With Sample Vaporizing Means Patents (Class 250/425)
  • Publication number: 20030122089
    Abstract: The invention relates to an ion source for an ion implanter in which source material for providing desired ions is provided in the form of a plate or liner which can be fitted into the reactant chamber of the ion source.
    Type: Application
    Filed: December 2, 2002
    Publication date: July 3, 2003
    Inventors: Adrian Murrell, Peter Michael Banks, Andrew Allen, Neil L. Clarke, Matthew Peter Dobson
  • Patent number: 6576909
    Abstract: An ion generator chamber, for an implantation apparatus, having its interior walls surfaces knurled or roughened so that any of the materials used in the chamber cannot deposit onto the interior wall surfaces in a size sufficiently large enough to adversely affect the operation of the chamber, if the deposits peel off the interior walls of the chamber. By limiting the size of any deposits on interior chamber walls, the invention extends the average life of the filaments used in the chamber as well as extending the average time between any necessary cleaning of the inner chamber walls thereby extending the operating life of the chamber.
    Type: Grant
    Filed: February 28, 2001
    Date of Patent: June 10, 2003
    Assignee: International Business Machines Corp.
    Inventors: Gary A. Donaldson, Donald W. D. Rakowski, Nick G. Selva
  • Publication number: 20030102437
    Abstract: A source of ions for an analyzer includes a reservoir for containing a liquid and a channel having a first end opening into the reservoir. A nozzle element adjacent a second end of the channel includes a plurality of tips for producing individual droplets from the liquid. The plurality of tips reduces the likelihood that individual droplets will coalesce, increases the overall flow of material or analyte to the mass spectrometer and provides a level of redundancy in the delivery of liquid for producing droplets. The tips also may produce a higher current output and greater signal from the system, as well. With micro-miniaturization, the individual droplets are relatively small, thereby increasing the likelihood that ions would be ejected from the droplet surfaces under the influence of an electric field. Multiple nozzle elements can be used to more selectively deliver fluid droplets to the analyzer, or to increase the overall flow rate of droplets from the reservoir.
    Type: Application
    Filed: February 17, 2000
    Publication date: June 5, 2003
    Inventors: Paul C. Goodley, Jean-Luc Truche
  • Patent number: 6570166
    Abstract: This ion source 2 has the heating furnace 4 for heating a solid material 6 to produce a vapor 8, the plasma production vessel 16 for producing a plasma 24 by ionizing this vapor 8, and the vapor conduit tube 10 connecting both the heating furnace 4 and the plasma production vessel 16. In this ion source 2, using indium fluoride 6a as the solid material 6, an ion beam 30 containing indium ions is led out, while the temperature of the heating furnace 4 is kept in a range from 450° to 1170° C., and below the temperature of the plasma production vessel 16.
    Type: Grant
    Filed: May 3, 2001
    Date of Patent: May 27, 2003
    Assignee: Nissin Electric Co., Ltd.
    Inventor: Takatoshi Yamashita
  • Patent number: 6526909
    Abstract: A device for increasing the incident energy of an ion for coating a disc in an ion beam deposition process. The ion beam deposition process is performed in a chamber with the disc to be coated disposed therein. An ion source, having a voltage level, is introduced into the chamber for generating an ion beam for depositing ions on the disc. A bias contact is coupled to the disc and a power supply is coupled to the bias contact. The power supply applies a voltage level to the bias contact that is less than the voltage level of the ion source thereby creating a negative bias voltage between the disc and the ion source. This negative bias voltage causes the incident energy of the ion to increase. As a result, the optimal incident energy can be achieved using a lower original energy.
    Type: Grant
    Filed: March 22, 2000
    Date of Patent: March 4, 2003
    Assignee: Seagate Technology, LLC
    Inventors: Kevin John Grannen, Jeffrey Arthur McCann, Xiaoding Ma, Jing Gui, Mark Anthony Shows
  • Patent number: 6525313
    Abstract: The present invention relates to a spray needle for use in electrospray ionization (ESI) for mass spectrometry. A spray needle is disclosed which is constructed to have an opening along its length such that a sample solution may be more readily introduced or loaded therein. Further, the design of the spray needle of the invention is more durable than the prior art spray needles and may be reusable. Because sample loading is more readily achieved, the spray needle of the invention is appropriate for use with a fully automated system for the analysis of samples.
    Type: Grant
    Filed: August 16, 2000
    Date of Patent: February 25, 2003
    Assignee: Brucker Daltonics Inc.
    Inventor: Melvin A. Park
  • Publication number: 20030015657
    Abstract: To provide a mass spectrometer having a high sensitivity to dioxins. In the mass spectrometer including: a sample supply tube for supplying a sample solution containing a sample to be measured; a nebulizer for nebulizing the sample solution supplied from the sample supply tube; an ion source having a needle electrode for ionizing the sample nebulized and vaporized in the nebulizer; and a mass analyzer for analyzing ions formed in the ion source, and a gas of a flow rate corresponding to the flow rate of the sample solution is mixed to the vaporized sample, and a moving direction of the sample is made opposite to a moving direction of ions at a tip of the needle electrode.
    Type: Application
    Filed: January 24, 2002
    Publication date: January 23, 2003
    Inventors: Yasuaki Takada, Masuyoshi Yamada, Masao Suga, Yuichiro Hashimoto
  • Patent number: 6479828
    Abstract: A method of implanting ionized icosaborane (B20HX), triantaborane (B30HX), and sarantaborane (B40HX) into a workpiece is provided, comprising the steps of (i) vaporizing and ionizing decaborane in an ion source (50) to create a plasma; (ii) extracting ionized icosaborane, triantaborane, and sarantaborane (collectively “higher order boranes”) within the plasma through a source aperture (126) to form an ion beam; (iii) mass analyzing the ion beam with a mass analysis magnet (127) to permit ionized icosaborane (B20HX+) or one of the other higher order boranes to pass therethrough; and (iv) implanting the ionized icosaborane (B20HX+) or one of the other higher order boranes into a workpiece. The step of vaporizing and ionizing the decaborane comprises the substeps of (i) vaporizing decaborane in a vaporizer (51) and (ii) ionizing the vaporized decaborane in an ionizer (53).
    Type: Grant
    Filed: December 15, 2000
    Date of Patent: November 12, 2002
    Inventor: Alexander S. Perel
  • Publication number: 20020162967
    Abstract: Methods and apparatus for simultaneous vaporization and ionization of a sample in a spectrometer prior to introducing the sample into the drift tube of the analyzer are disclosed. The apparatus includes a vaporization/ionization source having an electrically conductive conduit configured to receive sample particulate which is conveyed to a discharge end of the conduit. Positioned proximate to the discharge end of the conduit is an electrically conductive reference device. The conduit and the reference device act as electrodes and have an electrical potential maintained between them sufficient to cause a corona effect, which will cause at least partial simultaneous ionization and vaporization of the sample particulate. The electrical potential can be maintained to establish a continuous corona, or can be held slightly below the breakdown potential such that arrival of particulate at the point of proximity of the electrodes disrupts the potential, causing arcing and the corona effect.
    Type: Application
    Filed: May 1, 2001
    Publication date: November 7, 2002
    Applicant: Bechtil BWTX Idaho, LLC
    Inventors: David A. Atkinson, Paul Mottishaw
  • Publication number: 20020153493
    Abstract: An ion source vaporizer comprises a hollow vaporizer main body, a heater, and a nozzle. The hollow vaporizer main body has an opening portion. The heater is installed outside the vaporizer main body and evaporates a solid sample within the vaporizer main body. The nozzle feeds a vapor produced within the vaporizer main body into an arc chamber. The ion source vaporizer further comprises a crucible for filling the solid sample which is provided within a cavity of the vaporizer main body, and a pressing unit for pressing a crucible bottom against a cavity bottom of the vaporizer main body. One end of the nozzle is screwed with an upper part of the crucible.
    Type: Application
    Filed: April 23, 2002
    Publication date: October 24, 2002
    Applicant: Nissin Electric Co., Ltd
    Inventor: Kenji Miyabayashi
  • Publication number: 20020130271
    Abstract: In an ion implantation method using an ion implantation equipment having an extraction electrode and a post accelerator, ion is uniformly implanted into a shallow region from the surface of a sample by setting an applied volt. of the post accelerator higher than an applied volt. of the extraction electrode.
    Type: Application
    Filed: February 22, 2002
    Publication date: September 19, 2002
    Applicant: Kabushiki Kaisha Toshiba
    Inventors: Atsushi Murakoshi, Kyoichi Suguro
  • Patent number: 6451616
    Abstract: A method for the chemical analysis of molecules bound and bonded to solid surfaces is presented. The method includes the steps desorbing absorbate molecules or structurally significant fragments of these molecules by selective cleavage of a bond in an absorbate/substrate system using resonant excitation processes and detection of the absorbate species or its characteristic fragments using mass spectrometry techniques.
    Type: Grant
    Filed: November 19, 1999
    Date of Patent: September 17, 2002
    Inventors: Robert W. Odom, Kuang Jen Wu
  • Publication number: 20020117630
    Abstract: A laser illumination apparatus for illuminating a semiconductor film with a linear laser beam while scanning the semiconductor film with the linear laser beam. An optical system generates a linear laser beam having a beam width W by dividing a pulse laser beam that is emitted from a pulsed laser light source into a plurality of beams vertically and horizontally, and combines divisional beams after they have been processed into a linear shape individually. A mechanism is provided to move a substrate that is mounted with the semiconductor film. A condition W/20≦&Dgr;(r)≦x≦W/5 or &Dgr;(r)≦W/20≦x≦W/5 is satisfied, where r is a height difference of the surface of the semiconductor film, &Dgr;(r) is a variation amount of the beam width W as a function of the height difference r, and x is a movement distance of the substrate during an oscillation period of the pulsed laser light source.
    Type: Application
    Filed: April 24, 2002
    Publication date: August 29, 2002
    Inventors: Shunpei Yamazaki, Koichiro Tanaka
  • Patent number: 6414320
    Abstract: The composition analysis by scanning femtosecond ultraprobing (CASFLU) technology scans a focused train of extremely short-duration, very intense laser pulses across a sample. The partially-ionized plasma ablated by each pulse is spectrometrically analyzed in real time, determining the ablated material's composition. The steering of the scanned beam thus is computer directed to either continue ablative material-removal at the same site or to successively remove nearby material for the same type of composition analysis. This invention has utility in high-speed chemical-elemental, molecular-fragment and isotopic analyses of the microstructure composition of complex objects, e.g., the oxygen isotopic compositions of large populations of single osteons in bone.
    Type: Grant
    Filed: May 2, 2000
    Date of Patent: July 2, 2002
    Assignee: The Regents of the University of California
    Inventors: Muriel Y. Ishikawa, Lowell L. Wood, E. Michael Campbell, Brent C. Stuart, Michael D. Perry
  • Publication number: 20020050573
    Abstract: An electrically conductive mask having openings formed is located above a semiconductor substrate and ions are implanted into the surface of the semiconductor substrate through the electrically conductive mask, thereby forming ion implanted layers. For ion implantation under different conditions, a dedicated electrically conductive mask is used with each ion implantation step.
    Type: Application
    Filed: December 5, 2001
    Publication date: May 2, 2002
    Applicant: Kabushiki Kaisha Toshiba
    Inventors: Kyoichi Suguro, Atsushi Murakoshi, Katsuya Okumura
  • Patent number: 6335534
    Abstract: An electrically conductive mask having openings formed is located above a semiconductor substrate and ions are implanted into the surface of the semiconductor substrate through the electrically conductive mask, thereby forming ion implanted layers. For ion implantation under different conditions, a dedicated electrically conductive mask is used wit each ion implantation step.
    Type: Grant
    Filed: April 15, 1999
    Date of Patent: January 1, 2002
    Assignee: Kabushiki Kaisha Toshiba
    Inventors: Kyoichi Suguro, Atsushi Murakoshi, Katsuya Okumura
  • Patent number: 6107634
    Abstract: An ion source (50) for an ion implanter is provided, comprising: (i) a sublimator (52) having a cavity (66) for receiving a source material (68) to be sublimated and for sublimating the source material; (ii) an ionization chamber (58) for ionizing the sublimated source material, the ionization chamber located remotely from the sublimator; (iii) a feed tube (62) for connecting the sublimator (52) to the ionization chamber (58); and (iv) a heating medium (70) for heating at least a portion of the sublimator (52) and the feed tube (62). A control mechanism is provided for controlling the temperature of the heating medium (70). The control mechanism comprises a heating element (80) for heating the heating medium (70), a pump (55) for circulating the heating medium, at least one thermocouple (92) for providing temperature feedback from the heating medium (70), and a controller (56) responsive to the temperature feedback to output a first control signal (94) to the heating element.
    Type: Grant
    Filed: April 30, 1998
    Date of Patent: August 22, 2000
    Assignee: Eaton Corporation
    Inventor: Thomas N. Horsky
  • Patent number: 5977552
    Abstract: In an efficient ion source BF.sub.3 gas is first passed over solid boron heated in an oven to at least 1100.degree. C. to reduce the BF.sub.3 to BF molecules. It is also proposed to use solid boron as feed stock by heating this in an oven to at least 1800.degree. C. to produce boron vapour. Either a reactive gas such as fluorine or an inert gas such as Argon is also introduced into the arc chamber to react with or sputter off boron condensing on the arc chamber walls.
    Type: Grant
    Filed: December 11, 1997
    Date of Patent: November 2, 1999
    Assignee: Applied Materials, Inc.
    Inventor: Majeed A. Foad
  • Patent number: 5874314
    Abstract: In a technique for detecting organic vapors and aerosols, e.g. of amines, hydrazines and nitrogen-containing compounds produced in combustion, molecules condense at a surface of a conductive device. By heating the conductive device in pulsed fashion, e.g. by resistance heating, condensed molecules are thermally ionized and emitted from the conductive device. Emitted ions are collected by a collector electrode, and the resulting ionic current pulse is amplified by a transimpedance circuit. The heat pulse lasts until the ionic current pulse has subsided, by which time the conductive device has become free of residual substances. As a result, the conductive device remains uncontaminated and has a long service life. The time-averaged power consumption of the technique is less than 2 mW. For resistance heating, a meander heater element can be disposed on a silicon nitride membrane across an etched opening in a silicon chip.
    Type: Grant
    Filed: January 31, 1997
    Date of Patent: February 23, 1999
    Assignee: Cerberus AG
    Inventors: Markus Loepfe, Dieter Wieser, Peter Ryser
  • Patent number: 5526682
    Abstract: A system and process for analyzing a liquid sample is disclosed which includes an ultrasonic nebulizer capable of vibrating at a frequency between about 50 Khz and 760 Khz for converting the liquid sample to a liquid aerosol. The liquid aerosol is heated at a pressure of at least atmospheric pressure to evaporate solvent in the aerosol and to form a solid aerosol. The solid aerosol is separated from the evaporate solvent and the solid aerosol is directed into an electron impact ionizer and a mass spectrometer where it is analyzed.
    Type: Grant
    Filed: May 18, 1994
    Date of Patent: June 18, 1996
    Assignee: Waters Investments Limited
    Inventors: Joseph A. Jarrell, Michael Tomany, Stephen C. Gabeler
  • Patent number: 5472670
    Abstract: The present invention relates to an improved sample injector for use in gas chromatography. The invention also includes a method of injecting a sample onto a chromatographic column, and a method of analyzing a sample using column chromatography and/or mass spectrometry. The improved sample injector features an arrangement to allow a pyrolytic probe to be more easily inserted into the vaporization cavity while permitting the sample to be volatilized in such a way that the sample is more efficiently introduced onto the column. Another feature of the invention is the use of means to reduce the volume of the pyrolysis/vaporization cavity so as to provide efficient throughput of pure sample. Also part of the present invention is a gas chromatograph and gas chromatograph-mass spectrometer which uses the sample injector of the present invention. The present invention includes methods of sample injection and sample analysis using the aforementioned apparatus of the present invention.
    Type: Grant
    Filed: March 5, 1993
    Date of Patent: December 5, 1995
    Assignee: Ohio University
    Inventors: Peter de B. Harrington, Hans P. Whittenberg
  • Patent number: 5369035
    Abstract: In the elemental analysis of an analyte present in a sample by optical or mass spectrometry, a nebulizer sprays the liquid sample into a chamber which has a wall transparent to infra-red radiation. Infra-red radiation from a heater external to the chamber is focused on to the droplets of sample as they emerge from the nebulizer, disrupting the droplets into smaller ones and evaporating solvent from them as they pass through the chamber. The thus desolvated sample stream is delivered into a plasma and the reaction accuracy within the plasma is qualified by the spectrometer.
    Type: Grant
    Filed: April 2, 1993
    Date of Patent: November 29, 1994
    Assignee: Fisons plc
    Inventors: Alan R. Eastgate, Wilfried Vogel
  • Patent number: 5180921
    Abstract: A method and an apparatus for monitoring simultaneously the temperature and the velocity of sprayed particles. The system is comprised of a sensor head attached to the spray gun, an optical fibre transmitting the collected radiation to detection apparatus, and a protective detection cabinet having the detection apparatus that incorporates two detectors. A two-slit or multiple-slit mask is located in the sensor head at the end of the optical fibre. For the temperature measurements, the particle emitted radiation collected by the sensor head is transmitted to two photodetectors, filtered by interference filters at two adjacent wavelengths. The particle temperature may be computed from the ratio of the detector outputs. To measure the velocity, the two-slit system collects radiation emitted by the in-flight particles travelling in the sensor field of view, which generates a double peak light pulse transmitted through the optical fibre.
    Type: Grant
    Filed: November 18, 1991
    Date of Patent: January 19, 1993
    Assignee: National Research Council of Canada
    Inventors: Christian Moreau, Mario Lamontagne, Paolo Cielo
  • Patent number: 5153672
    Abstract: A high bandwidth vapor density diagnostic system for measuring the density of an atomic vapor during one or more photoionization events. The system translates the measurements from a low frequency region to a high frequency, relatively noise-free region in the spectrum to provide improved signal to noise ratio.
    Type: Grant
    Filed: April 14, 1989
    Date of Patent: October 6, 1992
    Assignee: The United States of America as represented by the United States Department of Energy
    Inventors: Michael A. Globig, Thomas W. Story
  • Patent number: 5122713
    Abstract: This invention pertains to an atmospheric pressure capacitively coupled plasma formed inside a graphite furnace as a source for atomic emission spectroscopy. A capacitively coupled plasma device includes an electrically conducting, hollow elongated tube and an electrically conducting rod located coaxially and substantially inside the elongated tube, an ionizable gas present inside the cylindrical tube, and a mechanism of applying a high-frequency electric potential between the tube and the rod.
    Type: Grant
    Filed: June 11, 1991
    Date of Patent: June 16, 1992
    Assignee: University of British Columbia
    Inventors: Dong C. Liang, Michael W. Blades
  • Patent number: 5105123
    Abstract: A plasma source incorporates a furnace as a hollow anode, while a coaxial cathode is disposed therewithin. The source is located in a housing provided with an ionizable gas such that a glow discharge is produced between anode and cathode. Radiation or ionic emission from the glow discharge characterizes a sample placed within the furnace and heated to elevated temperatures.
    Type: Grant
    Filed: October 10, 1990
    Date of Patent: April 14, 1992
    Assignee: Battelle Memorial Institute
    Inventor: Nathan E. Ballou
  • Patent number: 5081397
    Abstract: A novel atmospheric pressure capacitively coupled ratio frequency plasma discharge method and apparatus. The apparatus is suitable for atomic absorption and atomic emission analysis of discrete sample volumes (1-50 .mu.l). The plasma can be operated at very low Radio Frequency (RF) input powers (10-600 W) which allow for optimal conditions for atom resonance line absorption measurements. Sample vaporization for analysis in the plasma is done by an electrically heated tantalum strip vaporizer. The vaporization and dissociation-atomization steps are separately controlled. Analyte absorption takes place in the plasma discharge which is characterized by a long path length (10-50 cm) and low support gas flow rate (0.05 to 6 L/m) both of which provide for a relatively long residence time. The device exhibits linear calibration plots and provides sensitivities in the range of from 3.5-40 pg.
    Type: Grant
    Filed: July 11, 1989
    Date of Patent: January 14, 1992
    Assignee: University of British Columbia
    Inventors: Dong C. Liang, Michael W. Blades
  • Patent number: 5068533
    Abstract: A sample manifold and method of its use has been developed so that milligram quantities of mercury can be analyzed mass spectroscopically to determine the .sup.196 Hg concentration to less than 0.02 atomic percent. Using natural mercury as a standard, accuracy of .+-.0.002 atomic percent can be obtained. The mass spectrometer preferably used is a commercially available GC/MS manufactured by Hewlett Packard. A novel sample manifold is contained within an oven allowing flow rate control of Hg into the MS. Another part of the manifold connects to an auxiliary pumping system which facilitates rapid clean up of residual Hg in the manifold. Sample cycle time is about 1 hour.
    Type: Grant
    Filed: March 15, 1989
    Date of Patent: November 26, 1991
    Assignee: GTE Products Corporation
    Inventors: Mark W. Grossman, Roger Evans
  • Patent number: 5062935
    Abstract: When vaporizing a sample substance consisting of big molecules, in particular for the purpose of mass-spectroscopic examinations, the energy introduced for the vaporization process may lead to thermolytic decomposition of the sample substance. In order to prevent such decomposition, the invention proposes that the sample substance be mixed, prior to its irradiation, with a matrix material which is easily decomposed under the influence of the laser beam pulses. The matrix may consist of a material which absorbs the radiation and which is easily decomposed thermolytically, or else of a material which is permeable to laser radiation, but mixed with a metal powder. When the mixture is exposed to laser beam pulses, the instable matrix material will decompose first whereby the embedded molecules of the sample substance are set free. It is possible in this manner to prevent, practically completely, the molecules of the sample substance from being destructed.
    Type: Grant
    Filed: March 21, 1989
    Date of Patent: November 5, 1991
    Assignee: Bruker-Franzen Analytik GmbH
    Inventors: Edward W. Schlag, Josef Lindner, Ronald C. Beavis, Jurgen Grotemeyer
  • Patent number: 5015862
    Abstract: A method for modulating a liquid metal ion source includes generating an ion beam, directing a light beam at the liquid metal ion source and inducing a modulation in the ion beam by modulating the light beam.An apparatus for carrying out the invention includes a light beam source for generating a light beam, a modulator for modulating the light beam and a mechanism for directing the modulated light beam at the light metal ion source.
    Type: Grant
    Filed: January 22, 1990
    Date of Patent: May 14, 1991
    Assignee: Oregon Graduate Institute of Science & Technology
    Inventors: J. Fred Holmes, Jonathan H. Orloff, Karl J. Jousten
  • Patent number: 4980556
    Abstract: Disclosed is an apparatus for the generation of large currents of negative ions for use in tandem accelerators, suitable for employment in ion implantation on an industrial production scale. The apparatus includes a high current positive ion source which is coupled to a charge exchange canal where a fraction of the positive ions are transformed into negative ions.
    Type: Grant
    Filed: March 6, 1990
    Date of Patent: December 25, 1990
    Assignee: Ionex/HEI Corporation
    Inventors: John P. O'Connor, Nicholas R. White
  • Patent number: 4980557
    Abstract: Surface ionization technique for detection of airborne particles whereby each particle is pyrolyzed on a hot surface, releasing its chemical constituents, some of which are ionized at the surface, creating a burst of ions that denote the particle's presence. The hot surface is a catalytic material deposited on an inert substrate heated by an internal heating element. Inert substrates are selected to provide mechanical strength, reduce microphonic noise and make a large catalytic surface area achievable, and hence permit high sensitivity while employing reduced quantities of catalytic materials. By locating the heater within the substrate, its electrical parameters are such that the heater power supply can be simplified. The pulses during "on" parts of the "on-off" cycles are filtered out and not counted. In one embodiment the hot sensor surface is biased to a high voltage by a high bias resistor and is coupled to a pulse-counting preamplifier through a capacitor.
    Type: Grant
    Filed: June 6, 1988
    Date of Patent: December 25, 1990
    Assignee: Extrel Corporation
    Inventors: Richard L. Myers, Edward L. McCall
  • Patent number: 4952294
    Abstract: In-situ generation of dangerous polyatomic gases is achieved by providing a solid elemental or compound source, one or more gaseous feedstock sources, a plasma generated in a partial vacuum, and beam impingement on the target to rapidly evolve the elemental species of interest. The toxic, corrosive, and explosive gas so generated in-situ can be better handled safely with lower operating cost.
    Type: Grant
    Filed: February 28, 1989
    Date of Patent: August 28, 1990
    Inventors: George J. Collins, John R. McNeil, Zeng-gi Yu
  • Patent number: 4933548
    Abstract: The device allows microsamples to be introduced into the ionization source of the spectrometer. It includes a reactor with means for introducing the microsample, means for heating the microsample, means for connection with a vacuum source and means for feeding an adjustable flow of reagent for transforming the microsample into gaseous compounds; a restricted and calibrated passage for flow of the gases from the reactor; and a sublimation tube connected on the one hand to the passage and, on the other, to the ion source of the spectrometer through a valve having means for bringing it to an adjustable cryogenic temperature.
    Type: Grant
    Filed: December 14, 1988
    Date of Patent: June 12, 1990
    Assignee: Compagnie Generale des Matieres Nucleaires
    Inventors: Robert Boyer, Jean-Pierre Journoux, Claude Duval
  • Patent number: 4879458
    Abstract: An automated sample inlet system for sequentially introducing a plurality of indium encapsulated samples into a mass spectrometer wherein the samples are placed in a micro tube and loaded into a circular carousel under a vacuum bell jar maintained at ambient temperature. The samples are systematically advanced by rotating the carousel resulting in each sample sequentially falling through a delivery tube containing an inverted ball valve into a sample vaporizing chamber within an oven. An additional pair of sapphire ball valves in communication with the glass vaporizing chamber are sequentially opened and closed in a preprogrammed manner along with the opening and closing of the thermal inverted ball valve and the indexing of the carousel such as to automatically evacuate the glass inlet system iwthin the oven, introduce a new sample and vaporize it and then inject this vapor into a mass spectrometer.
    Type: Grant
    Filed: September 4, 1987
    Date of Patent: November 7, 1989
    Assignee: R. J. Brunfeldt Company, Inc.
    Inventors: Robert J. Brunfeldt, James C. Jackson
  • Patent number: 4845366
    Abstract: The present invention involves apparatus and methods for introducing ion source material into an ion implant system for use in connection with Freeman type sources. A vaporizer unit which is removable from the system is prepared for insertion into the ion implant equipment outside the system. It is cleaned, a new vial of ion source material is introduced and it may be pre-heated to degas it or to prepare it for use in the system. The vaporizer unit which is currently in use is removed, to be cleaned and recharged, and the previously prepared vaporizer unit is inserted, sealed in place and the vacuum established. The ion implant system is, then, ready to resume operation with minimal down time. The vaporizer unit comprises a vaporizer block of high heat conductive material such as copper which includes three cavities or wells. One cavity contains a heater, one a gas flow path for heating and/or cooling, and one contains a sealed vial of semiconductor dopant.
    Type: Grant
    Filed: October 23, 1987
    Date of Patent: July 4, 1989
    Assignee: Air Products and Chemicals, Inc.
    Inventors: Gregory C. Hoffman, Mark A. Logan, Justice N. Carman
  • Patent number: 4833319
    Abstract: A source of clusters of atoms is provided, wherein the clusters are thermally conditioned after their formation so that the clusters are in the liquid state. A beam of clusters is first formed during the mixing of a stream of atoms and a carrier gas. The beam of clusters mixed with carrier gas is passed through a conditioner, preferably including a heated drift tube, to bring the clusters to a temperature whereat the clusters are in a condensed state without crystalline order, comparable to the liquid state. The conditioned cluster beam passes to vacuum, with separation and removal of a large portion of the carrier gas mixed therewith, so that cooling of the clusters in the cluster beam is minimized during their flight to the cluster target.
    Type: Grant
    Filed: February 27, 1987
    Date of Patent: May 23, 1989
    Assignee: Hughes Aircraft Company
    Inventor: Wolfgang Knauer
  • Patent number: 4814612
    Abstract: This disclosure is concerned with method and apparatus for vaporizing liquid solutions in order to detect, quantitate, and/or determine physical or chemical properties of samples present in liquid solution. Mixtures may be separated by an on-line liquid chromatographic column and the methods used for detection, quantitation, identification, and/or determination of chemical and physical properties include mass spectrometry, photoionization, flame ionization, electron capture, optical photometry, including UV, visible, and IR regions of the spectrum, light scattering, light emission, atomic absorption, and any other technique suitable for detecting or analyzing molecules or particles in a gaseous or vacuum environment. The method and apparatus involves controlled partial vaporization of the solution.
    Type: Grant
    Filed: March 25, 1987
    Date of Patent: March 21, 1989
    Assignee: Research Corporation
    Inventors: Marvin L. Vestal, Calvin R. Blakely, Gordon J. Fergusson
  • Patent number: 4801849
    Abstract: An ion source is described, including a source of neutral particles which arrive at an ionization support positioned inside a chamber which is closed by a cap and which includes lateral walls. The cap includes an outlet orifice opposite which a plate defines a main ionization active surface. An electric field is applied between said device and by an electrode place downstream from the orifice in the direction of ion emission and fitted with a corresponding opening. Overall, the ionization support defines, by virtue of its active surface, and by virtue of holes surrounding said central active surface, a baffle assembly which prevents neutral atoms from passing directly to the outlet orifice, and which contributes to a high degree of ionization.
    Type: Grant
    Filed: November 6, 1987
    Date of Patent: January 31, 1989
    Assignees: Office National D Etudes et de Recherches, Aerospatiales and Universite de Paris-Sud
    Inventors: Georges Slodzian, Bernard Daigne, Francois Girard
  • Patent number: 4780642
    Abstract: Electron cyclotron resonance ion source having an enclosure containing a plasma of ions and electrons formed by electron cyclotron resonance from a sample. The enclosure is connected to a transition cavity by a first conductive duct, and by a second conductive duct traversing the cavity and the first duct. The sample is introduced into the enclosure by the second duct, and the cavity is laterally connected to a vacuum source and to an electromagnetic wave generator by a tight, transparent window.
    Type: Grant
    Filed: March 3, 1987
    Date of Patent: October 25, 1988
    Assignee: Commissariat a l'Energie Atomique
    Inventor: Bernard Jacquot
  • Patent number: 4760263
    Abstract: Metal tetrafluoroborates, alkali and alkaline earth tetrafluoroborates in particular, and preferably lithium tetrafluoroborate are used as ion source materials in ion implantation of semiconductor materials with boron.
    Type: Grant
    Filed: December 29, 1986
    Date of Patent: July 26, 1988
    Assignee: Air Products and Chemicals, Inc.
    Inventors: Andre Lagendijk, Shantia Riahi
  • Patent number: 4755683
    Abstract: A corrosion-resistant, long-life, high-capacity, power-efficient source substructure for a source of liquid-metal ions useable in focused-ion-beam apparatus. The substructure takes the form of an elongate carbon needle, pointed at one end, structurally supported entirely within the turns of an electrical heating coil having end leads which are conductively connected to, and structurally supported by, a pair of larger cross section electrical feeder legs.
    Type: Grant
    Filed: October 5, 1987
    Date of Patent: July 5, 1988
    Assignee: Oregon Graduate Center
    Inventors: Anthony E. Bell, Lynwood W. Swanson
  • Patent number: 4752692
    Abstract: U-shaped billet (52) has a slot (54) cut therein for receipt of a slip of insulator material (56). This body is machined on its front end (64) to produce a narrow bridge (66) of controlled cross-sectional area. Emitter needle (78) is positioned in a bore through the bridge to be heated by current through the bridge. The ion emitter body is rigid and strong to hold the emitter needle in the proper location.
    Type: Grant
    Filed: April 26, 1985
    Date of Patent: June 21, 1988
    Assignee: Hughes Aircraft Company
    Inventors: Jerg B. Jergenson, Charles M. McKenna
  • Patent number: 4730111
    Abstract: This disclosure is concerned with method and apparatus for vaporizing liquid solutions in order to detect, quantitate, and/or determine physical or chemical properties of samples present in liquid solution. Mixtures may be separated by an on-line liquid chromatographic column and the methods used for detection, quantitation, indentification, and/or determination of chemical and physical properties include mass spectrometry, photoionization, flame ionization, electron capture, optical photemetry, including UV, visible, and IR regions of the spectrum, light scattering, light emission, atomic absorption, and any other technique suitable for detecting or analyzing molecules or particles in a gaseous or vacuum environment. The method and apparatus involves controlled partial vaporization of the solution.
    Type: Grant
    Filed: February 24, 1986
    Date of Patent: March 8, 1988
    Assignee: Research Corporation
    Inventors: Marvin L. Vestal, Calvin R. Blakley
  • Patent number: 4728796
    Abstract: A method for the ionization of polymers which comprises forming a thick layer of the polymer on a probe tip and then ionizing the polymer in a vacuum with laser irradiation. In a preferred embodiment, a moiety that readily photoionizes in an IR field is incorporated into the thick layer of polymer and the irradiation of the thus modified polymer is done with a CO.sub.2 IR laser. A method is also disclosed for the fabrication of polymer coatings which comprises accelerating the charged polymer ions generated by the ionization of a thick layer of polymer in a vacuum toward the substrate which has an appropriate charge gradient.
    Type: Grant
    Filed: April 10, 1986
    Date of Patent: March 1, 1988
    Assignee: Medical College of Wisconsin
    Inventor: Charles E. Brown
  • Patent number: 4719355
    Abstract: An ion source of a type used on ion implanters which includes a crucible having a hollow interior and a hole for providing fluid communication between the interior of and exterior to the crucible. A heater assembly is used for adjustably heating the crucible. The crucible hole is if fluid communication with a passageway down the crucible and with a vapor nozzle aperture. An arc chamber has an inlet positioned at the output of the vapor nozzle aperture. The material to be vaporized does not bond to the crucible interior when solidified from a liquid state.
    Type: Grant
    Filed: April 10, 1986
    Date of Patent: January 12, 1988
    Assignee: Texas Instruments Incorporated
    Inventors: Victor Meyers, Michael Relue
  • Patent number: 4714860
    Abstract: An ion generating apparatus utilizing a vacuum chamber, a cathode and an anode in the chamber. A source of electrical power produces an arc or discharge between the cathode and anode. The arc is sufficient to vaporize a portion of the cathode to form a plasma. The plasma is directed to an extractor which separates the electrons from the plasma, and accelerates the ions to produce an ion beam.
    Type: Grant
    Filed: January 30, 1985
    Date of Patent: December 22, 1987
    Inventors: Ian G. Brown, James Galvin
  • Patent number: 4703180
    Abstract: A microwave discharge type ion source incorporating a plurality of vaporizing furnaces for vaporizing and ionizing solid or liquid specimens and suited for use in an ion implantation apparatus. The plurality of vaporizing furnaces are charged with a number of same type specimens or different types of specimens for allowing ionization of a same or different specimens in a continuous manner without interruption for supplementation or exchange of the specimens, the furnaces being then vacuumized. A corresponding number of feeding passages are provided for introducing exchangeably and selectively the vapors produced in the furnaces to the ionization chamber. Exchange of the vapors introduced to the ionization chamber is realized by correspondingly changing over electric heaters provided in association with the vaporizing furnaces, respectively.
    Type: Grant
    Filed: October 28, 1985
    Date of Patent: October 27, 1987
    Assignee: Hitachi, Ltd.
    Inventor: Shunroku Taya
  • Patent number: 4670685
    Abstract: A liquid metal ion source and alloy for the simultaneous ion evaporation of arsenic and boron, arsenic and phosphorus, or arsenic, boron and phosphorus. The ionic species to be evaporated are contained in palladium-arsenic-boron and palladium-arsenic-boron-phosphorus alloys. The ion source, including an emitter means such as a needle emitter and a source means such as U-shaped heater element, is preferably constructed of rhenium and tungsten, both of which are readily fabricated. The ion sources emit continuous beams of ions having sufficiently high currents of the desired species to be useful in ion implantation of semiconductor wafers for preparing integrated circuit devices. The sources are stable in operation, experience little corrosion during operation, and have long operating lifetimes.
    Type: Grant
    Filed: April 14, 1986
    Date of Patent: June 2, 1987
    Assignee: Hughes Aircraft Company
    Inventors: William M. Clark, Jr., Mark W. Utlaut, Joseph A. Wysocki, Edmund K. Storms, Eugene G. Szklarz, Robert G. Behrens, Lynwood W. Swanson, Anthony E. Bell
  • Patent number: 4664769
    Abstract: Plasma enhancement is achieved in a plasma glow system by increasing the number of photoelectric electrons in the plasma glow by producing photoelectrons from the surface of a target in the system by the use of a radiation source. This is more particularly accomplished by flooding the surface of the target with a UV laser beam during the plasma process where emitted photoelectrons are injected into the plasma to increase the plasma density.The plasma enhancement is used in a sputter etching/deposition system which includes a chamber containing a cathode, a target, a substrate platform containing substrate and a pump. An ultraviolet light source such as a UV laser and focussing optics for focussing the UV radiation onto the target through a UV transmission window are also provided. A plasma region in the chamber is enhanced by photons from the laser striking the target and producing photoelectrons which are injected into the plasma to increase its density.
    Type: Grant
    Filed: October 28, 1985
    Date of Patent: May 12, 1987
    Assignee: International Business Machines Corporation
    Inventors: Jerome J. Cuomo, Charles R. Guarnieri