With Significant Slider/housing Shaping Or Treating Patents (Class 29/603.12)
  • Patent number: 7810227
    Abstract: Using a beam of xenon ions together with a suitable mask, a GMR stack is ion milled until a part of it, no more than about 0.1 microns thick, has been removed so that a pedestal, having sidewalls comprising a vertical section that includes all of the free layer, has been formed. This is followed by formation of the dielectric and conductive lead layers in the usual way. Using xenon as the sputtering gas enables the point at which milling is terminated to be more precisely controlled.
    Type: Grant
    Filed: October 18, 2007
    Date of Patent: October 12, 2010
    Assignees: Headway Technologies, Inc., TDK Corporation
    Inventors: Stuart Kao, Chunping Luo, Chaopeng Chen, Takahiko Machita, Daisuke Miyauchi, Jeiwei Chang
  • Patent number: 7784170
    Abstract: A resist pattern for lift-off is formed on a first film composed of one or more layers deposited on a substrate. The first film is patterned by dry-etching using the resist pattern as a mask. Subsequently, a second film is deposited with presence of the resist pattern on the first film. Then, the resist pattern for lift-off is removed for conducting lift-off. Subsequently, the resulting substrate is etched. In the etching, the substrate is dry-etched using etching particles which are oriented at an incident angle set in a range of 60 ° to 90 ° relative to the normal direction of the substrate.
    Type: Grant
    Filed: May 11, 2007
    Date of Patent: August 31, 2010
    Assignee: TDK Corporation
    Inventors: Takeo Kagami, Kazuki Sato
  • Patent number: 7779534
    Abstract: The present invention provides a thin film magnetic head capable of suppressing unintentional wiring to a neighboring track and preventing information recorded on a recording medium from being erased. A main magnetic pole layer is constructed so that height of a widened end surface in a lower main magnetic pole layer specifying a wide portion is smaller than height of an exposed surface in an upper main magnetic pole layer (front end portion) specifying a uniform width portion.
    Type: Grant
    Filed: June 18, 2007
    Date of Patent: August 24, 2010
    Assignee: SAE Magnetics (H.K.) Ltd.
    Inventor: Naoto Matono
  • Patent number: 7770281
    Abstract: A method of forming a perpendicular magnetic recording write head having a trailing shield (TS) with a precisely defined throat height (TH) on an air-bearing slider includes depositing an electrical lapping guide (ELG) layer on the substrate adjacent to and spaced from the write pole (WP) layer. A nonmagnetic TS pad layer is deposited on both the gap layer and the ELG layer, with the TS pad layer patterned to have a front edge extending across the both the ELG layer and the gap layer and recessed from the line where the substrate will be later cut to form the slider. An ELG protection layer is patterned on the ELG layer, the TS pad layer material is removed from the ELG layer in the region recessed from the TS pad layer front edge, and the ELG layer is removed in regions not covered by the ELG protection layer.
    Type: Grant
    Filed: May 10, 2007
    Date of Patent: August 10, 2010
    Assignee: Hitachi Global Storage Technologies Netherlands B.V.
    Inventor: Aron Pentek
  • Patent number: 7765675
    Abstract: Current-perpendicular-to-plane (CPP) read sensors for magnetic heads having constrained current paths made of lithographically-defined conductive vias, and methods of making the same, are disclosed. In one example, a sensor stack structure which includes an electrically conductive spacer layer is formed over a first shield layer. An insulator layer is deposited over and adjacent the spacer layer, and a resist structure which exposes one or more portions of the insulator layer is formed over the insulator layer. With the resist structure in place, the exposed insulator layer portions are removed by etching to form one or more apertures through the insulator layer down to the spacer layer. Electrically conductive materials are subsequently deposited within the one or more apertures to form one or more lithographically-defined conductive vias of a current-constraining structure.
    Type: Grant
    Filed: September 1, 2005
    Date of Patent: August 3, 2010
    Assignee: Hitachi Global Storage Technologies Netherlands B.V.
    Inventors: Jeffrey Robinson Childress, Jordan Asher Katine
  • Patent number: 7765676
    Abstract: A method for constructing a magnetoresistive sensor using an etch mask that is resistant to the material removal process used to define the sensor width and stripe height. The method may include the use of a Ta etch mask formed under a photoresist mask, and the use of an ion milling process to define the sensor. The etch mask remains substantially intact after performing the ion milling and therefore is readily removed by a later CMP process. The etch mask layer is also very resistant to high temperatures such as those used in a desired atomic layer deposition of alumina, which is used to deposit conformal layers of alumina around the sensor.
    Type: Grant
    Filed: November 18, 2004
    Date of Patent: August 3, 2010
    Assignee: Hitachi Global Storage Technologies Netherlands B.V.
    Inventors: Marie-Claire Cyrille, Elizabeth Ann Dobisz, Wipul Pemsiri Jayasekara, Jui-Lung Li
  • Patent number: 7739786
    Abstract: An apparatus and a method for manufacturing a magnetic head slider are to improve product quality of the magnetic head slider while simplifying the process and reducing the manufacturing time. The apparatus includes: holding devices for holding the both ends of a block member of an array of the magnetic head sliders respectively; a cutting device for cutting out a potion in which the magnetic head sliders are to be formed from the block member; and a cut surface treatment device having cut surface treating parts on the front and back surfaces of the cutting device for treating cut surfaces opposite to each other which form the predetermined two cut surfaces of the magnetic head sliders.
    Type: Grant
    Filed: June 22, 2006
    Date of Patent: June 22, 2010
    Assignee: SAE Magnetics (H.K.) Ltd.
    Inventor: Ryuji Fujii
  • Patent number: 7735213
    Abstract: Embodiments of the present invention provide a method of fabricating a magnetic head slider realizing high-recording density at high-yields by preventing formation of a short circuit on the air-bearing surface of a magnetic head slider and preventing formation of an oxidized layer with significant film thickness which increases the effective magnetic spacing, on the air-bearing surface of the magnetic head slider. According to one embodiment, after air-bearing surface mechanical lapping of a row bar or a magnetic head slider, cleaning is performed by ion beam bombardment to remove a conductive smear. Oxygen exposure is performed to recover a damaged region which was formed by ion beam bombardment at the end face of an intermediate layer of a magnetoresistive film 5. Thereafter, air-bearing surface protection films are formed and followed by rail formation. If the processes are performed on the row bar, the row bar is cut into individual separated magnetic head sliders.
    Type: Grant
    Filed: August 24, 2007
    Date of Patent: June 15, 2010
    Assignee: Hitachi Global Storage Technologies Netherlands B.V.
    Inventors: Nobuto Yasui, Katsuro Watanabe, Takateru Seki, Kazuhito Miyata, Tetsuya Matsusaki
  • Patent number: 7716814
    Abstract: Components of a plurality of magnetic heads are formed on a single substrate to fabricate a magnetic head substructure in which a plurality of pre-head portions are aligned in a plurality of rows. The substructure is cut to separate the plurality of pre-head portions from one another, and the plurality of magnetic heads are thereby fabricated. The surface formed by cutting the substructure is lapped to form a lapped surface. The lapped surface is lapped so as to reach a target position of a medium facing surface. The substructure incorporates first to fourth resistor elements each of which detects the position of the lapped surface. The third and fourth detection elements are located at positions shifted from the first and second resistor elements along the direction orthogonal to the medium facing surface.
    Type: Grant
    Filed: February 5, 2007
    Date of Patent: May 18, 2010
    Assignees: Headway Technologies, Inc., SAE Magnetics (H.K.) Ltd.
    Inventors: Yoshitaka Sasaki, Hiroyuki Itoh, Kazuo Ishizaki, Ryuji Fujii, Tatsushi Shimizu
  • Patent number: 7716813
    Abstract: A method is disclosed for independently controlling track width and bevel angle of a write pole tip of a magnetic recording head. The method includes establishing the track width in the pole tip layer material utilizing E-beam lithography. A portion of this pole tip material having the established track width is protected by providing a temporary masking material to make a protected portion. At least one unprotected portion is left exposed to be shaped. This unprotected portion is then beveled to produce at least one beveled portion. The protected portion produces an upper pole tip portion which together with the beveled portion produce an improved pole tip. Also disclosed is a magnetic head having the improved pole tip, and a disk drive having a magnetic head having the improved pole tip.
    Type: Grant
    Filed: December 5, 2006
    Date of Patent: May 18, 2010
    Assignee: Hitachi Global Storage Technologies Netherlands B.V.
    Inventors: Kim Y. Lee, Jyh-Shuey Lo
  • Patent number: 7716811
    Abstract: Head elements are formed on a wafer to suppress deterioration in pinning strength of a pinned layer, which is caused by ESD generated during air bearing surface polishing of a thin film magnetic head. The wafer is cut into rovers in each of which are connected head elements. Rover air bearing surfaces are polished until an MR elements attain a predetermined height. A final polishing step finishes air bearing surfaces by applying an electroconductive polishing liquid to achieve a predetermined shape and surface roughness with high accuracy. A pinning defect occurrence rate is reduced by suppressing deterioration in pinning strength of a pinned layer of a read element. To achieve this, a specific resistance of the electroconductive polishing liquid is controlled to 5 G?·cm or less. A shallow rail and a deep rail are formed on the air bearing surfaces, and the rover is cut into thin film magnetic heads.
    Type: Grant
    Filed: October 27, 2006
    Date of Patent: May 18, 2010
    Assignee: Hitachi Global Storage Technologies Netherlands B.V.
    Inventors: Takateru Seki, Akihiro Namba, Hideo Yamakura, Takahiro Noji
  • Patent number: 7716812
    Abstract: A main magnetic pole of a recording head is formed in an inverted trapezoidal shape by ion milling but, the long milling time poses a problem of variations in the inverted trapezoidal shape and the dimensional variations in track width. In one embodiment of the invention, a recording head is formed by first forming a lower magnetic pole, a gap layer, and conductor coils, forming an upper magnetic yoke over the gap layer at a position recessed from the air bearing surface, and forming an inorganic insulative layer in the recessed portion. A back magnetic pole connected with the upper magnetic yoke is formed on the back of the lower electrode. Successively, the upper surfaces of the inorganic insulative layer and the upper magnetic yoke are planarized, on which an underlayer film such as of Rh is formed. A magnetic layer is formed by stacking a plurality of thin magnetic films by sputtering over the underlayer film from the air bearing surface as far as the position overlapping the upper magnetic yoke.
    Type: Grant
    Filed: April 20, 2006
    Date of Patent: May 18, 2010
    Assignee: Hitachi Global Storage Technologies Netherlands B.V.
    Inventors: Atsushi Kato, Norihiro Ookawa, Hisashi Kimura
  • Patent number: 7712204
    Abstract: A manufacturing method of a thin-film head includes the steps of, laminating and patterning a soft magnetic layer with iron alloy that contains silicon and aluminum through a base layer on a substrate; laminating an insulating layer on the patterned soft magnetic layer; performing a chemical-mechanical polishing of a surface of the laminated insulating layer and the patterned soft magnetic layer with a first acid slurry; forming a lower shield layer by a mechanical polishing with a second weak acid, or neutral slurry with a pH different from that of the first slurry; and forming a lower shield gap layer and a magnetoresistive effect layer on the lower shield layer.
    Type: Grant
    Filed: February 27, 2007
    Date of Patent: May 11, 2010
    Assignee: TDK Corporation
    Inventors: Kazuhiko Maejima, Makoto Hasegawa, Atsuhiro Nonaka, Hiroshi Kamiyama, Teruhisa Shindo, Hiroshi Yamazaki
  • Patent number: 7707707
    Abstract: A method of temporarily protecting an electrically sensitive component from damage due to electrostatic discharge includes defining a shunt having first and second leads electrically connected in parallel with the component and separated by a gap. A portion of a shield layer is deposited to form the shunt between the first and second leads to span the gap therebetween and form a shunted assembly. The shunted assembly and component are lapped to form the ABS at the location of the component, a sacrificial carbon overcoat is deposited on the ABS, and additional processing is performed on the shunted assembly. A portion of the shunted assembly, the shunt, and portions of the sacrificial carbon overcoat are then removed to form an electrical open for an unshunted assembly having ABS features comprising an air bearing cavity/deep gap at a former location of the shunted assembly.
    Type: Grant
    Filed: December 19, 2006
    Date of Patent: May 4, 2010
    Assignee: Hitachi Global Storage Technologies Netherlands B.V.
    Inventor: David John Seagle
  • Patent number: 7703193
    Abstract: The lapping of a slider is controlled based on an amplitude of a readback signal which is produced from an externally applied magnetic field. A lapping plate is used to lap a slider which includes at least one magnetic head having a read sensor. During the lapping, a coil produces a magnetic field around the slider and processing circuitry monitors both a readback signal amplitude and a resistance of the read sensor. The lapping of the slider is terminated based on the monitoring both the readback signal amplitude and the resistance. Preferably, the lapping of the slider is terminated when the resistance is within a predetermined resistance range and the readback signal amplitude is above a predetermined minimum amplitude threshold or reaches its peak value. Asymmetry can also be measured in the described system, where the lapping process is terminated based on asymmetry as well as resistance and amplitude measurements.
    Type: Grant
    Filed: July 27, 2007
    Date of Patent: April 27, 2010
    Assignee: Hitachi Global Storage Technologies Netherlands B.V.
    Inventors: Jacey Robert Beaucage, Linden J. Crawforth, Xiao Z. Wu
  • Patent number: 7698806
    Abstract: The application discloses processes for fabricating a slider or head for a data storage device. The processes disclosed provide a transducer portion that is separated from a slider body by a gap. In an illustrated embodiment, actuator elements are fabricated in the gap to adjust a position of the transducer portion relative to the slider body.
    Type: Grant
    Filed: November 5, 2007
    Date of Patent: April 20, 2010
    Assignee: Seagate Technology LLC
    Inventors: Wayne A. Bonin, Roger L. Hipwell, John R. Pendray, Kyle M. Bartholomew, Zine-Eddine Boutaghou
  • Patent number: 7698807
    Abstract: Formation of the magnetic sensor layers of a magnetic sensor are separated into at least two depositions to reduce the dimension of the sensor. The free layer portion of the sensor is deposited at a different process step than the pinned layer portion. The top of the free layer stack can be a tunnel barrier, the free layer, or part of the free layer. The free layer stack also may contain an in-stack bias layer. The longitudinal bias layer may be patterned in a separate processing step, which allows the stack containing the free layer to be effectively thinner and allow smaller track width dimensions.
    Type: Grant
    Filed: January 20, 2006
    Date of Patent: April 20, 2010
    Assignee: Hitachi Global Storage Technologies, Netherlands B.V.
    Inventors: Jeffrey Robinson Childress, Robert E. Fontana, Jr., Jeffrey S. Lille
  • Patent number: 7681302
    Abstract: A system and method are disclosed for improving suspension-to-slider attachment in a hard disk drive. A slider having a number of bond pads on its leading edge and a number of bond pads on its trailing edge is to be coupled to a suspension flexure having a number of leading bond pads and a number of trailing bond pads. The slider is to be coupled to the suspension flexure at the leading bond pads and the trailing bond pads by a method such as gold ball, solder ball, or solder bump bonding.
    Type: Grant
    Filed: January 27, 2003
    Date of Patent: March 23, 2010
    Assignee: SAE Magnetics (H. K.) Ltd.
    Inventor: Takehiro Kamigama
  • Patent number: 7681303
    Abstract: Embodiments of the present invention provide a method of manufacturing a magnetic head slider, the method being adapted so that throat height of a main magnetic pole piece of a perpendicular recording magnetic head can be controlled with high accuracy. According to one embodiment, a first Electrical Lapping Guide element (ELG) is disposed on the same layer as a plated underlayer of a shield of one write head in a row bar, and other ELGs are disposed on the same layer as that of a main magnetic pole piece of another write head. Front end positions (Tops) are detected from changes in resistance values of the other ELGs and an ending position of lapping is calculated. Since the front end positions (Tops) of the other ELGs are accurate, it is possible to assign a correlation to throat height “Th” of the main magnetic pole piece and the resistance value of the first ELG by detecting this resistance value existing when the front end positions (Tops) are detected.
    Type: Grant
    Filed: August 30, 2007
    Date of Patent: March 23, 2010
    Assignee: Hitachi Global Storage Technologies Netherlands B.V.
    Inventors: Akira Kondo, Koji Tanaka, Kimitoshi Etoh, Ichiro Oodake
  • Patent number: 7676905
    Abstract: A magnetoresistive sensor having a pinned layer that extends beyond the stripe height defined by the free layer of the sensor. The extended pinned layer has a strong shape induced anisotropy that maintains pinning of the pinned layer moment. The extended portion of the pinned layer has sides beyond the stripe height that are perfectly aligned with the sides of the sensor within the stripe height. This perfect alignment is made possible by a manufacturing method that uses a mask structure for more than one manufacturing phase, eliminating the need for multiple mask alignments.
    Type: Grant
    Filed: August 15, 2005
    Date of Patent: March 16, 2010
    Assignee: Hitachi Global Storage Technologies Netherlands B.V.
    Inventor: Mustafa Michael Pinarbasi
  • Patent number: 7676904
    Abstract: A method of manufacturing a GMR, TMR or CPP GMR sensor having a smooth interface between magnetic and non-magnetic layers to improve sensor performance by exposing a layer to a low energy ion beam prior to depositing a subsequent layer.
    Type: Grant
    Filed: July 30, 2004
    Date of Patent: March 16, 2010
    Assignee: Hitachi Global Storage Technologies Netherlands B.V.
    Inventors: Phong V. Chau, James Mac Freitag, Mustafa Michael Pinarbasi, Hua Ai Zeng
  • Patent number: 7657992
    Abstract: A method of making a perpendicular magnetic recording (PMR) head with single or double coil layers and with a small write shield stitched onto a main write shield. The stitched shield allows the main write pole to produce a vertical write field with sharp vertical gradients that is reduced on both sides of the write pole so that adjacent track erasures are eliminated. From a fabrication point of view, both the main pole and the stitched shield are defined and formed using a single photolithographic process, a trim mask and CMP lapping process so that the main shield can be stitched onto a self-aligned main pole and stitched shield.
    Type: Grant
    Filed: December 11, 2007
    Date of Patent: February 9, 2010
    Assignee: Headway Technologies, Inc.
    Inventors: Cherng-Chyi Han, Kenichi Takano
  • Patent number: 7650684
    Abstract: A method for fabricating a magnetic head including a spin valve sensor having a sensor layer stack that includes a pinned magnetic layer, a spacer layer formed on the pinned magnetic layer, and a free magnetic layer formed on the spacer layer. In a preferred embodiment the spacer layer is comprised of CuOx. The method includes the plasma smoothing of the upper surface of the pinned magnetic layer prior to depositing the spacer layer, and a preferred plasma gas is a mixture of argon and oxygen.
    Type: Grant
    Filed: July 16, 2004
    Date of Patent: January 26, 2010
    Assignee: Hitachi Global Storage Technologies Netherlands B.V.
    Inventors: Wen-Yaung Lee, Tsann Lin, Danielle Mauri, Alexander Michael Zeltser
  • Patent number: 7640650
    Abstract: A method of making a magnetoresistive sensor includes defining a track width of a magnetoresistive element stack of the sensor. Further, processes of the method enable depositing of hard magnetic bias material on each side of the stack. These processes may permit both milling of excess depositions of the material outside of regions where the hard magnetic bias material is desired via use of a photoresist and making the material have a planar surface via chemical mechanical polishing, which also removes the material on top of the stack. The method includes removing excess material outside of the photoresist, wherein the excess material includes part of the hard bias layer, while a portion of the hard bias layer remains directly above the MR sensor stack.
    Type: Grant
    Filed: December 28, 2007
    Date of Patent: January 5, 2010
    Assignee: Hitachi Global Storage Technologies Netherlands B.V.
    Inventors: Satoru Araki, Ying Hong, Wipul Jayasekara, Ming Jiang
  • Patent number: 7634851
    Abstract: A method of forming a magnetic tunnel junction memory element and the resulting structure are disclosed. A magnetic tunnel junction memory element comprising a thick nonmagnetic layer between two ferromagnetic layers. The thick nonmagnetic layer has an opening in which a thinner tunnel barrier layer is disposed. The resistance of a magnetic tunnel junction memory element may be controlled by adjusting the surface area and/or thickness of the tunnel barrier layer without regard to the surface area of the ferromagnetic layers.
    Type: Grant
    Filed: June 28, 2006
    Date of Patent: December 22, 2009
    Assignee: Micron Technology, Inc.
    Inventor: Mark E. Tuttle
  • Patent number: 7634850
    Abstract: Embodiments of the present invention allow control over the element height of read and write heads without damage to a lapping surface table when an air-bearing surface is lapped with a row bar or magnetic head slider tilted. According to one embodiment, the air-bearing surface is lapped with the row bar tilted in the longitudinal direction of a slider to compensate element height-wise positional deviations of the read head and the write head. The lapping is performed while changing an inclination angle stepwise and swinging the row bar in the longitudinal direction of the slider centering around an inclination angle at each step. Thus, the element heights of the magnetic pole piece and the read element can be controlled without damage to a lapping surface table.
    Type: Grant
    Filed: July 20, 2007
    Date of Patent: December 22, 2009
    Assignee: Hitachi Global Storage Technologies Netherlands B.V.
    Inventor: Koji Tanaka
  • Patent number: 7631416
    Abstract: A reticle having a convex portion and a concave portion is used to form a convex portion and concave portion in the resist pattern for magnetic detection element and conductive layer, respectively. Then, with each resist pattern as a mask, unnecessary portions are removed to determine an initial height and to form a convex portion and concave portion in the magnetic detection element layer and in the conductive layer, respectively. Then, based on a ratio between widths of the convex portion and of the concave portion of the magnetic detection element layer, a deviation of the magnetic detection element layer is obtained, and a deviation of the conductive layer is obtained in a similar way, and based on these deviations the medium facing surface is ground with the conductive layer as a resistance sensor so that the height of the magnetic detection element layer be a desired value.
    Type: Grant
    Filed: May 14, 2007
    Date of Patent: December 15, 2009
    Assignee: TDK Corporation
    Inventors: Naoki Ohta, Kazuki Sato
  • Patent number: 7631418
    Abstract: A manufacturing process is provided where aggressive (i.e. tight tolerance) stitching offers several advantages for magnetic write heads but at the cost of some losses during pole trimming. This problem has been overcome by replacing the alumina filler layer, that is used to protect the stitched pole during trimming, with a layer of electroplated material. Because of the superior step coverage associated with the plating method of deposition, pole trimming can then proceed without the introduction of stresses to the stitched pole while it is being trimmed.
    Type: Grant
    Filed: July 26, 2007
    Date of Patent: December 15, 2009
    Assignee: Headway Technologies, Inc.
    Inventors: Cherng-Chyi Han, Mao-Min Chen, Laurie Lauchlan, Lei Zhang
  • Patent number: 7627942
    Abstract: A method for fabricating a magnetic write head with a coil with a high aspect ratio using a Chemical Vapor Deposition process such as Atomic Layer Deposition (ALD), High Speed ALD, Plasma Enhanced ALD (PEALD), Plasma Enhanced Chemical Vapor Deposition (PECVD) or Low Pressure Chemical Vapor Deposition (LPCVD) to form encapsulating films over the coils without voids is disclosed. Materials which can be used for encapsulation include Al2O3, SiO2, AlN, Ta2O5, HfO2, ZrO2, and YtO3. The use of an ultra-conformal deposition process allows the pitch of the coils to be smaller than it is possible in the prior art. The method also allows materials with a smaller coefficient of thermal expansion than hardbake photoresist to be used with resulting improvements in thermal protrusion characteristics.
    Type: Grant
    Filed: March 25, 2005
    Date of Patent: December 8, 2009
    Assignee: Hitachi Global Storage Technologies Netherlands B.V.
    Inventors: Richard Hsiao, Wipul Pemsiri Jayasekara, Howard Gordon Zolla
  • Patent number: 7624496
    Abstract: A method for creating a disk drive. A slider is installed in a disk drive having at least one unlubricated disk. The slider is designed to be in initial contact. The slider is burnished to the final design point. A vapor phase lubricant reservoir system is installed in the drive either before or after the burnishing step.
    Type: Grant
    Filed: August 29, 2003
    Date of Patent: December 1, 2009
    Assignee: Hitachi Global Storage Technologies Netherlands B.V.
    Inventors: Walton Fong, Donald Ray Gillis, Remmelt Pit, Mike Suk
  • Patent number: 7624610
    Abstract: Laser beam irradiation areas are provided in a load curve portion and an angle adjustment portion of a suspension. The laser beam irradiation areas are oriented in a direction in which the suspension is to be bent. A laser beam having a predetermined length and a predetermined shape is irradiated onto each laser beam irradiation area.
    Type: Grant
    Filed: August 25, 2003
    Date of Patent: December 1, 2009
    Assignee: NHK Spring Co., Ltd.
    Inventors: Masaru Inoue, Hiroshi Kawamata, Hironori Tanaka
  • Patent number: 7617589
    Abstract: A method of manufacturing a slider includes forming a slider material containing a portion to be the slider body and a head element. The slider material is processed to form an air bearing surface by lapping a surface to be a medium facing surface of the slider material to form a lapped surface that includes a third surface. Selectively etching the lapped surface for form a second surface and after the selectively etching, lapping a part of the lapped surface to form the first surface, the third surface and a border part.
    Type: Grant
    Filed: November 1, 2007
    Date of Patent: November 17, 2009
    Assignees: Headway Technologies, Inc., SAE Magnetics (H.K.) Ltd.
    Inventors: Yoshitaka Sasaki, Takehiro Kamigama
  • Patent number: 7617588
    Abstract: Methods for making devices comprise forming a plurality of transducers on a major surface of a wafer, including forming a plurality of solid layers each having a thickness that is less than one micron; dividing the wafer and the attached transducers into a plurality of units such that each of the units includes a portion of the layers and a substantially planar surface that is substantially perpendicular to the portion of the layers; and removing at least part of the substantially planar surface, including creating, for each transducer, at least one flexible element that is attached the transducer. Conventional problems of connecting a head to the flexure and/or gimbal are eliminated. The heads can be made thinner than is conventional and gimbals and flexures can be more closely aligned with forces arising from interaction with the media surface and from seeking various tracks, reducing torque and dynamic instabilities.
    Type: Grant
    Filed: September 26, 2005
    Date of Patent: November 17, 2009
    Inventor: Mark A. Lauer
  • Patent number: 7614137
    Abstract: Embodiments of the invention relate to manufacturing method of a magnetic head slider which flies stably even with a reduced peripheral speed resulting from a trend toward a magnetic disk having a smaller diameter. According to one embodiment, a method of manufacturing a magnetic head slider comprises forming a leading side rail surface and a trailing side rail surface, a leading stepped bearing surface and a trailing stepped bearing surface, and a negative-pressure groove surface on an air bearing surface through etching, forming a first stepped surface on the leading side rail surface through sputtering, and forming a second stepped surface by forming a carbon layer on the first stepped surface through sputtering. The first stepped surface has a first height with respect to the leading side rail surface and the second stepped surface has a second height with respect to the first stepped surface.
    Type: Grant
    Filed: July 5, 2006
    Date of Patent: November 10, 2009
    Assignee: Hitachi Global Storage Technologies Netherlands B.V.
    Inventors: Yoshihiro Taniguchi, Yoshinori Takeuchi
  • Patent number: 7607215
    Abstract: To provide a method of manufacturing magnetic head slider which is capable of improving the product quality, simplifying the manufacturing process, and reducing the manufacturing time. This method of manufacturing a magnetic head slider, formed by cutting out from a block member, includes the steps of: processing an end face of the block member forming one surface of a magnetic head slider; holding fixedly the end face of the block member processed; and while maintaining a holding state provided by the step of holding, cutting a portion of the end face side of the block member, and processing a cut surface of the cut portion forming another surface of the magnetic head slider.
    Type: Grant
    Filed: May 26, 2006
    Date of Patent: October 27, 2009
    Assignee: SAE Magnetics (H.K.) Ltd.
    Inventor: Ryuta Murakoshi
  • Patent number: 7607214
    Abstract: A slider for use in a magnetic data recording system that is constructed from a Si wafer by a method that saves valuable wafer real estate by minimizing kerf related to the cutting of the wafer into slider rows. The sliders are produced from a (110) oriented Si wafer, and the sliders are parsed into rows by a process that involves forming a mask having a trench or opening between the rows of sliders at the location of the desired cut and parallel to a vertical (111) plane of the wafer. The wafer is then exposed to KOH which removes wafer material in the vertical direction through the wafer without removing wafer material in the horizontal direction. The vertical removal of wafer material is due to the extreme preferential removal of the (110) surface Si over that of the (111) surface Si. This results in a narrow straight trench being formed. The KOH etch removal can form a trench or cut having a width of only 30 to 50 um through a 1 mm thick wafer.
    Type: Grant
    Filed: February 22, 2005
    Date of Patent: October 27, 2009
    Assignee: Hitachi Global Storage Technologies Netherlands B.V.
    Inventors: Timothy Clark Reiley, Barry Cushing Stipe
  • Patent number: 7603762
    Abstract: An optical lapping guide for determining an amount of lapping performed on a row of sliders in a process for manufacturing sliders for magnetic data recording. The optical lapping guide is constructed with a front edge that is at an angle with respect to an air bearing surface plane ABS plane, such that a portion of the lapping guides is in front of the ABS and portion of the lapping guide is behind the ABS. As lapping progresses, an increasing amount of the lapping guide will be exposed at the ABS and visible for inspection. Therefore, after a lapping process has been performed, the optical lapping guide can be inspected to determine the amount of material removed by lapping. The greater the amount of the lapping guide that is exposed and visible, the greater the amount of material removed by lapping.
    Type: Grant
    Filed: December 15, 2006
    Date of Patent: October 20, 2009
    Assignee: Hitachi Global Storage Technologies Netherlands B.V.
    Inventors: Amanda Baer, Vladimir Nikitin, Aron Pentek, Neil Leslie Robertson
  • Patent number: 7596853
    Abstract: The method of manufacturing a thin film magnetic head includes forming a first recessed portion for insulation and a second recessed portion for contact that reach the substrate through the first insulating layer from a side of the first insulating layer of the substrate having the first insulating layer thereon; forming a second insulating layer on the substrate in the first recessed portion; and forming the lower shield layer in the first recessed portion and a contact portion in the second recessed portion.
    Type: Grant
    Filed: December 28, 2006
    Date of Patent: October 6, 2009
    Assignee: TDK Corporation
    Inventors: Kenji Ichinohe, Yosuke Goto
  • Patent number: 7596855
    Abstract: A thin film magnetic head capable of shortening a manufacturing time and a method of manufacturing the same are provided. After forming a write gap layer by using a non-magnetic conductive material such as copper, a top pole is formed on the write gap layer by growing a plating film with the write gap layer used as a seed layer. Unlike the case where the write gap layer is formed by using a non-magnetic insulating material such as alumina, a step of newly forming a seed layer aside from the write gap layer and a step of selectively removing the newly formed seed layer become unnecessary. Therefore, the number of manufacturing processes is reduced, and the manufacturing time of the thin film magnetic head is shortened.
    Type: Grant
    Filed: March 16, 2004
    Date of Patent: October 6, 2009
    Assignee: SAE Magnetics (H.K.) Ltd.
    Inventor: Naoto Matono
  • Patent number: 7591064
    Abstract: A method is presented for fabrication of a tape medium read head having a unitary formation of multiple elements for reading multi-track data from a magnetic tape. The method includes providing a continuous substrate layer, and forming a sensor material layer on the continuous substrate layer. Photoresist material is deposited on the sensor material layer, and is patterned to form masks which provide protected areas and exposed areas of the sensor material layer. Exposed areas of the sensor material layer are shaped to form sensors from the protected areas of the sensor material layer. Electrical lead materials are deposited between and adjacent to the sensors, and the masks are removed.
    Type: Grant
    Filed: July 20, 2005
    Date of Patent: September 22, 2009
    Assignee: Hitachi Global Storage Technologies Netherlands B.V.
    Inventor: Ian Robson McFadyen
  • Publication number: 20090229112
    Abstract: The method of producing a head slider is capable of restraining variation of processing read-elements, forming the read-elements having a prescribed size, improving production yield and improving magnetoresistance characteristics. The method comprises the steps of: forming grooves in a wafer substrate, wherein the grooves correspond to raw bars to be cut from the wafer substrate; filling the grooves with an insulating material; forming read-elements and write-elements on the surface of the wafer substrate, whose grooves have been filled with the insulating material; and cutting the wafer substrate, on which the read-elements and the write-elements have been formed, along the grooves so as to form the raw bars, whose base members are constituted by the wafer substrate and coated with the insulating material.
    Type: Application
    Filed: September 22, 2008
    Publication date: September 17, 2009
    Applicant: FUJITSU LIMITED
    Inventors: Masayuki Hamakawa, Mitsuru Kubo, Satoshi Tomita
  • Patent number: 7587810
    Abstract: A mask structure for fabricating a write pole for a perpendicular write head. The mask structure includes a first and second hard mask structures separated by an image transfer layer, such as DURAMIDE®. The first mask structure may be a bi-layer mask structure that functions as a CMP stop as well as a hard mask for ion milling. The first hard mask is chosen to have a desired resistance to removal by ion milling to maintain excellent track width control during an ion milling process used to form the write pole. Therefore, the first hard mask may be comprises of two layers selected from the group consisting of Rh, alumina, and diamond like carbon (DLC). The second hard mask is constructed of a material that functions as a bottom antireflective coating as well as a hard mask.
    Type: Grant
    Filed: March 28, 2006
    Date of Patent: September 15, 2009
    Assignee: Hitachi Global Storage Technologies Netherlands B.V.
    Inventor: Quang Le
  • Patent number: 7587809
    Abstract: A magnetoresistive reader having a sensor, current contacts with low parasitic resistance and a top shield with substantially planar topology is fabricated by first defining a stripe height back edge of the sensor. Next, a reader width of the sensor is defined. The current contacts are deposited to a thickness such that a top surface of the current contacts is substantially level with a top surface of the sensor. The top shield is deposited over the sensor and the current contacts. Defining the stripe height back edge prior to the reader width results in current contacts with low parasitic resistance and inhibits the formation of magnetic domains in the top shield.
    Type: Grant
    Filed: January 15, 2002
    Date of Patent: September 15, 2009
    Assignee: Seagate Technology LLC
    Inventors: Dimitar V. Dimitrov, Daniel P. Burbank, Paul E. Anderson, Richard P. Larson, Kenneth P. Naughton, Insik Jin
  • Patent number: 7584532
    Abstract: An apparatus for processing a magnetic head slider used for a magnetic disk apparatus for performing a magnetic recording/reproducing process in a discoid recording medium. The apparatus for processing a magnetic head slider includes a discoid recording medium used as an abrasive material, a holding unit configured to hold a suspension arm on which a magnetic head slider is disposed, an elevating unit configured to bring the magnetic head slider into contact with the discoid recording medium in a sliding manner by elevating and lowering the discoid recording medium, and a rotating unit configured to rotate the discoid recording medium at a rotation speed lower than a rotation speed upon the magnetic recording/reproducing process.
    Type: Grant
    Filed: March 6, 2006
    Date of Patent: September 8, 2009
    Assignee: Fujitsu Limited
    Inventors: Shunsuke Sone, Hirokazu Yamanishi
  • Patent number: 7574791
    Abstract: A method for fabricating magnetic side shields for an MR sensor of a magnetic head. Following the deposition of MR sensor layers, a first DLC layer is deposited. Milling mask layers are then deposited, and outer portions of the milling mask layers are removed such that a remaining central portion of the milling mask layers is formed having straight sidewalls and no undercuts. Outer portions of the sensor layers are then removed such that a relatively thick remaining central portion of the milling mask resides above the remaining sensor layers. A thin electrical insulation layer is deposited, followed by the deposition of magnetic side shields. A second DLC layer is deposited and the remaining mask layers are then removed utilizing a chemical mechanical polishing (CMP) liftoff step. Thereafter, the first DLC layer and the second DLC layer are removed and a second magnetic shield layer is then fabricated thereabove.
    Type: Grant
    Filed: May 10, 2005
    Date of Patent: August 18, 2009
    Assignee: Hitachi Global Storage Technologies Netherlands B.V.
    Inventors: Satoru Araki, Robert Stanley Beach, Marie-Claire Cyrille, Wipul Pemsiri Jayasekara, Quang Le, Jui-Lung Li, David John Seagle, Howard Gordon Zolla
  • Publication number: 20090195934
    Abstract: A spring member manufacturing device that manufactures the spring member by laser irradiation includes a laser irradiation unit including a plurality of laser irradiation devices that perform predetermined laser irradiation with respect to the spring member. In the spring member manufacturing device, the laser irradiation devices are configured so that laser irradiated conditions different from each other are preset for the respective laser irradiation devices, and are arranged so that the respective irradiated positions do not overlap each other. The laser irradiation apparatus is constituted by combining laser irradiation devices having laser irradiation conditions being 2 to the (n?1)th power, n being a positive integer,of predetermined minimum adjustment amount for adjusting load on the spring member. The combination of the laser irradiation devices are selected in accordance with load adjusting amount required for the spring member.
    Type: Application
    Filed: December 16, 2008
    Publication date: August 6, 2009
    Applicant: Fujitsu Limited
    Inventors: Toshikazu Furui, Naohisa Matsushita
  • Patent number: 7565732
    Abstract: A method of fabricating a magnetic write head, in accordance with one embodiment, includes forming a beveled write pole. A conformal spacer may be formed upon a portion of a flare length proximate a tip of the write pole. A shield layer may also be formed upon the conformal spacer adjacent the flare length proximate the tip of the write pole.
    Type: Grant
    Filed: August 31, 2004
    Date of Patent: July 28, 2009
    Assignee: Hitachi Global Storage Technologies Netherlands B.V.
    Inventors: Quang Le, Howard Zolla, Nian-Xiang Sun
  • Patent number: 7562435
    Abstract: The sensitivity of the ABS shape of a suspension mounted slider to temperature variations can be greatly reduced if the backside of the slider is lapped to a smooth convex contour that is similar to the ABS shape, rather than to a planar shape, prior to mounting the slider on the suspension. When the backside surfaces of sliders are shaped in this manner, the size of changes in the crown height of the ABS shape due to temperature variations are greatly reduced and the ABS shapes are distributed more tightly, thereby increasing disk drive reliability.
    Type: Grant
    Filed: March 24, 2005
    Date of Patent: July 21, 2009
    Assignee: SAE Magnetics (H.K.) Ltd.
    Inventors: Niraj Mahadev, Yugraj S. Aujla
  • Patent number: 7562436
    Abstract: In one embodiment, a method of forming a CPP sensor comprises providing a sensor having a hard mask disposed on a left side thereof and a right side with a portion of the sensor material removed therefrom, the hard mask having a vertical surface; forming a right dielectric layer including a vertical surface disposed adjacent the vertical surface of the hard mask; forming a right hard bias layer or right side shields on the right dielectric layer; removing the hard mask to expose the left side of the sensor; forming an electrically conductive layer on the sensor, the electrically conductive layer including a vertical electrically conductive portion disposed adjacent the vertical surface of the right dielectric layer; removing the electrically conductive layer except the vertical electrically conductive portion; removing a portion of the sensor material from the left side of the sensor; forming a left dielectric layer on the left side of the sensor, the left dielectric layer including a vertical surface dispose
    Type: Grant
    Filed: July 29, 2005
    Date of Patent: July 21, 2009
    Assignee: Hitachi Global Storage Technologies Netherlands B.V.
    Inventor: Wipul Pemsiri Jayasekara
  • Publication number: 20090165287
    Abstract: A bar is cut from a wafer having head elements arrayed thereon along sectional surfaces parallel to each other and orthogonal to a wafer surface. One sectional surface is set as a medium opposing surface of a head slider. Polishing processing is performed on the bar, starting from a “surface corresponding to rear side” corresponding to a wafer rear surface, with a grinding surface rubbed in a transverse direction of the bar. The roughness of the “surface corresponding to rear side” of the bar is reduced. By suppressing the surface roughness in this way, a read element and write element among head elements can be obtained with high dimensional accuracy. Such a manufacturing method considerably contributes to reduction of a dimension error of a head element, in particular, a write element.
    Type: Application
    Filed: December 22, 2008
    Publication date: July 2, 2009
    Applicant: FUJITSU LIMITED
    Inventors: Michinao NOMURA, Mitsuru KUBO