Abstract: A high output light emitting diode (LED) based lighting module includes a plurality of LEDs on a substrate board, a fiber optic mounting assembly that securely holds a plurality of fiber bundles that form a fiber cable to said LEDs so that each LED mates to a fiber bundle making each fiber bundle slightly overlap the active area of its respective LED and mechanical means for holding each fiber optic bundle a fixed distance from said LED substrate.

Abstract: A cell of a semiconductor device includes a substrate portion including a plurality of diffusion regions, including at least one p-type diffusion region and at least one n-type diffusion region separated by one or more non-active regions. The cell includes a gate electrode level including a number of conductive features defined to extend in only a first parallel direction. Each of the conductive features is fabricated from a respective originating rectangular-shaped layout feature. A width of the conductive features is less than a wavelength of light used in a photolithography process for their fabrication. Some of the conductive features form respective PMOS and/or NMOS transistor devices. A number of the PMOS transistor devices is equal to a number of the NMOS transistor devices in the gate electrode level. The cell also includes a number of interconnect levels formed above the gate electrode level.

Abstract: A method for making a cadmium sulfide layer is provided. The method includes a number of steps including providing a substrate and disposing a layer containing cadmium on the substrate followed by sulfurization of the cadmium-containing layer.

Abstract: Provided is a CdTe-based semiconductor substrate for epitaxial growth, which is capable of growing good-quality epitaxial crystals without urging a substrate user to implement etching treatment before the epitaxial growth. A CdTe-based semiconductor substrate, in which tracks of linear polishing damage with a depth of 1 nm or more are not observed within a viewing range of 10 ?m×10 ?m when a surface of the substrate is observed by an atomic force microscope, and orange peel defects are not observed when the surface of the substrate is visually observed under a fluorescent lamp, can grow the good-quality epitaxial crystals.

Abstract: Crystalline inorganic-organic hybrid structures having a plurality of layers of a repeating unit characterized by a first organic ligand layer, a second organic ligand layer, and a two-dimensional semiconducting inorganic double layer having two opposing surfaces therebetween, wherein the two-dimentional semiconducting inorganic double layer is characterized by two single atom thick layers of a II-chalcogenide compound; and the first organic ligand layer and the second organic ligand layer are attached to the two opposing surfaces of the two-dimensional semiconducting inorganic double layer through a covalent bond or a coordinate covalent bond between the compounds of the organic ligand layers and the metal cation species of the II-VI chalcogenide compounds, so that the semiconducting inorganic double layer is directed by the compounds of the two opposing organic layers to form ordered crystal lattices. Methods for the preparation of the hybrid structures are also disclosed.

Abstract: Apparatus and method to improve the operating parameters of HgCdTe-based optoelectric devices by the addition of hydrogen to passivate dislocation defects. A chamber and a UV light source are provided. The UV light source is configured to provide UV radiation within the chamber. The optoelectric device, which may comprise a HgCdTe semiconductor, is placed into the chamber and may be held in position by a sample holder. Hydrogen gas is introduced into the chamber. The material is irradiated within the chamber by the UV light source with the device and hydrogen gas present within the chamber to cause absorption of the hydrogen into the material.

Abstract: In an npn-type transistor, the emitter 42 and the collector 43 are formed of an n-type transparent semiconductor, and the base 41 is formed by a p-type transparent semiconductor. The base electrode 44, the emitter electrode 45 and the collector electrode 46 are formed respectively on the base 41, the emitter 42 and the collector 43. As the n-type transparent semiconductor, for example, n-type ZnO is used. The n-type ZnO is ZnO doped with, for example, group III elements, group VII elements. As the p-type transparent semiconductor, for example, p-type ZnO is used. The p-type ZnO is ZnO doped with, for example, group I elements and group V elements.