Shaping Patents (Class 219/121.73)
  • Patent number: 8395084
    Abstract: A laser beam having homogeneous intensity distribution is delivered without causing interference stripes of a laser to appear on an irradiation surface. A laser beam emitted from a laser oscillator passes through a diffractive optical element so that the intensity distribution thereof is homogenized. The beam emitted from the diffractive optical element then passes through a slit so that low-intensity end portions in a major-axis direction of the beam are blocked. Subsequently, the beam passes through a projecting lens and a condensing lens, so that an image of the slit is projected onto the irradiation surface. The projecting lens is provided so that the slit and the irradiation surface are conjugated. Thus, the irradiation surface can be irradiated with the laser having homogeneous intensity while preventing the diffraction by the slit.
    Type: Grant
    Filed: April 26, 2006
    Date of Patent: March 12, 2013
    Assignee: Semiconductor Energy Laboratory Co., Ltd.
    Inventor: Koichiro Tanaka
  • Patent number: 8389894
    Abstract: A laser processing apparatus for processing a multitude of portions to be processed in an area to be processed in a subject W to be processed, including a laser device, a focusing or imaging device for laser beams provided by the laser device, and an arranging device for arranging the subject W to be processed, in which the subject W to be processed and the focusing or imaging device are fixed, and the subject to be processed is processed while relatively shifting the laser beams and the focusing or imaging device so that the focusing or imaging device is irradiated from different areas in the laser beam, inside and outside the area to be processed, and that cumulative laser beam irradiation time during the processing of each of the multitude of portions to be processed is equalized.
    Type: Grant
    Filed: May 16, 2006
    Date of Patent: March 5, 2013
    Assignee: Phoeton Corp.
    Inventors: Satoshi Ando, Tomobumi Muraoka, Takashi Nire, Akira Matsuno, Tadashi Kurata
  • Patent number: 8389895
    Abstract: The invention is a method and apparatus for laser marking a stainless steel specimen with commercially desirable marks. The method includes providing a laser processing system having a laser, and laser optics and a controller with pre-determined laser pulse parameters, selecting the pre-determined laser pulse parameters associated with the desired mark, and directing the laser marking system to produce laser pulses having laser pulse parameters associated with the desired marks including temporal pulse widths greater than about 1 and less than about 1000 picoseconds.
    Type: Grant
    Filed: June 25, 2010
    Date of Patent: March 5, 2013
    Assignee: Electro Scientifix Industries, Inc.
    Inventors: Robert Reichenbach, Jeffrey Howerton, Jeffrey Albelo
  • Patent number: 8383981
    Abstract: A system for generating a laser machined tool from a substantially cylindrical work piece. The system includes a laser producing a laser beam, a mask positioned within the laser beam for shaping the laser beam into an image, and an optical system for imaging the laser beam image onto the outer surface of the work piece. The system coordinates rotational and translation movements of the work piece with activation of the laser in order to use the laser image for ablating the outer surface of the work piece, creating microstructures within the surface of the work piece to form the cylindrical tool.
    Type: Grant
    Filed: June 20, 2011
    Date of Patent: February 26, 2013
    Assignee: 3M Innovative Properties Company
    Inventors: Thomas R. Corrigan, Patrick R. Fleming
  • Patent number: 8378259
    Abstract: The embodiments disclosed herein provide systems and methods for correcting a head-to-head offset in a laser machining system with two or more processing heads. A focusing lens is associated with each processing head, and is configured to receive an incident laser beam along an incident beam axis of propagation. The incident beam axis of propagation is offset from the primary axis of the focusing lens. The focusing lens is further configured to rotate about the incident beam axis of propagation in order to steer the incident laser beam's path with respect to a workpiece.
    Type: Grant
    Filed: September 30, 2008
    Date of Patent: February 19, 2013
    Assignee: Electro Scientific Industries, Inc.
    Inventors: Yanfei Jiang, Mehmet E. Alpay
  • Patent number: 8378258
    Abstract: A laser machining system and method uses a shaped laser beam, such as a long, narrow beam, and effectively scans the beam in the narrow direction across a mask having an aperture pattern. The pattern on the mask is imaged onto a moving workpiece and the patterned laser beam selectively removes material from the workpiece. The workpiece may be moved using a coordinated synchronized rotational motion. The laser may use a longer wavelength (e.g., 248 nm) and the beam may be scanned at a high rate of speed to reduce the dissipation of the residual thermal energy in the material being machined. In one embodiment, this system and method may be used to machine a complex pattern into a curved surface with relatively high resolution and high speeds.
    Type: Grant
    Filed: August 2, 2005
    Date of Patent: February 19, 2013
    Assignee: IPG Microsystems LLC
    Inventors: Patrick J. Sercel, Jeffrey P. Sercel
  • Patent number: 8372762
    Abstract: In a manufacturing process of a semiconductor device, a manufacturing technique and a manufacturing apparatus of a semiconductor device which simplify a lithography step using a photoresist is provided, so that the manufacturing cost is reduced, and the throughput is improved. An irradiated object, in which a light absorbing layer and an insulating layer are stacked over a substrate, is irradiated with a multi-mode laser beam and a single-mode laser beam so that both the laser beams overlap with each other, and an opening is formed by ablation in part of the irradiated object the irradiation of which is performed so that both the laser beams overlap with each other.
    Type: Grant
    Filed: June 3, 2010
    Date of Patent: February 12, 2013
    Assignee: Semiconductor Energy Laboratory Co., Ltd.
    Inventors: Hirotada Oishi, Koichiro Tanaka
  • Patent number: 8367971
    Abstract: According to the present invention, a method of working material with high-energy radiation is provided, wherein a polymer matrix (1) is irradiated with high-energy radiation, in particular with a laser beam (9), wherein the radiation is focused onto a focal point (11) and the focal point (11) is set such that the focal point (11) lies behind the surface (3) of the polymer matrix (1) facing the radiation, and material removal is brought about at the polymer matrix (1), and consequently a reaction space (13) is created within the polymer matrix (1).
    Type: Grant
    Filed: November 18, 2009
    Date of Patent: February 5, 2013
    Assignee: tesa SE
    Inventors: Arne Koops, Sven Reiter
  • Publication number: 20130017670
    Abstract: A laser processing method comprising a step of irradiating an object to be processed with laser light elliptically polarized with an ellipticity of other than 1 such that a light-converging point of the laser light is located within the object along the major axis of an ellipse indicative of the elliptical polarization of laser light, along a line which the object is intended to be cut, to form a modified region caused by multiphoton absorption within the object, along the line which the object is intended to be cut.
    Type: Application
    Filed: August 28, 2012
    Publication date: January 17, 2013
    Applicant: Hamamatsu Photonics K.K.
    Inventors: Fumitsugu Fukuyo, Kenshi Fukumitsu, Naoki Uchiyama, Toshimitsu Wakuda
  • Patent number: 8344286
    Abstract: A method of enhancing the quality of laser ablation by controlling the laser repetition rate during the ablation process, wherein the method enhances the quality of laser ablation of a photomask in order to improve the optical quality thereof. Also provided is a system employing the method of enhancing the quality of laser ablation.
    Type: Grant
    Filed: January 18, 2007
    Date of Patent: January 1, 2013
    Assignee: International Business Machines Corporation
    Inventors: Peter P. Longo, Alfred Wagner
  • Patent number: 8338747
    Abstract: The present invention provides a method of removing a coated resin layer of a resin-coated metal tube whereby a resin layer can be stripped rapidly without the risk of damaging a plating layer. In a method of removing a coating resin layer of a resin-coated metal tube according to the present invention, a coating resin layer is removed by a rotating body of a rotating body stripping apparatus, whereupon the coating resin layer is removed by a laser beam of a laser apparatus.
    Type: Grant
    Filed: November 24, 2009
    Date of Patent: December 25, 2012
    Assignee: Sanoh Industrial Co., Ltd.
    Inventors: Takanori Kon, Yoshihide Tabayashi, Kazunori Takano, Takaaki Motohashi, Toshio Oshima, Naoki Kawai, Yuji Motohashi
  • Publication number: 20120318777
    Abstract: An apparatus 101 for singulating an object is disclosed. The apparatus 101 comprises a laser 103 configured to emit a laser beam 105 with a Gaussian irradiance profile, as well as a beam-shaping device 115 configured to reshape the Gaussian irradiance profile of the laser beam 105 emitted from the laser 103. In particular, the beam-shaping device 115 has a plurality of aspherical lenses 117, 119 to redistribute irradiance of the laser beam 105, so as to reduce variation of the irradiance in an effective irradiation spectrum of the laser beam 105 for singulating the object. By redistributing the irradiance of the laser beam 105, irradiation energy may be more efficiently delivered to the semiconductor wafer 102 for laser singulation, compared with conventional laser beams with Gaussian irradiance profiles which are non-uniform. A method of singulating an object is also disclosed.
    Type: Application
    Filed: June 15, 2011
    Publication date: December 20, 2012
    Inventors: Chi Hang KWOK, Chi Wah CHENG
  • Patent number: 8324528
    Abstract: The present invention provides a manufacturing method for accurate, fine and efficient processing of a work piece to be processed and prevention of graphitization of the work piece to be processed, when sintered diamond is processed by a laser beam. The method provides process comprising steps of (a) irradiating outer circumference of a scribing wheel 2 with a laser beam from the side of the wheel, (b) moving the laser beam relative to the wheel 2, (c) forming continuously along the circumferential direction in the required space fine grooves with openings directed radially on a ridge site, (d) irradiating the laser beam onto the site to be processed at a speed of the laser beam relative to the work piece, and (e) forming the work piece into a minute shape within a depth of less than 200 ?m.
    Type: Grant
    Filed: February 2, 2006
    Date of Patent: December 4, 2012
    Assignee: Mitsuboshi Diamond Industrial Co., Ltd
    Inventors: Mikio Kondo, Kazuhisa Kuriyama, Hiroshi Tomimori
  • Patent number: 8324529
    Abstract: A laser machining device 1 includes a laser light source 10, a spatial light modulator 20, a controller 22, a converging optical system 30, and a shielding member 40. The phase-modulating spatial light modulator 20 inputs a laser beam outputted from the laser light source 10, displays a hologram modulating a phase of the laser beam at each of a plurality of pixels arranged two-dimensionally, and outputs the phase-modulated laser beam. The controller 22 causes the spatial light modulator 20 to display a plurality of holograms sequentially, lets the converging optical system 30 converge the laser beam outputted from the spatial light modulator 20 at converging positions having a fixed number of M, selectively places N converging positions out of the M converging positions into a machining region 91, and machines an object to be machined 90.
    Type: Grant
    Filed: August 26, 2008
    Date of Patent: December 4, 2012
    Assignee: Hamamatsu Photonics K.K.
    Inventors: Naoya Matsumoto, Takashi Inoue, Norihiro Fukuchi, Haruyasu Ito, Yuu Takiguchi
  • Patent number: 8309885
    Abstract: A laser processing system provides a burst of ultrafast laser pulses having a selectively shaped burst envelope. A burst pulse laser includes a high repetition rate ultrafast laser to deliver a pulse train with each pulse in the train having an independently controlled amplitude. The respective amplitudes of each ultrafast pulse in a group define a “burst envelope.” In addition to independently controlling the amplitude of each ultrafast pulse within the burst envelope, the system may also provide selective control of spacing between each ultrafast pulse and/or the overall temporal width of the burst envelope. Thus, the system provides selective shaping of the burst envelope for particular laser processing applications.
    Type: Grant
    Filed: January 15, 2009
    Date of Patent: November 13, 2012
    Assignee: Electro Scientific Industries, Inc.
    Inventors: Xiaoyuan Peng, Andrew Hooper
  • Patent number: 8309884
    Abstract: The present invention is to provide a laser irradiation apparatus for forming a laser beam which has a shape required for the annealing and which has homogeneous energy distribution, by providing a slit at an image-formation position of a diffractive optical element, wherein the slit has a slit opening whose length is changeable. The laser irradiation apparatus comprises a laser oscillator, a diffractive optical element, and a slit, wherein the slit has a slit opening whose length in a major-axis direction thereof is changeable, wherein a laser beam is delivered obliquely to a substrate, and wherein the laser beam is a continuous wave solid-state, gas, or metal laser, or a pulsed laser with a repetition frequency of 10 MHz or more.
    Type: Grant
    Filed: May 4, 2005
    Date of Patent: November 13, 2012
    Assignee: Semiconductor Energy Laboratory Co., Ltd.
    Inventor: Koichiro Tanaka
  • Publication number: 20120274029
    Abstract: The present invention discloses a mating ring, a primary ring, and associated mechanical seal having superior heat transfer and wear characteristics. According to an exemplary embodiment of the present invention, one or more dimples are formed onto the cylindrical outer surface of a mating ring sidewall and/or a primary ring sidewall. A stationary mating ring for a mechanical seal assembly is disclosed. Such a mating ring comprises an annular body having a central axis and a sealing face, wherein a plurality of dimples are formed into the outer circumferential surface of the annular body such that the exposed circumferential surface area of the annular body is increased. The texture added to the sidewall of the mating ring yields superior heat transfer and wear characteristics.
    Type: Application
    Filed: May 6, 2011
    Publication date: November 1, 2012
    Applicant: Board of Supervisors of Louisiana State University and Agricultural and Mechanical College
    Inventors: Michael M. Khonsari, Nian Xiao
  • Publication number: 20120273472
    Abstract: A laser processing system includes a first positioning system for imparting first relative movement of a beam path along a beam trajectory with respect to a workpiece, a processor for determining a second relative movement of the beam path along a plurality of dither rows, a second positioning system for imparting the second relative movement, and a laser source for emitting laser beam pulses. The system may compensate for changes in processing velocity to maintain dither rows at a predetermined angle. For example, the dither rows may remain perpendicular to the beam trajectory regardless of processing velocity. The processing velocity may be adjusted to process for an integral number of dither rows to complete a trench. A number of dither points in each row may be selected based on a width of the trench. Fluence may be normalized by adjusting for changes to processing velocity and trench width.
    Type: Application
    Filed: October 24, 2011
    Publication date: November 1, 2012
    Applicant: ELECTRO SCIENTIFIC INDUSTRIES, INC.
    Inventors: Mark A. Unrath, Andrew Berwick, Alexander A. Myachin
  • Patent number: 8288685
    Abstract: The thermal processing device includes a stage, a continuous wave electromagnetic radiation source, a series of lenses, a translation mechanism, a detection module, a three-dimensional auto-focus, and a computer system. The stage is configured to receive a substrate thereon. The continuous wave electromagnetic radiation source is disposed adjacent the stage, and is configured to emit continuous wave electromagnetic radiation along a path towards the substrate. The series of lenses is disposed between the continuous wave electromagnetic radiation source and the stage, and are configured to condense the continuous wave electromagnetic radiation into a line of continuous wave electromagnetic radiation on a surface of the substrate. The translation mechanism is configured to translate the stage and the line of continuous wave electromagnetic radiation relative to one another. The detection module is positioned within the path, and is configured to detect continuous wave electromagnetic radiation.
    Type: Grant
    Filed: December 29, 2010
    Date of Patent: October 16, 2012
    Assignee: Applied Materials, Inc.
    Inventors: Dean C. Jennings, Mark Yam, Abhilash J. Mayur, Vernon Behrens, Paul A. O'Brien, Leonid M. Tertitski, Alexander Goldin
  • Publication number: 20120251779
    Abstract: A housing for an electronic device is described. The housing includes a metal substrate, and a plurality of recesses formed on an outer surface of the metal substrate. The recesses define a pattern. The recesses are dispersed on the outer surface with a gradual change of density of the recesses across at least one dimension of the outer surface. The recesses have an average width of about 0.02 mm-0.04 mm. The average depth of the recesses is about 0.05 mm-0.1 mm, and the distance between each two adjacent recesses is about 0.2 mm-2 mm.
    Type: Application
    Filed: September 7, 2011
    Publication date: October 4, 2012
    Applicants: FIH (HONG KONG) LIMITED, SHENZHEN FUTAIHONG PRECISION INDUSTRY CO., LTD.
    Inventors: WEI LIU, SONG ZHANG, MING-MING CHEN
  • Patent number: 8278590
    Abstract: Embodiments of the present invention are directed to methods and systems for laser micro-machining, which may include dividing a long line illumination field into a plurality of individual fields, wherein each of the plurality of fields includes an aspect ratio of about 4:1 or greater, directing the plurality of individual fields onto at least one mask, wherein each individual field illuminates a corresponding area on the mask and translating the mask and/or workpiece relative to one another along a scan axis.
    Type: Grant
    Filed: May 27, 2005
    Date of Patent: October 2, 2012
    Assignee: Resonetics, LLC
    Inventors: Brian Hall, David S. Holbrook, David L. Wall
  • Patent number: 8278594
    Abstract: A method and an apparatus for perforating a printed circuit board are provided so that the processing efficiency and the board densification can be improved. In test processing, a conductor layer 50i is irradiated with a pulsed laser beam 4a whose energy density is set at a value high enough to process the conductor layer 50i while emission 23a from a processed portion is monitored. Thus, the number of pulses of irradiation required for processing a window in the conductor layer 50i is obtained. An insulating layer 51i is irradiated with a pulsed laser beam 5a whose energy density is set at a value high enough to process the insulating layer 51i but low enough not to process a conductor layer 50i+1 under the insulating layer 51i. Thus, the number of pulses of irradiation required for processing a window in the insulating layer 51i is obtained.
    Type: Grant
    Filed: March 3, 2009
    Date of Patent: October 2, 2012
    Assignee: Hitachi Via Mechanics, Ltd.
    Inventors: Kunio Arai, Hiroyuki Sugawara, Hiroaki Ashizawa, Hiromi Nishiyawa
  • Publication number: 20120220140
    Abstract: Provided is a forming device and method making it possible to obtain a low-temperature polysilicon film in which the size of crystal grains fluctuates minimally, and is uniform. A mask has laser-light-blocking areas and laser-light-transmission areas arranged in the form of a grid such that the light-blocking areas and transmission areas are not adjacent to one another. Laser light is directed by the microlenses through the masks to planned channel-area-formation areas. The laser light transmitted by the transmission areas is directed onto an a-Si:H film, annealing and polycrystallzing the irradiated parts thereof. The mask is then removed, and when the entire planned channel-area-formation area is irradiated with laser light, the already-polycrystallized area, having a higher melting point, does not melt, while the area in an amorphous state melts and solidifies, leading to polycrystallization.
    Type: Application
    Filed: October 14, 2010
    Publication date: August 30, 2012
    Inventors: Koichi Kajiyama, Kuniyuki Hamano, Michinobu Mizumura
  • Publication number: 20120211474
    Abstract: To provide a laser lap welding method including: performing lap welding (11; 21) by irradiating a laser beam (La) on a plurality of overlapped workpieces (1, 2); and irradiating, after a very short interruption time period of the laser beam irradiation, a defocused laser beam (Lc) on a terminating end (12; 22) of the lap welding. Preferably, the laser lap welding method including: interrupting the irradiation of the laser beam for a very short time period and moving, during the interruption time period, the optical axis of the laser beam from the terminating end of the lap welding to the side of the starting end of the lap welding; and irradiating a defocused laser beam from the position to which the optical axis of the laser beam is moved, to the terminating end of the lap welding.
    Type: Application
    Filed: February 14, 2012
    Publication date: August 23, 2012
    Applicant: SUZUKI MOTOR CORPORATION
    Inventors: Kazuhiro Hayashimoto, Yuta Fujinuma, Tsukasa Hagihara, Yoshitaka Sanuki
  • Patent number: 8202811
    Abstract: To provide a manufacturing apparatus of a semiconductor device, which does not use a stepper in a manufacturing process in the case where mass production of semiconductor devices is carried out by using a large-sized substrate. A thin film formed over a substrate having an insulating surface is selectively irradiated with a laser beam through light control means, specifically through an electro-optical device to cause ablation; accordingly, the thin film is partially removed, thereby processing the thin film in a remaining region into a desired shape. The electro-optical device functions as a variable mask by inputting an electrical signal based on design CAD data of the semiconductor device.
    Type: Grant
    Filed: September 9, 2010
    Date of Patent: June 19, 2012
    Assignee: Semiconductor Energy Laboratory Co., Ltd.
    Inventors: Koichiro Tanaka, Shunpei Yamazaki
  • Publication number: 20120145687
    Abstract: An apparatus for operating a laser materials processing and measurement device with a controllable laser for generating a laser beam and beam control means for adjusting the focus zone of a controlled portion of the laser beam in three spatial directions comprises an interface for operating a bidirectional data transfer link with the laser and the beam control means, and user control means for inputting and displaying control commands or control command sequences and for monitoring and/or controlling operation and/or the operating state of the device. So that all the components of the apparatus may also be tested with regard to all functionalities, if the laser materials processing and measurement device is not operationally ready and/or not connected to the interface, according to the invention the apparatus comprises simulation means for simulating operation of the device and/or of the user control means.
    Type: Application
    Filed: December 10, 2010
    Publication date: June 14, 2012
    Inventor: Mathias Wõlfel
  • Patent number: 8198565
    Abstract: A laser-welding apparatus may include a laser source, an incoming laser beam produced by the laser source, and a beam splitter that splits the incoming laser beam to form a leading beam and a trailing beam. A first focusing lens may focus the leading beam and a second focusing lens may focus the trailing beam to form a trailing-beam pattern on a workpiece. The trailing-beam pattern may include a crescent-shape having arms and a tail portion.
    Type: Grant
    Filed: April 11, 2008
    Date of Patent: June 12, 2012
    Assignee: Chrysler Group LLC
    Inventors: Feng Lu, Mariana G. Forrest
  • Patent number: 8173930
    Abstract: An apparatus for cutting a substrate includes a laser oscillator generating a femtosecond laser beam, a first beam splitter splitting the femtosecond laser beam into first and second femtosecond laser beams, a first condenser lens receiving the first femtosecond laser beam and condensing the first femtosecond laser beam to have a first focal depth, a second condenser lens receiving the second femtosecond laser beam, and condensing the second femtosecond laser beam to have a second focal depth different from the first focal depth, and a second beam splitter receiving and splitting the first femtosecond laser beam condensed through the first condenser lens and the second femtosecond laser beam condensed through the second condenser lens, and irradiating the split first and second femtosecond laser beams at different positions on a substrate to be cut.
    Type: Grant
    Filed: November 20, 2009
    Date of Patent: May 8, 2012
    Assignee: LG Display Co., Ltd.
    Inventor: Jeong Kweon Park
  • Patent number: 8158904
    Abstract: A method and apparatus is provided for removing material from an outer surface of a workpiece such as a catheter or other medical device. The method begins by generating a laser beam having an intensity profile and directing the laser beam onto the outer surface of the workpiece. After the laser beam is generated, its intensity profile is adjusted by a component such as a diffractive optical element (DOE) or a holographic optical element (HOE) so that material can be removed from the workpiece by ablation in a prescribed manner.
    Type: Grant
    Filed: August 13, 2004
    Date of Patent: April 17, 2012
    Assignee: Boston Scientific Scimed, Inc.
    Inventors: Jan Weber, Thomas J. Holman
  • Patent number: 8148663
    Abstract: The present invention generally relates to an optical system that is able to reliably deliver a uniform amount of energy across an anneal region contained on a surface of a substrate. The optical system is adapted to deliver, or project, a uniform amount of energy having a desired two-dimensional shape on a desired region on the surface of the substrate. Typically, the anneal regions may be square or rectangular in shape. Generally, the optical system and methods of the present invention are used to preferentially anneal one or more regions found within the anneal regions by delivering enough energy to cause the one or more regions to re-melt and solidify.
    Type: Grant
    Filed: July 31, 2007
    Date of Patent: April 3, 2012
    Assignee: Applied Materials, Inc.
    Inventors: Bruce E. Adams, Samuel C. Howells, Dean Jennings, Jiping Li, Timothy N. Thomas, Stephen Moffatt
  • Patent number: 8143552
    Abstract: A laser beam machining system including a chuck table for holding a work, and a laser beam irradiation unit for irradiating the work held on the chuck table with a laser beam, wherein the laser beam irradiation unit includes: a pulsed laser beam oscillator for oscillating a pulsed laser beam; a condenser for condensing the pulsed laser beam oscillated from the pulsed laser beam oscillator; a laser beam scanning unit disposed between the pulsed laser beam oscillator and the condenser and operative to deflect the pulsed laser beam to be inputted to the condenser; and a laser beam reshaping unit which ids disposed between the pulsed laser beam oscillator and the laser beam scanning unit and by which the energy distribution of the pulsed laser beam oscillated from the pulsed laser beam oscillator is reshaped into a top hat shape.
    Type: Grant
    Filed: September 6, 2007
    Date of Patent: March 27, 2012
    Assignee: Disco Corporation
    Inventor: Keiji Nomaru
  • Publication number: 20120043306
    Abstract: The invention is a method and apparatus for laser marking a stainless steel specimen with commercially desirable marks. The method includes providing a laser processing system having a laser, laser optics and a controller with pre-determined laser pulse parameters, selecting the pre-determined laser pulse parameters associated with the desired mark, and directing the laser marking system to produce laser pulses having laser pulse parameters associated with the desired marks including temporal pulse widths greater than about 1 and less than about 1000 picoseconds.
    Type: Application
    Filed: August 19, 2010
    Publication date: February 23, 2012
    Applicant: ELECTRO SCIENTIFIC INDUSTRIES, INC.
    Inventors: Jeffrey Howerton, Robert Reichenbach, Mehmet Alpay
  • Patent number: 8115137
    Abstract: In laser annealing using a solid state laser, a focus position of a minor axial direction of a rectangular beam is easily corrected depending on positional variation of a laser irradiated portion of a semiconductor film. By using a minor-axis condenser lens 29 condensing incident light in a minor axial direction and a projection lens 30 projecting light, which comes from the minor-axis condenser lens 29, onto a surface of a semiconductor film 3, laser beam 1 is condensed on the surface of the semiconductor film 3 in the minor axial direction of a rectangular beam. The positional variation of a vertical direction of the semiconductor film 3 in a laser irradiated portion of the semiconductor film 3 is detected by a positional variation detector 31, and the minor-axis condenser lens 29 is moved in an optical axis direction based on a value of the detection.
    Type: Grant
    Filed: June 12, 2008
    Date of Patent: February 14, 2012
    Assignee: IHI Corporation
    Inventors: Norihito Kawaguchi, Ryusuke Kawakami, Kenichiro Nishida, Miyuki Masaki, Masaru Morita, Atsushi Yoshinouchi
  • Publication number: 20120024465
    Abstract: Certain embodiments of the invention may include systems and methods for providing stator bar press tooling. According to an example embodiment of the invention, a method is provided for pressing and curing insulation material on a shaped element. The method can include providing tooling. The tooling can include an inner press and an outer press, wherein at least an inner press surface associated with the inner press and an outer press surface associated with the outer press are fabricated at least in part by sintering. The method can include applying at least one of pressure or heat to insulation material in contact with a shaped element with the tooling, wherein the inner press surface and the outer press surface of the tooling conform to least an external portion of the shaped element.
    Type: Application
    Filed: July 29, 2010
    Publication date: February 2, 2012
    Applicant: GENERAL ELECTRIC COMPANY
    Inventors: Caleb James Munholand, Mark Stephen Clough, Mark Kent Shoemaker, David John Wardell
  • Publication number: 20120012594
    Abstract: In the method for structuring at least one area of a solid body surface provided with a ta-C coating, a mask in the homogenous spot of the optical system is used in order to shape the beam in the mask projection technique and then a diaphragm in front of the imaging optics. A structure is applied by means of an excimer laser having pulse durations in the nanosecond range, a number of mask and diaphragm combinations being arranged in a exchanger device and the exchanger device being adapted to place both one of the masks and one of the diaphragms in the beam path of the laser independently of each other, the masks and diaphragms being arranged in holders while being displaceable linearly or rotatively and rotatable about themselves. This method allows the rational manufacture of very complex, extremely fraud-resistant authentication features and/or of esthetically attractive, optical diffraction effective colored patterns.
    Type: Application
    Filed: March 18, 2009
    Publication date: January 19, 2012
    Inventors: Charles Boegli, Steffen Weissmantel, Günter Reisse, Andy Engel, Rene Boettcher, Werner Steffen
  • Patent number: 8097829
    Abstract: A laser processing method involving moving first and second laser beams relative to a workpiece, wherein the first and second laser beams have at least a differing wavelength or intensity. The method including irradiating the first and second laser beams through first and second portions, respectively, of an optical element that directs the first and second laser beams onto the workpiece, wherein irradiating the second laser beam is subsequent to the irradiating the first laser beam. The method including moving the first laser beam and the second laser beam relative to the workpiece along another direction. The method including irradiating the first and second laser beams through third and fourth portions, respectively, of the optical element, wherein the third and fourth portions are dependent on the another direction, wherein irradiating the second laser beam is subsequent to the irradiating the first laser beam.
    Type: Grant
    Filed: October 24, 2008
    Date of Patent: January 17, 2012
    Assignee: Hitachi Zosen Corporation
    Inventors: Naoaki Fukuda, Kazuyoshi Kunishio, Shigeaki Nakayama
  • Patent number: 8084707
    Abstract: Disclosed herein is a laser irradiation apparatus, including: an optical system configured to form laser light of a linear cross section to be irradiated on an irradiation object; and a cutting member having a light blocking portion configured to block the laser light formed in the linear cross section by the optical system to cut the laser light so as to have a predetermined length along a line longitudinal direction; the light blocking portion having a plurality of fins provided on the light blocking portion thereof so as to fetch and absorb the laser light.
    Type: Grant
    Filed: August 24, 2007
    Date of Patent: December 27, 2011
    Assignee: Sony Corporation
    Inventors: Keisuke Omoto, Minoru Nakajima, Masatoshi Inagaki
  • Patent number: 8071908
    Abstract: Apparatuses and methods are provide thermally processing of the central portion of a substrate surface using a scanned photonic beam. Such thermal processing is carried out using a shield to block the beam from illuminating the side wall or peripheral portion of the substrate. The shield has characteristics, e.g., diffractive characteristics, effective to maintain the intensity of any unblocked portion of beam suitable for processing the central portion of the substrate surface.
    Type: Grant
    Filed: March 26, 2008
    Date of Patent: December 6, 2011
    Assignee: Ultratech, Inc.
    Inventor: Serguei G. Anikitchev
  • Patent number: 8071911
    Abstract: A combustor component with cooling apertures has the apertures formed by laser drilling. The machining apparatus comprises a beam generator for generating a beam for directing at the combustor component and a beam trap. The component is translated relative to the beam and the beam is directed to the beam trap and is dissipated within the beam trap.
    Type: Grant
    Filed: January 24, 2008
    Date of Patent: December 6, 2011
    Assignee: Rolls-Royce PLC
    Inventor: Ian M. Garry
  • Publication number: 20110266266
    Abstract: A laser processing machine is provided which includes a chuck table adapted to hold a workpiece; and a laser beam irradiation unit for emitting a laser beam to the workpiece held by the chuck table. The laser beam irradiation unit includes a single laser beam oscillating unit for emitting a laser beam; a beam splitter which splits the laser beam emitted from the laser beam oscillating unit into a first laser beam propagating along a first path and a second laser beam propagating along a second path; a first condenser which condenses the first laser beam; and a second condenser which condenses the second laser beam.
    Type: Application
    Filed: July 13, 2011
    Publication date: November 3, 2011
    Applicant: Disco Corporation
    Inventor: Koichi Kondo
  • Patent number: 8049135
    Abstract: A method makes a discrete adjustment to static alignment of a laser beam in a machine for selectively irradiating conductive links on or within a semiconductor substrate using the laser beam. The laser beam propagates along a beam path having an axis extending from a laser to a laser beam spot at a location on or within the semiconductor substrate. The method generates, based on at least one measured characteristic of the laser beam, at least one signal to control an adjustable optical element of the machine effecting the laser beam path. The method also sends said at least one signal to the adjustable optical element. The method then adjusts the adjustable optical element in response to said at least one signal so as to improve static alignment of the laser beam path axis.
    Type: Grant
    Filed: July 5, 2006
    Date of Patent: November 1, 2011
    Assignee: Electro Scientific Industries, Inc.
    Inventors: Kelly J. Bruland, Stephen N. Swaringen
  • Patent number: 8049133
    Abstract: A laser beam machining apparatus including a laser beam irradiation unit, the laser beam irradiation unit including: a laser beam oscillator for oscillating a laser beam; a beam splitter by which the laser beam oscillated by the laser beam oscillator is split into a first laser beam and a second laser beam; a rotary half-wave plate disposed between the laser beam oscillator and the beam splitter; a condenser lens disposed in a first optical path for guiding the first laser beam split by the beam splitter; a first reflecting mirror disposed in a second optical path for guiding the second laser beam split by the beam splitter; a first quarter-wave plate disposed between the beam splitter and the first reflecting mirror; a second reflecting mirror disposed in a third optical path for splitting thereinto the second laser beam returned to the beam splitter through the second optical path; a second quarter-wave plate disposed between the beam splitter and the second reflecting mirror; and a cylindrical lens dispose
    Type: Grant
    Filed: April 28, 2008
    Date of Patent: November 1, 2011
    Assignee: Disco Corporation
    Inventors: Ryugo Oba, Hiroshi Morikazu
  • Publication number: 20110259862
    Abstract: An additive manufacturing apparatus comprises a processing chamber (100) defining a window (110) for receiving a laser beam and an optical module (10) The optical module is removably-mountable to the processing chamber for delivering the laser beam through the window. The optical module contains optical components for focusing and steering the laser beam and a controlled atmosphere can be maintained within the module.
    Type: Application
    Filed: September 7, 2009
    Publication date: October 27, 2011
    Applicant: MTT TECHNOLOGIES LIMITED
    Inventors: Simon Peter Scott, Chris Sutcliffe
  • Patent number: 8044372
    Abstract: Continuous wave laser apparatus with enhanced processing efficiency is provided as well as a method of manufacturing a semiconductor device using the laser apparatus. The laser apparatus has: a laser oscillator; a unit for rotating a process object; a unit for moving the center of the rotation along a straight line; and an optical system for processing laser light that is outputted from the laser oscillator to irradiate with the laser light a certain region within the moving range of the process object. The laser apparatus is characterized in that the certain region is on a line extended from the straight line and that the position at which the certain region overlaps the process object is moved by rotating the process object while moving the center of the rotation along the straight line.
    Type: Grant
    Filed: June 20, 2007
    Date of Patent: October 25, 2011
    Assignee: Semiconductor Energy Laboratory Co., Ltd.
    Inventors: Shunpei Yamazaki, Koichiro Tanaka, Hidekazu Miyairi, Aiko Shiga, Akihisa Shimomura, Mai Akiba
  • Patent number: 8030593
    Abstract: A laser welding apparatus and method for easily adjusting a laser focusing position according to a distance from a laser irradiating device to a laser irradiating point on a work piece, or a welding point. A post-collimation laser diameter is measured when the laser emitting end has an optimal laser diameter on the work piece with respect to the distance from the laser processing head to the work piece. Corresponding data is stored with the above distance and the post-collimation laser diameter corresponding to each other. During welding, a diameter of the laser beam passing through a collimate lens is measured by a laser diameter measuring device. The post-collimation laser diameter is adjusted to be an optimal value according to the corresponding data.
    Type: Grant
    Filed: March 22, 2007
    Date of Patent: October 4, 2011
    Assignee: Nissan Motor Co., Ltd.
    Inventor: Nobuhiro Yoshikawa
  • Patent number: 8022332
    Abstract: A laser condensing optical system of the present invention includes a laser beam source which emits a laser beam, a condensing optical system which is arranged between the laser beam source and a medium and condenses the laser beam in the medium, and a laser divergence point moving unit which can move the position of a laser divergence point of the laser beam along an optical axis of the laser beam in accordance with the refractive index of the medium in which the laser beam is desired to be condensed and the distance from a surface of the medium to a position where the beam is desired to be condensed.
    Type: Grant
    Filed: October 5, 2007
    Date of Patent: September 20, 2011
    Assignees: Olympus Corporation, Hamamatsu Photonics K.K.
    Inventors: Yukio Eda, Sadashi Adachi, Norio Kurita, Tetsuya Osajima
  • Patent number: 8008600
    Abstract: The fiber laser apparatus comprises an amplifying section for amplifying seed light by cladding-pumping, and has a structure for further using a residual component of pumping light for cladding-pumping in order to heat the object. A guiding optical fiber is provided between an amplifying optical fiber of the amplifying section and an output optical system converging the single-mode amplified seed light on the object, the guiding optical fiber serving to increase the degree of freedom in arranging the output optical system. The guiding optical fiber has a structure enabling the single-mode propagation of the amplified seed light outputted from the amplifying optical fiber and multimode propagation of the residual pumping light. Because the object is irradiated with the converged amplified seed light, while being heated with the residual pumping light outputted from the output optical system, even an object with a complex shape can be subjected to efficient laser processing.
    Type: Grant
    Filed: June 13, 2007
    Date of Patent: August 30, 2011
    Assignee: Sumitomo Electric Industries, Ltd.
    Inventors: Kazuo Nakamae, Motoki Kakui, Shinobu Tamaoki
  • Patent number: 8006385
    Abstract: A forming method of a tooth trace of a gear according to the present invention includes: a first step of preparing a preformed gear made of metal including a cylindrical main body and a tooth part having a flat tooth flank having a uniform thickness in a tooth trace direction inside of the main body; and a second step of conducting a surface treatment locally to an outside surface of the main body in order to deform the outside surface of the main body in such a manner that the same becomes concave, so that a crowning bulging in the tooth trace direction is formed on the tooth flank of the tooth part.
    Type: Grant
    Filed: July 12, 2005
    Date of Patent: August 30, 2011
    Assignee: Musashi Seimitsu Kogyo Kabushiki Kaisha
    Inventor: Akira Mataga
  • Patent number: 7989731
    Abstract: A method and device for processing materials with laser pulses having a large spectral bandwidth and a device for carrying out said method. The aim of the invention is to create an easy, flexible method enabling universally applicable processing which can, however, be adapted to specific processing and methodological requirements. According to the invention, one or several spectral parameters of the laser pulses, i.e. the spectral amplitude and/or spectral phase and/or spectral polarization thereof, is/are specifically modified, preferably according to a measuring process variable, in order to process material or during the occurrence of said processing. The invention is used in order to process material with laser pulses having a large spectral bandwidth, particularly femto-second pulses and pico-second pulses.
    Type: Grant
    Filed: July 20, 2004
    Date of Patent: August 2, 2011
    Assignee: Carl Zeiss Meditec AG
    Inventors: Mark Bischoff, Martin Hacker, Roland Sauerbrey, Gregor Stobrawa, Wolfgang Ziegler
  • Publication number: 20110180521
    Abstract: A system comprises a working laser beam, a sensing laser beam, first and second optical elements, an optical sensor, an aperture and a controller. The first optical element generates a coaxial beam from the working laser beam and the sensing laser beam. The second optical element focuses the coaxial beam onto a workpiece, such that the working laser beam machines the workpiece and the sensing laser beam reflects from the workpiece. The optical sensor senses an intensity of the reflected sensing beam. The aperture determines a focus position by translating along the reflected sensing beam, such that the reflected intensity is maximized. The controller determining a machining parameter of the working laser beam, based on the focus position.
    Type: Application
    Filed: January 27, 2010
    Publication date: July 28, 2011
    Applicant: United Technologies Corporation
    Inventors: John Patrick Quitter, Chester E. Yaworsky, JR., Hai-Lung Tsai