Forming Or Treating Article Containing Magnetically Responsive Material Patents (Class 216/22)
  • Patent number: 8673161
    Abstract: Methods for fabricating a device component are provided. A substrate comprising a RIE stop layer, an oxide layer formed on the RIE stop layer, and a RIE-able layer formed on the oxide layer may be provided. A resist layer may be patterned on the RIE-able layer. A metal layer may be formed on portions of the RIE-able layer that are not covered by the resist layer. The resist layer may be removed and an RIE performed to remove exposed portions of the RIE-able layer and portions of the oxide layer beneath the exposed portions of the RIE-able layer. Thereafter, the metal layer may be removed, and the component may be formed in an opening in the oxide layer formed during the RIE.
    Type: Grant
    Filed: December 29, 2008
    Date of Patent: March 18, 2014
    Assignee: HGST Netherlands B.V.
    Inventors: Christian R. Bonhôte, Jeffrey S. Lille, Ricardo Ruiz
  • Publication number: 20140072830
    Abstract: The disclosure relates generally to a method for fabricating a patterned medium. The method includes providing a substrate with an exterior layer under a lithographically patterned surface layer, the lithographically patterned surface layer comprising a first pattern in a first region and a second pattern in a second region, applying a first masking material over the first region, transferring the second pattern into the exterior layer in the second region, forming self-assembled block copolymer structures over the lithographically patterned surface layer, the self-assembled block copolymer structures aligning with the first pattern in the first region, applying a second masking material over the second region, transferring the polymer block pattern into the exterior layer in the first region, and etching the substrate according to the second pattern transferred to the exterior layer in the second region and the polymer block pattern transferred to the exterior layer in the first region.
    Type: Application
    Filed: September 13, 2012
    Publication date: March 13, 2014
    Inventors: Jeffrey S. Lille, Kurt A. Rubin, Ricardo Ruiz, Lei Wan
  • Patent number: 8670213
    Abstract: A writer main pole for a perpendicular magnetic recording system is provided. The writer pole has a tunable bottom gap to side gap ratio, and may be formed using deposition of a first seed layer through an ion beam deposition process, deposition of a second seed layer through a physical vapor deposition process, and deposition of a non-magnetic gap layer through a chemical vapor deposition process.
    Type: Grant
    Filed: March 16, 2012
    Date of Patent: March 11, 2014
    Assignee: Western Digital (Fremont), LLC
    Inventors: Wanxue Zeng, Weimin Si, Ying Hong, Zhigang Bai
  • Publication number: 20140063658
    Abstract: To uniformly determine the positional relationship between a main magnetic pole and a spin torque oscillator while independently optimizing the main magnetic pole and the spin torque oscillator. On a trailing end surface of a main magnetic pole, a step is provided at the boundary between the main magnetic pole and a gap material disposed on both sides thereof, and a spin torque oscillator is formed on the step. The spin torque oscillator is effectively separated into two regions by utilizing the step. Further, a part of the spin torque oscillator is removed so as to disable the unwanted region, thereby realizing a self-alignment type high frequency magnetic field assisted magnetic recording head structure such that the positions of the end portions of the main magnetic pole and the spin torque oscillator are aligned.
    Type: Application
    Filed: August 16, 2013
    Publication date: March 6, 2014
    Applicant: HITACHI, LTD.
    Inventors: Junichiro SHIMIZU, Kikuo KUSUKAWA, Yo SATO, Masukazu IGARASHI
  • Patent number: 8663486
    Abstract: A method of manufacturing a magnetic recording medium, includes, in the order recited, the steps of forming a mask protective film composed of carbon on a magnetic layer; forming a resist with a predetermined pattern on the mask protective film; forming a protective mask by etching the mask protective film using the resist as a mask; forming protrusions and recesses on a magnetic layer by etching the magnetic layer using the resist and the protective mask as masks; removing the protective mask, including removing the mask protective film comprised of carbon, using ultraviolet light with a principal wavelength not longer than 340 nm; and forming a protective layer on the magnetic layer having the protrusions and recesses formed thereon.
    Type: Grant
    Filed: November 17, 2009
    Date of Patent: March 4, 2014
    Assignee: Fuji Electric Co., Ltd.
    Inventor: Noboru Kurata
  • Patent number: 8658048
    Abstract: The present invention aims to prevent decreases in etching rate due to adhesion of an etched film to a substrate holder. A method of manufacturing a magnetic recording medium includes: forming a first film on a substrate holder not yet having a substrate mounted thereon; mounting a substrate on the substrate holder having the first film formed thereon, the substrate having a resist layer formed on a multilayer film including a magnetic film layer, the resist layer having a predetermined pattern; and processing the magnetic film layer into a shape based on the predetermined pattern by performing dry etching on the substrate. The first film is a film that is not etched as easily as the films in the multilayer film to be removed by the dry etching.
    Type: Grant
    Filed: October 31, 2011
    Date of Patent: February 25, 2014
    Assignee: Canon Anelva Corporation
    Inventors: Kazuto Yamanaka, Shogo Hiramatsu
  • Patent number: 8652338
    Abstract: A magnetic recording medium a magnetic recording medium includes a soft magnetic layer formed on a substrate, magnetic patterns made of a protruded ferromagnetic layer separated from each other on the soft magnetic layer, and a nonmagnetic layer formed between the magnetic patterns, a nitrogen concentration therein being higher on a surface side than on a substrate side.
    Type: Grant
    Filed: November 15, 2012
    Date of Patent: February 18, 2014
    Assignee: Kabushiki Kaisha Toshiba
    Inventors: Kaori Kimura, Yoshiyuki Kamata, Satoshi Shirotori, Tsuyoshi Onitsuka
  • Patent number: 8647517
    Abstract: A producing method of a suspension board with circuit includes simultaneously forming a conductive pattern formed on an insulating layer formed on a metal supporting board and having a terminal portion for connecting to an electronic component, and a mark formed on the metal supporting board, or on the insulating layer and having an opening for forming a reference hole for mounting the electronic component, and forming the reference hole by etching the metal supporting board disposed in the opening of the mark, or the insulating layer and the metal supporting board each disposed in the opening of the mark.
    Type: Grant
    Filed: July 8, 2008
    Date of Patent: February 11, 2014
    Assignee: Nitto Denko Corporation
    Inventors: Takahiko Yokai, Yasunari Ooyabu, Toshiki Naito
  • Publication number: 20140036384
    Abstract: A DFH (Dynamic Flying Height) type slider ABS design has significantly improved DFH efficiency and back-off efficiency as well as uniform touchdown detectability. This is the result of decoupling the local pressure variations at the read/write head that result from skew angle variations across a disk, from local stiffness due to ABS protrusion caused by heater activation. The decoupling, which allows the heater activation stiffness to be carefully tuned, is a result of the effects of airflow channeled by a wide down-track channel onto a narrow down-track channel formed in an extended finger of the central pad of the slider. Airflow impinges on the finger channel in a manner that eliminates variations in air pressure at the central pad due to variations in skew angle.
    Type: Application
    Filed: July 31, 2012
    Publication date: February 6, 2014
    Applicants: HEADWAY TECHNOLOGIES, INC., SAE MAGNETICS (H.K.) LTD.
    Inventors: Guoqiang Zheng, Wan Ting Looi, Kwun Pan Ng, Ellis Cha
  • Publication number: 20140030554
    Abstract: In one embodiment, there are provided: a substrate; a data area disposed on the substrate and having a plurality of first magnetic dots arrayed in lines in mutually different first, second, and third directions; and a boundary magnetic part having a plurality of first magnetic portions arrayed in a line in the third direction and each having a length longer than that of the first magnetic dot in the third direction, and a second magnetic dot disposed between the first magnetic portions and disposed on extensions in the first and second directions of the first magnetic dots, and disposed along with the data area on the substrate.
    Type: Application
    Filed: June 7, 2013
    Publication date: January 30, 2014
    Inventors: Akira KIKITSU, Naoko KIHARA, Yoshiyuki KAMATA, Hiroyuki HIEDA
  • Patent number: 8636913
    Abstract: The present invention generally relates to a method of forming a magnetic head while ensuring residues do not negatively impact the magnetic head. In particular, when performing a RIE process to remove DLC, oxygen gas can leave residues that will negatively impact the RIE process performed on the next substrate to enter the chamber. By utilizing CO2 rather than O2, the residues will not be created and therefore will not impact processing of the next substrate that enters the chamber.
    Type: Grant
    Filed: December 21, 2011
    Date of Patent: January 28, 2014
    Assignee: HGST Netherlands B.V.
    Inventors: Guomin Mao, Satyanarayana Myneni
  • Publication number: 20140014616
    Abstract: A method of making a thermally-assisted recording (TAR) disk includes etching an initial layer of generally spherically shaped FePt grains encapsulated by shells of graphitic carbon layers. The etching partially or completely removes the carbon layers on the tops of the shells, exposing the FePt grains while leaving carbon segregant material between the FePt grains. Additional Fe, Pt and C are then simultaneously deposited. The additional Fe and Pt grow on the exposed FePt grains and increase the vertical height of the grains, resulting in growth of columnar FePt grains. The additional C forms on top of the grains that together with the intergranular carbon form larger carbon shells. The resulting FePt grains thus have a generally columnar shape with perpendicular magnetic anisotropy, rather than a generally spherical shape. Lateral grain isolation is maintained by the carbon segregant remaining between the grains.
    Type: Application
    Filed: July 15, 2012
    Publication date: January 16, 2014
    Inventors: Oleksandr Mosendz, Simone Pisana, James William Reiner, Franck Dreyfus Rose
  • Publication number: 20140014617
    Abstract: A method of forming a PMR writer is disclosed wherein at least one of a recessed center section in the write pole trailing edge and a center recessed trailing shield is used to improve the field gradient at track edge. In all embodiments, there is a non-uniform write gap formed between the trailing edge and the trailing shield. The recessed portion of the write pole trailing edge and/or center recess of the trailing shield has a thickness from 10 to 40 nm in a down-track direction and a width in a cross-track direction of 20 to 200 nm. The distance between the center recess and a corner of the trailing edge is from 20 to 80 nm. A sequence of steps is provided to fabricate the two embodiments of the present invention.
    Type: Application
    Filed: September 23, 2013
    Publication date: January 16, 2014
    Applicant: HEADWAY TECHNOLOGIES, INC.
    Inventor: Lijie Guan
  • Patent number: 8628673
    Abstract: Disclosed are: a resin composition for pattern formation, which enables the stable formation of a pattern at a level of the wavelength of light; a method for forming a pattern having a sea-island structure using the composition; and a process for producing a light-emitting element that can achieve high luminous efficiency properties.
    Type: Grant
    Filed: May 12, 2010
    Date of Patent: January 14, 2014
    Assignees: Kabushiki Kaisha Toshiba, Asahi Kasei E-Materials Corporation
    Inventors: Koji Asakawa, Ryota Kitagawa, Akira Fujimoto, Yoshiaki Shirae, Tomohiro Yorisue, Akihiko Ikeda
  • Patent number: 8628672
    Abstract: A method for fabricating a magnetic recording transducer having a magnetic writer pole with a short effective throat height is provided. In an embodiment, a writer structure comprising a magnetic writer pole having a trailing bevel and a nonmagnetic stack on the top surface of the writer pole is provided. A dielectric write gap layer comprising alumina is deposited over the trailing bevel section and the nonmagnetic stack; and at least one etch stop layer is deposited over the dielectric write gap layer. A layer of nonmagnetic fill material is deposited over the etch stop layer and to form a nonmagnetic bevel by performing a dry etch process. The etch stop layer(s) are removed from the short throat section; and a trailing shield is deposited over the short throat section, nonmagnetic bevel, and nonmagnetic stack top surface.
    Type: Grant
    Filed: June 27, 2012
    Date of Patent: January 14, 2014
    Assignee: Western Digital (Fremont), LLC
    Inventors: Weimin Si, Ying Hong, Zhigang Bai, Yunhe Huang, Fenglin Liu, Hong Zhang, Jikou Zhou, Xiaoyu Yang, Yuan Yao, Iulica Zana, Feng Liu, Ling Wang
  • Publication number: 20140009853
    Abstract: According to one embodiment, a magnetic head manufacturing method includes forming a protective layer on the surfaces of a main magnetic pole layer, a processed spin torque oscillator, and a mask formed on the spin torque oscillator, and further performing ion beam etching on the main magnetic pole layer and the protective layer on the surface of the main magnetic pole layer through the mask such that the protective layer is left behind on the side surfaces of the spin torque oscillator and removed from the surface of the main magnetic pole layer, thereby processing the main magnetic pole layer such that its side surfaces have a shape tapered toward the substrate.
    Type: Application
    Filed: October 22, 2012
    Publication date: January 9, 2014
    Applicant: KABUSHIKI KAISHA TOSHIBA
    Inventors: Satoshi Shirotori, Katsuhiko Koui, Shinobu Sugimura, Norihito Fujita, Akihiko Takeo
  • Patent number: 8623223
    Abstract: A method using directed self-assembly of BCPs enables the making of a master disk for nanoimprinting magnetic recording disks that have patterned data islands and patterned binary encoded nondata marks. The method uses guided self-assembly of a BCP to form patterns of sets of radial lines and circumferential gaps of one of the BCP components, which can be used as an etch mask to make the master disk. The sets of radial lines and circumferential gaps can be patterned so as to encode binary numbers. The pattern is replicated as binary encoded nondata marks into the nanoimprinted disks, with the marks functioning as binary numbers for data sector numbers and/or servo sector numbers. If the disks also use a chevron servo pattern, the binary numbers can function to identify groups of tracks associated with the chevron servo pattern.
    Type: Grant
    Filed: November 18, 2011
    Date of Patent: January 7, 2014
    Assignee: HGST Netherlands B.V.
    Inventors: Elizabeth Ann Dobisz, Jeffrey S. Lille, Guoliang Liu, Ricardo Ruiz, Gabriel Zeltzer
  • Patent number: 8617408
    Abstract: A method for manufacturing a magnetic read sensor at very narrow track widths. The method uses an amorphous carbon mask layer to pattern the sensor by ion milling, rather than a mask constructed of a material such as photoresist or DURIMIDE® which can bend over during ion milling at very narrow track widths. By using the amorphous carbon layer as the masking layer, the trackwidth can be very small, while avoiding this bending over of the mask that has been experienced with prior art methods. In addition, the track-width can be further reduced by using a reactive ion etching to further reduce the width of the amorphous carbon mask prior to patterning the sensor. The method also allows extraneous portions of the side insulation layer and hard bias layer to be removed above the sensor by a light CMP process.
    Type: Grant
    Filed: October 18, 2011
    Date of Patent: December 31, 2013
    Assignee: HGST Netherlands B.V.
    Inventors: Hamid Balamane, Patrick M. Braganca, Jordan A. Katine, Jui-Lung Li, Yang Li, Kanaiyalal C. Patel, Neil L. Robertson, Samuel W. Yuan
  • Publication number: 20130335086
    Abstract: A radio frequency (RF) birdcage coil includes a first distributed capacitance end ring, a second distributed capacitance end ring, and a plurality of rungs connected between the first and second end rings, wherein at least one of the first and second distributed capacitance end rings includes a substrate having a first side and a second side, a first plurality of conductors formed on the first side, a second plurality of conductors formed on the second side, and an insulating material deposited on the first side such that the insulating material substantially covers the first plurality of conductors.
    Type: Application
    Filed: January 5, 2012
    Publication date: December 19, 2013
    Applicant: General Electric Company
    Inventors: Bijay Shah, Ricardo Becerra, Masahiro Fujimoto, Michael P. Edwards, Zhentian Xie
  • Patent number: 8608971
    Abstract: A method of manufacturing a display substrate includes forming a first metallic pattern including gate and storage conductors and a gate electrode of a switching device on a base substrate, forming a gate insulation layer, forming a second metallic pattern and a channel portion including a source line, source and drain electrodes of the switching device, forming a passivation layer and a photoresist film on the second metallic pattern, patterning the photoresist film to form a first pattern portion corresponding to the gate and source conductors and the switching device, and a second pattern portion formed on the storage line, etching the passivation layer and the gate insulation layer, and forming a pixel electrode using the first pattern portion.
    Type: Grant
    Filed: August 24, 2010
    Date of Patent: December 17, 2013
    Assignee: Samsung Display Co., Ltd.
    Inventors: Hong-Kee Chin, Sang-Gab Kim, Min-Seok Oh
  • Patent number: 8603348
    Abstract: A method of removing an alumina layer around a main pole layer during perpendicular magnetic recording head fabrication is disclosed. The alumina etch sequence includes immersing a substrate in a series of aqueous solutions purged with an inert gas to remove oxygen thereby avoiding corrosion of the main pole. Initially, the substrate is soaked and heated in deionized (DI) water. Once heated, the substrate is immersed in an etching bath at about 80° C. and pH 10.5. Bath chemistry is preferably based on Na2CO3 and NaHCO3, and N2 purging improves etch uniformity and reduces residue. Thereafter, the substrate is rinsed in a second DI water bath between room temperature and 80° C., and finally subjected to a quick dump rinse before drying. Inert gas, preferably N2, may be introduced into the aqueous solutions through a purge board having a plurality of openings and positioned proximate to the bottom of a bath container.
    Type: Grant
    Filed: January 14, 2011
    Date of Patent: December 10, 2013
    Assignee: Headway Technologies, Inc.
    Inventors: Chao-Peng Cheng, Chih-I Yang, Jas Chudasama, William Stokes, Chien-Li Lin, David Wagner
  • Patent number: 8603349
    Abstract: Methods of manufacturing a nanoimprint stamp are provided. The method may include forming a pattern on a surface of a master substrate, depositing an etch barrier layer on a surface of a stamp substrate, coating a photoresist on one of the surfaces of the master substrate and the stamp substrate on which an etch barrier layer is formed, forming a photoresist pattern by pressing the master substrate against the stamp substrate, forming a hard mask by etching the etch barrier layer using the photoresist pattern, and etching the stamp substrate using the hard mask as an etch mask.
    Type: Grant
    Filed: June 28, 2011
    Date of Patent: December 10, 2013
    Assignee: Samsung Electronics Co., Ltd.
    Inventors: Byung-kyu Lee, Du-hyun Lee, Woong Ko
  • Patent number: 8597527
    Abstract: The invention provides a method of forming a concavo-convex pattern by partly removing a magnetic layer and a carbon protective layer in an intermediate product of a magnetic recording medium having at least the magnetic layer and the protective layer formed on a substrate surface, wherein the magnetic layer is partly removed to form the concavo-convex pattern by a dry etching method using a etching gas of a mixture gas of argon and a deposition gas containing one or more types of carbon compounds. Also disclosed is a method of manufacturing a patterned medium type magnetic recording medium employing the method of forming a concavo-convex pattern. As a result a concavo-convex pattern free of after-corrosion and exhibiting good productivity is provided.
    Type: Grant
    Filed: August 26, 2009
    Date of Patent: December 3, 2013
    Assignee: Fuji Electric Co., Ltd.
    Inventor: Katsumi Taniguchi
  • Patent number: 8597528
    Abstract: A method and system for fabricating a magnetic transducer is described. A magnetic junction is defined from the magnetoresistive stack. The magnetic junction has a top and a plurality of sides. The step of defining the magnetic junction redeposits a portion of the magnetoresistive stack and forms fencing adjacent to the top of the magnetic junction. At least one hard bias structure is provided after the magnetic junction is defined. A first portion of the at least one hard bias structure is substantially adjacent to the magnetoresistive junction in a track-width direction. The magnetic junction is ion beam planarized, thereby substantially removing the fencing.
    Type: Grant
    Filed: March 30, 2011
    Date of Patent: December 3, 2013
    Assignee: Western Digital (Fremont), LLC
    Inventors: Anup G. Roy, Ming Mao
  • Patent number: 8591752
    Abstract: A method for plasma-etching a magnetic film and plasma-cleaning, in which deposits in an etching processing chamber are efficiently removed while corrosion of a wafer is suppressed, is provided. A plasma processing method for plasma-etching a to-be-processed substrate having a magnetic film in an etching processing chamber includes the steps of plasma-etching the magnetic film using a first gas not containing chlorine, transferring out the to-be-processed substrate from the etching processing chamber, first plasma-cleaning of the etching processing chamber using a second gas containing chlorine, and second plasma-cleaning using a third gas containing hydrogen after the first plasma cleaning.
    Type: Grant
    Filed: February 17, 2012
    Date of Patent: November 26, 2013
    Assignee: Hitachi High Technologies Corporation
    Inventors: Takahiro Abe, Takeshi Shimada, Atsushi Yoshida, Kentaro Yamada, Daisuke Fujita
  • Patent number: 8591751
    Abstract: High Hc (>4,000 Oe) and high Hk (>1 Tesla) has been achieved in FePt films as thin as 70 Angstroms. This was accomplished by starting with a relatively thick film having the required high coercivity, coating it with a suitable material such as Ta, and then using ion beam etching to remove surface material until the desired thickness was reached.
    Type: Grant
    Filed: September 30, 2011
    Date of Patent: November 26, 2013
    Assignee: Headway Technologies, Inc.
    Inventors: Kunliang Zhang, Min Zheng, Min Li
  • Patent number: 8590139
    Abstract: A method according to embodiments of the present invention comprises providing a magnetic stack comprising a magnetic layer sub-stack comprising magnetic layers and a bottom conductive electrode and a top conductive electrode electrically connecting the magnetic layer sub-stack at opposite sides thereof; providing a sacrificial pillar on top of the magnetic stack, the sacrificial pillar having an undercut with respect to an overlying second sacrificial material and a sloped foot with increasing cross-sectional dimension towards the magnetic stack, using the sacrificial pillar for patterning the magnetic stack, depositing an insulating layer around the sacrificial pillar, selectively removing the sacrificial pillar, thus creating a contact hole towards the patterned magnetic stack, and filling the contact hole with electrically conductive material.
    Type: Grant
    Filed: May 18, 2010
    Date of Patent: November 26, 2013
    Assignees: IMEC, Katholieke Universiteit Leuven, K.U. Leuven R&D
    Inventors: Maria Op De Beeck, Liesbet Lagae, Sven Cornelissen
  • Publication number: 20130309526
    Abstract: Fabrication methods for magnetic recording media that use a plasma polish are disclosed. For one exemplary method, a film of a magnetic recording medium is deposited, and a top surface of the film is polished utilizing a plasma formed by a noble gas to smoothen the top surface of the film. A subsequent layer is then deposited onto the polished top surface of the film. A top surface of the subsequent layer has a reduced roughness by being deposited on the polished top surface of the film.
    Type: Application
    Filed: May 16, 2012
    Publication date: November 21, 2013
    Inventors: Mark F. Mercado, Mohammad T. Mirzamaani, Kai Tang, Qi-Fan Xiao
  • Patent number: 8585912
    Abstract: A batch vapor deposition process for applying adhesion promoter during manufacturing of nanoimprinted discrete track media and bit-patterned media, and mono-molecular layer lubricant on magnetic recording media are disclosed. The adhesion promoter is simultaneously coated on both sides of numerous disk substrates, and minimal solution is wasted. In another step, the lubricant is applied at a uniform thickness that is on the order of a single molecular layer. The lubricant is also applied on the entire disk surfaces while processing multiple disks at a time. Batch processing increases throughput, and vapor lubricant reduces costs compared to conventional techniques. Limited air exposure controls bonding and monolayer adsorption guarantees uniformity.
    Type: Grant
    Filed: July 23, 2008
    Date of Patent: November 19, 2013
    Assignee: HGST Netherlands B.V.
    Inventors: Xing-Cai Guo, Robert Waltman, Tsai-Wei Wu
  • Patent number: 8578594
    Abstract: A process for fabricating a magnetic recording transducer for use in a data storage system comprises providing a substrate, an underlayer and a first nonmagnetic intermediate layer deposited to a first thickness on and in contact with the underlayer, performing a first scanning polishing on a first section of the first intermediate layer to planarize the first section of the first intermediate layer to a second thickness, providing a main pole in the planarized first section of the first intermediate layer, providing a first pattern of photoresist on and in contact with the first section of the first intermediate layer, the pattern comprising an aperture to define a side shield trench, performing a wet etch to remove at least a portion of the first intermediate layer thereby exposing at least one of the plurality of main pole sides, and depositing side shield material in the side shield trench.
    Type: Grant
    Filed: June 6, 2011
    Date of Patent: November 12, 2013
    Assignee: Western Digital (Fremont), LLC
    Inventors: Ming Jiang, Ronghui Zhou, Guanghong Luo, Masahiro Osugi, Danning Yang
  • Publication number: 20130284693
    Abstract: A method for manufacturing a magnetic read sensor allows for the construction of a very narrow trackwidth sensor while avoiding problems related to mask liftoff and shadowing related process variations across a wafer. The process involves depositing a plurality of sensor layers and forming a first mask structure. The first mask structure has a relatively large opening that encompasses a sensor area and an area adjacent to the sensor area where a hard bias structure can be deposited. A second mask structure is formed over the first mask structure and includes a first portion that is configured to define a sensor dimension and a second portion that is over the first mask structure in the field area.
    Type: Application
    Filed: April 27, 2012
    Publication date: October 31, 2013
    Applicant: Hitachi Global Storage Technologies Netherlands B.V.
    Inventors: Yi Zheng, Guomin Mao, Hicham M. Sougrati, Xiaozhong Dang
  • Patent number: 8567045
    Abstract: As track densities increase, it becomes increasingly important, while writing in a given track, not to inadvertently write data in adjoining tracks. This problem has been overcome by limiting the width of material in the ABS plane to what it is at the write gap. The part of the lower pole that is wider than this is recessed back away from the ABS, thereby greatly reducing its magnetic influence on adjacent tracks. Four different embodiments of write heads that incorporate this notion are described together with a description of a general process for their manufacture.
    Type: Grant
    Filed: February 6, 2012
    Date of Patent: October 29, 2013
    Assignee: Headway Technologies, Inc.
    Inventors: Moris Dovek, Glen Garfunkel, Po Kang Wang
  • Patent number: 8568602
    Abstract: A method for manufacturing a magnetic sensor that decreases area resistance and decreases MR ratio of the sensor by eliminating any oxide formation in the capping layer of the sensor. The method includes forming a sensor stack having a multi-layer capping structure formed there-over. The multi-layer capping structure can include first, second, third and fourth layers. The second layer is constructed of a material that is not easily oxidized and which is different from the first layer. The sensor can be formed using a mask that includes a carbon hard mask. After the sensor stack has been formed by ion milling, the hard mask can be removed by reactive ion etching. Then, a cleaning process is performed to remove the second, third and fourth layers of the capping layer structure using an end point detection method such as secondary ion mass spectrometry to detect the presence of the second layer.
    Type: Grant
    Filed: January 19, 2011
    Date of Patent: October 29, 2013
    Assignee: HGST Netherlands B.V.
    Inventors: Koji Sakamoto, Atsushi Katou, Takao Yonekawa, Norihiro Ookawa, Kouichi Nishioka, Kouji Okazaki
  • Patent number: 8568601
    Abstract: A method for manufacturing a magnetic write head for perpendicular magnetic recording. The method includes forming a write pole using a mask that includes a hard mask layer deposited over the write pole laminate material, and a thick, physically robust image transfer layer. The image transfer layer can be a material such as AlTiO that can be patterned by a reactive ion etching process, but which also resists deformation during processing. This process allows a write pole and wrap-around trailing shield to be constructed at very narrow track widths without the mask deformation and fencing problems experienced by prior art methods.
    Type: Grant
    Filed: November 29, 2007
    Date of Patent: October 29, 2013
    Assignee: HGST Netherlands B.V.
    Inventors: Aron Pentek, Sue Siyang Zhang, Yi Zheng
  • Publication number: 20130279046
    Abstract: According to one embodiment, a magnetic head includes a reproducing unit to detect a medium magnetic field recorded in a magnetic recording medium. The reproducing unit includes first and second magnetic shields, a stacked body, and a side wall film. The stacked body is provided between the first and second magnetic shields and includes first and second magnetic layer and an intermediate layer provided between them. The stacked body has a side wall. The side wall intersects a plane perpendicular to a stacking direction from the first magnetic shield toward the second magnetic shield. The side wall film covers at least a part of the side wall of the stacked body. The side wall film includes at least one of Fe and Co, and has a composition different from a composition of the first magnetic layer and different from a composition of the second magnetic layer.
    Type: Application
    Filed: March 26, 2013
    Publication date: October 24, 2013
    Inventors: Hitoshi IWASAKI, Masayuki TAKAGISHI
  • Publication number: 20130270222
    Abstract: There is provided a planarizing film-forming composition for a hard disk. A planarizing film-forming composition for a hard disk comprising a hydrophobic coating material having a photopolymerizable group and an aromatic group, containing a polymer or a combination of a polymer and a compound selected from the group consisting of a polymer (A1), a polymer (A2), a polymer (A3), a compound (a1), a compound (a2), and a compound (a3).
    Type: Application
    Filed: December 21, 2011
    Publication date: October 17, 2013
    Applicant: NISSAN CHEMICAL INDUSTRIES, LTD.
    Inventors: Taku Kato, Keisuke Shuto, Junpei Kobayashi, Masayoshi Suzuki
  • Publication number: 20130270221
    Abstract: A method for making a bit-patterned-media magnetic recording disk with discrete magnetic islands includes annealing the data islands after they have been formed by an etching process. A hard mask, such as a layer of silicon nitride or carbon, may be first formed on the recording layer and a patterned resist formed on the hard mask. The resist pattern is then transferred into the hard mask, which is used as the etch mask to etch the recording layer and form the discrete data islands. After the data islands are formed by the etching process, the patterned recording layer is annealed. The annealing may be done in a vacuum, or in an inert gas, like helium or argon, or in a forming gas such as a reducing atmosphere of argon plus hydrogen. The annealing improves the coercivity, the effective saturation magnetization and the thermal stability of the patterned media.
    Type: Application
    Filed: April 17, 2012
    Publication date: October 17, 2013
    Inventors: Michael Konrad Grobis, Olav Hellwig, Ernesto E. Marinero, Andrew Thomas McCallum, Dieter K. Weller
  • Patent number: 8555486
    Abstract: A method for fabricating a magnetic recording transducer is described. The transducer has an ABS location and a nonmagnetic intermediate layer having a pole trench. The method includes depositing at least one magnetic pole layer having a top surface and a pole tip portion proximate to the ABS location. A first portion of the magnetic pole layer(s) resides in the pole trench. The magnetic pole layer(s) have a seam in the pole tip portion that extends to the top surface. The method also includes cathodically etching a second portion of the magnetic pole layer(s) from the seam at a rate of not more than 0.1 nanometers/second, thereby forming a seam trench in the magnetic pole layer(s). The method also includes refilling the seam trench with at least one magnetic refill layer. At least an additional magnetic pole layer is deposited on the top surface and the magnetic refill layer(s).
    Type: Grant
    Filed: December 6, 2011
    Date of Patent: October 15, 2013
    Assignee: Western Digital (Fremont), LLC
    Inventors: Jose A. Medina, Tiffany Yun Wen Jiang, Ming Jiang
  • Publication number: 20130264306
    Abstract: A vacuum planarization method substantially improves the surface roughness of a thermally-assisted recording (TAR) disk that has a recording layer (RL) formed of a substantially chemically-ordered FePt alloy or FePt-X alloy (or CoPt alloy or CoPt-X alloy) and a segregant, like SiO2. A first amorphous carbon overcoat (OC1) is deposited on the RL and etched with a non-chemically reactive plasma to remove at least one-half the thickness of OC1. Then a second amorphous carbon overcoat (OC2) is deposited on the etched OC1. The OC2 is then reactive-ion-etched, for example in a H2/Ar plasma, to remove at least one-half the thickness of OC2. A thin third overcoat (OC3) may be deposited on the etched OC2.
    Type: Application
    Filed: April 5, 2012
    Publication date: October 10, 2013
    Inventors: Xiaoping Bian, Qing Dai, Oleksandr Mosendz, Franck Dreyfus Rose, Run-Han Wang
  • Patent number: 8551348
    Abstract: A magnetic recording medium has magnetic patterns formed of a patterned ferromagnetic layer, and a non-magnetic layer including a component of the ferromagnetic layer and separating the magnetic patterns, in which a thickness “a” of the non-magnetic layer and a thickness “b” of the magnetic patterns satisfy a relationship of: a<b.
    Type: Grant
    Filed: August 26, 2009
    Date of Patent: October 8, 2013
    Assignee: Kabushiki Kaisha Toshiba
    Inventors: Yosuke Isowaki, Satoshi Shirotori, Yoshiyuki Kamata, Kaori Kimura, Masatoshi Sakurai
  • Patent number: 8551347
    Abstract: A method in one embodiment includes forming a layer of a nonmagnetic material above an upper surface of a substrate; forming a resist structure above the layer of nonmagnetic material, wherein the resist structure has an undercut; removing a portion of the layer of nonmagnetic material not covered by the resist structure; depositing a layer of magnetic material above the substrate adjacent a remaining portion of the layer of nonmagnetic material such that at least portions of the layer of magnetic material and the remaining portion of the layer of nonmagnetic material lie in a common plane; removing the resist structure; and forming a write pole above the layer of magnetic material and the remaining portion of the layer of nonmagnetic material. Additional methods are also presented.
    Type: Grant
    Filed: December 22, 2008
    Date of Patent: October 8, 2013
    Assignee: HGST Netherlands B.V.
    Inventors: Amanda Baer, Wen-Chien David Hsiao, John I. Kim, Vladimir Nikitin, Trevor W. Olson, John Bruce Piggott, Jr., Yuan Yao
  • Patent number: 8551349
    Abstract: A method for producing a magnetic recording medium having a magnetically partitioned magnetic recording pattern on at least one surface of a nonmagnetic substrate, characterized by comprising a step of reacting portions of a magnetic layer, formed on the non-magnetic substrate, with ozone to modify magnetic properties of said portions of the magnetic layer for forming the magnetically partitioned magnetic recording pattern. The magnetic layer can be a two-layer structure comprising a magnetic layer having a granular structure and formed thereon a magnetic layer having a non-granular structure. The produced magnetic recording medium exhibits a greatly enhanced recording density while recording/reproducing characteristics equal to or better than those of the heretofore proposed magnetic recording mediums are maintained, and it can be produced with an enhanced efficiency.
    Type: Grant
    Filed: December 24, 2008
    Date of Patent: October 8, 2013
    Assignee: Showa Denko K.K.
    Inventors: Masato Fukushima, Akira Sakawaki, Akira Yamane
  • Publication number: 20130258518
    Abstract: According to one embodiment, a patterned medium is disclosed herein. The patterned medium includes a patterned layer, a stop layer, and a fill layer. The patterned layer includes plurality of grooves. The stop layer is positioned on the patterned layer. The stop layer is at least partially positioned within the plurality of grooves and a portion of the stop layer may be positioned on walls of the grooves of the patterned layer. The fill layer is at least partially positioned within the grooves between portions of the stop layer. The stop layer substantially separates the fill layer from the patterned layer.
    Type: Application
    Filed: March 30, 2012
    Publication date: October 3, 2013
    Inventor: Kurt A. Rubin
  • Publication number: 20130248485
    Abstract: A manufacturing method of a magnetic recording medium includes steps of forming a magnetic recording layer, a first mask layer, a second mask layer containing silicon as primary component, a strip layer, a third mask layer, and a resist layer, a step of patterning the resist layer to provide a pattern, steps of transferring the pattern to the third mask layer, to the strip layer, and to the second mask layer, a step of removing the strip layer by wet etching and of stripping the third mask layer and the resist layer above the magnetic recording layer, steps of transferring the pattern to the first mask layer and to the magnetic recording layer, and a step of stripping the first mask layer remaining on the magnetic recording layer.
    Type: Application
    Filed: September 7, 2012
    Publication date: September 26, 2013
    Applicant: KABUSHIKI KAISHA TOSHIBA
    Inventors: Akira Watanabe, Kaori Kimura, Kazutaka Takizawa, Takeshi Iwasaki, Tsuyoshi Onitsuka, Akihiko Takeo
  • Publication number: 20130242431
    Abstract: A magnetic write head having a shield structure that provides both a leading shield and side shielding function. The magnetic shield is separated from the sides and leading edge of the write pole by a non-magnetic gap layer that has a non-uniform thickness. The non-magnetic gap layer is thicker near the leading edge and thinner at the trailing edge. This allows for increased side field gradient near the trailing edge of the write pole and decreased write field loss at the leading edge of the write pole.
    Type: Application
    Filed: March 13, 2012
    Publication date: September 19, 2013
    Applicant: Hitachi Global Storage Technologies Netherlands B.V.
    Inventors: Kazuhiko Hosomi, Kimitoshi Eto, Mikito Sugiyama, Junichi Hashimoto, Kazue Kudo, Misuzu Kanai
  • Publication number: 20130242434
    Abstract: Various embodiments concern a head suspension system having a load beam. The lead beam comprises a metal base having a proximal portion and a distal portion. Two opposing rails extend along the proximal and distal portions. The load beam has a void in the metal base separating the proximal portion from the distal portion, the void extending between the rails. A pair of microactuators is coupled to each of the proximal portion and the distal portion such that each microactuator extends across the void. The microactuators bend the rails to move the distal portion along a X-Y plane relative to the proximal portion. Additionally, the rails stiffen the load beam to resist movement between the first portion and the second portion along a Z-axis.
    Type: Application
    Filed: March 14, 2013
    Publication date: September 19, 2013
    Applicant: HUTCHINSON TECHNOLOGY INCORPORATED
    Inventors: Jacob D. Bjorstrom, Mark A. Miller, Haven A. Mercer
  • Patent number: 8533937
    Abstract: A method or forming a wrapped-around shielded perpendicular magnetic recording writer pole is disclosed. A structure comprising a leading shield layer and an intermediate layer disposed over the leading shield layer is provided, the intermediate layer comprising a pole material and a dielectric material. A trench is formed in the dielectric material. A non-magnetic layer in the trench is removed via an ion beam etching process. A seed layer is deposited in the trench and over the pole material. A magnetic material comprising a side shield layer is deposited on at least a portion of the seed layer.
    Type: Grant
    Filed: October 18, 2011
    Date of Patent: September 17, 2013
    Assignee: Western Digital (Fremont), LLC
    Inventors: Jinwen Wang, Weimin Si, Jianxin Fang, Ying Hong, Hongzhou Jiang, Ching-Huang Lu, Yan Chen, Donghong Li, Lien-Chang Wang, Lieping Zhong, Tao Pan
  • Patent number: 8536270
    Abstract: To provide a resist composition including: at least one polymerizable compound having a viscosity of 100 mPa·s or less at 25° C.; a fluorine-containing compound A having a viscosity of 5,000 mPa·s or greater at 25° C., and a fluorine content of 10% by mass or greater; and a fluorine-containing compound B having a viscosity of 2,000 mPa·s or less at 25° C., and a fluorine content of 10% by mass or greater.
    Type: Grant
    Filed: March 25, 2010
    Date of Patent: September 17, 2013
    Assignee: FujiFilm
    Inventor: Tadashi Omatsu
  • Patent number: 8524094
    Abstract: The object of the present invention is to provide a masking material for dry etching, which is suitable for fine processing of a magnetic film as thin as a few nm such as NiFe or CoFe constituting a TMR film and capable of simplifying the process for producing a TMR element and reducing production costs related to facilities and materials. This object was solved by a masking material for dry etching of a magnetic material by using a mixed gas of carbon monoxide and a nitrogenous compound as etching gas, which comprises a metal (tantalum, tungsten, zirconium or hafnium) with a melting or boiling point increasing upon conversion thereof into a nitride or carbide.
    Type: Grant
    Filed: July 16, 2008
    Date of Patent: September 3, 2013
    Assignees: National Institute for Materials Science, Japan Science and Technology Corporation, Anelva Corporation
    Inventors: Isao Nakatani, Kimiko Mashimo, Naoko Matsui
  • Patent number: 8524095
    Abstract: Methods for fabrication of leading edge shields and tapered magnetic poles with a tapered leading edge are provided. The leading edge shield may be formed by utilizing a CMP stop layer. The CMP stop layer may aid in preventing over polishing of the magnetic material. For the tapered magnetic poles with a tapered leading edge, a magnetic material is deposited on a planarized surface, a patterned resist material is formed, and exposed magnetic material is etched to form at least one tapered surface of the magnetic material.
    Type: Grant
    Filed: November 24, 2010
    Date of Patent: September 3, 2013
    Assignee: HGST Netherlands B.V.
    Inventors: Liubo Hong, Fenglin Liu, Qiping Zhong, Honglin Zhu