Abstract: Systems and methods for detecting and monitoring Nickel-silicide process and induced failures. In a first method embodiment, a method of characterizing a Nickel-silicide semiconductor manufacturing process includes accessing a test chip including a parallel coupled chain of transistors, wherein the transistors are designed for inducing stress into Nickel-silicide features of the transistors, and for increasing a probability of a manufacturing failure of the Nickel-silicide features. A biasing voltage is applied to one terminal of the parallel coupled chain, all other terminals of the parallel coupled chain and grounded, and current is measured at each of the all other terminals of the parallel coupled chain. This process is repeated for each terminal of the parallel coupled chain. The measured currents from all possible conduction paths are compared to determine a manufacturing defect in the parallel coupled chain of transistors.

Abstract: A wafer-level chip-scale packaging feature for a semiconductor device is disclosed which has a substrate, a plurality of nail-shaped conducting posts extending from a surface of the substrate, and a plurality of solder balls, where each of the solder balls is connected to one of the nail-shaped conducting posts. When a different-sized solder ball is desired for use, the device can be re-processed by only removing and replacing the cross-members of the nail-shaped conducting posts, which cuts down on the re-processing expense.

Abstract: Disclosed is a method for manufacturing a solar cell module in which a wiring substrate having a base material and a wiring formed on the base material, and a plurality of solar cells electrically connected by being placed on the wiring of the wiring substrate are sealed with a sealant, including a first step of placing at least one of the solar cells on the wiring of the wiring substrate, and a second step of sealing the wiring substrate and the solar cells with the sealant, the method including the step of conducting an inspection of the solar cells after the first step and before the second step.

Abstract: A MEMS device comprising a flexible membrane that is free to move in response to pressure differences generated by sound waves. A first electrode mechanically coupled to the flexible membrane, and together form a first capacitive plate. A second electrode mechanically coupled to a generally rigid structural layer or back-plate, which together form a second capacitive plate. A back-volume is provided below the membrane. A first cavity located directly below the membrane. Interposed between the first and second electrodes is a second cavity. A plurality of bleed holes connected the first cavity and the second cavity. Acoustic holes are arranged in the back-plate so as to allow free movement of air molecules, such that the sound waves can enter the second cavity. The first and second cavities in association with the back-volume allow the membrane to move in response to the sound waves entering via the acoustic holes in the back-plate.

Abstract: Disclosed is a multichip package or system-in package which the logic chip includes a selector circuit which, by transmitting a test mode select signal or a test mode select command to the logic chip, enables access from a logic signal pin connected to the logic chip, to a memory control signal to each of the “m” number of memory chips; and the memory control signal, when viewed from the logic chip, is connected using a one-for-one wiring scheme or a one-for-up-to-m branch wiring scheme, between the selector circuit and each of the “m” number of memory chips. This multichip package or system-in package is low in noise and high in operational reliability.

Abstract: A pixel structure disposed on a substrate and including a common line, a reserved line, a dielectric layer, two repair lines, an active device, and a pixel electrode is provided. The reserved line and the common line are disposed on the substrate and are covered by the dielectric layer. The repair lines are disposed on the dielectric layer, and each repair line has a first repairing region overlapped with the common line and a second repairing region overlapped with the reserved line. When the common line is open, the repair lines in the first and second repairing regions are connected with the common line and the reserved line, such that the common line, the repair lines, and the reserved line are electrically connected. After the common line, the repair lines, and the reserved line are connected, the above-mentioned pixel structure is effectively repaired.

Abstract: A semiconductor device includes at least one first type of pad and at least one second type of pad having a different area from the first type of pad. A pad connection unit electrically couples the at least one second type of pad to an integrated circuit of the semiconductor device during a test mode, and disconnects the at least one second type of pad from the integrated circuit during a normal operating mode.

Abstract: A method of manufacturing a semiconductor wafer having at least one device trench extending to a first depth position includes providing a semiconductor substrate having first and second main surfaces and a semiconductor material layer having first and second main surfaces disposed on the first main surface of the semiconductor substrate and determining an etch ratio. The least one device trench and at least one monitor trench are simultaneously formed in the first main surface of the semiconductor material layer. The at least one monitor trench is monitored to detect when it extends to a second depth position. A ratio of the first depth position to the second depth position is generally equal to the etch ratio.

Abstract: A test structure which can be used to detect residual conductive material such as polysilicon which can result from an under etch comprises a PMOS transistor and an OTP EPROM floating gate device. By testing the devices using different testing parameters, it can be determined whether residual conductive material remains subsequent to an etch, and where the residual conductive material is located on the device. A method for testing a semiconductor device using the test structure is also described.

Abstract: Disclosed are systems and methods of producing electronic devices including an auxiliary circuit mounted on another, underlying, circuit at the wafer level. The auxiliary circuit is electrically connected to the underlying circuit via micro-scale interconnects. The systems are capable of testing the auxiliary circuit and/or interconnects using an interface within the underlying circuit. For example, the auxiliary circuit may be tested although it is mounted such that the interconnects are hidden, i.e., inaccessible for testing purposes after assembly using conventional testing systems and methods. The systems and methods further allow for including excess circuits and/or excess interconnects that can be reconfigured to replace parts of the auxiliary circuit and/or micro-scale interconnects found defective during testing.

Abstract: Methods and devices for multi-chip stacks are shown. A method is shown that assembles multiple chips into stacks by stacking wafers prior to dicing into individual chips. Methods shown provide removal of defective chips and their replacement during the assembly process to improve manufacturing yield.

Abstract: A landing pad for use as a contact to a conductive spacer adjacent a structure in a semiconductor device comprises two islands, each of which is substantially rectangularly shaped and is spaced apart from one another and from the structure. Conductive spacers are adjacent to each island and overlapping each other and overlapping with the conductive spacer adjacent to the structure. The contact to the landing pad is on the conductive spacers adjacent to the islands and spaced apart from the structure.

Abstract: An edit structure is disclosed that allows the input of a logic gate to be changed by modifying any one of the metal and via masks that are used to form the metal interconnect structure. As a result, a first permanent logic state provided by a tie-in circuit can be changed to a second permanent logic state by modifying any one of the metal and via masks that are used to form the metal interconnect structure.

Abstract: In one aspect, a method for configuring a ball grid array is disclosed. The method may include identifying a number of balls for use in a ball grid array, determining a number of rows and a number of columns for the ball grid array, and populating the ball grid array at least in part with a plurality of ball-space groupings. The method may also include allocating an unpopulated portion of an area bounded by the at least one first outside row, the at least one second outside row, the at least one first outside column, and the at least one second outside column, to be free of balls. The method may also include routing a signal line from a ball of at least one ball-space grouping to a space of the at least one ball-space grouping and routing the signal line to a substrate layer through a via.

Abstract: A method of manufacturing an integrated circuit including a first isolated chip electrically and mechanically connected via wafer bonding to a second isolated chip, wherein the active faces of the chips face one another, includes: forming metallic contact zones on active faces of first and second wafers, positioning and fixing the wafers one above another at a predetermined distance such that the active faces of the wafers face one another and the contact zones are aligned, placing the fixed wafers in a bath for electroless metal deposition onto the contact zones; and removing the fixed wafers in the event that the metal layers growing on the aligned contact zones of the first and second wafers have grown together.

Abstract: A method for improving semiconductor yield by in-line repair of defects during manufacturing comprises inspecting dies on a wafer after a selected layer is formed on the dies, identifying defects in each of the dies, classifying the identified defects as killer or non-critical, for each killer defect determining an action to correct the defect, repairing the defect and returning the wafer to a next process step. Also disclosed is a method for determining an efficient repair process by dividing the die into a grid and using analysis of the grid to find a least invasive repair.

Abstract: A method for manufacturing a semiconductor device is provided. The method includes the steps of forming an interlayer insulating layer on a semiconductor substrate, selectively patterning the interlayer insulating layer to form a contact hole, depositing a first metal on an inner surface of the contact hole, submerging the semiconductor substrate on which the first metal is deposited into an electrochemical plating (ECP) solution bath in which a second metal is dissolved, dissolving the first metal in the ECP solution bath, plating the first and second metals dissolved in the ECP solution bath at the same time to gap-fill an alloy of the first and second metals in the contact hole, and removing the alloy using the interlayer insulating layer as an end point in a CMP process to form an alloy interconnection.

Abstract: An integrated circuit (IC) includes a substrate having a device layer and a plurality of metal layers formed thereon. The plurality of metal layers include patterned upper metal layers and lower metal layers, a multi-level metal interconnect structure formed using the plurality of metal layers, where the interconnect structure is in electrical contact with a first portion and second portion of the device layer. At least one circuit editing structure including a first and second columns are formed using at least a portion of the plurality of metal layers, the first column being in electrical contact with the first portion of the device layer and the second column being in electrical contact with second portion of the device layer, where a portion of the first and second columns define a circuit editing feature operable to electrically couple or decouple the columns using focused ion beam (FIB) processing.

Abstract: Embodiments are described for arbitrating stacked dies in multi-die semiconductor packages. In one embodiment, die identification data for at least two stacked dies are arbitrated to select one of the dies as the primary die and the other as secondary. Each die includes an input/output buffer that drives an output signal to a commonly shared output terminal in response to receiving a die identification data bit as the input signal. Each die also includes an arbitration circuit that generates a control signal in response to the identification bit of one die being mismatched to a corresponding identification bit of the other die. The control signal programs a stack enable fuse in accordance with the arbitration to designate one of the dies as the secondary die.

Abstract: A semiconductor device is obtained, in which excellent characteristics are achieved, the reliability is improved, and an SiC wafer can also be used for the fabrication. A plurality of Schottky-barrier-diode units 10 is formed on an SiC chip 9, and each of the units 10 has an external output electrode 4 independently of each other. Bumps 11 (the diameter is from several tens to several hundreds of ?m) are formed only on the external output electrodes 4 of non-defective units among the units 10 formed on the SiC chip 9, meanwhile bumps are not formed on the external output electrodes 4 of defective units in which the withstand voltage is too low, or the leakage current is too much.

Abstract: Memory die are provided with programmable chip enable circuitry to allow particular memory die to be disabled after packaging and/or programmable chip address circuitry to allow particular memory die to be readdressed after being packaged. In a multi-chip memory package, a memory die that fails package-level testing can be disabled and isolated from the memory package by a programmable circuit that overrides the master chip enable signal received from the controller or host device. To provide a continuous address range, one or more of the non-defective memory die can be re-addressed using another programmable circuit that replaces the unique chip address provided by the pad bonding. Memory chips can also be also be readdressed after packaging independently of detecting a failed memory die.

Abstract: Disclosed are thermally conductive plates. Each plate is configured such that a uniform adhesive-filled gap may be achieved between the plate and a heat generating structure when the plate is bonded to the heat generating structure and subjected to a temperature within a predetermined temperature range that causes the heat generating structure to warp. Additionally, this disclosure presents the associated methods of forming the plates and of bonding the plates to a heat generating structure. In one embodiment the plate is curved and modeled to match the curved surface of a heat generating structure within the predetermined temperature range. In another embodiment the plate is a multi-layer conductive structure that is configured to undergo the same warpage under a thermal load as the heat generating structure. Thus, when the plate is bonded with the heat generating structure it is able to achieve and maintain a uniform adhesive-filled gap at any temperature.

Abstract: An object of the invention is to provide a semiconductor device and an adjusting method for a semiconductor device wherein power source noises and noises radiated as radio waves can be reduced and power source noises inside the semiconductor device can be cut. The open stub OS1 is formed in the upper wiring layer of the semiconductor device 1. The stub length L1 is set to a length of ¼ of the wavelength of the known frequency containing peak components of noises. The noise receiving part AT1 is disposed adjacent to the open stub OS1. The open stub OS1 is connected to the power source wiring 4 by an interlayer wiring 6. The noise receiving part AT1 is biased to a ground potential. The basic wave component and odd-number harmonic waves of noises that are generated from the PLL circuit 11 and propagate (the arrow Y1 of FIG. 2) in the power source wiring 4 are reflected (arrow Y2 of FIG. 2) by the open stub OS1 so as to return to the PLL circuit 11, and do not reach the filter circuit 12.

Abstract: Systems and methods for providing power to on-chip components of an integrated circuit with improved uniformity through the use of a split power plane. One embodiment comprises a system having an integrated circuit chip, a power distribution network coupled to the integrated circuit chip, and a power plane coupled to the power distribution network. The power plane is divided into two or more separate sections, each of which is separately connected to the power distribution network.

Abstract: The invention provides an inspection apparatus and an inspection method for detecting defects, a punching apparatus, and a method for controlling a punching apparatus, for the purpose of immediate detection of debris from being lifted toward the surface of an insulating film for film carrier tape, which debris tends to occur during punching of the insulating film for film carrier tape by use of a punching mold, whereby the number of pieces having defects on the film surface caused by attachment of debris from being lifted or foreign matter is reduced to a minimum possible number.

Abstract: A device and method for determining target values for a parameter of a semiconductor device to be trimmed.

Abstract: A TAG chip includes a magnetic coating or an electrostatically chargeable structure. A device for packing semiconductor chips includes an electromagnetic or electrostatic lifter, which picks up singulated semiconductor chips of a semiconductor wafer with a magnetic coating or including an electrostatically chargeable structure from a wafer position and deposits them in a collecting position. A mounting device includes a conveying roller with conveying receptacles for semiconductor chips, which pick up the semiconductor chips in a pick-up position with electromagnetically or electrostatically activatable conveying receptacles and, in a discharge position will discharge, via deactivation of the conveying receptacles, the semiconductor chips onto a corresponding liner or an object.

Abstract: Systems and methods are disclosed for producing vertical LED array on a metal substrate; evaluating said array of LEDs for defects; destroying one or more defective LEDs; forming good LEDs only LED array suitable for wafer level package.

Abstract: Resistance and capacitance are added to a prototype die to fix or identify performance issues with the integrated circuit formed in the die by forming a thin piece of silicon on the top surface of the die. For resistance, vias are formed to regions on the metal traces and to opposite ends of the piece of silicon using a FIB system. For capacitance, a dielectric is formed on the piece of silicon, and a layer of metal is formed on the dielectric. Vias are formed to regions on the metal traces, to the piece of silicon, and to the layer of metal using the FIB system.

Abstract: A semiconductor integrated circuit has a first functional block, a second functional block, and a signal line routed from the first functional block to the second functional block in a metal interconnection layer. A complementary pair of metal-oxide-semiconductor circuits with source, gate, and drain terminals are located near the signal line between the first and second functional blocks. The drain terminals extend to the same metal interconnection layer as the signal line, but are not connected to the signal line. The circuit can be redesigned to invert the signal transmitted on the signal line by altering a single mask defining the metal interconnection layer, so as to divide the signal line into a first part connected to the gate terminals and a second part connected to the drain terminals of the complementary pair of metal-oxide-semiconductor circuits.

Abstract: A MEMS device, for example a capacitive microphone, comprises a flexible membrane 11 that is free to move in response to pressure differences generated by sound waves. A first electrode 13 is mechanically coupled to the flexible membrane 11, and together form a first capacitive plate of the capacitive microphone device. A second electrode 23 is mechanically coupled to a generally rigid structural layer or back-plate 14, which together form a second capacitive plate of the capacitive microphone device. The capacitive microphone is formed on a substrate 1, for example a silicon wafer. A back-volume 33 is provided below the membrane 11, and is formed using a “back-etch” through the substrate 1. A first cavity 9 is located directly below the membrane 11, and is formed using a first sacrificial layer during the fabrication process. Interposed between the first and second electrodes 13 and 23 is a second cavity 17, which is formed using a second sacrificial layer during the fabrication process.

Abstract: A test structure and methods of using and making the same are provided. In one aspect, a test structure is provided that includes a first conductor that has a first end and a second conductor that has a second end positioned above the first end. A third conductor is positioned between the first end of the first conductor and the second end of the second conductor. A first electrode is coupled to the first conductor at a first distance from the third conductor and a second electrode coupled to the first conductor at a second distance from the third conductor. A third electrode is coupled to the second conductor at a third distance from the third conductor and a fourth electrode is coupled to the second conductor at a fourth distance from the third conductor. The first through fourth electrodes provide voltage sense taps and the first and second conductors provide current sense taps from which the resistance of the third conductor may be derived.

Abstract: Multi-chip module systems and method of fabrication thereof wherein the equivalent of a failed die of a multi-chip module (MCM) is added to the module in a vacancy position previously constructed with appropriate electrical connections. A variety of different dice may be attached to the same vacancy position of an MCM by means of adapters, wherein each adapter has the same footprint, but different adapters are capable of accommodating different numbers and types of dice.

Abstract: One embodiment of the present invention provides a system that measures alignment between a first semiconductor die and a second semiconductor die. The system operates by applying a pattern of voltage signals to a two-dimensional array of conductive transmitter elements that form a transmitter array on the first semiconductor die. This transmitter array is positioned over a corresponding two-dimensional array of conductive receiver elements that form a receiver array on the second semiconductor die, whereby a voltage signal applied to a transmitter element induces a voltage signal in one or more receiver elements. The system amplifies voltage signals induced in receiver elements in the receiver array, and subsequently analyzes the amplified signals to determine an alignment between the first semiconductor die and the second semiconductor die.

Abstract: The present invention relates generally to semiconductor processing, and more particularly to methods and systems for reducing costs of wafer production by analyzing key aspects of wafer status to determine whether to initiate corrective measures to salvage a wafer at an early stage and before substantial costs are incurred in fabricating a defective wafer. One aspect of the present invention provides for growing an oxide layer on a wafer upon a determination that an oxide layer on the wafer surface is absent or is present but inadequate. Another aspect of the present invention provides for a determination of whether to apply preemptory corrective treatment(s) to a wafer surface based on the presence and/or magnitude of nitrogen signatures in an extant oxide surface layer, which can indicate that an undesirable defect known as “footing” will occur during a post-exposure delay period.

Abstract: A method for determination of tunnel oxide weakness is provided. A tunnel oxide layer is formed on a semiconductor wafer. At least one poly gate is formed on the tunnel oxide layer in a flash memory region of the semiconductor wafer. At least one poly island, which is substantially larger than the poly gate, is formed on the tunnel oxide layer in a voltage contrast cell region of the semiconductor wafer. The poly island and the tunnel oxide layer therebeneath form a voltage contrast tunnel oxide cell. A voltage contrast measurement is performed on the voltage contrast tunnel oxide cell. The voltage contrast measurement is then compared with prior such voltage contrast measurements on other such voltage contrast tunnel oxide cells. The tunnel oxide weakness of the tunnel oxide layer is then determined from the voltage contrast measurement comparisons.

Abstract: A semiconductor package (101) has a die (1), a leadframe (4), a bond pad (6), an encapsulation (3) and a wire bond ball (2). The wire bond ball is formed on the bond pad by bonding one end of a bond wire (7), and remainder of the bond wire is removed. Locations (23) for attaching the wire bond ball are recorded with reference to fiducials (5) on the lead frame. The encapsulation covers the die, deposits and die attach flag (24) of the lead frame. The wire bond ball is exposed where the encapsulation is removed. The locations for making openings (17) for exposing the wire bond ball is determined by recorded coordinates when the wire bond ball is formed. Exposed wire bond ball is plated, forming a lead to electrically connect to the die.

Abstract: An IC module, such as a Multi-Chip Module (MCM), includes multiple IC dice, each having a test mode enable bond pad, such as an output enable pad. A fuse incorporated into the MCM's substrate connects each die's test mode enable bond pad to one of the MCM's no-connection (N/C) pins, and a resistor incorporated into the substrate connects the test mode enable bond pads to one of the MCM's ground pins. By applying a supply voltage to the test mode enable bond pads through the N/C pin, a test mode is initiated in the dice. Once testing is complete, the fuse may be blown, and a ground voltage applied to the test mode enable bond pads through the ground pins so the resistor disables the test mode in the dice and initiates an operational mode. As a result, dice packaged in IC modules may be tested after packaging.