Gas Ionization Type (e.g., Ion Pump Or Gauge Source) Patents (Class 315/111.91)
  • Patent number: 10870334
    Abstract: An ionic wind delivery device includes a first discharge electrode; a reference electrode arranged separate from the first discharge electrode; a first power supply circuit configured to output a voltage to induce a corona discharge between the first discharge electrode and the reference electrode; a control electrode arranged on a delivery path of an ionic wind of ions that are generated by the corona discharge induced between the first discharge electrode and the reference electrode; a second discharge electrode arranged between the reference electrode and the control electrode; and a second power supply circuit configured to output a voltage to accelerate the ions generated by the corona discharge induced between the first discharge electrode and the reference electrode and to induce a corona discharge between the second discharge electrode and the control electrode.
    Type: Grant
    Filed: July 28, 2016
    Date of Patent: December 22, 2020
    Assignees: DENSO CORPORATION, SOKEN, INC.
    Inventors: Noboru Maeda, Koji Ito
  • Patent number: 10800682
    Abstract: A water treatment system is disclosed having electrolytic cell for liberating hydrogen from a base solution. The base solution may be a solution of brine for generating sodium hypochlorite, or potable water to be oxidized. The cell has first and second opposing electrode end plates held apart from each other by a pair of supports such that the supports enclose opposing sides of the end plates to form a cell chamber. One or more inner electrode plates are spaced apart from each other in the cell chamber in between the first and second electrode plates. The supports are configured to electrically isolate the first and second electrode plates and the inner electrode plates from each other. The first and second electrode plates are configured to receive opposite polarity charges that passively charge the inner electrode plates via conduction from the base solution to form a chemical reaction in the base solution as the base solution passes through the cell chamber.
    Type: Grant
    Filed: January 21, 2019
    Date of Patent: October 13, 2020
    Assignee: UGSI Solutions, Inc.
    Inventors: Brent A. Simmons, Gunnar T. Thordarson, James C. Robertson
  • Patent number: 10578512
    Abstract: A leak detector for detection of leaks from an object to be tested by detection of a tracer gas, the leak detector including: an inlet of gases; a pumping device; a pumping line connecting the inlet of the gases to the pumping device; a device for detection of tracer gas fitted to the pumping line, as bypass of the pumping device, the device for detection of tracer gas including a probe configured to ionize the gas molecules and to measure current of the ionized gas molecules, and a separating membrane arranged upstream of the probe. The separating membrane is a monoatomic layer of graphene deposited on a gas-permeable substrate of the device for detection of tracer gas including selection orifices, the greatest dimension of which is less than 5 angstroms, made in the monoatomic layer of graphene.
    Type: Grant
    Filed: March 7, 2016
    Date of Patent: March 3, 2020
    Assignee: PFEIFFER VACUUM
    Inventors: Laurent Ducimetiere, Michel Puech, Frederic Rouveyre
  • Patent number: 9413274
    Abstract: A method for directly converting wind energy into electrical energy is provided. An air stream is ionized and then routed through the electrical field of a collection electrode providing an opposing field for the air ions. The ions are collected on a collection electrode. The electrical potential of the collection electrode is higher than the ionizer, and discharged. A counter-electrode in front of the collection electrode has an electrical potential higher than the collection electrode. Ionized air molecules overcome the electrical field emanating from the counter-electrode via wind power. An apparatus for carrying out the method is provided. An optional retaining electrode, located in front of the ionizer electrode, drives ionized air in the counter-electrode and collection electrode direction. The apparatus is expediently located in a flow channel, with inlet and outlet electrodes at respective ends. A plurality of flow channels combine to form a flow generation module.
    Type: Grant
    Filed: July 15, 2013
    Date of Patent: August 9, 2016
    Inventor: Stefan Stahl
  • Patent number: 9325300
    Abstract: The disclosure relates to a method for the scheduling and/or the operation of a system of at least two power supplies (11) providing DC pulses to a consumer (5), typically an electrostatic precipitator, wherein the power supplies (11) are energized by a common feeding (1). According to the proposed method one power supply (11) is defined to be the reference power supply, and the initial pulses of each further power supply (11) are shifted by controlled delays (?Pri) with respect to the pulses of the reference power supply so as to fill the gaps between the pulses of the reference power supply by the pulses of the further power supplies (11).
    Type: Grant
    Filed: June 17, 2011
    Date of Patent: April 26, 2016
    Assignee: ALSTOM Technology Ltd
    Inventors: Per Ranstad, Jörgen Linner, Jürgen Biela, Thiago Batista Soeiro
  • Patent number: 9212785
    Abstract: Disclosed are techniques to reduce the effects of Paschen events from occurring within a gas transport system. A passive isolation assembly may be used to bridge a gas being transported from a low potential environment to a high potential environment. The passive isolation assembly may include a non-conductive axially bored transport insulator. An irregularly shaped non-conductive isolation tracking insulator may be in direct contact with and surrounding the transport insulator. The passive isolation assembly may also include an electrically conductive front end sealing cap at earth ground potential that has an opening that is adapted to couple with a source gas transport line and an electrically conductive rear end sealing cap at a high voltage potential that has an opening adapted to couple with a destination gas transport line.
    Type: Grant
    Filed: October 11, 2012
    Date of Patent: December 15, 2015
    Assignee: Varian Semiconductor Equipment Associates, Inc.
    Inventor: Craig R. Chaney
  • Patent number: 9035553
    Abstract: A hybrid plasma reactor includes a reactor body having a plasma discharge space, a gas inlet, and a gas outlet; a hybrid plasma source including an inductive antenna inductively coupled to plasma formed in the plasma discharge space and a primary winding coil transformer coupled to the plasma and wound in a magnetic core; and an alternating switching power supply for supplying plasma generation power to the inductive antenna and the primary winding coil. The hybrid plasma reactor induces a plasma discharge using the inductively coupled plasma source and the transformer coupled plasma source, so that it has a wide operational area from a low pressure area to a high pressure area.
    Type: Grant
    Filed: November 9, 2012
    Date of Patent: May 19, 2015
    Inventor: Dae-Kyu Choi
  • Patent number: 9018829
    Abstract: An ion source includes an ion chamber housing defining an ion source chamber, the ion chamber housing having a side with a plurality of apertures. The ion source also includes an antechamber housing defining an antechamber. The antechamber housing shares the side with the plurality of apertures with the ion chamber housing. The antechamber housing has an opening to receive a gas from a gas source. The antechamber is configured to transform the gas into an altered state having excited neutrals that is provided through the plurality of apertures into the ion source chamber.
    Type: Grant
    Filed: July 31, 2013
    Date of Patent: April 28, 2015
    Assignee: Varian Semiconductor Equipment Associates, Inc.
    Inventors: Bon-Woong Koo, Victor Benveniste, Christopher A. Rowland, Craig R. Chaney, Frank Sinclair, Neil J. Bassom
  • Patent number: 9012874
    Abstract: An ion implantation system and process, in which the performance and lifetime of the ion source of the ion implantation system are enhanced, by utilizing isotopically enriched dopant materials, or by utilizing dopant materials with supplemental gas(es) effective to provide such enhancement.
    Type: Grant
    Filed: July 22, 2014
    Date of Patent: April 21, 2015
    Assignee: Entegris, Inc.
    Inventors: Robert Kaim, Joseph D. Sweeney, Anthony M. Avila, Richard S. Ray
  • Patent number: 9006971
    Abstract: A planar helix slow-wave structure with straight edge connections where the structure consists of two arrays of thin, parallel, conductors printed on top and bottom faces of a low-loss dielectric material or substrate, the conductors in the arrays printed on the top and bottom surfaces being inclined at different but symmetric pitch angles on the surface of the planar surface, the conjunction ends of the conductors on the top and bottom faces being connected by vertical conductors with circular rings with a diameter greater than the diameter of the vertical conductors to ensure proper connections between them, and a vacuum tunnel inside the planar helix structure.
    Type: Grant
    Filed: April 14, 2010
    Date of Patent: April 14, 2015
    Inventors: Ciersiang Chua, Sheel Aditya, Zhongxiang Shen
  • Patent number: 9006976
    Abstract: A compact cold plasma device for generating cold plasma having temperatures in the range 65 to 120 degrees Fahrenheit. The compact cold plasma device has a magnet-free configuration and an induction-grid-free configuration. An additional configuration uses an induction grid in place of the input electrode to generate the cold plasma. A high voltage power supply is provided that includes a controllable switch to release energy from a capacitor bank to a dual resonance RF transformer. A controller adjusts the energy input to the capacitor bank, as well as the trigger to the controllable switch.
    Type: Grant
    Filed: September 14, 2012
    Date of Patent: April 14, 2015
    Assignee: Plasmology4, Inc.
    Inventors: Gregory A. Watson, Robert M. Hummel, Marc C. Jacofsky, David J. Jacofsky
  • Patent number: 9006975
    Abstract: Described herein is a method and apparatus for removing metal oxides on a surface of a component via electron attachment. In one embodiment, there is provided a field emission apparatus, wherein the electrons attach to at least a portion of the reducing gas to form a negatively charged atomic ions which removes metal oxides comprising: a cathode comprising an electrically conductive and comprising at least one or more protrusions having a high surface curvature, wherein the cathode is surrounded by a dielectric material which is then surrounded by an electrically conductive anode wherein the cathode and anode are each connected to an electrical voltage source, and the dielectric material between the cathode and anode is polarized to provide an electric field at one or more protrusions and thereby electrons from the cathode.
    Type: Grant
    Filed: February 2, 2012
    Date of Patent: April 14, 2015
    Assignee: Air Products and Chemicals, Inc.
    Inventors: Chun Christine Dong, Russell A. Siminski
  • Patent number: 8994271
    Abstract: A device for generating a cold, HF-excited plasma under atmospheric pressure conditions can be used advantageously for plasma treatment of materials for cosmetic and medical purposes. The device contains a metal housing functioning as a grounded electrode in the region of the emergent plasma, wherein an HF generator, an HF resonance coil having a closed ferrite core suitable for the high frequency, an insulating body acting as a gas nozzle, and a high-voltage electrode mounted in the insulating body are disposed in such a manner that they are permeated or circulated around by process gas. By integrating the plasma nozzle and required control electronics in a miniaturized handheld device, or by using a short high-voltage cable, the invention allows compliance with the electromagnetic compatibility directives and allows the power loss to be minimized and thus a mobile application to be implemented.
    Type: Grant
    Filed: July 31, 2010
    Date of Patent: March 31, 2015
    Assignee: Leibniz—Institut fuer Plasmaforschung und Technologie E. V.
    Inventors: Eckhard Kindel, Norbert Lembke, Manfred Stieber, Ruediger Titze, Klaus-Dieter Weltmann, Lutz Hellwig
  • Patent number: 8988012
    Abstract: In a dielectric window 41 for a plasma processing apparatus, a first dielectric window recess 47 is formed on an outer region of a surface of the dielectric window 41 in a diametrical direction of the dielectric window 41 at a side where plasma is generated, and the first dielectric window recess 47 is extended in a ring shape and has a tapered shape inwardly in a thickness direction of the dielectric window 41. A multiple number of second dielectric window recesses 53a to 53g are formed between the center of the dielectric window 41 and the first dielectric window recess 47, and each of the second dielectric window recesses 53a to 53g is recessed inwardly in the thickness direction of the dielectric window 41 from the surface of the dielectric window 41.
    Type: Grant
    Filed: March 24, 2011
    Date of Patent: March 24, 2015
    Assignee: Tokyo Electron Limited
    Inventors: Wataru Yoshikawa, Naoki Matsumoto, Jun Yoshikawa
  • Patent number: 8933630
    Abstract: An apparatus for extending the useful life of an ion source, comprising an arc chamber containing a plurality of cathodes to be used sequentially and a plurality of repellers to protect cathodes when not in use. The arc chamber includes an arc chamber housing defining a reaction cavity, gas injection openings, a plurality of cathodes, and at least one repeller element. A method for extending the useful life of an ion source includes providing power to a first cathode of an arc chamber in an ion source, operating the first cathode, detecting a failure or degradation in performance of the first cathode, energizing a second cathode, and continuing operation of the arc chamber with the second cathode.
    Type: Grant
    Filed: December 19, 2012
    Date of Patent: January 13, 2015
    Assignee: Taiwan Semiconductor Manufacturing Co., Ltd.
    Inventors: Chin-Tsung Lin, Hsiao-Yin Hsieh, Chi-Hao Huang, Hong-Hsing Chou, Yeh-Chieh Wang
  • Patent number: 8928230
    Abstract: A cold plasma treatment device for delivery of a cold plasma to patient treatment area. Gas is fed to a gas compartment where it is energized by an electrode coupled to a pulse source to thereby generate a cold plasma. A dielectric barrier is sandwiched between the gas compartment and the electrode to form a dielectric barrier discharge device. The cold plasma exits the gas compartment via a bottom member having a plurality of holes. Gases that can be used include noble gases such as helium or combinations of noble gases.
    Type: Grant
    Filed: September 14, 2012
    Date of Patent: January 6, 2015
    Assignee: Cold Plasma Medical Technologies, Inc.
    Inventors: Gregory A. Watson, Marc C. Jacofsky
  • Patent number: 8922122
    Abstract: The present disclosure provides for various advantageous methods and apparatus of controlling electron emission. One of the broader forms of the present disclosure involves an electron emission element, comprising an electron emitter including an electron emission region disposed between a gate electrode and a cathode electrode. An anode is disposed above the electron emission region, and a voltage set is disposed above the anode. A first voltage applied between the gate electrode and the cathode electrode controls a quantity of electrons generated from the electron emission region. A second voltage applied to the anode extracts generated electrons. A third voltage applied to the voltage set controls a direction of electrons extracted through the anode.
    Type: Grant
    Filed: December 1, 2011
    Date of Patent: December 30, 2014
    Assignee: Taiwan Semiconductor Manufaturing Company, Ltd.
    Inventors: Chih-Hong Hwang, Chun-Lin Chang, Nai-Han Cheng, Chi-Ming Yang, Chin-Hsiang Lin
  • Publication number: 20140375209
    Abstract: An ion source is configured for electron ionization and produces coaxial electron and ion beams. The ion source includes an ionization chamber along an axis, a magnet assembly configured for generating an axial magnetic field in the ionization chamber, an electron source, and a lens assembly configured for directing the ion beam out from the ionization chamber along the axis, reflecting the electron beam back toward the electron source, and transmitting higher energy ions out from the ion source while reflecting lower energy ions toward a lens element for neutralization.
    Type: Application
    Filed: June 24, 2013
    Publication date: December 25, 2014
    Inventors: Charles William Russ, Harry F. Prest, Jeffrey T. Kernan
  • Publication number: 20140332695
    Abstract: An ion source able to ionize liquid and gaseous effluents from interfaced liquid or gaseous separation techniques and from direct introduction of the analyte to the entrance of the ionization region. The liquid effluents from sources such as a liquid chromatograph are ionized by inlet ionization methods and the gaseous effluents from sources such as a gas chromatograph are ionized by a corona or Townsend electrical discharge, or an alpha or beta emitter, or by inlet ionization, or by photoionization. Ionization occurs in an intermediate pressure region linking atmospheric pressure and the vacuum of the mass analyzer. The source has the ability to ionize compounds from both liquid and gaseous sources, which facilitates ionization of volatile compounds separated by gas chromatography, volatile or non-volatile compounds separated by liquid chromatography, or infused into the ionization. The ionization methods can be achieved with a single configuration or with separately optimized configurations.
    Type: Application
    Filed: January 24, 2013
    Publication date: November 13, 2014
    Inventors: Charles Nehemiah McEwen, Vincent Salvatore Pagnotti
  • Patent number: 8884525
    Abstract: Disclosed herein are systems, methods and apparatuses for dissociating a non-activated gas through a disc-shaped plasma in a remote plasma source. Two inductive elements, one on either side of the disc-shaped plasma, generate a magnetic field that induces electric fields that sustain the disc-shaped plasma. The inductive elements can be coiled conductors having any number of loops and can be arranged in planar or vertical coils or a combination of planar and vertical coils. Additionally, the ratio of inductive element radius to gap distance between the two inductive elements can be configured to achieve a desired vertical plasma confinement.
    Type: Grant
    Filed: March 20, 2012
    Date of Patent: November 11, 2014
    Assignee: Advanced Energy Industries, Inc.
    Inventors: Daniel J. Hoffman, Daniel Carter, Randy Grilley, Karen Peterson
  • Patent number: 8853621
    Abstract: Disclosed herein are systems and methods that allow analysis of macromolecular structures using laserspray ionization at intermediate pressure or high vacuum using commercially available mass spectrometers with or without modification and with the application of heat. The systems and methods produce multiply-charged ions for improved analysis in mass spectrometry.
    Type: Grant
    Filed: October 25, 2011
    Date of Patent: October 7, 2014
    Assignee: Wayne State University
    Inventor: Sarah Trimpin
  • Publication number: 20140265858
    Abstract: An ion source for use in a radiation generator includes an active cathode configured to emit electrons on a trajectory away from the active cathode, at least some of the electrons as they travel interacting with an ionizable gas to produce ions. In addition, there is at least one extractor downstream of the active cathode having a potential such that the ions are attracted toward the at least one extractor.
    Type: Application
    Filed: March 14, 2013
    Publication date: September 18, 2014
    Applicant: Schlumberger Technology Corporation
    Inventor: Schlumberger Technology Corporation
  • Publication number: 20140263996
    Abstract: A radiation generator includes an insulator, with an ion source carried within the insulator and configured to generate ions and indirectly generate undesirable particles. An extractor electrode is carried within the insulator downstream of the ion source and has a first potential. An intermediate electrode is carried within the insulator downstream of the extractor electrode at a ground potential and is shaped to capture the undesirable conductive particles. In addition, a suppressor electrode is carried within the insulator downstream of the intermediate electrode and has a second potential opposite in sign to the first potential. A target is carried within the insulator downstream of the suppressor electrode. The extractor electrode and the suppressor electrode have a voltage therebetween such that an electric field generated in the insulator accelerates the ions generated by the ion source toward the target.
    Type: Application
    Filed: March 14, 2013
    Publication date: September 18, 2014
    Applicant: SCHLUMBERGER TECHNOLOGY CORPORATION
    Inventors: Jani Reijonen, Frederic Gicquel, Joel L. Groves, Peter Wraight, Kenneth E. Stephenson
  • Publication number: 20140263998
    Abstract: A method of generating ions in a radiation generator includes emitting electrons from an active cathode and on a trajectory away from the active cathode, at least some of the electrons as they travel interacting with an ionizable gas to produce ions. The method also includes setting a potential of at least one extractor downstream of the active cathode such that the ions are attracted toward the at least one extractor.
    Type: Application
    Filed: March 14, 2013
    Publication date: September 18, 2014
    Inventors: Luke Perkins, Benjamin Levitt, Peter Wraight, Arthur D. Liberman
  • Patent number: 8835870
    Abstract: Provided is an ion beam treatment apparatus including the target. The ion beam treatment apparatus includes a substrate having a first surface and a second surface opposed to the first surface, and including a cone type hole decreasing in width from the first surface to the second surface to pass through the substrate, wherein an inner wall of the substrate defining the cone type hole is formed of a metal, an ion generation thin film attached to the second surface to generate ions by a laser beam incident into the cone type hole through the first surface and strengthen, and a laser that emits a laser beam to generate ions from the ion generation thin film and project the ions onto a tumor portion of a patient. The laser beam incident into the cone type hole is focused by the cone type hole and is strengthened.
    Type: Grant
    Filed: January 9, 2013
    Date of Patent: September 16, 2014
    Assignee: Electronics and Telecommunications Research Institute
    Inventors: Moon Youn Jung, Hyeon-Bong Pyo, Hyung Ju Park, Seunghwan Kim, Seon Hee Park, Dong-Ho Shin, Hwang Woon Lee
  • Patent number: 8822947
    Abstract: A particle beam generating device includes at least one accelerator unit for generating a particle beam and at least one emission unit for the output of the at least one particle beam onto a workpiece. The device is configured to release at least two particle beams including hadronic particles with at least one of a different mass or a different charge.
    Type: Grant
    Filed: May 26, 2011
    Date of Patent: September 2, 2014
    Assignee: GSI Helmholzzentrum fuer Schwerionenforschung GmbH
    Inventors: Gerhard Kraft, Nami Saito, Dieter Schardt
  • Patent number: 8810134
    Abstract: A method for generating atmospheric pressure cold plasma inside a hand-held unit discharges cold plasma with simultaneously different rf wavelengths and their harmonics. The unit includes an rf tuning network that is powered by a low-voltage power supply connected to a series of high-voltage coils and capacitors. The rf energy signal is transferred to a primary containment chamber and dispersed through an electrode plate network of various sizes and thicknesses to create multiple frequencies. Helium gas is introduced into the first primary containment chamber, where electron separation is initiated. The energized gas flows into a secondary magnetic compression chamber, where a balanced frequency network grid with capacitance creates the final electron separation, which is inverted magnetically and exits through an orifice with a nozzle. The cold plasma thus generated has been shown to be capable of accelerating a healing process in flesh wounds on animal laboratory specimens.
    Type: Grant
    Filed: May 31, 2011
    Date of Patent: August 19, 2014
    Assignee: Cold Plasma Medical Technologies, Inc.
    Inventor: Gregory A. Watson
  • Patent number: 8803110
    Abstract: Beam current is adjusted during ion implantation by adjusting one or more parameters of an ion source. The ion beam is generated or provided by a non-arc discharge based ion source, such as an electron gun driven ion source or an RF driven ion source. A beam current adjustment amount is determined. Then, one or more parameters of the ion source are adjusted according to the determined beam current adjustment amount. The beam current is provided having a modulated beam current.
    Type: Grant
    Filed: September 29, 2006
    Date of Patent: August 12, 2014
    Assignee: Axcelis Technologies, Inc.
    Inventors: Michael A. Graf, Edward C. Eisner, William F. DiVergilio, Daniel R. Tieger
  • Patent number: 8785889
    Abstract: An ion implantation system and process, in which the performance and lifetime of the ion source of the ion implantation system are enhanced, by utilizing isotopically enriched dopant materials, or by utilizing dopant materials with supplemental gas(es) effective to provide such enhancement.
    Type: Grant
    Filed: March 15, 2013
    Date of Patent: July 22, 2014
    Assignee: Advanced Technology Materials, Inc.
    Inventors: Robert Kaim, Joseph D. Sweeney, Anthony M. Avila, Richard S. Ray
  • Patent number: 8786192
    Abstract: A plasma generator having a housing surrounding an ionization chamber, at least one working-fluid supply line leading into the ionization chamber, the ionization chamber having at least one outlet opening, at least one electric coil arrangement which surrounds at least one area of the ionization chamber, the coil arrangement being electrically connected with a high-frequency alternating-current source (AC) which is constructed such that it applies a high-frequency electric alternating current to at least one coil of the coil arrangement, is wherein a further current source (DC) is provided which is constructed such that it applies a direct voltage or an alternating voltage of a frequency lower than that of the voltage supplied by the high-frequency alternating current source (AC) to at least one coil of the coil arrangement.
    Type: Grant
    Filed: April 29, 2009
    Date of Patent: July 22, 2014
    Assignee: Astrium GmbH
    Inventors: Werner Kadrnoschka, Rainer Killinger, Ralf Kukies, Hans Leiter, Johann Mueller, Georg Schulte
  • Patent number: 8779400
    Abstract: An ion beam machining and observation method relevant to a technique of cross sectional observation of an electronic component, through which a sample is machined by using an ion beam and a charged particle beam processor capable of reducing the time it takes to fill up a processed hole with a high degree of flatness at the filled area. The observation device is capable of switching the kind of gas ion beam used for machining a sample with the kind of a gas ion beam used for observing the sample. To implement the switch between the kind of a gas ion beam used for sample machining and the kind of a gas ion beam used for sample observation, at least two gas introduction systems are used, each system having a gas cylinder, a gas tube, a gas volume control valve, and a stop valve.
    Type: Grant
    Filed: June 25, 2013
    Date of Patent: July 15, 2014
    Assignee: Hitachi High-Technologies Corporation
    Inventors: Hiroyasu Shichi, Satoshi Tomimatsu, Kaoru Umemura, Noriyuki Kaneoka, Koji Ishiguro
  • Publication number: 20140184074
    Abstract: An ion source for use in a radiation generator tube includes a back passive cathode electrode, a passive anode electrode downstream of the back passive cathode electrode, a magnet adjacent the anode, and a front passive cathode electrode downstream of the passive anode electrode. The front passive cathode electrode and the back passive cathode electrode define an ionization region therebetween. At least one field emitter array (FEA) cathode is configured to electrostatically discharge due to an electric field in the ion source. The back passive cathode electrode and the passive anode electrode, and the front passive cathode electrode and the passive anode electrode, have respective voltage differences therebetween, and the magnet generating a magnetic field, such that a Penning-type trap is produced to confine electrons from the electrostatic discharge to the ionization region. At least some of the electrons in the ionization region interact with an ionizable gas to create ions.
    Type: Application
    Filed: December 27, 2012
    Publication date: July 3, 2014
    Applicant: SCHLUMBERGER TECHNOLOGY CORPORATION
    Inventor: Luke Perkins
  • Patent number: 8766541
    Abstract: A method to modulate the density of an electron beam as it is emitted from a cathode, the method comprised of connecting a source of pulsed input power to the input end of a nonlinear transmission line and connecting the output end directly to the cathode of an electron beam diode by a direct electrical connection.
    Type: Grant
    Filed: September 26, 2011
    Date of Patent: July 1, 2014
    Assignee: The United States of America as represented by the Secretary of the Air Force
    Inventors: Brad W. Hoff, David M. French, Donald A. Shiffler, Susan L. Heidger, Wilkin W. Tang
  • Patent number: 8766542
    Abstract: The disclosed charged particle beam apparatus includes a field-emission electron source including <310> single crystal of tungsten; a vacuum chamber having the electron source therein; an exhausting system for exhausting the vacuum chamber; a filament connected to the electron source to let flow a current through the electron source and thereby heat the electron source; a power supply for letting a current flow through the filament; an ammeter for measuring a total current emitted from the electron source; and a controlling unit for exercising control to cause the power supply to let a current flow through the filament when the total current measured periodically has become a predetermined ratio or less as compared with a total current from the electron source found immediately after first electron beam emission, or a total current from the electron beam found immediately after a current is let flow through the filament.
    Type: Grant
    Filed: January 19, 2011
    Date of Patent: July 1, 2014
    Assignee: Hitachi High-Technologies Corporation
    Inventors: Boklae Cho, Shigeru Kokubo, Hisaya Murakoshi, Hisao Nitta
  • Publication number: 20140167614
    Abstract: An apparatus for extending the useful life of an ion source, comprising an arc chamber containing a plurality of cathodes to be used sequentially and a plurality of repellers to protect cathodes when not in use. The arc chamber includes an arc chamber housing defining a reaction cavity, gas injection openings, a plurality of cathodes, and at least one repeller element. A method for extending the useful life of an ion source includes providing power to a first cathode of an arc chamber in an ion source, operating the first cathode, detecting a failure or degradation in performance of the first cathode, energizing a second cathode, and continuing operation of the arc chamber with the second cathode.
    Type: Application
    Filed: December 19, 2012
    Publication date: June 19, 2014
    Applicant: TAIWAN SEMICONDUCTOR MANUFACTURING CO., LTD.
    Inventor: TAIWAN SEMICONDUCTOR MANUFACTURING CO., LTD.
  • Patent number: 8736177
    Abstract: An inductively coupled plasma ion source for a focused ion beam (FIB) system is disclosed, comprising an insulating plasma chamber with a feed gas delivery system, a compact radio frequency (RF) antenna coil positioned concentric to the plasma chamber and in proximity to, or in contact with, the outer diameter of the plasma chamber. In some embodiments, the plasma chamber is surrounded by a Faraday shield to prevent capacitive coupling between the RF voltage on the antenna and the plasma within the plasma chamber. High dielectric strength insulating tubing is heat shrunk onto the outer diameter of the conductive tubing or wire used to form the antenna to allow close packing of turns within the antenna coil. The insulating tubing is capable of standing off the RF voltage differences between different portions of the antenna, and between the antenna and the Faraday shield.
    Type: Grant
    Filed: September 30, 2010
    Date of Patent: May 27, 2014
    Assignee: FEI Company
    Inventor: Shouyin Zhang
  • Patent number: 8698399
    Abstract: A method of sustaining a plasma, by focusing a first wavelength of electromagnetic radiation into a gas within a volume, where the first wavelength is substantially absorbed by a first species of the gas and delivers energy into a first region of a plasma having a first size and a first temperature. A second wavelength of electromagnetic radiation is focused into the first region of the plasma, where the second wavelength is different than the first wavelength and is substantially absorbed by a second species of the gas and delivers energy into a second region of the plasma region within the first region of the plasma having a second size that is smaller than the first size and a second temperature that is greater than the first temperature.
    Type: Grant
    Filed: February 12, 2010
    Date of Patent: April 15, 2014
    Assignee: KLA-Tencor Corporation
    Inventors: Ilya V. Bezel, Anatoly Shchemelinin, Eugene Shifrin, Matthew W. Derstine, Richard W. Solarz
  • Publication number: 20140070701
    Abstract: This disclosure provides systems, methods, and apparatus for ion generation. In one aspect, an apparatus includes an anode, a first cathode, a second cathode, and a plurality of cusp magnets. The anode has a first open end and a second open end. The first cathode is associated with the first open end of the anode. The second cathode is associated with the second open end of the anode. The anode, the first cathode, and the second cathode define a chamber. The second cathode has an open region configured for the passage of ions from the chamber. Each cusp magnet of the plurality of cusp magnets is disposed along a length of the anode.
    Type: Application
    Filed: September 4, 2013
    Publication date: March 13, 2014
    Applicant: The Regents of the University of California
    Inventors: Thomas Schenkel, Qing Ji, Arun Persaud, Amy V. Sy
  • Patent number: 8648604
    Abstract: An ionization gauge to measure pressure and to reduce sputtering yields includes at least one electron source that generates electrons. The ionization gauge also includes a collector electrode that collects ions formed by the collisions between the electrons and gas molecules. The ionization gauge also includes an anode. An anode bias voltage relative to a bias voltage of a collector electrode is configured to switch at a predetermined pressure to decrease a yield of sputtering collisions.
    Type: Grant
    Filed: August 20, 2010
    Date of Patent: February 11, 2014
    Assignee: Brooks Automation, Inc.
    Inventor: Gerardo A. Brucker
  • Patent number: 8633648
    Abstract: A gas conversion system using microwave plasma is provided. The system includes: a microwave waveguide; a gas flow tube passing through a microwave waveguide and configured to transmit microwaves therethrough; a temperature controlling means for controlling a temperature of the microwave waveguide; a temperature sensor disposed near the gas flow tube and configured to measure a temperature of gas flow tube or microwave waveguide; an igniter located near the gas flow tube and configured to ignite a plasma inside the gas flow tube so that the plasma converts a gas flowing through the gas flow tube during operation; and a plasma detector located near the gas flow tube and configured to monitor the plasma.
    Type: Grant
    Filed: June 19, 2012
    Date of Patent: January 21, 2014
    Assignee: ReCarbon, Inc.
    Inventors: Toru Tanibata, Jae-Mo Koo, Sang Hun Lee
  • Patent number: 8624503
    Abstract: An electrohydrodynamic fluid accelerator includes an emitter electrode and leading surfaces of a collector electrode that are substantially exposed to ion bombardment. Heat transfer surfaces downstream of the emitter electrode along a fluid flow path include a first portion not substantially exposed to the ion bombardment that is conditioned with a first ozone reducing material. The leading surfaces of the collector electrode are not conditioned with the first ozone reducing material, but may include a different surface conditioning. The downstream heat transfer surfaces and the leading surfaces can be separately formed and joined to form the unitary structure or can be integrally formed. The electrohydrodynamic fluid accelerator can be used in a thermal management assembly of an electronic device with a heat dissipating device thermally coupled to the conditioned heat transfer surfaces.
    Type: Grant
    Filed: April 30, 2010
    Date of Patent: January 7, 2014
    Assignee: Panasonic Precision Devices Co., Ltd.
    Inventors: Nels Jewell-Larsen, Yan Zhang, Matt Schwiebert, Ken Honer
  • Patent number: 8618514
    Abstract: A method of manufacturing a semiconductor device includes the steps of: providing a supply of molecules containing a plurality of dopant atoms into an ionization chamber, ionizing said molecules into dopant cluster ions, extracting and accelerating the dopant cluster ions with an electric field, selecting the desired cluster ions by mass analysis, modifying the final implant energy of the cluster ion through post-analysis ion optics, and implanting the dopant cluster ions into a semiconductor substrate. In general, dopant molecules contain n dopant atoms, where n is an integer number greater than 10. This method enables increasing the dopant dose rate to n times the implantation current with an equivalent per dopant atom energy of 1/n times the cluster implantation energy, while reducing the charge per dopant atom by the factor n.
    Type: Grant
    Filed: November 2, 2011
    Date of Patent: December 31, 2013
    Assignee: SemEquip, Inc.
    Inventors: Thomas N. Horsky, Dale C. Jacobson
  • Patent number: 8587202
    Abstract: The invention relates to an ion accelerator arrangement comprising an electrostatic acceleration field between a cathode to which a frame potential is applied and an anode to which a high-voltage potential is applied. The ion accelerator arrangement further comprises a gas supply system into which a gas-permeable, open porous insulator member is introduced. Also described is a high-voltage insulator arrangement that comprises such an insulator member and is suitable, inter alia, for such an ion accelerator arrangement and for the corona-resistant insulation of other components to which a high voltage is applied.
    Type: Grant
    Filed: September 12, 2008
    Date of Patent: November 19, 2013
    Assignee: Thales Electronic Systems GmbH
    Inventors: Hans-Peter Harmann, Norbert Koch, Guenter Kornfeld
  • Patent number: 8581496
    Abstract: A plasma torch is formed from a hollow electrode forming a first gap to an isolated plasma tube, the isolated plasma tube forming a second gap with a plasma outlet tube having electrically common plasma tubes which terminate into a plasma outlet. The first gap and second gap of the isolated plasma tubes are fed by a source of plasma gas such that when a voltage is applied across the electrodes, plasmas initially form across the first plasma gap and second plasma gap. The formed plasmas spread laterally until the plasmas are formed entirely from electrode to electrode and self-sustaining. Plasma gasses which are fed to the plasma torch can be metered on both sides of the electrodes to steer the plasma arc attachment axially over the extent of the hollow electrodes, thereby reducing surface wear and increasing electrode life.
    Type: Grant
    Filed: July 29, 2011
    Date of Patent: November 12, 2013
    Assignee: Oaks Plasma, LLC.
    Inventors: Alexander Filippovich Rutberg, Philipp Grigorevich Rutberg, Sergei Dmitrievich Popov, Valentin Anatolevich Spodobin
  • Patent number: 8575843
    Abstract: A plasma generating system, related method and device are disclosed. The plasma generation system includes a plasma generation device, a source of ionizable gas and a driver network. The plasma generation device includes a housing, an electrode, and a resonant circuit. The housing includes a passage defined therein and directs a flow of ionizable gas therethrough. The electrode is coupled to the ionizable gas flowing through the passage of the housing. The resonant circuit includes a capacitor and an inductor connected together in series. The resonant circuit has a resonance frequency and is coupled to the electrode. The resonant circuit receives an AC signal. The driver network provides the AC signal such that the AC signal has a frequency and excites the ionizable gas flowing through the passage of the housing to a plasma.
    Type: Grant
    Filed: May 29, 2009
    Date of Patent: November 5, 2013
    Assignee: Colorado State University Research Foundation
    Inventors: Cameron A. Moore, Douglas A. Scott, George J. Collins
  • Publication number: 20130285552
    Abstract: The invention relates to devices and methods in mass spectrometers for the generation of ions of heavy molecules, especially biomolecules, by bombarding them with uncharged clusters of molecules. The analyte ions which are generated or released by cluster bombardment of analyte substances on the surface of sample support plates show a broad distribution of their kinetic energies, which prevents good ion-optical focusing. In the invention, the kinetic energies are homogenized in a higher-density collision gas. The collision gas is preferably located in an RF ion guide, more preferably an RF ion funnel, which can transfer the ions to the mass analyzer. The collision gas may be introduced with temporal pulsing, coordinated or synchronized with the pulsed supersonic gas jet. The collision gas may be pumped off again before the next supersonic gas pulse. In an advantageous embodiment, the collision gas can originate from the supersonic gas jet itself.
    Type: Application
    Filed: April 25, 2013
    Publication date: October 31, 2013
    Applicant: Bruker Daltonik GmbH
    Inventors: Michael Duerr, Christoph Gebhardt
  • Patent number: 8530854
    Abstract: Various technologies described herein pertain to a micro gas-puff based source of neutrons, x-rays, and/or energetic particles. The micro gas-puff based source can generate plasma, which can emit neutrons, x-rays, and the like. The micro gas-puff based source includes a diode, which further includes an anode and a cathode. Further, a chamber is between the anode and the cathode. Moreover, a MEMS gas supply can inject a puff of gas between the anode and the cathode within the chamber, where the MEMS gas supply shapes the puff of gas to form a quasispherical density profile of gas created in various of geometries. Further, a pulsed power supply applies a voltage across the anode and the cathode to cause compression of the puff of gas to form the plasma.
    Type: Grant
    Filed: October 9, 2012
    Date of Patent: September 10, 2013
    Assignee: Sandia Corporation
    Inventors: Mark S. Derzon, Paul C. Galambos
  • Patent number: 8508134
    Abstract: A Hall-current ion source with a narrow ion beam energy distribution is presented. A narrow ion beam energy distribution is provided by a utilization of a multi-chamber anode through which a working gas is applied and delivers a uniform working gas distribution in a discharge channel. Introduction of a working gas through a lower part of anode makes applied electric potential in a narrow area and leading to enhanced conditions for a working gas ionization, high ion beam current, high translation of a discharge voltage into a “monochromatic” ion beam mean energy distribution. A multi-chamber anode with a slit exit for introduction of a working gas into area under anode is utilized to prevent a backflow of insulating and dielectric depositions on anode parts, and under anode area makes a nominal operation with reactive gases without a phenomenon called as “anode poisoning” during long operating hours.
    Type: Grant
    Filed: July 29, 2010
    Date of Patent: August 13, 2013
    Inventors: Evgeny Vitalievich Klyuev, Viacheslav Vasilievich Zhurin
  • Patent number: 8481965
    Abstract: The process of the present application facilitates the production of electric energy by the deliberate extraction of electrons from atoms and molecules of a gas, vapor, liquid, particulate solid, or any other form of matter that can be passed along the surface or through the electron extraction unit. The extracted electrons are captured, collected and controlled or regulated for distribution as electric energy. It is an energy efficient process for the extraction and capture of electrons for the production of electric energy with positive atomic or molecular ions as byproducts. The product ions can then be confined in a coherent beam or restricted to a magnetic enclosure or by other confinement methods, expelled to the atmosphere, another environment or to ground, or modified into useful molecules. These results are accomplished by the forcible extraction and capture of electrons from the object particles by electrically charged particles in a strong electric field.
    Type: Grant
    Filed: February 8, 2011
    Date of Patent: July 9, 2013
    Inventor: Eugene B. Pamfiloff
  • Patent number: 8481980
    Abstract: An ion beam machining and observation method relevant to a technique of cross sectional observation of an electronic component, through which a sample is machined by using an ion beam and a charged particle beam processor capable of reducing the time it takes to fill up a processed hole with a high degree of flatness at the filled area. The observation device is capable of switching the kind of gas ion beam used for machining a sample with the kind of a gas ion beam used for observing the sample. To implement the switch between the kind of a gas ion beam used for sample machining and the kind of a gas ion beam used for sample observation, at least two gas introduction systems are used, each system having a gas cylinder a gas tube, a gas volume control valve, and a stop valve.
    Type: Grant
    Filed: April 23, 2008
    Date of Patent: July 9, 2013
    Assignee: Hitachi High-Technologies Corporation
    Inventors: Hiroyasu Shichi, Satoshi Tomimatsu, Kaoru Umemura, Noriyuki Kaneoka, Koji Ishiguro