Abstract: A method for repairing a collector for an EUV projection exposure apparatus having a first coating and a second coating, wherein the first coating is arranged between the second coating and a surface of the collector. The method includes completely or partly removing the first coating by treatment with a first chemical solution, and applying a new first coating.

Abstract: A fiber-end surface structuring chamber or system having a main body with multiple ports including a fiber-holder port, a process port that is either a stamp/shim holder port or a plasma etching enabler port, an evacuation port, a gas delivery port, and one or more observation ports, where the fiber-end surface structuring system forms structures directly into the end of the fiber to enhance transmission of light over a wide range of wavelengths and increase the laser damage threshold.

Abstract: An illuminated glass keycap having a glyph diffuser layer that may diffuse light through a glyph window opened in a background layer. The background layer may be opaque and the glyph window may be transparent. The keycap is adhered to a scissor mechanism positioned above electrical switch circuitry. Included within, below, or adjacent to the scissor mechanism may be one or more light sources positioned to emit light through the keycap, around the perimeter of the keycap, and/or through the background layer.

Abstract: In summary, an optical transportation fiber (10) for transmitting laser beams (S0) comprises at least one fiber core (1), at least one fiber jacket (2, 3) and one sheath (5) encompassing the fiber jacket (2, 3), wherein an interlayer (4), the refraction index of which is lower than a refraction index of the corresponding fiber jacket (2, 3) being in contact with the interlayer (4), is provided between the fiber jacket (2, 3) and the sheath (5). Thereby, the fiber (10) is formed with at least one outputting means (11).

Abstract: The invention relates to a glass substrate having enhanced optical properties for optoelectronic devices, wherein said substrate is totally or partially textured, by means of a chemical attack, on at least one of the surfaces thereof with a set of geometric patterns such that the arctangent of the ratio of the mean height of the patterns, Rz, to half the mean distance between the peaks of two contiguous patterns, RSm, is at least equal to an angle of 35° and at most equal to an angle of 80°.

Abstract: A method for producing an optical semiconductor device includes the steps of determining a wafer size to make a section arrangement including a plurality of sections in each of which the optical semiconductor device including a semiconductor mesa is formed; obtaining an in-plane distribution of a thickness of a resin layer on a wafer; obtaining a correlation between a thickness of a resin layer and a trench width; forming a trench width map using the in-plane distribution of the thickness and the correlation; preparing an epitaxial substrate by forming a stacked semiconductor layer; forming, on the epitaxial substrate, a mask based on the trench width map; forming a trench structure including the semiconductor mesa by etching the stacked semiconductor layer using the mask; forming a resin layer on the trench structure; and forming an opening on the semiconductor mesa by etching the resin layer.

Abstract: A plasma etching method capable of oblique etching with a high aspect ratio and high uniformity is provided. In the plasma etching method, a base body is etched with a high aspect ratio by the following process: An electric-field control device having an ion-introducing orifice penetrating therethrough in a direction inclined from the normal to the surface of a base body is placed on or above the surface of this base body. Plasma is generated on the surface of the base body on or above which the electric-field control is placed. A potential difference is formed between the plasma and the base body so as to attract ions in the plasma toward the base body.

Abstract: Compositions and methods for chemical texturing a surface of a polycrystalline silicon wafer to be used in the manufacture of solar cells provide increased efficiency in the manufacture and operation of solar cells. The compositions and methods disclosed herein include first and second components, wherein the first component is a UKON etch composition, including a hydrofluoric acid/nitric acid mixture and water, while the second component includes a silicon wafer texturing enhancer (SWTE).

Abstract: Thin film wavelength converters and methods for making the same are disclosed. In some embodiments, the thin film converters include a first thin film layer of first wavelength conversion material, a conductive layer, and a second thin film layer of a second wavelength conversion material. In one embodiment, a photoresist mask is applied to the conductive layer to form a pattern of by which the second wavelength conversion material may be applied by electrophoretic deposition to the exposed regions of the surface of the conductive layer.

Abstract: Nanostructured material exhibiting a random anisotropic nanostructured surface, and exhibiting an average reflection at 60 degrees off angle less than 1 percent. The nanostructured materials are useful, for example, for optical and optoelectronic devices, displays, solar, light sensors, eye wear, camera lens, and glazing.

Abstract: A cover glass element can extend to the edges of an electronic device while maintaining the optical flatness and thickness needed for the cover glass. A first glass sheet with the desired thickness and flatness can be thermally bonded to a second glass sheet machined to include an opening to be received by the edges of the electronic device. The resulting three-dimensional cover element forms a uni-body frame that is significantly stiffer than a single sheet of glass, and the larger surface area of the edge provides for enhances pressure distribution, particularly after chemical strengthening, thus enhancing the durability of the electronic device. Further, the thermal bonding process uses lower temperatures than processes such as slumping or pressing, which could potentially affect the flatness and optical clarity of the original sheet glass.

Abstract: A polarizer includes a base substrate, a metal wire layer disposed on the base substrate, and a plurality of wire grid patterns disposed on the base substrate or the metal wire layer.

Abstract: A method of producing an optoelectronic component comprises the steps of: A) providing a radiation-emitting layer sequence (1) having an active zone (13), which emits electromagnetic primary radiation when in operation, B) providing a first wavelength conversion layer (2), which converts the primary radiation at least partially into electromagnetic secondary radiation, and C) arranging the first wavelength conversion layer (2) on the radiation-emitting layer sequence (1) in the beam path of the primary radiation.

Abstract: Aspects of the invention are directed to a method for forming an optical waveguide structure. Initially, a base film stack is received with an optical waveguide feature covered by a lower dielectric layer. An etch stop feature is then formed on the lower dielectric layer, and an upper dielectric layer is formed over the etch stop feature. Subsequently, a trench is patterned in the upper dielectric layer and the etch stop feature at least in part by utilizing the etch stop feature as an etch stop. Lastly, a waveguide coupler feature is formed in the trench, at least a portion of the waveguide coupler feature having a refractive index higher than the lower dielectric layer and the upper dielectric layer. The waveguide coupler feature is positioned over at least a portion of the optical waveguide feature but is separated from the optical waveguide feature by a portion of the lower dielectric layer.

Abstract: An etching process includes: forming a metal film on a substrate having a pattern formation region; forming a mask having a predetermined pattern on the metal film in the pattern formation region, and forming a resist film in part or all of a periphery of the pattern formation region; and dry-etching the metal film in the pattern formation region.

Abstract: A method may involve: forming a sacrificial layer on a working substrate; forming a first bio-compatible layer on the sacrificial layer such that the first bio-compatible layer adheres to the sacrificial layer; forming a conductive pattern on the first bio-compatible layer; mounting an electronic component to the conductive pattern; forming a second bio-compatible layer over the first bio-compatible layer, the electronic component, and the conductive pattern; and removing the sacrificial layer to release the bio-compatible device from the working substrate. The first bio-compatible layer defines a first side of a bio-compatible device. The second bio-compatible layer defines a second side of the bio-compatible device.

Abstract: The present invention provides a method of producing hollow particles for reducing light scattering in an antireflection coating. This method includes synthesizing core-shell particles including a core containing an organic compound as a major component and a shell containing an inorganic-based compound as a major component in an aqueous medium, dispersing the core-shell particles in an organic solvent, and preparing hollow particles by heating the core-shell particles dispersed in the organic solvent to remove the core therefrom.

Abstract: Processes for making high multiplex arrays for use in analyzing discrete reactions at ultra high multiplex with reduced optical noise, and increased system flexibility. The high multiplex arrays include substrates having integrated optical components that increase multiplex capability by one or more of increasing density of reaction regions, improving transmission of light to or collection of light from discrete reactions regions. Integrated optical components include reflective optical elements which re-direct illumination light and light emitted from the discrete regions to more efficiently collect emitted light. Particularly preferred applications include single molecule reaction analysis, such as polymerase mediated template dependent nucleic acid synthesis and sequence determination.

Abstract: In a method for manufacturing a radiation window there is produced a layered structure where an etch stop layer exists between a carrier and a solid layer. A blank containing at least a part of each of the carrier, the etch stop layer, and the solid layer is attached to a radiation window frame. At least a part of what of the carrier was contained in the blank is removed, thus leaving a foil attached to the radiation window frame, wherein the foil contains at least a part of each of the etch stop layer and the solid layer.

Abstract: A method for manufacturing a holographic bi-blazed grating. Two blaze angles of the holographic bi-blazed grating are respectively a blaze angle A and a blaze angle B, and oblique-ion beam etching is performed on two grating areas A and B respectively by using a photoresist grating (12) and a homogeneous grating (14) as masks, thereby implementing different controls on the two blaze angles, and avoiding a secondary photoresist lithography process. Because when manufacturing the homogeneous grating (14), the time of positive ion beam etching can be controlled, so that the groove depth of the homogeneous grating (14) is controlled accurately. In addition, because the homogeneous grating mask and a substrate (10) are made of the same material, etching rates of the two are consistent, so that the accurate control of blaze angles can be implemented.

Abstract: In implementations, a glass-based multichip package includes a photodefinable glass-based substrate, at least one electronic component disposed on the photodefinable glass-based substrate, and a portion of the photodefinable glass-based substrate that has been exposed to ultraviolet light, where the portion of the photodefinable glass-based substrate includes ceramic. Additionally, the sensor package may include additional electronic components, a glass touch panel, and/or a printed circuit board. In implementations, fabricating the sensor package device includes receiving a photodefinable glass-based substrate, etching the photodefinable glass-based substrate, and forming a ceramic portion of the photodefinable glass-based substrate.

Abstract: A micromirror system that includes a chip frame, at least one spring element, and at least one mirror plate oscillatorily suspended in the chip frame via the at least one spring element. The chip frame and the at least one spring element include at least one microchannel which is provided with an inlet opening and an outlet opening for leading through a flowing coolant.

Abstract: Methods for manufacturing the grating sheet and a liquid crystal display panel are provided. The grating sheet comprises a plurality of primary color gratings in parallel, each of which comprises a red R sub-grating, a green G sub-grating and a blue B sub-grating in parallel, and each sub-grating comprises an opening area and a reflective region disposed around the opening area and corresponds to a pixel unit on a sub-array substrate. The methods for manufacturing the grating sheet and a liquid crystal display panel may be applicable to a system with a liquid crystal display.

Abstract: A plasmonic transducer includes at least two metal elements with a gap therebetween. The metal elements are elongated along a plasmon-enhanced, near-field radiation delivery axis. Cross sections of the metal elements in a plane normal to the delivery axis vary in shape along the delivery axis. A waveguide is disposed along an elongated side of the plasmonic transducer. The waveguide is optically coupled to the plasmonic transducer along the elongated side.

Abstract: A surface enhanced Raman scattering (SERS) sensor includes a substrate with a nanostructured surface. The nanostructured surface has a quasi-periodic, anisotropic array of elongated ridge elements having a wave-ordered structure pattern, each ridge element having a wavelike cross-section and oriented substantially in a first direction. The sensor also includes a plurality of metal elements disposed, at least in part, on tops of the ridge elements.

Abstract: A process for producing a multilayer body (100) is specified. In this process, an HRI layer (7) made of a material having a high refractive index is applied to at least part of the surface area of a substrate (4). At least one partial region (10) of the HRI layer (7) is then physically removed from the substrate (4) again by treatment with an alkaline solution. Additionally specified is a multilayer body (100) that can be obtained by such a process.

Abstract: The present invention concerns a method for manufacturing a resonator in a substrate characterized in that it includes the following steps: a) modifying the structure of at least one region of the substrate in order to make said at least one region more selective; b) etching said at least one region in order to selectively manufacture said resonator.

Abstract: A method of making a grating in a waveguide includes forming a waveguide material over a substrate, the waveguide material having a thickness less than or equal to about 100 nanometers (nm). The method further includes forming a photoresist over the waveguide material and patterning the photoresist. The method further includes forming a first set of openings in the waveguide material through the patterned substrate and filling the first set of openings with a metal material.

Abstract: A novel blazed grating spectral filter disclosed herein includes a multilayer stack of materials that is formed on a wedge-shaped substrate wherein the upper surface of the substrate is oriented at an angle relative the bottom surface of the substrate and wherein the angle corresponds to the blaze angle of the blazed grating filter. Various methods of forming such a filter are also disclosed such as, for example, performing a planarization process in a CMP tool to define the wedge-shaped substrate, thereafter forming the multilayer stack of materials above the upper planarized surface of the substrate and etching recesses into the multilayer stack.

Abstract: A manufacturing method for a grating is disclosed for the angular dispersion of light impinging the grating. The grating comprises tapered structures and cavities. A cavity width and/or corrugation amplitude is varied for achieving a desired grating efficiency according to calculation. A method is disclosed for conveniently creating gratings with variable cavity width and/or corrugation amplitude. The method comprises the step of anisotropically etching a groove pattern into a grating master. Optionally a replica is produced that is complementary to the grating master. By variation of an etching resist pattern, the cavity width of the grating may be varied allowing the optimization towards different efficiency goals.

Abstract: A substrate is composed of a first material. A photonic structure is composed of the first material connected to one or more support structures composed of the first material between the photonic structure and a surface of the substrate, with at least one of the support structures supporting a first section of a strip of the photonic structure. The first section has a width that is wider than a width of a second section of the strip and has a length that is at least about twice the width of the second section of the strip.

Abstract: A method for manufacturing a symbol on an exterior of an electronic device is provided. The method includes preparing a support layer, preparing a nanograting layer on the support layer, the nanograting layer including a first nanograting area corresponding to a preset symbol and a second nanograting area corresponding to an area other than the preset symbol, wherein each of the first nanograting area and the second nanograting area includes three-dimensional (3D) nanostructures and a pitch between the 3D nanostructures arranged in the first nanograting area is different from a pitch between the 3D nanostructures arranged in the second nanograting area.

Abstract: An absorber device comprises a substrate; one or more thin film radiation absorbers arranged on the substrate; an integrated optical system, comprising at least one first optical element; a cover medium arranged above the substrate and the one or more radiation absorbers. The at least one first optical element and at least one corresponding one of the one or more radiation absorbers are aligned with respect to their optical axis, such that an incoming radiation is directed onto the one or more radiation absorbers by the optical system. A method of manufacturing an absorber device is also provided.

Abstract: Embodiments of the present invention include a fiber-optic tissue illuminator suitable for illuminating large areas of central and peripheral neural tissue, e.g., in a primate brain. Certain examples of the tissue illuminator have a light delivery surface that may be about two orders of magnitude larger than that of a conventional optical fiber of equal diameter. This illuminator allows for substantially more light to be delivered to brain tissue with no more penetration damage than a conventional fiber. For example, an illustrative illuminator can deliver light over a length of at least 3 mm in neural tissue, such as a macaque cortex, as shown by the presence of a light artifact in the local field potential. An exemplary illuminator can also be used with a previously injected viral vector (e.g., halorhodopsin) of optogenetic applications, like silencing neurons distributed over an extended region (e.g., a 3 mm length) of neural tissue.

Abstract: An optical coupler may include a fiber optic structure that has a portion of an outer surface that is beveled at a predetermined angle relative to a longitudinal axis of the fiber optic structure. The beveled outer surface portion may be optically coupled with a waveguide core of an optical integrated circuit. The fiber optic structure may also include a second outer surface portion that is butt coupled to an end of an optical fiber to optically couple the second outer surface portion with the optical fiber.

Abstract: The disclosed subject matter provides a nanoaperture having a bottom surface and a side wall comprising gold. A surface of the side wall is passivated with a first functional molecule comprising polyethylene glycol. The bottom surface of the nanoaperture can be functionalized with at least one second molecule comprising polyethylene glycol, for example, a silane-PEG molecule. The second molecule can further include a moiety, such as biotin, which is capable of binding a target biomolecule, which in turn can bind to a biomolecule of interest for single molecule fluorescence imaging analysis. Fabrication techniques of the nanoaperture are also provided.

Abstract: An apparatus for providing self-aligned optical coupling between an opto-electronic substrate and a fiber array, where the substrate is enclosed by a transparent lid such that the associated optical signals enter and exit the arrangement through the transparent lid. The apparatus takes the form of a two-part connectorized fiber array assembly where the two pieces uniquely mate to form a self-aligned configuration. A first part, in the form of a plate, is attached to the transparent lid in the area where the optical signals pass through. The first plate includes a central opening with inwardly-tapering sidewalls surrounding its periphery. A second plate is also formed to include a central opening and has a lower protrusion with inwardly-tapering sidewalls that mate with the inwardly-tapering sidewalls of the first plate to form the self-aligned connectorized fiber array assembly. The fiber array is then attached to the second plate in a self-aligned fashion.

Abstract: A mask including a light-blocking area, a transparent area and a partial-transparent area is disclosed. The partial-transparent area protrudes from edges of the light-blocking area to admit some of the UV rays to pass through. In addition, a glass substrate and the manufacturing method thereof are disclosed. By arranging the partial-transparent area on the edges of the light-blocking, area, the mask is formed with the slope having the small angle after the lithography process. As such, in the etching process, the edge of the thin film is formed with the slope having the small angle, which contributes to the formation of the second thin film. The thin films are prevented from being fragmented around the slope and the ITO layer is also prevented from fragmented around the periphery of the through hole.

Abstract: A waveguide structure includes a bottom dielectric layer, a core layer disposed over the bottom dielectric layer, an etch stop layer disposed over the core layer, and a cladding layer or a buffer layer disposed over the etch stop layer. The waveguide structure is configured to guide a light signal through different geography, such as straight, taper, turning, grating and tight coupling sections.

Abstract: A colored glass, a surface of which is roughened in whole or in part. In the colored glass, an average value of gloss values measured at 9 points in the surface thereof at an incident angle of 60° in accordance with JIS 28741 (1991) is 30 or less, a ratio of a difference between a maximum gloss value and a minimum gloss value to the maximum gloss value is 20% or less, and a minimum value of visible-light transmittance at a thickness of 0.8 mm is 70% or less.

Abstract: A polarizer includes a base substrate and a metal pattern disposed on the base substrate and forming a wire grid. The wire grid has a width and a height and spaced apart from adjacent wire grid by a separation distance. A pitch is a sum of the width and the separation distance. A fill factor is obtained by dividing the width by the pitch. The range of the fill factor is based on an extinction ratio of polarization and a transmittance of the polarizer.

Abstract: A method and apparatus for modifying low emissivity (low-E) coated glass, so that windows using the processed glass allow uninterrupted use of RF devices within commercial or residential buildings. Glass processed in the manner described herein will not significantly diminish the energy conserving properties of the low-E coated glass. This method and apparatus disrupts the conductivity of the coating in small regions. In an embodiment, the method and apparatus ablates the low-E coating along narrow contiguous paths, such that electrical conductivity can no longer occur across the paths. The paths may take the form of intersecting curves and/or lines, so that the remaining coating consists of electrically isolated areas. The method and apparatus are applicable both to treating glass panels at the factory as well as treating windows in-situ after installation.

Abstract: The present invention discloses a method for transferring a graphene layer. The graphene layer formed on a metal carrier layer is electrostatically adsorbed on a substrate by electrostatic charges, and then the substrate having the graphene layer formed on the metal carrier layer is immersed in an etching solution to remove the metal carrier layer, thereby completing the transfer of the graphene layer. In addition to being able to provide a simple method for transferring the graphene layer, the present invention further solves a problem of retaining organic residues, thus enhancing electrical properties of the transferred graphene layer.

Abstract: A plasmonic transducer includes at least two metal elements with a gap therebetween. The metal elements are placed along a plasmon-enhanced, near-field radiation delivery axis. Cross sections of the metal elements in a plane normal to the delivery axis vary in shape along the delivery axis. The metal elements have a reduced cross section portion at a media-facing surface oriented normal to the delivery axis. A dielectric material surrounds the reduced cross section portion of the plasmonic transducer at the media-facing surface, and reduces deformation of the metal elements proximate the media-facing surface at elevated temperatures.

Abstract: A diffraction-type 3D display element is arranged on an image output face of a 3D display device and comprises a first diffraction area and a second diffraction area. The first diffraction area has a plurality of first stepped gratings spaced apart from each other. The second diffraction area has a plurality of second stepped gratings spaced apart from each other. The second diffraction area is adjacent to the first diffraction area and is arranged symmetrically to the first diffraction area with a central line being the symmetric axis. The diffraction-type 3D display element of the invention diffracts the images output by the 3D display device and projects the diffracted images to two different viewing areas to provide 3D images for users.

Abstract: Novel processing methods for production of high-refractive index contrast and low loss optical waveguides are disclosed. In one embodiment, a “channel” waveguide is produced by first depositing a lower cladding material layer with a low refractive index on a base substrate and a refractory metal layer. Then, an etch mask layer is deposited on the refractory layer, followed by selective etching of the refractory metal layer with a dry-etch tool with high selectivity to the etch mask layer. Then, the refractory metal layer is oxidized to form an oxidized refractory metal region, and a top cladding layer made of a second low refractive index material to encapsulate the oxidized refractory metal region. In another embodiment, a “ridge” waveguide is produced by using similar process steps with an added step of depositing a high-refractive-index material layer and an optional optically-transparent layer.

Abstract: The technology provides embodiments for a waveguide including gaps which turn the direction of light. Each of a plurality of planes located within a waveguide includes a group of gaps so that each of the gapped planes partially reflects out of the waveguide light within a first angle range and transmits down the waveguide light received within a second angle range. In some examples, the waveguide is formed by joining optically transparent sections, and each group of gaps is formed in a surface of each optically transparent section which becomes a joining surface when bonded with an abutting all flat surface of an adjacent section. The waveguide may be used in displays, and in particular in near-eye displays (NED)s.

Abstract: An optical element structure and a fabricating process for the same are provided. The optical element fabricating process includes providing a substrate forming thereon a protrusion; and forming an over coating layer over the protrusion and the substrate by a deposition scheme to form an optical element.

Abstract: A method of forming a sampled grating includes the steps of preparing a substrate; preparing a nano-imprinting mold including a pattern surface on which projections and recesses are periodically formed; preparing a mask including a light obstructing portion and a light transmitting portion that are alternately provided; forming a photoresist layer and a resin portion in that order on the substrate; forming a patterned resin portion having projections and recesses by pressing the pattern surface of the mold into contact with the resin portion and hardening the resin portion while maintaining the contact; exposing a portion of the photoresist layer by irradiating the photoresist layer with exposing light through the mask and the patterned resin portion; forming a patterned photoresist layer by developing the photoresist layer; and etching the substrate using the patterned photoresist layer.

Abstract: A method for producing an antireflection coating on a substrate is specified. A first nanostructure in a first material is formed using by means of a first plasma etching process. The first material is the material of the substrate or the material of a layer made of a first organic material applied onto the substrate. A layer made of a second material is applied onto the first nanostructure, the second material is an organic material. A second nanostructure is formed in the layer made of the second material using a second plasma etching process. The second material has a higher etching rate than the first material when carrying out the second plasma etching process.