Abstract: The invention generally relates to mass spectrometers that utilize ionic wind and methods of use thereof.

Abstract: A fan device including high voltage power source, conductive blade, first electrode and a resistance device is provided. Connecting side of the conductive blade is connected to first electric contact of the high voltage power source, and the conductive blade further includes a vibration side, wherein the conductive blade is extended from the connecting side to the vibration side along a first direction. The first electrode electrically connected to the second electric contact of the high voltage power source. The first electrode is disposed on a side of the vibration side of the conductive blade, and located in the vibrating range of the vibration side. The resistance device is connected between the conductive blade and the second electric contact in series.

Abstract: An air vent system includes a conduit for airflow. A stream of air is moved through the conduit.

Abstract: An ionic wind delivery device includes a first discharge electrode; a reference electrode arranged separate from the first discharge electrode; a first power supply circuit configured to output a voltage to induce a corona discharge between the first discharge electrode and the reference electrode; a control electrode arranged on a delivery path of an ionic wind of ions that are generated by the corona discharge induced between the first discharge electrode and the reference electrode; a second discharge electrode arranged between the reference electrode and the control electrode; and a second power supply circuit configured to output a voltage to accelerate the ions generated by the corona discharge induced between the first discharge electrode and the reference electrode and to induce a corona discharge between the second discharge electrode and the control electrode.

Abstract: A water treatment system is disclosed having electrolytic cell for liberating hydrogen from a base solution. The base solution may be a solution of brine for generating sodium hypochlorite, or potable water to be oxidized. The cell has first and second opposing electrode end plates held apart from each other by a pair of supports such that the supports enclose opposing sides of the end plates to form a cell chamber. One or more inner electrode plates are spaced apart from each other in the cell chamber in between the first and second electrode plates. The supports are configured to electrically isolate the first and second electrode plates and the inner electrode plates from each other. The first and second electrode plates are configured to receive opposite polarity charges that passively charge the inner electrode plates via conduction from the base solution to form a chemical reaction in the base solution as the base solution passes through the cell chamber.

Abstract: A leak detector for detection of leaks from an object to be tested by detection of a tracer gas, the leak detector including: an inlet of gases; a pumping device; a pumping line connecting the inlet of the gases to the pumping device; a device for detection of tracer gas fitted to the pumping line, as bypass of the pumping device, the device for detection of tracer gas including a probe configured to ionize the gas molecules and to measure current of the ionized gas molecules, and a separating membrane arranged upstream of the probe. The separating membrane is a monoatomic layer of graphene deposited on a gas-permeable substrate of the device for detection of tracer gas including selection orifices, the greatest dimension of which is less than 5 angstroms, made in the monoatomic layer of graphene.

Abstract: A method for directly converting wind energy into electrical energy is provided. An air stream is ionized and then routed through the electrical field of a collection electrode providing an opposing field for the air ions. The ions are collected on a collection electrode. The electrical potential of the collection electrode is higher than the ionizer, and discharged. A counter-electrode in front of the collection electrode has an electrical potential higher than the collection electrode. Ionized air molecules overcome the electrical field emanating from the counter-electrode via wind power. An apparatus for carrying out the method is provided. An optional retaining electrode, located in front of the ionizer electrode, drives ionized air in the counter-electrode and collection electrode direction. The apparatus is expediently located in a flow channel, with inlet and outlet electrodes at respective ends. A plurality of flow channels combine to form a flow generation module.

Abstract: The disclosure relates to a method for the scheduling and/or the operation of a system of at least two power supplies (11) providing DC pulses to a consumer (5), typically an electrostatic precipitator, wherein the power supplies (11) are energized by a common feeding (1). According to the proposed method one power supply (11) is defined to be the reference power supply, and the initial pulses of each further power supply (11) are shifted by controlled delays (?Pri) with respect to the pulses of the reference power supply so as to fill the gaps between the pulses of the reference power supply by the pulses of the further power supplies (11).

Abstract: Disclosed are techniques to reduce the effects of Paschen events from occurring within a gas transport system. A passive isolation assembly may be used to bridge a gas being transported from a low potential environment to a high potential environment. The passive isolation assembly may include a non-conductive axially bored transport insulator. An irregularly shaped non-conductive isolation tracking insulator may be in direct contact with and surrounding the transport insulator. The passive isolation assembly may also include an electrically conductive front end sealing cap at earth ground potential that has an opening that is adapted to couple with a source gas transport line and an electrically conductive rear end sealing cap at a high voltage potential that has an opening adapted to couple with a destination gas transport line.

Abstract: A hybrid plasma reactor includes a reactor body having a plasma discharge space, a gas inlet, and a gas outlet; a hybrid plasma source including an inductive antenna inductively coupled to plasma formed in the plasma discharge space and a primary winding coil transformer coupled to the plasma and wound in a magnetic core; and an alternating switching power supply for supplying plasma generation power to the inductive antenna and the primary winding coil. The hybrid plasma reactor induces a plasma discharge using the inductively coupled plasma source and the transformer coupled plasma source, so that it has a wide operational area from a low pressure area to a high pressure area.

Abstract: An ion source includes an ion chamber housing defining an ion source chamber, the ion chamber housing having a side with a plurality of apertures. The ion source also includes an antechamber housing defining an antechamber. The antechamber housing shares the side with the plurality of apertures with the ion chamber housing. The antechamber housing has an opening to receive a gas from a gas source. The antechamber is configured to transform the gas into an altered state having excited neutrals that is provided through the plurality of apertures into the ion source chamber.

Abstract: An ion implantation system and process, in which the performance and lifetime of the ion source of the ion implantation system are enhanced, by utilizing isotopically enriched dopant materials, or by utilizing dopant materials with supplemental gas(es) effective to provide such enhancement.

Abstract: A compact cold plasma device for generating cold plasma having temperatures in the range 65 to 120 degrees Fahrenheit. The compact cold plasma device has a magnet-free configuration and an induction-grid-free configuration. An additional configuration uses an induction grid in place of the input electrode to generate the cold plasma. A high voltage power supply is provided that includes a controllable switch to release energy from a capacitor bank to a dual resonance RF transformer. A controller adjusts the energy input to the capacitor bank, as well as the trigger to the controllable switch.

Abstract: Described herein is a method and apparatus for removing metal oxides on a surface of a component via electron attachment. In one embodiment, there is provided a field emission apparatus, wherein the electrons attach to at least a portion of the reducing gas to form a negatively charged atomic ions which removes metal oxides comprising: a cathode comprising an electrically conductive and comprising at least one or more protrusions having a high surface curvature, wherein the cathode is surrounded by a dielectric material which is then surrounded by an electrically conductive anode wherein the cathode and anode are each connected to an electrical voltage source, and the dielectric material between the cathode and anode is polarized to provide an electric field at one or more protrusions and thereby electrons from the cathode.

Abstract: A planar helix slow-wave structure with straight edge connections where the structure consists of two arrays of thin, parallel, conductors printed on top and bottom faces of a low-loss dielectric material or substrate, the conductors in the arrays printed on the top and bottom surfaces being inclined at different but symmetric pitch angles on the surface of the planar surface, the conjunction ends of the conductors on the top and bottom faces being connected by vertical conductors with circular rings with a diameter greater than the diameter of the vertical conductors to ensure proper connections between them, and a vacuum tunnel inside the planar helix structure.

Abstract: A device for generating a cold, HF-excited plasma under atmospheric pressure conditions can be used advantageously for plasma treatment of materials for cosmetic and medical purposes. The device contains a metal housing functioning as a grounded electrode in the region of the emergent plasma, wherein an HF generator, an HF resonance coil having a closed ferrite core suitable for the high frequency, an insulating body acting as a gas nozzle, and a high-voltage electrode mounted in the insulating body are disposed in such a manner that they are permeated or circulated around by process gas. By integrating the plasma nozzle and required control electronics in a miniaturized handheld device, or by using a short high-voltage cable, the invention allows compliance with the electromagnetic compatibility directives and allows the power loss to be minimized and thus a mobile application to be implemented.

Abstract: In a dielectric window 41 for a plasma processing apparatus, a first dielectric window recess 47 is formed on an outer region of a surface of the dielectric window 41 in a diametrical direction of the dielectric window 41 at a side where plasma is generated, and the first dielectric window recess 47 is extended in a ring shape and has a tapered shape inwardly in a thickness direction of the dielectric window 41. A multiple number of second dielectric window recesses 53a to 53g are formed between the center of the dielectric window 41 and the first dielectric window recess 47, and each of the second dielectric window recesses 53a to 53g is recessed inwardly in the thickness direction of the dielectric window 41 from the surface of the dielectric window 41.

Abstract: An apparatus for extending the useful life of an ion source, comprising an arc chamber containing a plurality of cathodes to be used sequentially and a plurality of repellers to protect cathodes when not in use. The arc chamber includes an arc chamber housing defining a reaction cavity, gas injection openings, a plurality of cathodes, and at least one repeller element. A method for extending the useful life of an ion source includes providing power to a first cathode of an arc chamber in an ion source, operating the first cathode, detecting a failure or degradation in performance of the first cathode, energizing a second cathode, and continuing operation of the arc chamber with the second cathode.

Abstract: A cold plasma treatment device for delivery of a cold plasma to patient treatment area. Gas is fed to a gas compartment where it is energized by an electrode coupled to a pulse source to thereby generate a cold plasma. A dielectric barrier is sandwiched between the gas compartment and the electrode to form a dielectric barrier discharge device. The cold plasma exits the gas compartment via a bottom member having a plurality of holes. Gases that can be used include noble gases such as helium or combinations of noble gases.

Abstract: The present disclosure provides for various advantageous methods and apparatus of controlling electron emission. One of the broader forms of the present disclosure involves an electron emission element, comprising an electron emitter including an electron emission region disposed between a gate electrode and a cathode electrode. An anode is disposed above the electron emission region, and a voltage set is disposed above the anode. A first voltage applied between the gate electrode and the cathode electrode controls a quantity of electrons generated from the electron emission region. A second voltage applied to the anode extracts generated electrons. A third voltage applied to the voltage set controls a direction of electrons extracted through the anode.

Abstract: An ion source is configured for electron ionization and produces coaxial electron and ion beams. The ion source includes an ionization chamber along an axis, a magnet assembly configured for generating an axial magnetic field in the ionization chamber, an electron source, and a lens assembly configured for directing the ion beam out from the ionization chamber along the axis, reflecting the electron beam back toward the electron source, and transmitting higher energy ions out from the ion source while reflecting lower energy ions toward a lens element for neutralization.

Abstract: An ion source able to ionize liquid and gaseous effluents from interfaced liquid or gaseous separation techniques and from direct introduction of the analyte to the entrance of the ionization region. The liquid effluents from sources such as a liquid chromatograph are ionized by inlet ionization methods and the gaseous effluents from sources such as a gas chromatograph are ionized by a corona or Townsend electrical discharge, or an alpha or beta emitter, or by inlet ionization, or by photoionization. Ionization occurs in an intermediate pressure region linking atmospheric pressure and the vacuum of the mass analyzer. The source has the ability to ionize compounds from both liquid and gaseous sources, which facilitates ionization of volatile compounds separated by gas chromatography, volatile or non-volatile compounds separated by liquid chromatography, or infused into the ionization. The ionization methods can be achieved with a single configuration or with separately optimized configurations.

Abstract: Disclosed herein are systems, methods and apparatuses for dissociating a non-activated gas through a disc-shaped plasma in a remote plasma source. Two inductive elements, one on either side of the disc-shaped plasma, generate a magnetic field that induces electric fields that sustain the disc-shaped plasma. The inductive elements can be coiled conductors having any number of loops and can be arranged in planar or vertical coils or a combination of planar and vertical coils. Additionally, the ratio of inductive element radius to gap distance between the two inductive elements can be configured to achieve a desired vertical plasma confinement.

Abstract: Disclosed herein are systems and methods that allow analysis of macromolecular structures using laserspray ionization at intermediate pressure or high vacuum using commercially available mass spectrometers with or without modification and with the application of heat. The systems and methods produce multiply-charged ions for improved analysis in mass spectrometry.

Abstract: An ion source for use in a radiation generator includes an active cathode configured to emit electrons on a trajectory away from the active cathode, at least some of the electrons as they travel interacting with an ionizable gas to produce ions. In addition, there is at least one extractor downstream of the active cathode having a potential such that the ions are attracted toward the at least one extractor.

Abstract: A radiation generator includes an insulator, with an ion source carried within the insulator and configured to generate ions and indirectly generate undesirable particles. An extractor electrode is carried within the insulator downstream of the ion source and has a first potential. An intermediate electrode is carried within the insulator downstream of the extractor electrode at a ground potential and is shaped to capture the undesirable conductive particles. In addition, a suppressor electrode is carried within the insulator downstream of the intermediate electrode and has a second potential opposite in sign to the first potential. A target is carried within the insulator downstream of the suppressor electrode. The extractor electrode and the suppressor electrode have a voltage therebetween such that an electric field generated in the insulator accelerates the ions generated by the ion source toward the target.

Abstract: A method of generating ions in a radiation generator includes emitting electrons from an active cathode and on a trajectory away from the active cathode, at least some of the electrons as they travel interacting with an ionizable gas to produce ions. The method also includes setting a potential of at least one extractor downstream of the active cathode such that the ions are attracted toward the at least one extractor.

Abstract: Provided is an ion beam treatment apparatus including the target. The ion beam treatment apparatus includes a substrate having a first surface and a second surface opposed to the first surface, and including a cone type hole decreasing in width from the first surface to the second surface to pass through the substrate, wherein an inner wall of the substrate defining the cone type hole is formed of a metal, an ion generation thin film attached to the second surface to generate ions by a laser beam incident into the cone type hole through the first surface and strengthen, and a laser that emits a laser beam to generate ions from the ion generation thin film and project the ions onto a tumor portion of a patient. The laser beam incident into the cone type hole is focused by the cone type hole and is strengthened.

Abstract: A particle beam generating device includes at least one accelerator unit for generating a particle beam and at least one emission unit for the output of the at least one particle beam onto a workpiece. The device is configured to release at least two particle beams including hadronic particles with at least one of a different mass or a different charge.

Abstract: A method for generating atmospheric pressure cold plasma inside a hand-held unit discharges cold plasma with simultaneously different rf wavelengths and their harmonics. The unit includes an rf tuning network that is powered by a low-voltage power supply connected to a series of high-voltage coils and capacitors. The rf energy signal is transferred to a primary containment chamber and dispersed through an electrode plate network of various sizes and thicknesses to create multiple frequencies. Helium gas is introduced into the first primary containment chamber, where electron separation is initiated. The energized gas flows into a secondary magnetic compression chamber, where a balanced frequency network grid with capacitance creates the final electron separation, which is inverted magnetically and exits through an orifice with a nozzle. The cold plasma thus generated has been shown to be capable of accelerating a healing process in flesh wounds on animal laboratory specimens.

Abstract: Beam current is adjusted during ion implantation by adjusting one or more parameters of an ion source. The ion beam is generated or provided by a non-arc discharge based ion source, such as an electron gun driven ion source or an RF driven ion source. A beam current adjustment amount is determined. Then, one or more parameters of the ion source are adjusted according to the determined beam current adjustment amount. The beam current is provided having a modulated beam current.

Abstract: A plasma generator having a housing surrounding an ionization chamber, at least one working-fluid supply line leading into the ionization chamber, the ionization chamber having at least one outlet opening, at least one electric coil arrangement which surrounds at least one area of the ionization chamber, the coil arrangement being electrically connected with a high-frequency alternating-current source (AC) which is constructed such that it applies a high-frequency electric alternating current to at least one coil of the coil arrangement, is wherein a further current source (DC) is provided which is constructed such that it applies a direct voltage or an alternating voltage of a frequency lower than that of the voltage supplied by the high-frequency alternating current source (AC) to at least one coil of the coil arrangement.

Abstract: An ion implantation system and process, in which the performance and lifetime of the ion source of the ion implantation system are enhanced, by utilizing isotopically enriched dopant materials, or by utilizing dopant materials with supplemental gas(es) effective to provide such enhancement.

Abstract: An ion beam machining and observation method relevant to a technique of cross sectional observation of an electronic component, through which a sample is machined by using an ion beam and a charged particle beam processor capable of reducing the time it takes to fill up a processed hole with a high degree of flatness at the filled area. The observation device is capable of switching the kind of gas ion beam used for machining a sample with the kind of a gas ion beam used for observing the sample. To implement the switch between the kind of a gas ion beam used for sample machining and the kind of a gas ion beam used for sample observation, at least two gas introduction systems are used, each system having a gas cylinder, a gas tube, a gas volume control valve, and a stop valve.

Abstract: An ion source for use in a radiation generator tube includes a back passive cathode electrode, a passive anode electrode downstream of the back passive cathode electrode, a magnet adjacent the anode, and a front passive cathode electrode downstream of the passive anode electrode. The front passive cathode electrode and the back passive cathode electrode define an ionization region therebetween. At least one field emitter array (FEA) cathode is configured to electrostatically discharge due to an electric field in the ion source. The back passive cathode electrode and the passive anode electrode, and the front passive cathode electrode and the passive anode electrode, have respective voltage differences therebetween, and the magnet generating a magnetic field, such that a Penning-type trap is produced to confine electrons from the electrostatic discharge to the ionization region. At least some of the electrons in the ionization region interact with an ionizable gas to create ions.

Abstract: A method to modulate the density of an electron beam as it is emitted from a cathode, the method comprised of connecting a source of pulsed input power to the input end of a nonlinear transmission line and connecting the output end directly to the cathode of an electron beam diode by a direct electrical connection.

Abstract: The disclosed charged particle beam apparatus includes a field-emission electron source including <310> single crystal of tungsten; a vacuum chamber having the electron source therein; an exhausting system for exhausting the vacuum chamber; a filament connected to the electron source to let flow a current through the electron source and thereby heat the electron source; a power supply for letting a current flow through the filament; an ammeter for measuring a total current emitted from the electron source; and a controlling unit for exercising control to cause the power supply to let a current flow through the filament when the total current measured periodically has become a predetermined ratio or less as compared with a total current from the electron source found immediately after first electron beam emission, or a total current from the electron beam found immediately after a current is let flow through the filament.

Abstract: An apparatus for extending the useful life of an ion source, comprising an arc chamber containing a plurality of cathodes to be used sequentially and a plurality of repellers to protect cathodes when not in use. The arc chamber includes an arc chamber housing defining a reaction cavity, gas injection openings, a plurality of cathodes, and at least one repeller element. A method for extending the useful life of an ion source includes providing power to a first cathode of an arc chamber in an ion source, operating the first cathode, detecting a failure or degradation in performance of the first cathode, energizing a second cathode, and continuing operation of the arc chamber with the second cathode.

Abstract: An inductively coupled plasma ion source for a focused ion beam (FIB) system is disclosed, comprising an insulating plasma chamber with a feed gas delivery system, a compact radio frequency (RF) antenna coil positioned concentric to the plasma chamber and in proximity to, or in contact with, the outer diameter of the plasma chamber. In some embodiments, the plasma chamber is surrounded by a Faraday shield to prevent capacitive coupling between the RF voltage on the antenna and the plasma within the plasma chamber. High dielectric strength insulating tubing is heat shrunk onto the outer diameter of the conductive tubing or wire used to form the antenna to allow close packing of turns within the antenna coil. The insulating tubing is capable of standing off the RF voltage differences between different portions of the antenna, and between the antenna and the Faraday shield.

Abstract: A method of sustaining a plasma, by focusing a first wavelength of electromagnetic radiation into a gas within a volume, where the first wavelength is substantially absorbed by a first species of the gas and delivers energy into a first region of a plasma having a first size and a first temperature. A second wavelength of electromagnetic radiation is focused into the first region of the plasma, where the second wavelength is different than the first wavelength and is substantially absorbed by a second species of the gas and delivers energy into a second region of the plasma region within the first region of the plasma having a second size that is smaller than the first size and a second temperature that is greater than the first temperature.

Abstract: This disclosure provides systems, methods, and apparatus for ion generation. In one aspect, an apparatus includes an anode, a first cathode, a second cathode, and a plurality of cusp magnets. The anode has a first open end and a second open end. The first cathode is associated with the first open end of the anode. The second cathode is associated with the second open end of the anode. The anode, the first cathode, and the second cathode define a chamber. The second cathode has an open region configured for the passage of ions from the chamber. Each cusp magnet of the plurality of cusp magnets is disposed along a length of the anode.

Abstract: An ionization gauge to measure pressure and to reduce sputtering yields includes at least one electron source that generates electrons. The ionization gauge also includes a collector electrode that collects ions formed by the collisions between the electrons and gas molecules. The ionization gauge also includes an anode. An anode bias voltage relative to a bias voltage of a collector electrode is configured to switch at a predetermined pressure to decrease a yield of sputtering collisions.

Abstract: A gas conversion system using microwave plasma is provided. The system includes: a microwave waveguide; a gas flow tube passing through a microwave waveguide and configured to transmit microwaves therethrough; a temperature controlling means for controlling a temperature of the microwave waveguide; a temperature sensor disposed near the gas flow tube and configured to measure a temperature of gas flow tube or microwave waveguide; an igniter located near the gas flow tube and configured to ignite a plasma inside the gas flow tube so that the plasma converts a gas flowing through the gas flow tube during operation; and a plasma detector located near the gas flow tube and configured to monitor the plasma.

Abstract: An electrohydrodynamic fluid accelerator includes an emitter electrode and leading surfaces of a collector electrode that are substantially exposed to ion bombardment. Heat transfer surfaces downstream of the emitter electrode along a fluid flow path include a first portion not substantially exposed to the ion bombardment that is conditioned with a first ozone reducing material. The leading surfaces of the collector electrode are not conditioned with the first ozone reducing material, but may include a different surface conditioning. The downstream heat transfer surfaces and the leading surfaces can be separately formed and joined to form the unitary structure or can be integrally formed. The electrohydrodynamic fluid accelerator can be used in a thermal management assembly of an electronic device with a heat dissipating device thermally coupled to the conditioned heat transfer surfaces.

Abstract: A method of manufacturing a semiconductor device includes the steps of: providing a supply of molecules containing a plurality of dopant atoms into an ionization chamber, ionizing said molecules into dopant cluster ions, extracting and accelerating the dopant cluster ions with an electric field, selecting the desired cluster ions by mass analysis, modifying the final implant energy of the cluster ion through post-analysis ion optics, and implanting the dopant cluster ions into a semiconductor substrate. In general, dopant molecules contain n dopant atoms, where n is an integer number greater than 10. This method enables increasing the dopant dose rate to n times the implantation current with an equivalent per dopant atom energy of 1/n times the cluster implantation energy, while reducing the charge per dopant atom by the factor n.

Abstract: The invention relates to an ion accelerator arrangement comprising an electrostatic acceleration field between a cathode to which a frame potential is applied and an anode to which a high-voltage potential is applied. The ion accelerator arrangement further comprises a gas supply system into which a gas-permeable, open porous insulator member is introduced. Also described is a high-voltage insulator arrangement that comprises such an insulator member and is suitable, inter alia, for such an ion accelerator arrangement and for the corona-resistant insulation of other components to which a high voltage is applied.

Abstract: A plasma torch is formed from a hollow electrode forming a first gap to an isolated plasma tube, the isolated plasma tube forming a second gap with a plasma outlet tube having electrically common plasma tubes which terminate into a plasma outlet. The first gap and second gap of the isolated plasma tubes are fed by a source of plasma gas such that when a voltage is applied across the electrodes, plasmas initially form across the first plasma gap and second plasma gap. The formed plasmas spread laterally until the plasmas are formed entirely from electrode to electrode and self-sustaining. Plasma gasses which are fed to the plasma torch can be metered on both sides of the electrodes to steer the plasma arc attachment axially over the extent of the hollow electrodes, thereby reducing surface wear and increasing electrode life.

Abstract: A plasma generating system, related method and device are disclosed. The plasma generation system includes a plasma generation device, a source of ionizable gas and a driver network. The plasma generation device includes a housing, an electrode, and a resonant circuit. The housing includes a passage defined therein and directs a flow of ionizable gas therethrough. The electrode is coupled to the ionizable gas flowing through the passage of the housing. The resonant circuit includes a capacitor and an inductor connected together in series. The resonant circuit has a resonance frequency and is coupled to the electrode. The resonant circuit receives an AC signal. The driver network provides the AC signal such that the AC signal has a frequency and excites the ionizable gas flowing through the passage of the housing to a plasma.

Abstract: The invention relates to devices and methods in mass spectrometers for the generation of ions of heavy molecules, especially biomolecules, by bombarding them with uncharged clusters of molecules. The analyte ions which are generated or released by cluster bombardment of analyte substances on the surface of sample support plates show a broad distribution of their kinetic energies, which prevents good ion-optical focusing. In the invention, the kinetic energies are homogenized in a higher-density collision gas. The collision gas is preferably located in an RF ion guide, more preferably an RF ion funnel, which can transfer the ions to the mass analyzer. The collision gas may be introduced with temporal pulsing, coordinated or synchronized with the pulsed supersonic gas jet. The collision gas may be pumped off again before the next supersonic gas pulse. In an advantageous embodiment, the collision gas can originate from the supersonic gas jet itself.

Abstract: Various technologies described herein pertain to a micro gas-puff based source of neutrons, x-rays, and/or energetic particles. The micro gas-puff based source can generate plasma, which can emit neutrons, x-rays, and the like. The micro gas-puff based source includes a diode, which further includes an anode and a cathode. Further, a chamber is between the anode and the cathode. Moreover, a MEMS gas supply can inject a puff of gas between the anode and the cathode within the chamber, where the MEMS gas supply shapes the puff of gas to form a quasispherical density profile of gas created in various of geometries. Further, a pulsed power supply applies a voltage across the anode and the cathode to cause compression of the puff of gas to form the plasma.