Abstract: A charged particle beam irradiation apparatus includes: an irradiation section configured to irradiate an irradiated body with a charged particle beam; a gantry in which an irradiation section is disposed and which can rotate or oscillate around a central axis line; an enclosure in which the irradiated body is disposed; and a gantry-side transport line that has an inlet section on which a charged particle beam emitted from an accelerator is incident and that is supported on the gantry and configured to transport an incident charged particle beam to the irradiation section, in which the gantry has a first bearing section provided between the inlet section of the gantry-side transport line and the enclosure, and a second bearing section provided on a side opposite to the first bearing section with respect to the enclosure.

Abstract: A compact synchrotron radiation source includes an electron beam generator, an electron storage ring, one or more wiggler insertion devices disposed along one or more straight sections of the electron storage ring, the one or more wiggler insertion devices including a set of magnetic poles configured to generate a periodic alternating magnetic field suitable for producing synchrotron radiation emitted along the direction of travel of the electrons of the storage ring, wherein the one or more wiggler insertion devices are arranged to provide light to a set of illumination optics of a wafer optical characterization system or a mask optical characterization system, wherein the etendue of a light beam emitted by the one or more wiggler insertion devices is matched to the illumination optics of the at least one of a wafer optical characterization system and the mask optical characterization system.

Abstract: An apparatus for producing light includes a chamber and an ignition source that ionizes a gas within the chamber. The apparatus also includes at least one laser that provides energy to the ionized gas within the chamber to produce a high brightness light. The laser can provide a substantially continuous amount of energy to the ionized gas to generate a substantially continuous high brightness light.

Abstract: The present invention relates to a 68Ga generator, wherein the 68Ge parent nuclide thereof is attached specifically to a support through a triethoxyphenyl group and continuously disintegrates to 68Ga, the triethoxyphenyl group being covalently bound to a support material through a linker.

Abstract: The present disclosure relates to a charged particle beam system, comprising a noble gas field ion beam source, a charged particle beam column, and a housing defining a first vacuum region and a second vacuum region. A noble gas field ion beam source is arranged within the first vacuum region. A first mechanical vacuum pump is functionally attached to the first vacuum region, an ion getter pump is attached to the charged particle beam column, and a gas supply is attached to the first vacuum region configured to supply a noble gas to the noble gas field ion beam source.

Abstract: The present disclosure relates to a charged particle beam system comprising a charged particle beam source, a charged particle column, a sample chamber, a plurality of electrically powered devices arranged within or at either one of the charged particle column, the charged particle beam source and the sample chamber, and at least one first converter to convert an electrical AC voltage power into an electrical DC voltage. The first converter is positioned at a distance from either of the charged particle beam source, the charged particle column and the charged particle chamber, and all elements of the plurality of electrically powered devices, when operated during operation of the charged particle beam source, are configured to be exclusively powered by the DC voltage provided by the converter.

Abstract: A target supply device may include a tank including a nozzle, a first electrode provided with a first through-hole and disposed so that a center axis of the nozzle is positioned within the first through-hole, a second electrode that includes a main body portion provided with a second through-hole and a collection portion formed in a cylindrical shape extending in a direction from a circumferential edge of the second through-hole toward the nozzle and that is disposed so that the center axis of the nozzle is positioned within the second through-hole, a third electrode disposed within the tank, and a heating unit configured to heat the second electrode.

Abstract: A laser driven light source comprises laser and focusing optics. These produce a beam of radiation focused on a plasma forming zone within a container containing a gas (e.g., Xe). Collection optics collects photons emitted by a plasma maintained by the laser radiation to form a beam of output radiation. Plasma has an elongate form (L>d) and collecting optics is configured to collect photons emerging in the longitudinal direction from the plasma. The brightness of the plasma is increased compared with sources which collect radiation emerging transversely from the plasma. A metrology apparatus using the light source can achieve greater accuracy and/or throughput as a result of the increased brightness. Back reflectors may be provided. Microwave radiation may be used instead of laser radiation to form the plasma.

Abstract: Techniques for forming a target and for producing extreme ultraviolet light include releasing an initial target material toward a target location, the target material including a material that emits extreme ultraviolet (EUV) light when converted to plasma; directing a first amplified light beam toward the initial target material, the first amplified light beam having an energy sufficient to form a collection of pieces of target material from the initial target material, each of the pieces being smaller than the initial target material and being spatially distributed throughout a hemisphere shaped volume; and directing a second amplified light beam toward the collection of pieces to convert the pieces of target material to plasma that emits EUV light.

Abstract: A module for producing extreme ultraviolet radiation includes a supply configured to supply droplets of an ignition material to a predetermined target ignition position and a laser arranged to be focused on the predetermined target ignition position and to produce a plasma by hitting such a droplet which is located at the predetermined target ignition position in order to change the droplet into an extreme ultraviolet producing plasma. Also, the module includes a collector mirror having a mirror surface constructed and arranged to reflect the radiation in order to focus the radiation on a focal point. A fluid supply is constructed and arranged to form a gas flow flowing away from the mirror surface in a direction transverse with respect to the mirror surface in order to mitigate particle debris produced by the plasma.

Abstract: Embodiments of the present invention provide a heating assembly using a heat exchange device to cool a plurality of heating element. The heating assembly includes a plurality of heating elements, a cooling element having one or more cooling channels for receiving cooling fluid therein, and a heat exchange device disposed between the plurality of heating elements and the cooling element. The heat exchange device comprises a hot interface disposed adjacent to and in thermal contact with the plurality of heating elements and a cold interface disposed adjacent to and in thermal contact with the cooling element.

Abstract: A chamber apparatus used with a laser apparatus may include: a chamber provided with at least one inlet through which a laser beam outputted from the laser apparatus enters the chamber; a target supply unit provided to the chamber for supplying a target material to a predetermined region inside the chamber; a magnetic field generation unit for generating a magnetic field in the predetermined region; and a charged particle collection unit disposed in a direction of a magnetic flux of the magnetic field for collecting a charged particle thereinto, the charged particle being generated when the target material is irradiated with the laser beam inside the chamber and traveling along the magnetic flux.

Abstract: Apparatus having a chamber with an interior wall and a region within the chamber from which a contaminating material emanates when the apparatus is in operation. A plurality of vanes is positioned on a portion of the interior wall, each of the vanes having a first surface which is oriented along a direction between the vane and the region and a second surface adjacent the first surface which is oriented to deflect the contaminating material striking the second surface away from the region, the second surfaces being dimensioned and juxtaposed with respect to one another such that the second surfaces substantially prevent the contaminating material from striking the portion of the interior wall. At least part of each of the vanes may be covered with a mesh. The vanes may be heated, and may be heated at least to a melting point of the contaminating material.

Abstract: A radiation generator may include a generator housing, a target electrode carried by the generator housing, a charged particle source carried by the generator housing to direct charged particles at the target electrode based upon an accelerating potential, and a suppressor electrode carried by the generator housing having an opening therein to permit passage of charged particles to the target electrode. A target extender electrode may be between the suppressor electrode and the target electrode and have an opening therein to permit passage of charged particles to the target.

Abstract: A radiation source for generating EUV from a stream of molten metal fuel droplets by LPP (Laser Produced Plasma) or (Dual Laser Plasma) has a fuel droplet generator arranged to provide a stream of droplets of fuel and at least one laser configured to vaporise at least some of said droplets of fuel, whereby radiation is generated. The fuel droplet generator has nozzle, fuel supply line, and reservoir, with a pumping device arranged to supply a flow of molten metal fuel from the reservoir through the fuel feed line and out of the nozzle as a stream of droplets. The fuel droplet generator has a replaceable filter assembly in the fuel feed line, arranged to filter the molten metal fuel in use, to deter nozzle blockage by solid particulate impurities in the fuel.

Abstract: An apparatus capable of performing a photo alignment process on a plate-shaped member and realizing high productivity is provided. An irradiating unit irradiates an irradiated area with polarized light, and a stage movement mechanism transports first and second stages on which substrates are mounted alternately to the irradiated area and returns the same. A space larger than a length by which the substrate on the second stage passes through the irradiated area is secured between the first stage positioned at a first substrate mounting-and-collecting position and the irradiated area, and a space larger than a length by which the substrate on the first stage passes through the irradiated area is secured between the second stage positioned at a second substrate mounting-and-collecting position and the irradiated area.

Abstract: An artificial composite object combines a quantum of sound with a matter excitation. A phonon in a confinement structure containing the matter excites it from an initial state to an excited state corresponding to a frequency of the phonon. Relaxation of the matter back to the initial state emits a phonon of the same frequency into the confinement structure. The phonon confinement structure, for example, a cavity, traps the emitted phonon thereby allowing further excitation of the matter. The coupling between the phonon and the matter results in a quantum quasi-particle referred to as a phoniton. The phoniton can find application in a wide variety of quantum systems such as signal processing and communications devices, imaging and sensing, and information processing.

Abstract: The invention relates to a water treatment using an UV AOP. The invention combines an UV AOP (11) applied to a water containing a free chlorine species (8) with a chemical post treatment (14), a quenching. The quenching (14) is applied to said water (9) after the UV AOP (11) able to reduce a remaining content of said free chlorine species in said water (9).

Abstract: The invention refers to a nanodevice for generating electromagnetic radiation in the terahertz frequency range, the nanodevice comprising a substrate (3) made of a dielectric material, a first graphene layer (1) arranged on the substrate (3), having a first longitudinal end being electrically connected with a source contact (source 1) and having a second longitudinal end being connected with a drain contact (drain 1), an electrically conducting layer (2) having a periodic grating structure with grating stripes (6) extending substantially in transversal direction (y), and a dielectric layer (4) arranged between the first graphene layer (1) and the conducting layer (2).

Abstract: Focus of a laser beam on a target in a Laser Produced Plasma (LPP) Extreme Ultraviolet (EUV) light source is maintained by focusing reflected light from the target illuminated by a laser source, sampling the focused reflected light in a plurality of planes at different optical path lengths, and comparing the image sizes of the focused reflected light at the plurality of planes to determine a correction signal to correct the focus of the laser source. In an embodiment, the focused reflected light is split into a two optical paths of differing optical path lengths, with each optical path directed to a sensing device at an imaging plane. Since each of the optical paths is of a different length, the images of the target taken by the sensing device at the imaging plane will be of different sizes. By comparing the relative sizes of the target images from the optical paths, a correction signal is produced to correct the focus of the laser source.

Abstract: A UV curing system includes an enclosure defining an interior, a UV radiation source disposed within the interior of the enclosure, and a first window disposed within the interior of the enclosure. The first window creates a barrier that separates the UV radiation source and a processing chamber. A second window is disposed within the interior of the enclosure at a distance from the first window to define a gas channel. The second window defines a plurality of openings such that the gas channel is in fluid communication with the processing chamber. A gas inlet conduit is in fluid communication with the gas channel and is configured to introduce a cooling gas into the gas channel. A gas outlet is in fluid communication with the processing chamber and is configured to remove gas from the processing chamber.

Abstract: A device for UV curing a coating or printed ink on an workpiece such as an optical fiber comprises dual elliptical reflectors arranged to have a co-located focus. The workpiece is centered at the co-located focus such that the dual elliptical reflectors are disposed on opposing sides of the workpiece. Two separate light sources are positioned at a second focus of each elliptical reflector, wherein light irradiated from the light sources is substantially concentrated onto the surface of the workpiece at the co-located focus.

Abstract: Techniques are described that enhance power from an extreme ultraviolet light source with feedback from a target material that has been modified prior to entering a target location into a spatially-extended target distribution or expanded target. The feedback from the spatially-extended target distribution provides a nonresonant optical cavity because the geometry of the path over which feedback occurs, such as the round-trip length and direction, can change in time, or the shape of the spatially-extended target distribution may not provide a smooth enough reflectance. However, it may be possible that the feedback from the spatially-extended target distribution provides a resonant and coherent optical cavity if the geometric and physical constraints noted above are overcome. In any case, the feedback can be generated using spontaneously emitted light that is produced from a non-oscillator gain medium.

Abstract: A radiation source for generating EUV from a stream of molten fuel droplets by LPP (Laser Produced Plasma) or (Dual Laser Plasma) has a fuel droplet generator arranged to provide a stream of droplets of fuel and at least one laser configured to vaporize at least some of the droplets of fuel, whereby radiation is generated. The fuel droplet generator has a nozzle, a feed chamber, and a reservoir, with a pumping device arranged to supply a flow of fuel in molten state from the reservoir through the feed chamber and out of the nozzle as a stream of droplets. The feed chamber has an outer face in contact with a drive cavity filled with a liquid, and the liquid is driven to oscillate by a vibrator with the oscillation transmissible to the molten fuel in the feed chamber from the outer face of the feed chamber through the liquid.

Abstract: A method for separating, or removing, particulate material, e.g., blood cells, from a sample of fluid, e.g., whole blood of a patient, in which the particulate material is suspended. In the case of separating blood cells from blood plasma or blood serum, the resulting samples of blood plasma or blood serum can be used for in vitro diagnostic applications. In normal practice, a whole blood sample of a patient are provided and then introduced into an apparatus that contains a flow channel. An acoustic field, which contains acoustic standing waves from external ultrasonic transducers, is located within the flow channel. Laminar flow is maintained in the flow channel. Blood cells and platelets are separated from blood plasma or blood serum at the end of the flow channel and collected. The method described herein allows fluid components to differentially migrate to areas of preferred acoustic interaction.

Abstract: Methods and apparatus for detecting variations in electromagnetic fields, in particular, terahertz (THz) electromagnetic fields, are provided. The methods and apparatus employ polarization detection devices and controllers to maintain or vary the polarization of modulated signals as desired. The methods and apparatus are provided to characterize electromagnetic fields by directing the electromagnetic field and a probe beam upon an electro-crystal and detecting the modulation of the resulting probe beam. Detection of the modulation of the probe beam is practiced by detecting and comparing the polarization components of the modulated probe beam. Aspects of the invention may be used to analyze or detect explosives, explosive related compounds, and pharmaceuticals, among other substances. A compact apparatus, modular optical devices for use with the apparatus, sample holders, and radiation source mounts are also disclosed.

Abstract: A laser-sustained plasma illuminator system includes at least one laser light source to provide light. At least one reflector focuses the light from the laser light source at a focal point of the reflector. An enclosure substantially filled with a gas is positioned at or near the focal point of the reflector. The light from the laser light source at least partially sustains a plasma contained in the enclosure. The enclosure has at least one wall with a thickness that is varied to compensate for optical aberrations in the system.

Abstract: Offset in the ejection direction of target material droplets is corrected in order to stabilize EUV output in an EUV light source device. An extreme ultraviolet light source device includes a droplet generation device 110 that outputs target material droplets 101 towards a predetermined plasma emission point 103; a charging device 130 that charges the target material droplets 101; a trajectory correction device 140 that generates a force field in the trajectory to correct the travel direction of the charged target material droplets 101a so that the charged target material droplets 101a travel towards the plasma emission point 103; and a laser light source 150 that irradiates, at the plasma emission point 103, a laser beam onto the charged target material to generate plasma thereby.

Abstract: A radiation generating apparatus and a radiographing apparatus configured to allow a radiation generating unit to be installed at arbitrary positions include an arm configured to support a radiation generating unit that generates radiation, a pillar configured to rotatably support the arm, and a movable base configured to support the pillar and move on a floor surface are provided, and the arm includes an expandable mechanism configured to expand and contract in a longitudinal direction of the arm.

Abstract: A radiation generating apparatus includes a support structure that supports a radiation generating unit that generates radiation; and a base frame that supports the support structure and includes a plurality of leg portions configured to be arranged in a predetermined manner in accordance with an imaging state or storage state of the radiation generating apparatus.

Abstract: A radiation generation apparatus and a radiographic apparatus that can be easily transported and whose radiation generation unit can be installed according to the radiographing region of the object include a supporting mechanism (supporting column, arm) that supports a radiation generation unit that generates radiation, and a supporting base that supports the supporting mechanism. The supporting mechanism is removable from the supporting base together with a power source unit that supplies power to the radiation generation unit.

Abstract: The invention relates to extreme ultraviolet “EUV” radiation generating systems that include a vacuum chamber where a target material can be positioned at a target position for generation of EUV radiation, and a beam guiding chamber for guiding a laser beam from a driver laser device towards the target position. The EUV radiation generating apparatus includes an intermediate chamber which is arranged between the vacuum chamber and the beam guiding chamber, a first window which seals the intermediate chamber in a gas-tight manner for entry of the laser beam from the beam guiding chamber and a second window which seals the intermediate chamber in a gas-tight manner for exit of the laser beam into the vacuum chamber. The invention also relates to a method for operating the EUV radiation generating apparatus.

Abstract: An LED-based photolithographic illuminator with high collection efficiency is disclosed. The illuminator utilizes an array of LEDs, wherein each LED has an LED die and a heat sink. The LED dies are imaged onto the input end of a homogenizer rod to substantially cover the input end without inclusion of the non-light-emitting heat sink sections of the LED. A microlens array is used to image the LED dies. The collection efficiency of the illuminator is better than 50% and the illumination uniformity at the output end of the light homogenizer is within +/?2%.

Abstract: A control method for a target supply device may employ a target supply device, provided in an EUV light generation apparatus including an image sensor, that includes a target generator having a nozzle and configured to hold a target material and a pressure control unit configured to control a pressure within the target generator, and the method may include outputting the target material in the target generator from a nozzle hole in the nozzle by pressurizing the interior of the target generator using the pressure control unit, determining whether or not a difference between an output direction of the target material outputted from the nozzle hole that is detected by the image sensor and a set direction is within a predetermined range, and holding the pressure in the target generator using the pressure control unit until the difference falls within the predetermined range.

Abstract: A device having a vertical slot for sanitizing a dental appliance inserted in the device. The device comprises a removable tray for containing a dental appliance, the removable tray is suitable to be lifted in and out of the vertical slot of the sanitizing device. The device comprises vertically extending walls on opposing sides of the vertical slot between which the removable tray is inserted, wherein one of the vertically extending walls comprises an ultraviolet lamp for transmission of ultraviolet light.

Abstract: In an integrated gimbal and High-Powered Multiband Laser (HPMBL) for use in an infrared countermeasure apparatus in a pod mounted on an aircraft, the improvement comprises an optical bench that connects the optical path between side-by-side mounted gimbal and high power laser; and a kinematic mounting system that prevents optical bench bending.

Abstract: An EUV light source is disclosed herein which may comprise a droplet generator producing a stream of target material droplets, a first optical gain medium amplifying light on a first beam path without a seed laser providing a seed laser output to the first beam path, a second optical gain medium amplifying light on a second beam path without a seed laser providing a seed laser output to the second beam path, and a beam combiner combining light from the first beam path and the second beam path for interaction with a target material droplet to produce EUV light emitting plasma.

Abstract: A plasmon generator has a front end face located in a medium facing surface of a magnetic head. The plasmon generator includes a first portion formed of a first metal material and a second portion formed of a second metal material. The first portion has an inclined surface facing toward the front end face. The second portion is located between the inclined surface and the front end face, and includes a first end face located in the front end face and a second end face in contact with the inclined surface. The second metal material is higher in Vickers hardness than the first metal material. The first portion has a plasmon exciting part. The front end face generates near-field light.

Abstract: The present invention is directed to a method and device to desorb an analyte using heat to allow desorption of the analyte molecules, where the desorbed analyte molecules are ionized with ambient temperature ionizing species. In various embodiments of the invention a current is passed through a mesh upon which the analyte molecules are present. The current heats the mesh and results in desorption of the analyte molecules which then interact with gas phase metastable neutral molecules or atoms to form analyte ions characteristic of the analyte molecules.

Abstract: An ultraviolet irradiator including a housing having an ultraviolet irradiation port through which the target is irradiated with the ultraviolet light, an ultraviolet lamp that emits ultraviolet light, a water-cooling jacket in which the ultraviolet lamp is mounted, a reflection plate that reflects light emitted from the ultraviolet lamp, the ultraviolet lamp, the water-cooling jacket and the reflection plate being mounted in the housing, and ultraviolet light emitted directly from the ultraviolet lamp and reflection light reflected from the reflection plate being irradiated to the outside of the housing, a heat withdrawing mechanism that withdraws heat of the reflection plate and discharges the heat to the outside of the housing; and a heat transfer member that transfers ambient heat in the housing to the heat withdrawing mechanism so that the heat withdrawing mechanism withdraws the ambient heat.

Abstract: Electronic devices for the generation of electromagnetic radiation are provided. Also provided are methods for using the devices to generate electromagnetic radiation. The radiation sources include an anisotropic electrically conducting thin film that is characterized by a periodically varying charge carrier mobility in the plane of the film. The periodic variation in carrier mobility gives rise to a spatially varying electric field, which produces electromagnetic radiation as charged particles pass through the film.

Abstract: An apparatus supplies a target material to a target location. The apparatus includes a reservoir that holds a target mixture that includes the target material and non-target particles; a supply system that receives the target mixture from the reservoir and that supplies the target mixture to the target location, the supply system including a tube and a nozzle that defines an orifice through which the target mixture is passed; and a filter inside the tube through which the target mixture is passed.

Abstract: An infrared (IR) light device is provided comprising: a main casing filled with a gas to prevent condensation from forming on an interior surface of the visible light filter; and a plurality of IR light emitting diodes (LEDs) mounted in the main casing, wherein the casing includes heat dissipating features.

Abstract: A standard EM wave field generator, includes a first tapered region configured to have a first port formed on its one side and be supplied with a source to generate EM field through the first port; and a first untapered region configured to have at least one or more slits in the form of a hole. Further, the standard EM wave field generator includes a second tapered region configured to have a third port formed on its one side and output the EM field generated from the first port through the third port.

Abstract: A method of monitoring a composition in transition from liquid to solid state includes the steps of providing an apparatus having a temperature pyrometer, a drying element, a laser displacement sensor, and an electronic balance; providing a composition in a liquid state; converting the composition to a solid state; and measuring the a process condition during said step of converting. The apparatus can include a drying element, a temperature pyrometer, a laser displacement sensor, a platform for holding a composition, an electronic balance, and a spectral birefringence measurement system.

Abstract: Problems to be solved: To obtain higher brightness than Langmuir limit. Adjust brightness to the optimum value. Method of resolution: To obtain such beams, the following means and methods are effective. A charged particles beam apparatus consisting of a charged particle source, a beam drawing electrode, and a beam control electrode, wherein; after the charged particles beam source a condenser lens is designed, and brightness of the charged particles beam is adjusted by adjusting a magnification factor of said condenser lens.

Abstract: A scanned ultraviolet-light emitting diode (UV-LED) exposure device, exposing a large area by using a periodic UV-LED exposure light source with a fixed rate in an exposure task without a need of stopping movement of the device, so as to periodically repeat a use of an exposure light source to increase a use efficiency of the energy source, resulting in an improved uniformity of exposure, with the LEDs alternatively arranged policy, which further results in an improved yield. In addition, the overall design of the upper and lower exposure stations and the periodic moving ring assembly sufficiently employs the available space, and results in a reduced volume, a corresponding production space, energy consumption and production cost.

Abstract: A device for generating x-rays has an enclosing vessel having a structure suitable to provide an enclosed space at a predetermined fluid pressure, wherein the enclosing vessel has a window portion and a shielding portion in which the shielding portion is more optically dense to x-rays than the window portion; a mechanoluminescent component disposed at least partially within the enclosing vessel; and a mechanical assembly connected to the mechanoluminescent component. The mechanical assembly provides mechanical energy to the mechanoluminescent component while in operation, and at least some of the mechanical energy when provided to the mechanoluminescent component by the mechanical assembly is converted to x-rays.

Abstract: A target supply device according to an aspect of the present disclosure may include a target generator having a holding space and a first through-hole that communicates with the holding space, a porous filter having a thermal expansion coefficient that is substantially the same as a thermal expansion coefficient of the target generator, and a holder portion having a thermal expansion coefficient that is substantially the same as the thermal expansion coefficient of the target generator, that is configured to hold the porous filter and that is provided so as to form a seal against an inner surface of the target generator.

Abstract: In various embodiments, an emitter for the irradiation of surfaces is provided. The emitter may include: an emitter vessel and an emitter base connected thereto, wherein the emitter base has at least one gas opening, which is designed for supplying a process gas into a spatial area adjacent to the emitter vessel.