With Object Moving Or Positioning Means Patents (Class 250/442.11)
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Patent number: 8134131Abstract: An object of the invention is to provide a method and apparatus for observing inside structures and a specimen holder, wherein aging degradation of a good sample to a bad sample can be tracked in the same field of view, using the same specimen in order to determine the mechanism of failure. The present invention is a method for observing inside structures. The method comprises irradiating a specimen with a corpuscular beam generated from a corpuscular beam source, detecting transmitted particles transmitted by the specimen, applying a voltage to a portion of the specimen, and observing of a detection status of the transmitted particles in the voltage-applied portion as needed.Type: GrantFiled: December 8, 2008Date of Patent: March 13, 2012Assignee: Hitachi, Ltd.Inventors: Shohei Terada, Kazutoshi Kaji, Shigeto Isakozawa
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Patent number: 8115180Abstract: A processing system includes a particle beam column for generating a particle beam directed to a first processing location; a laser system for generating a laser beam directed to a second processing location located at a distance from the first processing location; and a protector including an actuator and a plate connected to the actuator. The actuator is configured to move the plate between a first position in which it protects a component of the particle beam column from particles released from the object by the laser beam and a second position in which the component of the particle beam column is not protected from particles released from the object by the laser beam.Type: GrantFiled: August 18, 2009Date of Patent: February 14, 2012Assignee: Carl Zeiss NTS GmbHInventors: Holger Doemer, Stefan Martens, Walter Mack
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Patent number: 8101924Abstract: An object-positioning device comprises a rod-like object holder inserted in the chamber of a charged-particle beam system for moving the object outside the chamber, a support for slideably supporting at least a part of the side surface of the object holder, thus making the rear end of the holder outside the chamber a free end, and a vibration-absorbing portion mounted on the rear end of the object holder. The vibration-absorbing portion has an operating range in which vibrational frequencies in a translational direction perpendicular to the longitudinal direction of the object holder are absorbed. The natural vibrational frequency of the object holder in the bending mode is included within the operating range of the vibration-absorbing portion.Type: GrantFiled: November 23, 2009Date of Patent: January 24, 2012Assignee: JEOL Ltd.Inventor: Mitsuru Hamochi
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Patent number: 8089053Abstract: The present invention relates to double-tilt specimen holders of the side-entry type for transmission electron microscopy (TEM). The invention uses Micro Electro Mechanical Systems (MEMS) and Piezoelectric Transducer (PZT) technology to create a digitally programmable dynamically tilting specimen holder integrated into a standard transmission electron microscope stage. In this invention, specimens can be tilted using a MEMS/PZT-actuated specimen holder to between 10 and 25° for stereo pairs and at higher angles (up to 90°) for tomography applications. In one embodiment, the specimen cradle may be effectively rotated 360° about the Y axis, enabling virtually the complete three-dimensional mapping of a specimen.Type: GrantFiled: November 10, 2009Date of Patent: January 3, 2012Inventor: Dudley Sean Finch
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Publication number: 20110309245Abstract: Separation and the like of an excised specimen from a specimen are automatically performed. Marks for improving image recognition accuracy are provided in a region that becomes an excised specimen in a specimen and a region other than said region, or in a transfer means for transferring the excised specimen and a specimen holder capable of holding the excised specimen, and the relative movement of the excised specimen and the specimen, and the like are recognized with high accuracy by image recognition. In the sampling of a minute specimen using a focused ion beam, the detection of an end point of processing for separation of the excised specimen from the specimen, and the like are automatically performed. Thus, for example, unmanned specimen excision becomes possible, and preparation of a lot of specimens becomes possible.Type: ApplicationFiled: October 23, 2009Publication date: December 22, 2011Inventors: Yuichi Madokoro, Tsuyoshi Onishi, Megumi Aizawa, Yukio Yoshizawa
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Publication number: 20110303844Abstract: It is an object of the present invention to provide an electron microscope for properly applying a retarding voltage to a sample which is brought into electrical conduction.Type: ApplicationFiled: October 15, 2009Publication date: December 15, 2011Applicant: HITACHI HIGH-TECHNOLOGIES CORPORATIONInventors: Seiichiro Kanno, Hiroyuki Kitsunai, Masaru Matsushima, Toru Shuto, Kazuyuki Ikenaga
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Patent number: 8076651Abstract: A specimen stage apparatus has a braking structure which can generate a braking force enough to stop a specimen stage while keeping a movable table from increasing in its weight. The specimen stage apparatus has an X guide fixed on an X base and representing a guide structure in X direction, an X table constrained by the X guide to be movable in X direction, an X actuator having its movable part fixed to the X table and an X brake fixed to the X base and representing a braking structure for the X table. A controller carries out positioning control in which it generates a braking force by pushing the X brake against the bottom surface of the X table to stop a specimen stage and turning off the servo-control of the X actuator after stoppage of the specimen stage.Type: GrantFiled: March 31, 2009Date of Patent: December 13, 2011Assignee: Hitachi High-Technologies CorporationInventors: Masahiro Koyama, Hironori Ogawa, Nobuo Shibata, Masaru Matsushima, Toshinori Kobayashi, Shuichi Nakagawa
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Patent number: 8074293Abstract: For adjusting a positional relationship between a specimen and a probe to measure an electric characteristic of the specimen through a contact therebetween, a base table holding a specimen table holding the specimen and a probe holder holding the probe is positioned at a first position to measure the positional relationship between the probe and the specimen at the first position, and subsequently positioned at a second position to measure the positional relationship therebetween at the second position so that the probe and the specimen are contact each other at the second position, the specimen table and the probe holder are movable with respect to each other on the base table at each of the first and second positions to adjust the positional relationship between the probe and the specimen, and a measuring accuracy at the second position is superior to a measuring accuracy at the first position.Type: GrantFiled: May 26, 2009Date of Patent: December 6, 2011Assignee: Hitachi High-Technologies CorporationInventors: Eiichi Hazaki, Yasuhiro Mitsui, Takashi Furukawa, Hiroshi Yanagita, Susumu Kato, Osamu Satou, Osamu Yamada, Yoshikazu Inada
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Patent number: 8063383Abstract: We disclose a precision positioner based on an inertial actuator, an optical instrument for accurate positional readout and control, and an electrostatically clamped assembly for holding any instrument or device. All aspects of the present invention present a significant improvement over the prior art: a positioner is robust and compact; an optical instrument for positional control is a profoundly simple and compact module; a clamping assembly is self-aligning and suitable for robotic hot-swapping of objects being positioned.Type: GrantFiled: November 4, 2008Date of Patent: November 22, 2011Inventors: Sergiy Pryadkin, Dmitri Simonian
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Patent number: 8058613Abstract: The present disclosure describes micromechanical devices and methods for using such devices for characterizing a material's strength. The micromechanical devices include an anchor pad, a top shuttle platform, a nanoindenter in movable contact with the top shuttle platform and at least two sample stage shuttles. The nanoindenter applies a compression force to the top shuttle platform, and the at least two sample stage shuttles move apart in response to the compression force. Each of the at least two sample stage shuttles is connected to the top shuttle platform and to the anchor pad by at least one inclined beam. Methods for using the devices include connecting a sample between the at least two sample stage shuttles and applying a compression force to the top shuttle platform. Application of the compression force to the top shuttle platform results in a tensile force being applied to the sample. Measuring a tip displacement of the nanoindenter is correlated with the sample's strength.Type: GrantFiled: October 28, 2009Date of Patent: November 15, 2011Assignee: William Marsh Rice UniversityInventors: Jun Lou, Yogeeswaran Ganesan, Yang Lu, Cheng Peng
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Patent number: 8058628Abstract: Substrate processing methods and apparatus are disclosed. In some embodiments a substrate processing apparatus may comprise a support structure and a moveable stage including first and second stages. The moveable stage has one or more maglev units attached to the first stage and/or second stage proximate an edge of the first stage. The first stage retains one or more substrates and moves with respect to a first axis that is substantially fixed with respect to the second stage. The second stage translates along a second axis with respect to the support structure. In other embodiments, a primary motor may maintain a rotary stage at an angular speed and/or accelerate or decelerate the stage from a first angular speed to a second angular speed. A secondary motor may accelerate the stage from rest to the first angular speed and/or decelerate the stage from a non-zero angular speed.Type: GrantFiled: July 9, 2008Date of Patent: November 15, 2011Assignee: KLA-Tencor CorporationInventors: Marek Zywno, Noah Bareket
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Patent number: 8050802Abstract: A levitated XY stage with a mechanism to disable the bearing element to allow the physical elements of the stage to come into contact with one another and “Coulomb weld” together, thereby eliminating drift. Preferably, the XY position shift of the stage that results from disabling the bearing is measured, and feed-forward communication to, for example, the AFM scanner is used to enable an offset and remove the error.Type: GrantFiled: November 3, 2006Date of Patent: November 1, 2011Assignee: Bruker Nano, Inc.Inventor: James M. Young
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Patent number: 8044373Abstract: A lithographic apparatus is disclosed having a projection system housing supporting internally one or more lens elements, and a movement damper connected to the projection system housing, the movement damper configured to damp movement of the projection system housing at an eigenfrequency of at least one of the one or more lens elements and/or of the projection system housing.Type: GrantFiled: June 14, 2007Date of Patent: October 25, 2011Assignee: ASML Netherlands B.V.Inventor: Hans Butler
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Publication number: 20110253905Abstract: A specimen holder assembly (500) suitable for tomographic inspection of a specimen in a transmission electron microscope comprising: a body portion (501) in the form of an elongate member arranged to be removably insertable into the column of the microscope; and a manipulator portion having a first axis, the manipulator portion comprising: a specimen mount portion (510) configured to support the specimen; a specimen translation assembly operable to translate the specimen mount portion with respect to the body portion; and a specimen rotation assembly (540) coupled to the body portion and to the specimen translation assembly (530), the specimen rotation assembly being operable to rotate the specimen translation assembly relative to the body portion about the first axis.Type: ApplicationFiled: March 16, 2009Publication date: October 20, 2011Inventors: Guenter Moebus, Guan Wei, Xiaojing Xu, Jing Jing Wang, Ralph Gay, Alden James Lockwood, Beverley Inkson
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Publication number: 20110248165Abstract: A novel specimen holder for specimen support specimen support devices for insertion in electron microscopes. The novel specimen holder of the invention provides mechanical support for specimen support devices and as well as electrical contacts to the specimens or specimen support devices.Type: ApplicationFiled: April 12, 2011Publication date: October 13, 2011Applicant: PROTOCHIPS, INC.Inventors: John Damiano, JR., Stephen E. Mick, David P. Nackashi, Montie Roland, Paul A. Hakenewerth
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Patent number: 8035089Abstract: In a scanning probe apparatus capable of always effectively canceling an inertial force to suppress vibration even in repetitive use while replacing a sample holding table or a probe, a stage for a sample or the probe includes a drive element for moving the sample holding table and movable portions movable in a direction in which an inertial force generated during movement of the sample holding table. The stage is configured so that the drive element, the movable portions, and the sample holding table or the probe are integrally detachably mountable to a main assembly of the scanning probe apparatus.Type: GrantFiled: May 29, 2009Date of Patent: October 11, 2011Assignee: Canon Kabushiki KaishaInventors: Takao Kusaka, Nobuki Yoshimatsu, Susumu Yasuda, Junichi Seki
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Publication number: 20110240881Abstract: The present disclosure significantly reduces the waiting time from inserting a specimen holder into an electron microscope until high quality data acquisition is possible. Characterizing the present disclosure, it is a specimen holder partly made of low thermal expansion material. The low thermal expansion material can be any of group 4, 5 or 6 in the periodic table of the elements.Type: ApplicationFiled: March 14, 2011Publication date: October 6, 2011Inventor: Hiroya Miyazaki
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Patent number: 8030622Abstract: A specimen holder is offered which can reduce the amount of chemical sprayed over a specimen consisting of cultured cells. The specimen holder has an open specimen-holding surface. At least a part of the specimen-holding surface is formed by a film and a tapering portion formed around the film. The specimen can be cultured on the specimen-holding surface of the film. The presence of the tapering portion can reduce the amount of used reagent. The specimen can be irradiated via the film with a primary beam for observation or inspection of the specimen. Consequently, the specimen, such as cells, can be well observed or inspected in vivo while the specimen is being cultured. Especially, if an electron beam is used as the primary beam, the specimen can be well observed or inspected in vivo by SEM (scanning electron microscopy).Type: GrantFiled: June 4, 2009Date of Patent: October 4, 2011Assignee: JEOL Ltd.Inventors: Hidetoshi Nishiyama, Mitsuru Koizumi, Mitsuo Suga
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Patent number: 8008637Abstract: A semiconductor device fabrication apparatus includes a load lock chamber, a loading assembly in the load lock chamber, and an ion implantation target chamber that is hermetically connected to the load lock chamber. The load lock chamber is configured to store a plurality of wafer plates. Each wafer plate respectively includes at least one semiconductor wafer thereon. The ion implantation target chamber is configured to implant an ion species into a semiconductor wafer on a currently loaded wafer plate. The loading assembly is also configured to load a next one of the plurality of wafer plates from the load lock chamber into the ion implantation target chamber. The loading assembly may be configured to load the next wafer plate from the load lock chamber into the ion implantation target chamber while substantially maintaining a current temperature within the ion implantation target chamber and/or without depressurizing the ion implantation target chamber. Related methods and devices are also discussed.Type: GrantFiled: April 13, 2009Date of Patent: August 30, 2011Assignee: Cree, Inc.Inventor: Alexander Suvorov
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Patent number: 8003955Abstract: A sample manipulation device comprises an observation unit, which is used to observe a sample and to select a target position at which a portion to be removed from the sample is located, and a specimen stage which receives the sample. The sample manipulation device may include a manipulation tool, which is spatially shiftable relative to the observation unit and comprises a manipulation tip by which portions are removed from the sample, a control unit, which controls the shifting of the manipulation tool, as well as an optical position measurement unit, which is connected to the control unit and is used to determine the actual position of the manipulation tip, so that specific shifting of the manipulation tip to the target position can be carried out.Type: GrantFiled: September 29, 2006Date of Patent: August 23, 2011Inventor: Roland Kilper
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Publication number: 20110198326Abstract: A processing system includes a common base, an object mount configured to hold an object for inspection or processing, and at least one aperture plate provided on the object mount. The aperture plate has at least one aperture The processing system also includes a laser device mounted on the common base and configured to scan a laser beam across a scan region, and a transport device configured to displace the object mount relative to the common base from a first position to a second position. When the object mount is in the first position, the object and the at least one aperture are positioned within the scan region of the laser device. The processing system also includes at least one light guide provided on the object mount. The light guide has an input port provided by the at least one aperture, and an output port.Type: ApplicationFiled: February 17, 2011Publication date: August 18, 2011Applicant: CARL ZEISS NTS GMBHInventor: Holger Doemer
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Publication number: 20110198512Abstract: An object of the invention is to provide a charged corpuscular beam apparatus which is equipped with a static elimination mechanism suitable for eliminating electric charges deposited on front and back surfaces of a specimen. To achieve the foregoing object, there is proposed a static elimination mechanism which includes a first ionizer for eliminating electric charges from the front surface of the specimen, and a second ionizer for eliminating electric charges from the back surface of the specimen. The first and second ionizers are disposed in a mini-environment, and are arranged along a downflow in the mini-environment. A specimen carrying mechanism is disposed so that the specimen can pass between the two ionizers.Type: ApplicationFiled: October 15, 2009Publication date: August 18, 2011Inventors: Koki Miyahara, Katsuya Kawakami, Masahiro Tsunoda, Takashi Gunji
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Publication number: 20110196223Abstract: The invention relates to a method and apparatus for charged particle tomographic imaging using a tomography system. The tomography imaging system is optionally simultaneously operational with a charged particle cancer therapy system using common elements, allows tomographic imaging with rotation of the patient, is operational on a patient in an upright, semi-upright, and/or horizontal position, is simultaneously operational with X-ray imaging, and/or allows use of adaptive charged particle cancer therapy. The common tomography and cancer therapy apparatus elements are operational in a multi-axis and/or multi-field raster beam mode.Type: ApplicationFiled: April 14, 2011Publication date: August 11, 2011Inventor: Vladimir Balakin
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Patent number: 7989784Abstract: A hydrogen ion implanter for the exfoliation of silicon from silicon wafers uses a large scan wheel carrying 50+ wafers around its periphery and rotating about an axis. In one embodiment, the axis of rotation of the wheel is fixed and a ribbon beam of hydrogen ions is directed down on a peripheral edge of the wheel. The ribbon beam extends over the full radial width of wafers on the wheel. The beam is generated by an ion source providing an extracted ribbon beam having at least 100 mm major cross-sectional diameter. The ribbon beam may be passed through a 90° bending magnet which bends the beam in the plane of the ribbon. The magnet provides intensity correction across the ribbon to compensate for the dependency on the radial distance from the wheel axis of the speed at which parts of the wafers pass through the ribbon beam.Type: GrantFiled: June 30, 2009Date of Patent: August 2, 2011Assignee: Twin Creeks Technologies, Inc.Inventors: Hilton Glavish, Geoffrey Ryding, Theodore H. Smick, Kenneth Harry Purser
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Patent number: 7989778Abstract: A charged-particle optical system (100) such as an electron microscope has a vacuum chamber (102) with a space (104) for accommodating a specific one (114) of multiple specimens in operational use. The charged-particle optical system has a loader (106) with a part (108) that is moveable into and out of the space. The part is configured for attaching a specimen carrier (110), brought from outside the system, to a first holder (112) or to detach the carrier from the first holder and to remove the carrier from inside the system. The carrier accommodates a first specimen. The system has an interface (116) in a wall of the chamber for removably accommodating the first holder (112) or a second holder (118) with a second specimen (120) mounted thereon.Type: GrantFiled: October 29, 2009Date of Patent: August 2, 2011Assignee: FEI CompanyInventors: Johannes Antonius Maria Van Den Oetelaar, Jorn Hermkens, Pleun Dona, Frank Nederlof, Wim Wondergem
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Publication number: 20110180724Abstract: A sample transfer device is provided which can insert to a charged particle beam apparatus a sample to be observed and analyzed under irradiation of a charged particle beam while suppressing to a minimum the time to expose the sample to the atmospheric environment. The sample transfer device for transferring the sample to be observed and analyzed by irradiating the charged particle beam comprises an expansible hollow member capable of accommodating a sample holder mounting the sample, a fixing member for fixing the sample holder within the expansible hollow member, and a sealing member communicating with the interior of the expansible hollow member to open/close an opening through which the sample holder passes.Type: ApplicationFiled: January 27, 2011Publication date: July 28, 2011Inventors: Shohei TERADA, Tatsumi Hirano, Koichi Watanabe, Yasuichiro Watanabe, Hiromitsu Seino
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Patent number: 7957501Abstract: The present invention provides a system and method for a system for accommodating a solid target in an accelerator. The system and method includes a target changer having at least one port for accommodating the solid target, an insert for receiving the solid target in the target changer, a piston for providing a vacuum and a cooling system for the solid target, a cylinder for displacing the piston in one of three positions; and a bracket for securing the insert, piston and cylinder to the target changer.Type: GrantFiled: October 5, 2010Date of Patent: June 7, 2011Assignee: Siemens Medical Solutions USA, Inc.Inventor: Andrew C. Williamson
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Patent number: 7956333Abstract: A moving module of a wafer ion-implanting machine includes a wafer carrier, a moving shaft, a base, a pair of first magnets, a fixture body, and a plurality of second magnets. One end of the wafer carrier is pivotally connected to a wafer tray; and the other end is fixed onto one end of the moving shaft. The base is fixed to the other end of the moving shaft. The moving shaft drives the wafer carrier and the base to move lengthwise. The pair of first magnets is fixed to the base. The fixture body is located between the pair of first magnets. The second magnets are fixed onto the fixture body and one of them forms compelling magnetic force between one of the first magnets. Thereby, the friction generated by contacting any of the first magnets with the fixture body can be prevented, thus increasing the production yield.Type: GrantFiled: June 25, 2009Date of Patent: June 7, 2011Assignee: Inotera Memories, Inc.Inventor: Ting-Wei Lin
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Publication number: 20110127427Abstract: A novel specimen holder for specimen support devices for insertion in electron microscopes. The novel specimen holder of the invention provides mechanical support for specimen support devices and as well as electrical contacts to the specimens or specimen support devices.Type: ApplicationFiled: March 17, 2009Publication date: June 2, 2011Applicant: PROTOCHIPS, INC.Inventors: David P. Nackashi, John Damiano, JR., Stephen E. Mick, Thomas G. Schmelzer, Michael Zapata, III
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Patent number: 7935937Abstract: A TEM sample holder is formed from at least one nano-manipulator probe tip and a TEM sample holder pre-form. The probe tip is permanently attached to the TEM sample-holder pre-form to create a TEM sample holder before attachment of a sample to the point of the probe tip inside a FIB. In the preferred embodiment the probe tip is attached to the TEM sample holder pre-form by applying pressure to the pre-form and the probe tip, so as to cause plastic flow of the pre-form material about the probe tip. The TEM sample holder may have smaller dimensions than the TEM sample holder pre-form; in this case the TEM sample holder is cut from the larger TEM sample holder pre-form, preferably in the same operation as attaching the probe tip.Type: GrantFiled: February 24, 2009Date of Patent: May 3, 2011Assignee: Omniprobe, In.cInventors: Thomas M. Moore, Gonzalo Amador, Lyudmila Zaykova-Feldman
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Patent number: 7932494Abstract: A method of characterizing the vibrational performance of a charged particle beam microscope system having at least one encoder is disclosed. The encoder is part of a control system for controlling the speed of a stage whereupon a sample is secured for imaging. A plurality of images each corresponding to a specific encoder working frequency are analyzed to generate imaged pattern vibration amplitude information over an imaging time period. The generated imaged pattern vibration amplitude information is then transformed to generate an imaged pattern vibration amplitude information over a range of encoder working frequencies. Information of system vibrational performance is then derived from the encoder working frequency-based vibration amplitude information. As a result, the vibrational performance of the system is characterized to describe the system vibrational behavior in terms of imaged pattern vibration amplitudes at varying working frequencies of the encoder.Type: GrantFiled: March 3, 2009Date of Patent: April 26, 2011Assignee: Hermes Microvision, Inc.Inventor: Nan Zhang
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Patent number: 7919760Abstract: The present invention relates to an operation stage of a charged particle beam apparatus which is employed in a scanning electron microscope for substrate (wafer) edge and backside defect inspection or defect review. However, it would be recognized that the invention has a much broader range of applicability. A system and method in accordance with the present invention provides an operation stage for substrate edge inspection or review. The inspection region includes top near edge, to bevel, apex, and bottom bevel. The operation stage includes a supporting stand, a z-stage, an X-Y stage, an electrostatic chuck, a pendulum stage and a rotation track. The pendulum stage mount with the electrostatic chuck has the ability to swing from 0° to 180° while performing substrate top bevel, apex and bottom bevel inspection or review.Type: GrantFiled: December 9, 2008Date of Patent: April 5, 2011Assignee: Hermes-Microvision, Inc.Inventors: Jack Jau, Hong Xiao, Joe Wang, Zhongwei Chen, Yi Xiang Wang, Edward Tseng
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Patent number: 7906760Abstract: An electron microscope method for inspecting a liquid specimen and a reagent solution therefor. A culture medium and biological cells are put in the sample holder. A plugging agent is mixed into the liquid sample. The cells can be irradiated with a primary beam via a film. An image of the cells or information about the cells is obtained by detecting a resulting secondary signal. If the film is destroyed, the plugging agent plugs up the damaged portion of the film. Consequently, liquid leakage can be minimized.Type: GrantFiled: December 15, 2008Date of Patent: March 15, 2011Assignee: JEOL Ltd.Inventors: Hidetoshi Nishiyama, Mitsuo Suga, Mitsuru Koizumi
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Patent number: 7906762Abstract: A compact electron microscope uses a removable sample holder having walls that form a part of the vacuum region in which the sample resides. By using the removable sample holder to contain the vacuum, the volume of air requiring evacuation before imaging is greatly reduced and the microscope can be evacuated rapidly. In a preferred embodiment, a sliding vacuum seal allows the sample holder to be positioned under the electron column, and the sample holder is first passed under a vacuum buffer to remove air in the sample holder.Type: GrantFiled: June 7, 2007Date of Patent: March 15, 2011Assignee: FEI CompanyInventors: Mart Petrus Maria Bierhoff, Bart Buijsse, Cornelis Sander Kooijman, Hugo Van Leeuwen, Hendrik Gezinus Tappel, Colin August Sanford, Sander Richard Marie Stoks, Ben Jacobus Marie Bormans, Steven Berger, Koen Arnoldus Wilhelmus Driessen, Johannes Antonius Hendricus Wilhelmus Gerardus Persoon
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Patent number: 7897936Abstract: A sample fabricating method of irradiating a sample with a focused ion beam at an incident angle less than 90 degrees with respect to the surface of the sample, eliminating the peripheral area of a micro sample as a target, turning a specimen stage around a line segment perpendicular to the sample surface as a turn axis, irradiating the sample with the focused ion beam while the incident angle on the sample surface is fixed, and separating the micro sample or preparing the micro sample to be separated. A sample fabricating apparatus for forming a sample section in a sample held on a specimen stage by scanning and deflecting an ion beam, wherein an angle between an optical axis of the ion beam and the surface of the specimen stage is fixed and formation of a sample section is controlled by turning the specimen stage.Type: GrantFiled: July 5, 2007Date of Patent: March 1, 2011Assignee: Hitachi, Ltd.Inventors: Hiroyasu Shichi, Tohru Ishitani, Hidemi Koike, Kaoru Umemura, Eiichi Seya, Mitsuo Tokuda, Satoshi Tomimatsu, Hideo Kashima, Muneyuki Fukuda
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Patent number: 7888655Abstract: The invention relates to a transfer mechanism for transferring a specimen (2) from a first position in a first holder (40) to a second position in a second holder (10) and/or vice versa, each holder (10, 40) equipped to detachably hold the specimen, the transfer of the specimen between the holders taking place in a transfer position different from the second position, characterized in that when the specimen is transferred between the holders (10, 40) a mechanical guidance mechanism positions the holders with a mutual accuracy higher than the mutual accuracy in the second position, and said mechanical guidance mechanism not positioning at least one of the holders (10, 40) when the specimen is in the second position. The mechanical guidance mechanism may comprise extra parts (50). At least one of the holders (40) may be equipped to hold a multitude of specimens.Type: GrantFiled: July 25, 2007Date of Patent: February 15, 2011Assignee: FEI CompanyInventors: Erik Pieter van Gaasbeek, Pleun Dona, Gerbert Jeroen van de Water, Johannes Antonius Maria van den Oetelaar, Paul Johannes Leonardes Barends, Ian Johannes Bernardus van Hees
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Patent number: 7888639Abstract: An object of the invention is to realize a method and an apparatus for processing and observing a minute sample which can observe a section of a wafer in horizontal to vertical directions with high resolution, high accuracy and high throughput without splitting any wafer which is a sample. In an apparatus of the invention, there are included a focused ion beam optical system and an electron optical system in one vacuum container, and a minute sample containing a desired area of the sample is separated by forming processing with a charged particle beam, and there are included a manipulator for extracting the separated minute sample, and a manipulator controller for driving the manipulator independently of a wafer sample stage.Type: GrantFiled: October 31, 2007Date of Patent: February 15, 2011Assignee: Hitachi, Ltd.Inventors: Mitsuo Tokuda, Muneyuki Fukuda, Yasuhiro Mitsui, Hidemi Koike, Satoshi Tomimatsu, Hiroyasu Shichi, Hideo Kashima, Kaoru Umemura
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Patent number: 7888643Abstract: The invention relates to a focusing and positioning ancillary device for a particle-optical scanning microscope, a particle-optical scanning microscope including a corresponding positioning aid, and a method for focusing and positioning an object in a particle-optical scanning microscope. The focusing and positioning ancillary device includes an illuminating device, a camera, a display and a control unit. The illuminating device produces a collimated or focused light beam at an angle to the particle-optical beam axis which intersects the particle-optical beam axis at a predetermined position. The camera is sensitive to the wavelength of the light beam and records an image of the object, which is positioned on the object table, at a second angle to the particle-optical beam axis. The control unit produces an image captured by the camera on the display together with a marking which indicates the position of the particle-optical beam axis in the image.Type: GrantFiled: August 1, 2008Date of Patent: February 15, 2011Assignee: Carl Zeiss NTS GmbHInventor: Michael Albiez
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Patent number: 7884326Abstract: A manipulator for use in e.g. a Transmission Electron Microscope (TEM) is described, said manipulator capable of rotating and translating a sample holder (4). The manipulator clasps the round sample holder between two members (3A, 3B), said members mounted on actuators (2A, 2B). Moving the actuators in the same direction results in a translation of the sample holder, while moving the actuators in opposite directions results in a rotation of the sample holder.Type: GrantFiled: September 26, 2007Date of Patent: February 8, 2011Assignees: FEI Company, The Board of Trustees of the University of Illinois, The Regents of the University of CaliforniaInventors: Jeroen van de Water, Johannes van den Oetelaar, Raymond Wagner, Hendrik Nicolaas Slingerland, Jan Willem Bruggers, Adriaan Huibert Dirk Ottevanger, Andreas Schmid, Eric A. Olson, Ivan G. Petrov, Todor I. Donchev, Thomas Duden
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Publication number: 20110017922Abstract: A variable-tilt specimen holder for a charged particle instrument having a tilt stage, where the tilt stage has a maximum range of tilt, a sample plate affixed to the tilt stage, and an ion-beam column having an ion-beam column axis. The variable-tilt specimen holder has a base for mounting to the sample plate, so that the base is substantially parallel to the tilt stage. Bearing blocks on the base rotatably support a pivot plate that has slots for holding TEM specimens or TEM grids holding specimens. The pivot plate is rotatable so that the TEM specimens held therein can be aligned with the axis of the ion beam column for thinning of the specimen.Type: ApplicationFiled: July 24, 2009Publication date: January 27, 2011Applicant: OMNIPROBE, INC.Inventor: Gonzalo Amador
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Patent number: 7875861Abstract: The invention relates to a positioning device for positioning a patient in a medical device comprising a patient receiving device for placing a patient and a robot arm having a plurality of movement axes for positioning the patient receiving device in a room. The positioning device can be placed into a manual operating mode in which a position of the patient receiving device in the room can be changed manually. The invention also relates to a method for operating the positioning device, comprising: providing a normal operating mode for positioning the patient receiving device automatically at a position predefined by a control device; providing a manual operating mode for manually changing a position of the patient receiving device; and switching from the normal operating mode into the manual operating mode if a switchover condition is present. The invention further relates to an irradiation device having the positioning device.Type: GrantFiled: January 15, 2009Date of Patent: January 25, 2011Assignee: Siemens AktiengesellschaftInventors: Stefan Hüttenberger, Eike Rietzel
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Patent number: 7872231Abstract: In a chamber of a charged particle beam apparatus, the sample on the sample substrate is gripped and carried to the sample holder, and there is controlled the attitude of the sample when the sample is fixed on the sample holder. There possesses a marking process applying, in the chamber, a marking to a surface of the sample Wb existing on the sample substrate by a beam, a carriage process gripping the sample by a sample gripping means and carrying it from the sample substrate to the sample holder, and an attitude control process controlling, when fixing the sample to the sample holder, the attitude of the sample while observing the marking applied to the surface of the sample.Type: GrantFiled: March 12, 2008Date of Patent: January 18, 2011Assignee: Sll NanoTechnology Inc.Inventors: Junichi Tashiro, Masanao Munekane
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Patent number: 7868303Abstract: A patterning device handling apparatus for use in charged particle beam imaging is disclosed. The disclosed patterning device handling apparatus comprises a first gripping member and a second gripping member. The first gripping member is equipped with a plurality of first positioning projections, and the second gripping member is equipped with a plurality of second positioning projections. When the patterning device is held at one angle, the first positioning projections abut against one edge of the patterning device and the second positioning projections abut against the opposite edge of the patterning device. When the patterning device is held at another angle, the first positioning projections abut against two neighboring edges of the patterning device, and the second positioning projections abut against the other two neighboring edges of the patterning device. Therefore, the disclosed patterning device handling apparatus can hold the pattering device at different angles.Type: GrantFiled: October 10, 2008Date of Patent: January 11, 2011Assignee: Hermes Microvision, Inc.Inventors: You-Jin Wang, Hsuan-Bin Huang, Chung-Shih Pan
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Publication number: 20100320396Abstract: A sample holder capable of holding samples is provided which comprises a plurality of probes in contact with a sample, fine movement mechanisms for moving the plural probes, and a driver connected to the fine movement mechanisms, wherein the plural fine movement mechanisms move the plural probes independently of one another and the driver moves the plural probes simultaneously.Type: ApplicationFiled: June 17, 2010Publication date: December 23, 2010Inventors: Shohei TERADA, Tatsumi Hirano
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Patent number: 7851769Abstract: The invention relates to a motorized manipulator for positioning a TEM specimen holder with sub-micron resolution parallel to a y-z plane and rotating the specimen holder in the y-z plane, the manipulator comprising a base (2), and attachment means (30) for attaching the specimen holder to the manipulator, characterized in that the manipulator further comprises at least three nano-actuators (3a, 3b, 3c) mounted on the base, each nano-actuator showing a tip (4a, 4b, 4c), the at least three tips defining the y-z plane, each tip capable of moving with respect to the base in the y-z plane; a platform (5) in contact with the tips of the nano-actuators; and clamping means (6) for pressing the platform against the tips of the nano-actuators; as a result of which the nano-actuators can rotate the platform with respect to the base in the y-z plane and translate the platform parallel to the y-z plane.Type: GrantFiled: October 17, 2008Date of Patent: December 14, 2010Assignee: The Regents of the University of CaliforniaInventors: Andreas Karl Schmid, Nord Andresen
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Publication number: 20100305747Abstract: An improved method and apparatus for extracting and handling samples for S/TEM analysis. Preferred embodiments of the present invention make use of a micromanipulator and a hollow microprobe probe using vacuum pressure to adhere the microprobe tip to the sample. By applying a small vacuum pressure to the lamella through the microprobe tip, the lamella can be held more securely and its placement controlled more accurately than by using electrostatic force alone. By using a probe having a beveled tip and which can also be rotated around its long axis, the extracted sample can be placed down flat on a sample holder.Type: ApplicationFiled: October 20, 2007Publication date: December 2, 2010Applicant: FEI COMPANYInventors: Enrique Agorio, James Edgar Hudson, Gerhard Daniel, Michael Tanguay, Jason Arjavac
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Patent number: 7838848Abstract: A patterning device holding apparatus includes a support platform unit with a plurality of first positioning projections and a gripper unit. The gripper unit includes a head portion and a plurality of second positioning projections disposed on the head portion, and a rolling member set at a base portion. The grapping and releasing of the patterning device is achieved by the rotation of the gripper unit about a pivot substantially parallel with the center axis of the rolling member. The first and second positioning projections corporately abut against the edges of a patterning device to fix the patterning device in place.Type: GrantFiled: October 23, 2008Date of Patent: November 23, 2010Assignee: Hermes Microvision, Inc.Inventors: Hsuan-Bin Huang, You-Jin Wang, Chung-Shih Pan
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Publication number: 20100270476Abstract: The invention can provide a reaction force treatment mechanism used in a stage apparatus including a pedestal, a platen which supported by the pedestal through a vibration isolation unit, a mobile body which supported by the platen and moves on the platen, and an actuator which actuates the mobile body in one direction, the reaction force treatment mechanism including: a connection portion which connects a stator of the actuator to the pedestal through an stress relief mechanism for absorbing displacement in a direction different from the one direction; and a guide portion which movably guides the stator of the actuator in the one direction while restraining the stator of the actuator relative to the platen in a direction different from the one direction.Type: ApplicationFiled: April 28, 2010Publication date: October 28, 2010Applicant: SUMITOMO HEAVY INDUSTRIES, LTD.Inventors: Jun NISHIMAKI, Yasuhito NAKAMORI, Yoshiyuki TOMITA
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Publication number: 20100264330Abstract: An apparatus capable of improving image quality by making it possible to suck specimens of different sizes electrostatically, and uniformalizing an electric field of a specimen edge portion, while suppressing increase in prime cost is provided. Specimen holding means is an electrostatic chuck, a master flat plane part surrounding a specimen of the largest size of specimen sizes, and an opening surrounding a specimen size except for the largest specimen size are included at an outer peripheral portion of the electrostatic chuck, a dummy specimen attachable to and detachable from the electrostatic chuck is included, and at a time of switching the specimen size, a dummy specimen is selected (or may be prevented from being used).Type: ApplicationFiled: July 1, 2010Publication date: October 21, 2010Applicant: HITACHI HIGH-TECHNOLOGIES CORPORATIONInventors: Masaki MIZUOCHI, Shoji Tomida
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Publication number: 20100258432Abstract: A sputtering apparatus includes a substrate holder, a magnetic field applying unit, and target mounting table. The substrate holder includes a first stage which can mount a substrate and can rotate about a first rotating shaft, a second stage which can rotate about a second rotating shaft shifted from the first rotating shaft, a spinning unit which rotates the first stage about the first rotating shaft, and a revolving unit which revolves the first stage about the second rotating shaft. The magnetic field applying unit applies a magnetic field in a specific direction to the substrate. The target mounting table can mount a target configured to deposit a film on the substrate. The spinning unit rotates the first stage in a direction opposite to that of the rotation of the revolving unit, and rotates the first stage so as to maintain the specific direction of the magnetic field.Type: ApplicationFiled: June 24, 2010Publication date: October 14, 2010Applicant: CANON ANELVA CORPORATIONInventor: Franck ERNULT