Abstract: Ion sources and methods for generating an ion beam with a controllable ion current density distribution. The ion source includes a discharge chamber and an electromagnet adapted to generate a magnetic field for changing a density distribution of the plasma inside the discharge chamber and, thereby, to change the ion current density distribution.

Abstract: A system for producing energetic particles including a housing containing an anode and a cathode, wherein the anode is connected to a voltage supply and the cathode is one of a cathode containing an oxide layer and a cathode in the presence of oxygen, said cathode is grounded; a vacuum source connected to the housing for providing a reduced pressure in the housing; and a supply of at least one gas connected to the housing for introducing the at least one gas into the housing containing deuterium and oxygen.

Abstract: A device for coupling ionization energy into an ion or electron source, which is excited inductively or inductively-capacitively is provided. The device includes: a discharge vessel for a gas, which is to be ionized; a coupling coil, which is wound around the discharge vessel and feeds in a high frequency energy, which is required for plasma excitation; a coupling capacitor, which is electrically coupled to the coupling coil; a high frequency generator, which is electrically coupled to the coupling coil. The high frequency generator forms, together with the at least one coupling capacitor, a resonant circuit. The high frequency generator includes a PLL controller for automatic impedance matching of the resonant circuit, so that the resonant circuit can be driven at a resonant frequency.

Abstract: A gridless ion source operates from a control system (201) that generates an anode voltage (215) comprising a mains rectified signal such that the anode voltage modulates between a first voltage above a threshold and a second voltage below the threshold. The mains rectified signal is provided by transformer (210) receiving a mains input (211). The output of the transformer (213) is rectified by a bridge rectifier (214). In preferred embodiments, the threshold is an ionization threshold such that the ion current is initiated and extinguished in every cycle.

Abstract: An extreme UV radiation producing device in which adhesion of solid tin in the vacuum pump of an evacuation device is restricted, so that the maintenance period and the replacement period of the pump is prolonged is achieved by the provision of a treatment unit between a radiation source chamber and the evacuation device. The treatment device has a hydrogen radical producing part in which tin and/or a tin compound in the evacuated gas from the radiation source chamber is/are made into a tin hydride; and a heat treatment part in which the tin hydride is thermally decomposed and in which the tin produced liquefied and separated from the evacuated gas. The liquid tin is fed into a collecting/storage vessel and the evacuated gas from which the tin and/or a tin compound has been removed fed to the evacuation device.

Abstract: An electron beam irradiation device having an electron beam generating unit R, an irradiation chamber E for irradiating an electron beam to a irradiated object F, and an oxygen cutoff section S for blowing inert gas N on an upstream side of the irradiated chamber. The oxygen cutoff section is designed so that a gap Ws between partitions across the irradiated object is smaller than a gap We between the partitions across the irradiated object in the irradiation chamber (Ws<We). The gap Ws is made uniform, or almost uniform, throughout the entire area of the oxygen cutoff section, and a blowing slit 55 for blowing the inert gas to the processing surface of the irradiated object is provided on a partition with no projection nor recess involved.

Abstract: A method, apparatus, and system are described for an ionic wind generator. The ionic wind generator may have a first electrode that is elevated off a surface of a device that the ionic wind generator is intended to cool. A first surface of the first electrode is in contact with a first surface of a first post that elevates the first electrode off the surface of the device that the ionic wind generator is intended to cool. The ionic wind generator causes a generation of ions that are then drawn through an interstitial atmosphere from the first electrode to a second electrode to affect a velocity of local flow over the surface of the device between the first electrode and the second electrode.

Abstract: A device generates and/or influences electromagnetic radiation from a plasma, for the lithographic production of semiconductor elements. For example, the device generates and/or reflects EUV-radiation for EUV-lithography. In a first example, a magnetic means (10) generates at least one inhomogeneous magnetic field (11) and is provided as means for the targeted screening of at least one surface of the device (1; 5; 12) and/or another component (5; 12) from the charge carriers in the plasma (3).

Abstract: A compact Marx-type generator capable of producing high voltage pulses into low impedance loads. A parallel switch and distributed capacitance topology produce a coaxial-like conduction through the Marx-like circuit, resulting in a low source impedance. The parallel switching topology also lends itself to high repetition rates. Without loss of generality the device may be used, for example, as a source for vacuum diode loads, such as in flash radiography and high power microwaves.

Abstract: A novel plasma reactor is provided that includes a discharge chamber with dimensional characteristics and configuration of dielectric and electrodes that optimize efficiency based on the characteristics of the corona discharge streamers generated. Upon application of a pulsed high voltage potential, the discharge chamber enables formation of plasma where surface streamers play a greater role in the overall energy density of the discharge chamber than gas streamers. The formation of gas streamers is constrained. Because surface streamers have a higher energy density, the present invention is able to achieve improved energy efficiency while preserving effectiveness for gas treatment.

Abstract: An ion doping system includes a chamber 11, an exhausting section 13 for exhausting gases from the chamber, an ion source 12 provided for the chamber, and an accelerating section 23 for extracting the ions, generated in the ion source 12, from the ion source 12 and accelerating the ions toward a target. The ion source 12 includes an inlet port 14 to introduce a gas including a dopant element, a filament 15 emitting thermo electrons, and an anode electrode 17 to produce an arc discharge between the filament and itself. The ion source 12 decomposes the gas through the arc discharge, thereby generating ions including the dopant element. The ion doping system controls the arc discharge such that a constant amount of arc current flows between the filament and the anode electrode.

Abstract: An etching processing apparatus 1 has a transfer chamber 2, a plurality of processing chambers 3 and 4, and a plurality of cassette chambers 7 and 8. Inside the transfer chamber 2, a transfer mechanism 14 is provided. A control device 17 pauses the operation of the vacuum pump 16 after closing an opening/closing valve 15 of a vacuum evacuating mechanism, which vacuum evacuates the transfer chamber 2 in which the transfer mechanism 14 is provided, when the operation of the transfer mechanism 14 is paused for a predetermined time or longer. Accordingly, conservation of energy becomes possible without causing decrease of productivity.

Abstract: This invention relates to an apparatus for processing particles. The apparatus comprises a particle source having an exist aperture; an extraction electrode located at the exist aperture; an acceleration electrode adjacent to the extraction electrode; a processing compartment adjacent to the acceleration electrode; and a deceleration electrode located adjacent to the processing compartment. The invention also relates to methods of processing particles and to particles processed by the apparatus and methods of the invention.

Abstract: There is provided by this invention a wafer probe for measuring plasma and surface characteristics in plasma processing environment that utilizes integrated sensors on a wafer substrate. A microprocessor mounted on the substrate receives input signals from the integrated sensors to process, store, and transmit the data. A wireless communication transceiver receives the data from the microprocessor and transmits information outside of the plasma processing system to a computer that collects the data during plasma processing. The integrated sensors may be dual floating Langmuir probes, temperature measuring devices, resonant beam gas sensors, or hall magnetic sensors. There is also provided a self-contained power source that utilizes the plasma for power that is comprised of a topographically dependent charging device or a charging structure that utilizes stacked capacitors.

Abstract: A method and apparatus for generating and controlling a plasma (130) formed in a capacitively coupled plasma system (100) having a plasma electrode (140) and a bias electrode in the form of a workpiece support member (170), wherein the plasma electrode is unitary and has multiple regions (Ri) defined by a plurality of RF power feed lines (156) and the RF power delivered thereto. The electrode regions may also be defined as electrode segments (420) separated by insulators (426). A set of process parameters A={n, ?i, ?i, Pi, S; Li} is defined; wherein n is the number of RF feed lines connected to the electrode upper surface at locations Li, ?i is the on-time of the RF power for the ith RF feed line, ?i is the phase of the ith RF feed line relative to a select one of the other RF feed lines, Pi is the RF power delivered to the electrode through the ith RF feed line at location Li, and S is the sequencing of RF power to the electrode through the RF feed lines.

Abstract: A SWP source includes an electromagnetic (EM) wave launcher configured to couple EM energy in a desired EM wave mode to a plasma by generating a surface wave on a plasma surface of the EM wave launcher adjacent the plasma. A power coupling system is coupled to the EM wave launcher and configured to provide the EM energy to the EM wave launcher for forming the plasma. A cover plate coupled to the plasma surface of the EM wave launcher protects the EM wave launcher from the plasma.

Abstract: A multistage plasma accelerator system includes at least one intermediate electrode between the plasma chamber between electrodes that include each other. An especially good efficiency can be achieved by way of an uneven distribution of potential to the potential stages formed by the plurality of electrodes having a high potential gradient of the last stage, when the plasma beam emerges, and by a special shape of the magnetic field prevailing in the plasma chamber of the last stage.

Abstract: A plasma surface treatment system for irradiating a surface of a substrate to be treated with a nitrogen plasma excited by a high-frequency electric field to introduce nitrogen into the surface of the substrate comprises a pulse modulator for pulse modulation of the high-frequency electric field. By applying the high-frequency electric field in a pulsed form, it is possible to realize a nitriding by which the peak of nitrogen concentration is located at a shallower position and a desired nitrogen concentration can be obtained.

Abstract: This invention relates to a method of producing a dopant gas species containing a required dopant element for implanting in a target and to an ion source for implementing such a method. In particular, although not exclusively, this invention relates to producing dopant ions for implanting in semiconductor wafers using an ion implanter. The present invention provides a method of producing a dopant gas species containing a required dopant element for implanting in a target, the method comprising: exposing a source mass of the element to gaseous bromine and element react to form a reactant product, and ionising the reactant product to produce ions of the dopant gas species.

Abstract: Plasma discharge sources for generating emissions in the VUV, EUV and X-ray spectral regions. Embodiments can include running a current through liquid jet streams within space to initiate plasma discharges. Additional embodiments can include liquid droplets within the space to initiate plasma discharges. One embodiment can form a substantially cylindrical plasma sheath. Another embodiment can form a substantially conical plasma sheath. Another embodiment can form bright spherical light emission from a cross-over of linear expanding plasmas. All the embodiments can generate light emitting plasmas within a space by applying voltage to electrodes adjacent to the space. All the radiative emissions are characteristic of the materials comprising the liquid jet streams or liquid droplets.

Abstract: A cold-cathode closed-drift ion source includes an anode, a cathode and a power supply. In certain example embodiments, neither the positive nor negative terminals of the power supply are connected to ground, and the anode and cathode are also not connected to ground. Thus, the ion source operates in a floating mode. As a result, the likelihood of formation of a problematic secondary circuit from the source to the power supply through the walls can be reduced and/or eliminated (or suppressed). Therefore, the chance of drawing a net positive charge from the ion source which induces a positive charge on dielectric or other surfaces proximate the wall(s) can be suppressed and/or reduced.

Abstract: A usable 13.5 nm radiation source in which Sn is the radiation substance, in which rapid transport with good reproducibility is possible up to the plasma generation site and in which formation of detrimental “debris” and coagulation of the vapor are suppressed as much as possible is achieved using emission of Sn ions in that SnH4 is supplied continuously or intermittently to the heating/ excitation part, is subjected to discharge heating and excitation or laser irradiation heating and excitation, and thus, is converted into a plasma from which extreme UV light with a main wavelength of 13.5 nm is emitted.

Abstract: A gas distributor for an ion source includes a plate having a recess and a series of apertures spaced radially outward from the recess. The apertures define paths for the flow of a gas through the plate, and the gas distributor further includes a sacrificial element that is separate from the plate and that is receivable and seats within the recess. The sacrificial element forms an area of the gas distributor that is subjected to erosive forces during normal operations of the ion source, and therefore, prevents erosion of the surface of the plate. The sacrificial element is removable from the plate and replaceable with another sacrificial element during a procedure which neither requires the plate to be removed from the ion source nor the ion source to be disassembled.

Abstract: The invention relates to thermal physics, in particular to a method and apparatus for cooling a working medium and a method for generating microwave radiation. The object is to reduce the power consumed in the cooling process and in the conversion of electric power into electromagnetic radiation energy. A working medium, molecules of which exhibit a stable dipole moment, is placed into a closed working zone of electrical field effect, the electric field having an intensity satisfying the condition: ?E>107 D V/m where: ? is the dipole moment of the working medium molecules, in Debyes (D), E is the electric field intensity, in V/m; and passage of electric current is prevented through the closed working zone. In generation of microwave radiation, exit of the microwave radiation is provided from the closed working zone of electric field effect, and heat is removed through absorption of the microwave radiation by an external coolant.

Abstract: A high-frequency current detector of a plasma processing apparatus detects a high-frequency current produced when high-frequency power in the range that does not cause generation of plasma in a chamber is supplied from a high-frequency power supply source to the chamber. The high-frequency current detector outputs the detected high-frequency current to a computer. The computer compares the high-frequency current received from the high-frequency current detector with a reference high-frequency current. When the received high-frequency current matches the reference high-frequency current, the computer determines that the process performance is normal. Otherwise, the computer determines that the process performance is abnormal. In this way, high-frequency characteristics specific to the apparatus are detected and the process performance are evaluated based on the detected high-frequency characteristics.

Abstract: The present invention relates to a device for electron beam pulse formation and amplification comprising an electron beam axis (5) for microstructuring and amplifying current pulses. Such a device is especially suitable for pulse frequencies of from 100 to 400 MHz and power amplifications of several megawatts. The device can be used especially for ion beam acceleration, the device being arranged directly in an ion accelerator tank (1) having a central container axis (2) for guiding and accelerating a pulsed ion beam (3) in the container axis (2). The electron beam pulse formation and amplification device (4) is arranged with its electron beam axis (5) transverse and offset relative to the container axis (2) and comprises outside the ion accelerator tank (1) device components for microstructuring the electron beam (14) and, inside the container, comprises device components for output coupling of the electron beam to the consumer, which, in a preferred embodiment, is the ion beam (3) itself.

Abstract: A glow discharge spectroscopy (GDS) source operates at atmospheric pressure. One of the discharge electrodes of the device is formed by an electrolytic solution 27 containing the analyte specimen. The passage of electrical current (either electrons or positive ions) across the solution/gas phase interface causes local heating and the volatilization of the analyte species. Collisions in the discharge region immediately above the surface of the solution results in optical emission and ionization that are characteristic of the analyte elements. As such, these analyte elements can be identified and quantified by optical emission spectroscopy (OES) or mass spectrometry (MS). The device uses the analyte solution as either the cathode or anode. Operating parameters depend on the electrolyte concentration (i.e. solution conductivity) and the gap 35 between the solution surface and the counter electrode.

Abstract: The invention is directed to a radiation source for generating extreme ultraviolet (EUV) radiation based on a hot, dense plasma generated by gas discharge.

Abstract: A low/band/high pass filter includes first and second plasmas, each with a path for the flow of electromagnetic energy at frequencies above the plasma frequency. A path for the flow of electromagnetic energy is coupled to the second port of the first plasma and to a first port of the second plasma. The plasma frequency of the second plasma is greater than that of the first plasma. Energy below the plasma frequency of the first plasma is reflected from the first port of the first plasma, and energy above the plasma frequency of the second plasma propagates to the second plasma. That energy above the plasma frequency of the first plasma but below the plasma frequency of the second plasma reflects from the second plasma and is coupled out of the system. That energy at a frequency above the second plasma frequency propagates through the second plasma.

Abstract: A method and device are presented for producing an intensive flow of atoms from an input flow of a molecular gas. Effects of ignition of a gas discharge of a complex type and dissociation of the gas molecules by electron impact in a discharge cell are utilized. The flow of atoms is output from the discharge cell through at least one emitting aperture. The complex gas discharge is composed of a main discharge and two auxiliary discharges of different types ignited in substantially coinciding zones of the discharge cell. The main discharge is an arc Penning discharge ignited in the vicinity of at least one emitting aperture. The first auxiliary discharge is a magnetron discharge with heated cathode, and the second auxiliary discharge is either a Penning discharge, or a Penning discharge with hollow cathode. The dissociation of the gas molecules is thereby carried out in the complex discharge and results in creation of the flow of hot and thermally atoms.

Abstract: There is proposed an apparatus for doping a material to be doped by generating plasma (ions) and accelerating it by a high voltage to form an ion current is proposed, which is particularly suitable for processing a substrate having a large area. The ion current is formed to have a linear sectional configuration, and doping is performed by moving a material to be doped in a direction substantially perpendicular to the longitudinal direction of a section of the ion current.

Abstract: The invention in one embodiment is realized in a plasma reactor for processing a semiconductor workpiece. The reactor includes a vacuum chamber having a side wall and a ceiling, a workpiece support pedestal within the chamber and generally facing the ceiling, a gas inlet capable of supplying a process gas into the chamber and a solenoidal interleaved parallel conductor coil antenna overlying the ceiling and including a first plurality conductors wound about an axis of symmetry generally perpendicular to the ceiling in respective concentric helical solenoids of at least nearly uniform lateral displacements from the axis of symmetry, each helical solenoid being offset from the other helical solenoids in a direction parallel to the axis of symmetry. An RF plasma source power supply is connected across each of the plural conductors.

Abstract: The invention provides a plasma processing apparatus, in which the uniformity of the plasma density can be improved, and the electron temperature can be kept low. A vacuum vessel 21 for generating a plasma includes an upper vessel 22 that is dome-shaped and formed in one seamless piece, and a lower vessel 23 fastened tightly on a lower aperture portion 24 of the upper vessel 22 with a sealing member. The plasma processing apparatus is provided with a supply port 26 for supplying gas to the vacuum vessel 21 and an exhaust port 34 for exhausting gas. An electrode 29 for applying high-frequency power to ionize the gas is provided not in the vacuum vessel 21 but in ring-shape outside the vacuum vessel 21. On the outer side of this tubular electrode 29, a pair of tubular magnets 30 are provided, which form magnetic force lines that intersect perpendicularly with the electric field.

Abstract: A method and apparatus for generating electrical fields within the ion flight path of a mass spectrometer are provided. Gratings having a planar array of parallel conductive strands and electrically connected to a voltage source are placed in the ion flight path so that at least a portion of the conductive strands traverses the flight path. The gratings may be arranged within the ion flight path so that the conductive strands of each of the gratings are aligned behind the conductive strands of a first grating, with respect to the ion flight path, thus providing high ion transmission.

Abstract: A process for modification of a surface structure by exposing the surface to a flow of neutral atomic or molecular gaseous medium excited to metastable level which is produced in a process of blowing a working gaseous medium through a discharge gap filled with plasma generated from this working gaseous medium.

Abstract: An improved method for charging ultrafine particles in coronas (e.g., unipolar or bipolar corona discharges) by exposing the particles to X-ray irradiation. Experimental tests have verified that positive corona in the presence of X-ray irradiation results in maximum or optimum charging efficiency, followed by a negative corona in the presence of X-ray irradiation, X-ray radiation only (without corona), negative corona only (without X-ray irradiation), and finally positive corona only (without X-ray irradiation). This method and system is particularly well suited for use with bioaerosol particles wherein exposure to the corona discharge and X-ray irradiation serves to both capture and inactivate the bioaerosol particles using a single device.

Abstract: A method for controlling a plasma used for materials processing includes generating a power for forming an electronegative plasma, detecting a signal that is related to a parameter of the plasma, and modulating the power generated in response to the signal. Modulation of the power causes a reduction in an instability of the parameter of the plasma. An apparatus for controlling a materials processing electronegative plasma includes a signal detector for detecting a signal that is related to a parameter of the plasma, and a power modulator for causing a modulation of the power for forming the plasma in response to the signal.

Abstract: Incorporating the use of a permanent magnet within a GCIB apparatus to separate undesirable monomer ions from a gas cluster ion beam to facilitate improved processing of workpieces. In an alternate embodiment, the effect of the permanent magnet may be controlled by the use of an electrical coil. The above system eliminates problems related to power consumption and heat generation.

Abstract: A radio frequency (RF) probe head apparatus is provided for measuring voltage and current of an RF signal in a sampled transmission line. The probe head apparatus includes a conductive housing, a bus inside the conductive housing, a pair of connectors mounted on the conductive housing and configured to pass an RF signal into and out of the housing via the bus, a voltage pick-up board within the housing, and a current pickup board within the housing. The voltage pickup board has an analog processor responsive to an electric field around the bus to produce a first DC output indicative of a root-mean-square (RMS) value of the electric field. The current pick-up board has a second analog processor responsive to a magnetic field around the bus to produce a second DC output indicative of an RMS value of the magnetic field.

Abstract: Ozone output in ion wind devices using one or more emitters (10) and an array of collectors (20) (accelerators) may be reduced through catalytic conversion of the produced ozone back to oxygen by using various materials placed in or downstream from the airflow, such as a manganese dioxide coating on the accelerator substrate elements. Precious metal or activated carbon coatings may also be used for the purpose of converting ozone to oxygen.

Abstract: A system and method for maintaining a plasma in a plasma region, by supplying RF power at a fundamental frequency to the plasma region together with a gas in order to create an RF electromagnetic field which interacts with the gas to create a plasma that contains electromagnetic energy components at frequencies that are harmonics of the fundamental frequency. The components at frequencies that are harmonics of the fundamental frequency are removed from the plasma by placing a body of an RF absorber material in energy receiving communication with the plasma, the body having a frequency dependent attenuation characteristic such that the body attenuates electrical energy at frequencies higher than the fundamental frequency more strongly than energy at the fundamental frequency.

Abstract: A method and apparatus for using a magnetic field generated by a thruster magnet to control electron current emitted by a cathode assembly. The magnetic field reduces leakage current drawn by an inactive anode by producing a magnetic field in proximity to the inactive anode. This magnetic field increases the impedance to the anode for electron current which is produced in the cathode assembly. This reduction in leakage current reduces the amount of electron current produced by the cathode assembly. This control system can be implemented by connecting all thruster anodes and cathodes in parallel to an anode power supply.

Abstract: An analytical balance that includes a balance scale, a wind guard encircling the balance scale, and an apparatus for generating an ionized stream of air for dissipating electrostatic charges of goods to be weighed. The apparatus for generating an ionized stream of air includes a blower that draws in air from the weighing space into at least one boundary surface of the weighing space. The blower also recycles the air back into the weighing space via at least one exhaust opening at another point. In this manner, highly effective dissipation of electrostatic charges is possible, and the stream of air can be conducted so that it exerts scarcely any vertical forces on the goods to be weighed. The analytical balance is very user-friendly in operation. Additionally, the apparatus for generating an ionized stream of air is preferably structured to be an easily installed optional component of the analytical balance.

Abstract: The present invention relates to a device for electron beam pulse formation and amplification comprising an electron beam axis (5) for microstructuring and amplifying current pulses. Such a device is especially suitable for pulse frequencies of from 100 to 400 MHz and power amplifications of several megawatts. The device can be used especially for ion beam acceleration, the device being arranged directly in an ion accelerator tank (1) having a central container axis (2) for guiding and accelerating a pulsed ion beam (3) in the container axis (2). The electron beam pulse formation and amplification device (4) is arranged with its electron beam axis (5) transverse and offset relative to the container axis (2) and comprises outside the ion accelerator tank (1) device components for microstructuring the electron beam (14) and, inside the container, comprises device components for output coupling of the electron beam to the consumer, which, in a preferred embodiment, is the ion beam (3) itself.

Abstract: The present invention provides a pulse power system for extreme ultraviolet and x-ray light sources. The pulse power system produces electrical pulses of at least 12 J at pulse repetition rates of at least 2000 Hz. The system is extremely reliable and has design lifetime substantially in excess of 10 billion pulses. The system includes a charging capacitor bank, a fast charger for charging the charging capacitor bank in time periods of less than 0.5 seconds. A voltage control circuit is provided for controlling the charging voltage capacitor to within less than 0.5 percent of desired values. The system includes a magnetic compression circuit for creating, compressing in duration and amplifying voltage pulses. A trigger circuit discharges the charging capacitor bank into the pulse compression circuit so as to produce EUV or x-ray light pulses with a timing accuracy of less than 10 ns.

Abstract: In a spark gap switch 12 of a pulse generating circuit 2 of a plasma generator T, an intermediate electrode 15, which is not connected to any electrical source, is disposed at a nearly middle position between a first spherical electrode 13 and a second spherical electrode 15 so as to hold respective spark gaps to the both spherical electrodes 13, 14. Further, in the spark gap switch 12, switching operation is performed between the both spherical electrodes 13, 14 by causing two-stage spark discharge in the first spark gap between the first spherical electrode 13 and the intermediate electrode 15, and in the second spark gap between the intermediate electrode 15 and the second spherical electrode 14. Thus, in the spark gap switch 12, pulse voltage of high voltage and high frequency is stably generated for a long time, and further the spark gap switch 12 may be made compact.

Abstract: A plasma pinch having an inner/outer coaxial tube arrangement, which nested tube arrangement yields a higher-performance pinchlamp than is capable with a single-tube configuration. Further, each tube contains a separate gas, the inner tube filled with Argon, and the outer tube filled with Helium. The inner/outer coaxial tube arrangement of the present invention facilitates the use of an inner tube to contain a volume of Argon gas as the working gas. The outer tube is coaxial with the inner tube, surrounding the inner tube with contained Helium gas. The configuration of an outer tube filled with Helium presents external pressures to the inner tube. The contained Helium gas in the outer tube, among other things, compresses and supports the walls of the inner tube, enabling the inner tube to be smaller in diameter than prior art plasma chambers, which chambers would shatter if made with as small a diameter as the present inner tube.

Abstract: A particle accelerator for inducing contained particle collisions. The particle accelerator includes two hollow dees of electrically conductive material which are separated and electrically insulated from each other. The dees are located between the poles of a strong magnet which generates a magnetic field through top and bottom sides of the dees. In addition, the dees are connected to an oscillator for providing an alternating voltage between the dees. The dees are located within a chamber containing a gas and/or vapor provided at a measurable pressure. Ions are accelerated in essentially spiral paths within the dees, and follow paths which may be both concentric and non-concentric with the dees whereby collisions are produced between accelerated ions and gas or vapor atoms contained within the chamber, as well as between pairs of accelerated ions following different paths.

Abstract: An ionizing rod comprising a core having an outer surface with a plurality of ionizing points disposed along the outer surface of the core. The plurality of ionizing points are sufficiently dense upon the core surface such that air between the plurality of ionizing points and an object is sufficiently ionized to remove static charge from the object. The core material can be electrically conductive, insulative, or static dissipative. The methods to attach the ionizing points to the core include a pullover sleeve, made of fibers including ionizing points, and glue to adhere either fibers in electrical communication or not in electrical communication depending on whether conductive or non-conductive adhesive are employed. Alternative embodiments include a means for the ionizing charged particles to travel to ground or electrically charged and a grip.

Abstract: A microwave discharge-type electrostatic accelerator propulsion device is provided that features a simplified system configuration, and accordingly, high reliability and low fabrication costs. A discharge chamber is formed by side walls that are made of an insulating material. An upstream acceleration electrode and a ring-shaped downstream acceleration electrode, which are supplied with power by an acceleration power supply, are provided upstream and downstream of the discharge chamber, respectively.