Abstract: A method for generating a radiation light in a lithography exposure system. The method includes producing a predetermined gas pressure in a storage chamber to supply a first load of a target fuel in the storage chamber via a nozzle. The method further includes irradiating the target fuel from the nozzle with a laser to generate the radiation light. The method also includes increasing the gas pressure in a buffer chamber which receives a second load of target fuel to the predetermined gas pressure. In addition, the method includes actuating the flow of the target fuel from the buffer chamber to the storage chamber.

Abstract: This invention employs a computer system or a programmable logic controller (computer) with a specific wireless communication protocol (BLE) to allow for remote connectivity of the germicidal UV device to display the status of the disinfection cycle and to operate the device and send and transfer data wirelessly to the Cloud via the BLE interface. A dose sensitive coupon, which can undergo color change in response to UV dosage, can also be used.

Abstract: An optical device includes a nanostructured transparent dielectric film, which is a Huygens metasurface. The Huygens metasurface imparts a phase change to light propagating through or reflecting from the surface. The phase change can be achieved by means of a resonant interaction between light and the Huygens resonators, resulting in a controllable phase change of 0 to 2? with approximately 100% light transmission characterized by a below 0.1 dielectric loss tangent of delta and with the height of the resonators less than the wavelength of light. In one embodiment, the metasurface includes titanium dioxide, but many materials or stacks of different materials may be used. The optical device is functional throughout the visible spectrum between 380 and 700 nm. The nanostructured transparent dielectric film includes a plurality of Huygens resonators.

Abstract: A method includes providing a target material that comprises a component that emits extreme ultraviolet (EUV) light when converted to plasma; directing a first beam of radiation toward the target material to deliver energy to the target material to modify a geometric distribution of the target material to form a modified target; directing a second beam of radiation toward the modified target, the second beam of radiation converting at least part of the modified target to plasma that emits EUV light; measuring one or more characteristics associated with one or more of the target material and the modified target relative to the first beam of radiation; and controlling an amount of radiant exposure delivered to the target material from the first beam of radiation based on the one or more measured characteristics to within a predetermined range of energies.

Abstract: An input coupler for an accelerating cavity includes a cylindrical external conductor; a cylindrical internal conductor arranged coaxially with the external conductor, inside of which a heating medium circulates; a plate provided between the inner surface of the external conductor and the outer surface of the internal conductor; a cooling part for cooling the plate from the external conductor side to the freezing point of water or lower; and a heat insulating part provided on the part at which the internal conductor and the plate are connected, the heat insulating part having lower thermal conductivity than that of the internal conductor. The plate is connected to the internal conductor via the heat insulating part.

Abstract: A nail lamp for curing UV-curable nail gel uses light emitting diodes (LEDs) that emit ultraviolet light and are relatively lower power. The nail lamp is powered from an exterior power source, such as a wall socket, or by a rechargeable battery pack. A battery compartment of the nail lamp holds the battery pack, which is removable without disassembling the nail lamp. The nail lamp is easily transportable to different locations and can be used even when a wall socket is unavailable. A curing time of the nail lamp is user-selectable. The nail lamp can also include detection sensors to detect a person's hand or foot in a treatment chamber and automatically turn on or off the LEDs.

Abstract: An extreme ultraviolet light generating apparatus includes a light collecting mirror that reflects and focuses extreme ultraviolet light, and a magnet that generates a magnetic field. The light collecting mirror includes a first mirror portion that includes a first reflective surface formed by a portion of a spheroidal surface, and a second mirror portion that includes a second reflective surface having a focal point at substantially the same position as a focal point of the first reflective surface, formed by a portion of a spheroidal surface different from that of the first reflective surface. The second reflective surface is provided at a position at which a magnetic flux density caused by the magnetic field is lower than that of the first reflective surface.

Abstract: A system for the radiation treatment of substrates, which includes at least one radiation source above the substrate holders in a chamber, which holders are to be equipped with substrates that are to be treated, and the chamber has means for maintaining a gas flow in the chamber, having at least one gas inlet and at least one gas outlet, characterized in that the at least one gas inlet is situated in the vicinity of the substrate holders so that gas flowing in by means of the at least one gas inlet first flows around the substrate holders before either exiting the chamber directly via the gas outlet or exiting after flowing around the at least one radiation source.

Abstract: Accelerator based systems are disclosed for the generation of isotopes, such as molybdenum-98 (“99Mo”) and metastable technetium-99 (“99mTc”) from molybdenum-98 (“98Mo”). Multilayer targets are disclosed for use in the system and other systems to generate 99mTc and 98Mo, and other isotopes. In one example a multilayer target comprises a first, inner target of 98Mo surrounded, at least in part, by a separate, second outer layer of 98Mo. In another example, a first target layer of molybdenum-100 is surrounded, at least in part, by a second target layer of 98Mo. In another example, a first inner target comprises a Bremsstrahlung target material surrounded, at least in part, by a second target layer of molybdenum-100, surrounded, at least in part, by a third target layer of 98Mo.

Abstract: A dental irradiation device comprises a first light emitting unit for emitting blue light adapted for light hardening of a dental material. The device further comprises a second light emitting unit and an image sensing unit which are adapted for cooperation with each other for simultaneous illumination and image capturing. The device facilitates hardening of dental materials and provides, inter alia, additional diagnostic functions.

Abstract: A device and method are disclosed in which a source material delivery system can be reoriented so that the path of the source material is not directly towards an irradiation region in operating conditions in which the path is expected to be unpredictable. A shroud provided to protect the flow of source material from being disrupted is segmented so with one part of the shroud being movable with respect to another part of the shroud so that the movable part can avoid interfering with the path of the source material when it is not directly towards the irradiation region.

Abstract: An organic EL element having a luminescence peak in a near-infrared range comprises a positive electrode, a negative electrode, and at least one organic layer including a luminescent layer located between the positive electrode and the negative electrode. The luminescent layer comprises a host material, a delayed fluorescent material and a luminescent material. The LUMO and HOMO energy levels of the delayed fluorescent material and the luminescent material, the absorption spectrum of the luminescent material, and the emission spectrum of the delayed fluorescent material satisfy predetermined relationships.

Abstract: A plasmon-based optical modulator comprises a substrate, a layer of high reflectivity material disposed over the substrate, a relatively thin dielectric layer disposed over a top major surface of the layer of high reflectivity material and a plurality of graphene strips disposed in parallel across a top major surface of the relatively thin dielectric layer, each graphene strip exhibiting a predetermined width w, with adjacent strips separated by a predetermined spacing s. A first electrical contact is coupled to the plurality of graphene strips and a second electrical contact is coupled to the layer of high reflectivity material, where the values of w, s, and voltage applied between the first and second electrical contacts determines a resonant wavelength of the plasmon-based optical modulator, with changes in the applied voltage changing between absorption and non-absorption of an applied optical input signal.

Abstract: An optical system for generating broadband light via light-sustained plasma formation includes a chamber, an illumination source, a set of focusing optics, and a set of collection optics. The chamber is configured to contain a buffer material in a first phase and a plasma-forming material in a second phase. The illumination source generates continuous-wave pump illumination. The set of focusing optics focuses the continuous-wave pump illumination through the buffer material to an interface between the buffer material and the plasma-forming material in order to generate a plasma by excitation of at least the plasma-forming material. The set of collection optics receives broadband radiation emanated from the plasma.

Abstract: X-ray pulse source (100) for generating X-ray pulses (1) includes electron pulse source device (10) including photo-emitter device (11) being configured for photo-induced creation of free electron pulses (2) and driver device (12) being configured for creating electromagnetic driver pulses (3) accelerating electron pulses (2) along acceleration path (7), and electromagnetic interaction device (50) comprising electromagnetic pulse source device (51) being configured for creating electromagnetic pulses (4) in interaction section (5) of electromagnetic interaction device (50), wherein electron pulse source device (10) and electromagnetic interaction device (50) are operable for generating X-ray pulses (1) by an interaction of electron pulses (2) and electromagnetic pulses (4), and driver device (12) includes THz driver pulse source (13), which is configured for creating single cycle or multi cycle THz driver pulses (3). Furthermore, a method of creating X-ray pulses (1) is described.

Abstract: A terahertz wave generating element includes a nonlinear optical crystal generating terahertz waves by propagating light, and a coupling member propagating the generated terahertz waves. The coupling member includes a reflecting face reflecting at least part of the generated terahertz waves. The reflecting face is convex in a propagation direction of the generated terahertz waves. An angle at the coupling member side between the reflecting face and the propagation direction of the light is greater than 90 degrees?cos?1 (ng/nTHz) but smaller than 90 degrees at a plane including the light propagation direction. ng represents a group refractive index of the nonlinear optical crystal at a wavelength of the light, nTHz the refractive index of the coupling member at a wavelength of the generated terahertz waves. A curvature radius of the reflecting face, in a reflection region reflecting the radius terahertz waves, is smaller the farther downstream in the light propagation direction.

Abstract: A metallic waveguide tuned to an infrared region of interest provides spectral and spatial control over emitted/absorbed thermal radiation. The ratio of the depth of the waveguide to the smallest lateral dimension thereof is such that that the lateral dimension provides spectral selectivity and that the waveguide is deep enough for a fixed lateral dimension to establish directionality but is not so deep that it incurs severe ohmic losses. A panel with an array of such waveguides directs thermal radiation from a body in a specific direction and with a spectral response that is the result of the physical dimensions of the individual waveguides that make up the waveguide array and the arrangement of the waveguides in the array. The waveguide axis may be obliquely oriented with respect to the substrate normal so as to impart non-normal directionality to the emitted radiation with respect to the substrate normal surface.

Abstract: A method for monitoring transportation of a package, as well as the apparatus for monitoring transportation, that uses an environmental monitoring device electrically connected to a vibration-to-electricity converter. The vibration-to-electricity converter is electrically attached to the environmental monitoring device.

Abstract: An optical system for generating broadband light via light-sustained plasma formation includes a chamber, an illumination source, a set of focusing optics, and a set of collection optics. The chamber is configured to contain a buffer material in a first phase and a plasma-forming material in a second phase. The illumination source generates continuous-wave pump illumination. The set of focusing optics focuses the continuous-wave pump illumination through the buffer material to an interface between the buffer material and the plasma-forming material in order to generate a plasma by excitation of at least the plasma-forming material. The set of collection optics receives broadband radiation emanated from the plasma.

Abstract: A method is described for measuring a moving property of a target. The method includes: forming a remaining plasma that at least partially coincides with an extended target region, the remaining plasma being a plasma formed from an interaction between a prior target and a prior radiation pulse in a target space; releasing a current target along a trajectory toward the target space that is at least partly overlapping the extended target region; determining one or more moving properties of the current target when the current target is within the extended target region and after a prior and adjacent target has interacted with a prior radiation pulse in the target space; and if any of the determined one or more moving properties of the current target are outside an acceptable range, then adjusting one or more characteristics of a radiation pulse directed toward the target space.

Abstract: A nail lamp for curing UV-curable nail gel uses light emitting diodes (LEDs) that emit ultraviolet light and are relatively lower power. The nail lamp is powered from an exterior power source, such as a wall socket, or by a rechargeable battery pack. A battery compartment of the nail lamp holds the battery pack, which is removable without disassembling the nail lamp. The nail lamp is easily transportable to different locations and can be used even when a wall socket is unavailable. A curing time of the nail lamp is user-selectable. The nail lamp can also include detection sensors to detect a person's hand or foot in a treatment chamber and automatically turn on or off the LEDs.

Abstract: Aspects of lighting assemblies principally for pools and spas are addressed. The assemblies may be configured to operate without penetrating housings thereof, thus not adversely impacting waterproof characteristics of the housings. This result is especially beneficial when the housings are installed underwater within pools or spas.

Abstract: An extreme ultraviolet light generation system used with a laser apparatus may be provided, and the extreme ultraviolet light generation system may include: a chamber including at least one window for at least one laser beam and a target supply unit for supplying a target material into the chamber; and at least one polarization control unit, provided on a laser beam path, for controlling a polarization state of the at least one laser beam.

Abstract: Disclosed are compositions which can mimic DNA and/or RNA in cells of a subject and methods of using them as a substrate in testing efficacy of one or more compositions in reducing and/or preventing radiation, such as ultraviolet (UV) radiation-caused DNA and/or RNA damage of said subject. Also disclosed are systems related to the disclosed methods.

Abstract: A system for an EUV light source includes a metrology light source configured to emit a metrology light beam; and an optical beam combiner positioned to receive the metrology light beam and at least one other light beam and to direct the metrology light beam and the at least one other light beam onto a beam path toward a target region. After interacting with the optical beam combiner, the metrology light beam and the at least one other light beam have the same polarization state.

Abstract: A radiation source for a lithographic apparatus uses a plurality of fiber lasers to ignite a fuel droplet at an ignition location to generate EUV radiation. The fiber lasers may be provided to emit parallel to an optical axis and a telescopic optical system is provided to focus the lasers at the ignition location, or the lasers may be directed towards the optical axis with a final focus lens being used to reduce beam waist. The lasers may be provided in two or more groups to allow them to be independently controlled and some of the lasers may be focused at a different location to provide a pre-pulse. Radiation from fiber lasers may also be combined using dichroic mirrors.

Abstract: In a light source device, a control unit causes an energy density of a laser light in a lighting start region RS when a laser support light is maintained to be lower than an energy density of the laser light in the lighting start region RS when the laser support light is put on. For this reason, when the laser support light is maintained, a laser light L is radiated to the lighting start region RS at an energy density of a degree where sputtering does not occur. Therefore, in the light source device, because sputtering in a light emission sealing body can be suppressed, a sufficiently long life can be realized.

Abstract: A method for monitoring transportation of a package, as well as the apparatus for monitoring transportation, that uses an environmental monitoring device electrically connected to a vibration-to-electricity converter. The vibration-to-electricity converter is electrically attached to the environmental monitoring device.

Abstract: A layered infrared emitter structure includes only semi-transparent metal layers, preferably one semi-transparent metal layer, and one or more dielectric layers on both sides of the semi-transparent metal layer. Further, an electric heating wiring is arranged in or between any of the dielectric layers to heat the semi-transparent metal layer up to a required infrared emission temperature, preferably to a temperature within a range from 400° C. to 1000° C.

Abstract: An extreme ultraviolet light generation apparatus may include: a chamber including a plasma generation region to which a target is supplied, the target being turned into plasma so that extreme ultraviolet light is generated in the chamber; a target supply part configured to supply the target to the plasma generation region by outputting the target as a droplet into the chamber; a droplet detector configured to detect the droplet traveling from the target supply part to the plasma generation region; an imaging part configured to capture an image of an imaging region containing the plasma generation region in the chamber; and a controller configured to control an imaging timing at which the imaging part captures the image of the imaging region, based on a detection timing at which the droplet detector detects the droplet.

Abstract: An infrared surface light source generating device includes a substrate layer and a carbon material layer formed on a surface of the substrate layer and having a sheet resistance value ranged between 0.01 and 1000?/?. The carbon material layer is able to emit far infrared rays when it is heated by an amount of external low-power energy to a temperature above 36° C. A method of manufacturing the above infrared surface light source generating device is also disclosed. The method includes the steps of (A) providing a substrate layer and (B) forming a carbon material layer that is located on a surface of the substrate layer and has a sheet resistance value ranged between 0.01 and 1000?/?. Since the method involves only a simplified manufacturing process, the infrared surface light source generating device can be manufactured at reduced cost.

Abstract: A quantum device includes a phononic crystal defined on a semiconductor substrate. Phononic cavities are defined in the phononic crystal, wherein each phononic cavity contains an implanted acceptor atom. Phononic waveguides are defined in the phononic crystal, wherein each waveguide is coupled to at least one phononic cavity. At least some phononic waveguides are arranged to provide coupling between phononic cavities and ultrasonic transducers. At least some phononic waveguides are arranged to provide coupling between different phononic cavities.

Abstract: An illumination optical unit for EUV projection lithography guides illumination light toward an object field. A field facet mirror of the illumination optical unit has a multiplicity of individual mirrors which are switchable between at least two tilting positions. A pupil facet mirror of the illumination optical unit has a plurality of stationary pupil facets and is disposed downstream of the field facet mirror in the beam path of the illumination light. The pupil facets serve for the at least sectionally superimposing imaging of a group of the individual mirrors of the field facet mirror into the object field via a group-mirror illumination channel.

Abstract: A system for forming a laser-sustained plasma includes a gas containment element, an illumination source configured to generate pump illumination, and a collector element configured to focus the pump illumination from the pumping source into the volume of the gas mixture in order to generate a plasma within the volume of the gas mixture that emits broadband radiation. The gas containment element may be configured to contain a volume of a gas mixture including a first gas component and a second gas component. The second gas component suppresses at least one of a portion of the broadband radiation associated with the first gas component or radiation by one or more excimers associated with the first gas component from a spectrum of radiation exiting the gas mixture.

Abstract: A method and apparatus for control of a dose of extreme ultraviolet (EUV) radiation generated by a laser produced plasma (LPP) EUV light source. Each laser pulse is modulated to be of a width that is determined to be sufficient to allow for extraction of a suitable uniform amount of energy in the laser source gain medium; in some embodiments the suitable uniform amount of energy to be extracted may be selected to avoid self-lasing. The EUV energy created by each pulse is measured and total EUV energy created by the fired pulses determined, and a desired energy for the next pulse is determined based upon whether the total EUV energy is greater or less than a desired average EUV energy times the number of pulses. The energy of the next pulse is modulated, either by modulating its magnitude or by modulating the amplification of the pulse by one or more amplifiers, but without decreasing the determined width of the laser pulse.

Abstract: A spectroscopic analysis apparatus includes a light source section having a first light source and second light source that radiate light fluxes, a wavelength tunable interference filter, an imaging section that captures light having passed through the wavelength tunable interference filter to acquire a first spectroscopic image when the object being imaged is irradiated with the light from the first light source and a second spectroscopic image when the object being imaged is irradiated with the light from the second light source, a pixel detector that detects an abnormal pixel in the first spectroscopic image, and a light amount corrector that replaces the amount of light at the abnormal pixel in the first spectroscopic image with the amount of light at a pixel in the second spectroscopic image that is located in the same position as the abnormal pixel.

Abstract: An initial pulse of radiation is generated; a section of the initial pulse of radiation is extracted to form a modified pulse of radiation, the modified pulse of radiation including a first portion and a second portion, the first portion being temporally connected to the second portion, and the first portion having a maximum energy that is less than a maximum energy of the second portion; the first portion of the modified pulse of radiation is interacted with a target material to form a modified target; and the second portion of the modified pulse of radiation is interacted with the modified target to generate plasma that emits extreme ultraviolet (EUV) light.

Abstract: A method includes providing a target material that comprises a component that emits extreme ultraviolet (EUV) light when converted to plasma; directing a first beam of radiation toward the target material to deliver energy to the target material to modify a geometric distribution of the target material to form a modified target; directing a second beam of radiation toward the modified target, the second beam of radiation converting at least part of the modified target to plasma that emits EUV light; measuring one or more characteristics associated with one or more of the target material and the modified target relative to the first beam of radiation; and controlling an amount of radiant exposure delivered to the target material from the first beam of radiation based on the one or more measured characteristics to within a predetermined range of energies.

Abstract: A collector transfers EUV illumination light from a radiation source region to illumination optics. Imaging optics of the collector image the radiation source region in a downstream focal region. The imaging optics are embodied so that the radiation source is imaged with at least one first imaging scale by the EUV illumination light, which is emitted with beam angles <20° between the radiation source region and the downstream focal region. The imaging optics are also embodied so that the radiation source is imaged with at least one second imaging scale by the illumination light emitted with beam angles >70°. The two imaging scales for the beam angles <20° on the one hand and >70° on the other hand differ by no more than a factor of 2.5. In addition to a corresponding collector, an illumination system contains field facets transfer optics.

Abstract: A nonlinear optical microscope is provided, including source of a pulsed laser beam; a spatial light modulator for modulating the spatial profile of the pulsed laser beam; an objective for guiding the modulated beam towards a slide intended to carry a specimen; and a detector for collecting signals originating from the specimen, wherein the spatial light modulator is designed to modulate the intensity and/or the phase of the pulsed laser beam on the rear pupil of the objective to produce a beam that is axially extended and confined in one or two lateral directions after focusing by the objective, and wherein the slide is placed on a motorized stage of a histology slide scanner assembly.

Abstract: A device and method are disclosed in which gas is caused to flow parallel to a flow of source material to form a gas shroud. The gas shroud may protect flow of source material from being disrupted by a cross flow of gas. The gas shroud may also limit heating of a physical shroud through which the source material passes and limit accumulation of source material on the physical shroud by deforming a plasma bubble formed during irradiation of the source material so that the plasma bubble does not come too near the physical shroud. A device and method are also disclosed for establishing an additional transverse flow of gas so that the gas shroud does not cause source material contamination of an optic used to collect light generated during irradiation of the source material.

Abstract: An apparatus comprising at least one sealing aperture (40) comprising a hollow part (41), having an inner surface (42), extending at an interface between different zones (50;60) of the apparatus; and a member (43) positioned in the hollow part configured to substantially transmit EUV radiation and to substantially filter non-EUV radiation at the interface; wherein the inner surface of the hollow part has a surface treatment configured to increase absorption of the non-EUV radiation that is transferred by the member to the hollow part.

Abstract: A method and apparatus for control of a dose of extreme ultraviolet (EUV) radiation generated by a laser produced plasma (LPP) EUV light source that combines pulse control mode and pulse modulation. The EUV energy created by each pulse is measured and total EUV energy created by the fired pulses determined, a desired energy for the next pulse is determined based upon whether the total EUV energy is greater or less than a desired average EUV energy times the number of pulses. If the desired pulse energy for the next droplet is within the range of one or more pulse modulation actuators, the pulse is modulated; otherwise, the pulse is fired to miss the droplet. This provides greater control of the accumulated dose as well as uniformity of the EUV energy over time, greater ability to compensate for pulses that generate EUV energy that is higher or lower than nominal expected values, and ability to provide an average EUV energy per pulse that is less than the nominal minimum EUV energy per pulse of the system.

Abstract: A radiographic projector for housing and projecting a radioisotope for use in radiography is described. The front end of the projector has a chamfered surface for receiving an ancillary shielding component. The material used for the front end surface of the projector is tungsten powder in a less dense material matrix. A locking mechanism for a projector is described, including a locking bar for locking a source holder in the projector. The locking mechanism includes an interlock section for retaining the locking bar in an unlocked position while a source holder is not in its storage position, and a latch section for latching the locking bar in the unlocked position prior to engagement of the interlock section. A holster for mounting a radiographic projector and a refraction cage for a remote windout mechanism are also described.

Abstract: A lighting device may include a pump laser row and a phosphor arrangement. The pump laser row is designed for the purpose of emitting pump laser radiation for the irradiation of the phosphor arrangement. The phosphor arrangement has at least two different phosphors, which can be irradiated with the pump laser radiation and emit the pump laser radiation again at least partially and converted in wavelength differently in each case, and a movable mirror, which is designed for the purpose of reflecting the pump laser radiation of the pump laser row in a targeted manner on the phosphors in dependence on its position.

Abstract: The disclosure concerns an infrared emitter is provided comprising a metalized membrane emitting infrared light in operation. The membrane comprises a two dimensional array of infrared wavelength sized through-holes and to each side a thin metal layer comprising also an array of through-holes. The through-holes are arranged as a two-dimensional periodic array and each of said through-holes have a cross section having a maximum and a minimum dimension of less than any wavelength of the emitted infrared light. The peak wavelength of the emitted infrared light is proportional to the periodicity of the through-holes. At least one of the metal layers is connected to an electrical current source that provides an electrical current that heats at least one of the metal layers so that a narrow bandwidth and highly directive light beam of infrared light is emitted. The membrane is arranged on a membrane support and both are made of a material that resists to temperatures higher than 400°.

Abstract: A cyclotron includes a pole; a superconductive coil wound so as to cover an outer periphery of the pole; a coil support that supports the superconductive coil; a cooling part that cools the superconductive coil; a first support that is connected to the coil support and is capable of adjusting a position of the coil support in a direction of a winding central axis of the superconductive coil; and a second support that is connected to the coil support and is capable of adjusting the position of the coil support in an orthogonal direction orthogonal to the direction of the winding central axis of the superconductive coil. The second support has a link mechanism that is displaceable in each of the direction of the winding central axis and the orthogonal direction.

Abstract: An electron beam irradiation apparatus that emits an electron beam into a container, the electron beam irradiation apparatus including: a vacuum housing constituting a vacuum chamber; an electron generator provided in the vacuum housing; a cylindrical nozzle member that is extended from the vacuum housing so as to be inserted into the container and has exit windows on the distal end of the nozzle member, the exit windows being provided for emission of an electron beam generated by the electron generator into the container; and a magnetic shield member for the vacuum chamber and a magnetic shield member for the nozzle member, the magnetic shield members being respectively provided for the vacuum housing and the nozzle member so as to block variable magnetism generated around an electron beam trajectory extended from the electron generator to the exit windows.

Abstract: A measuring device and corresponding method for measuring a measurement object, comprising an illumination device for illuminating the measurement object with an illumination pattern, a pattern generation device with at least one pattern generating element for bringing about a positionally variant intensity distribution of the illumination pattern, and an optical sensor arrangement for detecting the illumination pattern reflected and/or scattered by the measurement object. The measuring device has an optics which is telecentric at least on the measurement object side and is arranged in a beam path from the illumination device to the measurement object. The optical sensor arrangement detects the illumination pattern through at least one part of the telecentric optics. The pattern generating device is designed in such a way that the illumination pattern has a positionally and/or spectrally variant vertex focal length distribution on the measurement object side.

Abstract: Disclosed herein a light source apparatus that is capable of suppressing a light transmission rate of a debris trap to be lowered and a reflection rate in a light condenser mirror to be lowered. In the light source apparatus, a shielding member is provided having an aperture is provided in front of a stationary type foil trap to limit a solid angle of light emitted from a high temperature plasma. Furthermore, the stationary type foil trap is provided with a driving mechanism to allow the foil trap to be revolved such that an adhesion part of the debris of the foil trap is deviated from a position of the foil trap facing the aperture.