With Target Means Patents (Class 250/398)
  • Patent number: 11303074
    Abstract: An enclosure comprising a housing having a first end and a second end opposite the first end, the housing having a first connector receptacle at the first end, the housing having a surface defining a robot-engaging mechanism, a hook extending from the second end of the housing, and a securement mechanism at the second end of the housing.
    Type: Grant
    Filed: June 22, 2020
    Date of Patent: April 12, 2022
    Assignee: Google LLC
    Inventors: Nathanael Arling Worden, Samuel Gardner Garrett
  • Patent number: 11282674
    Abstract: In one embodiment, a charged particle beam writing method is for writing a pattern in a writing area on a substrate by irradiating a charged particle beam onto the substrate while moving the substrate to write stripes sequentially, each of the stripes having a width W and shapes obtained by dividing the writing area by the width W. The method includes performing S times (S is an integer greater than or equal to two) strokes, each of the strokes which is a process writing the stripes in a multiplicity of 2n (n is an integer greater than or equal to one) while shifting a reference point of each of the stripes in the width direction by a preset stripe shift amount and changing a moving direction of the substrate for each of the stripes, and writing while the reference point of the stripes in the each of the strokes in the width direction of the stripes is shifted by a preset stroke shift amount in each of the strokes.
    Type: Grant
    Filed: February 24, 2020
    Date of Patent: March 22, 2022
    Assignee: NuFlare Technology, Inc.
    Inventor: Hideki Matsui
  • Patent number: 11275001
    Abstract: An on-axis, angled, rotator device is disclosed. The rotator device may include a container containing a slot for receiving a sample. An angle of the slot may be configured to be between 0 and 180 degrees relative to a perpendicular irradiation plane of a radiation device. The rotator device may include a cup positioned within an opening of the container. Additionally, the rotator device may include a driveshaft configured to transmit torque to cause the cup to be rotated when the cup is positioned within the opening. When the sample resides within the slot and the driveshaft transmits the torque to the cup, the cup may cause the sample to rotate about a center axis of the sample. The angle of the slot containing the sample and the rotation of the sample about the center axis may facilitate uniform radiation exposure to the sample when the radiation device emits radiation.
    Type: Grant
    Filed: July 24, 2020
    Date of Patent: March 15, 2022
    Assignee: Rad Source Technologies, Inc.
    Inventors: Justin M. Czerniawski, Peter M. Mitchell
  • Patent number: 11239054
    Abstract: A multi-beam particle beam system includes a multi-aperture plate having a multiplicity of apertures. During operation, one particle beam of the plurality of particle beams passes through each of the apertures. A multiplicity of electrodes are insulated from the second multi-aperture plate to influence the particle beam passing through the aperture. A voltage supply system for the electrodes includes: a signal a generator to generate a serial sequence of digital signals; a D/A converter to convert the digital signals into a sequence of voltages between an output of the D/A converter and the multi-aperture plate; and a controllable changeover system, which feeds the sequence of voltages successively to different electrodes.
    Type: Grant
    Filed: November 16, 2020
    Date of Patent: February 1, 2022
    Assignee: Carl Zeiss MultiSEM GmbH
    Inventors: Yanko Sarov, Jan Horn, Ulrich Bihr, Christof Riedesel, Erik Essers
  • Patent number: 11191876
    Abstract: A coating for a medical device or appliance may include a fluoropolymer and a polyimide. Such coatings may provide a lubricious exterior surface that facilitates insertion or displacement of a medical device in a body lumen. Some coatings that include a fluoropolymer and a polyimide may, among other functions and characteristics, provide increased strength and/or durability relative to some other coatings.
    Type: Grant
    Filed: May 20, 2019
    Date of Patent: December 7, 2021
    Assignee: Merit Medical Systems, Inc.
    Inventors: William Paul McKee, Albert Hillen, Peter van der Wal
  • Patent number: 11166472
    Abstract: A devices (10) and method for pasteurizing and/or sterilizing particulate material. The device contain at least one electron source (20) for generating an electron beam and a treatment zone (19) in which the material is pasteurized and/or sterilized by the electron beam. The device (10) comprises a vibration surface (11) which vibrates to convey and individualize the material. The first vibration surface (11) has a plurality of grooves (12) into which the material is conveyed and individualized. The device (10) has a material channel (21) in which the material is pasteurized and/or sterilized by the electron beam in the region of the treatment zone (19). The device (10) has at least one auxiliary channel (22) through which a fluid flows, between the electron source (20) and the material channel (21), and is separated from the material channel (21). A cartridge (24) for pasteurizing and/or sterilizing particulate material is also disclosed.
    Type: Grant
    Filed: October 29, 2020
    Date of Patent: November 9, 2021
    Assignee: BÜHLER AG
    Inventors: Nicolas Meneses, Martin Hersche, Alasdair Currie, Niklaus Schönenberger, Thomas Scheiwiller
  • Patent number: 11145485
    Abstract: A multiple electron beam irradiation apparatus includes a shaping aperture array substrate to form multiple primary electron beams, a plurality of electrode array substrates stacked each to dispose thereon a plurality of electrodes each arranged at a passage position of each of the multiple primary electron beams, each of the multiple primary electron beams surrounded by an electrode of the plurality of electrodes when each of the multiple primary electron beams passes through the passage position, the first wiring and the second wiring applied with one of different electric potentials, and a stage to mount thereon a target object to be irradiated with the multiple primary electron beams having passed through the plurality of electrode array substrates, wherein, in each of the plurality of electrode array substrates, each of the plurality of electrodes is electrically connected to either one of the first wiring and the second wiring.
    Type: Grant
    Filed: December 23, 2019
    Date of Patent: October 12, 2021
    Assignees: NuFlare Technology, Inc., NuFlare Technology America, Inc.
    Inventors: Kazuhiko Inoue, Atsushi Ando, Munehiro Ogasawara, John Hartley
  • Patent number: 11145486
    Abstract: A beam profile determination method and ion implantation apparatus implanting the same is provided. The method includes measuring a beam profile of an ion beam in a direction orthogonal to a scanning direction of a substrate and a traveling direction of the ion beam; computing, based on the measured beam profile, a uniformity of a dose distribution of a part of the ion beam with which a surface of the substrate is irradiated when the substrate is scanned; and comparing the computed uniformity of the dose distribution with a first reference value to determine an adequacy of the beam profile of the ion beam.
    Type: Grant
    Filed: June 25, 2020
    Date of Patent: October 12, 2021
    Assignee: NISSIN ION EQUIPMENT CO., LTD.
    Inventor: Yutaka Inouchi
  • Patent number: 11127563
    Abstract: A method for scanning a sample by a charged particle beam tool is provided. The method includes providing the sample having a scanning area including a plurality of unit areas, scanning a unit area of the plurality of unit areas, blanking a next unit area of the plurality of unit areas adjacent to the scanned unit area, and performing the scanning and the blanking the plurality of unit areas until all of the unit areas are scanned.
    Type: Grant
    Filed: December 30, 2019
    Date of Patent: September 21, 2021
    Assignee: ASML Netherlands B.V.
    Inventors: Adam Lyons, Thomas I. Wallow
  • Patent number: 11054751
    Abstract: A method and apparatus to measure a target (e.g., an alignment mark (e.g., on a substrate)) is disclosed. Relative movement between the target and a measurement spot of a measurement system in a “fly-in” direction (e.g., movement of the target towards the measurement spot) is performed so that a first measurement for the target can be made. Thereafter, relative movement between the target and the measurement spot is made in an opposite “fly-in” direction so that a second measurement for the target can be made. By combining (e.g., averaging) these two measurements, an error is cancelled out, and higher accuracy in the measurement may be achieved.
    Type: Grant
    Filed: September 30, 2016
    Date of Patent: July 6, 2021
    Assignee: ASML Holding N.V.
    Inventors: Hong Ye, Gerrit Johannes Nijmeijer
  • Patent number: 11045664
    Abstract: A ridge filter 100 provided in a particle therapy system includes a repeating structure body 101 having a plurality of extending parts 101c extending along the incident direction P of a proton beam 204, and a bottom plate 102 provided on the lower face 101b side opposite to the incident side of the proton beam 204 of the repeating structure body 101. In addition, the repeating structure body 101 and the bottom plate 102 are integrally formed by a molding method, and each of the repeating structure body 101 and the bottom plate 102 is formed of a laminate of resin.
    Type: Grant
    Filed: November 28, 2017
    Date of Patent: June 29, 2021
    Assignee: HITACHI, LTD.
    Inventors: Satoshi Arai, Hiroaki Furuichi, Jun-ichi Hirai, Osamu Chiba, Tomoki Murata
  • Patent number: 11017978
    Abstract: An ion implanter having a beam park device on the way of a beamline through which an ion beam is transported toward a wafer is provided. The beam park device includes a pair of park electrodes which faces each other across the beamline, and a beam dump which is provided away from the beamline in a facing direction of the pair of park electrodes and on a downstream side of the pair of park electrodes in a beamline direction. At least one of the pair of park electrodes includes a plurality of electrode bodies which are disposed to be spaced apart from each other in a predetermined direction perpendicular to both a direction in which the beamline extends and the facing direction, and each of the plurality of electrode bodies extends from an upstream side toward the downstream side in the beamline direction.
    Type: Grant
    Filed: November 12, 2019
    Date of Patent: May 25, 2021
    Assignee: SUMITOMO HEAVY INDUSTRIES ION TECHNOLOGY CO., LTD.
    Inventor: Takanori Yagita
  • Patent number: 10960231
    Abstract: A radiation therapy system includes an accelerator and beam transport system that generates a beam of particles. The accelerator and beam transport system guides the beam on a path and into a nozzle that is operable for aiming the beam toward an object. The nozzle includes a scanning magnet operable for steering the beam toward different locations within the object, and also includes a beam energy adjuster configured to adjust the beam by, for example, placing different thicknesses of material in the path of the beam to affect the energies of the particles in the beam.
    Type: Grant
    Filed: May 2, 2019
    Date of Patent: March 30, 2021
    Assignee: Varian Medical Systems, Inc.
    Inventor: Stanley Mansfield
  • Patent number: 10912180
    Abstract: The present disclosure relates to an X-ray source apparatus and a control method of the X-ray source apparatus in which a cathode electrode and a gate electrode are arranged in an array form to enable matrix control, and, thus, it is possible to irradiate X-rays at an optimum dose for each position on the subject. Therefore, it is possible to suppress the irradiation of more X-rays than are needed to the subject. Also, it is possible to obtain a high-resolution and high-quality X-ray image. As such, two-dimensional matrix control makes it easy to control the dose of X-rays and makes it possible to uniformly irradiate X-rays to the subject. Therefore, it is possible to manufacture a high-resolution surface X-ray source with less dependence on the size of the focus of electron beams.
    Type: Grant
    Filed: April 1, 2019
    Date of Patent: February 2, 2021
    Assignee: KOREA UNIVERSITY RESEARCH AND BUSINESS FOUNDATION
    Inventors: Cheol Jin Lee, Sang Heon Lee, Jun Soo Han, Han Bin Go
  • Patent number: 10880982
    Abstract: A light generation system is provided. The light generation system includes a vaporization device, a laser device and a lens structure. The vaporization device is configured to vaporize a metal-nonmetal compound to generate a metal-nonmetal precursor gas. The laser device is configured to provide laser light, and irradiate the metal-nonmetal precursor gas released from the vaporization device with the laser light to emit a light signal. The lens structure is configured to direct the light signal toward a photomask used in a lithography process.
    Type: Grant
    Filed: June 12, 2019
    Date of Patent: December 29, 2020
    Assignee: TAIWAN SEMICONDUCTOR MANUFACTURING COMPANY LTD.
    Inventors: Ching-Hsiang Hsu, Feng Yuan Hsu, Hsu-Kai Chang, Chi-Ming Yang
  • Patent number: 10867774
    Abstract: In one embodiment, a multi charged particle beam writing apparatus includes a plurality of reflective marks disposed on a stage, an inspection aperture member configured to allow one beam to pass therethrough, a first detector detecting a beam current of a beam passed through the inspection aperture member, a second detector detecting charged particles reflected from the reflective marks, a first beam shape calculator generating a beam image based on the beam currents detected by the first detector and calculating a reference beam shape, and a second beam shape calculator calculating a beam shape based on changes in intensity of the reflected charged particles and a position of the stage. The reference beam shape is calculated before writing. During writing, the beam shape based on reflected charged particles is calculated, and variation of the beam shape is added to the reference beam shape.
    Type: Grant
    Filed: July 23, 2018
    Date of Patent: December 15, 2020
    Assignee: NuFlare Technology, Inc.
    Inventor: Osamu Iizuka
  • Patent number: 10849333
    Abstract: Devices (10) and methods for pasteurizing and/or sterilizing particulate material. The devices contain at least one electron source (20) for generating an electron beam and a treatment zone (19) in which the material is pasteurized and/or sterilized by the electron beam. The device (10) comprises a vibration surface (11) which vibrates to convey and individualize the material. The first vibration surface (11) has a plurality of grooves (12) into which the material is conveyed and individualized. The device (10) has a good channel (21) in which the material is pasteurized and/or sterilized by the electron beam in the region of the treatment zone (19). The device (10) has at least one auxiliary channel (22) through which a fluid flows between the electron source (20) and the good channel (21) and is separated from the good channel (21). A cartridge (24), for pasteurizing and/or sterilizing particulate material, is also disclosed.
    Type: Grant
    Filed: August 17, 2017
    Date of Patent: December 1, 2020
    Assignee: BUEHLER AG
    Inventors: Nicolas Meneses, Martin Hersche, Alasdair Currie, Niklaus Schönenberger, Thomas Scheiwiller
  • Patent number: 10832827
    Abstract: Disclosed is a system for irradiating a target. The system includes a particle accelerator configured to at least emit an irradiation beam along an axis, a target-holder mounting outside the accelerator, a radiation-protection enclosure surrounding the target-holder mounting, and a deflection device. The particle accelerator is positioned outside the enclosure. The target-holder mounting includes at least one port configured to receive a target holder for a target to be irradiated. The target-holder mounting is stationary relative to the particle accelerator. The port is offset relative to the axis of the irradiation beam. The deflection device is positioned in the radiation-protection enclosure and is configured to divert the irradiation beam towards the port of the target holder in which the target to be irradiated is inserted.
    Type: Grant
    Filed: March 24, 2016
    Date of Patent: November 10, 2020
    Assignee: P M B
    Inventors: Nicolas Masse, Nancy Tannoury, Alain Perez Delaume
  • Patent number: 10825646
    Abstract: A positioning system can include a guide, a carrier element configured to engage and convey a workpiece, a motor having a mover element, a restraint coupled to the carrier element, and an actuator disposed between the restraint and the carrier element. The guide can be movable relative to a horizontal reference plane such that the carrier element coupled to the guide is inclined with respect to the horizontal reference plane. At least the mover element of the motor can be coupled to the carrier element and can be configured to move the carrier element along the guide. The restraint can be configured to selectively engage the guide to restrain movement of the carrier element in at least one direction along the guide when the guide is inclined out of the horizontal reference plane. The actuator can be configured to displace the carrier element relative to the restraint along the guide when the restraint is engaged with the guide.
    Type: Grant
    Filed: March 28, 2019
    Date of Patent: November 3, 2020
    Assignee: FEI Company
    Inventor: Graham LeGrove
  • Patent number: 10796875
    Abstract: One or more pellicles protect a cathode, the pellicles comprised of a thin layer of material that allows electrons to pass while preventing contamination of the cathode from elements originating beyond the pellicle or contamination of an outside apparatus from elements originating on or near the cathode. The pellicle can be supported by an insulator, the insulator in turn supported by a deflecting layer. The pellicle can be maintained at a positive voltage relative to the cathode, such that a voltage gradient is created between the cathode and the pellicle that accelerates electrons emitted by the cathode away from the cathode. The pellicle is located at an appropriate distance from the cathode to allow electron transmission matching the energy of the electrons at that distance.
    Type: Grant
    Filed: January 22, 2020
    Date of Patent: October 6, 2020
    Inventor: John Bennett
  • Patent number: 10784077
    Abstract: Systems and methods for implementing charged particle flooding in a charged particle beam apparatus are disclosed. According to certain embodiments, a charged particle beam system includes a charged particle source and a controller which controls the charged particle beam system to emit a charged particle beam in a first mode where the beam is defocused and a second mode where the beam is focused on a surface of a sample.
    Type: Grant
    Filed: August 2, 2018
    Date of Patent: September 22, 2020
    Assignee: ASML Netherlands B.V.
    Inventors: Frank Nan Zhang, Zhongwei Chen, Yixiang Wang, Ying Crystal Shen
  • Patent number: 10770262
    Abstract: A scanning electron microscope (SEM) system includes an SEM objective that emits an electron beam toward a sample, causing emission of charged particles including secondary electrons, Auger electrons, backscattered electrons, anions and cations. The SEM system includes electron optics elements that are configured to establish electric fields around the sample that accelerate charged particles toward a detector. A two-dimensional distribution of locations of incidence of the charged particles on the detector is indicative of energies of the charged particles and their emission angles from the sample. A three-dimensional spatial distribution of charged particles emitted from the sample is recovered by performing an Abel transform over the distribution on the detector. The energies and emission angles of the charged particles are then determined from the three-dimensional spatial distribution.
    Type: Grant
    Filed: November 21, 2018
    Date of Patent: September 8, 2020
    Assignee: National Technology & Engineering Solutions of Sandia, LLC
    Inventors: David W. Chandler, Kimberlee Chiyoko Celio
  • Patent number: 10755893
    Abstract: A charged particle beam writing method includes acquiring the deviation amount of the deflection position per unit tracking deflection amount with respect to each tracking coefficient of a plurality of tracking coefficients having been set for adjusting the tracking amount to shift the deflection position of a charged particle beam on the writing target substrate in order to follow movement of the stage on which the writing target substrate is placed, extracting a tracking coefficient based on which the deviation amount of the deflection position per the unit tracking deflection amount is closest to zero among the plurality of tracking coefficients, and writing a pattern on the writing target substrate with the charged particle beam while performing tracking control in which the tracking amount has been adjusted using the tracking coefficient extracted.
    Type: Grant
    Filed: January 29, 2019
    Date of Patent: August 25, 2020
    Assignee: NuFlare Technology, Inc.
    Inventors: Rieko Nishimura, Takahito Nakayama
  • Patent number: 10747012
    Abstract: A method of depositing a variable thickness material includes providing a substrate and providing a shadow mask having a first region with a first aperture dimension to aperture periodicity ratio and a second region with a second aperture dimension to aperture periodicity ratio less than the first aperture dimension to aperture periodicity ratio. The method also includes positioning the shadow mask adjacent the substrate and performing a plasma deposition process on the substrate to deposit the variable thickness material. A layer thickness adjacent the first region is greater than a layer thickness adjacent the second region.
    Type: Grant
    Filed: December 5, 2019
    Date of Patent: August 18, 2020
    Assignee: Magic Leap, Inc.
    Inventors: Shuqiang Yang, Vikramjit Singh, Kang Luo, Nai-Wen Pi, Frank Y. Xu
  • Patent number: 10714311
    Abstract: An individual beam detector for multiple beams includes a thin film in which a passage hole smaller than a pitch between beams of multiple beams and larger than the diameter of a beam is formed and through which the multiple beams can penetrate, a support base to support the thin film in which an opening is formed under the region including the passage hole, and the width size of the opening is formed to have a temperature of the periphery of the passage hole higher than an evaporation temperature of impurities adhering to the periphery in the case that the thin film is irradiated with the multiple beams, and a sensor arranged, at the position away from the thin film by a distance based on which a detection target beam having passed the passage hole can be detected by the sensor as a detection value with contrast discernible.
    Type: Grant
    Filed: November 2, 2018
    Date of Patent: July 14, 2020
    Assignees: NuFlare Technology, Inc., NuFlare Technology America, Inc.
    Inventors: Yoshikuni Goshima, Victor Katsap, Rodney Kendall
  • Patent number: 10663746
    Abstract: According to various embodiments, a collimator includes a substrate defining a plurality of channels through the substrate. The substrate includes a first surface and a second surface opposite the first surface. Each of the channels includes a first aperture exposed from the first surface, a second aperture between the first surface and the second surface, and a third aperture exposed from the second surface. The first aperture and the third aperture are larger than the second aperture.
    Type: Grant
    Filed: November 9, 2016
    Date of Patent: May 26, 2020
    Assignee: ADVANCED SEMICONDUCTOR ENGINEERING, INC.
    Inventors: Yuan-Feng Chiang, Tsung-Tang Tsai, Min Lung Huang
  • Patent number: 10566168
    Abstract: One or more pellicles protect a cathode, the pellicles comprised of a thin layer of material that allows electrons to pass while preventing contamination of the cathode from elements originating beyond the pellicle or contamination of an outside apparatus from elements originating on or near the cathode. The pellicle can be supported by an insulator, the insulator in turn supported by a deflecting layer. The pellicle can be maintained at a positive voltage relative to the cathode, such that a voltage gradient is created between the cathode and the pellicle that accelerates electrons emitted by the cathode away from the cathode. The pellicle is located at an appropriate distance from the cathode to allow electron transmission matching the energy of the electrons at that distance.
    Type: Grant
    Filed: August 10, 2018
    Date of Patent: February 18, 2020
    Inventor: John Bennett
  • Patent number: 10553395
    Abstract: An ion beam irradiation device is provided and including: a substrate holder that holds a substrate; a rotating mechanism that rotates the substrate holder about a center portion of the substrate being held; a reciprocating mechanism that reciprocates the substrate holder and the rotating mechanism in the moving direction; an ion beam irradiator that irradiates the substrate with an ion beam; and a control device that controls the rotating mechanism and the reciprocating mechanism. The ion beam has a center region where the beam current density is a predetermined value or more in the moving direction, and a peripheral region where the beam current density is less than the predetermined value, a center region size in the direction orthogonal to the moving direction is larger than a substrate size in the direction orthogonal to the moving direction.
    Type: Grant
    Filed: April 21, 2017
    Date of Patent: February 4, 2020
    Assignee: NISSIN ELECTRIC CO., LTD.
    Inventor: Hiroshi Inami
  • Patent number: 10535522
    Abstract: Provided herein are techniques for treating vertical surface features of a semiconductor device with ions. In some embodiments, a method for forming a semiconductor device, may include providing a set of surface features extending from a substrate, the set of surface features including a sidewall. The method may include treating the sidewall with an ion beam disposed at an angle, the angle being a non-zero angle of inclination with respect to a perpendicular to a plane of an upper surface of the substrate. The method may further include rotating the substrate about the perpendicular to the plane while the sidewall is treated with the ion beam to impact an entire height of the sidewall with the ion beam.
    Type: Grant
    Filed: August 21, 2018
    Date of Patent: January 14, 2020
    Assignee: VARIAN SEMICONDUCTOR EQUIPMENT ASSOCIATES, INC.
    Inventors: Gang Shu, Glen Gilchrist, Shurong Liang
  • Patent number: 10533195
    Abstract: Biomass (e.g., plant biomass, animal biomass, and municipal waste biomass) is processed to produce useful products, such as fuels. For example, systems can use feedstock materials, such as cellulosic and/or lignocellulosic materials and/or starchy or sugary materials, to produce ethanol and/or butanol, e.g., by fermentation.
    Type: Grant
    Filed: November 30, 2018
    Date of Patent: January 14, 2020
    Assignee: Xyleco, Inc.
    Inventor: Marshall Medoff
  • Patent number: 10510510
    Abstract: Methods and systems are described for processing cellulosic and lignocellulosic materials and useful intermediates and products, such as energy and fuels. For example, irradiating methods and systems are described to aid in the processing of the cellulosic and lignocellulosic materials. The electron beam accelerator has multiple windows foils and these foils are cooled with cooling gas. In one configuration a secondary foil is integral to the electron beam accelerator and in another configuration the secondary foil is part of the enclosure for the biomass conveying system.
    Type: Grant
    Filed: April 13, 2017
    Date of Patent: December 17, 2019
    Assignee: Xyleco, Inc.
    Inventors: Marshall Medoff, Anthony Peters, Thomas Craig Masterman, Robert Paradis, Kenny Kin-Chui Ip
  • Patent number: 10504681
    Abstract: A particle-optical arrangement comprises a charged-particle source for generating a beam of charged particles; a multi-aperture plate arranged in a beam path of the beam of charged particles, wherein the multi-aperture plate has a plurality of apertures formed therein in a predetermined first array pattern, wherein a plurality of charged-particle beamlets is formed from the beam of charged particles downstream of the multi-aperture plate, and wherein a plurality of beam spots is formed in an image plane of the apparatus by the plurality of beamlets, the plurality of beam spots being arranged in a second array pattern; and a particle-optical element for manipulating the beam of charged particles and/or the plurality of beamlets; wherein the first array pattern has a first pattern regularity in a first direction, and the second array pattern has a second pattern regularity in a second direction electron-optically corresponding to the first direction, and wherein the second regularity is higher than the first re
    Type: Grant
    Filed: May 30, 2017
    Date of Patent: December 10, 2019
    Assignees: CARL ZEISS MICROSCOPY GMBH, APPLIED MATERIALS ISRAEL LTD.
    Inventors: Rainer Knippelmeyer, Oliver Kienzle, Thomas Kemen, Heiko Mueller, Stephan Uhlemann, Maximilian Haider, Antonio Casares, Steven Rogers
  • Patent number: 10497536
    Abstract: A multi-beam scanning electron microscopy (SEM) system is disclosed. The system includes an electron beam source configured to generate a source electron beam. The system includes a set of electron-optical elements configured to generate a flood electron beam from the source electron beam. The system includes a multi-beam lens array with a plurality of electron-optical pathways configured to split the flood electron beam into a plurality of primary electron beams, and a plurality of electrically-charged array layers configured to adjust at least some of the plurality of primary electron beams. The system includes a set of electron-optical elements configured to direct at least some of the plurality of primary electron beams onto a surface of a sample secured by a stage. The system includes a detector array configured to detect a plurality of electrons emanated from the surface of the sample in response to the plurality of primary electron beams.
    Type: Grant
    Filed: July 10, 2017
    Date of Patent: December 3, 2019
    Assignee: Rockwell Collins, Inc.
    Inventor: Alan D. Brodie
  • Patent number: 10483086
    Abstract: An ion implantation system and method are provided where an ion beam is tuned to a first process recipe. The ion beam is scanned along a scan plane at a first frequency, defining a first scanned ion beam. A beam profiling apparatus is translated through the first scanned ion beam and one or more properties of the first scanned ion beam are measured across a width of the first scanned ion, thus defining a first beam profile associated with the first scanned ion beam. The ion beam is then scanned at a second frequency, thus defining a second scanned ion beam, wherein the second frequency is less than the first frequency. A second beam profile associated with the second scanned ion beam is determined based, at least in part, on the first beam profile. Ions are subsequently implanted into a workpiece via the second scanned ion beam.
    Type: Grant
    Filed: December 22, 2015
    Date of Patent: November 19, 2019
    Assignee: Axcelis Technologies, Inc.
    Inventors: Andy M. Ray, Edward C. Eisner, Bo H. Vanderberg
  • Patent number: 10468222
    Abstract: In the present invention, a computed tomography system, an X-ray tube used therein and a cathode assembly disposed in the X-ray tube, as well as an associated method of use, is provided that includes a gantry and the X-ray tube coupled to the gantry. The X-ray tube includes the cathode assembly having a pair of emitters for generating an electron beam, where the pair of emitters are disposed in the casing at angles with respect to one another. The X-ray tube further includes a focusing electrode for focusing the electron beam, an extraction electrode which electrostatically controls the intensity of the electron beam, a target for generating X-rays when impinged upon by the electron beam and a magnetic focusing assembly located between the cathode assembly and the target for focusing the electron beam towards the target.
    Type: Grant
    Filed: March 31, 2016
    Date of Patent: November 5, 2019
    Assignee: General Electric Company
    Inventor: Sergio Lemaitre
  • Patent number: 10456591
    Abstract: An example particle therapy system includes: a synchrocyclotron to output a particle beam; a magnet to affect a direction of the particle beam to scan the particle beam across at least part of an irradiation target; scattering material that is configurable to change a spot size of the particle beam, where the scattering material is down-beam of the magnet relative to the synchrocyclotron; and a degrader to change an energy of the beam prior to output of the particle beam to the irradiation target, where the degrader is down-beam of the scattering material relative to the synchrocyclotron.
    Type: Grant
    Filed: October 27, 2017
    Date of Patent: October 29, 2019
    Assignee: Mevion Medical Systems, Inc.
    Inventors: Gerrit Townsend Zwart, James Cooley, Ken Yoshiki Franzen, Mark R. Jones, Tao Li, Michael Busky
  • Patent number: 10460908
    Abstract: A multiple charged particle beam writing apparatus includes a circuitry to calculate, for each of the plurality of combinations, a first distribution coefficient for each of the three beams configuring the combination concerned, for distributing a dose to irradiate the design grid concerned to the three beams such that the gravity center position of each distributed dose coincides with the position of the design grid concerned and the sum of the each distributed dose coincides with the dose to irradiate the design grid concerned; and a circuitry to calculate, for each of the four or more beams, a second distribution coefficient of each of the four or more beams relating to the design grid concerned by dividing the total value of at least one first distribution coefficient corresponding to the beam concerned in the four or more beams by the number of the plurality of combinations.
    Type: Grant
    Filed: August 1, 2018
    Date of Patent: October 29, 2019
    Assignee: NuFlare Technology, Inc.
    Inventor: Hiroshi Matsumoto
  • Patent number: 10440810
    Abstract: A system that generates short charged particle packets or pulses (e.g., electron packets) without requiring a fast-switching-laser source is described. This system may include a charged particle source that produces a stream of continuous charged particles to propagate along a charged particle path. The system also includes a charged particle deflector positioned in the charged particle path to deflect the stream of continuous charged particles to a set of directions different from the charged particle path. The system additionally includes a series of beam blockers located downstream from the charged particle deflector and spaced from one another in a linear configuration as a beam-blocker grating. This beam-blocker grating can interact with the deflected stream of charged particles and divide the stream of the charged particles into a set of short particle packets. In one embodiment, the charged particles are electrons. The beam blockers can be conductors.
    Type: Grant
    Filed: January 8, 2018
    Date of Patent: October 8, 2019
    Assignee: Cornell University
    Inventors: Amit Lal, Yue Shi, Serhan Ardanuc, June-Ho Hwang, Farhan Rana
  • Patent number: 10431421
    Abstract: An apparatus for monitoring of an ion beam. The apparatus may include a processor; and a memory unit coupled to the processor, including a display routine, where the display routine operative on the processor to manage monitoring of the ion beam. The display routine may include a measurement processor to receive a plurality of spot beam profiles of the ion beam, the spot beam profiles collected during a fast scan of the ion beam and a slow mechanical scan of a detector, conducted simultaneously with the fast scan. The fast scan may comprise a plurality of scan cycles having a frequency of 10 Hz or greater along a fast scan direction, and the slow mechanical scan being performed in a direction parallel to the fast scan direction. The measurement processor may also send a display signal to display at least one set of information, derived from the plurality of spot beam profiles.
    Type: Grant
    Filed: November 3, 2017
    Date of Patent: October 1, 2019
    Assignee: VARIAN SEMICONDUCTOR EQUIPMENT ASSOCIATES, INC
    Inventors: Eric D. Wilson, George M. Gammel, Sruthi Chennadi, Daniel Tieger, Shane Conley
  • Patent number: 10410896
    Abstract: A device for determining alignment errors of structures which are present on, or which have been applied to a substrate, comprising a substrate holder for accommodating the substrate with the structures and detection means for detecting X-Y positions of first markings on the substrate and/or second markings on the structures by moving the substrate or the detection means in a first coordinate system, wherein in a second coordinate system which is independent of the first coordinate system X?-Y? structure positions for the structures are given whose respective distance from the X-Y positions of the first markings and/or second markings can be determined by the device.
    Type: Grant
    Filed: October 4, 2018
    Date of Patent: September 10, 2019
    Assignee: EV Group E. Thallner GmbH
    Inventor: Thomas Wagenleitner
  • Patent number: 10395889
    Abstract: A system and method for controlling an ion implantation system as a function of sampling ion beam current and uniformity thereof. The ion implantation system includes a plurality of ion beam optical elements configured to selectively steer and/or shape the ion beam as it is transported toward a workpiece, wherein the ion beam is sampled at a high frequency to provide a plurality of ion beam current samples, which are then analyzed to detect fluctuations and/or nonuniformities or unpredicted variations amongst the plurality of ion beam current samples. Beam current samples are compared against predetermined threshold levels, and/or predicted nonuniformity levels to generate a control signal when a detected nonuniformity in the plurality of ion beam current density samples exceeds a predetermined threshold.
    Type: Grant
    Filed: September 7, 2016
    Date of Patent: August 27, 2019
    Assignee: Axcelis Technologies, Inc.
    Inventor: Alfred Mike Halling
  • Patent number: 10395883
    Abstract: Lithographic apparatuses suitable for complementary e-beam lithography (CEBL) are described. In an example, a blanker aperture array (BAA) for an e-beam tool includes a first column of openings along a first direction and having a pitch. Each opening of the first column of openings has a dimension in the first direction. The BAA also includes a second column of openings along the first direction and staggered from the first column of openings. The second column of openings has the pitch. Each opening of the second column of openings has the dimension in the first direction. A scan direction of the BAA is along a second direction orthogonal to the first direction. The openings of the first column of openings overlap with the openings of the second column of openings by at least 5% but less than 50% of the dimension in the first direction when scanned along the second direction.
    Type: Grant
    Filed: March 31, 2016
    Date of Patent: August 27, 2019
    Assignee: Intel Corporation
    Inventors: Shakul Tandon, Mark C. Phillips, Gabriele Canzi
  • Patent number: 10362666
    Abstract: The invention provides a method for accelerating protons and carbon ions up to 450 MeV/u in a very compact linac, the method comprising subjecting the particles to a radio frequency quadrupole field to accelerate the particles to at least 3 MeV/u, a drift tube linac (DTL) to an energy of 20 MeV/u, followed by a coupled DTL to 45 MeV/u and finally a high-gradient section made of CCL-type standing wave cavities or negative harmonic traveling wave cavities operating at S-band frequencies and capable of delivering voltage gradients of 40 to 60 MV/m. Focusing the accelerated particles while accelerated to higher energy is provided by appropriately placed constant field permanent magnets and electromagnetic quadrupoles. The compactness and power efficiency of the linac is enabled by using high-gradient structure in the S-band frequencies for lower energy particles than ever before.
    Type: Grant
    Filed: September 22, 2017
    Date of Patent: July 23, 2019
    Assignee: UCHICAGO ARGONNE, LLC
    Inventors: Brahim Mustapha, Alireza Nassiri, Peter N. Ostroumov, Alexander S. Plastun, Aditya Goel
  • Patent number: 10340120
    Abstract: In one embodiment, a blanking aperture array is for a multi-charged particle beam writing apparatus. The blanking aperture array includes a substrate and a plurality of blankers. Each of the plurality of blankers includes a blanking electrode and a ground electrode that are formed on a first surface of the substrate. The plurality of blankers includes at least a normal blanker which is capable of applying a predetermined voltage between the blanking electrode and the ground electrode and for which a through hole bored through the substrate is formed, and a defective blanker which is not capable of applying the predetermined voltage between the blanking electrode and the ground electrode and for which the through hole bored through the substrate is filled with a beam shield.
    Type: Grant
    Filed: July 5, 2017
    Date of Patent: July 2, 2019
    Assignee: NuFlare Technology, Inc.
    Inventor: Takao Tamura
  • Patent number: 10330904
    Abstract: A compact microscope including an enclosure, a support element, a primary optical support element located within the enclosure and supported by the support element, at least one vibration isolating mount between the support element and the primary optical support element, an illumination section, an objective lens system, a sample stage mounted on the primary optical support element, an illumination optical system to direct an illumination light beam from the illumination section to the sample stage, and a return optical system to receive returned light from sample stage and transmit returned light to a detection apparatus, wherein the illumination optical system and return optical system are mounted on the primary optical support element.
    Type: Grant
    Filed: October 27, 2014
    Date of Patent: June 25, 2019
    Assignee: Oxford University Innovation Limited
    Inventors: Achillefs Kapanidis, Bo Jing, Robert Crawford
  • Patent number: 10325757
    Abstract: In a charged-particle multi-beam writing method a desired pattern is written on a target using a beam of energetic electrically charged particles, by imaging apertures of a pattern definition device onto the target, as a pattern image which is moved over the target. Thus, exposure stripes are formed which cover the region to be exposed in sequential exposures, and the exposure stripes are mutually overlapping, such that each area of said region is exposed by at least two different areas of the pattern image at different transversal offsets (Y1). For each pixel, a corrected dose amount is calculated by dividing the value of the nominal dose amount by a correction factor (q), wherein the same correction factor (q) is used with pixels located at positions which differ only by said transversal offsets (Y1) of overlapping stripes.
    Type: Grant
    Filed: January 25, 2018
    Date of Patent: June 18, 2019
    Assignee: IMS Nanofabrication GmbH
    Inventors: Elmar Platzgummer, Christoph Spengler, Hanns Peter Petsch
  • Patent number: 10307618
    Abstract: A radiation therapy system includes an accelerator and beam transport system that generates a beam of particles. The accelerator and beam transport system guides the beam on a path and into a nozzle that is operable for aiming the beam toward an object. The nozzle includes a scanning magnet operable for steering the beam toward different locations within the object, and also includes a beam energy adjuster configured to adjust the beam by, for example, placing different thicknesses of material in the path of the beam to affect the energies of the particles in the beam.
    Type: Grant
    Filed: December 21, 2017
    Date of Patent: June 4, 2019
    Assignee: Varian Medical Systems, Inc.
    Inventor: Stanley Mansfield
  • Patent number: 10292790
    Abstract: Techniques and methods for utilizing ion implantation to modify dental archwires are provided. An example of a method of ion implanting a wire target includes providing the wire target in an ion implant system, implanting ions into the wire target such that a color of the wire target material after the implanting exhibits a changed appearance from the color of the wire target material before the implanting, and removing the wire target from the ion implant system. An example of a copper-aluminum-nickel (CuAlNi) wire includes an ion implanted atomic species wherein a color of an implanted CuAlNi wire is white, off-white and/or silver and further wherein the implanted CuAlNi wire exhibits mechanical properties of an unimplanted CuAlNi wire.
    Type: Grant
    Filed: December 27, 2016
    Date of Patent: May 21, 2019
    Assignee: N2 Biomedical LLC
    Inventor: Nader M. Kalkhoran
  • Patent number: 10290463
    Abstract: A particle beam device including a magnet, the device including: a particle beam source configured to emit electron and ion beams; a plurality of yokes arranged in a substantially rectangular shape; a coil set including a plurality of coils, wherein windings of the plurality of coils are uniformly distributed across and wound around the plurality of yokes, wherein the coil set is configured to produce both dipole and quadrupole fields, wherein the magnet is configured to deflect and focus electron and ion beams.
    Type: Grant
    Filed: June 16, 2017
    Date of Patent: May 14, 2019
    Assignee: IMATREX, INC.
    Inventors: Roy E. Rand, Vitaliy Ziskin
  • Patent number: 10283314
    Abstract: A charged particle beam writing apparatus includes a number of shots calculation circuit to calculate the number of shots in the case where a deflection region is irradiated with a shot of a charged particle beam, a deflection position correcting circuit to correct a deflection position of the charged particle beam to be shot in the deflection region, depending on the number of shots to be shot in the deflection region, and a deflector to deflect the charged particle beam to a corrected deflected position on the target object.
    Type: Grant
    Filed: October 20, 2017
    Date of Patent: May 7, 2019
    Assignee: NUFLARE TECHNOLOGY, INC.
    Inventor: Rieko Nishimura