Radiant Energy Generation And Sources Patents (Class 250/493.1)
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Patent number: 9516730Abstract: An extreme-ultraviolet (EUV) light source comprising an optic, a target material, and a laser beam passing through said optic along a beam path to irradiate said target material. The EUV light source further includes a system generating a gas flow directed toward said target material along said beam path, said system having a tapering member surrounding a volume and a plurality of gas lines, each gas line outputting a gas stream into said volume.Type: GrantFiled: June 8, 2011Date of Patent: December 6, 2016Assignee: ASML Netherlands B.V.Inventors: Vladimir B. Fleurov, William N. Partlo, Igor V. Fomenkov, Alexander I. Ershov
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Patent number: 9509115Abstract: An extreme ultraviolet light generation system used with a laser apparatus may be provided, and the extreme ultraviolet light generation system may include: a chamber including at least one window for at least one laser beam and a target supply unit for supplying a target material into the chamber; and at least one polarization control unit, provided on a laser beam path, for controlling a polarization state of the at least one laser beam.Type: GrantFiled: August 7, 2015Date of Patent: November 29, 2016Assignee: GIGAPHOTON INC.Inventors: Tatsuya Yanagida, Osamu Wakabayashi
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Patent number: 9497842Abstract: A system includes a chamber, a laser beam apparatus configured to generate a laser beam to be introduced into the chamber, a laser controller for the laser beam apparatus to control at least a beam intensity and an output timing of the laser beam, and a target supply unit configured to supply a target material into the chamber, the target material being irradiated with the laser beam for generating extreme ultraviolet light.Type: GrantFiled: January 11, 2016Date of Patent: November 15, 2016Assignee: GIGAPHOTON INC.Inventors: Tsukasa Hori, Kouji Kakizaki, Tatsuya Yanagida, Osamu Wakabayashi, Hakaru Mizoguchi
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Patent number: 9494785Abstract: Image resolution enhancement techniques are implemented using a single image an unstructured broadband illumination. By placing an axicon and a convex lens pair in an optical path of a microscope, telescope, or the object system, between the system and an image capture pickup device (e.g., a camera) the maximum resolution of the system may be increased through the formation of an interference pattern at the image capture device.Type: GrantFiled: December 9, 2013Date of Patent: November 15, 2016Assignee: PURDUE RESEARCH FOUNDATIONInventors: Steven T. Wereley, Craig A. Snoeyink
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Patent number: 9497841Abstract: An extreme ultraviolet light (EUV) generation system is configured to improve conversion efficiency of energy of a laser system to EUV energy by improving the efficiency of plasma generation. The EUV generation system includes a target generation unit configured to output a target toward a plasma generation region in a chamber. The laser system is configured to generate a first pre-pulse laser beam, a second pre-pulse laser beam, and a main pulse laser beam so that the target is irradiated with the first pre-pulse laser beam, the second pre-pulse laser beam, and the main pulse laser beam in this order. In addition, the EUV generation system includes a controller configured to control the laser system so that a fluence of the second pre-pulse laser beam is equal to or higher than 1 J/cm2 and equal to or lower than a fluence of the main pulse laser beam.Type: GrantFiled: November 18, 2015Date of Patent: November 15, 2016Assignee: GIGAPHOTON INC.Inventors: Tatsuya Yanagida, Osamu Wakabayashi
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Patent number: 9476841Abstract: The invention provides a method and apparatus for a commercially viable EUV light source for EUV metrology and actinic inspection of EUV lithography masks. The invention is carried out using a laser target in the form of a continuous jet of liquid Lithium, circulated in a closed loop system by means of a high temperature pump. The collector mirror is placed outside the vacuum chamber in an environment filled with an inert gas and EUV output to a collector mirror is provided through the spectral purity filter, configured as an EUV exit window for the vacuum chamber. In the vacuum chamber, the input window for the laser beam is coated with a screening optical element. Evaporative cleaning of the EUV spectral purity filter and the screening optical element is provided. The protective shield with a temperature higher than 180° C. may be adjusted around the target jet.Type: GrantFiled: June 14, 2016Date of Patent: October 25, 2016Assignee: OOO “Isteq B.V.”Inventors: Pavel Stanislavovich Antsiferov, Aleksandr Yurievich Vinokhodov, Vladimir Vitalievich Ivanov, Konstantin Nikolaevich Koshelev, Mikhail Sergeyevich Kryvokorytov, Vladimir Mikhailovich Krivtsun, Aleksandr Andreevich Lash, Vyacheslav Valerievich Medvedev, Yury Viktorovich Sidelnikov, Oleg Feliksovich Yakushev, Denis Alexandrovich Glushkov, Samir Ellwi, Pavel Viktorovich Seroglazov
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Patent number: 9459154Abstract: An apparatus, method and thin-film structure for producing a blackbody spectrum is disclosed. A first layer of the apparatus is configured to generate heat in response to an applied voltage. A second layer is configured to emit the blackbody radiation spectrum in response to the heat from the first layer. A thermal spreading layer is disposed between the first layer and the second layer. The thermal spreading layer includes a graphene sheet for reducing a spatial variation of the heat in a plane of the thermal spreading layer.Type: GrantFiled: November 19, 2014Date of Patent: October 4, 2016Assignee: RAYTHEON COMPANYInventors: James R. Chow, Kurt S. Ketola, David M. La Komski, Carl W. Townsend, William E. Elias, Stuart J. Marble
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Patent number: 9462668Abstract: Techniques for forming a target and for producing extreme ultraviolet light include releasing an initial target material toward a target location, the target material including a material that emits extreme ultraviolet (EUV) light when converted to plasma; directing a first amplified light beam toward the initial target material, the first amplified light beam having an energy sufficient to form a collection of pieces of target material from the initial target material, each of the pieces being smaller than the initial target material and being spatially distributed throughout a hemisphere shaped volume; and directing a second amplified light beam toward the collection of pieces to convert the pieces of target material to plasma that emits EUV light.Type: GrantFiled: October 2, 2015Date of Patent: October 4, 2016Assignee: ASML Netherlands B.V.Inventors: Yezheng Tao, Robert Jay Rafac, Igor Vladimirovich Fomenkov, Daniel John William Brown, Daniel James Golich
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Patent number: 9442380Abstract: A radiation source (e.g., LPP—laser produced plasma source) for generation of extreme UV (EUV) radiation has at least two fuel particle streams having different trajectories. Each stream is directed to cross the path of an excitation (laser) beam focused at a plasma formation region, but the trajectories are spaced apart at the plasma formation region, and the streams phased, so that only one stream has a fuel particle in the plasma formation region at any time, and so that when a fuel particle from one stream is generating plasma and EUV radiation at the plasma generation region, other fuel particles are sufficiently spaced so as to be substantially unaffected by the plasma. The arrangement permits potential doubling of the radiation intensity achievable for a particular fuel particle size.Type: GrantFiled: October 3, 2013Date of Patent: September 13, 2016Assignee: ASML Netherlands B.V.Inventors: Ramin Badie, Vadim Yevgenyevich Banine, Johan Frederik Dijksman, Antonius Theodorus Wilhelmus Kempen, Andrei Mikhailovich Yakunin, Hendrikus Robertus Marie Van Greevenbroek, Koen Gerhardus Winkels
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Patent number: 9414476Abstract: The present invention relates to a method and device for generating optical radiation (18), in particular EUV radiation or soft x-rays, by means of electrically operated discharges. A plasma (15) is ignited in a gaseous medium between at least two electrodes (1, 2), wherein said gaseous medium is produced at least partly from a liquid material (6), which is applied to one or several surface(s) moving in the discharge space and is at least partially evaporated by one or several pulsed energy beam(s) (9). At least two consecutive pulses (16) are applied within a time interval of each electrical discharge onto said surface(s). The delay between and/or the pulse energy of said consecutive pulses is controlled to stabilize the position of an emission center of the plasma (15).Type: GrantFiled: June 12, 2012Date of Patent: August 9, 2016Assignees: FRAUNHOFER-GESELLSCHAFT ZUR FOERDERUNG DER ANGEWANDTEN FORSCHUNG E.V., USHIO DENKI KABUSHIKI KAISHAInventors: Ralf Pruemmer, Ralf Conrads, Klaus Bergmann, Felix Kuepper, Jeroen Jonkers
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Patent number: 9357928Abstract: A method of noninvasively imaging tissue within a body includes irradiating the tissue using an imaging laser including a Raman-based laser tuner, the radiation including a plurality of laser pulses, each having energy greater than 100 mJ; receiving an acoustic signal generated by vibrational energy in the tissue, wherein the vibrational energy is a result of selective overtone excitation of molecules in the tissue by the radiation; and automatically converting the acoustic signal to an image representative of the tissue using a processor. An imaging system includes an imaging laser configured to irradiate tissue with a plurality of laser pulses using a Raman-based laser tuner. An ultrasonic transducer receives an acoustic signal generated by vibrational energy in the tissue due to overtone excitation by the radiation. A processor is configured to automatically produce an image representative of the tissue using the received acoustic signal.Type: GrantFiled: January 16, 2014Date of Patent: June 7, 2016Assignee: Purdue Research FoundationInventor: Ji-Xin Cheng
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Patent number: 9338408Abstract: An image obtaining apparatus includes: a light source configured to irradiate a biological sample having a fluorescent label with excitation light, the excitation light exciting the fluorescent label; an optical system including an objective lens, the objective lens being configured to magnify an imaging target of the biological sample; an image sensor configured to form an image of the imaging target magnified by the objective lens; a movement controller configured to move a focus position of the optical system in an imaging range including at least a range corresponding to the thickness of the imaging target; and a data processing unit configured to exposure the image sensor to light while moving the focus position in the imaging range and obtain a fluorescent image of the biological sample, to thereby calculate distribution information of the fluorescent label in a thickness direction of the imaging target based on the fluorescent image.Type: GrantFiled: November 12, 2012Date of Patent: May 10, 2016Assignee: Sony CorporationInventors: Koichiro Kishima, Ryu Narusawa, Fumiyasu Suzuki
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Patent number: 9338870Abstract: A first remaining plasma that at least partially coincides with a target region is formed; a target including target material in a first spatial distribution to the target region is provided, the target material including material that emits EUV light when converted to plasma; the first remaining plasma and the initial target interact, the interaction rearranging the target material from the first spatial distribution to a shaped target distribution to form a shaped target in the target region, the shaped target including the target material arranged in the shaped spatial distribution; an amplified light beam is directed toward the target region to convert at least some of the target material in the shaped target to a plasma that emits EUV light; and a second remaining plasma is formed in the target region.Type: GrantFiled: December 8, 2014Date of Patent: May 10, 2016Assignee: ASML Netherlands B.V.Inventors: Yezheng Tao, John Tom Stewart, IV, Daniel J.W. Brown
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Patent number: 9301382Abstract: A device and method are disclosed in which gas is caused to flow parallel to a flow of source material to form a gas shroud. The gas shroud may protect flow of source material from being disrupted by a cross flow of gas. The gas shroud may also limit heating of a physical shroud through which the source material passes and limit accumulation of source material on the physical shroud by deforming a plasma bubble formed during irradiation of the source material so that the plasma bubble does not come too near the physical shroud. A device and method are also disclosed for establishing an additional transverse flow of gas so that the gas shroud does not cause source material contamination of an optic used to collect light generated during irradiation of the source material.Type: GrantFiled: December 2, 2013Date of Patent: March 29, 2016Assignee: ASML NETHERLANDS B.V.Inventors: Alexander I. Ershov, David Evans, Matthew Graham
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Patent number: 9267662Abstract: The invention relates to a folding reflector (1) having shade spokes (5) that are annularly hinged on a bearing body (7), by which spokes a reflecting cover (3) can be mounted. The reflector is characterized in that the ends of the shade spokes (5) that turned toward the linkage thereof extend beyond said linkage respectively and in that, due to the effect on said sections (9) of the shade spokes (5) extending beyond the linkage, said sections can be moved into the mounting position and back.Type: GrantFiled: March 6, 2012Date of Patent: February 23, 2016Assignee: Bron Elektronik AGInventor: Francois Portmann
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Patent number: 9232623Abstract: A target material is provided at a target location, the target material including a material that emits extreme ultraviolet light when converted to plasma, and the target material extending in a first extent along a first direction and in a second extent along a second direction; an amplified light beam is directed along a direction of propagation toward the target location; and the amplified light beam is focused in a focal plane, where the target location is outside of the focal plane and an interaction between the amplified light beam and the target material converts at least part of the target material to plasma that emits EUV light.Type: GrantFiled: September 17, 2014Date of Patent: January 5, 2016Assignee: ASML Netherlands B.V.Inventors: Robert J. Rafac, Richard L. Sandstrom, Daniel Brown, Kai-Chung Hou
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Patent number: 9182298Abstract: Blackbody calibration standard including a main absorber and a secondary absorber, wherein the main absorber is comprised in a cavity and the secondary absorber is comprised in a cavity and the secondary absorber is arranged such that it surrounds the cavity comprising the main absorber.Type: GrantFiled: August 31, 2012Date of Patent: November 10, 2015Assignee: European Organisation for Astronomical Research in the Southern HemisphereInventor: Pavel Yagoubov
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Patent number: 9155911Abstract: As part of a charged particle cancer therapy system, a negative ion source is used to generate and accelerate an anion, such a C?, and to convert the anion to a cation, such as C6+, through use of one or more electron extraction subsystems. Initially, an electric field is pulsed across a magnetic field to generate the C? anion. Subsequent to extraction of the C? anion from a plasma region using pulsed electrodes, one or both of a hydrogen gas electron stripping system and a carbon foil electron stripping system converts the carbon anion into the cation. The resultant cation is accelerated in a synchrotron, transported along a beam-line, and targeted to a tumor resulting in ablation of the tumor.Type: GrantFiled: March 24, 2014Date of Patent: October 13, 2015Inventor: Vladimir Balakin
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Patent number: 9155179Abstract: Techniques for forming a target and for producing extreme ultraviolet light include releasing an initial target material toward a target location, the target material including a material that emits extreme ultraviolet (EUV) light when converted to plasma; directing a first amplified light beam toward the initial target material, the first amplified light beam having an energy sufficient to form a collection of pieces of target material from the initial target material, each of the pieces being smaller than the initial target material and being spatially distributed throughout a hemisphere shaped volume; and directing a second amplified light beam toward the collection of pieces to convert the pieces of target material to plasma that emits EUV light.Type: GrantFiled: November 21, 2014Date of Patent: October 6, 2015Assignee: ASML Netherlands B.V.Inventors: Yezheng Tao, Robert J. Rafac, Igor V. Fomenkov, Daniel J. W. Brown, Daniel J. Golich
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Patent number: 9087618Abstract: The present invention relates to a method and apparatus for solidifying radioactive waste accompanying chlorine recycling or radioactive iodine removal. The present invention provide a method and apparatus for treating radioactive waste composed of volatile metal halide with high corrosiveness at a high temperature through a solidifying system including crushing, mixing/dehalogenating and sintering. In the inventive method and apparatus for solidifying radioactive waste, a dechlorination process by using a dehalogenation material is performed on highly corrosive metal salt under an oxidizing atmosphere by using a method of controlling a temperature on the surface of a reactor, and solidification is carried out by removing radioactive iodine while reusing chlorine contained in an exhaust gas. Accordingly, the generated amount of total waste can be reduced, and therefore the inventive method and apparatus can be usefully used in preparing a solidified body with high durability.Type: GrantFiled: December 22, 2011Date of Patent: July 21, 2015Assignees: Korea Atomic Energy Research Institute, Korea Hydro and Nuclear Power Co., LTDInventors: Hwan Seo Park, Byung-Gil Ahn, Hwan-Young Kim, In-Tae Kim, Yung-Zun Cho, Hansoo Lee
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Patent number: 9046416Abstract: A device for the radiometric calibration of infra-red measuring devices is provided. The device is in the form of a heated metal surface that is used as a radiant surface and is coated with a high-emission material. The device includes a spherical segment, the interior of which is coated with the high-emission material and the opening of the spherical segment is used as an aperture for an infra-red device that can be arranged in the center of the aperture.Type: GrantFiled: May 25, 2011Date of Patent: June 2, 2015Assignee: EADS Deutschland GmbHInventor: Jochen Barth
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Publication number: 20150144808Abstract: A plasma source apparatus for generating a beam of charged particles is disclosed.Type: ApplicationFiled: May 20, 2013Publication date: May 28, 2015Inventors: Colin Ribton, Allan Sanderson
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Patent number: 9040943Abstract: A chamber used in an extreme ultraviolet light generation apparatus that generates extreme ultraviolet light by irradiating a target material with a laser beam may include a chamber receptacle, a heat shield that is disposed within the chamber receptacle between a predetermined region where the target material turns into plasma and the chamber receptacle and that is configured to absorb heat produced at the predetermined region when the target material turns into plasma, and a support portion configured to attach the heat shield to the chamber receptacle, and further, the support portion may include an absorbing portion configured to absorb stress produced in the heat shield deforming due to the heat, by expanding/contracting in response to the thermal deformation of the heat shield.Type: GrantFiled: February 5, 2014Date of Patent: May 26, 2015Assignee: GIGAPHOTON INC.Inventor: Toshihiro Nishisaka
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Publication number: 20150136987Abstract: Provided is a terahertz wave generator having the following structural feature in a plane perpendicular to an optical propagation direction of an optical waveguide. Specifically, 0<r1<r2 is satisfied, where r1 represents a radius of curvature of a terahertz wave emitting plane of a coupling member at a point A at which a line extending from the optical waveguide in the normal direction to a surface of a substrate crosses the terahertz wave emitting plane of the coupling member, and r2 represents a radius of curvature of a wavefront of a terahertz wave at the same point A. Here, r1 has a positive value when being convex in a propagation direction of the terahertz wave.Type: ApplicationFiled: July 1, 2013Publication date: May 21, 2015Inventor: Kousuke Kajiki
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Patent number: 9035271Abstract: The present invention is directed to a mobile radiation system that comprises a mobile radiation device coupled to a control unit; a radiation blocker having an adaptor opening for receiving said mobile radiation device when said mobile radiation device is in a seated position on said radiation blocker; and a mobile carrier comprising a first compartment for housing said radiation blocker, a second compartment for housing said control unit, and one or more carrier motion devices. The adaptor opening can dimensionally fit the mobile radiation device to block radiations from the mobile radiation device when said mobile radiation device is in the seated position. The mobile radiation device can produce radiation having peak radiation wavelength in a range of from 250 nm to 450 nm and can have a peak irradiation power in a range of from 0.5 W/cm2 to 10 W/cm2.Type: GrantFiled: August 22, 2013Date of Patent: May 19, 2015Assignee: SPDI, Inc.Inventors: John Wilson, Robert Schenk
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Publication number: 20150129782Abstract: A modular germicidal light grid system for use inside an air treatment apparatus that has a plenum in which a stream of air is enclosed. The system comprises at least one elongate member and at least one lamp assembly. Each lamp assembly comprises a housing defining at least one socket and is mounted to one elongate member at a predetermined position. The system further comprises at least one linear germicidal light source. Each light source has a longitudinal axis and a distal end constructed and arranged to mount within one socket of the housing. The elongate member is mounted within the plenum and the lamp assembly is mounted to the elongate member such that the longitudinal axis of the light source extends therein the stream of air and is positioned at an acute light angle relative to the direction of flow of the stream of air.Type: ApplicationFiled: November 11, 2014Publication date: May 14, 2015Inventors: JOEL E. HORNE, RICHARD P. SUTTON
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Patent number: 9029816Abstract: A source assembly (48) configured to generate infrared electromagnetic radiation includes an emitter (60) that emits electromagnetic radiation over an emission solid angle. A portion of the emitted electromagnetic radiation is used in a detection. The portion of the user electromagnetic radiation surrounds the optical path in a usable solid angle. Electromagnetic radiation outside of the usable solid angle is focused back by a reflection assembly (64) onto the emitter to enhance the efficiency of the emitter.Type: GrantFiled: December 14, 2012Date of Patent: May 12, 2015Assignee: Koninklijkle Philips N.V.Inventor: James Torrance Russell
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Publication number: 20150123016Abstract: An infrared radiation element includes: a first insulating layer having heat insulating properties and electrically insulating properties; a heating element layer provided on the first insulating layer and configured to radiate infrared radiation when energized; and a second insulating layer provided on an opposite side of the heating element layer from the first insulating layer and having heat insulating properties and electrically insulating properties. The second insulating layer transmits the infrared radiation radiated from the heating element layer. The heating element layer has such a sheet resistance that impedance of the heating element layer matches impedance of space which is in contact with the second insulating layer.Type: ApplicationFiled: March 12, 2013Publication date: May 7, 2015Applicant: PANASONIC INTELLECTUAL PROPERTY MANAGEMENT CO., LTD.Inventors: Yoshiharu Nagatani, Yoshifumi Watabe, Koji Tsuji, Masao Kirihara, Takaaki Yoshihara, Hirotaka Matsunami
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Publication number: 20150123015Abstract: An apparatus for generating ultraviolet light for irradiating a substrate. The apparatus includes a housing enclosing an interior space. The housing includes an inlet for receiving a cooling air flow, and a window configured to emit ultraviolet light and discharge the cooling air flow. A lamp bulb is mounted within the interior space between the inlet and the window. First and second microwave generators are mounted between the inlet and the lamp bulb. A plate is positioned between the inlet and the first and second microwave generators, the plate at least partially defining a plenum within the housing and including first and second openings generally aligned with the respective first and second microwave generators to direct first and second portions of the cooling air flow at the first and second microwave generators.Type: ApplicationFiled: November 3, 2014Publication date: May 7, 2015Inventors: James V. Bachman, James M. Borsuk, Edward C. McGhee, James C. Smith
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Patent number: 9018604Abstract: An arrangement for handling a liquid metal for cooling revolving components of a radiation source based on a radiation-emitting plasma has the handling arrangement for the liquid metal comprises a reservoir of liquid metal in a vessel, a tempering device for adjusting the temperature moderately above the melting point of the metal, a pump unit for moving the liquid metal in circulation. The handling unit containing the reservoir and the pump unit is provided for transporting the metal into a separated source module via a feed pipe and a return pipe for guiding highly heated metal back from the source module into the reservoir. The return pipe is formed as a straight pipe slightly inclined to the reservoir to guide the heated metal back by action of gravity in a substantially laminar flow.Type: GrantFiled: April 11, 2014Date of Patent: April 28, 2015Assignee: USHIO Denki Kabushiki KaishaInventors: Goto Niimi, Paulus P. M. Blom, Wilhelmus V. J. Van Nunspeet
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Patent number: 9012874Abstract: An ion implantation system and process, in which the performance and lifetime of the ion source of the ion implantation system are enhanced, by utilizing isotopically enriched dopant materials, or by utilizing dopant materials with supplemental gas(es) effective to provide such enhancement.Type: GrantFiled: July 22, 2014Date of Patent: April 21, 2015Assignee: Entegris, Inc.Inventors: Robert Kaim, Joseph D. Sweeney, Anthony M. Avila, Richard S. Ray
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Publication number: 20150102238Abstract: A glass radiation-source with customized geometries to maximize receipt of radiation into treatment areas that is formed from either neutron-activated glass, radioisotopes molecularly bonded to glass, or radioisotopes encased within glass.Type: ApplicationFiled: April 2, 2014Publication date: April 16, 2015Applicant: IP LIBERTY VISION CORPORATIONInventors: Paul T. FINGER, Toby WELLES
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Patent number: 9006693Abstract: An energy degrader includes: a damping unit that attenuates energy of incident charged particles and has a thickness changing stepwise or continuously according to a position of a two-dimensional coordinate system within a plane crossing a traveling direction of charged particles; and a driving unit that performs translational driving of the damping unit in first and second axial directions that are directions of two axes crossing each other in the two-dimensional coordinate system.Type: GrantFiled: July 17, 2013Date of Patent: April 14, 2015Assignee: Sumitomo Heavy Industries, Ltd.Inventor: Kenzo Sasai
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Patent number: 9000402Abstract: An LPP EUV light source includes a vacuum chamber 12 that is maintained in a vacuum environment; a gas jet device 14 that forms a hypersonic steady gas jet 1 of the target substance inside the vacuum chamber so as to be collected; and a laser device 16 that collects and radiates a laser beam 3 to the hypersonic steady gas jet, wherein plasma is produced by exciting the target substance at the light collecting point 2 of the laser beam and EUV light 4 is emitted therefrom.Type: GrantFiled: August 27, 2010Date of Patent: April 7, 2015Assignees: IHI Corporation, Tokyo Institute of TechnologyInventors: Hajime Kuwabara, Kazuhiko Horioka
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Patent number: 9000404Abstract: An extreme-ultraviolet (EUV) light source is described herein comprising an optic; a primary EUV light radiator generating an EUV light emitting plasma and producing a deposit on said optic; and a cleaning system comprising a gas and a secondary light radiator, the secondary light radiator generating a laser produced plasma and producing a cleaning species with the gas.Type: GrantFiled: December 19, 2013Date of Patent: April 7, 2015Assignee: ASML Netherlands, B.V.Inventors: Alexander N. Bykanov, Silvia De Dea, Alexander I. Ershov, Vladimir B. Fleurov, Igor V. Fomenkov, William N. Partlo
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Patent number: 8993987Abstract: A target supply device may include a receptacle for holding a liquid target material, a first electrode disposed within the receptacle, a nozzle portion provided in the receptacle, a second electrode provided with a first path and disposed facing the nozzle portion, a third electrode provided with a second path that, along with the first path, defines a trajectory of the liquid target material released from the nozzle portion, a first power source that applies a first potential that is higher than a common potential to the first electrode, a second power source that applies a second potential that is lower than the common potential to the third electrode, and a third power source that applies a third potential that is no greater than the first potential and is no less than the second potential to the second electrode.Type: GrantFiled: August 28, 2013Date of Patent: March 31, 2015Assignee: Gigaphoton Inc.Inventor: Hiroshi Umeda
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Publication number: 20150083914Abstract: A railway reference machine is provided for surveying and aligning a railroad track, and includes a collapsible projector assembly having a pusher buggy assembly, and a lifting device. A plurality of projectors is mounted to a projector cart. The pusher buggy assembly has extendable and retractable linkage sections such that the linkage sections are stackable and nestable within a space defined by the lifting device and the projector cart. At one end, the pusher buggy assembly is connected to the projector cart and at an opposite end is connected to the lifting device such that the projector cart pivots upwardly about a pivot point to rest the projector assembly in a space defined by a chassis being dimensional for supporting the reference machine, and pivots downwardly about the pivot point to lower the projector assembly on the railroad track.Type: ApplicationFiled: September 18, 2014Publication date: March 26, 2015Inventor: David A. Spence
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Patent number: 8984800Abstract: An insect decoy is provided that includes a vapor-isolated vessel, a chemical compound disposed within the vapor-isolated vessel, and an excitation energy source. The chemical compound may have one or more absorption bands at a set of absorption wavelengths and have one or more emission bands at a set of emission wavelengths. The excitation energy source may be configured to produce electromagnetic radiation at the absorption wavelengths so as to fluoresce the chemical compound and release photons at the emission wavelengths. The vapor-isolated vessel may be configured with at least one infrared transmissive window that is substantially transparent to the released photons at the emission wavelengths of the chemical compound.Type: GrantFiled: March 15, 2013Date of Patent: March 24, 2015Assignee: Technology SG, L.P.Inventors: Eric L. Canfield, Thomas M. Dykstra, Scott J. Soma, Robert E. Rasmussen, Robert P. Alston
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Publication number: 20150076372Abstract: Systems and methods are discussed to create radiation from one or more compact toroids. Compact toroids can be created from plasma of gases within a confinement chamber using a plurality of coils of various densities of windings. High current pulses can be generated within the coil and switched at high frequencies to repeatedly generate compact toroids within the plasma. The plasma can produce radiation at various wavelengths that is focused toward a target or an intermediate focus.Type: ApplicationFiled: August 15, 2014Publication date: March 19, 2015Inventors: Timothy Ziemba, Kenneth E. Miller, John G. Carscadden, James Prager, Angus Mcnab
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Publication number: 20150069272Abstract: A light-emitting source for curing applications is disclosed. The light-emitting source comprises a first housing having a top wall and one or more side walls. The top wall and the one or more side walls define a first enclosure having a first open end. The light-emitting source further comprises a plurality of light-emitting devices arranged within the first enclosure of the first housing. One side of each of the plurality of light-emitting devices faces outward from the first open end of the first enclosure. The plurality of light-emitting devices is configured to emit light from the first open end to produce a substantially uniform area of illumination on a facing portion of a surface of a target.Type: ApplicationFiled: September 5, 2014Publication date: March 12, 2015Inventors: Darrin Leonhardt, Pradyumna Kumar Swain
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Publication number: 20150069256Abstract: There are provided a radiation generating apparatus and a radiation imaging apparatus that have excellent transportability. The radiation generating apparatus and radiation imaging apparatus include a radiation generating unit configured to generate radiation, an arm configured to support the radiation generating unit, and a support pillar configured to support the arm and rotate the arm, wherein the support pillar has a housing portion that has a space for housing at least a part of the radiation generating unit.Type: ApplicationFiled: September 10, 2014Publication date: March 12, 2015Inventors: Takeshi Nakata, Hideki Hayashi, Hitomi Ogasawara, Kenta Koyama, Kazuhiro Watanabe
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Patent number: 8976932Abstract: In an X-ray generator using an ultraviolet laser, the generation of the X-ray is stabilized. In an X-ray generation method for irradiating an ultraviolet laser beam emitted from an ultraviolet laser beam generator on an ultraviolet laser beam receiving surface of an electron beam emitting device, irradiating an electron beam emitted from an electron beam emitting surface of the electron beam emitting device distinguished from the ultraviolet laser beam receiving surface on a metal piece and generating an X-ray from the metal piece, denaturalization of substance of the ultraviolet laser beam receiving surface is prevented by controlling the ultraviolet laser beam.Type: GrantFiled: July 7, 2011Date of Patent: March 10, 2015Assignee: BSR Co., Ltd.Inventor: Toshiyuki Ishida
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Patent number: 8969838Abstract: A device is described herein which may comprise a chamber, a fluid line, a pressurized source material in the fluid line, a component restricting flow of the source material into the chamber, a sensor measuring flow of a fluid in the fluid line and providing a signal indicative thereof, and a pressure relief valve responsive to a signal to reduce a leak of source material into the chamber in the event of a failure of the component.Type: GrantFiled: July 23, 2009Date of Patent: March 3, 2015Assignee: ASML Netherlands B.V.Inventors: Georgiy O. Vaschenko, Krishna Ramadurai, Richard Charles Taddiken
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Patent number: 8963101Abstract: The present invention is directed to a method and device to desorb an analyte using heat to allow desorption of the analyte molecules, where the desorbed analyte molecules are ionized with ambient temperature ionizing species. In various embodiments of the invention a current is passed through a mesh upon which the analyte molecules are present. The current heats the mesh and results in desorption of the analyte molecules which then interact with gas phase metastable neutral molecules or atoms to form analyte ions characteristic of the analyte molecules.Type: GrantFiled: August 8, 2014Date of Patent: February 24, 2015Assignee: Ionsense, Inc.Inventors: Jordan Krechmer, Brian D. Musselman
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Patent number: 8963110Abstract: The generation of EUV light includes rotating a cylinder at least partially coated with a plasma-forming target material, directing pulsed illumination to a first set of helically-arranged spots traversing a material-coated portion of the rotating cylinder in a first direction and directing pulsed illumination to a second set of helically-arranged spots traversing the material-coated portion of the rotating cylinder in a second direction, the pulsed illumination being suitable for exciting the plasma-forming target material.Type: GrantFiled: June 19, 2014Date of Patent: February 24, 2015Assignee: KLA-Tencor CorporationInventors: Layton Hale, Francis Chilese, Qiang Q. Zhang
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Patent number: 8947021Abstract: An accelerator includes an inflector through which a beam entering from an ion source passes and which introduces the beam to an acceleration orbit. The inflector includes a beam convergence unit that converges the beam passing through the inflector. A cyclotron, which accelerates a beam in a convoluted acceleration orbit, includes magnetic poles, D-electrodes, and an inflector. The magnetic poles generate a magnetic field in a direction perpendicular to the acceleration orbit. The D-electrodes generate a potential difference, which accelerates the beam, in the acceleration orbit. A beam, which enters in an incident direction perpendicular to the acceleration orbit, passes through the inflector, and the inflector bends the beam so as to introduce the beam to the acceleration orbit. The inflector includes a beam convergence unit that converges the beam passing through the inflector.Type: GrantFiled: May 23, 2011Date of Patent: February 3, 2015Assignee: Sumitomo Heavy Industries, Ltd.Inventor: Hiroshi Tsutsui
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Patent number: 8944363Abstract: Embodiments of methods, apparatuses, and systems associated with producing and distributing one or more radiative forcing agents to Earth's atmosphere are disclosed.Type: GrantFiled: March 7, 2012Date of Patent: February 3, 2015Assignees: Robert Theodore Jenkins, TGV, LLCInventor: Robert Theodore Jenkins
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Patent number: 8946661Abstract: A radiation source is configured to produce extreme ultraviolet radiation. The radiation source includes a chamber in which, in use, a plasma is generated, and an evaporation surface configured to evaporate a material formed as a by-product from the plasma and that is emitted to the evaporation surface. A method for removing a by-product material in or from a plasma radiation source of a lithographic apparatus includes evaporating a material which, in use, is emitted to that surface from the plasma.Type: GrantFiled: November 27, 2012Date of Patent: February 3, 2015Assignee: ASML Netherlands B.V.Inventors: Erik Roelof Loopstra, Gerardus Hubertus Petrus Maria Swinkels, Vadim Yevgenyevich Banine, Johannes Hubertus Josephina Moors
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Patent number: 8942352Abstract: The present disclosure relates to a field emission X-ray tube apparatus for facilitating cathode replacement, and more particularly, to a field emission X-ray tube apparatus for facilitating cathode replacement in which gates and cathodes are easily arranged through a joining member and a rotation preventing guide when gates and insulating spacers are rotated and joined with the cathodes while the cathodes and respective gates maintain electrical insulation, thereby easily replacing the cathodes.Type: GrantFiled: February 28, 2012Date of Patent: January 27, 2015Assignee: Electronics and Telecommunications Research InstituteInventors: Jin Woo Jeong, Jun Tae Kang, Yoon Ho Song, Jae Woo Kim
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Patent number: 8941086Abstract: A charged particle beam irradiation apparatus includes: an irradiation section configured to irradiate an irradiated body with a charged particle beam; a gantry in which an irradiation section is disposed and which can rotate or oscillate around a central axis line; an enclosure in which the irradiated body is disposed; and a gantry-side transport line that has an inlet section on which a charged particle beam emitted from an accelerator is incident and that is supported on the gantry and configured to transport an incident charged particle beam to the irradiation section, in which the gantry has a first bearing section provided between the inlet section of the gantry-side transport line and the enclosure, and a second bearing section provided on a side opposite to the first bearing section with respect to the enclosure.Type: GrantFiled: May 8, 2014Date of Patent: January 27, 2015Assignee: Sumitomo Heavy Industries, Ltd.Inventor: Satoru Yajima