Characterized By Doping Material (epo) Patents (Class 257/E31.031)
  • Patent number: 8772914
    Abstract: A first semiconductor chip and a second semiconductor chip are overlapped with each other in a direction in which a first multilayer interconnect layer and a second multilayer interconnect layer are opposed to each other. When seen in a plan view, a first inductor and a second inductor are overlapped. The first semiconductor chip and the second semiconductor chip have non-opposed areas which are not opposed to each other. The first multilayer interconnect layer has a first external connection terminal in the non-opposed area, and the second multilayer interconnect layer has a second external connection terminal in the non-opposed area.
    Type: Grant
    Filed: January 15, 2013
    Date of Patent: July 8, 2014
    Assignee: Renesas Electronics Corporation
    Inventors: Yasutaka Nakashiba, Kenta Ogawa
  • Patent number: 8378470
    Abstract: A first semiconductor chip and a second semiconductor chip are overlapped with each other in a direction in which a first multilayer interconnect layer and a second multilayer interconnect layer are opposed to each other. When seen in a plan view, a first inductor and a second inductor are overlapped. The first semiconductor chip and the second semiconductor chip have non-opposed areas which are not opposed to each other. The first multilayer interconnect layer has a first external connection terminal in the non-opposed area, and the second multilayer interconnect layer has a second external connection terminal in the non-opposed area.
    Type: Grant
    Filed: September 2, 2010
    Date of Patent: February 19, 2013
    Assignee: Renesas Electronics Corporation
    Inventors: Yasutaka Nakashiba, Kenta Ogawa
  • Patent number: 8093684
    Abstract: The semiconductor of the present invention has iron sulfide and a forbidden band control element contained in the iron sulfide. The forbidden band control element has a property capable of controlling the forbidden band of iron sulfide on the basis of the number density of the forbidden band control element in the iron sulfide. An n-type semiconductor is manufactured by incorporating a group 13 element of the IUPAC system into iron sulfide. Moreover, a p-type semiconductor is manufactured by incorporating a group Ia element into iron sulfide. A semiconductor junction device or a photoelectric converter is manufactured by using the n-type semiconductor and the p-type semiconductor.
    Type: Grant
    Filed: January 9, 2007
    Date of Patent: January 10, 2012
    Assignee: Sharp Kabushiki Kaisha
    Inventors: Yoshiyuki Nasuno, Noriyoshi Kohama, Kazuhito Nishimura
  • Publication number: 20070090480
    Abstract: The solid-state imaging device of the present invention includes: a plurality of photodetectors that are arranged in a two-dimensional matrix; a plurality of vertical transfer portions that transfer, in a vertical direction, signal electric charges which are read out from the respective photodetectors; a horizontal transfer portion that receives the signal electric charges transferred by the vertical transfer portions, and transfers the signal electric charges in a horizontal direction; a barrier region that is adjacent to the horizontal transfer portion, and allows an excess electric charge in the horizontal transfer portion to pass through; and a drain region that is adjacent to the barrier region and drains the excess electric charge which has passed through the barrier region; and bus lines that are disposed in parallel with the drain region, and apply control voltages to electrodes of the horizontal transfer portion.
    Type: Application
    Filed: June 26, 2006
    Publication date: April 26, 2007
    Applicant: MATSUSHITA ELECTRIC INDUSTRIAL CO., LTD.
    Inventor: Toshihiro Kuriyama