Abstract: Inter-circuit interference such as a switching noise is suppressed without deteriorating the circuit integration. An output buffer (1) is connected to power source lines (11) and (21) by though holes. In a similar manner, an output buffer (2) is connected to power source lines (11) and (21) and an output buffer (3) is connected to power source lines (22) and (12). The power source lines (21) and (22) are disposed on the same straight line and terminate in an area which is sandwiched by the output buffers (2) and (3). The power source lines (11) and (12) are disposed on the same straight line and terminate in an area which is sandwiched by the output buffers (2) and (3).

Abstract: A notched insulation gate static induction transistor integrated circuit ording to the present invention comprises an enhancement mode CMOS logic circuit including a notched insulation gate static induction transistor in which a threshold voltage is determined to prevent current from flowing in a standby mode, and a depletion enhancement mode CMOS logic circuit including a notched insulation gate static induction transistor in which a threshold voltage is determined to cause current to slightly flow in the standby mode. The enhancement mode CMOS logic circuit and the depletion enhancement mode CMOS logic circuit are formed on a major surface of a substrate, and the depletion enhancement mode CMOS logic circuit is used in a circuit in which an average power consumption in a switching operation is higher than that in the standby mode.

Abstract: A new configurable gate array is defined in a master slice wafer form without borders of the kind currently known between constituent transistor gates, effectively providing a sea of gates over the wafer, interrupted if at all by islands, containing markers or the like; and a resultant application specific integrated circuit formed of such master slice is defined. In the IC, transistor gate cells, which are the same type of cells used for other purposes in the IC, are configured to serve the input and output function. Accordingly, the input and output function may be placed on any location in the IC. As an incident to personalization of the wafer saw lanes are formed of channels that extend over transistor cells and the latter cells are consequently destroyed in slicing the wafer.

Abstract: A linear, bipolar-type application-specific integrated circuit includes a silicon substrate having a plurality of columns of device primitives or cells. Each cell comprises a plurality of identical NPN and PNP transistors flanking a centrally-located capacitor. Each transistor has dual emitters, bases and collectors. Open field areas are reserved on the silicon substrate on the sides of the columns of cells. Formed in these open field areas are precise thin film silicon chromium resistors. Power planes are also routed in these open field areas. A ground plane is routed in the vicinity of the centrally-located capacitor. Standard analog circuits are personalized using two layers of metallization interconnects.

Abstract: A self-cascoding transconductance circuit has cascoding and current sink/source FETs, serially connected with their gates tied together to receive an input voltage, wherein the cascoding FET has a threshold voltage having an absolute value at least 0.1 volts less than that of the current sink/source FET to ensure that the current sink/source FET operates in its saturated region. A CMOS structure implementing the self-cascoding transconductance circuit has two doped threshold adjust regions formed beneath a gate electrode such that the two doped threshold adjust regions respectively effectuate the cascode and current sink/source FETs which then share the gate electrode. A method of forming the CMOS structure includes forming two self-cascoding transconductance circuits electrically connected in parallel such that they share a common drain region between their respective gate electrodes, and each has one source region.

Abstract: Herein disclosed is a semiconductor integrated circuit device which has a memory array or a memory mat formed of memory cells arranged regularly in a matrix shape. At the end portion or inside of the memory array or memory cell in the region of the device where the patterning of the memory cells is discontinued or interrupted, the shape of an element isolating insulating film, which is formed for regulating the memory cells having pattern interruptions, is made substantially identical to the shape of the element isolating insulating film for regulating the memory cells in the region of the device where the patternings of the memory cells are of an uninterrupted regular form. In the location on the chip front face where the regular patterns associated with the memory area are discontinued, there is formed a dummy pattern having a shape made substantially identical to that of a gate electrode arranged at the end portion of the location where the regular patterns are interrupted.

Abstract: A cell library for a semiconductor integrated circuit design, comprises a CMOS cell comprising two power source wires and a CMOS circuit placed between the two power source wires at a predetermined distance, and a BiCMOS cell comprising two power source wires which are placed at a distance equal to the distance between the power source wires in the CMOS cell, a CMOS circuit placed between the two power source wires in the BiCMOS cell, and bipolar transistor circuits placed at both outsides of the two power source wires in the BiCMOS cell.

Abstract: An MIS device which includes a source diffusion layer and a drain diffusion layer under the surface of a semiconductor substrate, and a plurality of gate insulation films on the surface of the semiconductor substrate. Further, a plurality of gate electrodes are formed on the plurality of gate insulation films in series with one another between the source diffusion layer and the drain diffusion layer. Moreover, inter-gate-electrode diffusion layers are formed under the surfaces of regions of the semiconductor substrate among the plurality of the gate electrodes. Insulating side walls are provided on both sides of each of the gate electrodes.

Abstract: Disclosed is an improved Bi-CMOS gate array for increasing integration density. The gate array includes a predetermined region for forming PMOS transistors, a predetermined region for forming bipolar transistors, a predetermined region for forming resistance elements, and a predetermined region for forming NMOS transistors. The resistance element region is formed adjacent to the bipolar transistor region, and, therefore, it is not necessary to provide any interconnection for forming a logic circuit including the resistance element connected to the bipolar transistor. An area occupied by interconnections on the semiconductor substrate is thus reduced, and, therefore the integration density is increased.

Abstract: In a gate array with a RAM, by-pass signal lines which interconnect a logic section and I/O unit circuit of the gate array are disposed so as to extend above the RAM. In order to minimize mutual interference, signal lines formed from a layer which is adjacent to the by-pass signal lines are disposed so as to intersect the latter at right angles. In addition, interconnection pitches in different layer which extend parallel with each other are set so that noises are canceled in differential sense circuits.

Abstract: A master-slice type semiconductor integrated circuit device of the invention has a master substrate and a plurality of basic cells provided on the master substrate. Each of the basic cells includes a plurality of resistors and a plurality of transistors. A plurality of wirings are provided in the master substrate to form a predetermined logic circuit. The wirings in each of the basic cells are changed such that the current to flow in each transistor may be selected in a number of ways without the logical amplitude being changed in the logical circuit.