Abstract: An integrated circuit includes a power component including a plurality of first trenches in a cell array and a first conductive material in the first trenches electrically coupled to a gate terminal of the power component, and a diode component including a first diode device trench and a second diode device trench disposed adjacent to each other. A second conductive material in the first and the second diode device trenches is electrically coupled to a source terminal of the diode component. The first trenches, the first diode device trench and the second diode device trench are disposed in a first main surface of a semiconductor substrate. The integrated circuit further includes a diode gate contact including a connection structure between the first and the second diode device trenches. The connection structure is in contact with the second conductive material in the first and the second diode device trenches.

Abstract: The present disclosure relates to a method of forming a back-end-of-the-line metal contact that eliminates RC opens caused by metal dishing during chemical mechanical polishing. The method is performed by depositing a sacrificial UV/thermal decomposition layer (UTDL) above an inter-level dielectric (ILD) layer. A metal contact is formed that extend through the ILD layer and the sacrificial UTDL. A chemical mechanical polishing (CMP) process is performed to generate a planar surface comprising the sacrificial UTDL. The sacrificial UTDL is then removed through an ultraviolet exposure or a thermal anneal, so that the metal contact protrudes from the ILD layer.

Abstract: A submount for a light emitting device package includes a substrate. A first bond pad and a second bond pad are on a first surface of the substrate. The first bond pad includes a die attach region offset toward a first end of the substrate and configured to receive a light emitting diode thereon. The second bond pad includes a bonding region between the first bond pad and the second end of the substrate and a second bond pad extension that extends from the bonding region along a side of the substrate toward a corner of the substrate at the first end of the substrate. First and second solder pads are a the second surface of the substrate. The first solder pad is adjacent the first end of the substrate and contacts the second bond pad. The second solder pad is adjacent the second end of the substrate and contacts the first bond pad. Related LED packages and methods of forming LED packages are disclosed.

Abstract: A structure obtaining a desired integrated circuit by sticking together a plurality of semiconductor substrates and electrically connecting integrated circuits formed on semiconductor chips of the respective semiconductor substrates is provided, and a penetrating electrode penetrating between a main surface and a rear surface of each of the semiconductor substrates and a penetrating separation portion separating the penetrating electrode are separately arranged. Thereby, after forming an insulation trench portion for formation of the penetrating separation portion on the semiconductor substrate, a MIS•FET is formed, and then, a conductive trench portion for formation of the penetrating electrode can be formed. Therefore, element characteristics of a semiconductor device having a three-dimensional structure can be improved.

Abstract: Semiconductor devices can be fabricated using conventional designs and process but including specialized structures to reduce or eliminate detrimental effects caused by various forms of radiation. Such semiconductor devices can include one or more parasitic isolation devices and/or buried layer structures disclosed in the present application. The introduction of design and/or process steps to accommodate these novel structures is compatible with conventional CMOS fabrication processes, and can therefore be accomplished at relatively low cost and with relative simplicity.

Abstract: Semiconductor devices can be fabricated using conventional designs and process but including specialized structures to reduce or eliminate detrimental effects caused by various forms of radiation. Such semiconductor devices can include one or more parasitic isolation devices and/or buried layer structures disclosed in the present application. The introduction of design and/or process steps to accommodate these novel structures is compatible with conventional CMOS fabrication processes, and can therefore be accomplished at relatively low cost and with relative simplicity.

Abstract: Embodiments of N-well or P-well strap structures are disclosed with lower space requirements achieved by forming the strap on both sides of one or more floating polysilicon gate fingers.

Abstract: A Semiconductor device and method for fabricating the same are disclosed. The method includes implanting first conduction type impurities into a semiconductor substrate to form a first well, implanting second conduction type impurities into the first well to form a second well, implanting second conduction type impurities into the second well to form an impurity region, forming a gate on the semiconductor substrate, and implanting second conduction type impurities to form a drain region in the impurity region on one side of the gate.

Abstract: A method for fabricating a non-volatile memory array includes placing contacts over bit lines in a self-aligned manner. The placing includes forming self-aligned contact holes bounded by a second insulating material resistant to the removal of a first insulating material previously deposited over the bit lines, and depositing contact material, wherein the second insulating material blocks effusion of the contact material beyond the contact holes. The distance between neighboring bit lines in the array does not include a margin for contact misalignment.

Abstract: A semiconductor gate stack comprising a silicon oxide based gate dielectric and a doped semiconductor material is formed on a semiconductor substrate. A high-k material metal gate electrode comprising a high-k gate dielectric and a metal gate portion is also formed on the semiconductor substrate. Oxygen-impermeable dielectric spacers are formed on the sidewalls of the semiconductor gate stack and the high-k material metal gate stack. The oxygen-impermeable dielectric spacer on the semiconductor gate stack is removed, while the oxygen impermeable dielectric spacer on the high-k material metal gate electrode is preserved. A low-k dielectric spacer is formed on the semiconductor gate stack, which provides a low parasitic capacitance for the device employing the semiconductor gate stack.

Abstract: A LDMOS device for an ESD protection circuit is provided. The LDMOS device includes a substrate of a first conductivity type, a deep well region of a second conductivity type, a body region of the first conductivity type, first and second doped regions of the second conductivity type, and a gate electrode. The deep well region is disposed in the substrate. The body region and the first doped region are respectively disposed in the deep well region. The second doped region is disposed in the body region. The gate electrode is disposed on the deep well region between the first and second doped regions. It is noted that the body region does not include a doped region of the first conductivity type having a different doped concentration from the body region.

Abstract: Circuits including a laterally diffused output driver transistor and a distinct device configured to provide electrostatic discharge (ESD) protection for the laterally diffused output driver transistor are presented. In general, the device configured to provide ESD protection includes a drain extended metal oxide semiconductor transistor (DEMOS) transistor configured to breakdown at a lower voltage than a breakdown voltage of the laterally diffused output driver transistor. The laterally diffused output driver transistor may be a pull-down or a pull-up output driver transistor. The device also includes a silicon controlled rectifier (SCR) configured to inject charge within a semiconductor layer of the circuit upon breakdown of the DEMOS transistor. Moreover, the device includes a region configured to collect the charge injected from the SCR and further includes an ohmic contact region configured to at least partially affect the holding voltage of the SCR.

Abstract: A lateral MOS device is formed in a body having a surface and is formed by a semiconductor layer of a first conductivity type; a drain region of a second conductivity type, formed in the semiconductor layer and facing the surface; a source region of the second conductivity type, formed in the semiconductor layer and facing the surface; a channel of the first conductivity type, formed in the semiconductor layer between the drain region and the source region and facing the surface; and an insulated gate region, formed on top of the surface over the channel region. In order to improve the dynamic performance, a conductive region extends only on one side of the insulated gate region, on top of the drain region but not on top of the insulated gate region.

Abstract: The present disclosure includes various method, circuit, device, and system embodiments. One such method embodiment includes creating a trench in an insulator stack material having a portion of the trench positioned between two of a number of gates and depositing a spacer material to at least one side surface of the trench. This method also includes depositing a conductive material into the trench and depositing a cap material into the trench.

Abstract: A semiconductor device is disclosed, which comprises a silicon substrate, a complementary MISFET circuit, an insulation film formed on the silicon substrate, a first contact hole formed in the insulation film, a first metal silicide layer formed on the bottom of the first contact hole, the first metal silicide layer being provided by a reaction of the n-channel impurity diffused region of the n-channel MISFET with a first metal, a second contact hole formed in the insulation film, a second metal silicide layer formed on the bottom of the second contact hole, the second metal silicide layer being provided by a reaction of the p-channel impurity diffused region of the p-channel MISFET with a second metal, and a work function of the second metal silicide layer being higher than that of the first metal silicide layer.

Abstract: The present invention relates to a layout of a multi-channel semiconductor integrated circuit and provides a layout of a semiconductor integrated circuit having ternary circuits in order to increase a degree of integration in the semiconductor integrated circuit and stabilize output characteristics. A ternary circuit is formed by arranging a second high-side transistor, a diode, a second level shift circuit on one hand, and a low-side transistor, a first high-side transistor, a first level shift circuit, and a pre-driver on the other, so that each of cells are arranged in a row and an output bonding pad is placed between the second high-side transistor and the low-side transistor, wherein a cell width of the first level shift circuit, second level shift circuit and pre-driver corresponds to a cell width of the low-side transistor.

Abstract: A method of manufacturing a memory device addressing reliability and refresh characteristics through the use of a multilayered doped conductor, and a method making is described. The multilayered doped conductor creates a high dopant concentration in the active area close to the channel region. The rich dopant layer created by the multilayered doped conductor is less susceptible to depletion from trapped charges in the oxide. This improves device reliability at burn-in and lowers junction leakage, thereby providing a longer period between refresh cycles.

Abstract: The invention relates to a trench filled with a thermally conducting material in a semiconductor substrate. In one embodiment, the semiconductor device has a trench defining a cell region, wherein a portion of the trench includes a thermally conducting material, and a contact to the thermally conducting material. The invention further relates to a semiconductor device and a method of forming a semiconductor device with an interlayer dielectric that is a thermally conducting material.