Discharge Device Load With Fluent Material Supply To The Discharge Space Patents (Class 315/111.01)
  • Patent number: 8563924
    Abstract: An ionization device comprises: a plasma source configured to generate a plasma. The plasma comprises light, plasma ions and plasma electrons. The plasma source comprises an aperture disposed such that at least part of the light passes through the aperture and is incident on a gas sample. The ionization device further comprises an ionization region; and a plasma deflection device comprising a plurality of electrodes configured to establish an electric field, wherein the electric field substantially prevents the plasma ions from entering the ionization region.
    Type: Grant
    Filed: June 28, 2011
    Date of Patent: October 22, 2013
    Assignee: Agilent Technologies, Inc.
    Inventors: James Edward Cooley, Sameer Kothari
  • Patent number: 8536539
    Abstract: An ion beam generator includes a discharge tank for generating plasma that includes ions. A lead-out electrode has an annular grid portion provided with openings for leading out the ions generated in the discharge tank, while accelerating the generated ions as an annular ion beam. A deflecting electrode deflects the annular ion beam, which is led out of the lead-out electrode, in an annular center direction.
    Type: Grant
    Filed: November 30, 2010
    Date of Patent: September 17, 2013
    Assignee: Canon Anelva Corporation
    Inventors: Hirohisa Hirayanagi, Ayumu Miyoshi, Einstein Noel Abarra
  • Patent number: 8530832
    Abstract: Improved apparatuses and methods are provided for ionizing samples and analyzing the samples with mass spectrometry.
    Type: Grant
    Filed: October 3, 2011
    Date of Patent: September 10, 2013
    Assignee: Agilent Technologies, Inc.
    Inventors: Alexander Mordehai, Mark H. Werlich, Craig P. Love, James L. Bertsch
  • Patent number: 8525412
    Abstract: A plasma lamp system is described with the capability to tune the resonant frequency of the resonator of the plasma lamp system after the manufacturing process has been completed. The tuning method developed allows a simple low-cost approach to continuously tune the resonant frequency and set the desired frequency to an ISM (Industrial Scientific Medical) band or set the resonant frequency to optimize the performance of the system. The tuning ability of the resonator relaxes the tolerance required for the dimensions of the resonator reducing the manufacturing cost and improving the manufacturing yield of the plasma lamp.
    Type: Grant
    Filed: February 1, 2012
    Date of Patent: September 3, 2013
    Assignee: Topanga Technologies, Inc.
    Inventors: Frederick M. Espiau, Erik H. M. Lundin
  • Patent number: 8519355
    Abstract: A charged particle source comprises at least one gas inlet configured to supply gas particles, at least one tip having a tip apex being biased to provide an electrical field for generating charged particles, and at least one ionization area to which gas particles are supplied. The gas particles are ionized in the ionization area due to the electrical field. Additionally, the charged particle source comprises at least one first electrode configured to accelerate charged particles and at least one light emitting device providing a light beam. The light beam is focused to a focus point in the ionization area, specifically, to a focus volume such that the ionization area is at least partly positioned in the focus volume. The ionization area is arranged between the tip apex and the first electrode. The distance between the ionization area and the tip apex may be from 0.1 nm to 1 nm.
    Type: Grant
    Filed: October 5, 2012
    Date of Patent: August 27, 2013
    Assignee: Carl Zeiss Microscopy GmbH
    Inventors: Wolfram Buhler, Matthias Langer, Xiong Liu
  • Patent number: 8487536
    Abstract: A dense plasma focus device is disclosed as having an anode with a non-constant radius and a cathode coupled to the anode, the cathode also having a non-constant radius. The anode and/or the cathode may be tapered. In addition, a ratio of the non-constant radius of the anode and the non-constant radius of the cathode may be held constant along the length of the dense plasma focus device in order to maintain constant inductance. Alternatively, the inductance may be varied by varying the ratio of the anode and cathode radii along the length of the dense plasma focus device.
    Type: Grant
    Filed: May 29, 2009
    Date of Patent: July 16, 2013
    Assignee: National Security Technologies, LLC
    Inventors: Edward Christopher Hagen, Bernard Timothy Meehan, III
  • Patent number: 8481965
    Abstract: The process of the present application facilitates the production of electric energy by the deliberate extraction of electrons from atoms and molecules of a gas, vapor, liquid, particulate solid, or any other form of matter that can be passed along the surface or through the electron extraction unit. The extracted electrons are captured, collected and controlled or regulated for distribution as electric energy. It is an energy efficient process for the extraction and capture of electrons for the production of electric energy with positive atomic or molecular ions as byproducts. The product ions can then be confined in a coherent beam or restricted to a magnetic enclosure or by other confinement methods, expelled to the atmosphere, another environment or to ground, or modified into useful molecules. These results are accomplished by the forcible extraction and capture of electrons from the object particles by electrically charged particles in a strong electric field.
    Type: Grant
    Filed: February 8, 2011
    Date of Patent: July 9, 2013
    Inventor: Eugene B. Pamfiloff
  • Patent number: 8482206
    Abstract: A new device based on very short pulsed discharges, generating plasmas balls and plumes over very long distances (up to several meters). These plasma balls travel in a dielectric guide at the end of which there is generation of an apparent plasma plume like zone, with a shape and intensity dependent on the discharge repetition rate. A secondary mixture plasma can be produced close to a given surface by adding other gas fluxes in the main gas stream. The plasma balls can be generated in gases at a repetition rate in the range from single shot to multi-kilohertz.
    Type: Grant
    Filed: October 16, 2008
    Date of Patent: July 9, 2013
    Assignees: Centre National de la Recherche Scientifique (CNRS), Universite D'Orleans
    Inventors: Jean-Michel Pouvesle, Christophe Cachoncinlle, Raymond Viladrosa, Ahmed Khacef, Eric Robert, Sébastien Dozias
  • Patent number: 8481980
    Abstract: An ion beam machining and observation method relevant to a technique of cross sectional observation of an electronic component, through which a sample is machined by using an ion beam and a charged particle beam processor capable of reducing the time it takes to fill up a processed hole with a high degree of flatness at the filled area. The observation device is capable of switching the kind of gas ion beam used for machining a sample with the kind of a gas ion beam used for observing the sample. To implement the switch between the kind of a gas ion beam used for sample machining and the kind of a gas ion beam used for sample observation, at least two gas introduction systems are used, each system having a gas cylinder a gas tube, a gas volume control valve, and a stop valve.
    Type: Grant
    Filed: April 23, 2008
    Date of Patent: July 9, 2013
    Assignee: Hitachi High-Technologies Corporation
    Inventors: Hiroyasu Shichi, Satoshi Tomimatsu, Kaoru Umemura, Noriyuki Kaneoka, Koji Ishiguro
  • Patent number: 8439649
    Abstract: A sputter ion pump including an evacuateable envelope having a chamber, first and second cathodes and an anode disposed in the chamber. The anode can have an outer layer of a non-evaporable getter (NEG) material so as to permit NEG pumping of gases by the anode. In another aspect of the invention, the anode can be formed with spaced-apart first and second sheet portions disposed in juxtaposition to each other and having a plurality of holes extending through the sheets for forming a plurality of anode cells.
    Type: Grant
    Filed: November 2, 2009
    Date of Patent: May 14, 2013
    Assignee: Duniway Stockroom Corp.
    Inventors: Sherman Lloyd Rutherford, Jeffrey Richard Winkler
  • Patent number: 8415884
    Abstract: A surface wave plasma (SWP) source is described. The SWP source comprises an electromagnetic (EM) wave launcher configured to couple EM energy in a desired EM wave mode to a plasma by generating a surface wave on a plasma surface of the EM wave launcher adjacent the plasma. The EM wave launcher comprises a slot antenna having a plurality of slots. The SWP source further comprises a first recess configuration formed in the plasma surface, wherein the first recess configuration is substantially aligned with a first arrangement of slots in the plurality of slots, and a second recess configuration formed in the plasma surface, wherein the second recess configuration is either partly aligned with a second arrangement of slots in the plurality of slots or not aligned with the second arrangement of slots in the plurality of slots. A power coupling system is coupled to the EM wave launcher and configured to provide the EM energy to the EM wave launcher for forming the plasma.
    Type: Grant
    Filed: September 8, 2009
    Date of Patent: April 9, 2013
    Assignee: Tokyo Electron Limited
    Inventors: Lee Chen, Jianping Zhao, Ronald V. Bravenec, Merritt Funk
  • Patent number: 8338796
    Abstract: An electron beam emitter includes an electron generator for generating electrons. The electron generator can have a housing containing at least one electron source for generating the electrons. The at least one electron source has a width. The electron generator housing can have an electron permeable region spaced from the at least one electron source for allowing extraction of the electrons from the electron generator housing. The electron permeable region can include a series of narrow elongate slots and ribs formed in the electron generator housing and extending laterally beyond the width of the at least one electron source. The electron permeable region can be configured and positioned relative to the at least one electron source for laterally spreading the electrons that are generated by the at least one electron source.
    Type: Grant
    Filed: May 20, 2009
    Date of Patent: December 25, 2012
    Assignee: Hitachi Zosen Corporation
    Inventors: Steven Raymond Walther, Michael L. Bufano, Gerald M. Friedman
  • Patent number: 8324591
    Abstract: A method for generating a pulsed flux of energetic particles comprises the following steps: —initiating an ion plasma at a first electrode (111) in a vacuum chamber (110) and allowing said plasma to develop towards a second electrode (112) in said vacuum chamber, —at a time at which said ion plasma is in a transitional state with a space distribution of ions or electrons at a distance from said second electrode, applying between said electrodes a short high voltage pulse so as to accelerate said distributed ions or electrons towards said second electrode, whereby a high-energy flux of charged particles is generated while overcoming the space charge current limit of a conventional vacuum diode, and —generating said energetic particles at said second electrode (112). A particle source is also disclosed. Application in particular to ultra-short pulse neutron generation.
    Type: Grant
    Filed: July 25, 2007
    Date of Patent: December 4, 2012
    Assignee: Sage Innovations Inc.
    Inventor: Peter Choi
  • Patent number: 8324592
    Abstract: Multiple control electrodes are provided asymmetrically within the plasma chamber of an ion source at respective positions along the length of the plasma chamber. Biasing the control electrodes selectively can selectively enhance the ion extraction current at adjacent positions along the length of the extraction slit. A method of generating an ion beam is disclosed in which the strengths of the transverse electric fields at different locations along the length of the plasma chamber are controlled to modify the ion beam linear current density profile along the length of the slit. The method is used for controlling the uniformity of a ribbon beam.
    Type: Grant
    Filed: November 2, 2010
    Date of Patent: December 4, 2012
    Assignee: Twin Creeks Technologies, Inc.
    Inventors: Geoffrey Ryding, Drew Arnold, William H. Park, Ronald Horner
  • Publication number: 20120286664
    Abstract: A plasma lamp system is described with the capability to tune the resonant frequency of the resonator of the plasma lamp system after the manufacturing process has been completed. The tuning method developed allows a simple low-cost approach to continuously tune the resonant frequency and set the desired frequency to an ISM (Industrial Scientific Medical) band or set the resonant frequency to optimize the performance of the system. The tuning ability of the resonator relaxes the tolerance required for the dimensions of the resonator reducing the manufacturing cost and improving the manufacturing yield of the plasma lamp.
    Type: Application
    Filed: February 1, 2012
    Publication date: November 15, 2012
    Applicant: Topanga Technologies, Inc.
    Inventors: FREDERICK M. ESPIAU, Erik H.M. Lundin
  • Patent number: 8304744
    Abstract: A closed drift ion source is provided, having an anode that serves as both the center magnetic pole and as the electrical anode. The anode has an insulating material cap that produces a closed drift region to further increase the electrical impedance of the source. The ion source can be configured as a round, conventional ion source for space thruster applications or as a long, linear ion source for uniformly treating large area substrates. A particularly useful implementation uses the present invention as an anode for a magnetron sputter process.
    Type: Grant
    Filed: October 19, 2007
    Date of Patent: November 6, 2012
    Assignee: General Plasma, Inc.
    Inventor: John Eric Madocks
  • Patent number: 8294120
    Abstract: The process of the present application differs substantially from the prior art, as it facilitates the deliberate extraction of electrons from atoms and molecules during the production of positive ions, as compared with occasionally and accidentally knocking them away. It is an energy efficient process for the extraction and capture of electrons, production of positive ions and negative ions, the construction of molecules and the selective decomposition of molecules. These results are accomplished by the forcible extraction of electrons from the object molecules and atoms. The present process is superior to any other intended for the production of positive ions and the composition and the decomposition of molecules, because it not only simplifies the process, but it also speeds the process, allowing a continuous stream or beam of particles to be so converted to positive ions.
    Type: Grant
    Filed: July 26, 2010
    Date of Patent: October 23, 2012
    Inventor: Eugene B. Pamfiloff
  • Patent number: 8247784
    Abstract: A novel ion source for ambient mass spectrometry (switched ferroelectric plasma ionizer or “SwiFerr”), which utilizes the ambient pressure plasma resulting from a sample of barium titanate [001] whose polarization is switched by an audio frequency electric field. High yields of both anions and cations are produced by the source and detected using an ion trap mass spectrometer. Protonated amines and deprotonated volatile acid species, respectively, are detected in the observed mass spectra. Aerodynamic sampling is employed to analyze powders of drug tablets of loperamide and ibuprofen. A peak corresponding to the active pharmaceutical ingredient for each drug is observed in the mass spectra. Pyridine is detected at concentrations in the low part-per-million range in air. The low power consumption of the source is consistent with incorporation into field portable instrumentation for detection of hazardous materials and trace substances in a variety of different applications.
    Type: Grant
    Filed: July 29, 2010
    Date of Patent: August 21, 2012
    Assignee: California Institute of Technology
    Inventors: Evan L. Neidholdt, Jesse L. Beauchamp
  • Patent number: 8242459
    Abstract: The current invention involves a desorption corona beam ionization source/device for analyzing samples under atmospheric pressure without sample pretreatment. It includes a gas source, a gas flow tube, a gas flow heater, a metal tube, a DC power supply and a sample support/holder for placing the samples. A visible corona beam is formed at a sharply pointed tip at the exit of the metal tube when a stream of inert gas flows through the metal tube that is applied with a high DC voltage. The gas is heated for desorbing the analyte from solid samples and the desorbed species are ionized by the energized particles embedded in the corona beam. The ions formed are then transferred through an adjacent inlet into a mass spectrometer or other devices capable of analyzing ions. Visibility of the corona beam in the current invention greatly facilitates pinpointing a sampling area on the analyte and also makes profiling of sample surfaces possible.
    Type: Grant
    Filed: December 29, 2009
    Date of Patent: August 14, 2012
    Assignee: Shimadzu Corporation
    Inventors: Wenjian Sun, Xiaohui Yang, Li Ding
  • Patent number: 8232730
    Abstract: An electrodeless plasma lamp having a bulb containing a fill that forms a light-emitting plasma is described. The lamp includes a power amplifier to provide radio frequency power to the fill at a frequency in the range of about 50 MHz to 10 GHz and the power amplifier is configured to operate in at least two classes of operation. Control electronics of the lamp is configured to change the class of operation of the power amplifier during operation of the plasma lamp. For example, the power amplifier may be configured to operate as a class A/B amplifier during at least a first mode of operation and a class C amplifier during at least a second mode of operation.
    Type: Grant
    Filed: August 3, 2010
    Date of Patent: July 31, 2012
    Assignee: Luxim Corporation
    Inventors: Marc DeVincentis, Paul Ralston, Gregg Hollingsworth, Jae Won Kim
  • Patent number: 8212228
    Abstract: An extreme ultra violet light source apparatus prevents debris staying and accumulating within a chamber from contaminating the chamber and deteriorating the performance of an important optical component. The extreme ultra violet light source apparatus includes: a chamber in which extreme ultra violet light is generated; a driver laser for applying a laser beam to a target supplied to a predetermined position within the chamber to generate plasma; a collector mirror provided within the chamber, for collecting and outputting the extreme ultra violet light radiated from the plasma; an exhaust path communicating with the chamber and connected to an exhausting device, for maintaining an interior of the chamber at a certain pressure; a catching chamber provided in the exhaust path, for catching debris generated from the plasma; and a collecting unit for collecting the caught debris out of the chamber.
    Type: Grant
    Filed: March 9, 2009
    Date of Patent: July 3, 2012
    Assignees: Komatsu Ltd., Gigaphoton Inc.
    Inventors: Tamotsu Abe, Toshihiro Nishisaka, Hiroshi Someya, Masato Moriya, Takeshi Asayama, Hideo Hoshino, Hakaru Mizoguchi
  • Patent number: 8205428
    Abstract: A standard 4-pole electric motor stator with capacitive plates in-line with the magnetic poles, but electrically 90° out of phase, produces two Lorentz force geometries 90° out of phase with each other (i.e., vertical, horizontal). An alternating source electrically rotates this pair of Lorentz geometries producing a propagating electromagnetic wave at the source frequency within the vacant internal cavity. Any charged particle within the cavity and along its axis will be accelerated or decelerated from an initial velocity via the Lorentz force. The rotating geometry provides for the coupling of the Lorentz force through a current loop and diamagnetism, providing acceleration and deceleration of non-charged particles. The force coupling is dependent upon the material's electromagnetic properties, the frequencies generated by the capacitive stator, and the velocity of the particles within the capacitive stator's influence.
    Type: Grant
    Filed: February 5, 2009
    Date of Patent: June 26, 2012
    Assignee: Lockheed Martin Corporation
    Inventor: Dale W. Boren
  • Publication number: 20120146507
    Abstract: An extreme ultraviolet light generation system used with a laser apparatus may be provided, and the extreme ultraviolet light generation system may include: a chamber including at least one window for at least one laser beam and a target supply unit for supplying a target material into the chamber; and at least one polarization control unit, provided on a laser beam path, for controlling a polarization state of the at least one laser beam.
    Type: Application
    Filed: March 25, 2011
    Publication date: June 14, 2012
    Inventors: Tatsuya Yanagida, Osamu Wakabayashi
  • Patent number: 8154206
    Abstract: There is provided a small-sized portable microwave plasma generator capable of generating plasma at atmospheric pressure with low electric power including a coaxial cable, an outer conductor, a connection conductor, and a connection member. The coaxial cable includes a first inner conductor and a dielectric material encircling the first inner conductor. The outer conductor encircles the coaxial cable. The connection conductor includes at least one gas inlet tube. The connection conductor electrically connects between the first inner conductor and the outer conductor at one end of the coaxial cable. The connection member includes a second inner conductor passing through the outer conductor and then connecting to the first inner conductor.
    Type: Grant
    Filed: February 4, 2009
    Date of Patent: April 10, 2012
    Assignees: Postech Foundation, Postech Academy Industry Foundation
    Inventors: Jun Choi, Felipe Iza, Jae Koo Lee
  • Patent number: 8139287
    Abstract: Apparatus and methods are disclosed for amplifying an energy beam such as a beam of laser light or a charged particle beam. An exemplary method includes providing a liner having a first end, a second end, a liner axis, and a lumen extending along the liner axis and being bound by interior reflective walls of the liner. An energy beam is introduced into the first end of the liner. The beam propagates through the lumen from the first end to the second end as the beam reflects multiple times from the interior walls of the liner. Meanwhile, an implosive force is applied to the liner. The implosive force compresses the interior walls implosively toward the liner axis in a manner that amplifies the beam as the beam propagates through the lumen of the imploding liner. The amplified energy beam can be used for any of various purposes including ignition of a fusion target.
    Type: Grant
    Filed: January 9, 2006
    Date of Patent: March 20, 2012
    Assignee: Board of Regents of the Nevada System of Higher Education, on behalf of the University of Nevada, Reno
    Inventor: Friedwardt M. Winterberg
  • Patent number: 8102123
    Abstract: Described is an electrode-less plasma lamp comprising a gas-fill vessel, a gas-fill contained within the gas-fill vessel, an RF electromagnetic radiation source, an RF electromagnetic resonator, an output probe that couples RF energy from the RF electromagnetic resonator to the gas-fill vessel, an input probe that couples RF energy from the RF electromagnetic radiation source to the resonator, and a grounding strap that holds a metal veneer surrounding the resonator and a portion of the gas-fill vessel at RF ground. Also described are many variations of the electrode-less plasma lamp, non-limiting examples of which include embodiments that employ other probes in a Dielectric Resonant Oscillator to drive the lamp, a lamp employing more than one resonator per gas-fill vessel, and many methods of improving light-harvesting, including raising the gas-fill vessel away from the resonator via a coaxial transmission line, and collecting light with an optical reflector.
    Type: Grant
    Filed: October 31, 2007
    Date of Patent: January 24, 2012
    Assignee: Topanga Technologies, Inc.
    Inventors: Frederick Matthew Espiau, Mehran Matloubian
  • Publication number: 20110266428
    Abstract: Apparatuses and methods relating to generating an electric field are disclosed. An electric field generator may include a semiconductive material configured in a physical shape substantially different from a shape of an electric field to be generated thereby. The electric field is generated when a voltage drop exists across the semiconductive material. A method for generating an electric field may include applying a voltage to a shaped semiconductive material to generate a complex, substantially nonlinear electric field. The shape of the complex, substantially nonlinear electric field may be configured for directing charged particles to a desired location. Other apparatuses and methods are disclosed.
    Type: Application
    Filed: April 29, 2010
    Publication date: November 3, 2011
    Applicant: BATTELLE ENERGY ALLIANCE, LLC
    Inventors: Jill R. Scott, Timothy R. McJunkin, Paul L. Tremblay
  • Patent number: 8039819
    Abstract: A device and a method for creating a spatial dose distribution in a medium volume (22) are described. A laser system produces laser pulses (12) with a pulse length shorter than 200 fs (femtoseconds) and is capable to be focused to peak intensities greater than 10^18 W/cm^2 (watts per centimeter squared). An electron source (18) is capable of releasing a high-energy electron pulse (20), in particular the electrons having an energy greater than 100 MeV, upon irradiation with said laser pulses (12) propagating into the medium volume (22). The light paths (52, 56,58) of at least some of the laser pulses (12) are adjustable in such a way that high-energy electron pulses (20) are emitted from the irradiated at least one electron source on different trajectories (20,28,60,62) through the medium volume (22) thereby depositing their dose in the medium volume (22) according to a provided pattern.
    Type: Grant
    Filed: July 20, 2006
    Date of Patent: October 18, 2011
    Assignees: Ecole Polytechnique, Deutsches Krebsforschungszentrum
    Inventors: Jérôme Faure, Yannick Glinec, Victor Malka, Thomas Fuchs, Hanitra Szymanowski, Uwe Oelfke
  • Patent number: 8030849
    Abstract: A device and a method for generating a truly pulsed plasma flow are disclosed. The device includes a cathode assembly comprising a cathode and a cathode holder, an anode, and two or more intermediate electrodes, the anode and the intermediate electrodes forming a plasma channel expanding toward the anode. The intermediate electrode closest to the cathode may form a plasma chamber around the cathode tip. An extension nozzle forming an extension channel having a tubular insulator along at least a portion of its interior surface is affixed to the anode end of the device. During operation, a voltage is applied between the cathode and the anode and a current is passed through the cathode, the plasma, and the anode. The voltage and current profiles are selected to cause the rapid development of a plasma flow with required characteristics. A substantially uniform temperature and power density distribution of the plasma pulse is achieved in the extension nozzle.
    Type: Grant
    Filed: September 11, 2009
    Date of Patent: October 4, 2011
    Assignee: Plasma Surgical Investments Limited
    Inventor: Nikolay Suslov
  • Patent number: 8024917
    Abstract: A multi-functional power supply system for a Hall thruster including a thruster assembly for providing a plasma discharge and a cathode assembly for providing electrons. The cathode assembly includes an emitter, a keeper with a current limiting device, and a heater. A magnetic field source is operatively associated with the cathode assembly for generating a magnetic field to control the discharge. A plasma discharge circuit creates a plasma and accelerates the plasma to produce thrust. A power supply is connected to the keeper and the plasma discharge circuit and is connected to the heater through a switching device responsive to a predetermined condition for interrupting the power to the heater and simultaneously enabling the power supply to deliver power to the keeper and the plasma discharge circuit to initiate production of thrust.
    Type: Grant
    Filed: January 22, 2004
    Date of Patent: September 27, 2011
    Assignee: Busek Company
    Inventors: Vladimir J. Hruby, Bruce M. Pote, Lawrence Byrne, William Connolly
  • Patent number: 8022362
    Abstract: An ionization device includes an ionization chamber (1) and a charging chamber (20) separately prepared therefrom. The ionization chamber (1) has a discharge electrode (6) and an opposing electrode (10) in an interior (4) of a case having an ionizing gas introducing inlet (14). The opposing electrode (10) has an orifice (8) communicating with outside and formed at a position opposing the tip end of the discharge electrode (6). The charging chamber (20) is arranged adjacent to the orifice (8) side of the ionization chamber (1). An introduction inlet (28) of a charge object introduction portion of the charging chamber (20) is arranged at the position near the exit of the orifice (8). The size of the orifice (8) is set so that the charge object is sucked therein by a negative pressure generated when a gas containing ions is sprayed from the exit of the orifice (8) into the charging chamber (20) and the ionization chamber (1) has a higher pressure than the charging chamber (20).
    Type: Grant
    Filed: December 13, 2007
    Date of Patent: September 20, 2011
    Assignees: Shimadzu Corporation, Osaka Prefecture University Public Corporation
    Inventors: Daiji Okuda, Shigeru Kimoto, Hiroshi Okuda, Motoaki Adachi
  • Publication number: 20110156590
    Abstract: The plasma temperature control apparatus includes a plasma generating section 40 that turns a plasma-generating gas into plasma, and a plasma-generating gas temperature control section 30 that controls the temperature of the plasma-generating gas supplied to the plasma generating section 40. The temperature of the plasma generated in the plasma generating section 40 is controlled by controlling the temperature of the plasma-generating gas.
    Type: Application
    Filed: September 3, 2009
    Publication date: June 30, 2011
    Inventors: Akitoshi Okino, Hidekazu Miyahara
  • Patent number: 7939810
    Abstract: An electrically conductive heat-blocking plate 11 with an opening 12 for allowing thermions to pass through is provided between a filament 3, whose temperature can be as high as 2000° to 3000° C., and an ionization chamber 2. The heat-blocking plate 11 is thermally connected via an aluminum block 10 to a heater for maintaining the ionization chamber 2 within a range temperature from 200° to 300° C., and also electrically set at a ground potential, which is approximately equal to the potential of the ionization chamber 2. The heat-blocking plate 11 blocks the radiation heat that the filament 3 emits when energized. Thus, the wall of the ionization chamber 2 is prevented from being locally heated to an abnormally high temperature. As a result, the inner space of the ionization chamber 2 is maintained at an approximately uniform temperature, and the noise due to the decomposition of a metallic material by abnormal heating is prevented.
    Type: Grant
    Filed: March 9, 2006
    Date of Patent: May 10, 2011
    Assignee: Shimadzu Corporation
    Inventors: Shuichi Kawana, Manabu Shimomura
  • Patent number: 7910896
    Abstract: A micro discharge device (MDD) ionizer and a method for fabricating the MDD ionizer are disclosed. The MDD ionizer includes a dielectric barrier having a first open end connected to an electrically conductive capillary tube and a second open end connected to a sample collection capillary tube. A circular high voltage electrode can be positioned around the dielectric barrier in close linear proximity to the conductive capillary tube and sealed by a non-conductive epoxy. A plasma discharge can be formed in a flow path through the dielectric barrier when an AC potential is applied between the high voltage electrode and the electrically conductive capillary tube utilizing an electronic controller. Such a plasma discharge in the flow path of the sample achieves soft ionization of gaseous sample molecules. The high pressure region generally occurs in the plasma region (where the ionization occurs). The ions thus are drawn (i.e.
    Type: Grant
    Filed: July 25, 2008
    Date of Patent: March 22, 2011
    Assignee: Honeywell International Inc.
    Inventors: Terry M. Marta, Fouad Nusseibeh, Adam Dewey McBrady, Michael Rhodes
  • Patent number: 7847485
    Abstract: A method and a device for artificially generating and showing an aurora and for generating and changing a true-to-life curtain-shaped discharge light emission by using a simple device. In a pressure-reduced chamber, two electrodes are arranged in the X direction and a third electrode is arranged in the Z direction in such a manner that the two electrodes oppose the third electrode and they are apart from each other. A coil generates a magnetic line of force in the Z direction.
    Type: Grant
    Filed: July 19, 2006
    Date of Patent: December 7, 2010
    Assignee: Iida Home Max Co., Ltd.
    Inventors: Kazuhiko Mori, Shigeyuki Minami, Yuuji Kurose, Ayumu Watanabe, Yasuhiro Ono, Hideyuki Saito
  • Patent number: 7838853
    Abstract: A patterned beam of radiation is projected onto a substrate. A reflective optical element is used to help form the radiation beam from radiation emitted from a plasma region of a plasma source. In the plasma source, a plasma current is generated in the plasma region. To reduce damage to the reflective optical element, a magnetic field is applied in the plasma region with at least a component directed along a direction of the plasma current. This axial magnetic field helps limit the collapse of the Z-pinch region of the plasma. By limiting the collapse, the number of fast ions emitted may be reduced.
    Type: Grant
    Filed: December 14, 2006
    Date of Patent: November 23, 2010
    Assignee: ASML Netherlands B.V.
    Inventors: Vladimir Vitalevitch Ivanov, Vadim Yevgenyevich Banine, Konstantin Nikolaevitch Koshelev
  • Patent number: 7834327
    Abstract: A load circuit device having a self-biasing active load circuit, and a related high voltage power supply configured to bias an optical element in a charged particle beam processing system, such as a gas cluster ion beam (GCIB) processing system. The high voltage power supply comprises a variable voltage supply having a load terminal at a load potential and a reference terminal at a reference potential, and a self-biasing active load circuit connected between the load terminal and the reference terminal, and configured to sustain a variable voltage drop between the load potential and the reference potential while maintaining a substantially constant current.
    Type: Grant
    Filed: September 23, 2008
    Date of Patent: November 16, 2010
    Assignee: TEL Epion Inc.
    Inventor: Kenneth P. Regan
  • Publication number: 20100276611
    Abstract: An apparatus for producing electromagnetic radiation includes a flow generator configured to generate a flow of liquid along an inside surface of an envelope, first and second electrodes configured to generate an electrical arc within the envelope to produce the electromagnetic radiation, and an exhaust chamber extending outwardly beyond one of the electrodes, configured to accommodate a portion of the flow of liquid. In another aspect, the flow generator is electrically insulated. In another aspect, the electrodes are configured to generate an electrical discharge pulse to produce an irradiance flash, and the apparatus includes a removal device configured to remove particulate contamination from the liquid, the particulate contamination being released during the flash and being different than that released by the electrodes during continuous operation.
    Type: Application
    Filed: July 13, 2010
    Publication date: November 4, 2010
    Applicant: Mattson Technology Canada, Inc.
    Inventors: David Malcolm Camm, Chee Chin, Rick Doolan, Tony Hewett, Arne Kjorvel, Tony Komasa, Mike Krasnich, Steve McCoy, Joseph Reyers, Igor Rudic, Ludmila Shepelev, Greg Stuart, Tilman Thrum, Alex Viel
  • Patent number: 7812329
    Abstract: A gas flow management system may comprise a first and second enclosing walls at least partially surrounding first and second respective spaces; a system generating plasma in the first space, the plasma emitting extreme ultraviolet light; an elongated body restricting flow from the first space to the second space, the body at least partially surrounding a passageway and having a first open end allowing EUV light to enter the passageway from the first space and a second open end allowing EUV light to exit the passageway into the second space, the body shaped to establish a location having a reduced cross-sectional area relative to the first and second ends; and a flow of gas exiting an aperture, the aperture positioned to introduce gas into the passageway at a position between the first end of the body and the location having a reduced cross-sectional area.
    Type: Grant
    Filed: December 14, 2007
    Date of Patent: October 12, 2010
    Assignee: Cymer, Inc.
    Inventors: Alexander N. Bykanov, David C. Brandt, Igor V. Fomenkov, William N. Partlo
  • Patent number: 7795818
    Abstract: A microwave plasma generator in which the generating amount of radicals can be regulated easily with higher reaction efficiency while reducing gas consumption. The microwave plasma generator comprises an outer conductor (2), an inner conductor (3) arranged in the internal space (4) of the outer conductor, a discharge tube (7) having a double tube structure consisting of an inner tube (5) and an outer tube (6) and penetrating the outer and inner conductors in the axial direction, and a cavity (1) having a means for adjusting the position of the inner tube to the outer tube in the axial direction in the discharge tube.
    Type: Grant
    Filed: September 12, 2006
    Date of Patent: September 14, 2010
    Assignee: Adtec Plasma Technology Co., Ltd.
    Inventors: Takuya Urayama, Kazunari Fujioka, Masahiko Uchiyama
  • Patent number: 7791019
    Abstract: A compact, low power ambient pressure pyroelectric ionization source. The source can be constructed using a z-cut lithium niobate or lithium tantalate crystal with an attached resistive heater mounted in front of the atmospheric pressure inlet of an ion trap mass spectrometer. Positive and negative ion formation alternately results from thermally cycling the crystal over a narrow temperature range. Ionization of molecules such as 1,1,1,3,3,3-hexafluoroisopropanol or benzoic acid results in the observation of the singly deprotonated species and their clusters in the negative ion mass spectrum. Ionization of molecules such as triethylamine or triphenylamine with the source results in observation of the corresponding singly protonated species of each in the positive ion mass spectrum. The pyroelectric crystals are thermally cycled by as little as 30 K from ambient temperature. Ion formation is largely unaffected by contamination of the crystal faces. This ion source is robust.
    Type: Grant
    Filed: January 11, 2008
    Date of Patent: September 7, 2010
    Assignee: California Institute of Technology
    Inventors: Jesse L. Beauchamp, Evan L. Neidholdt
  • Publication number: 20100207527
    Abstract: A multi-functional power supply system for a Hall thruster including a thruster assembly for providing a plasma discharge and a cathode assembly for providing electrons. The cathode assembly includes an emitter, a keeper with a current limiting device, and a heater. A magnetic field source is operatively associated with the cathode assembly for generating a magnetic field to control the discharge. A plasma discharge circuit creates a plasma and accelerates the plasma to produce thrust. A power supply is connected to the keeper and the plasma discharge circuit and is connected to the heater through a switching device responsive to a predetermined condition for interrupting the power to the heater and simultaneously enabling the power supply to deliver power to the keeper and the plasma discharge circuit to initiate production of thrust.
    Type: Application
    Filed: January 22, 2004
    Publication date: August 19, 2010
    Inventors: Vladimir J. Hruby, Bruce M. Pote, Lawrence Byrne, William Connolly
  • Publication number: 20100134013
    Abstract: A plasma electrodeless lamp comprises a substantially hollow metallic body, closely receiving two coupling elements, the first coupling element connected to the output of an RF amplifier, and the second coupling element connected to the input of an RF amplifier. The first coupling element is conductively connected (grounded) to metallic lamp body at its top surface, while the second coupling element is not. The lamp further comprises a vertical metallic post, the post being grounded to the metallic lamp body at the post's bottom surface. The lamp further comprises a dielectric sleeve which closely receives the metallic post, and which is in turn closely supported by the lamp body or alternatively or in combination a tuning stub. The lamp further comprises a bulb that is closely received by the metallic post, and that encloses a gas-fill which forms a radiant plasma when excited.
    Type: Application
    Filed: November 23, 2009
    Publication date: June 3, 2010
    Applicant: TOPANGA TECHNOLOGIES, INC.
    Inventors: FREDERICK M. ESPIAU, Mehran Matloubian, Timothy J. Brockett
  • Patent number: 7705330
    Abstract: To provide an electron beam irradiation device capable of reducing quantity of inert gas consumed while maintaining oxygen concentration in an irradiation chamber in appropriate level. An electron beam irradiation device to irradiate an electron beam to an irradiated object passing through an irradiation chamber while introducing inert gas into the irradiation chamber comprising an oxygen concentration detection device to detect oxygen concentration in the irradiation chamber; a main controlling valve to regulate flow rate of inert gas introduced in the irradiation chamber; a control unit to control valve travel of the main controlling valve so that the flow rate of the inert gas decreases when the oxygen concentration becomes low on the basis of the oxygen concentration detected by the oxygen concentration detection device.
    Type: Grant
    Filed: March 22, 2006
    Date of Patent: April 27, 2010
    Assignee: Dai Nippon Printing Co., Ltd.
    Inventor: Seitaro Nakao
  • Patent number: 7696493
    Abstract: The invention relates to a radiation system for generating electromagnetic radiation. The radiation system includes a pair of electrodes constructed and arranged to generate plasma of a first substance and a pinch in the plasma. The radiation system also includes a plasma recombination surface that is arranged proximate to the pinch, and is configured to neutralize a plurality of plasma particles.
    Type: Grant
    Filed: December 13, 2006
    Date of Patent: April 13, 2010
    Assignee: ASML Netherlands B.V.
    Inventors: Maarten Marinus Johannes Wilhelmus Van Herpen, Vadim Yevgenyevich Banine, Vladimir Vitalevitch Ivanov, Konstantin Nikolaevitch Koshelev, Derk Jan Wilfred Klunder
  • Patent number: 7686461
    Abstract: A high-intensity discharge lamp bulb with an attached housing for ballast and ignition electronics, forming an integral bulb and electronics unit. The electronics housing forms a removable closure for an access opening in a lamp enclosure. The electronics housing isolates the electronics from heat inside the lamp enclosure. A heat sink and radiator on the back of the housing provides heat transfer to a surrounding environment behind the lamp enclosure to cool the electronics. The electronics may be sealed in the housing for protection against entry of foreign substances. The electronics housing is fixed to the access opening of the lamp enclosure and to a boss or reflector mounted in the lamp enclosure, thus providing stable two-point fixation for the unit, reducing vibration.
    Type: Grant
    Filed: June 12, 2007
    Date of Patent: March 30, 2010
    Assignee: General Electric Company
    Inventors: Kunal Ravindra Goray, Amit Mukesh Shah
  • Patent number: 7622721
    Abstract: A focused ion source based on a Hall thruster with closed loop electron drift and a narrow acceleration zone is disclosed. The ion source of the invention has an ion focusing system consisting of two parts. The first part is a ballistic focusing system in which the aperture through which the beam exits the discharge channel is tilted. The second is a magnetic focusing system which focuses the ion beam exiting the discharge channel by canceling a divergent magnetic field present at the aperture through which the beam exits the discharge channel. The ion source of the invention also has an in-line hollow cathode capable of forming a self-sustaining discharge. The invention further reduces substrate contamination, while increasing the processing rate. Further the configuration disclosed allows the ion source to operate at lower operational gas pressures.
    Type: Grant
    Filed: February 9, 2007
    Date of Patent: November 24, 2009
    Inventors: Michael Gutkin, Alexander Bizyukov, Vladimir Sleptsov, Ivan Bizyukov, Konstantin Sereda
  • Patent number: 7589473
    Abstract: A device and a method for generating a truly pulsed plasma flow are disclosed. The device includes a cathode assembly comprising a cathode and a cathode holder, an anode, and two or more intermediate electrodes, the anode and the intermediate electrodes forming a plasma channel expanding toward the anode. The intermediate electrode closest to the cathode may form a plasma chamber around the cathode tip. An extension nozzle forming an extension channel having a tubular insulator along at least a portion of its interior surface is affixed to the anode end of the device. During operation, a voltage is applied between the cathode and the anode and a current is passed through the cathode, the plasma, and the anode. The voltage and current profiles are selected to cause the rapid development of a plasma flow with required characteristics. A substantially uniform temperature and power density distribution of the plasma pulse is achieved in the extension nozzle.
    Type: Grant
    Filed: August 6, 2007
    Date of Patent: September 15, 2009
    Assignee: Plasma Surgical Investments, Ltd.
    Inventor: Nikolay Suslov
  • Publication number: 20090200032
    Abstract: The present invention provides system, method and apparatus for creating an electric glow discharge that includes a first and second electrically conductive screens having substantially equidistant a gap between them, one or more insulators attached to the electrically conductive screens, and a non-conductive granular material disposed within the gap. The electric glow discharge is created whenever: (a) the first electrically conductive screen is connected to an electrical power source such that it is a cathode, the second electrically conductive screen is connected to the electrical power supply such that it is an anode, and the electrically conductive fluid is introduced into the gap, or (b) both electrically conductive screens are connected to the electrical power supply such they are the cathode, and the electrically conductive fluid is introduced between both electrically conductive screens and an external anode connected to the electrical power supply.
    Type: Application
    Filed: October 17, 2008
    Publication date: August 13, 2009
    Applicant: Foret Plasma labs, LLC
    Inventor: Todd Foret
  • Patent number: 7564190
    Abstract: A light source device comprises a waveguide, an electrodeless lamp, a probe, and conversing means. The waveguide is formed to contain a medium enabling a microwave to resonate and has a surface and an aperture cavity with an aperture opened at a predetermined position of the surface. The electrodeless lamp is loaded in the aperture cavity in a state where part of the electrodeless lamp is protruded from the surface of the waveguide so that the part of the electrode lamp emits light in response to applying the microwave to the electrodeless lamp. The probe supplies a high-frequency signal to the waveguide so that the high-frequency signal is converted to the microwave in the waveguide. The converging means is disposed on the surface of the waveguide to face the aperture cavity and utilizes all the light emitted from the part of the electrodeless lamp to converge the light.
    Type: Grant
    Filed: June 8, 2007
    Date of Patent: July 21, 2009
    Assignee: Victor Company of Japan, Ltd.
    Inventor: Ryusaku Takahashi