Abstract: The present invention maintains a stable emission amount from an emitter. In an embodiment of the present invention, a solid sample or a liquid sample is heated to gasify an object to be measured contained in the solid sample or the liquid sample, thereby forming a neutral gaseous molecule, and a metal ion emitted from an emitter having an oxidized surface is attached to the neutral gaseous molecule to ionize the neutral gaseous molecule, which is subjected to mass spectrometry. The solid sample or the liquid sample is a sample that emits a reducing gas by heating. The heating for gasifying the object to be measured is performed at a temperature lower than the vaporization temperature of the solid sample or the liquid sample and not less than the vaporization temperature of the object to be measured, and an oxidizing gas is provided to the emitter.

Abstract: This invention relates to a desorption/ionization source operated under ambient conditions for direct analysis of solid or liquid samples on a surface. The source comprises of a laser desorption system and a UV/electrospray combined ionization system. The source is suitable for simultaneously ionizing samples with different polarity in a complex mixture. At the same time, the compact design of the source with multiple channels can maintain the level of local concentration of the analyte ions inside the source for higher efficiency of sample ionization and introduction.

Abstract: An EUV light source apparatus can reliably detect and accurately judge deterioration of an optical element in a laser beam focusing optics disposed within an EUV light generation chamber. This EUV light source apparatus includes: the EUV light generation chamber; a target material supply unit; an EUV light collector mirror; a driver laser; a window; a parabolic mirror which focuses collimated laser beam by reflection and is disposed within the EUV light generation chamber; an energy detector detecting energy of the laser beam diffused without being applied to a target material after being focused by the laser beam focusing optics when the EUV light is not generated; and a processing unit for judging the deterioration of the window and the parabolic mirror according to the laser beam energy detected by the energy detector.

Abstract: The invention concerns an electrospray source having a structure comprising at least one flat and thin tip (3) in cantilever in relation to the rest (1) of the structure, the tip (3) being provided with a capillary slot (5) formed through the complete thickness of the tip and which ends up at the end (6) of the tip (3) to form an ejection orifice of the electrospray source, the source comprising means of supplying (4) the capillary slot (5) with liquid to be nebulised and means of applying an electrospray voltage to the liquid. The invention further concerns a method of manufacturing said electrospray source.

Abstract: An aerosol particle analyzer includes a laser ablation chamber, a gas-filled conduit, and a mass spectrometer. The laser ablation chamber can be operated at a low pressure, which can be from 0.1 mTorr to 30 mTorr. The ablated ions are transferred into a gas-filled conduit. The gas-filled conduit reduces the electrical charge and the speed of ablated ions as they collide and mix with buffer gases in the gas-filled conduit. Preferably, the gas filled-conduit includes an electromagnetic multipole structure that collimates the nascent ions into a beam, which is guided into the mass spectrometer. Because the gas-filled conduit allows storage of vast quantities of the ions from the ablated particles, the ions from a single ablated particle can be analyzed multiple times and by a variety of techniques to supply statistically meaningful analysis of composition and isotope ratios.

Abstract: An ion withdrawal apparatus that withdraws ions emitted from a plasma in an EUV light production apparatus in which a target at an EUV light production point is irradiated with laser light to be made in a plasma state and the target emits EUV light, the ion withdrawal apparatus which includes: a collector mirror that is disposed in a direction opposite to a laser light incidence direction to collect the EUV light and has a hole for the ions to pass therethrough; magnetic line of force production means that produces a magnetic line of force that is parallel or approximately parallel to the laser light incidence direction at or in the vicinity of the EUV light production point; and ion withdrawal means that is disposed on the opposite side of the collector mirror from the EUV light production point and withdraws the ions.

Abstract: A method for preparing an ion source from nanoparticles is provided. The method includes the steps of: providing nanoparticles, vaporizing the nanoparticles from a solid state to a gaseous state, and ionizing the gas to form the ion source. The ion source is prepared by placing solid nanoparticles in a stainless tube, heating and vaporizing the solid nanoparticles into a gaseous state, and ionizing the gas. The gas can be formed at a lower heating temperature than when solid lumps are used because solid nanoparticles have a lower melting point than solid lumps. Thus, the heating temperature is lowered, and the preparing time of the ion source is shortened. Besides, under the same temperature, an ion source prepared from nanoparticles provides higher vapor pressure and allows a higher implantation dose than when the ion source is prepared from solid lumps, thus expanding the applicability of ion implantation technology.

Abstract: In a device for mass spectrometry, an analyte contained in a sample is desorbed from a surface of the device by irradiating the sample in contact with the surface with measurement light. The device includes a micro-structure having a plurality of metal bodies on a surface of a substrate, and the plurality of metal bodies have sizes that can excite localized plasmons by irradiation with the measurement light. Further, the device includes an initiator fixed at least to a part of a surface of the micro-structure.

Abstract: An ion source includes a plasma generating chamber into which an ionization gas containing fluorine is introduced, a hot cathode provided on one side in the plasma generating chamber, an opposing reflecting electrode which is provided on other side in the plasma generating chamber and reflects electrons when a negative voltage is applied from a bias power supply to the opposing reflecting electrode, and a magnet for generating a magnetic field along a line, which connects the hot cathode and the opposing reflecting electrode, in the plasma generating chamber. The opposing reflecting electrode is formed of an aluminum containing material.

Abstract: The current invention involves a desorption corona beam ionization source/device for analyzing samples under atmospheric pressure without sample pretreatment. It includes a gas source, a gas flow tube, a gas flow heater, a metal tube, a DC power supply and a sample support/holder for placing the samples. A visible corona beam is formed at a sharply pointed tip at the exit of the metal tube when a stream of inert gas flows through the metal tube that is applied with a high DC voltage. The gas is heated for desorbing the analyte from solid samples and the desorbed species are ionized by the energized particles embedded in the corona beam. The ions formed are then transferred through an adjacent inlet into a mass spectrometer or other devices capable of analyzing ions. Visibility of the corona beam in the current invention greatly facilitates pinpointing a sampling area on the analyte and also makes profiling of sample surfaces possible.

Abstract: An electrospray ion source comprises a source of analyte-bearing liquid; a source of sheath gas; a plurality of liquid conduits, each configured so as to receive a portion of the analyte-bearing liquid; at least one electrode associated with the plurality of liquid conduits for producing electrospray emission of charged droplets from an outlet of each of the liquid conduits; a power supply electrically coupled to the at least one electrode for maintaining the at least one electrodes at an electrical potential; and either one or a plurality of sheath gas conduits, each sheath gas conduit comprising an inlet configured to receive sheath gas and an outlet configured to emit a sheath gas flow that circumferentially surrounds, in at least two dimensions, a portion of the emitted charged droplets.

Abstract: An electrospray ion source apparatus comprises: a plurality of emitter capillaries, each comprising an internal bore for transporting a portion of a liquid sample from a source, an electrode portion for providing a first applied electric potential and an emitter tip for emitting charged particles generated from the liquid sample portion; a counter electrode for providing a second applied electric potential different from the first applied electric potential; and at least one shield electrode disposed at least partially between the counter electrode and the emitter tip of at least one of the emitter capillaries for providing a third applied electric potential intermediate to the first and second applied electric potentials, wherein the at least one shield electrode is configured such that provision of the third applied electric potential to the at least one shield electrode provides a uniformity of emission of charged particles from the plurality of emitter tips.

Abstract: The invention provides an ionization source for mass spectrometers named Universal Soft Ionization Source (USIS), wherein the ionization chamber combines various physical effects including InfraRed and UltraViolet normal or laser light, ultrasound, electrostatic potential and differential temperature to analyze polar, non-polar, low, medium or high molecular weight molecules, in order to ionize a variety of compounds.

Abstract: This invention provides a method of combining an array-type nanospray ionization source comprising a set of externally wetted proud features and a contact electrode with a pneumatic nebuliser acting to enhance the flux of sprayed ions. Methods of fabricating a substrate combining a set of proud features with analyte delivery and gas flow channels in silicon-based materials are described.

Abstract: An electrospray ion source for a mass spectrometer includes an electrode comprising at least a first plurality of protrusions protruding from a base, each protrusion of the at least a first plurality of protrusions having a respective tip; a conduit for delivering an analyte-bearing liquid to the electrode; and a voltage source, wherein, in operation of the electrospray ion source, the analyte-bearing liquid is caused to move, in the presence of a gas or air, from the base to each protrusion tip along a respective protrusion exterior so as to form a respective stream of charged particles emitted towards an ion inlet aperture of the mass spectrometer under application of voltage applied to the electrode from the voltage source.

Abstract: A hybrid ion source, comprising a source body configured to create plasma therein, from a first material, wherein the first material comprises one of monatomic gases, small molecule gases, large molecule gases, reactive gases, and solids, a low power plasma generation component operably associated with the source body, a high power plasma generation component operably associated with the source body and an extraction aperture configured to extract ions of the ion plasma from the source body.

Abstract: An EUV light source apparatus can reliably detect and accurately judge deterioration of an optical element in a laser beam focusing optics disposed within an EUV light generation chamber. This EUV light source apparatus includes: the EUV light generation chamber; a target material supply unit; an EUV light collector mirror; a driver laser; a window; a parabolic mirror which focuses collimated laser beam by reflection and is disposed within the EUV light generation chamber; an energy detector detecting energy of the laser beam diffused without being applied to a target material after being focused by the laser beam focusing optics when the EUV light is not generated; and a processing unit for judging the deterioration of the window and the parabolic mirror according to the laser beam energy detected by the energy detector.

Abstract: In a conventional mass spectrometer in which a pipe to be electrically heated is provided between a separation wall separating an ionization chamber for ionizing a sample and a separation wall separating an analysis chamber, and an ion in the ionization chamber is introduced through the pipe to the analysis chamber, the pipe is attached or detached by screwing or unscrewing a connector portion of an electrode connected to the pipe and a connector portion of a support disposed at the separation wall. However, with this structure, the screw needs to be loosened until it is completely unscrewed every time it is washed or exchanged, and thus the operability is deteriorated. According to the present invention, a screw hole for screwing the electrode connector portion is in the form of a cut-out portion facing in the direction of rotation centering on an axis of the pipe. Accordingly, the pipe can be attached or detached by only loosening the screw without completely unscrewing it.

Abstract: The invention relates generally to sample ionization, and provides ionization probe assemblies, systems, computer program products, and methods useful for this purpose.

Abstract: An extreme ultraviolet light source apparatus generating an extreme ultraviolet light from plasma generated by irradiating a target material with a laser light within a chamber, and controlling a flow of ions generated together with the extreme ultraviolet light using a magnetic field or an electric field, the extreme ultraviolet light source apparatus comprises an ion collector device collecting the ion via an aperture arranged at a side of the chamber, and an interrupting mechanism interrupting movement of a sputtered particle in a direction toward the aperture, the sputtered particle generated at an ion collision surface collided with the ion in the ion collector device.

Abstract: The invention relates generally to sample ionization, and provides ionization probe assemblies, systems, computer program products, and methods useful for this purpose.

Abstract: Provided is an ionization emitter which can reduce a dead volume without deteriorating separating capacity. An ionization emitter (2) is provided with a tip (1) composed of a columnar or conical porous self-standing structure, and a channel for supplying a solution sample into the tip (1) from the base end side of the tip (1). The channel is formed by filling a pipe line with a packing, and the tip (1) is exposed from the pipe line of the channel. The packing and the porous self-standing structure constituting the tip (1) have an integrated structure composed of a same porous body formed at the same time.

Abstract: Systems, methods and computer program products for the multi-modal detection of particles are described herein. An embodiment of the present invention is a particle detector that includes a first chamber wherein analyte particles are subjected to a first particle detection mechanism, and a second chamber coupled to the first chamber, wherein the analyte particles are subjected to a second particle detection mechanism, and wherein the detection characteristics of second particle detection mechanism are orthogonal to detection characteristics of the first particle detection mechanism.

Abstract: A method of enhanced speciation of both positive and negatives species in an analyte is disclosed. The method can include producing a first analyte solution comprising an analyte composition and an effective amount of silver triflate, and analyzing the first analyte solution with an electrospray ionization mass spectrometer. The method can also include producing a second analyte solution comprising a portion of the analyte composition and an effective amount of a compound of formula I, and analyzing the second analyte solution with an electrospray ionization mass spectrometer. The compound of formula I is [NX+][OH?], where X is a linear, branched, or cyclic C1-C10 alkane; an aryl; a heterocyclic aromatic; or a heterocyclic moiety.

Abstract: Providing vapor to a vapor-receiving device housed in a high vacuum chamber. An ion beam implanter, as an example, has a removable high voltage ion source within a high vacuum chamber and a vapor delivery system that delivers vapor to the ion source and does not interfere with removal of the ion source for maintenance. For delivering vapor to a vapor-receiving device, such as the high voltage ion source under vacuum, a flow interface device is in the form of a thermally conductive valve block. A delivery extension of the interface device automatically connects and disconnects within the high vacuum chamber with the removable vapor receiving device by respective installation and removal motions. In an ion implanter, the flow interface device or valve block and source of reactive cleaning gas are mounted in a non-interfering way on the electrically insulating bushing that insulates the ion source from the vacuum housing and the ion source may be removed without disturbing the flow interface device.

Abstract: Methods and systems are provided for the soft desorption of analyte from a sample, in which an optical beam absorbed within an irradiate zone of the sample causes vibrational excitations of a component within the sample. The optical beam, providing sufficient energy to superheat the component, is provided for a time interval that is less than the time duration required for the loss of energy out of the irradiated zone due to thermal diffusion and acoustic expansion. The superheated component thus drives ablation within the irradiated zone, resulting in the soft desorption of analyte without ionization and fragmentation. The ejected ablation plume may be directed towards the inlet of a mass analysis device for detection of the desorbed analyte, which is preferably ionized by a linear resonant photo-ionization step.

Abstract: An Atmospheric Pressure Chemical Ionization (APCI) source interfaced to a mass spectrometer is configured with a corona discharge needle positioned inside the APCI inlet probe assembly. Liquid sample flowing into the APCI inlet probe is nebulized and vaporized prior to passing through the corona discharge region all contained in the APCI inlet probe assembly Ions produced in the corona discharge region are focused toward the APCI probe centerline to maximize ion transmission through the APCI probe exit. External electric fields penetrating into the APCI probe exit end opening providing additional centerline focusing of sample ions exiting the APCI probe. The APCI probe is configured to shield the electric field from the corona discharge region while allowing penetration of an external electric field to focus APCI generated ions into an orifice into vacuum for mass to charge analysis.

Abstract: A method and system for desorbing and ionizing molecules from a sample for mass spectrometry using a microplasma device is disclosed. The system and method relies upon a microplasma device, or array of such devices, to partially ionize a gas to form a microplasma. The ionized gas can be a mixture of a noble gas, such as neon or argon, and hydrogen (H2). The ionized gas can form a effluent stream directed onto the surface of a sample to desorb molecules from the remainder of the sample. The desorbed molecules can be ionized by the effluent stream as they leave the surface of the sample. The ionization process can include: photoionization, penning ionization, chemical ionization (proton transfer), and electron impact ionization. The ionized particles from the sample can be directed to a mass spectrometer for analysis. This can produce spatially-resolved mass spectral data, and can be conducted concurrently with another imaging system, such as a microscope.

Abstract: A gas cluster ion beam (GCIB) processing system using multiple nozzles for forming and emitting at least one GCIB and methods of operating thereof are described. The GCIB processing system may be configured to treat a substrate, including, but not limited to, doping, growing, depositing, etching, smoothing, amorphizing, or modifying a layer thereupon. Furthermore, the GCIB processing system may be operated to produce a first GCIB and a second GCIB, and to irradiate a substrate simultaneously and/or sequentially with the first GCIB and second GCIB.

Abstract: A multiple function atmospheric pressure ion source interfaced to a mass spectrometer comprises multiple liquid inlet probes configured such that the sprays from two or more probes intersect in a mixing region. Gas phase sample ions or neutral species generated in the spray of one probe can react with reagent gas ions generated from one or more other probes by such ionization methods as Electrospray, photoionization, corona discharge and glow discharge ionization. Reagent ions may be optimally selected to promote such processes as Atmospheric Pressure Chemical Ionization of neutral sample molecules, or charge reduction or electron transfer dissociation of multiply charged sample ions. Selected neutral reagent species can also be introduced into the mixing region to promote charge reduction of multiply charged sample ions through ion-neutral reactions. Different operating modes can be performed alternately or simultaneously, and can be rapidly turned on and off under manual or software control.

Abstract: A method of manufacturing a semiconductor device includes the steps of: providing a supply of molecules containing a plurality of dopant atoms into an ionization chamber, ionizing said molecules into dopant cluster ions, extracting and accelerating the dopant cluster ions with an electric field, selecting the desired cluster ions by mass analysis, modifying the final implant energy of the cluster ion through post-analysis ion optics, and implanting the dopant cluster ions into a semiconductor substrate. In general, dopant molecules contain n dopant atoms, where n is an integer number greater than 10. This method enables increasing the dopant dose rate to n times the implantation current with an equivalent per dopant atom energy of 1/n times the cluster implantation energy, while reducing the charge per dopant atom by the factor n.

Abstract: An apparatus for producing ions can include an emitter having a first end and a second end. The emitter can be coated with an ionic liquid room-temperature molten salt. The apparatus can also include a power supply and a first electrode disposed downstream relative to the first end of the emitter and electrically connected to a first lead of the power supply. The apparatus can also include a second electrode disposed downstream relative to the second end of the emitter and electrically connected to a second lead of the power supply.

Abstract: A cycling electrospray ionization device includes a driving mechanism and a nozzle. The nozzle is configured to sequentially form liquid droplets of an electrospray medium thereat, and is adapted to establish a traveling path with a receiving unit of a mass spectrometer such that when a potential difference is applied between the nozzle and the receiving unit to lade the liquid droplets with a plurality of electric charges for ionizing analytes to form ionized analytes, the charged droplets are forced to move toward the receiving unit along the traveling path. The nozzle defines a nozzle axis, and is driven by the driving mechanism to proceed with a cycling route about a cycling axis such that the nozzle axis tracks along the cycling route, and such that immediately after leaving the nozzle, the liquid droplets cooperate to form a substantially columnar plume with a cross section substantially surrounded by the cycling route.

Abstract: A spin polarized ion beam generation apparatus (30) can efficiently generate a spin polarized ion by using a pumping light generator (33) to an ion in a high frequency discharge tube (15) to irradiate optical pumping (33,34) by circularly polarized light and linearly polarized light orthogonal to each other to a metastable atom. For example, a polarized helium ion beam having a spin polarization rate that exceeds 18% and that is as high as 25% can be generated. The spin polarized ion beam generation apparatus (30) also can be applied to a processing apparatus and an analysis apparatus that can irradiate a polarized ion beam to a specimen. According to the spin polarized ion scattering spectroscopy apparatus, the spin status in a region at a depth of about 2 to 3 atomic layers from the surface of the specimen can be measured while discriminating the elements from the atomic layer with a reduced measurement time and with a high accuracy impossible in the conventional technique.

Abstract: Vapor delivery systems and methods that control the heating and flow of vapors from solid feed material, especially material that comprises cluster molecules for semiconductor manufacture. The systems and methods safely and effectively conduct the vapor to a point of utilization, especially to an ion source for ion implantation. Ion beam implantation is shown employing ions from the cluster materials. The vapor delivery system includes reactive gas cleaning of the ion source, control systems and protocols, wide dynamic range flow-control systems and vaporizer selections that are efficient and safe. Borane, decarborane, carboranes, carbon clusters and other large molecules are vaporized for ion implantation. Such systems are shown cooperating with novel vaporizers, ion sources, and reactive cleaning systems.

Abstract: An ion source has an arc chamber with an electron-emitting element and a repeller. A manifold assembly defines a cavity and a gas outlet configured to allow gas flow to the arc chamber. This gas outlet is closer to the repeller than the electron-emitting element. In one embodiment, the ion source has a first crucible and a second crucible. The first crucible and the second crucible are connected to the manifold assembly. In one instance, the crucibles have tamper-resistant features.

Abstract: A nozzle protection device capable of protecting a target nozzle from heat of plasma without disturbing formation of a stable flow of a target material in an LPP type EUV light source apparatus. This nozzle protection device includes a cooling unit which is formed with an opening for passing the target material therethrough, and which is formed with a flow path for circulating a cooling medium inside, and an actuator which changes a position or a shape of the cooling unit between a first state of evacuating the cooling unit from a trajectory of the target material and a second state of blocking heat radiation from the plasma to the nozzle by the cooling unit while securing a path of the target material in the cooling unit.

Abstract: In an ion source that generates ions by matrix-assisted laser desorption (MALDI), ion acceleration diaphragms having apertures though which ions are accelerated and which have become contaminated by matrix material, are cleaned by temporarily heating the diaphragms. During the cleaning process, the sample support plate is moved aside but remains in the ion source housing, and the heating is preferably limited to regions surrounding the apertures in the diaphragms. In one embodiment, the diaphragms are heated by irradiation generated by infrared laser diodes.

Abstract: A neutralizer 1 includes: a power supply circuit 11; an output controlling circuit 12 configured to convert a DC voltage generated by the power supply circuit 11 to a high-frequency voltage with frequency equal to or higher than an audible frequency, and thus to output the resultant high-frequency voltage alternately to two output lines at regular intervals; a transforming circuit 13 configured to raise the high-frequency voltage; a discharger 20 including 2n (n is an integer equal to one or more) discharge needles configured to output positive ions in response to application of a positive polarity voltage, and to output negative ions in response to application of a negative polarity voltage, the discharge needles being disposed while being divided into first and second groups each including n discharge needles; a polarity reversing circuit 14 configured to convert the high-frequency high voltage outputted from the transforming circuit 13, to two rectangular-wave DC high voltages with different polarities dur

Abstract: An electrically conductive heat-blocking plate 11 with an opening 12 for allowing thermions to pass through is provided between a filament 3, whose temperature can be as high as 2000° to 3000° C., and an ionization chamber 2. The heat-blocking plate 11 is thermally connected via an aluminum block 10 to a heater for maintaining the ionization chamber 2 within a range temperature from 200° to 300° C., and also electrically set at a ground potential, which is approximately equal to the potential of the ionization chamber 2. The heat-blocking plate 11 blocks the radiation heat that the filament 3 emits when energized. Thus, the wall of the ionization chamber 2 is prevented from being locally heated to an abnormally high temperature. As a result, the inner space of the ionization chamber 2 is maintained at an approximately uniform temperature, and the noise due to the decomposition of a metallic material by abnormal heating is prevented.

Abstract: In an extreme ultra violet light source apparatus of a laser produced plasma type, charged particles such as ions emitted from plasma are promptly ejected to the outside of a chamber. The extreme ultra violet light source apparatus includes a chamber in which extreme ultra violet light is generated, a target supply unit for supplying a target material to a predetermined position within the chamber, a driver laser for applying a laser beam to the target material supplied by the target supply unit to generate plasma, a collector mirror for collecting the extreme ultra violet light radiated from the plasma to output the extreme ultra violet light, a magnetic field forming unit for forming an asymmetric magnetic field in a generation position of the plasma by using a coil, and a charged particle collection mechanism provided on at least one of two surfaces of the chamber to which lines of magnetic force generated by the coil extend.

Abstract: An EUV light source apparatus capable of easily detecting deterioration etc. of a window of an EUV light generating chamber. The EUV light source apparatus includes a driver laser, an EUV light generating chamber, a window which passes the laser beam into the EUV light generating chamber, an EUV light collector mirror, laser beam focusing optics which focuses a laser beam onto a trajectory of a target material, a temperature sensor which detects a temperature of the window, and a laser beam optics deterioration determination processing unit which determines deterioration of the window based on the temperature of the window detected by the temperature sensor when extreme ultra violet light is generated.

Abstract: In relation with a laser-induced transport process of an object from a carrier to a collecting device, the invention provides a collecting medium in the collecting device in a liquid state. Prior to the laser-induced transport process, the object is separated from a mass on the carrier by laser irradiation. After the laser-induced transport process, the object, thus selected and separated, is transferred together with the collecting medium to a destination, for example, a container, for further treatment. To this end, a manipulation system for liquids is provided, the system permitting manipulation of the collecting medium with the object contained therein with a high degree of reliability and a high throughput.

Abstract: A method for growing material on a substrate is described. The method comprises directionally growing a thin film on one or more surfaces of a substrate using a gas cluster ion beam (GCIB) formed from a source of precursor for the thin film, wherein the growth occurs on surfaces oriented substantially perpendicular to the direction of incidence of the GCIB, and growth is substantially avoided on surfaces oriented substantially parallel to the direction of incidence.

Abstract: A method for ionizing and desorbing a sample for analysis includes energizing a first and second electrode to produce a glow discharge at atmospheric pressure. The method further includes supplying a carrier gas to at least a portion of the glow discharge to create effluents thereof. The method further includes conducting the effluents of the glow discharge to the sample to ionize and desorb the sample for analysis. An associated apparatus is also disclosed.

Abstract: A method for preparing an ion source from nanoparticles is provided. The method includes the steps of: providing nanoparticles, vaporizing the nanoparticles from a solid state to a gaseous state, and ionizing the gas to form the ion source. The ion source is prepared by placing solid nanoparticles in a stainless tube, heating and vaporizing the solid nanoparticles into a gaseous state, and ionizing the gas. The gas can be formed at a lower heating temperature than when solid lumps are used because solid nanoparticles have a lower melting point than solid lumps. Thus, the heating temperature is lowered, and the preparing time of the ion source is shortened. Besides, under the same temperature, an ion source prepared from nanoparticles provides higher vapor pressure and allows a higher implantation dose than when the ion source is prepared from solid lumps, thus expanding the applicability of ion implantation technology.

Abstract: An apparatus for producing negative ions including an emitter coated with an ionic liquid room-temperature molten salt, an electrode positioned downstream relative to the emitter, a power supply that applies a voltage to the emitter with respect to the electrode. The power supply is sufficient to generate a stable high brightness beam of negative ions having minimal chromatic and spherical aberrations in the beam. An electrostatic lens and deflector is used to focus and direct the beam to a target.

Abstract: A method of obtaining ions of an analyte is disclosed. The method includes aerosolizing a sample using a thermal liquid jetting device or a piezoelectric liquid jetting device to obtain an aerosol without ionizing the sample. The sample includes the analyte in a solvent. The method further includes drying the aerosol to obtain gas phase solvent and gas phase analyte, and ionizing the gas phase analyte to obtain ions thereof. An ion source using the method for obtaining ions of an analyte is also disclosed.

Abstract: An apparatus for in-situ specimen preparation is described. The apparatus includes an ion beam column 21 including at least: an liquid metal alloy ion source 56 including a first element for providing a light ion species with a mass of 10 g/mol to 60 g/mol and a second element for providing a heavy ions species with a mass of 150 g/mol or higher, a mass separator 58 for selectively separating the light ion species and the heavy ion species, and a focusing element for focusing the ion beam on a specimen. The apparatus further includes a specimen-beam-tilt unit for tilting the ion beam with respect to the specimen.

Abstract: A gas monitoring apparatus includes a sample introducing portion, a measurement portion, an ionization portion, a mass analysis portion, a data processing portion and a display. The sample introducing portion introduces a sample gas including an object material to be measured. The measurement portion measures a concentration of a predetermined coexisting material, which coexists with the object material in the sample gas. The ionization portion ionizes the sample gas. The mass analysis portion analyzes mass of an ion produced by the ionization portion. The data processing portion analyzes signals detected by the mass analysis portion to calculate a concentration of the object material. And the display displays results of analysis conducted by the data processing portion. The data processing portion includes an adjustment portion which adjusts the concentration of the object material according to the concentration of the predetermined coexisting material.