Abstract: A method fabricates a magnetic transducer. A sacrificial leading shield is provided on an etch stop layer. A nonmagnetic layer is provided on the sacrificial leading shield. A pole trench is formed in the nonmagnetic layer and on the sacrificial leading shield. A pole is formed. The pole has a bottom and a top wider than the bottom in a pole tip region. Part of the pole in the pole tip region is in the pole trench and at the ABS location. The sacrificial leading shield and part of the nonmagnetic layer adjacent to the pole are removed. An air bridge thus resides in place of the sacrificial leading shield between the portion of the pole and the etch stop layer. As least one shield layer is provided. The at least one shield layer substantially fills the air bridge and form a monolithic shield including a leading and side shields.

Abstract: A method of stabilizing electromagnetically charged particles, which includes coating electromagnetically charged particles with a protective layer; and etching the protective layer to produce a porous protective layer on the electromagnetically charged.

Abstract: Disclosed herein is a method of manufacturing a noise removing filter, including preparing at least one conductive pattern, an insulating layer for covering the at least one conductive pattern, and a lower magnetic body including input/output stud terminals for electrically inputting and outputting electricity to and from the at least one conductive pattern; disposing a recognizable portion on upper surfaces of the input/output stud terminals; disposing an upper magnetic body on the recognizable portion and the insulating layer; polishing the upper magnetic body; and removing the recognizable portion such that a level of an upper surface of the upper magnetic body is higher than levels of the upper surfaces of the input/output stud terminals.

Abstract: The present invention generally relates to methods for forming a sensor structure utilizing a shallow and narrow hard mask stencil. In one embodiment, a sensor structure is formed by utilizing a four-layered hard mask stencil. The four-layered hard mask stencil includes a first mask layer, a second mask layer disposed over the first hard mask, a third mask layer disposed over the second mask layer, and a forth mask layer disposed over the third mask layer. In another embodiment, a sensor structure is formed by utilizing a three-layered hard mask stencil. The three-layered hard mask stencil includes a first mask layer, a second mask layer disposed over the first mask layer, and a third mask layer disposed over the second mask layer. The sensor structure is formed with a two-step chemical mechanical planarization (CMP) process.

Abstract: Methods for reducing the surface roughness of magnetic media to be used in storage drives are described. One such method includes forming a recording media on a substrate, the recording media including at least one recording layer configured to store information magnetically, depositing a first layer of carbon on the recording media, the first carbon layer having a first average preselected thickness, etching the first carbon layer to have a second average preselected thickness less than the first average preselected thickness, depositing a second layer of carbon on the etched first carbon layer, the second carbon layer having a third average preselected thickness that is less than the first average preselected thickness, and implanting nitrogen in the second carbon layer.

Abstract: In a method of manufacturing a near-field light generator, a structure including a core and a polishing stopper layer disposed on the top surface of the core is formed on a first cladding layer. Next, a cladding material layer is formed to cover the first cladding layer and the structure. The cladding material layer is then polished until the polishing stopper layer is exposed. Next, the polishing stopper layer is removed so that the cladding material layer has a protruding portion protruding upward to a higher level than the top surface of the core. The cladding material layer is then polished so as to remove the protruding portion and thereby make the cladding material layer into a second cladding layer. Then, a third cladding layer and a plasmon generator are formed.

Abstract: A polishing composition for a magnetic disk substrate of the present invention includes water, silica particles, and at least one or more selected from an acid, a salt of the acid, and an oxidizing agent. The silica particles are observed with a transmission electron microscope to measure a maximum diameter and a projected area of each particle, and a value obtained by dividing the area of a circle whose diameter is the maximum diameter of a silica particle by the projected area of the silica particle and multiplying the result by 100, is in the range of 100 to 130.

Abstract: The present invention generally relates to methods for forming a sensor structure utilizing a shallow and narrow hard mask stencil. In one embodiment, a sensor structure is formed by utilizing a four-layered hard mask stencil. The four-layered hard mask stencil includes a first mask layer, a second mask layer disposed over the first hard mask, a third mask layer disposed over the second mask layer, and a forth mask layer disposed over the third mask layer. In another embodiment, a sensor structure is formed by utilizing a three-layered hard mask stencil. The three-layered hard mask stencil includes a first mask layer, a second mask layer disposed over the first mask layer, and a third mask layer disposed over the second mask layer. The sensor structure is formed with a two-step chemical mechanical planarization (CMP) process.

Abstract: A method for manufacturing a magnetic write pole using a mask that includes a multi-layer hard mask. The multi-layer hard mask hard mask includes a first hard mask layer that is constructed of a Si containing material that can be spun on and a second hard mask material that is deposited by a deposition process such as sputter deposition. The first hard mask layer has optical properties that allow it to function well as a bottom anti-reflective coating (BARC) and also has optical properties that match well with an underlying image transfer layer. The second hard mask material has good selectivity for reactive ion etching so that it functions well as a RIE hard mask.

Abstract: A method for etching a media is disclosed. A first magnetic layer comprising grains is deposited with a segregant such that a portion of the first segregant covers a top surface of the grains of the first magnetic layer and a second portion of the first segregant separates the grains of the first magnetic layer. The first segregant is etched to remove the portion of the first segregant that covers the top surface of the grains.

Abstract: A method and system provide a substantially seamless interface in a magnetic transducer. The magnetic recording transducer includes a first layer and a second layer on the first layer. The second layer is different from the first layer. The first layer consists of at least one material. The method includes removing at least the second layer using a first removal process. A residue of the second layer and a first portion of the first layer remain after the first removal process. A first sacrificial layer consists of the at least one material on the first portion of the first layer. At least the first sacrificial layer is removed using a second removal process. A second portion of the first layer remains after completion of the second removal process. An additional structure is provided. The seamless interface is between the second portion of the first layer and the additional structure.

Abstract: The embodiments of the present invention generally relate to a method for forming a trench in which a write pole is deposited therein. The trench is formed with a single mask and multiple reactive ion etching (RIE) processes and has substantially straight side walls and a consistent bevel angle along the length of the write pole. The consistent bevel angle along the length of the write pole allows the bevel angle at the ABS to be consistent regardless of where the cut is when defining the ABS.

Abstract: A method for fabricating a structure in magnetic recording head is described. First and second hard mask layers are provided on the layer(s) for the structure. A BARC layer and photoresist mask having a pattern are provided on the second hard mask layer. The pattern includes a line corresponding to the structure. The pattern is transferred to the BARC layer and the second hard mask layer in a single etch using an etch chemistry. At least the second hard mask layer is trimmed using substantially the same first etch chemistry. A mask including a hard mask line corresponding to the line and less than thirty nanometers wide is thus formed. The pattern of the second hard mask is transferred to the first hard mask layer. The pattern of the first hard mask layer is transferred to the layer(s) such that the structure has substantially the width.

Abstract: A two part ion beam etch sequence involving low energy (<300 eV) is disclosed for fabricating a free layer width (FLW) as small as 20-25 nm in a MTJ element. A first etch process has one or more low incident angles and accounts for removal of 70% to 100% of the MTJ stack that is not covered by an overlying photoresist layer. The second etch process employs one or more high incident angles and a sweeping motion that is repeated during a plurality of cycles. Sidewall slope may be adjusted by varying the incident angle during either of the etch processes. FLW is about 30 nm less than an initial critical dimension in the photoresist layer while maintaining a MR ratio over 60% and low RA (resistance×area) value of 1.0 ohm-?m2.

Abstract: In one embodiment, a pattern forming method includes: forming a functional layer having a functional group to cross-link a first polymer on a substrate; forming a diblock copolymer layer having the first polymer and a second polymer on the functional layer; self-assembling the diblock copolymer layer to form a self-assembled layer, the self-assembled layer having a first domain corresponding to the first polymer, and a plurality of second domains corresponding to the second polymer and surrounded by or interposed in the first domain; cross-linking the first polymer in the self-assembled layer with the functional group in the functional layer to form a bonding layer disposed in the self-assembled layer and bonded to the functional layer; and washing or etching the self-assembled layer to remain the bonding layer.

Abstract: An apparatus is provided that includes a waveguide adjacent an air bearing surface, a near-field transducer comprising a peg having a side orthogonal to the air bearing surface and a write pole adjacent to the waveguide. The write pole includes a first portion extending towards the air bearing surface at a non-orthogonal angle with respect to the air bearing surface, and a second portion in contact with the first portion comprising a side that extends towards and orthogonally contacts the air bearing surface. The second portion or the write pole defines a gap between the side of the peg orthogonal to the air bearing surface and the side of the second portion of the write pole that extends towards and orthogonally contacts the air bearing surface. A method of making a magnetic recording head that includes the provided apparatus is also disclosed.

Abstract: A magnetic write head is fabricated with its main pole attached to and magnetically coupled to a tapered yoke. The tapered yoke can be a top yoke (on the trailing side of the pole), a bottom yoke (on the leading side of the pole) or a combination of top and bottom configurations. The tapered portion of the yoke is at the distal end of the yoke and it is an extension of an otherwise uniformly thick yoke. It is found that the taper enables the yoke to be close to the ABS for better response times and a high data rate, while simultaneously being distant, producing less field disturbance by the shields and corresponding improvement of BER, and ATE/WATE. A taper of 45° is optimal for its production of uniform magnetization of the pole and optimal response times.

Abstract: A perpendicular magnetic recording write head has a main pole that is typically CoFe electroplated into a generally trapezoidal shaped alumina trench. A metallic side gap layer is deposited into the alumina trench to adjust the trench width to the desired main pole dimension. A nonmagnetic metallic amorphous underlayer, preferably an amorphous NiTa alloy or an amorphous NiNb alloy, is then deposited on the side gap layer. A pole seed layer, such as a NiCr/CoFe bilayer, is deposited into the trench onto the metallic amorphous underlayer prior to electroplating the CoFe main pole. The metallic amorphous underlayer serves to reset the growth between the side gap layer and the NiCr/CoFe pole seed layer. The metallic amorphous underlayer does not insulate the electroplating CoFe layer from the metallic side gap layer, which allows for better current conduction normal to the layers, resulting in a main pole with improved magnetic properties.

Abstract: A manufacturing method of a magnetic recording medium includes steps of forming a magnetic recording layer, a first mask layer, a second mask layer containing silicon as primary component, a strip layer, a third mask layer, and a resist layer, a step of patterning the resist layer to provide a pattern, steps of transferring the pattern to the third mask layer, to the strip layer, and to the second mask layer, a step of removing the strip layer by wet etching and of stripping the third mask layer and the resist layer above the magnetic recording layer, steps of transferring the pattern to the first mask layer and to the magnetic recording layer, and a step of stripping the first mask layer remaining on the magnetic recording layer.

Abstract: A suspension board with circuit includes a metal supporting board, an insulating layer formed on the metal supporting board, and a conductive pattern formed on the insulating layer and having a terminal portion connected to connecting terminals of a magnetic head mounted on a slider. A slider mounting region where the slider is disposed is defined, and a plurality of the terminal portions are spaced apart from each other in the slider mounting region, and in the metal supporting board, an opening which opens so as to expose the insulating layer where the terminal portions are disposed is formed at the slider mounting region.

Abstract: Tolerances for manufacturing reader structures for transducer heads continue to grow smaller and storage density in corresponding storage media increases. Reader stop layers may be utilized during manufacturing of reader structures to protect various layers of the reader structure from recession and/or scratches while processing other non-protected layers of the reader structure. For example, the stop layer may have a very low polish rate during mechanical or chemical-mechanical polishing. Surrounding areas may be significantly polished while a structure protected by a stop layer with a very low polish rate is substantially unaffected. The stop layer may then be removed via etching, for example, after the mechanical or chemical-mechanical polishing is completed.

Abstract: In one embodiment, a method includes masking a sensor stack with a first mask, milling exposed regions of the sensor stack for defining a back edge of the sensor stack, forming a tantalum oxide layer along the back edge, removing the first mask, masking the sensor stack with a second mask, and milling exposed regions of the sensor stack for defining side edges of the sensor stack, a width of the sensor stack in a track width direction being defined between the side edges. In another embodiment a system includes a sensor stack of thin films having a back edge, and a tantalum oxide layer extending along the back edge.

Abstract: According to one embodiment, a magnetic recording medium including a substrate and a magnetic recording layer formed on the substrate and including a plurality of projections is obtained. The array of the plurality of projections includes a plurality of domains in which the projections are regularly arranged, and a boundary region between the domains, in which the projections are irregularly arranged. The boundary region is formed along a perpendicular bisector of a line connecting the barycenters of adjacent projections.

Abstract: According to exemplary embodiments, a pattern forming method includes: forming a diblock copolymer coating film by applying coating liquid containing a diblock copolymer including a chain of a first polymer and a chain of a second polymer which is not compatible with the first polymer, and a homopolymer having affinity with the first polymer, on a substrate, and drying the liquid; and performing phase separation of the first polymer and the second polymer by providing a coating film for solvent annealing using a solvent having compatibility with the second polymer.

Abstract: A method in one approach includes forming a first layer of a nonmagnetic material over two sides of a structure, the first layer being substantially absent from above a top of the structure; depositing an overlayer of an etchable, nonmagnetic material over the first layer and the top of the structure; and etching the overlayer for substantially removing the overlayer from above the top of the structure, wherein a substantial portion of the overlayer remains along the two sides of the structure after the etching. Additional systems and methods are also presented.

Abstract: The embodiments disclose a method including creating at least one first structure including magnetically isolated features in servo fields, and creating at least one second structure including finger-structure patterns including intentional weak nucleation points in servo fields to create a regular bi-polar magnetization direction after bulk DC initialization, and wherein the first and second structures form bi-polar complementary structure patterns.

Abstract: A data reader and associated method of making are generally provided. A data reader capable of sensing adjacent data bits may be configured at least with a magnetic stack disposed between first and second side shields. Each side shield may have a polish stop layer that is tuned to provide a first predetermined polish rate.

Abstract: In accordance with one embodiment, a method may be implemented by depositing a non-magnetic gap layer of material above a main pole layer of magnetic material; depositing a sacrificial layer of material above the non-magnetic gap layer of material; etching a portion of the sacrificial layer of material while not entirely removing the sacrificial layer of material; and depositing additional sacrificial material to the etched sacrificial layer.

Abstract: In accordance with certain embodiments, a method can be utilized that includes depositing a backfill material layer over a reader stack; depositing a chemical-mechanical-polishing stop layer above the layer of backfill material; and depositing a sacrificial layer on top of the chemical-mechanical-polishing stop layer.

Abstract: A method provides an EAMR transducer. The EAMR transducer is coupled with a laser and has an ABS configured to reside in proximity to a media during use. The method includes providing an NFT using an NFT mask. The NFT resides proximate to the ABS and focuses the laser energy onto the media. A portion of the NFT mask is removed, forming a heat sink mask covering part of the NFT. Optical material(s) are deposited, covering the heat sink mask and the NFT. The heat sink mask is removed, providing an aperture in the optical material(s). A heat sink corresponding to the aperture is provided. The heat sink bottom is thermally coupled with the NFT. A write pole for writing to the media and coil(s) for energizing the write pole are provided. The write pole has a bottom surface thermally coupled with the top surface of the heat sink.

Abstract: Write heads may be formed by reactive ion etching (RIE) a dielectric mask and then reactive ion etching a polymeric underlayer. The first RIE affects the second RIE. The first portion of the first RIE process is performed with a ratio of CF4 to CHF3 between about 1.3 to 2, a gas flow ratio of CF4 to He between 2.2 and about 3, and a ratio of RF source power to RF bias power between about 10 and about 16. The second portion of the first RIE process is performed with a ratio of CF4 to CHF3 between about 0.3 to 0.8, a gas flow ratio of CF4 to He between about 1.2 and about 1.8, and a ratio of RF source power to RF bias between about 22 to 28. With the above parameters, the dielectric mask can be formed with minimized damage on the underlayer.

Abstract: A reaction block having a plurality of reaction chambers defined therein is provided. A bottom surface of each of the reaction chambers is configured to provide a seal for a corresponding reaction region on the substrate and around a periphery of the substrate. The reaction block includes a plurality of inlet channels and provides a gap between a top surface of the substrate and a bottom surface of the reaction block. The gap accepts a fluid from the inlet channels, wherein the reaction block includes a plurality of vacuum channels having access to the bottom surface of the reaction block to remove the fluid from the gap. A method of selectively etching a substrate for combinatorial processing is also provided.

Abstract: A method for making a perpendicular magnetic recording disk includes forming a template layer below a Ru or Ru alloy underlayer, with a granular Co alloy recording layer formed on the underlayer. The template layer is formed by depositing a solution of a polymer with a functional end group and nanoparticles, allowing the solution to dry, annealing the polymer layer to thereby form a polymer layer with embedded spaced-apart nanoparticles, and then etching the polymer layer to a depth sufficient to partially expose the nanoparticles so they protrude above the surface of the polymer layer. The protruding nanoparticles serve as controlled nucleation sites for the Ru or Ru alloy atoms. The nanoparticle-to-nanoparticle distances can be controlled during the formation of the template layer. This enables control of the Co alloy grain diameter distribution as well as grain-to-grain distance distribution.

Abstract: An object of the invention is to effectively remove particles on the glass substrate surfaces, even in the case wherein abrasive particles having a small particle size is used in the polishing step of the glass substrate and a supersonic treatment is performed at a high frequency at the supersonic cleaning step after the polishing step. In a manufacturing method of a glass substrate for a magnetic disk comprising a polishing step for performing polishing of the glass substrate and a supersonic cleaning step for performing supersonic cleaning of the glass substrate after the polishing step, the polishing step uses abrasive particles having a particle size of 10 nm to 30 nm and a first supersonic cleaning is performed at a frequency of 300 kHz to 1,000 kHz to form secondary particles and then a second supersonic cleaning is performed at a frequency of 30 kHz to 100 kHz in the supersonic cleaning step.

Abstract: A method for manufacturing a glass substrate for a magnetic disk comprises a surface grinding step of processing a mirror-surface plate glass, having a main surface in the form of a mirror surface, to a required flatness and surface roughness using fixed abrasive particles. The method comprises, before the surface grinding step using the fixed abrasive particles, a surface roughening step of roughening the surface of the mirror-surface plate glass by frosting.

Abstract: A method for patterning a substrate is disclosed. Depressions are patterned into a resist layer over a substrate. A mask layer is deposited over the resist layer at least partially filling the depressions. The mask layer is etched to expose a top surface of the resist layer and leaving at least a portion of the mask layer in the depressions of the resist layer, wherein the mask layer over said top surface of the resist layer is etched at a faster rate than said mask layer in the depressions of the resist layer. Exposed portions of the resist layer are removed to expose portions of the substrate. Exposed portions of the substrate are etched.

Abstract: A magnetoresistive device includes an MR element including a metal layer, and an insulating portion made of magnesium oxide and in contact with the MR element. A method of manufacturing the magnetoresistive device includes the step of removing an unwanted magnesium oxide film that is formed by the magnesium oxide in the process of forming the insulating portion. In this step, the unwanted magnesium oxide film is wet etched by using an etchant containing an aqueous ammonia solution.

Abstract: A method for applying a protective layer to an electronic device such as the ABS of a slider, magnetic head, etc. for reducing paramagnetic deadlayer thickness includes selecting an etching angle for minimizing formation of a paramagnetic deadlayer at an interface of an electronic device and an adhesive layer subsequently formed on the electronic device, etching a surface of an electronic device at the selected angle, the selected angle being less than about 75 degrees from an imaginary line extending perpendicular to the surface, forming an adhesive layer on the etched surface of the electronic device, and forming a protective layer on the adhesive layer. A magnetic head formed by the process is also disclosed.

Abstract: A method for making a master mold used to nanoimprint patterned magnetic recording disks that have chevron servo patterns with minimal defects uses directed self-assembly of block copolymers. A pattern of chemically modified polymer brush material is formed on the master mold substrate. The pattern includes sets of slanted stripes and interface strips between the sets of slanted stripes. A block copolymer material is deposited on the pattern, which results in directed self-assembly of the block copolymer as lamellae perpendicular to the substrate that are formed into alternating slanted stripes of alternating first and second components of the block copolymer. This component also forms on the interface strips, but as a lamella parallel to the substrate. One of the components is then removed, leaving the remaining component as a grid that acts as a mask for etching the substrate to form the master mold.

Abstract: A flattening film forming composition for a hard disk that can prevent a magnetic material from migrating to the nonmagnetic layer, including a photopolymerizable coating material containing at least one polymer selected from a homopolymer that has a divinyl aromatic compound-derived unit structure and a copolymer having the unit structure or containing a mixture of the polymer and a photopolymerizable compound. The photopolymerizable compound may include an acrylate group, a methacrylate group, or a vinyl group. The polymer may be a copolymer further containing an addition polymerizable compound as a component to be copolymerized. A method for producing a hard disk, including: a first step of forming projections and recesses on a magnetic body; a second step of coating the projections and recesses with the flattening film forming composition; and a third step of flattening the coating by means of etching and exposing a surface of the magnetic body.

Abstract: Method and apparatus for forming a patterned magnetic substrate are provided. A patterned resist is formed on a magnetically active surface of a substrate. An oxide layer is formed over the patterned resist by a flowable CVD process. The oxide layer is etched to expose portions of the patterned resist. The patterned resist is then etched, using the etched oxide layer as a mask, to expose portions of the magnetically active surface. A magnetic property of the exposed portions of the magnetically active surface is then modified by directing energy through the etched resist layer and the etched oxide layer, which are subsequently removed from the substrate.

Abstract: A method for manufacturing a magnetic media having an extremely thin lubricant layer on a magnetic media. The thin lubricant layer decreases magnetic spacing to maximize magnetic performance of the magnetic data recording system. The lubricant layer is formed by first depositing a lubricant that includes two different lubricant materials, one bonded and the other non-bonded. After lubricant deposition a burnishing process can be performed, with the lubricant being thick enough for effective burnishing. Then, the disk is exposed to a solvent vapor, which removes most of the lubricant leaving only a very thin layer of the bonded lubricant material.

Abstract: A method for making a perpendicular magnetic recording disk includes forming a template layer below a Ru or Ru alloy underlayer, with a granular Co alloy recording layer formed on the underlayer. The template layer is formed by depositing a solution of a polymer with a functional end group and nanoparticles, allowing the solution to dry, annealing the polymer layer to thereby form a polymer layer with embedded spaced-apart nanoparticles, and then etching the polymer layer to a depth sufficient to partially expose the nanoparticles so they protrude above the surface of the polymer layer. The protruding nanoparticles serve as controlled nucleation sites for the Ru or Ru alloy atoms. The nanoparticle-to-nanoparticle distances can be controlled during the formation of the template layer. This enables control of the Co alloy grain diameter distribution as well as grain-to-grain distance distribution.

Abstract: The method forms forming an open-network polishing pad useful for polishing magnetic, semiconductor and optical substrates. The method provides a polymer sheet or film of a curable polymer and exposes the polymer sheet or film to an energy source to create an exposure pattern in the polymer sheet or film. The exposure pattern having elongated sections exposed to the energy source. After attaching the polymer sheet or film to an open-network substrate, the method removes polymer adjacent from the exposed polymer sheet or film of the intermediate structure with a solvent. This forms elongated channels through the polymer sheet or film in a texture pattern that corresponds to the exposure pattern with the open-network supporting the polymer. The elongated channels extending through the thickness of the polymer sheet or film to form the open-network polishing pad.

Abstract: A write element for a thermally assisted magnetic head slider includes an air bearing surface facing to a magnetic recording medium; a first magnetic pole, a second magnetic pole, and coils sandwiched between the first and the second magnetic poles; a waveguide for guiding light generated by a light source module mounted on a substrate; and a plasmon unit provided around the first magnetic pole and the waveguide, which has a near-field light generating surface for propagating near-field light to the air bearing surface. The near-field light generating surface of the plasmon unit is apart from the air bearing surface with a first predetermined distance to form a first recess, and the first recess is filled in with a protective layer. The thermally assisted magnetic head slider can prevent the plasmon unit from protruding over the air bearing surface, thereby improving the performance of thermally assisted magnetic head.

Abstract: The present disclosure describes a method for manufacturing a full wraparound shield damascene write head through the implementation of a three layered (tri-layered) hard mask. According to an embodiment of the invention, the various layers of hard mask are used for different purposes during the formation of a write head. The wraparound shield head of the present invention exhibits improved physical characteristics that further result in improved performance characteristics. Use of the hard mask layers according to the present invention allows for use of manufacturing processes that can be more closely controlled than those processes used in other processes. For example, smaller dimension lithographic techniques can be used. Also, reliance on certain CMP processes is not necessary where the use of CMP processes is not as well-controlled as deposition or lithographic techniques as is possible using the present invention.

Abstract: A method for manufacturing a magnetic write pole of a magnetic write head that achieves improved write pole definition reduced manufacturing cost and improves ease of photoresist mask re-work. The method includes the use of a novel bi-layer hard mask beneath a photoresist mask. The bi-layer mask includes a layer of silicon dielectric, and a layer of carbon over the layer of silicon dielectric. The carbon layer acts as an anti-reflective coating layer that is unaffected by the photolithographic patterning process used to pattern the write pole and also acts as an adhesion layer for resist patterning. In the event that the photoresist patterning is not within specs and a mask re-work must be performed, the bi-layer mask can remain intact and need not be removed and re-deposited. In addition, the low cost and ease of use silicon dielectric and carbon reduce manufacturing cost and increase throughput.

Abstract: The present invention provides, in a plasma etching method for plasma-etching a magnetic film, a plasma etching method that allows a desired etching depth to be obtained regardless of the opening size of a mask. The present invention is, in a plasma etching method for plasma-etching a magnetic film by using a tantalum film as a mask, characterized by including: a first process to plasma-etch the magnetic film to a desired depth by using a mixed gas of an ammonia gas and a helium gas; and a second process, after the first process, to plasma-etch the magnetic film etched to the prescribed depth by using a mixed gas of an ammonia gas and a gas containing the oxygen element or a mixed gas of an ammonia gas and a gas containing a hydroxyl group.

Abstract: Write heads may be formed by reactive ion etching (RIE) a dielectric mask and then reactive ion etching a polymeric underlayer. The first RIE affects the second RIE. The first portion of the first RIE process is performed with a ratio of CF4 to CHF3 between about 1.3 to 2, a gas flow ratio of CF4 to He between 2.2 and about 3, and a ratio of RF source power to RF bias power between about 10 and about 16. The second portion of the first RIE process is performed with a ratio of CF4 to CHF3 between about 0.3 to 0.8, a gas flow ratio of CF4 to He between about 1.2 and about 1.8, and a ratio of RF source power to RF bias between about 22 to 28. With the above parameters, the dielectric mask can be formed with minimized damage on the underlayer.

Abstract: The present disclosure relates to a magnetic medium that includes a substrate and a bit patterned magnetic layer applied to the substrate. The bit-patterned magnetic layer includes islands and each island includes a first magnetic material having a first magnetic anisotropy and that has a top surface, a bottom surface, and a peripheral surface. Each island also includes a second magnetic material covering the peripheral surface of the first magnetic material and having a second magnetic anisotropy that is higher than the first magnetic anisotropy. In one embodiment, the first magnetic material may comprise a nucleation domain in a centrally located surface portion of the magnetic islands and/or the second magnetic material may comprise an outer shell on the peripheral surface of the islands.