yu, Rowena Schmidt
  • Patent number: 8349197
    Abstract: A method for manufacturing a magnetic write head having a write pole and a trailing wrap around magnetic shield, and having a non-magnetic step layer and a non-magnetic bump to provide additional spacing between the write pole and the trailing wrap around shield at a location removed from the air bearing surface. A magnetic write pole material is deposited on a substrate and a non-magnetic step layer is deposited over the write pole. A reactive ion milling can he used to pattern the non-magnetic step layer to have a front edge that is located a desired distance from an air hearing surface. A patterning and ion milling process is then performed to define a write pole, and then a layer of alumina is deposited and ion milled to from a tapered, non-magnetic bump at the front the non-magnetic step layer.
    Type: Grant
    Filed: November 20, 2009
    Date of Patent: January 8, 2013
    Assignee: Hitachi Global Storage Technologies Netherlands B.V.
    Inventors: Liubo Hong, Wen-Chien D. Hsiao, Yimin Hsu, Yi Zheng
  • Publication number: 20130001190
    Abstract: A perpendicular magnetic recording (PMR) head is fabricated with a multi-level tapered write pole which creates an efficient channeling of magnetic flux to the pole tip. The write pole comprises a main pole with a tapered tip on which is formed at least one yoke that has a tapered edge. The edge of the yoke is recessed from the ABS of the tapered tip, giving the write pole a stepped profile. The tapered tip can be two sloped surfaces that are symmetric about a mid plane of the main pole or a single sloped edge on the leading side or the trailing side of the pole. The yoke structure can consist of a single yoke formed on one side of the main pole or it can consist of two yokes formed symmetrically on both the leading and trailing sides of the main pole.
    Type: Application
    Filed: September 10, 2012
    Publication date: January 3, 2013
    Applicant: Headway Technologies, Inc.
    Inventors: Zhigang Bai, Kowang Liu, Yan Wu, Moris Dovek
  • Publication number: 20130004763
    Abstract: The embodiments disclose a method of fabricating a stack, including replacing a metal layer of a stack imprint structure with an oxide layer, patterning the oxide layer stack using chemical etch processes to transfer the pattern image and cleaning etch residue from the stack imprint structure to substantially prevent contamination of the metal layers.
    Type: Application
    Filed: June 30, 2011
    Publication date: January 3, 2013
    Applicant: SEAGATE TECHNOLOGY, LLC
    Inventors: Michael R. Feldbaum, Justin Jia-Jen Hwu, David S. Kuo, Gennady Gauzner, Kim Yang Lee, Li-Ping Wang
  • Publication number: 20130001189
    Abstract: A composite free layer having a FL1/insertion/FL2 configuration where a top surface of FL1 is treated with a weak plasma etch is disclosed for achieving enhanced dR/R while maintaining low RA, and low ? in TMR or GMR sensors. The weak plasma etch removes less than about 0.2 Angstroms of FL1 and is believed to modify surface structure and possibly increase surface energy. FL1 may be CoFe, CoFe/CoFeB, or alloys thereof having a (+) ? value. FL2 may be CoFe, NiFe, or alloys thereof having a (?) ? value. The thin insertion layer includes at least one magnetic element such as Co, Fe, and Ni, and at least one non-magnetic element. When CoFeBTa is selected as insertion layer, the CoFeB:Ta ratio is from 1:1 to 4:1.
    Type: Application
    Filed: July 30, 2012
    Publication date: January 3, 2013
    Applicant: Headway Technologies, Inc.
    Inventors: Tong Zhao, Hui Chuan Wang, Min Li, Kunliang Zhang
  • Publication number: 20130004736
    Abstract: The embodiments disclose a method of protecting patterned magnetic materials of a stack, including depositing a thin continuous film of an inert material that is inert to the magnetic materials of a patterned stack upon which the thin continuous film is being deposited and forming a thin interim interface layer from the thin continuous film to protect top and sidewall areas of non-etched higher relief magnetic islands and magnetic film etched surfaces of the patterned stack from air exposure damage and damage from contact with backfilled materials.
    Type: Application
    Filed: June 30, 2011
    Publication date: January 3, 2013
    Applicant: SEAGATE TECHNOLOGY, LLC
    Inventors: Zhaohui Fan, Yuan Xu, Justin Jia-Jen Hwu, Koichi Wago, David Shiao-Min Kuo
  • Publication number: 20130001188
    Abstract: The embodiments disclose a method to protect magnetic bits during carbon field planarization, including depositing a stop layer upon magnetic bits and magnetic film of a patterned stack, depositing a carbon fill layer on the stop layer and using the stop layer during planarization and etch-back of the carbon field to protect the patterned stack magnetic bits during the carbon field planarization.
    Type: Application
    Filed: June 30, 2011
    Publication date: January 3, 2013
    Applicant: SEAGATE TECHNOLOGY, LLC
    Inventors: David Kuo, Michael R. Feldbaum, Paritosh Rajora, Hieu Lam
  • Patent number: 8343364
    Abstract: A method of forming a near field transducer (NFT) for energy assisted magnetic recording is disclosed. A structure comprising an NFT metal layer and a first hardmask layer over the NFT metal layer is provided A first patterned hardmask is formed from the first hardmask layer, the first patterned hardmask disposed over a disk section and a pin section of the NFT to be formed. An etch process is performed on the NFT metal layer via the first patterned hardmask, the etch process forming the NFT having the disk section and the pin section.
    Type: Grant
    Filed: June 8, 2010
    Date of Patent: January 1, 2013
    Assignee: Western Digital (Fremont), LLC
    Inventors: Wei Gao, Guanxiong Li, Zhongyan Wang, Yufeng Hu, Ge Yi
  • Patent number: 8341826
    Abstract: A method and system for fabricating magnetic transducer are described. The method and system include providing a main pole having a bottom, a top wider than the bottom, and a top bevel. A nonmagnetic gap covering the main pole is provided. A portion of the nonmagnetic gap resides on the top of the main pole. A first seed layer is provided. At least a portion of the first seed layer covers the portion of the nonmagnetic gap on top of the main pole. A portion of the nonmagnetic gap on the magnetic recording transducer is removed after the first seed layer is provided. A second seed layer is provided after the portion of the nonmagnetic gap is removed. The second seed layer covers at least the portion of the first seed layer. A wrap-around shield layer is provided on the second seed layer.
    Type: Grant
    Filed: April 12, 2010
    Date of Patent: January 1, 2013
    Assignee: Western Digital (Fremont), LLC
    Inventors: Hai Jiang, Yunhe Huang, Jinwen Wang, Yun-Fei Li, Ying Hong
  • Patent number: 8343363
    Abstract: A method for fabricating an air-bearing surface (ABS) in a substrate having a surface is described. The substrate is for a magnetic recording head. The method includes providing a mask on the surface of substrate. The mask has an edge adjacent to a portion of the substrate exposed by the mask. The method also includes forming a taper in the portion of the substrate adjacent to the edge. The taper has an angle from the surface of the substrate of at least thirty degrees and not more than seventy degrees. The method also includes performing a reactive ion etching (RIE) to remove the portion of the substrate to form a cavity in the substrate. The angle of the taper is configured to substantially eliminated redeposition from the RIE on the edge.
    Type: Grant
    Filed: March 10, 2010
    Date of Patent: January 1, 2013
    Assignee: Western Digital (Fremont), LLC
    Inventors: Chupong Pakpum, Laddawan Supadee
  • Publication number: 20120325771
    Abstract: A method of fabricating media comprises forming recording media on a substrate. An overcoat is deposited on the recording media opposite the substrate. The overcoat has a first surface finish. The overcoat is etched to remove material and provide the overcoat with a second surface finish that is smoother than the first surface finish. The depositing and etching may occur sequentially in an in-situ, dry vacuum process. The second surface finish may not be mechanically processed after etching to further planarize the overcoat.
    Type: Application
    Filed: September 5, 2012
    Publication date: December 27, 2012
    Applicant: HGST NETHERLANDS B.V.
    Inventors: Xiaoping Bian, Qing Dai, Dan S. Kercher, Mark F. Mercado, Qi-fan Xiao, Jane J. Zhang
  • Publication number: 20120328907
    Abstract: According to one aspect of the present invention, provided is glass for use in substrate for information recording medium, which comprises, denoted as molar percentages, a total of 70 to 85 percent of SiO2 and Al2O3, where SiO2 content is equal to or greater than 50 percent and Al2O3 content is equal to or greater than 3 percent; a total of equal to or greater than 10 percent of Li2O, Na2O and K2O; a total of 1 to 6 percent of CaO and MgO, where CaO content is greater than MgO content; a total of greater than 0 percent but equal to or lower than 4 percent of ZrO2, HfO2, Nb2O5, Ta2O5, La2O3 Y2O3 and TiO2; with the molar ratio of the total content of Li2O, Na2O and K2O to the total content of SiO2, Al2O3, ZrO2, HfO2, Nb2O5, Ta2O5, La2O3, Y2O3 and TiO2 ((Li2O+Na2O+K2O)/(SiO2+Al2O3+ZrO2+HfO2+Nb2O5+Ta2O5+La2O3+Y2O3+TiO2)) being equal to or less than 0.28.
    Type: Application
    Filed: September 6, 2012
    Publication date: December 27, 2012
    Applicant: HOYA CORPORATION
    Inventors: Kazuo TACHIWANA, Yoichi HACHITANI, Xuelu ZOU, Mikio IKENISHI, Kinobu OSAKABE
  • Patent number: 8336194
    Abstract: A method of fabricating a tunneling magnetoresistance (TMR) reader is disclosed. A TMR structure comprising at least one ferromagnetic layer and at least one nonmagnetic insulating layer is provided. A first thermal annealing process on the TMR structure is performed. A reader pattern definition process performed on the TMR structure to obtain a patterned TMR reader. A second thermal annealing process is performed on the patterned TMR reader.
    Type: Grant
    Filed: November 3, 2009
    Date of Patent: December 25, 2012
    Assignee: Western Digital (Fremont), LLC
    Inventors: Lu Yuan, Jian X. Shen, Geoffrey W. Anderson, Christopher Ng
  • Patent number: 8336193
    Abstract: Provided is a process for making a magnetic recording medium having a magnetically partitioned magnetic recording patterns, which comprises the following three steps (1), (2) and (3), conducted in this order: (1) a step of forming a magnetic layer on a non-magnetic substrate; (2) a step of removing surface layer portions of regions for magnetically partitioning the magnetic layer; and (3) a step of exposing the thus-exposed regions of the magnetic layer, from which the surface layer portions have been removed, to a reactive plasma or a reactive ion, to modify the magnetic characteristics of the regions of magnetic layer, whereby a magnetic recording pattern is formed which are magnetically partitioned by the regions of magnetic layer having the modified characteristics. Thus, a magnetic recording medium having an enhanced recording density and minimizing letter bleeding at writing can be made with a high efficiency.
    Type: Grant
    Filed: July 24, 2008
    Date of Patent: December 25, 2012
    Assignee: Showa Denko K.K.
    Inventors: Masato Fukushima, Akira Sakawaki, Akira Yamane
  • Patent number: 8334213
    Abstract: A BE patterning scheme in a MRAM is disclosed that avoids damage to the MTJ array and underlying ILD layer while reducing BE-BE shorts and BE-bit line shorts. A protective dielectric layer is coated over a MTJ array before a photoresist layer is coated and patterned on the dielectric layer. The photoresist pattern is transferred through the dielectric layer with a dielectric etch process and then through the BE layer with a metal etch that includes a certain amount of overetch to remove metal residues. The photoresist is stripped with a sequence involving immersion or spraying with an organic solution followed by oxygen ashing to remove any other organic materials. Finally, a second wet strip is performed with a water based solution to provide a residue free substrate. In another embodiment, a bottom anti-reflective coating (BARC) is inserted between the photoresist and dielectric layer for improved critical dimension control.
    Type: Grant
    Filed: June 5, 2009
    Date of Patent: December 18, 2012
    Assignee: MagIC Technologies, Inc.
    Inventor: Guomin Mao
  • Patent number: 8333898
    Abstract: A method for manufacturing a magnetic tape head having a data sensor and a servo sensor. The data sensor and servo sensor are each separated from first and second magnetic shields by a non-magnetic gap layer, and the gap thickness for the servo sensor is larger than the gap thickness for the data sensor. The method involves depositing a first gap layer over shield structures, then depositing a second gap layer using a liftoff process to remove the second gap layer over the data sensor region. A plurality of sensor layers are then deposited, and a stripe height defining mask structure is formed over the data and servo sensor regions, the mask having a back edge that is configured to define a stripe height of the data and servo sensors. An ion milling is then performed to define the stripe height and to remove gap material from the field.
    Type: Grant
    Filed: December 20, 2010
    Date of Patent: December 18, 2012
    Assignee: Hitachi Global Storage Technologies Netherlands B.V.
    Inventors: Diane L. Brown, Quang Le, Chang-Man Park, David J. Seagle, Eileen Yan
  • Patent number: 8333899
    Abstract: According to one embodiment, a method of manufacturing a magnetic recording medium includes forming on a magnetic recording layer a first hard mask, a second hard mask, a third hard mask and a resist, imprinting the resist with a stamper, removing a residue left in the recesses of the patterned resist, etching the third hard mask by use of the patterned resist as a mask, etching the second hard mask by use of the third hard mask as a mask, etching the first hard mask by use of the second hard mask as a mask, forming a pattern of the magnetic recording layer with ion beam irradiation, and removing the first hard mask by use of a remover liquid with higher reactivity to the metal material of the first hard mask than to a constituent element of the magnetic recording layer.
    Type: Grant
    Filed: January 14, 2011
    Date of Patent: December 18, 2012
    Assignee: Kabushiki Kaisha Toshiba
    Inventors: Masatoshi Sakurai, Kaori Kimura, Yousuke Isowaki, Akira Watanabe, Yoshiyuki Kamata