By Etching Patents (Class 29/603.18)
  • Patent number: 7716814
    Abstract: Components of a plurality of magnetic heads are formed on a single substrate to fabricate a magnetic head substructure in which a plurality of pre-head portions are aligned in a plurality of rows. The substructure is cut to separate the plurality of pre-head portions from one another, and the plurality of magnetic heads are thereby fabricated. The surface formed by cutting the substructure is lapped to form a lapped surface. The lapped surface is lapped so as to reach a target position of a medium facing surface. The substructure incorporates first to fourth resistor elements each of which detects the position of the lapped surface. The third and fourth detection elements are located at positions shifted from the first and second resistor elements along the direction orthogonal to the medium facing surface.
    Type: Grant
    Filed: February 5, 2007
    Date of Patent: May 18, 2010
    Assignees: Headway Technologies, Inc., SAE Magnetics (H.K.) Ltd.
    Inventors: Yoshitaka Sasaki, Hiroyuki Itoh, Kazuo Ishizaki, Ryuji Fujii, Tatsushi Shimizu
  • Patent number: 7716811
    Abstract: Head elements are formed on a wafer to suppress deterioration in pinning strength of a pinned layer, which is caused by ESD generated during air bearing surface polishing of a thin film magnetic head. The wafer is cut into rovers in each of which are connected head elements. Rover air bearing surfaces are polished until an MR elements attain a predetermined height. A final polishing step finishes air bearing surfaces by applying an electroconductive polishing liquid to achieve a predetermined shape and surface roughness with high accuracy. A pinning defect occurrence rate is reduced by suppressing deterioration in pinning strength of a pinned layer of a read element. To achieve this, a specific resistance of the electroconductive polishing liquid is controlled to 5 G?·cm or less. A shallow rail and a deep rail are formed on the air bearing surfaces, and the rover is cut into thin film magnetic heads.
    Type: Grant
    Filed: October 27, 2006
    Date of Patent: May 18, 2010
    Assignee: Hitachi Global Storage Technologies Netherlands B.V.
    Inventors: Takateru Seki, Akihiro Namba, Hideo Yamakura, Takahiro Noji
  • Patent number: 7716813
    Abstract: A method is disclosed for independently controlling track width and bevel angle of a write pole tip of a magnetic recording head. The method includes establishing the track width in the pole tip layer material utilizing E-beam lithography. A portion of this pole tip material having the established track width is protected by providing a temporary masking material to make a protected portion. At least one unprotected portion is left exposed to be shaped. This unprotected portion is then beveled to produce at least one beveled portion. The protected portion produces an upper pole tip portion which together with the beveled portion produce an improved pole tip. Also disclosed is a magnetic head having the improved pole tip, and a disk drive having a magnetic head having the improved pole tip.
    Type: Grant
    Filed: December 5, 2006
    Date of Patent: May 18, 2010
    Assignee: Hitachi Global Storage Technologies Netherlands B.V.
    Inventors: Kim Y. Lee, Jyh-Shuey Lo
  • Patent number: 7712205
    Abstract: In a magnetic head manufacturing method, a floated surface of each block having plural magnetic head elements formed and arranged on a substrate is ground and lapped in a grinding/lapping step. The grinding/lapping step contains an angle adjusting step for adjusting the angle of the floated surface of the block with reference to a magnetic-head-element formed surface of a substrate and grinding the floated surface concerned, and a finishing lapping step of lapping the floated surface at an angle adjusted in the angle adjusting step.
    Type: Grant
    Filed: November 16, 2005
    Date of Patent: May 11, 2010
    Assignee: SAE Magnetics (H.K.) Ltd.
    Inventors: Yoshiaki Ito, Osamu Fukuroi, Hiroyasu Tuchiya, Kenji Kodaka
  • Patent number: 7712206
    Abstract: A method for constructing a magnetic write head for use in perpendicular magnetic recording, the write head having a write pole with a trailing shield. After forming a magnetic write pole such as by masking and ion milling a magnetic write pole layer, a thin layer of alumina is deposited. This is followed by the deposition of a thin layer of Rh. Then, a thick layer of alumina is deposited, having a thickness that is preferably at least equal to the height of the write pole layer. A chemical mechanical polish is then performed until a portion of the Rh layer over the top (trailing edge) of the write pole is exposed. A material removal process such as ion milling is then performed to remove the exposed Rh layer exposing the thin alumina layer there beneath. Since the Rh trailing gap layer is electrically conductive it can also serve as a seed layer for electroplating the magnetic trailing shield.
    Type: Grant
    Filed: May 22, 2006
    Date of Patent: May 11, 2010
    Assignee: Hitachi Global Storage Technologies Netherlands B.V.
    Inventors: Ming Jiang, Aron Pentek, Yi Zheng
  • Patent number: 7712207
    Abstract: A method for manufacturing a magnetic write pole and trailing wrap around magnetic shield for use in a perpendicular magnetic data recording system. The method includes the use of a hard mask structure with end point detection material embedded in a hard mask material. The novel hard mask structure provides the mill resistance of a hard mask, with the end point detection advantages of an end point detection layer.
    Type: Grant
    Filed: December 22, 2006
    Date of Patent: May 11, 2010
    Assignee: Hitachi Global Storage Technologies Netherlands B.V.
    Inventors: Aron Pentek, Yi Zheng, Howard Gordon Zolla
  • Publication number: 20100107402
    Abstract: One preferred method for use in making a device structure with use of the resist channel shrinking solution includes the steps of forming a first pedestal portion within a channel of a patterned resist; applying a resist channel shrinking solution comprising a resist channel shrinking film and corrosion inhibitors within the channel of the patterned resist; baking the resist channel shrinking solution over the patterned resist to thereby reduce a width of the channel of the patterned resist; removing the resist channel shrinking solution; and forming a second pedestal portion within the reduced-width channel of the patterned resist. Advantageously, the oxide layer and the corrosion inhibitors of the resist channel shrinking solution reduce corrosion in the pedestal during the act of baking the resist channel shrinking solution.
    Type: Application
    Filed: January 11, 2010
    Publication date: May 6, 2010
    Applicant: HITACHI GLOBAL STORAGE TECHNOLOGIES
    Inventors: Christian Rene Bonhote, Jila Tabib, Dennis Richard Mckean, Daniel Wayne Bedell, Jyh-Shuey Lo, Hieu Lam, Kim Y. Lee
  • Patent number: 7681303
    Abstract: Embodiments of the present invention provide a method of manufacturing a magnetic head slider, the method being adapted so that throat height of a main magnetic pole piece of a perpendicular recording magnetic head can be controlled with high accuracy. According to one embodiment, a first Electrical Lapping Guide element (ELG) is disposed on the same layer as a plated underlayer of a shield of one write head in a row bar, and other ELGs are disposed on the same layer as that of a main magnetic pole piece of another write head. Front end positions (Tops) are detected from changes in resistance values of the other ELGs and an ending position of lapping is calculated. Since the front end positions (Tops) of the other ELGs are accurate, it is possible to assign a correlation to throat height “Th” of the main magnetic pole piece and the resistance value of the first ELG by detecting this resistance value existing when the front end positions (Tops) are detected.
    Type: Grant
    Filed: August 30, 2007
    Date of Patent: March 23, 2010
    Assignee: Hitachi Global Storage Technologies Netherlands B.V.
    Inventors: Akira Kondo, Koji Tanaka, Kimitoshi Etoh, Ichiro Oodake
  • Patent number: 7676905
    Abstract: A magnetoresistive sensor having a pinned layer that extends beyond the stripe height defined by the free layer of the sensor. The extended pinned layer has a strong shape induced anisotropy that maintains pinning of the pinned layer moment. The extended portion of the pinned layer has sides beyond the stripe height that are perfectly aligned with the sides of the sensor within the stripe height. This perfect alignment is made possible by a manufacturing method that uses a mask structure for more than one manufacturing phase, eliminating the need for multiple mask alignments.
    Type: Grant
    Filed: August 15, 2005
    Date of Patent: March 16, 2010
    Assignee: Hitachi Global Storage Technologies Netherlands B.V.
    Inventor: Mustafa Michael Pinarbasi
  • Patent number: 7646570
    Abstract: Current-perpendicular-to-plane (CPP) read sensors having constrained current paths made of lithographically-defined conductive vias with surrounding oxidized metal sublayers, and methods of making the same, are disclosed. In one illustrative example, at least part of a sensor stack structure which includes an electrically conductive spacer layer is formed. A metal (e.g. Ta) sublayer is then deposited over and adjacent the spacer layer, followed by one of an oxidation process, a nitridation process, and an oxynitridation process, to produce an insulator (e.g. TaOx) from the metal sublayer. The metal sublayer deposition and oxidation/nitridation/oxynitridation processes are repeated as necessary to form the insulator with a suitable thickness. Next, a resist structure which exposes one or more portions of the insulator is formed over the insulator. With the resist structure in place, exposed insulator materials are removed by etching to form one or more apertures through the insulator down to the spacer layer.
    Type: Grant
    Filed: July 31, 2006
    Date of Patent: January 12, 2010
    Assignee: Hitachi Global Storage Technologies Netherlands B.V.
    Inventors: Hardayal Singh Gill, Jordan Asher Katine, Alexander Zeltser
  • Patent number: 7634850
    Abstract: Embodiments of the present invention allow control over the element height of read and write heads without damage to a lapping surface table when an air-bearing surface is lapped with a row bar or magnetic head slider tilted. According to one embodiment, the air-bearing surface is lapped with the row bar tilted in the longitudinal direction of a slider to compensate element height-wise positional deviations of the read head and the write head. The lapping is performed while changing an inclination angle stepwise and swinging the row bar in the longitudinal direction of the slider centering around an inclination angle at each step. Thus, the element heights of the magnetic pole piece and the read element can be controlled without damage to a lapping surface table.
    Type: Grant
    Filed: July 20, 2007
    Date of Patent: December 22, 2009
    Assignee: Hitachi Global Storage Technologies Netherlands B.V.
    Inventor: Koji Tanaka
  • Patent number: 7631417
    Abstract: Methods and structures for the fabrication of perpendicular thin film heads are disclosed. Prior to the deposition of shield structures, seed layers having anti-reflective properties are utilized, eliminating the need to deposit, then remove, traditional inorganic anti-reflection coatings prior to shield plating.
    Type: Grant
    Filed: November 10, 2006
    Date of Patent: December 15, 2009
    Assignee: Hitachi Global Storage Technologies Netherlands B.V.
    Inventors: Hieu Lam, Patrick Rush Webb, Yi Zheng
  • Patent number: 7617589
    Abstract: A method of manufacturing a slider includes forming a slider material containing a portion to be the slider body and a head element. The slider material is processed to form an air bearing surface by lapping a surface to be a medium facing surface of the slider material to form a lapped surface that includes a third surface. Selectively etching the lapped surface for form a second surface and after the selectively etching, lapping a part of the lapped surface to form the first surface, the third surface and a border part.
    Type: Grant
    Filed: November 1, 2007
    Date of Patent: November 17, 2009
    Assignees: Headway Technologies, Inc., SAE Magnetics (H.K.) Ltd.
    Inventors: Yoshitaka Sasaki, Takehiro Kamigama
  • Patent number: 7617588
    Abstract: Methods for making devices comprise forming a plurality of transducers on a major surface of a wafer, including forming a plurality of solid layers each having a thickness that is less than one micron; dividing the wafer and the attached transducers into a plurality of units such that each of the units includes a portion of the layers and a substantially planar surface that is substantially perpendicular to the portion of the layers; and removing at least part of the substantially planar surface, including creating, for each transducer, at least one flexible element that is attached the transducer. Conventional problems of connecting a head to the flexure and/or gimbal are eliminated. The heads can be made thinner than is conventional and gimbals and flexures can be more closely aligned with forces arising from interaction with the media surface and from seeking various tracks, reducing torque and dynamic instabilities.
    Type: Grant
    Filed: September 26, 2005
    Date of Patent: November 17, 2009
    Inventor: Mark A. Lauer
  • Publication number: 20090277591
    Abstract: An auxiliary fixture for debonding sliders from an exposure jig and receiving the sliders includes a debonding tray. A top surface of the debonding tray forms a plurality of slider pockets arranged in an array. Every two adjacent slider pockets in every column of the array are separated by an interval wall such that every interval wall corresponds to one slider pocket. One side of each interval wall that forms an inner wall of the corresponding slider pocket is an incline such that the interval wall has a structure tapering from the bottom up. The inclines of the interval walls in the same column of the array incline to the same side and the inclines of the interval walls in two adjacent columns of the array incline to opposite sides such that every two adjacent interval walls in every row of the array form side walls of each other's slider pockets. The present invention also discloses a method for manufacturing sliders with the auxiliary fixture.
    Type: Application
    Filed: July 3, 2008
    Publication date: November 12, 2009
    Applicant: SAE Magnetics (H.K.) Ltd.
    Inventors: ShiXing Zhao, Masahiro Kondoh, FangYi Ning, Takeshi Nakada, Shingcheong Lau
  • Patent number: 7614137
    Abstract: Embodiments of the invention relate to manufacturing method of a magnetic head slider which flies stably even with a reduced peripheral speed resulting from a trend toward a magnetic disk having a smaller diameter. According to one embodiment, a method of manufacturing a magnetic head slider comprises forming a leading side rail surface and a trailing side rail surface, a leading stepped bearing surface and a trailing stepped bearing surface, and a negative-pressure groove surface on an air bearing surface through etching, forming a first stepped surface on the leading side rail surface through sputtering, and forming a second stepped surface by forming a carbon layer on the first stepped surface through sputtering. The first stepped surface has a first height with respect to the leading side rail surface and the second stepped surface has a second height with respect to the first stepped surface.
    Type: Grant
    Filed: July 5, 2006
    Date of Patent: November 10, 2009
    Assignee: Hitachi Global Storage Technologies Netherlands B.V.
    Inventors: Yoshihiro Taniguchi, Yoshinori Takeuchi
  • Patent number: 7610673
    Abstract: A vertical recording magnetic head and a method of manufacturing the same is provided. The magnetic head includes a main magnetic pole layer on a surface opposite to a recording medium and a pair of neck height markers which is exposed on the surface around the main magnetic pole layer and which indicates a neck height position of the main magnetic pole layer by way of inter-exposure area ratios. The neck height markers have one cross sections that increases and the other that decreases even though the cross sections in a plane parallel to the surface are oriented toward forward or backward directions in a neck height direction. The neck height markers have the same cross sections at a specific cross sectional position parallel to the surface.
    Type: Grant
    Filed: April 4, 2005
    Date of Patent: November 3, 2009
    Assignee: TDK Corporation
    Inventor: Toru Takahashi
  • Patent number: 7610674
    Abstract: Concerns about inadequate electromigration robustness in CCP CPP GMR devices have been overcome by adding magnesium to the current confining structures that are presently in use. In one embodiment the alumina layer, in which the current carrying copper regions are embedded, is fully replaced by a magnesia layer. In other embodiments, alumina is still used but a layer of magnesium is included within the structure before it is subjected to ion assisted oxidation.
    Type: Grant
    Filed: February 13, 2006
    Date of Patent: November 3, 2009
    Assignee: Headway Technologies, Inc.
    Inventors: Kunliang Zhang, Daniel G Abels, Min Li, Yu-Hsia Chen
  • Patent number: 7607214
    Abstract: A slider for use in a magnetic data recording system that is constructed from a Si wafer by a method that saves valuable wafer real estate by minimizing kerf related to the cutting of the wafer into slider rows. The sliders are produced from a (110) oriented Si wafer, and the sliders are parsed into rows by a process that involves forming a mask having a trench or opening between the rows of sliders at the location of the desired cut and parallel to a vertical (111) plane of the wafer. The wafer is then exposed to KOH which removes wafer material in the vertical direction through the wafer without removing wafer material in the horizontal direction. The vertical removal of wafer material is due to the extreme preferential removal of the (110) surface Si over that of the (111) surface Si. This results in a narrow straight trench being formed. The KOH etch removal can form a trench or cut having a width of only 30 to 50 um through a 1 mm thick wafer.
    Type: Grant
    Filed: February 22, 2005
    Date of Patent: October 27, 2009
    Assignee: Hitachi Global Storage Technologies Netherlands B.V.
    Inventors: Timothy Clark Reiley, Barry Cushing Stipe
  • Patent number: 7603762
    Abstract: An optical lapping guide for determining an amount of lapping performed on a row of sliders in a process for manufacturing sliders for magnetic data recording. The optical lapping guide is constructed with a front edge that is at an angle with respect to an air bearing surface plane ABS plane, such that a portion of the lapping guides is in front of the ABS and portion of the lapping guide is behind the ABS. As lapping progresses, an increasing amount of the lapping guide will be exposed at the ABS and visible for inspection. Therefore, after a lapping process has been performed, the optical lapping guide can be inspected to determine the amount of material removed by lapping. The greater the amount of the lapping guide that is exposed and visible, the greater the amount of material removed by lapping.
    Type: Grant
    Filed: December 15, 2006
    Date of Patent: October 20, 2009
    Assignee: Hitachi Global Storage Technologies Netherlands B.V.
    Inventors: Amanda Baer, Vladimir Nikitin, Aron Pentek, Neil Leslie Robertson
  • Patent number: 7603764
    Abstract: A method for manufacturing a thin film magnetic head having superior overwrite characteristics as well as having a locally minimized pole width includes: forming top pole chip having a first magnetic film that is a top layer portion of the top pole chip; forming a second magnetic film that is a bottom layer portion of the top pole chip; and forming the first and second magnetic films of magnetic material having a high magnetic flux density of 1.5 tesla or more; wherein a thin film magnetic head is produced that does not suffer from saturation of magnetic flux in the top pole chip, even when the pole width is locally minimized to about 0.3 ?m or less, and therefore has superior overwrite characteristics.
    Type: Grant
    Filed: March 9, 2005
    Date of Patent: October 20, 2009
    Assignee: TDK Corporation
    Inventor: Yoshitaka Sasaki
  • Patent number: 7596853
    Abstract: The method of manufacturing a thin film magnetic head includes forming a first recessed portion for insulation and a second recessed portion for contact that reach the substrate through the first insulating layer from a side of the first insulating layer of the substrate having the first insulating layer thereon; forming a second insulating layer on the substrate in the first recessed portion; and forming the lower shield layer in the first recessed portion and a contact portion in the second recessed portion.
    Type: Grant
    Filed: December 28, 2006
    Date of Patent: October 6, 2009
    Assignee: TDK Corporation
    Inventors: Kenji Ichinohe, Yosuke Goto
  • Patent number: 7596854
    Abstract: A method is disclosed for fabricating a read head for a magnetic disk drive having a read head sensor and a hard bias layer, where the read head has a shaped junction between the read head sensor and the hard bias layer. The method includes providing a layered wafer stack to be shaped. A single- or multi-layered photoresist mask having no undercut is deposited upon the layered wafer stack to be shaped. The layered wafer stack is shaped by the output of a milling source, where the shaping includes partial milling to within a partial milling range to form a shaped junction. A hard bias layer is then deposited which is in contact with the shaped junction of the wafer stack.
    Type: Grant
    Filed: September 4, 2007
    Date of Patent: October 6, 2009
    Assignee: Hitachi Global Storage Technologies Netherlands B.V.
    Inventors: Marie-Claire Cyrille, Wipul Pemsiri Jayasckara, Mustafa Michael Pinarbasi
  • Patent number: 7596855
    Abstract: A thin film magnetic head capable of shortening a manufacturing time and a method of manufacturing the same are provided. After forming a write gap layer by using a non-magnetic conductive material such as copper, a top pole is formed on the write gap layer by growing a plating film with the write gap layer used as a seed layer. Unlike the case where the write gap layer is formed by using a non-magnetic insulating material such as alumina, a step of newly forming a seed layer aside from the write gap layer and a step of selectively removing the newly formed seed layer become unnecessary. Therefore, the number of manufacturing processes is reduced, and the manufacturing time of the thin film magnetic head is shortened.
    Type: Grant
    Filed: March 16, 2004
    Date of Patent: October 6, 2009
    Assignee: SAE Magnetics (H.K.) Ltd.
    Inventor: Naoto Matono
  • Publication number: 20090229112
    Abstract: The method of producing a head slider is capable of restraining variation of processing read-elements, forming the read-elements having a prescribed size, improving production yield and improving magnetoresistance characteristics. The method comprises the steps of: forming grooves in a wafer substrate, wherein the grooves correspond to raw bars to be cut from the wafer substrate; filling the grooves with an insulating material; forming read-elements and write-elements on the surface of the wafer substrate, whose grooves have been filled with the insulating material; and cutting the wafer substrate, on which the read-elements and the write-elements have been formed, along the grooves so as to form the raw bars, whose base members are constituted by the wafer substrate and coated with the insulating material.
    Type: Application
    Filed: September 22, 2008
    Publication date: September 17, 2009
    Applicant: FUJITSU LIMITED
    Inventors: Masayuki Hamakawa, Mitsuru Kubo, Satoshi Tomita
  • Patent number: 7587809
    Abstract: A magnetoresistive reader having a sensor, current contacts with low parasitic resistance and a top shield with substantially planar topology is fabricated by first defining a stripe height back edge of the sensor. Next, a reader width of the sensor is defined. The current contacts are deposited to a thickness such that a top surface of the current contacts is substantially level with a top surface of the sensor. The top shield is deposited over the sensor and the current contacts. Defining the stripe height back edge prior to the reader width results in current contacts with low parasitic resistance and inhibits the formation of magnetic domains in the top shield.
    Type: Grant
    Filed: January 15, 2002
    Date of Patent: September 15, 2009
    Assignee: Seagate Technology LLC
    Inventors: Dimitar V. Dimitrov, Daniel P. Burbank, Paul E. Anderson, Richard P. Larson, Kenneth P. Naughton, Insik Jin
  • Patent number: 7587811
    Abstract: A method for manufacturing a magnetic write head for perpendicular magnetic recording having a write pole with a very narrow track width and well controlled critical dimensions. The write pole is formed by depositing an electrically conductive seed layer over a substrate, and then depositing a photo resist layer over the seed layer. The photo resist layer is photolithographically exposed and developed to form an opening or trench in the photoreist layer, the opening defining the pattern of the write pole. A magnetic material is then plated into the opening in the photoresist layer. The photo resist layer can then be removed by a chemical lift off, and portions of the seed layer that are not covered by the write pole can be removed by ion milling.
    Type: Grant
    Filed: April 25, 2006
    Date of Patent: September 15, 2009
    Assignee: Hitachi Global Storage Technologies Netherlands B.V.
    Inventors: Hamid Balamane, Christian Rene Bonhote, Yimin Hsu, Aaron Neuhaus, Aron Pentek, Yi Zheng
  • Patent number: 7578049
    Abstract: A method for manufacturing a write pole for a perpendicular magnetic write head. The method includes forming a mask structure over a full film layer of magnetic write pole material. A layer of hard mask material such as conformally deposited alumina is then deposited full film over the mask and write pole material. An ion mill, such as in an Ar or CHF3 chemistry is then used to preferentially remove horizontally disposed portions of the alumina layer (hard mask layer), thereby forming vertical hard mask walls at the sides of the mask structure. An ion mill is then used to form the write pole, with the alumna side walls providing excellent masking for forming well defined write pole edges. A relatively gentle clean up process can then be performed to remove the remaining mask material and side walls.
    Type: Grant
    Filed: September 21, 2006
    Date of Patent: August 25, 2009
    Assignee: Hitachi Global Storage Technologies Netherlands B.V.
    Inventors: Yimin Hsu, Vladimir Nikitin, Aron Pentek
  • Patent number: 7562435
    Abstract: The sensitivity of the ABS shape of a suspension mounted slider to temperature variations can be greatly reduced if the backside of the slider is lapped to a smooth convex contour that is similar to the ABS shape, rather than to a planar shape, prior to mounting the slider on the suspension. When the backside surfaces of sliders are shaped in this manner, the size of changes in the crown height of the ABS shape due to temperature variations are greatly reduced and the ABS shapes are distributed more tightly, thereby increasing disk drive reliability.
    Type: Grant
    Filed: March 24, 2005
    Date of Patent: July 21, 2009
    Assignee: SAE Magnetics (H.K.) Ltd.
    Inventors: Niraj Mahadev, Yugraj S. Aujla
  • Patent number: 7562437
    Abstract: A method for constructing a magnetic write head for use in perpendicular magnetic recording, the write head having a write pole with a trailing shield that wraps around the write pole. The method allows the trailing shield to be constructed with a very well controlled trailing gap thickness and also allows the write pole to be constructed with a well controlled track width and a straight, flat trailing edge. The method includes depositing a magnetic write pole over a substrate and forming a mask structure over the write pole layer. The mask structure includes an end point detection layer that can be removed by reactive ion etching. An ion mill is performed to form a write pole by removing magnetic write pole material that is not covered by the mask layer. A layer of non-magnetic material is deposited and is ion milled to expose the end point detection layer.
    Type: Grant
    Filed: April 25, 2006
    Date of Patent: July 21, 2009
    Assignee: Hitachi Global Storage Technologies Netherlands B.V.
    Inventors: Aron Pentek, Yi Zheng
  • Patent number: 7562436
    Abstract: In one embodiment, a method of forming a CPP sensor comprises providing a sensor having a hard mask disposed on a left side thereof and a right side with a portion of the sensor material removed therefrom, the hard mask having a vertical surface; forming a right dielectric layer including a vertical surface disposed adjacent the vertical surface of the hard mask; forming a right hard bias layer or right side shields on the right dielectric layer; removing the hard mask to expose the left side of the sensor; forming an electrically conductive layer on the sensor, the electrically conductive layer including a vertical electrically conductive portion disposed adjacent the vertical surface of the right dielectric layer; removing the electrically conductive layer except the vertical electrically conductive portion; removing a portion of the sensor material from the left side of the sensor; forming a left dielectric layer on the left side of the sensor, the left dielectric layer including a vertical surface dispose
    Type: Grant
    Filed: July 29, 2005
    Date of Patent: July 21, 2009
    Assignee: Hitachi Global Storage Technologies Netherlands B.V.
    Inventor: Wipul Pemsiri Jayasekara
  • Patent number: 7555828
    Abstract: A read sensor for a magneto resistive head is formed through the use of a bilayer lift-off mask. According to one embodiment, a release layer is formed on top of a sensor layer. A silicon-containing resist layer is formed over the release layer. The resist layer is patterned according to the desired dimensions of the read sensor. Then, plasma etching, such as oxygen plasma etching, is used to remove the portion of the release layer that is exposed by removal of resist material. The release layer may be etched to undercut the patterned resist layer, or may entirely removed beneath the patterned resist layer to provide a bridge of the resist material. In either case, isotropic plasma etching, anisotropic plasma etching, or some combination thereof may be applied.
    Type: Grant
    Filed: December 2, 2002
    Date of Patent: July 7, 2009
    Assignee: Hitachi Global Storage Technologies Netherlands B.V.
    Inventors: Gregory Breyta, Mark Whitney Hart, Bulent Nihat Kurdi, Dennis Richard McKean, Alfred Floyd Renaldo, Douglas Johnson Werner
  • Patent number: 7552524
    Abstract: A method for preventing TMR (tunnel magneto-resistance) MRR (magneto-resistance resistance) drop of a slider, comprises steps of: positioning a row bar constructed by a plurality of slider structural bodies on a tray, each slider body having a pole tip with a TMR element; loading the tray into a processing chamber and evacuating the processing chamber to a preset pressure; introducing a processing gas containing oxygen gas into the processing chamber; and exposing the slider structural bodies to an etching means in the atmosphere of the processing gas to oxidize a surface of the TMR element to form an oxidation layer thereon. The invention also discloses a method for forming micro-texture on a surface of slider in same process, and a method for forming such a slider.
    Type: Grant
    Filed: May 16, 2006
    Date of Patent: June 30, 2009
    Assignee: Sae Magnetics (H.K.) Ltd.
    Inventors: Hongtao Ma, Hongxin Fang, Baohua Chen
  • Patent number: 7552523
    Abstract: A method and system for manufacturing a perpendicular magnetic recording transducer by a process that includes plating is described. The method and system include forming a chemical mechanical planarization (CMP) uniformity structure around a perpendicular magnetic recording pole. The CMP uniformity structure has a height substantially equal to a desired pole height. The method and system also include fabricating an insulator on the CMP uniformity structure and performing a CMP to remove a portion of the insulator. The CMP exposes a portion of the perpendicular magnetic recording pole and planarizes an exposed surface of the perpendicular magnetic recording transducer.
    Type: Grant
    Filed: July 1, 2005
    Date of Patent: June 30, 2009
    Assignee: Western Digital (Fremont), LLC
    Inventors: Li He, Jun Liu, Danning Yang, Yining Hu
  • Patent number: 7549213
    Abstract: A method for independently controlling track width and bevel angle of a write pole tip having a P3 pole tip for perpendicular recording. The method includes establishing the track width in a portion of the P3 layer material. A portion of this portion having the established track width is protected by providing a temporary masking material to make a protected portion. At least one unprotected portion is left exposed to be shaped. This unprotected portion is then beveled to produce at least one beveled portion having a bevel angle. The protected portion produces a rectangular portion which together with the beveled portion produce a hexagonal pole tip. Also a magnetic head having a hexagonal pole tip, and a disk drive having a magnetic head having a hexagonal pole tip.
    Type: Grant
    Filed: January 12, 2005
    Date of Patent: June 23, 2009
    Assignee: Hitachi Global Storage Technologies Netherlands B.V.
    Inventors: Yimin Hsu, Jyh-Shuey Lo
  • Publication number: 20090151151
    Abstract: Methods of fabricating magnetic read heads are provided which reduce the width of the scratch exposure region of a read head. During normal fabrication processes, a read head is formed with a first shield, a read element formed on the first shield, and hard bias layers formed on either side of the read element. The width of the read elements and the hard bias layers define an initial scratch exposure region. According to embodiments herein, a mask structure is formed to protect the read element and first portions of the hard bias layers proximate to the read element. A removal process is then performed to remove second portions of the hard bias layers that are not protected by the mask structure, which defines a final scratch exposure region that is smaller than the initial scratch exposure region.
    Type: Application
    Filed: December 16, 2007
    Publication date: June 18, 2009
    Inventors: David P. Druist, Mohamad T. Krounbi, David J. Seagle
  • Publication number: 20090144966
    Abstract: A method for manufacturing a perpendicular magnetic write head having a trailing shield and with a tapered step. The method includes forming a write pole with a non-magnetic trailing gap and first and second non-magnetic side gap layers. A mask is formed having an opening over a portion of the write pole that is configured to define a non-magnetic bump. A non-magnetic bump material is deposited into the opening in a manner that defines a non-magnetic bump having a tapered front edge. A magnetic wrap around shield can then be formed over the non-magnetic bump, so that the bump forms a tapered stepped feature on the wrap-around magnetic shield. The bump location can be controlled by an electric lapping guide, which is defined to be aligned to the bump front edge.
    Type: Application
    Filed: December 5, 2007
    Publication date: June 11, 2009
    Inventor: Yi Zheng
  • Patent number: 7536776
    Abstract: A fabrication method for thin film magnetic heads, comprises, forming a Current Perpendicular to a Plane (CPP) sensor film over a lower shield and a first chemical mechanical polishing (CMP) stop film over the CPP sensor film, etching the CPP sensor film and forming a track width on the CPP sensor film, and covering at least the etching section of the CPP sensor film with an insulating film. The method further comprises forming a CMP dummy film over the insulating film and a second CMP stop film over the CMP dummy film, exposing the first CMP stop film, and removing the first CMP stop film and the second CMP stop film by oxygen reactive ion etching (RIE) and the CMP dummy film by fluorine RIE, and forming an upper shield film over the insulating film and over the CPP sensor film.
    Type: Grant
    Filed: June 13, 2006
    Date of Patent: May 26, 2009
    Assignee: Hitachi Global Storage Technologies Netherlands B.V.
    Inventors: Nobuo Yoshida, Taku Shintani, Hisako Takei
  • Patent number: 7536775
    Abstract: A method for sample preparation. The method includes mechanically polishing portions of an insulating layer over a main pole of a recording head embedded within a sample structure. The insulating layer is polished top down in planar layers perpendicular to an air bearing surface adjoining the main pole. The method also includes selectively wet etching the remaining portions of the insulating layer to expose the main pole, wherein the insulating layer surrounds the main pole. Etching is made without damaging the main pole.
    Type: Grant
    Filed: January 6, 2005
    Date of Patent: May 26, 2009
    Assignee: Hitachi Global Storage Technologies Netherlands B.V.
    Inventors: Phillip J. Peterson, Monica L. Vargas
  • Patent number: 7536777
    Abstract: Methods and structures for the fabrication of perpendicular thin film heads are disclosed. Prior to the deposition of shield structures, capped seed layers having a dual layer structure are utilized, improving photo resist adhesion and plated shield adhesion, without the need to deposit, then remove, traditional inorganic anti-reflection coatings prior to shield plating.
    Type: Grant
    Filed: November 10, 2006
    Date of Patent: May 26, 2009
    Assignee: Hitachi Global Storage Technologies Netherlands B.V.
    Inventors: Hieu Lam, Patrick Rush Webb, Yi Zheng
  • Patent number: 7536778
    Abstract: A method of fabrication is disclosed for a slider having sites for fabrication of a continuous coil having a set of front coils and a set of back coils and a center tab, where the slider includes underpass leads.
    Type: Grant
    Filed: September 5, 2007
    Date of Patent: May 26, 2009
    Assignee: Hitachi Global Storage Technologies Netherlands B.V.
    Inventors: Amanda Baer, Tsung Yuan Chen, David Patrick Druist, Edward Hin Pong Lee
  • Patent number: 7533456
    Abstract: A free layer functions such that a magnetization direction changes depending on an external magnetic field, and is made up of a multilayer structure including a first Heusler alloy layer, and a fixed magnetization layer takes a form wherein an inner pin layer and an outer pin layer are stacked one upon another with a nonmagnetic intermediated layer sandwiched between them. The inner pin layer is made up of a multilayer structure including a second Heusler alloy layer. The first and second Heusler alloy layers are each formed by a co-sputtering technique using a split target split into at least two sub-targets in such a way as to constitute a Heusler alloy layer composition. When the Heusler alloy layer is formed, therefore, it is possible to bring up a film-deposition rate, improve productivity, and improve the performance of the device.
    Type: Grant
    Filed: June 1, 2007
    Date of Patent: May 19, 2009
    Assignee: TDK Corporation
    Inventors: Yoshihiro Tsuchiya, Tomohito Mizuno, Koji Shimazawa
  • Patent number: 7530159
    Abstract: A method is presented for fabricating a write pole for a magnetic recording head, wherein a photoresist layer is formed on a wafer stack. A target P2 pole configuration is provided, and a photomask having a pattern is produced, and the pattern is transferred to the photoresist to create a patterned photoresist having at least one photoresist channel. A layer of photoresist channel shrinking film used to produce a reduced width photoresist channel in an expanded photoresist. A P2 pole tip is formed within the reduced width photoresist channel. The P2 pole tip is then compared to the target P2 pole configuration to identify distortions, which are then used to produce a distortion-corrected photomask. The distortion-corrected photomask is then used to produce a distortion-corrected expanded photoresist, which is then used to produce a distortion-corrected P2 pole tip.
    Type: Grant
    Filed: June 29, 2006
    Date of Patent: May 12, 2009
    Assignee: Hitachi Global Storage Technologies Netherlands B.V.
    Inventors: Kim Y. Lee, Jyh-Shury Lo
  • Patent number: 7530160
    Abstract: A method for manufacturing a magnetoresistive sensor having improved free layer biasing and track width control. The method includes forming a ferromagnetic pinned layer, and depositing a ferromagnetic film thereover. A layer of Ta is deposited over the ferromagnetic film and a mask is formed over an active sensor area. A reactive ion etch process is performed to remove selected portions of said Ta layer. An etch is then performed to remove selected portions of the ferromagnetic film in unmasked areas and a ferromagnetic refill material is deposited.
    Type: Grant
    Filed: September 5, 2007
    Date of Patent: May 12, 2009
    Assignee: Hitachi Global Storage Technologies Netherlands B.V.
    Inventor: Hardayal Singh Gill
  • Patent number: 7526856
    Abstract: A method for fabricating sliders (magnetic heads) with a recessed surface around a magnetic feature such as the active components of the write head on the air-bearing surface (ABS) is described. An embodiment of the method applies a positive photoresist to the exposed ABS surface, a magnetic field is applied, then liquid ferrofluid is applied on top of the photoresist. The pole pieces around the write gap will interact with the applied magnetic field so that the field gradient is highest around the write gap and the mobile ferrofluid will preferentially collect in the areas of the surface having the highest magnetic field gradient. The opaque magnetic particles in the ferrofluid form an optical ferrofluid mask over the photoresist around the write gap. The unmasked surface of the slider is milled which results in the recession of material around the write gap.
    Type: Grant
    Filed: March 27, 2006
    Date of Patent: May 5, 2009
    Assignee: Hitachi Global Technologies Netherlands B.V.
    Inventor: Vladimir R. Nikitin
  • Patent number: 7523543
    Abstract: A magnetic memory device may include a digit line on a substrate, a first insulating layer on the digit line, and a magnetic tunnel junction memory cell on the first insulating layer so that the first insulating layer is between the digit line and the magnetic tunnel junction memory cell. A second insulating layer may be provided on the magnetic tunnel junction memory cell, wherein the second insulating layer has a hole therein exposing portions of the magnetic tunnel junction memory cell. A bit line may be provided on the second insulating layer and on portions of the magnetic tunnel junction memory cell exposed by the hole in the second insulating layer, and ferromagnetic spacers may be provided on sidewalls of at least one of the digit line and/or the bit line. Related methods are also discussed.
    Type: Grant
    Filed: July 12, 2007
    Date of Patent: April 28, 2009
    Assignee: Samsung Electronics Co., Ltd.
    Inventors: Kyung-Rae Byun, Sung-Lae Cho
  • Patent number: 7520048
    Abstract: A giant magnetoresistive (GMR) head is formed to include a recess in an overcoat layer that reduces stress on the poles. The process includes depositing a seed layer over the overcoat layer prior to plating a metal mask layer with an opening where the recess is to be formed, wet chemical etching the seed layer through the opening in the mask layer and performing an ion milling process to remove any remaining traces of the seed layer. With the seed layer completely removed, a trench having smooth sidewalls and bottom is etched in the overcast layer by a reactive ion etch (RIE) process. The saw that is used to separate the head elements in the wafer can be passed through the clean trench without contacting the overcoat layer, thereby avoiding the chipping and cracking that might otherwise result from the use of a silicon dioxide or silicon nitride overcoat layer.
    Type: Grant
    Filed: May 31, 2007
    Date of Patent: April 21, 2009
    Assignee: Hitachi Global Storage Technologies Netherlands B.V.
    Inventors: Yunxiao Gao, Aron Pentek, Alan J. Tam, Sue Siyang Zhang
  • Patent number: 7516538
    Abstract: A method of manufacturing a magnetic head is disclosed. The steps of manufacture include the formation of an underlying layer made of a material whose etching rate of ion beam etching is higher than that of a magnetic alloy used to make a pole layer, and the formation of a magnetic layer, which includes a portion of the magnetic layer to be etched that will be formed into a track width defining portion by making its side surfaces sloped through etching. The magnetic layer is formed such that the portion to be etched is disposed on the underlying layer. The side surfaces of the portion to be etched by the ion beam etching are etched so that the magnetic layer is formed into the pole layer and so that the end face of the track width defining portion located in the medium facing surface has a width that decreases with decreasing distance from the substrate.
    Type: Grant
    Filed: September 20, 2004
    Date of Patent: April 14, 2009
    Assignee: Headway Technologies, Inc.
    Inventors: Yoshitaka Sasaki, Hiroyuki Itoh, Shigeki Tanemura, Hironori Araki
  • Patent number: 7509729
    Abstract: A method for making a write pole in a perpendicular magnetic recording write head uses a metal mask to pattern the primary resist and only ion milling during the subsequent patterning steps. A layer of primary resist is deposited over the magnetic write pole material and a metal mask layer is deposited on the primary resist layer. An imaging resist layer is formed on the metal mask layer and lithographically patterned generally in the desired shape of the write pole. Ion milling without a reactive gas is then performed over the imaging resist pattern to pattern the underlying metal mask layer, which is then used as the mask to define the shape of the primary resist pattern. Ion milling with oxygen is then performed over the metal mask pattern to pattern the underlying primary resist. Ion milling without a reactive gas is then performed over the primary resist pattern to form the underlying write pole.
    Type: Grant
    Filed: April 25, 2006
    Date of Patent: March 31, 2009
    Assignee: Hitachi Global Storage Technologies Netherlands B.V.
    Inventors: Donald G. Allen, Amanda Baer, Michael Feldbaum, Hung-Chin Guthrie, Aron Pentek
  • Patent number: RE40951
    Abstract: A dry etching method in which a plasma of an etching gas is generated and a magnetic material is dry-etched using a mask material made of a non-organic material, wherein an alcohol having at least one hydroxyl group is used as the etching gas. The alcohol used as the etching gas has one hydroxyl group such as an alcohol selected from the group including methanol (CH3OH), ethanol (C2H5OH) and propanol (C3H7OH).
    Type: Grant
    Filed: June 12, 2008
    Date of Patent: November 10, 2009
    Assignee: Canon Anelva Corporation
    Inventors: Yoshimitsu Kodaira, Taichi Hiromi