Abstract: Information of a specimen holder or information of a specimen mounted on the specimen holder is stored in a memory inside the specimen holder mounted to an electron microscope. The memory is accessed to transmit the information of the specimen holder to the electron microscope, thereby ensuring that the user can use the specimen holder without mistaking characteristics of the specimen holder and danger of erroneous recording of the specimen information can be reduced.

Abstract: A specimen kit for enclosing a specimen is described, including a first substrate, a second substrate and a sealant. The first substrate has a first observation window at which a thickness thereof is smaller than that of the other parts thereof. The second substrate has a second observation window at which a thickness thereof is smaller than that of the other parts thereof, and is disposed on the first substrate such that the second observation window is aligned to the first observation window and an interval is present between the first and the second substrates. The sealant is disposed between the first and the second substrates and surrounds the first and the second observation windows to seal a space between fringes of the first and the second substrate, thus defining a specimen cell between the first and the second substrates.

Abstract: A manipulator for use in e.g. a Transmission Electron Microscope (TEM) is described, said manipulator capable of rotating and translating a sample holder (4). The manipulator clasps the round sample holder between two members (3A, 3B), said members mounted on actuators (2A, 2B). Moving the actuators in the same direction results in a translation of the sample holder, while moving the actuators in opposite directions results in a rotation of the sample holder.

Abstract: There is provided a mini environment type transfer unit which can efficiently transfer a sample to a critical dimension scanning electron microscope (CD-SEM) even in the case of use of a SMIF pod which can store only one photomask. In addition to a load port, a stocker which can store a plurality of photomasks is provided in the mini environment type transfer unit. A mask storage slot in which a plurality of storage units are stacked is provided in the stocker, and one photomask is stored in each storage unit. A sensor is provided in each storage unit to determine whether or not the photomask is normally stored. Additionally, a sensor is provided in each storage unit to detect whether or not the photomask exists.

Abstract: The present invention relates to an inertial slider (10) and a method for safely and controllably approach an object (2) towards a fixed object (3) for instance inside a transmission electron microscope (101). The inertial slider is controlled with a control signal (201) with a timing characteristic faster than a mechanical resonance of the object to be moved. The inertial slider moves in a first step away from the fixed object and the movable object is moved relative the inertial slider in that first step.

Abstract: A method for adjusting an operating parameter of a particle beam device and a sample holder, which is suitable in particular for performing the method are provided. An adjustment of an operating parameter of a particle beam device is possible without transfer of the sample holder out of the particle beam device. A reference sample is placed in a first sample receptacle, so that in ongoing operation of the particle beam device, the sample holder need only be positioned in such a way that the reference sample is bombarded and measured with the aid of a particle beam generated in the particle beam device.

Abstract: The invention relates to a composite structure of a sample carrier 20 and a sample holder 30 for use in a TEM, for example. The sample carrier is hereby separately embodied from the sample holder. Although such compositions are already known, the known compositions are very fragile constructions. The sample carrier according to the invention can be formed from a strip of metal, and is a simple and cheap element. Using resilient force, it clamps onto or into the sample holder. The portion of the sample holder to which the sample carrier couples also has a simple form. The sample carrier can couple to the sample holder in vacuum using a coupling tool.

Abstract: A method of characterizing the vibrational performance of a charged particle beam microscope system having at least one encoder is disclosed. The encoder is part of a control system for controlling the speed of a stage whereupon a sample is secured for imaging. A plurality of images each corresponding to a specific encoder working frequency are analyzed to generate imaged pattern vibration amplitude information over an imaging time period. The generated imaged pattern vibration amplitude information is then transformed to generate an imaged pattern vibration amplitude information over a range of encoder working frequencies. Information of system vibrational performance is then derived from the encoder working frequency-based vibration amplitude information. As a result, the vibrational performance of the system is characterized to describe the system vibrational behavior in terms of imaged pattern vibration amplitudes at varying working frequencies of the encoder.

Abstract: An electron microscope stage mechanism capable of performing high-accuracy positioning while limiting vibration and drift. An ultrasonic motor is used in a stage drive mechanism, and a fixing mechanism capable of increasing stop stiffness is combined integrally with the motor. That is, a structure in which a piezoelectric actuator of the fixing mechanism is mounted in a pre-load mechanism together with the ultrasonic motor is used. When the stage is fixed by the fixing mechanism after acceleration, deceleration and positioning of the stage performed by the drive mechanism, the piezoelectric actuators positioned on opposite sides of the stage are extended to press the stage.

Abstract: A specimen holding device has a plurality of electrodes, and a moving mechanism for moving upward and downward a part of the plurality of electrodes. Further, the moving mechanism moves the part of the plurality of electrodes downward to evacuate from a path through which a specimen is introduced. Further, the specimen holding device has a positioning member for the specimen so that the specimen is positioned after being mounted.

Abstract: The invention relates to a composite structure of a sample carrier 20 and a sample holder 30 for use in a TEM, for example. The sample carrier is hereby separately embodied from the sample holder. Although such compositions are already known, the known compositions are very fragile constructions. The sample carrier according to the invention can be formed from a strip of metal, and is a simple and cheap element. Using resilient force, it clamps onto or into the sample holder. The portion of the sample holder to which the sample carrier couples also has a simple form. The sample carrier can couple to the sample holder in vacuum using a coupling tool.

Abstract: A scanning probe apparatus for obtaining information of a sample, recording information in the sample, or processing the sample with relative movement between the sample and the apparatus, the apparatus is constituted by a probe; and a scanning stage including a drive element for moving a sample holding table for holding the sample and a movable portion movable in a direction in which an inertial force generated during movement of the sample holding table is cancelled. The scanning stage further includes a memory for storing characteristic information of the scanning stage and is detachably or replaceably mountable to a main assembly of the apparatus.

Abstract: An apparatus capable of improving image quality by making it possible to suck specimens of different sizes electrostatically, and uniformalizing an electric field of a specimen edge portion, while suppressing increase in prime cost is provided. Specimen holding means is an electrostatic chuck, a master flat plane part surrounding a specimen of the largest size of specimen sizes, and an opening surrounding a specimen size except for the largest specimen size are included at an outer peripheral portion of the electrostatic chuck, a dummy specimen attachable to and detachable from the electrostatic chuck is included, and at a time of switching the specimen size, a dummy specimen is selected (or may be prevented from being used).

Abstract: According to the present invention, a charged particle beam device has an unlimitedly rotatable sample stage and an electric field control electrode for correcting electric field distortion at a sample peripheral part. A voltage is applied to a sample on the unlimitedly rotatable sample stage through a retarding electrode that is in contact with a holder receiver at a rotation center of a rotary stage. An equipotential plane on the electric field control electrode is varied by applying a voltage to the electric field control electrode, and following this the equipotential plane at a sample edge is corrected, which enables the sample to be observed as far as its edge.

Abstract: A method and a device for preparing specimens for a cryo-electron microscope are described. A carrier is fixed to a holder, sample liquid is applied to the carrier, and a blotting device for removing excess sample liquid from the carrier by means of the absorbing medium is applied. The absorbing medium is illuminated with light and a change in the optical properties of the absorbing medium is detected by means of an optical sensor device. A control moves the blotting away from the carrier depending on a change in the detected optical properties.

Abstract: An assembly for holding a microscopy sample for storage, observation, manipulation, characterization and/or study of the sample using a microscopy instrument is provided. The assembly includes mating first and second parts having faces between which a microscopy sample, including a TEM grid mounted sample, is secured. A spring is used to provide compression between the faces. A rotatable member such as a threaded screw is operable to draw the parts apart from one another. An annular wall functions to protect microscopy samples held in the assembly from damage.

Abstract: Techniques for uniformity tuning in an ion implanter system are disclosed. In one particular exemplary embodiment, the techniques may be realized as a method for ion beam uniformity tuning. The method may comprise generating an ion beam in an ion implanter system. The method may also comprise measuring a first ion beam current density profile along an ion beam path. The method may further comprise measuring a second ion beam current density profile along the ion beam path. In addition, the method may comprise determining a third ion beam current density profile along the ion beam path based at least in part on the first ion beam current density profile and the second ion beam current density profile.

Abstract: A positioning device for positioning an aperture plate in an ion beam of an ion implantation system has two fixture parts that can be moved relative to each other by means of at least one positioning drive, of which the one fixture part can be connected or is connected to an abutment point that is disposed in a fixed location relative to an ion beam source, and the other fixture part can be connected or is connected to the aperture plate. An adjustment device has a fixture device and a display device. By means of the position-changing device, it is possible to change the position of at least one of the fixture parts relative to the positioning drive. By means of the display device it is possible to check whether the fixture parts are in a predetermined position relative to each other.

Abstract: A workpiece or semiconductor wafer is tilted as a ribbon beam is swept up and/or down the workpiece. In so doing, the implant angle or the angle of the ion beam relative to the workpiece remains substantially constant across the wafer. This allows devices to be formed substantially consistently on the wafer. Resolving plates move with the beam as the beam is scanned up and/or down. This allows desired ions to impinge on the wafer, but blocks undesirable contaminants.

Abstract: The present invention relates to an irradiation device for material test using a gamma ray radiated from a spent nuclear fuel assembly and provides the irradiation device for material test using a gamma ray radiated from a spent nuclear fuel assembly wherein an irradiation device for material test to achieve a radiation effect evaluation is manufactured to be movable upward, downward and horizontally in order to study the hardening phenomenon of the frail materials to the radiation among the atomic power facilities using a gamma ray radiated from a spent nuclear fuel assembly, thereby it is possible to adjust a position of the spent nuclear fuel used for material test using a gamma ray radiated from a spent nuclear fuel and a test material, identify a distance between the spent nuclear fuel and the test material easily with a scale and evaluate the radiation effects on the materials used at facilities handling a spent nuclear fuel under the same situation as they are really exposed.

Abstract: An ion implantation method for achieving angular uniformity throughout a workpiece and application thereof are provided. The ion beam has at least one beamlet striking the workpiece surface with corresponding incident angles. The workpiece is mapped to an imaginary planar coordinate system. The incident angle of a center beamlet of the ion beam has a projection on the coordinate system forming a projection angle with an axis thereof. A workpiece orientation of the workpiece is adjusted based on the projection angle such that the contribution of each beamlet to the overall ion beam intensity upon striking the workpiece surface is rendered substantially the same from respective directions of each of the coordinate axes.

Abstract: A specimen holder, a specimen inspection apparatus, and a specimen inspection method permitting a specimen consisting of cultured cells to be observed or inspected. Also, a method of fabricating the holder is offered. The holder has an open specimen-holding surface. At least a part of this surface is formed by a film. A specimen cultured on the specimen-holding surface of the film can be irradiated via the film with a primary beam for observation or inspection of the specimen. Consequently, the cultured specimen (e.g., cells) can be observed or inspected in vitro. Especially, if an electron beam is used as the primary beam, the specimen in vitro can be observed or inspected by SEM. Because the specimen-holding surface is open, a manipulator can gain access to the specimen. A stimulus can be given to the specimen using the manipulator. The reaction can be observed or inspected.

Abstract: There is provided a mini environment type transfer unit which can efficiently transfer a sample to a critical dimension scanning electron microscope (CD-SEM) even in the case of use of a SMIF pod which can store only one photomask. In addition to a load port, a stocker which can store a plurality of photomasks is provided in the mini environment type transfer unit. A mask storage slot in which a plurality of storage units are stacked is provided in the stocker, and one photomask is stored in each storage unit. A sensor is provided in each storage unit to determine whether or not the photomask is normally stored. Additionally, a sensor is provided in each storage unit to detect whether or not the photomask exists.

Abstract: At least one exemplary embodiment is directed to an alignment apparatus which includes a moving member, a structural object arranged on the moving member, and an electromagnetic actuator which moves the structural object relative to the moving member. The electromagnetic actuator includes a plurality of linear motor units, which apply forces in the horizontal direction and the vertical direction to the structural object. The plurality of linear motor units apply, to the structural object, forces in the rotation direction about each of two axes orthogonal to each other in the horizontal plane and the rotation direction about the axis in the vertical direction.

Abstract: The present invention relates to an operation stage of a charged particle beam apparatus which is employed in a scanning electron microscope for substrate (wafer) edge and backside defect inspection or defect review. However, it would be recognized that the invention has a much broader range of applicability. A system and method in accordance with the present invention provides an operation stage for substrate edge inspection or review. The inspection region includes top near edge, to bevel, apex, and bottom bevel. The operation stage includes a supporting stand, a z-stage, an X-Y stage, an electrostatic chuck, a pendulum stage and a rotation track. The pendulum stage mount with the electrostatic chuck has the ability to swing from 0° to 180° while performing substrate top bevel, apex and bottom bevel inspection or review.

Abstract: A two-part container for preserving material samples during storage and transport is separable and can be sealed with the presence of an elastomeric O-ring and internal threads on each part of the container. In the configuration at which the threads first engage between the two halves of the container, there is a small hole in the outer top part just above the O-ring of the bottom mating part. When the two container parts are mated and the sealing O-ring is below the small hole, inert gas can be made to flow through an inlet valve, into the container, and out through the small hole. In this configuration, the inert gas flows through the container and purges the atmospheric gas, replacing it with inert gas. After a period of time, the two container parts are rotated so that the sealing O-ring moves above the small hole. This will stop the flow into and out of the container. After this, the gas inlet valve is closed to seal the inert gas in the container.

Abstract: There is provided a method of arranging, as a composite charged-particle beam system, a gas ion beam apparatus, an FIB and an SEM in order to efficiently prepare a TEM sample. The composite charged-particle beam system includes an FIB lens-barrel 1, an SEM lens-barrel 2, a gas ion beam lens-barrel 3, and a rotary sample stage 9 having an eucentric tilt mechanism and a rotating shaft 10 orthogonal to an eucentric tilt axis 8. In the composite charged-particle beam system, an arrangement is made such that a focused ion beam 4, an electron beam 5 and a gas ion beam 6 intersect at a single point, an axis of the FIB lens-barrel 1 and an axis of the SEM lens barrel 2 are orthogonal to the eucentric tilt axis 8, respectively, and the axis of the FIB lens-barrel 1, an axis of the gas ion beam lens-barrel 3 and the eucentric tilt axis 8 are in one plane.

Abstract: Provided is a scanning probe microscope (SPM), a probe of which can be automatically replaced and the replacement probe can be attached onto an exact position. The SPM includes a first scanner that has a carrier holder, and changes a position of the carrier holder in a straight line; a second scanner changing a position of a sample on a plane; and a tray being able to store a spare carrier and a spare probe attached to the spare carrier. The carrier holder includes a plurality of protrusions.

Abstract: A patterning device holding apparatus includes a support platform unit with a plurality of first positioning projections and a gripper unit. The gripper unit includes a head portion and a plurality of second positioning projections disposed on the head portion, and a rolling member set at a base portion. The grapping and releasing of the patterning device is achieved by the rotation of the gripper unit about a pivot substantially parallel with the center axis of the rolling member. The first and second positioning projections corporately abut against the edges of a patterning device to fix the patterning device in place.

Abstract: A sample holder according to the present invention is characterized in that the sample holder comprise a holder body, a sample retaining stage, a means capable for tilting the sample around an axis which is arranged in a direction perpendicular to a long side of the holder body, wherein the means has a mechanism capable for tilting the sample around the axis with no relation to the existence of a fulcrum retaining member at the said axis.

Abstract: An electron beam apparatus and method are presented for collecting side-view and plane-view SEM imagery. The electron beam apparatus includes an electron source, some intermediate lenses if needed, an objective lens and an in-lens sectional detector. The electron source will provide an electron beam. The intermediate lenses focus the electron beam further. The objective lens is a combination of an immersion magnetic lens and a retarding electrostatic lens focuses the electron beam onto the specimen surface. The in-lens detector will be divided into two or more sections to collect secondary electrons emanating from the specimen with different azimuth and polar angle so that side-view SEM imagery can be obtained.

Abstract: A microscope stage with a flexural axis may exhibit predictable flexure characteristics and limited cross-coupling translations. Z motion of a Z plate proximate to a Z actuator may be substantially linear, while a distal side of the Z plate may be allowed to rotate about a hinge axis associated with a flexural component.

Abstract: The present invention achieves a heating stage for a micro-sample, capable of efficient heating and accurate observation of the micro-sample. A micro-sample mount is a heating portion in coil form and is fixed at both ends to a base for the heating stage for the micro-sample. The base can be divided into two members at a base cut line, and the mount is fixed at one end to the first member and is fixed at the other end to the second member. A sample subjected to micro-sampling is mounted on the mount. The base is removed from the tip of a holder, and is mounted on a stage for the sample stage. A current is fed to the micro-sample mount through the members to thereby apply heat to a micro-sample for observation.

Abstract: A patterning device handling apparatus for use in charged particle beam imaging is disclosed. The disclosed patterning device handling apparatus comprises a first gripping member and a second gripping member. The first gripping member is equipped with a plurality of first positioning projections, and the second gripping member is equipped with a plurality of second positioning projections. When the patterning device is held at one angle, the first positioning projections abut against one edge of the patterning device and the second positioning projections abut against the opposite edge of the patterning device. When the patterning device is held at another angle, the first positioning projections abut against two neighboring edges of the patterning device, and the second positioning projections abut against the other two neighboring edges of the patterning device. Therefore, the disclosed patterning device handling apparatus can hold the pattering device at different angles.

Abstract: Non uniform ion implantations in a pendulum type of ion implantation are mitigated by adjusting movement of a wafer according to a corresponding non uniform function. More particularly, a non uniform ion implantation function is obtained by measuring and/or modeling ion implantations. Then, movement of a wafer along a second non arcuate scan path is adjusted according to the non uniform ion implantation function to facilitate uniform ion implantations.

Abstract: A scanning probe apparatus for obtaining information of a sample, recording information in the sample, or processing the sample with relative movement between the sample and the apparatus, the apparatus is constituted by a probe; and a scanning stage including a drive element for moving a sample holding table for holding the sample and a movable portion movable in a direction in which an inertial force generated during movement of the sample holding table is cancelled. The scanning stage further includes a drive circuit for driving the scanning stage and is detachably or replaceably mountable to a main assembly of the apparatus.

Abstract: The invention solves charge nonuniformity of a specimen surface resulting from emission variation of a carbon nanotube electron source and individual difference of emission characteristics. During charge control processing, charge of the specimen surface is measured in real time. As means for solving charge nonuniformity resulting from nonuniformity of electron illumination density, electrons illuminating the specimen and the specimen are moved relatively to average electron illumination density. Moreover, an absorption current flowing into the specimen and the numbers of secondary electrons emitted from the specimen and of backscattered electrons are measured as means for monitoring charge of the specimen surface in real time.

Abstract: An example electron beam drawing apparatus includes an electron beam emitting unit which emits an electron beam, a rotary stage which rotatably supports a turntable for retaining a drawing object, and a sample stage which is supported by the turntable in a range including a rotating center of the turntable to retain an adjustment sample. A rotationally symmetrical pattern such as a concentric pattern and a radial pattern can be drawn in the drawing object by irradiating the drawing object with the electron beam during rotation of the turntable. Before the pattern is actually drawn in the drawing object, beam adjustment and rotating center adjustment are performed using an adjustment sample. The adjustment sample is retained by the sample stage, and the sample stage is supported by the turntable in the range including the rotating center of the turntable.

Abstract: A wafer handling robot, ion implanter system including a wafer handling robot and a related method are disclosed. An ion implanter system may include an ion implanting station including a load lock coupled thereto; a wafer handling robot located at least partially within the load lock, the wafer handling robot including an end effecter for handling at least one wafer, and a motor for moving the end effecter vertically; and a sensor positioned within the load lock to determine a vertical position of the end effecter.

Abstract: Left and right sides of the mesh sandwiching the placing region therebetween are set as left and right to-be-fixed portions to be fixed to sample holder separation portions respectively to be moved in a stretch direction. A slit for dividing use is formed from a portion of the periphery of the mesh disposed between the left and right to-be-fixed portions thereof toward the rubber slice-placing position of the mesh in a direction orthogonal to the stretch direction of the rubber slice or a direction inclined thereto. When the to-be-fixed portions are moved in a separation direction by moving the sample holder separation portions, the mesh is divided into left and right parts by the slit for dividing use so that the rubber slice fixed to the left and right sides of the mesh is stretched.

Abstract: A method is described for producing a micro-gripper, which comprises a base body and a gripping body connected integrally to the base body, which projects beyond the base body and provides a receptacle slot on a free end area in such a way that a micrometer-scale or sub-micrometer-scale object may be clamped in the receptacle slot for gripping and holding, as well as a micro-gripper according to the species.

Abstract: A grid holder for STEM analysis in a charged-particle instrument has a base jaw and a pivoting jaw. Both jaws have a substantially congruent inclined portion. The base jaw has a flat portion for mounting the holder on the sample carousel of a charged-particle instrument, such as a dual beam FIB. The inclined portion of the jaws is inclined to the flat portion of the holder at an angle A approximately equal to the difference between 90 degrees and the angle between the electron beam and the ion beam in the charged-particle instrument. The inclined portion of the jaws has a pocket for receiving and holding a sample grid. When a sample is mounted on the grid and the grid is held by the grid holder, the sample will be correctly oriented for ion-beam thinning when the sample carousel is horizontal. The thinned sample may then be placed perpendicular to the electron beam for STEM analysis by tilting the sample carousel by the same angle A.

Abstract: Charged particle beam equipment having a rotary mechanism in which shift of the observing/machining position incident to the rotary operation of the equipment having the rotary mechanism can be corrected conveniently with high precision in a plane perpendicular to the optical axis of the optical system of charged particle beam or in a slightly inclining plane. An X-Y shift incident to rotation in a plane is determined from the angular information of a rotary mechanism such as a sample holder, diaphragms or biprisms in the charged particle beam equipment, and then driving or controlling is performed to cancel the X-Y shift.

Abstract: It is an object of the present invention to provide a significantly beneficial specimen holder which allows mounting one or more specimens, for example, a specimen to be examined and a standard adjustment specimen for aberration correction in one specimen holder at the same time, thereby observing each specimens. The present invention is a specimen holder having a specimen holder movement mechanism for driving the specimen holder, wherein the specimen holder movement mechanism makes it possible to move the specimen holder approximately along the longer side of the specimen holder.

Abstract: A stage for processing a substrate, especially useful for vacuum applications, has a recess just large enough to hold a substantially flat substrate and a chuck or holder, but not much more. The perimeter of both top and bottom of the stage has air bearing surfaces separated from the recess by differentially pumped grooves and seal lands. The air bearing lands are guided between two reference surfaces and the seal lands, being substantially coplanar, create a resistance to flow between the bearings and the recess. On the other side of one of the reference plates mounts the radiation source or process. The opposite reference plate may have a large aperture, non-contact pumping port. This improves vacuum capability and stage precision. The stage may operate in a vacuum environment itself or can provide multiple stages moving between processes or inspection steps within the same tool or process sequence.

Abstract: In a method for checking for leakage from tubular batteries, when tubular batteries are fed with their respective axial centers aligned in parallel to each other to pass through a leakage check mechanism, a sealed end face of the tubular batteries is irradiated with an X-ray. In accordance with the result of analysis on whether the incident fluorescent X-ray entering a detector contains a fluorescent X-ray associated with an electrolyte component, it is determined whether the tubular batteries have leaked. A length of a detection window of the detector in a direction of feed of the tubular batteries is set to be less than a spacing between the tubular batteries. A length of the detection window oriented orthogonal to the direction of feed is set to be greater than an outer size of the cross-sectional shape of the tubular batteries oriented orthogonal to their axial center.

Abstract: A specimen holder is offered which can reduce the amount of chemical sprayed over a specimen consisting of cultured cells. The specimen holder has an open specimen-holding surface. At least a part of the specimen-holding surface is formed by a film and a tapering portion formed around the film. The specimen can be cultured on the specimen-holding surface of the film. The presence of the tapering portion can reduce the amount of used reagent. The specimen can be irradiated via the film with a primary beam for observation or inspection of the specimen. Consequently, the specimen, such as cells, can be well observed or inspected in vivo while the specimen is being cultured. Especially, if an electron beam is used as the primary beam, the specimen can be well observed or inspected in vivo by SEM (scanning electron microscopy).

Abstract: A microsystem manipulation apparatus and an associated kit is described that may be used to facilitate the assembly and testing of Microsystems and microsystem components. The microsystem manipulation apparatus may include a scanning electron microscope imaging system, a stage, and at least one manipulator having an associated tool. The microsystem manipulation apparatus may be partially or fully automated to provide for routine microsystem assembly, disasembly, and/or testing. The associated kit may include one or more manipulators and associated tools for retrofitting an existing scanning electron microscope to produce a microsystem manipulation apparatus.

Abstract: An object of the present invention is to obtain a charged particle beam apparatus that includes a simplified sample positioning mechanism used with an electrostatic chuck, allow the sample to be released easily when residual attraction occurs, and enable observation throughout an entire area on an outer peripheral portion of the sample. To attain the object, the present invention provides a charged particle beam apparatus including, in a sample holding system for holding a sample, an outer peripheral part for holding the sample at the outer peripheral portion on a backside of the sample and raising and lowering the sample; a drive portion for raising and lowering the outer peripheral part; an electrostatic chuck for attracting the backside of the sample; and a part for correcting an electric field that is of substantially the same height as the peripheral portion of the sample when the sample is attracted onto the electrostatic chuck.

Abstract: A method for implanting ions into a workpiece, such as a semiconductor wafer, includes the steps of generating an ion beam, measuring an angle of non-parallelism of the ion beam, tilting the wafer at a first angle, performing a first implant at the first angle, tilting the wafer at a second angle, and performing a second implant at the second angle. The first and second angles are opposite in sign with respect to a reference direction and in magnitude are equal to or greater than the measured angle of non-parallelism. Preferably, the first and second implants are controlled to provide substantially equal ion doses in the workpiece.